JPS6044503A - グロ−重合体層の形成方法 - Google Patents
グロ−重合体層の形成方法Info
- Publication number
- JPS6044503A JPS6044503A JP59151139A JP15113984A JPS6044503A JP S6044503 A JPS6044503 A JP S6044503A JP 59151139 A JP59151139 A JP 59151139A JP 15113984 A JP15113984 A JP 15113984A JP S6044503 A JPS6044503 A JP S6044503A
- Authority
- JP
- Japan
- Prior art keywords
- glow
- heat treatment
- polymer layer
- glow polymer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 37
- 229920000642 polymer Polymers 0.000 title claims description 28
- 238000010438 heat treatment Methods 0.000 claims description 28
- 239000000178 monomer Substances 0.000 claims description 14
- 150000002430 hydrocarbons Chemical class 0.000 claims description 12
- 229930195733 hydrocarbon Natural products 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 9
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 6
- 239000004215 Carbon black (E152) Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910021529 ammonia Inorganic materials 0.000 claims description 2
- 230000005684 electric field Effects 0.000 claims description 2
- 150000003335 secondary amines Chemical class 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 150000003141 primary amines Chemical class 0.000 claims 1
- 239000003708 ampul Substances 0.000 description 10
- 238000006116 polymerization reaction Methods 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000000576 coating method Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 210000002381 plasma Anatomy 0.000 description 5
- 239000012495 reaction gas Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- BCCOBQSFUDVTJQ-UHFFFAOYSA-N octafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(F)C1(F)F BCCOBQSFUDVTJQ-UHFFFAOYSA-N 0.000 description 4
- 235000019407 octafluorocyclobutane Nutrition 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 239000004341 Octafluorocyclobutane Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 230000007717 exclusion Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- RKIMETXDACNTIE-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6-dodecafluorocyclohexane Chemical compound FC1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)F RKIMETXDACNTIE-UHFFFAOYSA-N 0.000 description 1
- ZMYIIHDQURVDRB-UHFFFAOYSA-N 1-phenylethenylbenzene Chemical group C=1C=CC=CC=1C(=C)C1=CC=CC=C1 ZMYIIHDQURVDRB-UHFFFAOYSA-N 0.000 description 1
- 101100037762 Caenorhabditis elegans rnh-2 gene Proteins 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical compound FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
- B05D3/0453—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F114/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F114/18—Monomers containing fluorine
- C08F114/26—Tetrafluoroethene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/52—Polymerisation initiated by wave energy or particle radiation by electric discharge, e.g. voltolisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Chemical Vapour Deposition (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833326376 DE3326376A1 (de) | 1983-07-22 | 1983-07-22 | Verfahren zum erzeugen von glimmpolymerisat-schichten |
| DE3326376.0 | 1983-07-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6044503A true JPS6044503A (ja) | 1985-03-09 |
| JPH0514722B2 JPH0514722B2 (en:Method) | 1993-02-25 |
Family
ID=6204589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59151139A Granted JPS6044503A (ja) | 1983-07-22 | 1984-07-20 | グロ−重合体層の形成方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5089290A (en:Method) |
| EP (1) | EP0132686B1 (en:Method) |
| JP (1) | JPS6044503A (en:Method) |
| AT (1) | ATE30162T1 (en:Method) |
| CA (1) | CA1240285A (en:Method) |
| DE (2) | DE3326376A1 (en:Method) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5246451A (en) * | 1991-04-30 | 1993-09-21 | Medtronic, Inc. | Vascular prosthesis and method |
| CA2072384A1 (en) * | 1991-08-29 | 1993-03-01 | Clifford L. Spiro | Carbon fluoride compositions |
| US5569810A (en) * | 1994-03-18 | 1996-10-29 | Samco International, Inc. | Method of and system for processing halogenated hydrocarbons |
| US5804259A (en) * | 1996-11-07 | 1998-09-08 | Applied Materials, Inc. | Method and apparatus for depositing a multilayered low dielectric constant film |
| ES2252840T3 (es) | 1997-06-14 | 2006-05-16 | The Secretary Of State For Defence | Revestimientos de superficies. |
| GB9712338D0 (en) * | 1997-06-14 | 1997-08-13 | Secr Defence | Surface coatings |
| JP3574734B2 (ja) * | 1997-11-27 | 2004-10-06 | 東京エレクトロン株式会社 | 半導体デバイスの製造方法 |
| US6203850B1 (en) * | 1999-05-18 | 2001-03-20 | Neomecs Incorporated | Plasma-annealed porous polymers |
| DE10316379B4 (de) * | 2003-04-10 | 2006-06-01 | Christian-Albrechts-Universität Zu Kiel | Verfahren zur Herstellung von Metall-Polymer-Nanokompositen |
| GB0406049D0 (en) * | 2004-03-18 | 2004-04-21 | Secr Defence | Surface coatings |
| DE102005034764B4 (de) * | 2005-07-26 | 2012-08-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung von funktionalen Fluor-Kohlenstoff-Polymerschichten mittels Plasmapolymerisation von Perfluorocycloalkanen und damit beschichtete Substrate |
| US11742186B2 (en) * | 2017-05-21 | 2023-08-29 | Jiangsu Favored Nanotechnology Co., LTD | Multi-functional protective coating |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59159806A (ja) * | 1983-02-28 | 1984-09-10 | Daikin Ind Ltd | 含フツ素高分子化合物被膜の形成方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2652383C3 (de) * | 1976-11-17 | 1980-08-21 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Herstellung von elektrisch isolierenden Schichten durch Polymerisation von Gasen mittels einer'"'1"111611 Wechselspannung |
| US4096315A (en) * | 1976-12-15 | 1978-06-20 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Process for producing a well-adhered durable optical coating on an optical plastic substrate |
| US4252848A (en) * | 1977-04-11 | 1981-02-24 | Rca Corporation | Perfluorinated polymer thin films |
| JPS5518403A (en) * | 1978-07-25 | 1980-02-08 | Toshiba Corp | Formation of organic thin film |
| DE2900200A1 (de) * | 1979-01-04 | 1980-07-17 | Bosch Gmbh Robert | Messonde mit schutzschicht und verfahren zur herstellung einer schutzschicht auf einer messonde |
| DE3214804A1 (de) * | 1982-04-21 | 1983-10-27 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum erzeugen einer lyophoben schicht |
-
1983
- 1983-07-22 DE DE19833326376 patent/DE3326376A1/de not_active Withdrawn
-
1984
- 1984-07-09 AT AT84108035T patent/ATE30162T1/de not_active IP Right Cessation
- 1984-07-09 EP EP84108035A patent/EP0132686B1/de not_active Expired
- 1984-07-09 DE DE8484108035T patent/DE3466696D1/de not_active Expired
- 1984-07-20 CA CA000459317A patent/CA1240285A/en not_active Expired
- 1984-07-20 JP JP59151139A patent/JPS6044503A/ja active Granted
-
1990
- 1990-11-30 US US07/622,206 patent/US5089290A/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59159806A (ja) * | 1983-02-28 | 1984-09-10 | Daikin Ind Ltd | 含フツ素高分子化合物被膜の形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3326376A1 (de) | 1985-01-31 |
| US5089290A (en) | 1992-02-18 |
| EP0132686B1 (de) | 1987-10-07 |
| JPH0514722B2 (en:Method) | 1993-02-25 |
| ATE30162T1 (de) | 1987-10-15 |
| DE3466696D1 (en) | 1987-11-12 |
| EP0132686A1 (de) | 1985-02-13 |
| CA1240285A (en) | 1988-08-09 |
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