JPS6036638A - Copper alloy - Google Patents

Copper alloy

Info

Publication number
JPS6036638A
JPS6036638A JP14432883A JP14432883A JPS6036638A JP S6036638 A JPS6036638 A JP S6036638A JP 14432883 A JP14432883 A JP 14432883A JP 14432883 A JP14432883 A JP 14432883A JP S6036638 A JPS6036638 A JP S6036638A
Authority
JP
Japan
Prior art keywords
weight
copper alloy
copper
alloy
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14432883A
Other languages
Japanese (ja)
Inventor
Ikuo Okamoto
岡本 郁男
Tadashi Takemoto
正 竹本
Shinichi Tonai
伸一 藤内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON GENMA KK
Nihon Genma KK
Original Assignee
NIPPON GENMA KK
Nihon Genma KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON GENMA KK, Nihon Genma KK filed Critical NIPPON GENMA KK
Priority to JP14432883A priority Critical patent/JPS6036638A/en
Publication of JPS6036638A publication Critical patent/JPS6036638A/en
Pending legal-status Critical Current

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  • Conductive Materials (AREA)

Abstract

PURPOSE:To obtain a Cu alloy having superior solderability and enduring well an environment by adding specified amounts of Ti and Cu. CONSTITUTION:This Cu alloy contains 0.01-15wt% Ti and 20-99.99wt% Cu, has high solderability, and endures well an environment. In case of <0.01% Ti, the effects are not produced, and >15% Ti is uneconomical. It is preferable that Ti is contained by 0.01-5.6%, especially 0.01-4.0%, more especially 0.01-3.0%. The Cu alloy can be used in the form of a supersatd. solid soln. or a solid soln. The Cu alloy contains 0-7% Fe, 0-10% Sn and 0-5% Pb, 0-5% Mn, 0-5% Be, 0-8% P and 0-1% As, or 0-0.5% C, 0-5% Co, 0-3% Cr and 0-3% Ag.

Description

【発明の詳細な説明】 本発明は良好なはんだ付(J性を有する銅合金に関する
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a copper alloy having good solderability (J properties).

銅合金は、イの良好なはんだ付U性、および導電性の故
に電子F業を中心に多種多様の用途(例えば電子部品に
おいては、リード線、プリント基盤、あるいはペースト
)に応用されている。
Copper alloys have good solderability and conductivity, so they are used in a wide variety of applications, mainly in the electronics industry (for example, in electronic parts, as lead wires, printed circuit boards, and pastes).

しかしながら、多くの銅合金は保存中に、人気中の02
.1」201SO×、CO2,1」CI!、、NOX、
l−12s等と銅合金表面が反応し、酸化物を形成しは
んだ付(プが困難になる。
However, during storage, many copper alloys are
.. 1”201SO×,CO2,1”CI! ,,NOX,
The surface of the copper alloy reacts with l-12s, etc., forming oxides that make soldering difficult.

従来、この難点を解消するために銅合金の表面に錫メッ
キ、銀メッキ、はんだメッキ等の表面処理が施され耐環
境性の向上が図られているが、このように表面処理を施
ずには、それだ(プのT稈を要し、さらにはんだ付は性
を向上させるためには高価な銀を多量に必要とし、経済
的に好ましくない。
Conventionally, in order to solve this problem, surface treatments such as tin plating, silver plating, and solder plating have been applied to the surface of copper alloys to improve their environmental resistance. (It requires a T-shaped culm, and soldering requires a large amount of expensive silver to improve soldering properties, making it economically unfavorable.)

本発明省らは、銅合金のはんだ付は付を向上させ、あわ
せて耐環境性の向上のために鋭意研究の結果、本発明を
成づ−に到った。
The Ministry of the Invention and others have completed the present invention as a result of intensive research to improve soldering of copper alloys and to improve environmental resistance.

即ち、本発明は、Tiを0.01重量%〜15重填%含
有する良好なはんだ付り性を有する銅合金に関する。
That is, the present invention relates to a copper alloy containing 0.01% to 15% by weight of Ti and having good solderability.

本発明の銅合金はrlを0.01〜15重量%含めばよ
い。−[i含有量が0.01重量%未満では、T1の効
果が現われない。15重量%を越えるとTiの効果【よ
あるものの、得られるメリットが少ない割に費用がかか
り好ましくない。好ましくはTiの含有量は0 、01
重量%〜5.6小量%である。よりりfましくは、Ti
を0.011ス−1ム4.0Φ量%未満含有する。この
範囲内であれば均一な固溶体を作る温度範囲が広く、容
易に製造できる。最も好ましくは0.01重量%〜3.
0重量%である。3.0ffiffi%以下では溶体化
処理温度が低く、非常に容易に均一な固溶体が得られる
。Cuに対するT1の固溶限(5,6単量%、885℃
)を越λてl−iを添加したものは、TiC113また
はTi2Cu?で表現されるTiの金属間化合物が存在
覆る。この化合物自体は、はんだのぬれ111を害す−
るので、5.6%以上のTiを含む銅合金は71へリッ
クス固溶体のぬれ性は純銅J、り侵れているものの、T
iの増加に従って、金属u11重合化/バ多くなり、ぬ
れf’lをイル″Fさせるため、均一固溶体と比較して
はんだ付は性は低下してくる。一般に、添加元素の固溶
限は低温で減少覆るので、常温にお(Jる固溶限を越え
るTiを含む銅合金は、合金の製造■)に、溶体化処理
を行なうことによりT + Cu 3等の金属1B1化
合物の生成を防ぎ、良好なはんだ(1’ t−J性を確
保する。
The copper alloy of the present invention may contain 0.01 to 15% by weight of rl. - [When the i content is less than 0.01% by weight, the effect of T1 does not appear. If the amount exceeds 15% by weight, although the effect of Ti is good, it is undesirable because it is expensive and the benefits are small. Preferably the Ti content is 0.01
% by weight to 5.6% by weight. More preferably, Ti
Contains less than 0.011 sum-1 4.0Φ mass%. Within this range, the temperature range for forming a uniform solid solution is wide, and production is easy. Most preferably 0.01% by weight to 3.
It is 0% by weight. When the content is 3.0ffiffi% or less, the solution treatment temperature is low and a uniform solid solution can be obtained very easily. Solid solubility limit of T1 in Cu (5.6% monomer, 885°C
) with the addition of l-i, TiC113 or Ti2Cu? There exists an intermetallic compound of Ti expressed as . This compound itself impairs solder wetting 111-
Therefore, the wettability of the 71-helix solid solution for copper alloys containing 5.6% or more of Ti is that of pure copper J, although it is eroded by T.
As i increases, metal u11 polymerization/ba increases, causing wetting f'l to become il'F, resulting in a decrease in solderability compared to a homogeneous solid solution.In general, the solid solubility limit of an additive element is Since it decreases at low temperatures, it is possible to prevent the formation of metal 1B1 compounds such as T + Cu 3 by performing solution treatment at room temperature (for copper alloys containing Ti exceeding the solid solubility limit, manufacture the alloy). prevent and ensure good soldering (1't-J properties).

本発明銅合金は過飽和固溶体、または固溶体等の状態で
使用することができ、またいかなる組織状態で使用して
もよい。即ち、いかなる履歴を経l〔、いかなるII織
状態で用いてもよい。銅合金にTiを含有させて良好な
はんだ付は性を得ることの理由は限定的ではないが、T
iを含む銅合金では、酸化物の生成速度が小さいこと、
酸化物の母材に対ケる密着性が悪く、クラックを多く含
んでいること、酸化物が他の銅合金の酸化物より7ラツ
クス作用を受【)易いことがあげられる。これらのこと
により、TIを含む銅合金をはんだ付けする場合、はん
だ何時の熱膨張により母材の密着性の悪い酸化物層が剥
離し、残った薄い酸化膜もフ5− ラックスによりたやすく除人されて、母材とはんだのぬ
れがjJみ15かに起こるためと解される。
The copper alloy of the present invention can be used in the form of a supersaturated solid solution or a solid solution, and may be used in any structural state. In other words, any history may be used in any type of history and any type of texture may be used. The reason why good solderability is obtained by including Ti in a copper alloy is not limited, but T
In copper alloys containing i, the rate of oxide formation is low;
The adhesion of the oxide to the base material is poor, it contains many cracks, and the oxide is more susceptible to the 7 lux action than the oxides of other copper alloys. Due to these factors, when soldering copper alloys containing TI, the oxide layer with poor adhesion to the base material peels off due to thermal expansion of the solder, and the remaining thin oxide film is easily removed by flux. This is understood to be due to the fact that wetting between the base material and the solder occurs every 15 minutes.

本発明の効果は、表面に銅との酸化物を形成するずべ(
の銅合金に適応りることができる。即ち、種々の金属が
含まれる銅合金中に、王1がo、01〜15重(B%含
有1J−ればJ、い。本発明に用いる銅合金の例どして
は、Niを0〜70重量%、7nを0〜50 m m%
、AJl(!−o〜15重量%含有する銅合金であって
もよい。またFeを0〜7重ω%、S n ヲ0 ” 
10 F? ljt %、Pbを0〜5重(至)%含有
する銅合金であってもよい。更に、Mnを0〜5重量%
、3eを0〜5重量%、P@o〜8巾吊%、ASを0〜
1重け%含有する銅合金に適応してもよい。その他、C
を0〜0.5重量%、COをO〜5重借%、CrをO〜
3重fi%、AgをO〜3重間%含有り−る銅合金ある
いは酸素を0〜0.5重1%、Sを(’) 〜0,2重
量%、B1を0〜0.311%、CdをO〜0.3重量
%、ZrをO〜1重徂%含有する銅合金に適応すること
もできる。またsbを0〜1重量%、Teを06一 ・〜2重量%、Caを0〜1重量%、MgをO〜1千ω
%、1−1をO〜1重h)%、含有づる銅合金であつ’
C4vよい。これらの合金中に不純物どして、F記元素
以外のものを総計で1重量%J:で含むことも可能であ
る、1 本発明銅合金の製造方法は、いか4Tる方法を用いても
よい。例えば、真空溶解する方法を用いてもよい。
The effect of the present invention is that oxides with copper are formed on the surface (
Can be applied to copper alloys. That is, in a copper alloy containing various metals, Ni is 0,01 to 15% (B% content is 1J-1, J is 1,000%). ~70 wt%, 7n 0~50 mm%
, AJl (!-o ~ 15% by weight) may be used.Also, it may be a copper alloy containing 0 to 7% by weight of Fe, S n wo 0''
10 F? It may be a copper alloy containing Pb in an amount of 0 to 5% by weight. Furthermore, 0 to 5% by weight of Mn
, 3e 0~5% by weight, P@o~8 width hanging%, AS 0~5% by weight
It may also be applied to copper alloys containing 1% by weight. Other, C
0 to 0.5% by weight, CO to 5% by weight, Cr to O to 5% by weight
Copper alloy containing 0 to 3 weight% Ag or 0 to 0.5 weight 1% oxygen, (') to 0.2 weight % S, and 0 to 0.311 weight % B1. %, Cd in an amount of O to 0.3% by weight, and Zr in an amount of O to 1% by weight. In addition, sb is 0 to 1% by weight, Te is 06-2% by weight, Ca is 0 to 1% by weight, and Mg is O to 1,000Ω.
%, 1-1 to O~1%, copper alloy containing
C4v is good. It is also possible for these alloys to contain impurities other than the F elements in a total amount of 1% by weight. good. For example, a method of vacuum melting may be used.

本発明鋼合金に使用づるフラックスは通常用いられるい
かなるものを用いてもよい。例えば、塩素系またはり1
素系フラツクスがあげられる。
The flux used in the steel alloy of the present invention may be any commonly used flux. For example, chlorine-based or
Examples include elementary fluxes.

本発明銅合金は優れたはんだぬれ性を有し、耐環境f[
−6優れでいる。本発明銅合金を銅線、銅版あるいは銅
箔等に用いることによりはんだ付けをより容易に行なう
ことができる。またメッキの下地合金に用いた場合にも
、下地金属が酸化等の腐食を受(jることにより変質さ
れることが少なく、優れた(よんだ刊41性を保持づる
ために、メッキ厚を’JIJ <−dることができ、メ
ッキ材の節約につながる。また本発明銅合金を粉末とし
て銅ペーストと(ノて用いた場合にし良好なはんlごイ
ー1け性が期待できる。
The copper alloy of the present invention has excellent solderability and environmental resistance f[
-6 Excellent. By using the copper alloy of the present invention for copper wire, copper plate, copper foil, etc., soldering can be performed more easily. In addition, when used as a base alloy for plating, the base metal is less likely to undergo deterioration due to corrosion such as oxidation, and in order to maintain excellent properties, the plating thickness must be increased. 'JIJ <-d, which leads to savings in plating materials.Furthermore, when the copper alloy of the present invention is used as a powder with copper paste, good solderability can be expected.

以下、本発明を実施例にj、り詳細に説明りる。Hereinafter, the present invention will be explained in detail using examples.

火茄」」− −11の種々の含量を有りる銅合金のぬれ時間を測定し
た。結果を第′1図に示す。比較のため純銅のぬれ時間
を点線て゛示’J’ +1 測定方法;銅合金を、250℃で溶融したはんだ浴に一
定の速fff (4mm/sec ) テ挿入シ、ハン
だと銅合金の接触面が溶融はんだ表面と同じ高さになる
まぐの[,1間を測定1)だ。
The wetting times of copper alloys with various contents of ``Hiobo''--11 were measured. The results are shown in Figure '1. For comparison, the wetting time of pure copper is shown by the dotted line 'J' +1 Measuring method: A copper alloy is inserted into a solder bath melted at 250°C at a constant speed fff (4 mm/sec), and the copper alloy comes into contact with the hammer. The surface of the pin is at the same height as the surface of the molten solder (measured between 1 and 1).

■に入 純銅、T1を0./1重量%含有する銅合金、−1−1
を1申出%含有する銅合金およびT1を5重量%含イj
づ−る銅合金を種々の温度で1時間酸化処Tu! L、
た後のぬれ時間を調べlζ。結果を第2図に示づ。
■Pure copper, T1 0. Copper alloy containing /1% by weight, -1-1
Copper alloy containing 1% by weight of T1 and 5% by weight of T1
Tu! copper alloys were oxidized for 1 hour at various temperatures. L,
Check the wetting time after washing. The results are shown in Figure 2.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はTiの種々の含量を有Jる銅合金のぬれ時間を
示J−グラフ、第2図は純銅、T iをO4/1Φω%
含有4る銅合金、Tiを1小ω%含有する銅合金および
王iを5重量%含右りる銅合金を種々の高度で1時間酸
化処理した後のぬれ時間を示ηグラノぐある。 第1図中、(1)は純銅のぬれ時間、(2)は本発明銅
合金のぬれ時間を表ねり。 −〇−
Figure 1 is a J-graph showing the wetting time of copper alloys with various contents of Ti, Figure 2 is pure copper, Ti is O4/1Φω%.
The graph shows the wetting time after oxidizing a copper alloy containing 4% Ti, a copper alloy containing 1% by weight of Ti, and a copper alloy containing 5% by weight of Ti at various levels for 1 hour. In FIG. 1, (1) represents the wetting time of pure copper, and (2) represents the wetting time of the copper alloy of the present invention. −〇−

Claims (1)

【特許請求の範囲】 1、Tiを0.01重量%〜15重量%および銅を20
〜99.99%含有する良好なはんだ付(j性を有する
銅合金。 2、 T1を0.01重量%〜5.6重量%含有する第
1項記載の銅合金。 3、Ti を0.01Φ量%以上、4.0小樽%未満含
有する第1項記載の銅合金。 4、 銅合金が過飽和固溶体または固溶体である第1項
記載の銅合金。 5、Tiを0.01〜3重量%含有する第1項記載の銅
合金。 6、銅合金がN1を0〜70重量%、ZnをO〜50重
巖%、A乏をO〜15車量%含有する第1項〜5項いず
れかに記載の銅合金。 7、 銅合金がFeを0〜7重量%、Snを0〜10重
量%、pbを0〜5重量%含有する第1〜j5項いずれ
かに記載の銅合金。 8、 銅合金がMnを0〜5重帛%、Beを0〜5重量
%、1つを0〜8重量%、Asを0〜1重量%以下含有
する第1〜5項いずれかに記載の銅合金。 9、 銅合金がCをO〜0.5重量%、Coを0〜5重
量%、CrをO〜3fi1%、A(lを0〜3重量%含
有する第1〜5項いずれかに記載の銅合金。 10、銅合金が酸素をO〜0.5重量%、SをO〜0.
2Φ伍%、BiをO〜0.3重量%、CdをO〜0.3
重量%、Zrを0〜1重量%含有する第1〜5項いずれ
かに記載の銅合金。 11、 銅合金がS bをO〜1重隋%、Teを0〜2
重量%、Caを0〜1重量%、MOをO〜1重呈%、l
iをOへ・1重量%含有する第1〜5項いずれかに記載
の銅合金。
[Claims] 1. 0.01% to 15% by weight of Ti and 20% by weight of copper
2. Copper alloy according to item 1 containing 0.01% to 5.6% by weight of T1. 3. Copper alloy with 0.01% to 5.6% by weight of Ti. 4. The copper alloy according to item 1, wherein the copper alloy is a supersaturated solid solution or a solid solution. 5. Ti in an amount of 0.01 to 3% by weight. 6. Items 1 to 5, wherein the copper alloy contains 0 to 70% by weight of N1, O to 50% by weight of Zn, and O to 15% by weight of A-poor. 7. The copper alloy according to any one of items 1 to j5, wherein the copper alloy contains 0 to 7% by weight of Fe, 0 to 10% by weight of Sn, and 0 to 5% by weight of PB. 8. Any one of Items 1 to 5 in which the copper alloy contains 0 to 5% by weight of Mn, 0 to 5% by weight of Be, 0 to 8% by weight of one, and 0 to 1% by weight of As. Copper alloy as described. The copper alloy according to any one of Items 10. The copper alloy contains oxygen in an amount of O to 0.5% by weight and S in an amount of O to 0.5% by weight.
2Φ5%, Bi O~0.3% by weight, Cd O~0.3
The copper alloy according to any one of Items 1 to 5, containing Zr in an amount of 0 to 1% by weight. 11. The copper alloy contains Sb at 0~1% and Te at 0~2%.
% by weight, 0 to 1% by weight of Ca, 0 to 1% by weight of MO, l
The copper alloy according to any one of items 1 to 5, containing 1% by weight of i to O.
JP14432883A 1983-08-06 1983-08-06 Copper alloy Pending JPS6036638A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14432883A JPS6036638A (en) 1983-08-06 1983-08-06 Copper alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14432883A JPS6036638A (en) 1983-08-06 1983-08-06 Copper alloy

Publications (1)

Publication Number Publication Date
JPS6036638A true JPS6036638A (en) 1985-02-25

Family

ID=15359548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14432883A Pending JPS6036638A (en) 1983-08-06 1983-08-06 Copper alloy

Country Status (1)

Country Link
JP (1) JPS6036638A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60218440A (en) * 1984-04-13 1985-11-01 Furukawa Electric Co Ltd:The Copper alloy for lead frame
WO2007015549A1 (en) * 2005-08-03 2007-02-08 Nippon Mining & Metals Co., Ltd. High strength copper alloy for electronic parts and electronic parts
CN100343403C (en) * 2005-08-08 2007-10-17 河南科技大学 Rare earth copper alloy and its preparation method
US7351372B2 (en) * 2003-01-22 2008-04-01 Dowa Mining Co., Ltd. Copper base alloy and method for producing same
US20120027638A1 (en) * 2009-04-24 2012-02-02 San-Etsu Metals Co., Ltd. High-strength copper alloy
WO2013111143A1 (en) * 2012-01-24 2013-08-01 G D Abdhool Rahim Alloy containing precious metals and its method of preparation by using herbal extracts
CN104616827A (en) * 2015-01-09 2015-05-13 芜湖航天特种电缆厂 Oxidation-resistant conductor for cable as well as preparation method and application of such conductor
CN105033498A (en) * 2015-07-21 2015-11-11 安徽江威精密制造有限公司 Solder composition and preparation method for solder
JP2015199115A (en) * 2014-04-10 2015-11-12 住友金属鉱山株式会社 Copper alloy for solder joint
US20160336086A1 (en) * 2014-08-08 2016-11-17 Sumitomo Electric Industries, Ltd. Copper alloy wire, copper alloy stranded wire, covered electric wire, and terminal-fitted electric wire

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60218440A (en) * 1984-04-13 1985-11-01 Furukawa Electric Co Ltd:The Copper alloy for lead frame
US7351372B2 (en) * 2003-01-22 2008-04-01 Dowa Mining Co., Ltd. Copper base alloy and method for producing same
WO2007015549A1 (en) * 2005-08-03 2007-02-08 Nippon Mining & Metals Co., Ltd. High strength copper alloy for electronic parts and electronic parts
CN100343403C (en) * 2005-08-08 2007-10-17 河南科技大学 Rare earth copper alloy and its preparation method
US20120027638A1 (en) * 2009-04-24 2012-02-02 San-Etsu Metals Co., Ltd. High-strength copper alloy
WO2013111143A1 (en) * 2012-01-24 2013-08-01 G D Abdhool Rahim Alloy containing precious metals and its method of preparation by using herbal extracts
JP2015199115A (en) * 2014-04-10 2015-11-12 住友金属鉱山株式会社 Copper alloy for solder joint
US20160336086A1 (en) * 2014-08-08 2016-11-17 Sumitomo Electric Industries, Ltd. Copper alloy wire, copper alloy stranded wire, covered electric wire, and terminal-fitted electric wire
US10128018B2 (en) * 2014-08-08 2018-11-13 Sumitomo Electric Industries, Ltd. Copper alloy wire, copper alloy stranded wire, covered electric wire, and terminal-fitted electric wire
CN104616827A (en) * 2015-01-09 2015-05-13 芜湖航天特种电缆厂 Oxidation-resistant conductor for cable as well as preparation method and application of such conductor
CN105033498A (en) * 2015-07-21 2015-11-11 安徽江威精密制造有限公司 Solder composition and preparation method for solder
CN105033498B (en) * 2015-07-21 2017-12-05 重庆市巴南区环美金属加工厂 The preparation method of solder composition and solder

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