JPS6043833A - 表面汚染防止法並にその装置 - Google Patents

表面汚染防止法並にその装置

Info

Publication number
JPS6043833A
JPS6043833A JP58150953A JP15095383A JPS6043833A JP S6043833 A JPS6043833 A JP S6043833A JP 58150953 A JP58150953 A JP 58150953A JP 15095383 A JP15095383 A JP 15095383A JP S6043833 A JPS6043833 A JP S6043833A
Authority
JP
Japan
Prior art keywords
coating layer
clean
forming
substrate
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58150953A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0324768B2 (cg-RX-API-DMAC10.html
Inventor
Chikara Hayashi
林　主税
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP58150953A priority Critical patent/JPS6043833A/ja
Publication of JPS6043833A publication Critical patent/JPS6043833A/ja
Publication of JPH0324768B2 publication Critical patent/JPH0324768B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
JP58150953A 1983-08-20 1983-08-20 表面汚染防止法並にその装置 Granted JPS6043833A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58150953A JPS6043833A (ja) 1983-08-20 1983-08-20 表面汚染防止法並にその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58150953A JPS6043833A (ja) 1983-08-20 1983-08-20 表面汚染防止法並にその装置

Publications (2)

Publication Number Publication Date
JPS6043833A true JPS6043833A (ja) 1985-03-08
JPH0324768B2 JPH0324768B2 (cg-RX-API-DMAC10.html) 1991-04-04

Family

ID=15508032

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58150953A Granted JPS6043833A (ja) 1983-08-20 1983-08-20 表面汚染防止法並にその装置

Country Status (1)

Country Link
JP (1) JPS6043833A (cg-RX-API-DMAC10.html)

Also Published As

Publication number Publication date
JPH0324768B2 (cg-RX-API-DMAC10.html) 1991-04-04

Similar Documents

Publication Publication Date Title
US5294261A (en) Surface cleaning using an argon or nitrogen aerosol
EP0461476B1 (en) Surface cleaning using a cryogenic aerosol
US5366156A (en) Nozzle apparatus for producing aerosol
US5400603A (en) Heat exchanger
US10748789B2 (en) Systems and methods for treating substrates with cryogenic fluid mixtures
JPH08298252A (ja) エアロゾル表面処理
JPH08321480A (ja) 表面の処理
EP0712691B1 (en) Apparatus for producing cryogenic aerosol
JP2001506925A (ja) 回転可能で移動可能な噴霧ノズル
JPH0622224B2 (ja) パーティクルが少ないか又は含まない液化二酸化炭素の供給
US5486132A (en) Mounting apparatus for cryogenic aerosol cleaning
EP0569708B1 (en) Apparatus to clean solid surfaces using a cryogenic aerosol
JPS6043833A (ja) 表面汚染防止法並にその装置
JPS62149137A (ja) 乾燥装置
JPH07153729A (ja) 固体表面の洗浄装置
JPH0243730A (ja) 半導体ウエハの洗浄装置
EP0713071B1 (en) Heat exchanger
US6202423B1 (en) Non-damage transport system by ice condensation
EP1221357A1 (en) Arrangement and method for cleaning a semiconductor device
JP2000328228A (ja) 真空成膜システム
JPH0878374A (ja) ウエーハキャリヤの洗浄方法及びその装置
JPH04336962A (ja) アルミニウムドラムの表面処理装置
JPH02143522A (ja) 低温処理方法とそれに用いる低温処理装置
JPH08172035A (ja) 空気浄化装置