JPS6027125A - 光プラズマ気相反応法 - Google Patents

光プラズマ気相反応法

Info

Publication number
JPS6027125A
JPS6027125A JP58135398A JP13539883A JPS6027125A JP S6027125 A JPS6027125 A JP S6027125A JP 58135398 A JP58135398 A JP 58135398A JP 13539883 A JP13539883 A JP 13539883A JP S6027125 A JPS6027125 A JP S6027125A
Authority
JP
Japan
Prior art keywords
gas
reaction
oxide
plasma
reactive gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58135398A
Other languages
English (en)
Japanese (ja)
Other versions
JPH038577B2 (https=
Inventor
Shunpei Yamazaki
舜平 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP58135398A priority Critical patent/JPS6027125A/ja
Publication of JPS6027125A publication Critical patent/JPS6027125A/ja
Publication of JPH038577B2 publication Critical patent/JPH038577B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
    • H10P14/3411—Silicon, silicon germanium or germanium
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3438—Doping during depositing
    • H10P14/3441—Conductivity type
    • H10P14/3442—N-type

Landscapes

  • Photovoltaic Devices (AREA)
JP58135398A 1983-07-25 1983-07-25 光プラズマ気相反応法 Granted JPS6027125A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58135398A JPS6027125A (ja) 1983-07-25 1983-07-25 光プラズマ気相反応法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58135398A JPS6027125A (ja) 1983-07-25 1983-07-25 光プラズマ気相反応法

Publications (2)

Publication Number Publication Date
JPS6027125A true JPS6027125A (ja) 1985-02-12
JPH038577B2 JPH038577B2 (https=) 1991-02-06

Family

ID=15150778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58135398A Granted JPS6027125A (ja) 1983-07-25 1983-07-25 光プラズマ気相反応法

Country Status (1)

Country Link
JP (1) JPS6027125A (https=)

Also Published As

Publication number Publication date
JPH038577B2 (https=) 1991-02-06

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