JPS604266B2 - Copper alloy for contact materials and its manufacturing method - Google Patents
Copper alloy for contact materials and its manufacturing methodInfo
- Publication number
- JPS604266B2 JPS604266B2 JP5951480A JP5951480A JPS604266B2 JP S604266 B2 JPS604266 B2 JP S604266B2 JP 5951480 A JP5951480 A JP 5951480A JP 5951480 A JP5951480 A JP 5951480A JP S604266 B2 JPS604266 B2 JP S604266B2
- Authority
- JP
- Japan
- Prior art keywords
- tin
- plating
- copper
- copper alloy
- contact materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Manufacture Of Switches (AREA)
- Conductive Materials (AREA)
Description
【発明の詳細な説明】
本発明は、コールドウェルディングを起こさない接点材
料用鋼合金及びその製造法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a steel alloy for contact materials that does not cause cold welding, and a method for manufacturing the same.
特には銅合金に錫或いは錫含有合金のめつきを施した後
に熱処理を行なうことにより、コールドウェルディング
を起こさない接点材料に関するものである。錫は耐食性
、半田付け性等に優れ、表面接点用金属いわゆる錫めつ
きとして民生用電子機器に多量に用いられているが、長
時間に及ぶ援圧のかかる条件下では、接触面が粘着しあ
る程度の力をかけないと離脱しなくなる。In particular, the present invention relates to a contact material that does not cause cold welding by plating a copper alloy with tin or a tin-containing alloy and then subjecting it to heat treatment. Tin has excellent corrosion resistance and solderability, and is widely used in consumer electronic devices as a metal for surface contacts, so-called tin plating. It won't come off unless you apply a certain amount of force.
この現象はコールドウェルディングと呼ばれるが、従来
、このコールドウェルディングの発生が重大な障害とな
る分野においては金、銀、Rh、Pd等の高価な金属の
めつきが施されている。This phenomenon is called cold welding, and conventionally, in fields where the occurrence of cold welding is a serious problem, plating with expensive metals such as gold, silver, Rh, and Pd has been applied.
そこで錫或いは錫含有合金でめつきする場合でもコール
ドウェルディングを起こさない方法を探索した結果、本
発明に至った。即ち本発明は、銅合金に直接、或いは銅
下地めつきを行なった後、錫或いは錫含有合金のめつき
を施し、次いで加熱溶融及び/又はめつき材の融点以下
の温度で加熱することにより実質的に錫一銅化合物より
成る拡散層外層を形成せしむることにより、表面を硬化
させコールドゥェルディングを防止する接点材料を提供
するものである。Therefore, we searched for a method that does not cause cold welding even when plating with tin or a tin-containing alloy, and as a result we have arrived at the present invention. That is, the present invention provides plating with tin or a tin-containing alloy either directly on a copper alloy or after plating with a copper base, and then by heating and melting and/or heating at a temperature below the melting point of the plating material. The present invention provides a contact material which hardens the surface and prevents cold welding by forming an outer diffusion layer substantially made of a tin-copper compound.
接点用鋼合金には、りん青銅、黄銅、洋白、ベリリウム
鋼、チタン鋼等多種の銅合金が用いられるが、本発明は
これらの銅合金に直接或いは銅下地めつきを行なった後
、錫或いは錫含有合金のめつきを施す。めつきに用いる
錫含有合金とは、錫に鉛、インジウム、アンチモン、ア
ルミニウム、亜鉛等はんだ材料として知られているもの
を一種以上含むものを包括する。めつき方法としては電
解めつき、無電解めつき、更に錫或いは錫含有合金にお
いては溶融めつきのいずれでも実施することができ、か
つ、めつき浴組成にも限定されない。Various types of copper alloys, such as phosphor bronze, brass, nickel silver, beryllium steel, and titanium steel, are used as steel alloys for contacts, but the present invention uses these copper alloys either directly or after being plated with a copper undercoating. Alternatively, plating with a tin-containing alloy is applied. The tin-containing alloy used for plating includes tin containing one or more types of solder materials such as lead, indium, antimony, aluminum, and zinc. The plating method may be electrolytic plating, electroless plating, or, in the case of tin or a tin-containing alloy, hot-dip plating, and is not limited to the plating bath composition.
特に銅下地めつき及び錫めつきの厚さに制限は無いが、
銅下地めつきを行なう場合は加熱処理による生成物が銅
−錫化合物で初めはCu6,S広が主なものであるが、
最終的にはC叱Snと進行するため銅下地めつきと錫或
いは錫含有合金めつきの厚みは、この最終的な生成物で
あるCu3Snの組成を考慮し、銅と錫の比率が元素比
で(0u/Sn):(3′1)以下が好ましい。There is no particular limit to the thickness of copper underplating and tin plating, but
When performing copper underplating, the product of the heat treatment is a copper-tin compound, which is initially mainly composed of Cu6,S spread.
The thickness of the copper undercoating and tin or tin-containing alloy plating is determined by considering the composition of Cu3Sn, which is the final product, and adjusting the ratio of copper to tin based on the elemental ratio. (0u/Sn): (3'1) or less is preferable.
銅下地めつきを行なわない場合でも銅合金中の銅とめつ
き層中の錫とが拡散し、C&Sn5及びCu3Snが生
成する。本発明の接点材料はめつきされた錫或いは錫合
金中の錫成分の殆んどが銅−錫化合物を生成されれば十
分であって化合物の大部分がCuぶnである必要はない
。錫或いは錫含有合金を熔融めつき或いは電解めつき後
の熱処理条件としては加熱溶融の場合は例えば上層めつ
き層が0.5仏以下であれば多くの場合更に加熱処理す
ることなく、表面は実質的に錫−銅より成る拡散層が生
成する。Even when copper underplating is not performed, copper in the copper alloy and tin in the plating layer diffuse to form C&Sn5 and Cu3Sn. It is sufficient that most of the tin component in the tin or tin alloy plated with the contact material of the present invention forms a copper-tin compound, and it is not necessary that most of the compound be Cu. The heat treatment conditions after melting or electrolytically plating tin or tin-containing alloys include, in the case of heating and melting, for example, if the upper plating layer has a thickness of 0.5 mm or less, in many cases no further heat treatment is required and the surface is A diffusion layer consisting essentially of tin-copper is produced.
しかし溶融めつき及び加熱溶融の熱的条件は、金属間化
合物を生成させることを目的として定められてはおらず
、溶融めつきにおいては所定量のめつきを付着させるこ
とを、又、加熱溶融においては光沢を出すことを目的に
熱的条件が定められているから、本発明の目的とする実
質的に錫−銅より成る拡散層を生成させるには、更に加
熱処理が必要か否かは各めつき方法、めつき条件におい
て検討し選択されねばならず、一様に上層めつき層が0
.5仏以下は更に熱処理を要しないと決めることはでき
ない。錫或いは錫含有合金の融点以下の温度の熱処理条
件としては、例えば上層めつき層厚に大きく影響される
が、温度は150℃〜融点以下が実際的である。加熱雰
囲気は非酸化性であることが好ましいが、大気下の加熱
も勿論可能である。大気下で加熱した場合は表面に酸化
物が生成するが加熱処理後5〜1びol%の硫酸水溶液
で洗浄すれば容易に酸化物の皮膜は除去することができ
、何ら支障とはならない。これらの熱処理により実質的
に錫−銅より成る拡散層を外層として生成させた材料の
表面は極めて硬くなり、ばね用りん青銅母村のピッカー
ス硬さが260以下であるのに対し熱処理後の表面は3
50〜450にもなり、耐摩耗性にも優れている。However, the thermal conditions for hot melt plating and heat melting are not determined for the purpose of generating intermetallic compounds. Thermal conditions are determined for the purpose of producing gloss, so whether or not further heat treatment is necessary to generate the diffusion layer consisting essentially of tin and copper, which is the object of the present invention, is a matter of individual concern. The plating method and plating conditions must be considered and selected, and the upper plating layer must be uniformly 0.
.. It cannot be determined that further heat treatment is not required if the temperature is less than 5 degrees. The heat treatment conditions at a temperature below the melting point of tin or a tin-containing alloy are largely influenced by, for example, the thickness of the upper plating layer, but a practical temperature range is from 150° C. to below the melting point. Although it is preferable that the heating atmosphere be non-oxidizing, heating in the atmosphere is of course possible. When heated in the atmosphere, oxides are formed on the surface, but the oxide film can be easily removed by washing with a 5 to 1 vol% sulfuric acid aqueous solution after the heat treatment, and does not pose any problem. Through these heat treatments, the surface of the material in which a diffusion layer consisting essentially of tin and copper is formed as an outer layer becomes extremely hard.While the Pickers hardness of phosphor bronze matrix for springs is 260 or less, is 3
50 to 450, and has excellent abrasion resistance.
本発明の材料は務点材料としての要求特性である薮雛抵
抗値は3〜6のQであり、錫めつきの後融抵抗値が同一
試験法で3mQであるのと比較すると若干高くはなって
いるが、実用上の問題はない。又摺動が行なわれる用途
分野においても、表面が極めて硬いことから摺動時にお
ける俵融低抗値は安定しており、従ってノイズの発生が
少ない利点を有している。以下に実施例を述べる。The material of the present invention has a bush resistance value of 3 to 6 Q, which is a required property as a service material, which is slightly higher than the after-melting resistance value of tin plating, which is 3 mQ in the same test method. However, there are no practical problems. Furthermore, even in application fields where sliding occurs, since the surface is extremely hard, the bale melting resistance value is stable during sliding, and therefore has the advantage of generating less noise. Examples will be described below.
実施例 1
ばね用りん青銅条をアルカリ脱脂、電解脱脂、そして酸
洗中和後、硫酸錫格で0.5ぷの錫めつきを行なった。Example 1 A phosphor bronze strip for a spring was subjected to alkaline degreasing, electrolytic degreasing, pickling and neutralization, and then tin plating with a tin sulfate rating of 0.5 pu.
硫酸錫格ならびにめつき条件は下記の通りである。硫酸
錫裕 硫酸第1錫 72夕/そ
硫 酸 100夕/そ
浴 温 30o0
電流密度 3A/dの
こうして錫めつきされた条をバーナ直火型加熱炉におい
て600℃に5秒間保持した後、水袷、温風乾燥した。The tin sulfate rating and plating conditions are as follows. After holding the thus tinned strip at 600° C. for 5 seconds in a burner direct-fired heating furnace, The water linen was dried with warm air.
この条をX線回析で調べたところ、微かな8−錫と大部
分がC比Sn5から成る表面状態であることが確認され
た。この条の接融抵抗値は3肌○であった。次にこの条
から1仇吻×1仇咳の大きさの片を切り出し2枚重ねて
lk9/秘の援融圧を負荷し30日保持したがコールド
ウヱルディングは起こらなかつた。実施例 2
実施例1と同条件でめつきし(但しめつき厚は1.5〃
)加熱溶融した錫めつき条を160『0で2独特間アル
ゴン雰囲気中で加熱した。When this strip was examined by X-ray diffraction, it was confirmed that the surface state consisted of a faint amount of 8-tin and a large portion of C ratio Sn5. The welding resistance value of this strip was 3 skins. Next, a piece with the size of 1 x 1 x 1 inch was cut out from this strip, two pieces were stacked together, and LK9/secret melting pressure was applied and kept for 30 days, but no cold welding occurred. Example 2 Plated under the same conditions as Example 1 (however, the plating thickness was 1.5 mm)
) The molten tin-plated strip was heated in an argon atmosphere at 160°C for 2 hours.
この条はX線回折で8−錫は認められず、接触低抗は5
.5肌○であった。また、実施例1と同条件で行なった
試験ではコールドウェルディングは起こらなかった。実
施例 3亜鉛35%を含有する黄鋼条をアルカリ脱脂、
電解脱脂そして酸洗中和後、硫酸錫格で0.5仏の銅下
地めつきを行ない、実施例1と同条件で錫めつきを1.
5山施した条を15000で4潮時間アルゴン雰囲気中
で加熱した。No 8-tin was detected in this strip by X-ray diffraction, and the contact resistance was 5.
.. 5 skin was ○. Further, in the test conducted under the same conditions as in Example 1, no cold welding occurred. Example 3 Yellow steel strip containing 35% zinc was degreased with alkali.
After electrolytic degreasing and acid wash neutralization, copper underplating was carried out with tin sulfuric acid rating of 0.5 French, and tin plating was carried out under the same conditions as in Example 1.
The five coated strips were heated at 15,000 for 4 hours in an argon atmosphere.
この条をX線回折で調べたが3−錫は認められず、接触
低抗は5.6の○であった。This strip was examined by X-ray diffraction, but no 3-tin was detected, and the contact resistance was 5.6 (○).
また、実施例1と同条件で行なった試験ではコールドウ
ェルデイングは起こらなかった。Further, in the test conducted under the same conditions as in Example 1, no cold welding occurred.
Claims (1)
ールドウエルデイングを起こさない接点材料用銅合金。 2 銅合金に錫或いは錫含有合金をめつきを施した後、
加熱溶融および/又はめつき材の溶融点以下の温度で加
熱し、実質的に錫・銅化合物より成る拡散層を外層に生
成させたコールドウエルデイングを起こさない接点材料
用銅合金の製造法。[Claims] 1. A copper alloy for contact materials that does not cause cold welding and has a diffusion layer made of a tin-copper compound as an outer layer. 2 After plating copper alloy with tin or tin-containing alloy,
A method for producing a copper alloy for contact materials that does not cause cold welding by heating at a temperature below the melting point of the melting and/or plating material to generate a diffusion layer substantially consisting of a tin-copper compound in the outer layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5951480A JPS604266B2 (en) | 1980-05-07 | 1980-05-07 | Copper alloy for contact materials and its manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5951480A JPS604266B2 (en) | 1980-05-07 | 1980-05-07 | Copper alloy for contact materials and its manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56156769A JPS56156769A (en) | 1981-12-03 |
JPS604266B2 true JPS604266B2 (en) | 1985-02-02 |
Family
ID=13115439
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5951480A Expired JPS604266B2 (en) | 1980-05-07 | 1980-05-07 | Copper alloy for contact materials and its manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS604266B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS595583A (en) * | 1982-06-30 | 1984-01-12 | 田中貴金属工業株式会社 | Contact piece material for commutator |
JPS6417344A (en) * | 1987-07-10 | 1989-01-20 | Toshiba Corp | Contact for vacuum valve and its manufacture |
JP2647656B2 (en) * | 1987-07-24 | 1997-08-27 | 日鉱金属株式会社 | Method of manufacturing contacts |
JP2647657B2 (en) * | 1987-07-24 | 1997-08-27 | 日鉱金属株式会社 | Method of manufacturing contacts |
-
1980
- 1980-05-07 JP JP5951480A patent/JPS604266B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS56156769A (en) | 1981-12-03 |
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