JPS6026343A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS6026343A
JPS6026343A JP58133691A JP13369183A JPS6026343A JP S6026343 A JPS6026343 A JP S6026343A JP 58133691 A JP58133691 A JP 58133691A JP 13369183 A JP13369183 A JP 13369183A JP S6026343 A JPS6026343 A JP S6026343A
Authority
JP
Japan
Prior art keywords
slit
image
reticle
optical system
photoelectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58133691A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0430735B2 (cs
Inventor
Shoichi Tanimoto
昭一 谷元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58133691A priority Critical patent/JPS6026343A/ja
Publication of JPS6026343A publication Critical patent/JPS6026343A/ja
Priority to US06/800,094 priority patent/US4629313A/en
Priority to US06/897,644 priority patent/US4711567A/en
Publication of JPH0430735B2 publication Critical patent/JPH0430735B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Focusing (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58133691A 1982-10-22 1983-07-22 投影露光装置 Granted JPS6026343A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58133691A JPS6026343A (ja) 1983-07-22 1983-07-22 投影露光装置
US06/800,094 US4629313A (en) 1982-10-22 1985-11-20 Exposure apparatus
US06/897,644 US4711567A (en) 1982-10-22 1986-08-18 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58133691A JPS6026343A (ja) 1983-07-22 1983-07-22 投影露光装置

Publications (2)

Publication Number Publication Date
JPS6026343A true JPS6026343A (ja) 1985-02-09
JPH0430735B2 JPH0430735B2 (cs) 1992-05-22

Family

ID=15110619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58133691A Granted JPS6026343A (ja) 1982-10-22 1983-07-22 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6026343A (cs)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63296339A (ja) * 1987-05-28 1988-12-02 Nikon Corp 位置合わせ方法及び装置
JPH08167558A (ja) * 1994-12-15 1996-06-25 Nikon Corp 投影露光装置
JPWO2008153023A1 (ja) * 2007-06-11 2010-08-26 株式会社ニコン 計測部材、センサ、計測方法、露光装置、露光方法、及びデバイス製造方法
JP2022074800A (ja) * 2020-11-05 2022-05-18 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63296339A (ja) * 1987-05-28 1988-12-02 Nikon Corp 位置合わせ方法及び装置
JPH08167558A (ja) * 1994-12-15 1996-06-25 Nikon Corp 投影露光装置
JPWO2008153023A1 (ja) * 2007-06-11 2010-08-26 株式会社ニコン 計測部材、センサ、計測方法、露光装置、露光方法、及びデバイス製造方法
JP2022074800A (ja) * 2020-11-05 2022-05-18 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法
JP2024169699A (ja) * 2020-11-05 2024-12-05 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法

Also Published As

Publication number Publication date
JPH0430735B2 (cs) 1992-05-22

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