JPS6026343A - 投影露光装置 - Google Patents
投影露光装置Info
- Publication number
- JPS6026343A JPS6026343A JP58133691A JP13369183A JPS6026343A JP S6026343 A JPS6026343 A JP S6026343A JP 58133691 A JP58133691 A JP 58133691A JP 13369183 A JP13369183 A JP 13369183A JP S6026343 A JPS6026343 A JP S6026343A
- Authority
- JP
- Japan
- Prior art keywords
- slit
- image
- reticle
- optical system
- photoelectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 59
- 238000001514 detection method Methods 0.000 claims abstract description 14
- 238000003384 imaging method Methods 0.000 claims description 28
- 238000005286 illumination Methods 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 5
- YTCQFLFGFXZUSN-BAQGIRSFSA-N microline Chemical compound OC12OC3(C)COC2(O)C(C(/Cl)=C/C)=CC(=O)C21C3C2 YTCQFLFGFXZUSN-BAQGIRSFSA-N 0.000 claims description 3
- 230000004907 flux Effects 0.000 abstract description 5
- 238000005259 measurement Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 11
- 238000009826 distribution Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 241000257465 Echinoidea Species 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011295 pitch Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 201000009310 astigmatism Diseases 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000009897 systematic effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 102100025490 Slit homolog 1 protein Human genes 0.000 description 1
- 101710123186 Slit homolog 1 protein Proteins 0.000 description 1
- 241001333909 Soter Species 0.000 description 1
- IFLVGRRVGPXYON-UHFFFAOYSA-N adci Chemical compound C12=CC=CC=C2C2(C(=O)N)C3=CC=CC=C3CC1N2 IFLVGRRVGPXYON-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 210000003323 beak Anatomy 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Focusing (AREA)
- Automatic Focus Adjustment (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58133691A JPS6026343A (ja) | 1983-07-22 | 1983-07-22 | 投影露光装置 |
| US06/800,094 US4629313A (en) | 1982-10-22 | 1985-11-20 | Exposure apparatus |
| US06/897,644 US4711567A (en) | 1982-10-22 | 1986-08-18 | Exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58133691A JPS6026343A (ja) | 1983-07-22 | 1983-07-22 | 投影露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6026343A true JPS6026343A (ja) | 1985-02-09 |
| JPH0430735B2 JPH0430735B2 (enrdf_load_stackoverflow) | 1992-05-22 |
Family
ID=15110619
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58133691A Granted JPS6026343A (ja) | 1982-10-22 | 1983-07-22 | 投影露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6026343A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63296339A (ja) * | 1987-05-28 | 1988-12-02 | Nikon Corp | 位置合わせ方法及び装置 |
| JPH08167558A (ja) * | 1994-12-15 | 1996-06-25 | Nikon Corp | 投影露光装置 |
| JPWO2008153023A1 (ja) * | 2007-06-11 | 2010-08-26 | 株式会社ニコン | 計測部材、センサ、計測方法、露光装置、露光方法、及びデバイス製造方法 |
| JP2022074800A (ja) * | 2020-11-05 | 2022-05-18 | キヤノン株式会社 | 露光装置、露光方法、及び物品の製造方法 |
-
1983
- 1983-07-22 JP JP58133691A patent/JPS6026343A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63296339A (ja) * | 1987-05-28 | 1988-12-02 | Nikon Corp | 位置合わせ方法及び装置 |
| JPH08167558A (ja) * | 1994-12-15 | 1996-06-25 | Nikon Corp | 投影露光装置 |
| JPWO2008153023A1 (ja) * | 2007-06-11 | 2010-08-26 | 株式会社ニコン | 計測部材、センサ、計測方法、露光装置、露光方法、及びデバイス製造方法 |
| JP2022074800A (ja) * | 2020-11-05 | 2022-05-18 | キヤノン株式会社 | 露光装置、露光方法、及び物品の製造方法 |
| JP2024169699A (ja) * | 2020-11-05 | 2024-12-05 | キヤノン株式会社 | 露光装置、露光方法、及び物品の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0430735B2 (enrdf_load_stackoverflow) | 1992-05-22 |
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