JPS6030927B2 - electrochromic display device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention is directed to a transparent conductive film laminated on a transparent glass substrate and an interface between a pattern portion of an electrochromic (hereinafter abbreviated as EC) material and an insulating film other than the pattern portion. The purpose is to form an insulating film so that the insulating films are formed continuously without overlapping.

In the prior art, as shown in FIG.
Three structures A, B, and C have been considered to prevent direct contact between the capacitor and the electrolytic solution (not shown in the figure).

In Figure A, a transparent conductive film 2 such as ln203 or SN02 is patterned on a transparent glass substrate 1, and W0
3. The EC substance 3 such as MOO3 is patterned to be one size larger than the transparent conductive film 2, and in figure B, the transparent conductive film 2
and EC material 3 are formed in the same pattern. Furthermore, in Figure C, the EC material 3 is patterned to be one size smaller than the transparent conductive film 2. Next, to explain the drawbacks of these conventional structures using FIG. 2, in the case of the structure shown in FIG. However, as the coloring and decoloring are repeated, the portion 8 of the EC material that protrudes from the transparent conductive film gradually remains in a colored state as a border around the outer periphery of the pattern.
There was a drawback in that reversible coloring and decoloring phenomena depending on the applied voltage did not occur.

Furthermore, in the structures shown in Figures E and F, the coloring is different depending on the part 11 that is covered with the insulating film 10 and the part 9 that is not covered with the EC material, and the inside of the pattern is The disadvantage was that uneven coloring occurred. In order to eliminate the uneven coloring of EC substances in the colored state, which was a problem with these conventional techniques, the present invention
The present invention provides a method for forming an insulating film in such a manner that a pattern boundary surface of an EC material and a boundary surface of an insulating film outside the pattern are formed continuously without overlapping.

Example 1 FIG. 3 shows a case where the EC material is patterned to be one size smaller than the transparent conductive film.

First, a transparent conductive film 18 is formed in a pattern on a transparent glass substrate 17 by etching or mask vapor deposition, and an EC material 19 is formed on the entire surface.

Thereafter, an etching resist 20 is applied on the EC material in a pattern one size smaller than the transparent conductive film 18, and the EC material 19 is etched to form a stack of the transparent conductive film and the EC material, with the etching resist remaining. Then, the insulating film 21 on the pattern is removed by the same operation as in Example 1. According to the method of Example 1, the EC material in the pattern part and the insulating film outside the pattern are formed continuously without overlapping, which eliminates the problem of EC material in the prior art.
It is possible to completely prevent uneven coloring at material boundaries, and in addition, it is also possible to prevent current leakage between the transparent conductive film and the electrolyte.

As described above, according to the present invention, the separation between the transparent conductive film and the electrolyte is guaranteed, and the uneven coloring on the EC material at the time of coloring can be completely solved, and the etching resist that is first patterned on top of it can be insulated. Since it can be used as a mask during film coating, it becomes possible to form an insulating film with a precision that is incomparable to mask vapor deposition.

[Brief explanation of drawings]

FIGS. 1A, B, and C are configuration diagrams showing conventional structures, respectively, and FIG. 2 is an explanatory diagram illustrating details of the conventional structure. FIG. 3 is a diagram showing an embodiment according to the structure of the present invention. 17...Transparent glass substrate, 18...Transparent conductive film, 19...EC
Substance, 20...Etching resist, 21...
...Insulating film. Sai” box rice 2 illustrations spear 3 illustrations

Claims (1)

[Claims] 1. A transparent conductive film formed and patterned on the surface of a transparent glass substrate, an electrochromic material formed and patterned on the surface of the transparent conductive film, and the entire surface excluding the pattern of the electrochromic material. In an electrochromic display device having an insulating film formed thereon, the electrochromic material is patterned to be one size smaller than the transparent conductive film, and the insulating film overlaps with the electrochromic material. An electrochromic display device characterized in that the transparent conductive film is formed so as not to cause the transparent conductive film to be exposed.