JPS6029749A - Photoresist developing device - Google Patents
Photoresist developing deviceInfo
- Publication number
- JPS6029749A JPS6029749A JP13825883A JP13825883A JPS6029749A JP S6029749 A JPS6029749 A JP S6029749A JP 13825883 A JP13825883 A JP 13825883A JP 13825883 A JP13825883 A JP 13825883A JP S6029749 A JPS6029749 A JP S6029749A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- developer supply
- photoresist
- developer
- soln
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
（１）発明の技術分野
本発明はフォトレジスト現像装置の改良に関する。特に
被現像ウェーＩ＼のすべての領域におし１て、均一に現
像をなすことを可能にするフォトレジスト現像装置に関
する。DETAILED DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention The present invention relates to improvements in photoresist developing apparatus. In particular, the present invention relates to a photoresist developing device that can uniformly develop all areas of a wafer I\ to be developed.
（２）技術の背景と従来技術の問題点
フォトレジストを現像する方法には、フォトレジスト膜
を表面に有する板状体（ウェーハという。）を現像液に
浸漬する方法と、フォトレジスト膜を表面に有するウェ
ーハを水平面内に回転しながら支持しておき、回転中心
付近に現像液を流下させ、遠心力をもって現像液をウェ
ーハ外周に向って流しながら現像をなす方法とが知られ
ている。前者においては、複数のウェーハを現像してい
る間に次第に現像液の組成・濃度が変化し、単一のバッ
チ処理工程においても工程の初期と終期とにおいては現
像特性に大きな差が発生する欠点がある。後者は、この
欠点を解消するために開発された方法であるが、フレッ
シュな現像液と接触するウェーハ中心部とスチールな現
像液と接触するウェーハ外周とでは当然現像特性に差が
発生することは避は難く、特にウェーハ径が大きくなる
とともにその欠点は看過し難いものとなり、大口径のウ
ェーハに対してもそのすべての領域において均一な現像
特性が得られるフォトレジスト現像装置の開発が望まれ
ていた。(2) Background of the technology and problems with the conventional technology There are two methods for developing photoresists: immersing a plate-shaped body (referred to as a wafer) with a photoresist film on the surface in a developer solution; A known method is to rotate and support a wafer in a horizontal plane, to cause a developer to flow down near the center of rotation, and to perform development by flowing the developer toward the outer periphery of the wafer using centrifugal force. The disadvantage of the former is that the composition and concentration of the developer gradually changes while multiple wafers are being developed, resulting in large differences in development characteristics between the beginning and end of the process even in a single batch process. There is. The latter method was developed to overcome this drawback, but it is natural that there will be a difference in development characteristics between the center of the wafer, which comes into contact with fresh developer, and the outer periphery of the wafer, which comes into contact with steel developer. This is unavoidable, and especially as the wafer diameter increases, its drawbacks become more difficult to overlook.Therefore, it is desired to develop a photoresist developing device that can provide uniform development characteristics in all areas even for large-diameter wafers. Ta.
（４）発明の目的
本発明の目的はこの要請にこたえることにあり、被現像
ウェーへのすべての領域において均一に現像をなすこと
を可能にするフォトレジスト現像装置を提供することに
ある。(4) Purpose of the Invention The purpose of the present invention is to meet this demand, and to provide a photoresist developing apparatus that enables uniform development in all areas of the wafer to be developed.
（５）発明の構成
本発明の構成は、被現像フォトレジスト膜を表面に有す
る板状体の前記フォトレジスト膜の表面を水平面内に回
転しながら支持する支持回転手段と、前記フォトレジス
ト膜の表面にフォトレジスト現像液を流下する現像液供
給手段とを有するフォトレジスト現像装置において、前
記現像液供給手段は複数の現像液供給口を有し該現像液
供給口のそれぞれは前記支持回転手段の回転中心から異
なった距離の点に配設されてなることを特徴とするフォ
トレジスト現像装置にある。(5) Structure of the Invention The structure of the present invention includes a support rotation means for rotating and supporting the surface of the photoresist film of a plate-shaped body having a photoresist film to be developed on the surface thereof in a horizontal plane; In a photoresist developing apparatus, the developer supply means has a plurality of developer supply ports, and each of the developer supply ports is connected to the support rotation means. The photoresist developing device is characterized in that the photoresist developing device is disposed at different distances from the center of rotation.
本発明は現像液供給口を複数個設け、回転中心に対して
これらを分散配設してウェーハの全面に、おおむね同一
の組成参濃度の現像液が接触しうるようになし、ウェー
ハの全領域において均一な現像特性が確保されるように
したものである。In the present invention, a plurality of developer supply ports are provided and these are distributed around the center of rotation so that a developer having approximately the same composition and concentration can come into contact with the entire surface of the wafer. This ensures uniform development characteristics.
（６）発明の実施例
以下図面を参照しつつ、本発明の実施例に係るフォトレ
ジスト現像装置について説明する。(6) Embodiments of the Invention A photoresist developing apparatus according to an embodiment of the invention will be described below with reference to the drawings.
第１図参照
図において、２は直径が３５５■■で厚さが６■層のウ
ェーハ１を支持回転させる支持回転手段であり、真空チ
ャック等でウェーハｌを水平に支持するとともにモータ
３によって垂直軸を回転中心３゛として １２０ ｒｐ
■をもって回転される。４は現像液供給手段であり、図
においては３個の現像液供給口５．５°、５°°を有し
、これらの現像液供給口５．５°、５゛°は回転中心３
°からそれぞれ異なった距離の点に開口する。すなわち
、回転中心３°から、それぞれ、 ２０ｍ５＋、 ８Ｇ
鵬園、 １４０■腸離れた点に開口する。上記の装置が
ドレイン７を有する現像タンク６中に収容されることは
云うまでもない。In the diagram shown in FIG. 1, reference numeral 2 denotes a support and rotation means for supporting and rotating the wafer 1 having a diameter of 355mm and a thickness of 6mm. 120 rp with the shaft as the center of rotation 3゜
■It is rotated with. 4 is a developer supply means, which has three developer supply ports 5.5° and 5°° in the figure, and these developer supply ports 5.5° and 5° are located at the center of rotation 3.
The openings are at different distances from each other. That is, from the center of rotation 3°, 20m5+, 8G, respectively.
Pengen, 140 ■The intestine opens at a distant point. It goes without saying that the above-mentioned apparatus is housed in a developing tank 6 having a drain 7.
効果を確認するために、現像液供給口が１個であり、回
転中心から２０■−離れた点に開口する装置を試作し、
上記実施例の場合の現像結果とを比較した結果を第２図
に示す０図において、Ｙ軸は現像後のレジスト膜厚であ
り、Ｘ軸は回転中心からの距離である。そして、Ａは本
発明の実施例の結果でありＢは従来技術における構成の
試作装置の結果である。第２図は本発明の効果を明らか
に表わしている。In order to confirm the effect, we prototyped a device with one developer supply port, which opened at a point 20 cm away from the center of rotation.
In FIG. 2, which shows the results of comparison with the development results of the above embodiments, the Y-axis is the resist film thickness after development, and the X-axis is the distance from the center of rotation. A shows the result of the embodiment of the present invention, and B shows the result of a prototype device having a configuration according to the prior art. FIG. 2 clearly shows the effect of the present invention.
（７）発明の効果
以上説明せるとおり本発明によれば、被現像ウェーハの
すべての領域において均一に現像をなすことを可能にす
るフォトレジスト現像装置を提供することができる。(7) Effects of the Invention As explained above, according to the present invention, it is possible to provide a photoresist developing apparatus that enables uniform development in all areas of a wafer to be developed.
第１図は本発明の実施例に係るフォトレジスト現像装置
の概念的構成図であり、第２図は本発明の効果確認試験
の結果を示すグラフである。
ｌ・・拳ウェーハ、 ２・・・支持回転手段、３、ｍ−
モータ、 ３’１ｌｌｌ＃回転中心、４・争・現像液供
給手段、５．５′、５°゛・・・現像液供給口、 ６争
・−現像タンク、 ７・・Φドレイン。FIG. 1 is a conceptual diagram of a photoresist developing apparatus according to an embodiment of the present invention, and FIG. 2 is a graph showing the results of an effect confirmation test of the present invention. l... fist wafer, 2... support rotation means, 3, m-
Motor, 3'1lll#rotation center, 4.Developer supply means, 5.5', 5°...Developer supply port, 6.Developer tank, 7..Φ drain.
Claims (1)
ォトレジスト膜の表面を水平面内に回転しながら支持す
る支持回転手段と、前記フォトレジスト膜の表面にフォ
トレジスト現像液を流下する現像液供給手段とを有する
フォトレジスト現像装置において、前記現像液供給手段
は複数の現像液供給口を有し該現像液供給口のそれぞれ
は前記支持回転手段の回転中心かち異なった距離の点に
配設されてなることを特徴とするフォトにシスト現像装
置a support rotation means for rotating and supporting the surface of the photoresist film of a plate-shaped body having a photoresist film to be developed on the surface in a horizontal plane; and a developer supply for flowing a photoresist developer onto the surface of the photoresist film. In the photoresist developing apparatus, the developer supply means has a plurality of developer supply ports, and each of the developer supply ports is disposed at a different distance from the center of rotation of the support rotation means. A photo cyst developing device that is characterized by
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13825883A JPS6029749A (en) | 1983-07-28 | 1983-07-28 | Photoresist developing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13825883A JPS6029749A (en) | 1983-07-28 | 1983-07-28 | Photoresist developing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6029749A true JPS6029749A (en) | 1985-02-15 |
Family
ID=15217735
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13825883A Pending JPS6029749A (en) | 1983-07-28 | 1983-07-28 | Photoresist developing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6029749A (en) |
-
1983
- 1983-07-28 JP JP13825883A patent/JPS6029749A/en active Pending
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