JP2535497B2 - Electrolytic plating method and electrolytic plating apparatus - Google Patents
Electrolytic plating method and electrolytic plating apparatusInfo
- Publication number
- JP2535497B2 JP2535497B2 JP5192462A JP19246293A JP2535497B2 JP 2535497 B2 JP2535497 B2 JP 2535497B2 JP 5192462 A JP5192462 A JP 5192462A JP 19246293 A JP19246293 A JP 19246293A JP 2535497 B2 JP2535497 B2 JP 2535497B2
- Authority
- JP
- Japan
- Prior art keywords
- plated
- work
- metal salt
- solution
- salt solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Electroplating Methods And Accessories (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、電解メッキ方法及び電
解メッキ装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrolytic plating method and an electrolytic plating apparatus.
【0002】[0002]
【従来の技術】電解メッキは、電解液を貯留したメッキ
槽の槽底に固形の金属塩を沈ませておき、この電解液中
へ被メッキ材を浸漬し、被メッキ材を陰極、金属塩を陽
極として電圧を印加させることにより、金属塩を徐々に
電解液中に溶解させて被メッキ材の表面で析出させるも
のである。2. Description of the Related Art In electroplating, a solid metal salt is submerged in the bottom of a plating tank in which an electrolytic solution is stored, and a material to be plated is immersed in the electrolytic solution. Is used as an anode and a voltage is applied to gradually dissolve the metal salt in the electrolytic solution and deposit the metal salt on the surface of the material to be plated.
【0003】[0003]
【発明が解決しようとする課題】メッキ処理が進行する
にしたがって(金属塩の溶解が進めば進ほど)、金属塩
の外形は小さくなるが、このために金属塩の表面と被メ
ッキ材の表面との間隔が離れるようになる。その結果、
メッキの厚みにムラが生じるおそれがあった。本発明
は、上記事情に鑑みてなされたものであって、被メッキ
材が線状又は帯状をしたものである場合において、この
被メッキ材の表面に均一厚みのメッキを施すことができ
るようにした電解メッキ方法及び電解メッキ装置を提供
することを目的とする。As the plating process progresses (the more the metal salt dissolves), the outer shape of the metal salt becomes smaller. For this reason, the surface of the metal salt and the surface of the material to be plated are reduced. Will be separated from the distance. as a result,
There was a possibility that the plating thickness would be uneven. The present invention has been made in view of the above circumstances, and in the case where the material to be plated has a linear or strip shape, it is possible to perform plating of a uniform thickness on the surface of the material to be plated. It is an object of the present invention to provide an electrolytic plating method and an electrolytic plating apparatus.
【0004】[0004]
【課題を解決するための手段】本発明では、上記目的を
達成するために、次の技術的手段を講じた。即ち、本発
明に係る電解メッキ方法は、金属塩溶液に浸漬されたワ
ークガイド内に線状又は帯状の被メッキ材を走行させつ
つ、被メッキ材を陰極、金属塩溶液を陽極として電圧を
印加させる電解メッキ方法において、金属塩溶液を前記
ワークガイド内に流入させてワークガイドで金属塩溶液
流を案内しながら、走行する被メッキ材に沿わせて流す
ことを特徴としている。In order to achieve the above object, the present invention takes the following technical means. That is, the electrolytic plating method according to the present invention applies a voltage by using a material to be plated as a cathode and a metal salt solution as an anode while running a linear or strip-shaped material to be plated in a work guide immersed in a metal salt solution. In the electrolytic plating method, the metal salt solution is flown into the work guide and the metal salt solution is applied to the work guide.
It is characterized by flowing along the running material to be plated while guiding the flow .
【0005】また、本発明に係る電解メッキ装置は、液
受け槽と、この液受け槽内へ金属塩溶液を供給させる溶
液供給装置と、前記液受け槽内で線状又は帯状の被メッ
キ材を走行させるワーク走行装置と、液受け槽内で金属
塩溶液に浸漬されていて被メッキ材の移動方向と平行に
設けられている不溶性電極材により形成された陽極兼ワ
ークガイドと、前記液受け槽の内部又は外部において被
メッキ材に接触するように設けられる陰極ブラシとを備
える電解メッキ装置において、前記ワークガイドが被メ
ッキ材の走行方向に一対設けられていて、両ワークガイ
ド間に両ワークガイドの各内端と略近接してワーク通過
管が配置され、このワーク通過管内には被メッキ材を通
過させかつ溶液供給装置に接続された溶液噴流路が形成
され、こ の溶液噴流路は金属塩溶液の噴流を両ワークガ
イド内に流入させて案内すべく被メッキ材に沿って両ワ
ークガイドに指向配置されていることを特徴としてい
る。Further, the electrolytic plating apparatus according to the present invention includes a liquid receiving tank, a solution supply device for supplying a metal salt solution into the liquid receiving tank, and a linear or strip-shaped material to be plated in the liquid receiving tank. A work traveling device for traveling, an anode / work guide formed of an insoluble electrode material that is immersed in a metal salt solution in a liquid receiving tank and is provided in parallel with the moving direction of the material to be plated, and the liquid receiving device. in the electrolytic plating apparatus comprising a cathode brush provided so as to contact with the plating material inside or outside of the tank, the workpiece guide is provided in pairs in the running direction of the plating material, both the work between both work guide Guide to substantially close the respective inner ends of which is arranged word over click passage tube, through the material to be plated in the work passage pipe
Is bulk allowed and is connected to the solution supply device solution jet path forming a jet of the solution jet paths of this metal salt solution both Wakuga
Guide along the material to be plated so as to flow into the guide.
The feature is that it is oriented to the guide .
【0006】[0006]
【作用】本発明において、溶液供給装置からワーク通過
管に供給される金属塩溶液は、ワーク通過管に形成され
ている溶液噴流路により、金属塩溶液がワークガイド内
を被メッキ材に対してその外周面を包囲した状態で平行
に流れる。この時、金属塩溶液は被メッキ材の全周にわ
たって略均一に接触し、被メッキ材から距離的に変移す
ることなく多量に供給されることになる。更に、金属塩
溶液は走行する被メッキ材に対して相対速度を有してい
おり、両ワークガイド内における被メッキ材表面近傍の
金属イオン濃度が常に略均一に保持される。従って、被
メッキ材の全周にわたって均一な厚さのメッキが得られ
る。勿論、被メッキ材が走行しているため、長手方向に
も均一な厚さでメッキされる。In the present invention, the metal salt solution supplied from the solution supply device to the work passage pipe is supplied to the workpiece by the solution jetting passage formed in the work passage pipe. Flows in parallel while surrounding the outer peripheral surface. At this time, the metal salt solution comes into substantially uniform contact with the entire circumference of the material to be plated, and is supplied in a large amount without changing the distance from the material to be plated. Further, the metal salt solution has a relative velocity with respect to the material to be plated, and the metal ion concentration near the surface of the material to be plated in both work guides is always kept substantially uniform. Therefore, plating having a uniform thickness can be obtained over the entire circumference of the material to be plated. Of course, since the material to be plated is running, it is plated with a uniform thickness in the longitudinal direction.
【0007】又、ワーク通過管は一対のワークガイドの
間に配置されているため、ワーク通過管の前方と後方の
両方のワークガイド内に同時に金属塩溶液が噴射され、
メッキ処理工程中の浸漬時間が長くなり、一つの工程で
得られるメッキ厚さが大きくなる。特に、通過前に金属
塩溶液を噴射させる場合、被メッキ材と金属塩溶液の相
対速度が上昇し、より高速にメッキされる。そして、ワ
ーク通過管内の金属塩溶液は、ワーク通過管に略近接し
て両ワークガイドが設けられているため、確実にワーク
ガイドの内側へ噴射されると同時に溶液の飛散が少なく
なる。Further, since the work passage pipe is arranged between the pair of work guides, the metal salt solution is simultaneously sprayed into both the work guides in front of and behind the work passage pipe,
Immersion time during the plating process becomes long, and the plating thickness obtained in one process becomes large. In particular, when the metal salt solution is sprayed before passing, the relative speed between the material to be plated and the metal salt solution increases, and plating is performed at a higher speed. Since the metal salt solution in the work passage pipe is provided in close proximity to the work passage pipe with both work guides, the metal salt solution is surely sprayed inside the work guide and, at the same time, the solution is less scattered.
【0008】[0008]
【実施例】以下、本発明の実施例を図面に基づき説明す
る。図1は本発明に係る電解メッキ装置の実施例を示す
ものであって、1はメッキ処理が行われる液受け槽であ
り、2はワーク走行装置であり、3は溶液供給装置であ
る。この実施例では、図2によって明らかなように被メ
ッキ材Wとしてのワイヤ5本を一度にメッキ処理できる
ようになっている。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows an embodiment of an electrolytic plating apparatus according to the present invention, in which 1 is a liquid receiving tank in which plating is performed, 2 is a work traveling device, and 3 is a solution supply device. In this embodiment, as apparent from FIG. 2, five wires as the material W to be plated can be plated at one time.
【0009】図2乃至図3に示すように上記液受け槽1
は、全体が三つの槽部4,5,6に区画されている。中
央の槽部5は長く、この長手方向中央部に、同方向に沿
って両端開口部(入口部8及び出口部9)を向けるよう
にしたワーク通過管7が設けられている。このワーク通
過管7は、チーズ管10における水平方向両側の分岐口
部に対してノズル端11をねじ、圧入又は接着等により
取り付けたもので、図4に示すように、被メッキ材Wが
その内部を通過するように配置されている。これらノズ
ル端11の各内部には、その両側から中央部へ向かって
テーパ状に絞り込まれるようになった径小部が形成され
ている。この径小部の内径は、被メッキ材Wの外径の2
〜3倍程度となるように形成されている。このワーク通
過管7は、槽部3の底部寄りを横切る部分を有する給液
本管12に接続されており、この給液本管12は前記し
た溶液供給装置3(図1参照)に接続されている。更
に、図4を参照して、ワーク通過管7には、前記溶液供
給装置3から供給される溶液を、被メッキ材Wを包囲し
ながら入口部8と出口部9との両方から噴流させる溶液
噴流路が形成されている。As shown in FIGS. 2 to 3 , the liquid receiving tank 1 is used.
Is divided into three tank parts 4, 5, 6 as a whole. The tank portion 5 at the center is long, and a work passage pipe 7 is provided at the center portion in the longitudinal direction such that both end openings (the inlet portion 8 and the outlet portion 9) are directed along the same direction. This work passage pipe 7 is one in which the nozzle end 11 is attached to the branch ports on both sides in the horizontal direction of the cheese pipe 10 by screwing, press-fitting, or adhering, and as shown in FIG. It is arranged to pass through the inside. Inside each of the nozzle ends 11, there is formed a small diameter portion which is tapered from both sides toward the central portion. The inner diameter of this small diameter portion is 2 times the outer diameter of the material W to be plated.
It is formed so as to be about 3 times. This work passage pipe 7 is connected to a liquid supply main pipe 12 having a portion that crosses the bottom of the tank portion 3, and this liquid supply main pipe 12 is connected to the solution supply device 3 (see FIG. 1) described above. ing. Further, with reference to FIG. 4, a solution that causes the solution supplied from the solution supply device 3 to flow through the work passage pipe 7 from both the inlet 8 and the outlet 9 while surrounding the material W to be plated. A jet flow path is formed.
【0010】そして、図2及び図3に示すように、上記
ワーク通過管7の入口部8及び出口部9にワークガイド
15の端部が略近接して配置されている。このワークガ
イド15は、被メッキ材Wの通路を両側から挟むように
配された一対の板材から構成され、前記液受け槽1の内
で金属塩溶液に浸漬されていて被メッキ材Wの移動方向
と平行に設けられている。そして、このワークガイド1
5において、各板材は不溶性電極材により形成されてお
り、陽極の電極として兼用される。Then, as shown in FIGS. 2 and 3, the end portions of the work guides 15 are arranged in close proximity to the inlet portion 8 and the outlet portion 9 of the work passage tube 7. The work guide 15 is composed of a pair of plate materials arranged so as to sandwich the passage of the material to be plated W from both sides, and is immersed in the metal salt solution in the liquid receiving tank 1 to move the material to be plated W. It is provided parallel to the direction. And this work guide 1
In Fig. 5, each plate material is formed of an insoluble electrode material and also serves as an anode electrode.
【0011】液受け槽1の前後の槽部4及び6には、被
メッキ材Wの各通路に対応して吊り下げられ、下面を被
メッキ材Wに接触させるようになる陰極ブラシ16が設
けられている。17はガイドローラである。次に本発明
の電解メッキ方法を説明する。被メッキ材Wをワーク通
過管7の内部及びワークガイド15の板材相互間へ通
し、且つ陰極ブラシ16に接触する状態にセットする。
なお、液受け槽1の各槽部4,5,6を区画する区画壁
には、被メッキ材Wを通す貫通孔又はスリット(図示
略)が設けられているものとする。溶液供給装置3を作
動させて金属塩溶液がワーク通過管7内へ供給されるよ
うにする。この金属塩溶液としては、金属塩(例えば亜
鉛)の溶解濃度が500g/lのものを用いた。これに
より、金属塩溶液はワーク通過管7内の被メッキ材Wに
接触しつつ当該ワーク通過管7の入口部8及び出口部9
から槽部5内へ向けて流出して、この槽部5内で溜まっ
てゆくようになるが、ワーク通過管7(ノズル端11)
の内部には径小部が設けられているため、この流出は噴
射状態となるまで高速化されたものとなっている。その
ため、仮に槽部5が無い場合であったとしても、少なく
ともワーク通過管7内にあって被メッキ材Wは金属塩溶
液中に浸漬された状態となる。槽部5内の金属塩溶液が
ワークガイド15に接触するレベルまで溜まった後、こ
のワークガイド15(陽極)と陰極ブラシ16(陰極)
との間に電圧を印加する。このときの電流密度を200
A/dm2 とした。そして、前記ワーク走行装置2を作
動させて被メッキ材Wを高速で走行させる。このとき、
ワーク通過管7から噴出された金属塩溶液は、ワークガ
イド15の内で走行する被メッキ材Wの外周面を包囲し
た状態で相対速度を有しつつ平行に噴流し、この噴流の
ため、金属塩溶液が被メッキ材の全周にわたって略均一
に接触するようになる。これにより、金属塩溶液中に溶
解している金属塩が被メッキ材Wの表面で析出して均一
厚さのメッキが得られるようになる。Cathode brushes 16 are provided in the tank portions 4 and 6 before and after the liquid receiving tank 1 so as to be suspended corresponding to the passages of the material to be plated W and to bring the lower surface into contact with the material to be plated W. Has been. Reference numeral 17 is a guide roller. Next, the electrolytic plating method of the present invention will be described. The material W to be plated is passed through the inside of the work passage tube 7 and between the plate materials of the work guide 15 and is set to be in contact with the cathode brush 16.
In addition, a through hole or a slit (not shown) through which the material to be plated W is passed is provided in the partition wall that partitions the tank portions 4, 5, and 6 of the liquid receiving tank 1. The solution supply device 3 is operated so that the metal salt solution is supplied into the work passage pipe 7. As the metal salt solution, a metal salt (for example, zinc) having a dissolved concentration of 500 g / l was used. As a result, the metal salt solution comes into contact with the material W to be plated in the work passage pipe 7 while the inlet portion 8 and the outlet portion 9 of the work passage pipe 7 are in contact.
It flows out of the tank portion 5 into the tank portion 5 and accumulates in the tank portion 5, but the work passage pipe 7 (nozzle end 11)
Since a small-diameter portion is provided inside, the outflow is speeded up to the injection state. Therefore, even if the tank 5 is not provided, the material W to be plated is at least in the work passage tube 7 and is immersed in the metal salt solution. After the metal salt solution in the tank 5 has accumulated to a level where it contacts the work guide 15, the work guide 15 (anode) and the cathode brush 16 (cathode)
A voltage is applied between and. The current density at this time is 200
A / dm 2 . Then, the work traveling device 2 is operated to cause the material W to be plated to travel at high speed. At this time,
The metal salt solution jetted from the work passage pipe 7 jets in parallel while having a relative speed while surrounding the outer peripheral surface of the material W to be plated running inside the work guide 15, and due to this jet flow, metal The salt solution comes into uniform contact with the entire circumference of the material to be plated. As a result, the metal salt dissolved in the metal salt solution is deposited on the surface of the material W to be plated, and plating having a uniform thickness can be obtained.
【0012】なお参考までに言うと、従来の電解メッキ
では、固形の金属塩を電解液に沈めてメッキ処理を行っ
ている状態での硫酸亜鉛濃度が360g/lとなるもの
であり、また金属塩(陽極)と被メッキ材W(陰極)と
の間に印加する電圧の電流密度は40A/dm2 とする
ものであった。本発明の電解メッキ装置において、液受
け槽1(ワーク通過管7、ワークガイド15、陰極ブラ
シ16を含めた構成として)の複数を直列的に設けて、
メッキ処理が複数段階にわたって行われるようにするこ
とが可能である。これにより、メッキ厚の調節が行え
る。Incidentally, for reference, in the conventional electrolytic plating, the concentration of zinc sulfate in the state where the solid metal salt is immersed in the electrolytic solution to perform the plating treatment becomes 360 g / l, and The current density of the voltage applied between the salt (anode) and the material to be plated W (cathode) was 40 A / dm 2 . In the electrolytic plating apparatus of the present invention, a plurality of liquid receiving tanks 1 (as a configuration including the work passage tube 7, the work guide 15, and the cathode brush 16) are provided in series,
It is possible that the plating process is performed in multiple stages. Thereby, the plating thickness can be adjusted.
【0013】[0013]
【発明の効果】本発明のメッキ方法によれば、金属塩溶
液をワークガイド内で走行する被メッキ材に対してその
外周面を包囲した状態で相対速度を有しつつ平行に流す
ので、金属塩溶液を被メッキ材の全周にわたって均一に
接触させることができ、ワークガイド内における被メッ
キ材表面近傍の金属イオン濃度が常に略均一に保持する
ことができる。従って、被メッキ材の長手方向だけでな
く全周でより均一な厚さのメッキが可能となる。According to the plating method of the present invention, the metal salt solution is flowed in parallel with the relative speed with respect to the material to be plated traveling in the work guide while surrounding the outer peripheral surface thereof. The salt solution can be brought into uniform contact with the entire circumference of the material to be plated, and the metal ion concentration in the vicinity of the surface of the material to be plated in the work guide can always be kept substantially uniform. Therefore, it is possible to perform plating with a more uniform thickness not only in the longitudinal direction of the material to be plated but also in the entire circumference.
【0014】本発明のメッキ装置によれば、上記の効果
に加え、ワークガイドが被メッキ材の走行方向に一対設
けられていて、両ワークガイド間に被メッキ材を通過さ
せるワーク通過管が配置されているので、メッキ厚の大
きな製品も経済的に製造することができる。更に、ワー
ク通過管が両ワークガイドと略近接して配置されている
ので、両ワークガイドの内側へ確実に噴射させることが
でき、金属塩溶液の飛散が少なくなり作業環境が良くな
る。According to the plating apparatus of the present invention, in addition to the above effects, a pair of work guides are provided in the traveling direction of the material to be plated, and a work passage pipe for passing the material to be plated is arranged between both work guides. Therefore, a product having a large plating thickness can be economically manufactured. Further, since the work passage pipes are arranged in the vicinity of both the work guides, the work passage pipes can be surely ejected inside the both work guides, the scattering of the metal salt solution is reduced, and the working environment is improved.
【図1】本発明の実施例を示す全体構成図である。FIG. 1 is an overall configuration diagram showing an embodiment of the present invention.
【図2】図1の液受け槽を示す拡大平面図である。FIG. 2 is an enlarged plan view showing the liquid receiving tank of FIG.
【図3】図1の液受け槽を示す拡大正面断面図である。FIG. 3 is an enlarged front sectional view showing the liquid receiving tank of FIG.
【図4】ワーク通過管の主要部を示す拡大正面断面図で
ある。FIG. 4 is an enlarged front sectional view showing a main part of a work passage tube.
1 液受け槽 2 ワーク走行装置 3 溶液供給装置 7 ワーク通過管 15 ワークガイド 16 陰極ブラシ 1 Liquid Receiving Tank 2 Work Traveling Device 3 Solution Supply Device 7 Work Passing Pipe 15 Work Guide 16 Cathode Brush
Claims (2)
に線状又は帯状の被メッキ材を走行させつつ、被メッキ
材を陰極、金属塩溶液を陽極として電圧を印加させる電
解メッキ方法において、 金属塩溶液を前記ワークガイド内に流入させてワークガ
イドで金属塩溶液流を案内しながら、走行する被メッキ
材に沿わせて流すことを特徴とする電解メッキ方法。1. An electrolytic plating method in which a linear or strip-shaped material to be plated is run in a work guide immersed in a metal salt solution, and a voltage is applied using the material to be plated as a cathode and the metal salt solution as an anode, Flow the metal salt solution into the work guide and
While guiding the metal salt solution flow in Ido, electrolytic plating method characterized in that flowed along a material to be plated traveling.
液を供給させる溶液供給装置と、前記液受け槽内で線状
又は帯状の被メッキ材を走行させるワーク走行装置と、
液受け槽内で金属塩溶液に浸漬されていて被メッキ材の
移動方向と平行に設けられている不溶性電極材により形
成された陽極兼ワークガイドと、前記液受け槽の内部又
は外部において被メッキ材に接触するように設けられる
陰極ブラシとを備える電解メッキ装置において、 前記ワークガイドが被メッキ材の走行方向に一対設けら
れていて、両ワークガイド間に両ワークガイドの各内端
と略近接してワーク通過管が配置され、このワーク通過
管内には被メッキ材を通過させかつ溶液供給装置に接続
された溶液噴流路が形成され、この溶液噴流路は金属塩
溶液の噴流を両ワークガイド内に流入させて案内すべく
被メッキ材に沿って両ワークガイドに指向配置されてい
ることを特徴とする電解メッキ装置。2. A liquid receiving tank, a solution supply device for supplying a metal salt solution into the liquid receiving tank, and a work running device for running a linear or strip-shaped material to be plated in the liquid receiving tank.
An anode / work guide formed of an insoluble electrode material that is immersed in a metal salt solution in the liquid receiving tank and is provided in parallel with the moving direction of the material to be plated, and plating is performed inside or outside the liquid receiving tank. In an electroplating apparatus including a cathode brush provided so as to contact a material, a pair of the work guides are provided in the traveling direction of the material to be plated, and the inner ends of both work guides are provided between the work guides. > and is arranged word over click passage tube to substantially close, this is the work passage tube solution jet path connected to the cause and solution supply device passes through the plating material is formed, the solution jet passage metal salt
To guide by injecting a jet of solution into both work guides
An electroplating apparatus characterized in that the work guides are oriented along the material to be plated .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5192462A JP2535497B2 (en) | 1993-08-03 | 1993-08-03 | Electrolytic plating method and electrolytic plating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5192462A JP2535497B2 (en) | 1993-08-03 | 1993-08-03 | Electrolytic plating method and electrolytic plating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0748695A JPH0748695A (en) | 1995-02-21 |
JP2535497B2 true JP2535497B2 (en) | 1996-09-18 |
Family
ID=16291705
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5192462A Expired - Lifetime JP2535497B2 (en) | 1993-08-03 | 1993-08-03 | Electrolytic plating method and electrolytic plating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2535497B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4939066B2 (en) * | 2006-01-25 | 2012-05-23 | ジャパンファインスチール株式会社 | Saw wire and manufacturing method thereof |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60152689A (en) * | 1984-01-19 | 1985-08-10 | Nippon Steel Corp | Pickling method for preventing die galling of hot rolled steel sheet |
-
1993
- 1993-08-03 JP JP5192462A patent/JP2535497B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0748695A (en) | 1995-02-21 |
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