JPS60258496A - Continuous electroplating device - Google Patents

Continuous electroplating device

Info

Publication number
JPS60258496A
JPS60258496A JP11612484A JP11612484A JPS60258496A JP S60258496 A JPS60258496 A JP S60258496A JP 11612484 A JP11612484 A JP 11612484A JP 11612484 A JP11612484 A JP 11612484A JP S60258496 A JPS60258496 A JP S60258496A
Authority
JP
Japan
Prior art keywords
steel strip
plating
width
plating tank
shielding body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11612484A
Other languages
Japanese (ja)
Other versions
JPH0425357B2 (en
Inventor
Hiroshi Nakanishi
博 中西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IHI Corp
Original Assignee
IHI Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IHI Corp filed Critical IHI Corp
Priority to JP11612484A priority Critical patent/JPS60258496A/en
Publication of JPS60258496A publication Critical patent/JPS60258496A/en
Publication of JPH0425357B2 publication Critical patent/JPH0425357B2/ja
Granted legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To prevent the generation of an overcoat by providing an expandable and contractable shielding body in a plating tank equipped with an electrode whose width is larger than the width of a steel strip so that the end part of the steel plate may be shielded. CONSTITUTION:A plating tank 4 is constituted of an upper and a lower insoluble electrode 2 whose width are larger than the width of a steel strip 1 and an insulating side plate 3, and the steel strip 1 is electroplated by charging a plating soln. A hollow shielding body 13 (an insulating material such as rubber), which can be moved in the plating soln. from the outside through a rod 8 in correspondence with the width of the steel strip 1 and can be expanded and contracted by the supply and discharge of compressed air from an air supply tube 12, is provided in the plating tank 4. By said constitution, the shielding body 13 is expanded to an imaginary line in correspondence with the width of the steel strip 1, and the outer surface is pressed against the upper and the lower electrode 2. Under said conditions, the plating is carried out. Accordingly, since a clearance 10 is eliminated, the electric current is not leaked to the steel strip 1 side from a space 11, and the generation of an overcoat at the end part of the steel strip is prevented.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、連続して移動する銅帯へ電気メッキを行う連
続式電気メツキ装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a continuous electroplating device for electroplating a continuously moving copper strip.

〔従来の技術〕[Conventional technology]

銅帯を高速で連続的に電気メッキする装置として、従来
より第5図及び第6図に示す如き方式のものが知られて
いる。即ち、鋼帯1の板幅よりも幅広の上下の不溶性電
極2,2と絶縁物質性の側板3.3とからメッキ槽4を
構成し、入口5より鋼帯1を送給すると共に、出口6に
設けたメッキ液吠出ノズル7.7よりメッキ液を鋼帯1
に対し向流にして送り、循環させるようにしたものであ
る。
As an apparatus for continuously electroplating a copper strip at high speed, a system as shown in FIGS. 5 and 6 has been known. That is, a plating bath 4 is constituted by upper and lower insoluble electrodes 2, 2, which are wider than the plate width of the steel strip 1, and a side plate 3.3 made of an insulating material, and the steel strip 1 is fed from an inlet 5, and the steel strip 1 is fed from the outlet 5. Apply the plating solution to the steel strip 1 from the plating solution spewing nozzle 7.7 installed in 6.
It is designed to be sent in a countercurrent to the flow and circulated.

斯かる従来の連続式電気メツキ装置においては、鋼帯1
の入口5及び出口6を除くと完全に。 密閉された構造
で、メッキ液の流路が断面矩形状の管状になっているの
で、高速流でメッキ液を吹出しても、幅方向に均一な流
れが得られるし、流れ方向も一定であるのが特長である
が、銅帯1端剖にオーバーコートが発生することと、差
厚メッキにおける厚目付側から薄目付側へ電流の回り込
みが発生することが問題であった。
In such conventional continuous electroplating equipment, steel strip 1
Completely excluding inlet 5 and outlet 6. It has a sealed structure, and the flow path for the plating solution is tubular with a rectangular cross section, so even if the plating solution is blown out at high speed, a uniform flow can be obtained in the width direction, and the flow direction is also constant. However, there were problems in that an overcoat occurred on one end of the copper strip and that current flow ran from the thicker to the thinner side in differential thickness plating.

そこで従来、第6図の仮想線で示す如く、メッキ槽4内
に、槽外部からロッド8を介してメツキ液中で鋼帯1の
板幅に応じ移動せしめられるコの字状の絶縁性マスク9
,9を設け、該マスク9,9で鋼帯1の端部を陰蔽する
ようにした方式が採用されるに至っている。
Therefore, conventionally, as shown by the imaginary line in FIG. 6, a U-shaped insulating mask is moved into the plating bath 4 from outside the tank via a rod 8 in accordance with the width of the steel strip 1 in the plating solution. 9
, 9 are provided and the ends of the steel strip 1 are shaded by the masks 9, 9.

斯かる従来方法によれば、表裏付着量の等しい両面等厚
メッキは銅帯1端部のオーバーコートが防止され、均一
なメッキが可能であるが、例えば鋼帯1の表裏面で差厚
メッキを行った場合、厚目付側から薄目付側へ漏洩電流
があり、鋼帯1の薄目付側の面の板端部は目標付着量の
数倍のメッキがされる。即ち、この現象は、マスク9,
9と電極2,2との間に隙間10が存在するため、側板
3とマスク9との間の空[11より隙間10を通して厚
目付側の面に対応する電極2から、メッキ液を介して漏
洩電流が流れ、これが薄目付則の面に対応する電極2の
全面を介して鋼帯1の薄目付側の面に電着を起させるた
めである。
According to such a conventional method, uniform thickness plating on both sides with the same amount of coating on both sides prevents overcoating at the end of the copper strip 1, and uniform plating is possible. When this is done, there is a leakage current from the thicker coating side to the thinner coating side, and the plate end of the thinner coating side of the steel strip 1 is plated several times the target coating amount. That is, this phenomenon is caused by the mask 9,
Since there is a gap 10 between the side plate 3 and the electrodes 2, 2, the gap 10 between the side plate 3 and the mask 9 is removed from the electrode 2 corresponding to the thick side surface through the gap 10 through the plating solution. This is because a leakage current flows, which causes electrodeposition to occur on the light weight side surface of the steel strip 1 through the entire surface of the electrode 2 corresponding to the light weight surface.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

本発明は、鋼帯の板幅よりも幅広の電極を有する連続式
電気メツキ装置において、銅帯端部へのオーバーコート
と、差厚メッキにおける厚目付側から薄目付側への電流
の回り込みとを共に防止し、同一ラインで両面等厚メッ
キと表裏付着量の異なる差厚メッキとを共に行うことが
できるようにしたものである。
The present invention is a continuous electroplating device having an electrode wider than the width of the steel strip, and is capable of overcoating the end of the copper strip and preventing current from flowing from the thick side to the thin side in differential thickness plating. It is possible to perform both equal-thickness plating on both sides and differential-thickness plating with different deposit amounts on the front and back sides on the same line.

〔問題点を解決するための手段〕[Means for solving problems]

本発明の連続式電気メツキ装置は、銅帯の板幅より広幅
の電極を有するメッキ槽内に、鋼帯の板端部を遮蔽する
よう膨縮可能な遮蔽体を配設した構成を有する。
The continuous electroplating apparatus of the present invention has a structure in which an expandable and contractible shield is disposed in a plating bath having an electrode wider than the width of the copper strip so as to shield the edge of the steel strip.

〔実 施 例〕〔Example〕

以下、図面を参照して本発明の詳細な説明する。 Hereinafter, the present invention will be described in detail with reference to the drawings.

第1図は本発明の連続式電気メツキ装置の切断正面図を
示すものであり、第5図及び第6図で示した装置におい
て、メッキ槽4内に、槽外部からロッド8を介してメッ
キ液中で鋼帯1の板幅に応じ移動せしめられ、且つ空気
供給管12からの圧縮空気の供給、排出によって膨縮可
能な中空状の遮蔽体13.13を配設したものである。
FIG. 1 shows a cutaway front view of the continuous electroplating apparatus of the present invention. In the apparatus shown in FIGS. A hollow shield 13.13 is provided which can be moved in the liquid according to the width of the steel strip 1 and can be expanded and contracted by supplying and discharging compressed air from the air supply pipe 12.

前記遮蔽体13.13は、ゴム或いは芯金入りのゴム、
又は芯金入りのビニール等の絶縁物質によって形成され
、空気供給管12がら空気を供給されて膨張した際に、
上下の電極2,2に圧接するような大きさとしである。
The shielding body 13.13 is made of rubber or rubber with a cored metal,
Or, it is formed of an insulating material such as vinyl with a metal core, and when it is expanded by being supplied with air from the air supply pipe 12,
The size is such that it comes into pressure contact with the upper and lower electrodes 2, 2.

前記構成において、遮蔽体13.13を第1図において
仮想線で示すように、鋼帯1の板幅位置に対応するよう
な位置で膨張させ、上下の電極2.2にその外面を圧接
した状態で作業を行うと、第6図で示した隙間1oがな
くなるため、空隙11から鋼帯1側への電流の回り込み
が皆無となり、且つ鋼帯1端部のオーバーコートも防止
される。
In the above configuration, the shield 13.13 was expanded at a position corresponding to the width of the steel strip 1, as shown by the imaginary line in FIG. 1, and its outer surface was pressed against the upper and lower electrodes 2.2. If the work is carried out in this condition, the gap 1o shown in FIG. 6 disappears, so there is no current flowing from the gap 11 to the steel strip 1 side, and overcoating of the ends of the steel strip 1 is also prevented.

従って、同一ラインで、両面等厚メッキと表裏面付着量
の異なる差厚メッキとが共に高精度に安定して行える。
Therefore, both equal-thickness plating on both sides and differential-thickness plating with different coating amounts on the front and back sides can be performed stably and with high precision on the same line.

尚、遮蔽体13.13は第2図に示すように、コの字状
に形成してもよい。
Incidentally, the shielding body 13.13 may be formed in a U-shape as shown in FIG.

又、fnl記したように、遮蔽体13.13を膨張させ
ると、遮蔽体13.13と電極2,2との間がシールさ
れるので、第3図及び第4図に示すように、綱板3,3
を有さない開放型のメッキ槽4′に対しても実施するこ
とができる。
Also, as noted in fnl, when the shield 13.13 is expanded, a seal is created between the shield 13.13 and the electrodes 2, 2, so as shown in FIGS. Board 3,3
The method can also be applied to an open type plating tank 4' that does not have a plating tank 4'.

尚、本発明は…■記実施例にのみ限定されるものではな
く、本発明の要旨を逸脱しない限り種種変更を加え得る
ことは勿論である。
It should be noted that the present invention is not limited only to the embodiment described in (1), and it goes without saying that various changes can be made without departing from the gist of the present invention.

(発明の効果J 以上説明したように、本発明の連続式電気メツキ装置に
よれば、鋼帯端部へのオーバーコートと、差厚メッキに
おける厚目付側がら薄目付側への電流の回り込みとを共
に防止し得るので、同一ラインで、両面等厚メッキと表
裏付着量の異なる差厚メッキとを、共に精度よく安定し
て行うことができる、と言う優れた効果を奏し得る。
(Effects of the Invention J As explained above, the continuous electroplating apparatus of the present invention prevents the overcoating of the ends of the steel strip and the current flow from the thicker to the thinner side in differential thickness plating. Therefore, it is possible to achieve the excellent effect of being able to perform both equal-thickness plating on both sides and differential-thickness plating with different adhesion amounts on the front and back sides with high precision and stability on the same line.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の連続式電気メツキ装置の概略切断正面
図、第2図乃至第4図はいずれも本発明の他の実施例を
示す説明図、第5図は従来装置の概略切断側面図、第6
図は第5図のA−A矢視図である。 1は銅帯、2は電極、4,4′はメッキ槽、12は空気
供給管、13は遮蔽体を示す。 特 許 出 願 人 石川島播MW工業株式会社 特許出願人代理人 特許出願人代理人
FIG. 1 is a schematic cutaway front view of a continuous electroplating device of the present invention, FIGS. 2 to 4 are explanatory diagrams showing other embodiments of the present invention, and FIG. 5 is a schematic cutaway side view of a conventional device. Figure, 6th
The figure is a view taken along the line A-A in FIG. 5. 1 is a copper strip, 2 is an electrode, 4 and 4' are plating baths, 12 is an air supply pipe, and 13 is a shield. Patent Application Person Ishikawajimaban MW Kogyo Co., Ltd. Patent Applicant Agent Patent Applicant Agent

Claims (1)

【特許請求の範囲】 1〕 銅帯の板幅より広幅の電極を有するメッキ槽内に
、鋼帯の板端部を遮蔽するよう膨縮可能な遮蔽体を配設
したことを特徴とする連続式電気メツキ装置。 2)遮蔽体をコの字状に形成した特許請求の範囲第1)
項記載の連続式電気メツキ装置。 3〕 メッキ槽を密閉型とした特許請求の範囲第1)項
又は第2)項記載の連続式電気メツキ装置4〕 メッキ
槽を開放型とした特許請求の範囲第1)項又は第2)項
記載の連続式電気メッキ装置
[Scope of Claims] 1) A continuous method characterized in that an expandable and contractible shield is disposed in a plating bath having an electrode wider than the width of the copper strip so as to shield the edge of the steel strip. Type electroplating device. 2) Claim 1) in which the shield is formed in a U-shape
Continuous electroplating equipment as described in . 3] Continuous electroplating apparatus according to claim 1) or 2), in which the plating tank is a closed type; 4) Claim 1) or 2), in which the plating tank is an open type. Continuous electroplating equipment described in section
JP11612484A 1984-06-06 1984-06-06 Continuous electroplating device Granted JPS60258496A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11612484A JPS60258496A (en) 1984-06-06 1984-06-06 Continuous electroplating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11612484A JPS60258496A (en) 1984-06-06 1984-06-06 Continuous electroplating device

Publications (2)

Publication Number Publication Date
JPS60258496A true JPS60258496A (en) 1985-12-20
JPH0425357B2 JPH0425357B2 (en) 1992-04-30

Family

ID=14679291

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11612484A Granted JPS60258496A (en) 1984-06-06 1984-06-06 Continuous electroplating device

Country Status (1)

Country Link
JP (1) JPS60258496A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0345966U (en) * 1989-09-13 1991-04-26
CN103334137A (en) * 2013-04-02 2013-10-02 中冶南方工程技术有限公司 Edge cover covering anode edge and edge cover group

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4825619A (en) * 1971-08-06 1973-04-03
JPS5442668A (en) * 1977-09-12 1979-04-04 Hitachi Ltd Disconnecting terminal stand
JPS58168567U (en) * 1982-04-30 1983-11-10 住友金属工業株式会社 Continuous electroplating equipment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4825619A (en) * 1971-08-06 1973-04-03
JPS5442668A (en) * 1977-09-12 1979-04-04 Hitachi Ltd Disconnecting terminal stand
JPS58168567U (en) * 1982-04-30 1983-11-10 住友金属工業株式会社 Continuous electroplating equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0345966U (en) * 1989-09-13 1991-04-26
CN103334137A (en) * 2013-04-02 2013-10-02 中冶南方工程技术有限公司 Edge cover covering anode edge and edge cover group

Also Published As

Publication number Publication date
JPH0425357B2 (en) 1992-04-30

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