JPS60248691A - Novel preparation of cephalosporin compound and its intermediate - Google Patents
Novel preparation of cephalosporin compound and its intermediateInfo
- Publication number
- JPS60248691A JPS60248691A JP59104759A JP10475984A JPS60248691A JP S60248691 A JPS60248691 A JP S60248691A JP 59104759 A JP59104759 A JP 59104759A JP 10475984 A JP10475984 A JP 10475984A JP S60248691 A JPS60248691 A JP S60248691A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- general formula
- group
- salt
- cephalosporin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229930186147 Cephalosporin Natural products 0.000 title claims description 30
- 229940124587 cephalosporin Drugs 0.000 title claims description 30
- -1 cephalosporin compound Chemical class 0.000 title abstract description 42
- 150000001875 compounds Chemical class 0.000 claims abstract description 77
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims abstract description 37
- 229910015900 BF3 Inorganic materials 0.000 claims abstract description 18
- 150000003839 salts Chemical class 0.000 claims description 39
- 238000004519 manufacturing process Methods 0.000 claims description 29
- 150000001780 cephalosporins Chemical class 0.000 claims description 27
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 13
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 claims description 8
- 239000003960 organic solvent Substances 0.000 claims description 6
- 150000008282 halocarbons Chemical class 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 150000002825 nitriles Chemical class 0.000 claims description 5
- 150000002148 esters Chemical class 0.000 claims description 4
- 125000004971 nitroalkyl group Chemical group 0.000 claims description 4
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 31
- 125000000217 alkyl group Chemical group 0.000 abstract description 8
- 125000000623 heterocyclic group Chemical group 0.000 abstract description 7
- 125000003710 aryl alkyl group Chemical group 0.000 abstract description 5
- 125000003118 aryl group Chemical group 0.000 abstract description 5
- MIHIJWOEDDPOLG-DUXPYHPUSA-N (2e)-2-methoxyiminoacetic acid Chemical compound CO\N=C\C(O)=O MIHIJWOEDDPOLG-DUXPYHPUSA-N 0.000 abstract 1
- 230000000855 fungicidal effect Effects 0.000 abstract 1
- 239000000417 fungicide Substances 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical class CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 33
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 24
- 239000002904 solvent Substances 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 238000002844 melting Methods 0.000 description 10
- 230000008018 melting Effects 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- 239000013078 crystal Substances 0.000 description 8
- 239000000543 intermediate Substances 0.000 description 8
- 125000006239 protecting group Chemical group 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N DMSO Substances CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 5
- 229910052794 bromium Inorganic materials 0.000 description 5
- CSNNHWWHGAXBCP-UHFFFAOYSA-L magnesium sulphate Substances [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid group Chemical class S(O)(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 4
- 125000002252 acyl group Chemical group 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 4
- 235000017557 sodium bicarbonate Nutrition 0.000 description 4
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical class CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 239000002168 alkylating agent Substances 0.000 description 3
- 229940100198 alkylating agent Drugs 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 238000007363 ring formation reaction Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- LIKWMDGAWXCECN-UHFFFAOYSA-N 2,4,6-trimethylbenzenesulfonic acid;dihydrate Chemical compound O.O.CC1=CC(C)=C(S(O)(=O)=O)C(C)=C1 LIKWMDGAWXCECN-UHFFFAOYSA-N 0.000 description 2
- 125000004070 6 membered heterocyclic group Chemical group 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 2
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 2
- 229930182555 Penicillin Natural products 0.000 description 2
- JGSARLDLIJGVTE-MBNYWOFBSA-N Penicillin G Chemical compound N([C@H]1[C@H]2SC([C@@H](N2C1=O)C(O)=O)(C)C)C(=O)CC1=CC=CC=C1 JGSARLDLIJGVTE-MBNYWOFBSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000003242 anti bacterial agent Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- WLXALCKAKGDNAT-UHFFFAOYSA-N diazoethane Chemical compound CC=[N+]=[N-] WLXALCKAKGDNAT-UHFFFAOYSA-N 0.000 description 2
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Chemical class CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 230000002140 halogenating effect Effects 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 229940049954 penicillin Drugs 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 2
- 125000000714 pyrimidinyl group Chemical group 0.000 description 2
- 235000010288 sodium nitrite Nutrition 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- CZSRXHJVZUBEGW-UHFFFAOYSA-N 1,2-thiazolidine Chemical compound C1CNSC1 CZSRXHJVZUBEGW-UHFFFAOYSA-N 0.000 description 1
- XGYCWCIGCYGQFU-UHFFFAOYSA-N 1,2-thiazolidine 1,1-dioxide Chemical group O=S1(=O)CCCN1 XGYCWCIGCYGQFU-UHFFFAOYSA-N 0.000 description 1
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 1
- LXFQSRIDYRFTJW-UHFFFAOYSA-M 2,4,6-trimethylbenzenesulfonate Chemical compound CC1=CC(C)=C(S([O-])(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-M 0.000 description 1
- LXFQSRIDYRFTJW-UHFFFAOYSA-N 2,4,6-trimethylbenzenesulfonic acid Chemical compound CC1=CC(C)=C(S(O)(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- MARXMDRWROUXMD-UHFFFAOYSA-N 2-bromoisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(Br)C(=O)C2=C1 MARXMDRWROUXMD-UHFFFAOYSA-N 0.000 description 1
- FLYPZWDELZKIOY-UHFFFAOYSA-O 2-carboxyethyl(triphenyl)phosphanium Chemical compound C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCC(=O)O)C1=CC=CC=C1 FLYPZWDELZKIOY-UHFFFAOYSA-O 0.000 description 1
- KAIUHDKKCPPIGA-UHFFFAOYSA-N 2-methoxyimino-3-oxobutanamide Chemical compound CON=C(C(C)=O)C(N)=O KAIUHDKKCPPIGA-UHFFFAOYSA-N 0.000 description 1
- TYEYBOSBBBHJIV-UHFFFAOYSA-N 2-oxobutanoic acid Chemical compound CCC(=O)C(O)=O TYEYBOSBBBHJIV-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- MVKDNXIKAWKCCS-UHFFFAOYSA-N 3-methyl-1h-pyridin-2-one Chemical compound CC1=CC=CN=C1O MVKDNXIKAWKCCS-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 125000006181 4-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])C([H])([H])* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- HSHGZXNAXBPPDL-HZGVNTEJSA-N 7beta-aminocephalosporanic acid Chemical compound S1CC(COC(=O)C)=C(C([O-])=O)N2C(=O)[C@@H]([NH3+])[C@@H]12 HSHGZXNAXBPPDL-HZGVNTEJSA-N 0.000 description 1
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- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 1
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-M Methanesulfonate Chemical compound CS([O-])(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-M 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- 239000004157 Nitrosyl chloride Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical class OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- AZFNGPAYDKGCRB-XCPIVNJJSA-M [(1s,2s)-2-amino-1,2-diphenylethyl]-(4-methylphenyl)sulfonylazanide;chlororuthenium(1+);1-methyl-4-propan-2-ylbenzene Chemical compound [Ru+]Cl.CC(C)C1=CC=C(C)C=C1.C1=CC(C)=CC=C1S(=O)(=O)[N-][C@@H](C=1C=CC=CC=1)[C@@H](N)C1=CC=CC=C1 AZFNGPAYDKGCRB-XCPIVNJJSA-M 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- GCPWJFKTWGFEHH-UHFFFAOYSA-N acetoacetamide Chemical compound CC(=O)CC(N)=O GCPWJFKTWGFEHH-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000005354 acylalkyl group Chemical group 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000005078 alkoxycarbonylalkyl group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 238000007112 amidation reaction Methods 0.000 description 1
- 125000004103 aminoalkyl group Chemical group 0.000 description 1
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229940095564 anhydrous calcium sulfate Drugs 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000003287 bathing Methods 0.000 description 1
- 229940090012 bentyl Drugs 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000003460 beta-lactamyl group Chemical group 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- QQHZPQUHCAKSOL-UHFFFAOYSA-N butyl nitrate Chemical compound CCCCO[N+]([O-])=O QQHZPQUHCAKSOL-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 1
- 125000005242 carbamoyl alkyl group Chemical group 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000004181 carboxyalkyl group Chemical group 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- WORJEOGGNQDSOE-UHFFFAOYSA-N chloroform;methanol Chemical compound OC.ClC(Cl)Cl WORJEOGGNQDSOE-UHFFFAOYSA-N 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- NKLCHDQGUHMCGL-UHFFFAOYSA-N cyclohexylidenemethanone Chemical group O=C=C1CCCCC1 NKLCHDQGUHMCGL-UHFFFAOYSA-N 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 125000005265 dialkylamine group Chemical group 0.000 description 1
- 150000001983 dialkylethers Chemical class 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- WDCDAAMJNUHOIY-UHFFFAOYSA-N ethyl acetate;2-propan-2-yloxypropane Chemical compound CCOC(C)=O.CC(C)OC(C)C WDCDAAMJNUHOIY-UHFFFAOYSA-N 0.000 description 1
- VEUUMBGHMNQHGO-UHFFFAOYSA-N ethyl chloroacetate Chemical compound CCOC(=O)CCl VEUUMBGHMNQHGO-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- CUILPNURFADTPE-UHFFFAOYSA-N hypobromous acid Chemical compound BrO CUILPNURFADTPE-UHFFFAOYSA-N 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 125000003392 indanyl group Chemical group C1(CCC2=CC=CC=C12)* 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- GBMDVOWEEQVZKZ-UHFFFAOYSA-N methanol;hydrate Chemical compound O.OC GBMDVOWEEQVZKZ-UHFFFAOYSA-N 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 150000002832 nitroso derivatives Chemical class 0.000 description 1
- BMNDJWSIKZECMH-UHFFFAOYSA-N nitrosyl bromide Chemical compound BrN=O BMNDJWSIKZECMH-UHFFFAOYSA-N 0.000 description 1
- VPCDQGACGWYTMC-UHFFFAOYSA-N nitrosyl chloride Chemical compound ClN=O VPCDQGACGWYTMC-UHFFFAOYSA-N 0.000 description 1
- 235000019392 nitrosyl chloride Nutrition 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000005633 phthalidyl group Chemical group 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000004304 potassium nitrite Substances 0.000 description 1
- 235000010289 potassium nitrite Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- XHFLOLLMZOTPSM-UHFFFAOYSA-M sodium;hydrogen carbonate;hydrate Chemical class [OH-].[Na+].OC(O)=O XHFLOLLMZOTPSM-UHFFFAOYSA-M 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- ZFCQDZKQFPEDJE-UHFFFAOYSA-N thiolane 1,1-dioxide trifluoroborane Chemical compound S1(=O)(=O)CCCC1.B(F)(F)F ZFCQDZKQFPEDJE-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000004306 triazinyl group Chemical group 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Abstract
Description
【発明の詳細な説明】
本発明は、セファロスポリン類の製造法およびその中間
体、すなわち抗菌剤として有用な一般式
で表わされるセファロスポリン(シン異性体)またはそ
の塩の製造法、さらに詳しくは、一般式
で表わされる化合物(シン異性体)と
一般式
で表わさjる化合物を、三弗化硼素またはその錯化合物
の存在下に反応させ、必要に応じ、カルボキシル保護基
を脱離または塩に変換させて、一般式[111〕で表わ
されろセファロスポリン(シン異性体)またはその塩を
得る製造法および一般式〔IDで表わされる有用な中間
体に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing cephalosporins and intermediates thereof, that is, a method for producing a cephalosporin (synisomer) represented by the general formula or a salt thereof useful as an antibacterial agent, and Specifically, the compound represented by the general formula (syn isomer) and the compound represented by the general formula J are reacted in the presence of boron trifluoride or its complex compound, and if necessary, the carboxyl protecting group is removed or The present invention relates to a production method for obtaining a cephalosporin (syn isomer) represented by the general formula [111] or a salt thereof by converting it into a salt, and a useful intermediate represented by the general formula [ID].
本発明者らは、既に、一般式〔■〕で表わされるセファ
ロスポリン(シン異性体)およびその地が抗菌剤として
極めて有用な化合物であることを見出し、先に特許出願
した(特開昭57−99592号、特願昭57−200
382号、同58−67871号、同58−11356
5号、同58−114313号)。The present inventors have already discovered that the cephalosporin (synisomer) represented by the general formula [■] and its derivatives are extremely useful compounds as antibacterial agents, and have previously filed a patent application (Japanese Patent Application Laid-Open No. No. 57-99592, patent application No. 57-200
No. 382, No. 58-67871, No. 58-11356
No. 5, No. 58-114313).
その後、上記一般式〔■〕の化合物またはその塩の製造
法について鋭意研究を重ねた結果、一般式〔IDの化合
物(シン異性体)と一般式[IDの化合物を三弗化硼素
またはその錯化合物の存在下に反応させ、必要匿名じ、
カルボキシル保護基を脱離または塩に変換させることに
よって、一般式[III]の有用なセファロスポリン(
シン異性体)またはその塩が高収率圧かつ容易に得られ
ることを見出し、ここに本発明を完成した。After that, as a result of intensive research on the production method of the compound of the general formula [■] or its salt, we found that the compound of the general formula [ID] (synisomer) and the compound of the general formula [ID] were combined with boron trifluoride or its complex. React in the presence of a compound, the required anonymity,
By eliminating the carboxyl protecting group or converting it into a salt, useful cephalosporins of general formula [III] (
The present invention has been completed based on the discovery that the syn isomer) or a salt thereof can be easily obtained at high yield and pressure.
すなわち、遊離のアミノ基を有する一般式CI]の酸ア
ミドまたはモノ置換酸アミドを三弗化硼素またはその錯
化合物の存在下に一般式〔■〕の化合物と反応させるこ
とによって、はじめて一般式[III)のセファロスポ
リン(シン異性体)またはその塩が高収車にかつ容易に
得られることを見出したものである。That is, by reacting an acid amide of the general formula CI or a monosubstituted acid amide having a free amino group with a compound of the general formula [■] in the presence of boron trifluoride or its complex compound, the general formula [ It has been found that the cephalosporin (syn isomer) or its salt III) can be easily obtained in high yield.
而して、本発明の目的は、優れた抗菌スペクトルを有す
る一般式[I11]のセファロスポリン(シン異性体)
またはその塩の新規製造法および一般式mの新規な化合
物(シン異性体)を提供することにある。Therefore, the object of the present invention is to provide a cephalosporin (syn isomer) of general formula [I11] having an excellent antibacterial spectrum.
An object of the present invention is to provide a new method for producing a salt thereof, and a novel compound (syn isomer) of the general formula m.
なお、本明細書において、特にことわらない限り、アル
キル基とは、直鎖または分枝鎖状C1〜14アルキル、
たとえば、メチル、エチル、n−プロピル、イソプロピ
ル、n−ブチル、イソブチル、see −7”チル、t
ert −’7’チル、ペンチル、ヘキシル、ヘプチル
、オクチル、ドデシルなど;アリールとは、たとえば、
フェニル、トリル、ナフチル、インダニルなど;アルア
ルキルとは、たとえば、ベンジル、フェネチル、4−メ
チルベンジル、ナフチルメチルなど;アシルとは、 C
1〜12アシル、たとえば、アセチル、プロピオニル、
n−ブチリル、インブチリル、バレリル、ピバロイル、
ペンタンカルボニル、シクロヘキサンカルボニル、ベン
ゾイル、ナフトイル、フロイル、テノイルなど;ハロゲ
ン原子とは、フッ素、塩素、臭素、ヨウ素原子などをそ
れぞれ意味する。また低級とは、炭素原子数1〜5を意
味する。In this specification, unless otherwise specified, the alkyl group refers to linear or branched C1-14 alkyl,
For example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, see -7”thyl, t
ert - '7' tyl, pentyl, hexyl, heptyl, octyl, dodecyl, etc.; Aryl is, for example,
Phenyl, tolyl, naphthyl, indanyl, etc.; Aralkyl is, for example, benzyl, phenethyl, 4-methylbenzyl, naphthylmethyl, etc.; Acyl is C
1-12 acyl, such as acetyl, propionyl,
n-butyryl, imbutyryl, valeryl, pivaloyl,
Pentane carbonyl, cyclohexane carbonyl, benzoyl, naphthoyl, furoyl, thenoyl, etc.; halogen atom means fluorine, chlorine, bromine, iodine atom, etc., respectively. Moreover, lower means having 1 to 5 carbon atoms.
さらに一本明細書で使用されている種々の用語中、たと
えば、アルキル、アリール、アルアルキル、アシル基な
どの用語がある場合も、特にことわらない限り上述の意
味を示すものである。Furthermore, among the various terms used in this specification, for example, terms such as alkyl, aryl, aralkyl, and acyl groups have the above-mentioned meanings unless otherwise specified.
一般式CI]におけるR1ば、水素原子または置換され
ていてもよいアルキル、アルアルキル、アリールまたは
複素環式基を意味するが、その複素環式基としては、具
体的には、たとえば、ピラゾリル、イミダゾリル、トリ
アゾリル、テトラゾリル。R1 in the general formula CI] means a hydrogen atom or an optionally substituted alkyl, aralkyl, aryl, or a heterocyclic group, and specific examples of the heterocyclic group include, for example, pyrazolyl, imidazolyl, triazolyl, tetrazolyl.
ピリジル、ピリミジニル、ピリミジニル、ピラジニル、
トリアジニルなどの含窒素5員または6員複素環式基が
挙げられる。これらR1の置換基としては、たとえば、
ハロゲン原子、ニトロ基、アルキル基、アリール基、ア
ルコキシ基、シアノ基、アミノ基、アルキルアミノ基、
ジアルキルアミン基、アシルアミノ基、アシル基、アシ
ルオキシ基、アシルアルキル基、カルボキシル基、アル
コキシカルボニル基、アルコキシカルボニルアルキル基
、カルバモイル基、アミノアルキル基、N−アルキルア
ミノアルキル基、N、N−ジアルキルアミノアルキル基
、ヒドロキシアルキル基、ヒドロキシイミノアルギル基
、アルコキシアルキル基、カルボキシアルキル基、スル
ホアルキル基、スルホ基、スルファモイルアルキル基、
スルファモイル基、カルバモイルアルキル基、カルバモ
イルアルケニル基、N−ヒドロキシカルバモイルアルキ
ル基などが挙げられ、前記したアルキル、アルアルキル
、了り−ルまたは複素環式基はこれら一種以上の置換基
で置換さjていてもよい。これらの置換基のうち、カル
ボキシル基は、後述するR3BおよびR3のところで説
明するカルボキシル保護基で保護されていてもよい。pyridyl, pyrimidinyl, pyrimidinyl, pyrazinyl,
Examples include nitrogen-containing 5- or 6-membered heterocyclic groups such as triazinyl. Examples of these substituents for R1 include:
Halogen atom, nitro group, alkyl group, aryl group, alkoxy group, cyano group, amino group, alkylamino group,
dialkylamine group, acylamino group, acyl group, acyloxy group, acylalkyl group, carboxyl group, alkoxycarbonyl group, alkoxycarbonylalkyl group, carbamoyl group, aminoalkyl group, N-alkylaminoalkyl group, N,N-dialkylaminoalkyl group, hydroxyalkyl group, hydroxyiminoargyl group, alkoxyalkyl group, carboxyalkyl group, sulfoalkyl group, sulfo group, sulfamoylalkyl group,
Examples include sulfamoyl group, carbamoylalkyl group, carbamoylalkenyl group, N-hydroxycarbamoylalkyl group, etc., and the above-mentioned alkyl, aralkyl, ring or heterocyclic group may be substituted with one or more of these substituents. It's okay. Among these substituents, the carboxyl group may be protected with a carboxyl protecting group as explained in R3B and R3 below.
R3aはカルボキシル保護基を、またR3は水素原子ま
たはカルボキシル保護基を示すが、これらカルボキシル
基の保護基としては、従来ペニシリンおよびセファロス
ポリン系化合物の分野で、通常使用されているものが挙
げられる。具体的には、たとえば、アルキル、フタリジ
ル、ジフェニルメチル、アセトキシメチル、ピバロイル
オキシメチル、プロピオニルオキシメチル、ブチリルオ
キシメチル、イソブチリルオキシメチル、バレリルオキ
シメチル、l−アセトキシエチル、1−アセトキシ−n
−プロピル、1−ピバロイルオキシエチル、1−ピバロ
イルオキシ−n−プロピル、ベンゾイルオキシメチル、
1−ベンゾイルオキシエチル、α−ピバロイルオキシベ
ンジル、α−アセトキシベンジル基などが挙げられる。R3a represents a carboxyl-protecting group, and R3 represents a hydrogen atom or a carboxyl-protecting group, and protective groups for these carboxyl groups include those commonly used in the field of penicillin and cephalosporin compounds. . Specifically, for example, alkyl, phthalidyl, diphenylmethyl, acetoxymethyl, pivaloyloxymethyl, propionyloxymethyl, butyryloxymethyl, isobutyryloxymethyl, valeryloxymethyl, l-acetoxyethyl, 1- acetoxy-n
-propyl, 1-pivaloyloxyethyl, 1-pivaloyloxy-n-propyl, benzoyloxymethyl,
Examples include 1-benzoyloxyethyl, α-pivaloyloxybenzyl, α-acetoxybenzyl groups, and the like.
つぎに R4は3位エキソメチレン基と炭素−窒素結合
する置換されていてもよい複素環式基を示すが、その複
素環式基としては、たとえば、テト隣接する窒素原子お
よびスルホニル基と一緒になって、5員項または6員環
を形成する二価の基を示す。)で表わされる基、たとえ
ば、1.2.6−チアジアジン−1,1−ジオキシド、
イソチアゾリジン−1,1−ジオキシド基などの含窒素
5員または6員複素環式基が挙げられる。さらに具体的
には、1− (1,2,3,4−テトラゾリル)、2−
(1,2,3゜4−テトラゾリル)、1−(1,2,
3−トリアゾリル)、2− (1,2,3−)リアゾリ
ル)、1− (1゜2.4−)リアゾリル)、4−(1
,2,4−トリアゾリル)、2,3−ジオキソ−1,2
,3,4−テトラヒドロピラジニル、3.6−シオキソ
ー1.2,3.6−チトラヒドロピリダジニル、6−オ
キソ−1,6−シヒドロピリダジニル、2−オキソ−1
,2−ジヒドロピラジニル、6−オキソ−1,6−ジヒ
ドロピリミジニル、2−オキソ−1,2−ジヒドロピリ
ミジニル、1、2.6−チアジアジン−1,i−ジオキ
シド−2−イル、イソチアゾリジン−1,1−ジオキシ
ド−2−イル基などが挙げられる。Next, R4 represents an optionally substituted heterocyclic group that forms a carbon-nitrogen bond with the exomethylene group at the 3-position. represents a divalent group forming a 5-membered term or a 6-membered ring. ), for example, 1.2.6-thiadiazine-1,1-dioxide,
Examples include nitrogen-containing 5- or 6-membered heterocyclic groups such as isothiazolidine-1,1-dioxide groups. More specifically, 1-(1,2,3,4-tetrazolyl), 2-
(1,2,3゜4-tetrazolyl), 1-(1,2,
3-triazolyl), 2-(1,2,3-)riazolyl), 1-(1゜2.4-)riazolyl), 4-(1
, 2,4-triazolyl), 2,3-dioxo-1,2
, 3,4-tetrahydropyrazinyl, 3,6-thioxo-1,2,3,6-titrahydropyridazinyl, 6-oxo-1,6-cyhydropyridazinyl, 2-oxo-1
, 2-dihydropyrazinyl, 6-oxo-1,6-dihydropyrimidinyl, 2-oxo-1,2-dihydropyrimidinyl, 1,2,6-thiadiazin-1,i-dioxide-2-yl, isothiazolidine -1,1-dioxido-2-yl group and the like.
その複素環式基における置換基としては、R1のところ
で説明した置換基が挙げられる。これらの置換基のうち
、カルボキシル基は% R3aおよヒR3のところで説
明したカルボキシル保護基で保護すれていてもよい。Examples of the substituents in the heterocyclic group include the substituents described for R1. Among these substituents, the carboxyl group may be protected with a carboxyl protecting group as explained in %R3a and R3.
一般式Cm)のセファロスポリン(シン真性体)の塩と
しては、従来ペニシリンおよびセファロスポリン系化合
物の分野で周知の塩基性基または酸性基における塩が挙
げられる。そのような塩基性基における塩としては、た
とえば、塩酸、臭化水素酸、ヨウ化水素酸、硝酸または
硫酸などの鉱酸との塩;シュウ酸、コハク酸、ギ酸、ト
リクロロ酢酸またはトリフルオロ酢酸などの有機カルボ
ン酸との塩;メタンスルホン酸、エタンスルホン酸、ベ
ンゼンスルホン酸、トルエン−2−スルホン酸、トルエ
ン−4−スルホンW、71シチレンスルホン酸(2,4
,6−)リメチルベンゼンスルホン酸)すどのスルホン
酸との塩が挙げられ、また酸性基における塩としては、
たとえば、ナトリウムまたはカリウムなどのアルカリ金
属との塩;カルシウムまたはマ・グネシウムなどのアル
カリ土類金属との塩;アンモニウム塩;トリエチルアミ
ン、トリメチルアミン、アニリン、 N、N−ジメチル
アニリン、ピリジン、ジシクロヘキシルアミンなどの含
窒素有機塩基との塩が挙げられる。Salts of the cephalosporin (synthetic form) of the general formula Cm) include salts with basic groups or acidic groups conventionally known in the field of penicillin and cephalosporin compounds. Salts of such basic groups include, for example, salts with mineral acids such as hydrochloric, hydrobromic, hydroiodic, nitric or sulfuric acids; oxalic, succinic, formic, trichloroacetic or trifluoroacetic acids. Salts with organic carboxylic acids such as methanesulfonic acid, ethanesulfonic acid, benzenesulfonic acid, toluene-2-sulfonic acid, toluene-4-sulfone W, 71 sitylenesulfonic acid (2,4
, 6-) Limethylbenzenesulfonic acid) salts with sulfonic acid, and salts with acidic groups include:
For example, salts with alkali metals such as sodium or potassium; salts with alkaline earth metals such as calcium or magnesium; ammonium salts; triethylamine, trimethylamine, aniline, N,N-dimethylaniline, pyridine, dicyclohexylamine, etc. Examples include salts with nitrogen-containing organic bases.
つぎに、本発明方法の実施態様について説明する。Next, embodiments of the method of the present invention will be described.
本発明の一般式[IIDのセファロスポリンまたはその
塩は、一般式CI]の化合物と一般式〔■〕の化合物を
、三弗化硼素またはその錯化合物の存在下に反応させ、
必要に応じ、カルボキシル保護基を脱離または塩に変換
させることによって得ることができる。The compound of the general formula [IID or a salt thereof is the cephalosporin of the present invention, the general formula CI] and the compound of the general formula [■] are reacted in the presence of boron trifluoride or a complex compound thereof,
If necessary, it can be obtained by eliminating the carboxyl protecting group or converting it into a salt.
一般式〔■〕の化合物は、たとえば、7−アミノセファ
ロスポラン酸を酸の存在下に、通常の三位変換反応(特
開昭57−99592号、特願昭57=200382号
、同57−206873号、同58−67871号、同
5.8−113565号、同58−114313号など
)を行い、その後4位のカルボキシル基に保@基を導入
すれば、容易に得られる。The compound of the general formula [■] can be prepared, for example, by a conventional three-position conversion reaction of 7-aminocephalosporanic acid in the presence of an acid. No. 206873, No. 58-67871, No. 5.8-113565, No. 58-114313, etc.) and then introducing a @ group into the carboxyl group at the 4-position.
本発明で使用される三弗化硼素の錯化合物としては、た
とえば、三弗化硼素とギ酸エチルまたは酢酸エチルなど
とのカルボン酸エステル錯化合物;ジエチルエーテルま
たはジイソプロピルエーテルなどとのジアルキルエーテ
ル錯化合物:スルホランとのスルホラン錯化合物;アセ
トニトリルまたはプロピオニトリルなどとのニトリル錯
化合物などが挙げられ、好ましくは、三弗化硼素のスル
ホラン錯化合物、アセトニトリル錯化合物、ジエチルエ
ーテル錯化合物および酢酸エチル錯化合物が挙げられる
。Examples of boron trifluoride complexes used in the present invention include carboxylic acid ester complexes of boron trifluoride and ethyl formate or ethyl acetate; dialkyl ether complexes of diethyl ether or diisopropyl ether; Examples include sulfolane complex compounds with sulfolane; nitrile complex compounds with acetonitrile or propionitrile, etc., and preferably boron trifluoride sulfolane complex compounds, acetonitrile complex compounds, diethyl ether complex compounds, and ethyl acetate complex compounds. It will be done.
また、本発明では有機溶媒を使用して反応を行うのが好
ましく、使用される有機溶媒としては、タトエハ、ニト
ロメタン、ニトロエタン、ニトロプロパンナトのニトロ
アルカン類;ジエチルエーテル、ジイソプロピルエーテ
ル、ジオキサン、テトラヒドロフラン、エチレンク11
コールジメチルエーテル、アニソール、ジメチルセロソ
ルブなどのエーテル類;ギ酸エチル、炭酸ジエチル、酢
酸メチル、酢酸エチル、蓚酸ジエチル、クロロ酢酸エチ
ル、酢酸ブチルなどのエステル類;塩化メチレン、クロ
ロホルム、1.2−ジクロロエタンナトのハロゲン化炭
化水素類;アセトニトリル、プロピオニトリルなどのニ
トリル類;スルホランなどのスルホラン類などが挙げら
れ、好ましくは、ニトロアルカン類、エステル類、ニト
リル類、ハロゲン化炭化水素類およびスルホランが挙げ
られる。Further, in the present invention, it is preferable to carry out the reaction using an organic solvent, and examples of the organic solvents used include nitroalkanes such as tatoeha, nitromethane, nitroethane, and nitropropanato; diethyl ether, diisopropyl ether, dioxane, tetrahydrofuran, Ethylene 11
Ethers such as cold dimethyl ether, anisole, and dimethyl cellosolve; Esters such as ethyl formate, diethyl carbonate, methyl acetate, ethyl acetate, diethyl oxalate, ethyl chloroacetate, butyl acetate; methylene chloride, chloroform, and 1,2-dichloroethanat. Examples include halogenated hydrocarbons; nitriles such as acetonitrile and propionitrile; sulfolanes such as sulfolane; and preferred examples include nitroalkanes, esters, nitriles, halogenated hydrocarbons, and sulfolane.
また、所望により、これらの溶媒を二種以上混合して用
いることもできる。さらに、これらの有機溶媒と三弗化
硼素で形成される錯化合物を溶媒として使用してもよい
。一般式CI]の化合物の使用量は、一般式〔■〕の化
合物に対して、通常0.7〜5倍モル、好ましくは1〜
3倍モルである。また、三弗化硼素およびその錯化合物
の使用量は、一般式CI]の化合物に対して、通常1〜
3倍モルである。また、本反応は一般に一10〜50℃
で、10分〜20時間で完了する。Furthermore, if desired, two or more of these solvents may be used in combination. Furthermore, a complex compound formed with these organic solvents and boron trifluoride may be used as a solvent. The amount of the compound of general formula CI] to be used is usually 0.7 to 5 times the mole, preferably 1 to 5 times the mole of the compound of general formula [■].
It is 3 times the mole. In addition, the amount of boron trifluoride and its complex compound to be used is usually 1 to
It is 3 times the mole. Additionally, this reaction is generally carried out at -10 to 50°C.
It can be completed in 10 minutes to 20 hours.
この反応において、一般式〔I〕およびCIOの化合物
および三弗化硼素(または三弗化硼素の錯化合物)の添
加順序は、特に限定されるものではないが、好ましくは
、一般式CI]の化合物と三弗化硼素またはその錯化合
物を反応させ、ついで、一般式CIOの化合物を反応さ
せるのがよい。In this reaction, the order of addition of the compound of general formula [I] and CIO and boron trifluoride (or complex compound of boron trifluoride) is not particularly limited, but preferably, the order of addition of the compound of general formula [I] and CIO is It is preferable to react the compound with boron trifluoride or a complex thereof, and then react with the compound of the general formula CIO.
さらに、一般式CIIの化合物と三弗化硼素またはその
錯化合物を反応させて得られる化合物を単離し、ついで
、これと一般式〔■〕の化合物を反応させることが好ま
しい。この場合、一般式mの化合物と三弗化硼素または
その錯化合物を反応させて得られる化合物の使用量は、
一般式[n)の化合物に対して、通常1〜2倍モル(一
般式mの化合物にて換算)である。Furthermore, it is preferable to isolate a compound obtained by reacting the compound of general formula CII with boron trifluoride or a complex compound thereof, and then react this with the compound of general formula [■]. In this case, the amount of the compound obtained by reacting the compound of general formula m with boron trifluoride or its complex compound is:
It is usually 1 to 2 times the mole of the compound of general formula [n] (calculated based on the compound of general formula m).
この反応の系内に水分が存在するとβ−ラクタム環の開
裂など好ましくない副反応を惹起することかあるので、
反応系内を無水の状態に保つことが好ましい。この条件
を満足させるために、反応系内に適当な脱水剤、たとえ
ば、塩化カルシウム、無水硫酸ナトリウム、無水硫酸カ
ルシウム、無水硫酸マグネシウム、モレキュラーシーブ
などの脱水剤を添加してもよい。If water is present in the reaction system, it may cause undesirable side reactions such as cleavage of the β-lactam ring.
It is preferable to maintain the inside of the reaction system in an anhydrous state. In order to satisfy this condition, a suitable dehydrating agent such as calcium chloride, anhydrous sodium sulfate, anhydrous calcium sulfate, anhydrous magnesium sulfate, molecular sieve, etc. may be added to the reaction system.
このようにして得られた一般式[111]のセファロス
ポリンまたはその塩は、従来公知の方法で単離精製する
ことができるばかりでなく、必要に応じ、常法によって
Bsがカルボキシル保護基である一般式〔■〕の化合物
をR3が水素原子である一般式〔■〕の化合物またはそ
の塩に容易に変換することができる。The thus obtained cephalosporin of the general formula [111] or its salt can be isolated and purified by conventionally known methods, and if necessary, Bs can be replaced with a carboxyl protecting group by a conventional method. A certain compound of the general formula [■] can be easily converted into a compound of the general formula [■] in which R3 is a hydrogen atom or a salt thereof.
つぎに、一般式[I]の化合物の製造法について説明す
る。この化合物は、たとえば、下に示す製造法に従って
製造することができる。なお、図式中の一般式[I]の
化合物は新規化合物で、有用な中間体である。Next, a method for producing the compound of general formula [I] will be explained. This compound can be produced, for example, according to the production method shown below. In addition, the compound of general formula [I] in the diagram is a new compound and a useful intermediate.
製 造 法
cH3coc−coNHn’ [V:11
(1)一般式〔V〕の化合物の製造
一般式[V]のニトロソ体シよ、一般式(5)の化合物
にニトロソ化剤を反応させることによって得ることがで
きる。Production method cH3coc-coNHn' [V:11 (1) Production of compound of general formula [V] The nitroso compound of general formula [V] is produced by reacting the compound of general formula (5) with a nitrosating agent. Obtainable.
この反応は、通常溶媒中で行われ、使用される溶媒とし
ては、たとえば、水、酢酸、ベンゼン、メタノール、エ
タノール、テトラヒドロフランなどの反応に不活性な溶
媒が挙げられる。This reaction is usually carried out in a solvent, and examples of the solvent used include solvents inert to the reaction, such as water, acetic acid, benzene, methanol, ethanol, and tetrahydrofuran.
また、これらの溶媒を二種以上混合して用いることもで
きる。Moreover, two or more kinds of these solvents can also be used as a mixture.
つぎに、この反応で使用される好ましいニトロソ化剤と
しては、硝酸およびその誘導体、たとえば、塩化ニトロ
シル、臭化ニトロシルなどのハロゲン化ニトロシル;亜
硝酸ナトリウム、亜硝酸カリウムなどの亜硝酸アルカリ
金属塩;亜硝酸ブチルエステル、亜硝酸ベンチルエステ
ルなどの亜硝酸アルキルエステルなどが挙げられる。ニ
トロソ化剤として亜硝酸の塩を使用する場合には、塩酸
、硫酸、ギ酸、酢酸などの無機もしくは有機の淀の存在
下1c[応を行うのが好ましい。また、ニトロソ化剤と
して亜硝酸アルキルエステルを使用する場合には、アル
カリ金属アルコキシドのような強塩基の存在下に行うと
よい。Preferred nitrosating agents used in this reaction include nitric acid and its derivatives, such as nitrosyl halides such as nitrosyl chloride and nitrosyl bromide; alkali metal salts of nitrite such as sodium nitrite and potassium nitrite; Examples include alkyl nitrites such as butyl nitrate and bentyl nitrite. When a salt of nitrous acid is used as the nitrosating agent, it is preferable to carry out the reaction in the presence of an inorganic or organic base such as hydrochloric acid, sulfuric acid, formic acid or acetic acid. Furthermore, when a nitrous acid alkyl ester is used as a nitrosating agent, it is preferably carried out in the presence of a strong base such as an alkali metal alkoxide.
このニトロソ化剤応は、0°C〜30℃で、10分〜1
0時間で完了つる。This nitrosating agent reaction is carried out at 0°C to 30°C for 10 minutes to 1 hour.
Completed in 0 hours.
(2) 一般式〔■の化合物の製造
一般式〔■の化合物は、一般式N〕の化合物にアルキル
化剤を反応させることによって得ることができる。(2) Production of compound of general formula [■] The compound of general formula [■] can be obtained by reacting the compound of general formula N] with an alkylating agent.
このアルキル化反応は、常法に従って行うことができ、
通常−20〜60℃で、5分〜1o時間で完了する。こ
こで使用される溶媒としては、反応に悪影響を与えない
限りいかなる溶媒でもよく、たとえば、テトラヒドロフ
ラン、ジオキサイメタノール、エタノール、クロロホル
ム、増化メチレン、酢酸エチル、酢酸ブチル、N、N〜
ジメチルホルムアミド、N、N−ジメチルアセトアミド
、水などが挙げられる。また、これらの溶媒を二種以上
混合して用いることもできる。また、使用されるアルキ
ル化剤としては、たとえば、ヨウ化メチル、臭化メチル
、ヨウ化エチル、臭化エチルなどのハロゲン化低級アル
キル、硫酸ジメチル、硫酸ジエチル、ジアゾメタン、ジ
アゾエタン以外はp−)ルエンスルホン酸メチルなどが
挙げられる。アルキル化剤としてジアゾメタン、ジアゾ
エタン以外の化合物を使用する場合には、通常炭酸ナト
リウム、炭酸カリウムなどのアルカリ金属の炭酸塩、水
酸化ナトリウム、水酸化カリウムなどのアルカリ金属の
水酸化物、トリエチルアミン、ピリジンなどの塩基の存
在下に反応させるのがよい。This alkylation reaction can be carried out according to a conventional method,
It is usually completed in 5 minutes to 10 hours at -20 to 60°C. The solvent used here may be any solvent as long as it does not adversely affect the reaction, such as tetrahydrofuran, dioximethanol, ethanol, chloroform, methylene acetate, ethyl acetate, butyl acetate, N, N-
Examples include dimethylformamide, N,N-dimethylacetamide, water, and the like. Moreover, two or more kinds of these solvents can also be used as a mixture. Examples of alkylating agents used include lower alkyl halides such as methyl iodide, methyl bromide, ethyl iodide, and ethyl bromide, dimethyl sulfate, diethyl sulfate, diazomethane, and p-)luene other than diazoethane. Examples include methyl sulfonate. When a compound other than diazomethane or diazoethane is used as an alkylating agent, it is usually an alkali metal carbonate such as sodium carbonate or potassium carbonate, an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide, triethylamine, or pyridine. The reaction is preferably carried out in the presence of a base such as
また、一般式■の化合物は、一般式〔■〕の化合物をア
ンモニアまたは一級アミンで自体公知のアミド化反応に
付すことKより得ることもできる。The compound of general formula (1) can also be obtained by subjecting the compound of general formula (1) to a known amidation reaction with ammonia or a primary amine.
(3) 一般式〔■〕の化合物の製造
一般式〔■〕のハロゲン体は、一般式[VI]の化合物
にハロゲン化剤を反応させることによって得ることがで
きる。(3) Production of compound of general formula [■] The halogen compound of general formula [■] can be obtained by reacting the compound of general formula [VI] with a halogenating agent.
この反応は、通常溶媒中で行われ、使用される溶媒とし
ては、塩化メチレン、クロロホルムなどのハロゲン化炭
化水素;酢酸、プロピオン酸などの有機酸;テトラヒド
ロフラン、ジオキサンなどのエーテルなどの反応に悪影
響を与えない溶媒が挙げられる。また、これらの溶媒を
二種以上混合して用いることもできる。This reaction is usually carried out in a solvent, and the solvents used include halogenated hydrocarbons such as methylene chloride and chloroform; organic acids such as acetic acid and propionic acid; and ethers such as tetrahydrofuran and dioxane, which adversely affect the reaction. Examples include solvents that do not give Moreover, two or more kinds of these solvents can also be used as a mixture.
このハロゲン仕反応は、通常O〜50℃で、30分〜2
4時間で完了する。This halogen reaction is usually carried out at 0 to 50°C for 30 minutes to 2
Complete in 4 hours.
使用されるハロゲン化剤としては、臭素、塩素などのハ
ロゲン;塩化スルフリルなどのハロゲン化スルフリル;
次亜塩素酸、次亜臭素酸、次亜塩素酸ナトリウムなどの
次亜ノ・ロゲン酸またはその塩;N−ブロモスクシンイ
ミド、N−クロロスクシンイミド、N−ブロモフタルイ
ミドなどのN−ハロゲン化イミド化合物士ピリジニウム
ハイトロプロマイトeノクーフロマ()”、2−カルボ
キシエチルトリフェニルホスホニウム・パーブロマイド
などのパーブロマイド化合物などが挙げられる。The halogenating agents used include halogens such as bromine and chlorine; sulfuryl halides such as sulfuryl chloride;
Hypochlorogenic acid or its salts such as hypochlorous acid, hypobromous acid, and sodium hypochlorite; N-halogenated imide compounds such as N-bromosuccinimide, N-chlorosuccinimide, and N-bromophthalimide Examples include perbromide compounds such as pyridinium hytropromite and 2-carboxyethyltriphenylphosphonium perbromide.
(4)一般式[1]の化合物の製造
一般式[I]の化合物は、一般式園の化合物にチオ尿素
で閉環反応させることによって得ることができる。この
閉環反応は、通常溶媒中で行われ、使用される溶媒とし
ては、本反応に悪影響を与えない限りいかなるものでも
よく、たとえば、水、メタノール、エタノール、アセト
ン、テトラヒドロフラン、ジオキサン、N、N−ジメチ
ルホルムアミド、N、N−ジメチルアセトアミド、N−
メチルピリドンなどが挙げられる。(4) Production of compound of general formula [1] The compound of general formula [I] can be obtained by subjecting a compound of the general formula to a ring-closing reaction with thiourea. This ring-closing reaction is usually carried out in a solvent, and any solvent may be used as long as it does not adversely affect the reaction. For example, water, methanol, ethanol, acetone, tetrahydrofuran, dioxane, N, N- Dimethylformamide, N,N-dimethylacetamide, N-
Examples include methylpyridone.
また、これらの溶媒を二種以上混合して用X、Sること
もできる。Further, two or more of these solvents can be mixed for use.
また、この反応において、脱酸剤を添加すると円滑に反
応が進行することもあり、使用される脱酸剤としては、
たとえば、水酸化アルカリ金属塩、炭酸氷菓アルカリ金
属塩、トリエチルアミン、ピリジン、N、N−ジメチル
アニリンなどの無機または有機塩基などが挙げられる。In addition, in this reaction, adding a deoxidizing agent may make the reaction proceed smoothly, so the deoxidizing agent used is
Examples include inorganic or organic bases such as alkali metal hydroxide salts, alkali metal salts of iced carbonate, triethylamine, pyridine, and N,N-dimethylaniline.
反応時間は、通常1〜48時間、好ましくは1〜10時
間である。The reaction time is usually 1 to 48 hours, preferably 1 to 10 hours.
この閉環反応は、o −ioo℃の範囲で行われ、チオ
尿素は、一般式圃〕の化合物に対して、通常1〜数倍モ
ル使用するのがよい。This ring-closing reaction is carried out at a temperature of o - ioo°C, and thiourea is preferably used in an amount of usually 1 to several times the molar amount of the compound represented by the general formula.
なお、本反応は、中間体として、一般式(シン異性体)
前記と同じ意味を有する。)のチアゾリン化合物を経由
することが確認さねた。この反応において、上述のチア
ゾリン化合物を単離し、ついで、脱水反応に付すことに
よって、一般式CI)のチアゾール化合物を得ることも
できる。In addition, in this reaction, as an intermediate, the general formula (syn isomer) has the same meaning as above. ) was confirmed to be via the thiazoline compound. In this reaction, the thiazole compound of general formula CI) can also be obtained by isolating the above-mentioned thiazoline compound and then subjecting it to a dehydration reaction.
以上のようにして、一般式〔■〕のチアゾール化合物の
シン異性体を選択的に、高収率かつ安価に得ることがで
きる。As described above, the syn isomer of the thiazole compound of the general formula [■] can be selectively obtained in high yield and at low cost.
つぎに、本発明を実施例を挙げて説明するが、本髭明は
、これに限定されるものではない。Next, the present invention will be explained with reference to Examples, but the present invention is not limited thereto.
実施例1
(1)アセト酢酸アミド1o1gを水35紅に溶解させ
、水冷下、亜硝酸ナトリウム6.9gを加えて、0〜5
℃で攪拌下に4N−硫酸25j17を30分を要して滴
下する。滴下終了後、同温度で60分間反応させた彼、
飽和炭酸水素ナトリウム水溶液でpH6,0に調整する
。Example 1 (1) Dissolve 101g of acetoacetamide in 35ml of water, add 6.9g of sodium nitrite under water cooling,
While stirring at °C, 4N sulfuric acid 25j17 was added dropwise over 30 minutes. After dropping, he reacted at the same temperature for 60 minutes.
Adjust the pH to 6.0 with a saturated aqueous sodium bicarbonate solution.
不靜物を除、去した後、減圧下に水を留去し、得られた
残留物に酢酸エチル2041/を加えて析出結晶なP取
すれば、融点96〜97℃を示す2−ヒドロキシイミノ
−3−オキソ酪酸アミド86ノ(収率66.2%)を得
る。After removing impurities, water is distilled off under reduced pressure, and ethyl acetate 2041/ is added to the resulting residue to remove the precipitated crystalline P, which yields 2-hydroxyimino having a melting point of 96-97°C. 86 pieces of -3-oxobutyric acid amide (yield 66.2%) are obtained.
IR(KBr)cm 、C=0 167 ONMR(d
a−DMSO) δ値;
2.26 (3H,s、 CHiCO)。IR (KBr) cm, C=0 167 ONMR (d
a-DMSO) δ value; 2.26 (3H, s, CHiCO).
7.46 (I H,b++、 −CON刈)。7.46 (IH, b++, -CON cutting).
\H 7,62(IH,bs、−CON/H)。\H 7,62 (IH, bs, -CON/H).
\旦
1260(IH,u、=N−甲0
(2)2−ヒドロキシイミノ−6−オキソ酪酸アミド6
、59および無水炭酸ナトリウム5.67を20℃で水
201117に俗解させる。さらに、ジメチル硫酸66
ノを20〜25℃で加えて、同温度で2時間攪拌する。\dan1260 (IH, u, = N-K0 (2) 2-hydroxyimino-6-oxobutyric acid amide 6
, 59 and anhydrous sodium carbonate 5.67 are dissolved in water 201117 at 20°C. Furthermore, dimethyl sulfate 66
was added at 20-25°C and stirred at the same temperature for 2 hours.
ついで、析出物を沢取し、得られた相出物にメタノール
10011j”q加えて40〜50℃で30分間攪拌す
る。ついで、不俗物7除去した後、減圧下に各課を留去
し、得られた残留物(てエタノール20mを加えて結晶
を1取すれば、融点156〜157℃の2−(シン)−
メトキシイミノ−3−オキソ酪酸アミド529(収率7
22%)を得る。Then, a lot of the precipitate was collected, 10011j"q of methanol was added to the obtained phase product, and the mixture was stirred at 40 to 50°C for 30 minutes. Then, after removing the impurities 7, each section was distilled off under reduced pressure. Adding 20 ml of ethanol to the resulting residue and taking one crystal gives 2-(syn)- with a melting point of 156-157°C.
Methoxyimino-3-oxobutyric acid amide 529 (yield 7
22%).
IR(KBr) cm 、C=0 1700. i67
ONMR(d6−DMSO) δ値;
2.26 (3H,s、 CHiCO)。IR (KBr) cm, C=0 1700. i67
ONMR (d6-DMSO) δ value; 2.26 (3H,s, CHiCO).
3.96 (3H,s、OCH* )。3.96 (3H, s, OCH*).
7.58(IH,bs、 −CON/H)\基
[312−(シン)−メトキシイミノ−6−オキソ酪酸
アミド7、2 P 4テトラヒドロフラン36m1VC
詩〜させ、40℃で臭素0.87を攪拌下に加える。臭
素による着色が消失するのを確認した後、25〜60℃
で、さらに臭素7.29を攪拌下に加える。同温度で1
時間反応させた抜、減圧下に各課を留去する。得られた
残直に酢酸エチル501および水20#J’7加え、飽
和炭酸水素ナトリウム水浴液でpH6,0に調整した後
、有機層を分取し、飽和食塩水20 mlで洗浄する。7.58 (IH, bs, -CON/H)\ group [312-(syn)-methoxyimino-6-oxobutyric acid amide 7,2 P 4 Tetrahydrofuran 36ml 1VC
At 40° C., add 0.87 g of bromine under stirring. After confirming that the coloring caused by bromine disappears, heat at 25-60°C.
Then, an additional 7.29 g of bromine is added under stirring. 1 at the same temperature
After reacting for some time, each section was distilled off under reduced pressure. Ethyl acetate 501 and water 20#J'7 are added to the obtained residue, and the pH is adjusted to 6.0 with a saturated sodium bicarbonate aqueous solution, and then the organic layer is separated and washed with 20 ml of saturated brine.
ついで、無水硫酸マグネシウムで乾燥させた後、減圧下
に溶媒火留去する。得られた残留物にジイソプロピルエ
ーテル−酢酸エチル(i:i)の混合各課20dを加え
て結晶なP取すれば、融点112〜113℃の4−ブロ
モ−2−(シン)−メトキシイミノ−6−オキソ酪酸ア
ミド92g(収率82.1%)を得る。Then, after drying over anhydrous magnesium sulfate, the solvent was distilled off under reduced pressure. 20 d of diisopropyl ether-ethyl acetate (i:i) mixture is added to the resulting residue to obtain crystalline P, which yields 4-bromo-2-(syn)-methoxyimino-6 with a melting point of 112-113°C. - 92 g (yield 82.1%) of oxobutyric acid amide are obtained.
IR(KBr) cm 、C=0 1715.166O
NMR(dr−DMSO) δ値:
4.02 (3)1. s、OCH* )。IR (KBr) cm, C=0 1715.166O
NMR (dr-DMSO) δ value: 4.02 (3)1. s, OCH*).
4.58 (2H,a、BrCH* CO)。4.58 (2H, a, BrCH*CO).
7.72 (2H,bs、C0NHz )(4)4−フ
ロモー2−(シン)−メトキシイミノ−6−オキソ酪酸
アミド457をエタノール13.5mK懸濁させ、チオ
尿素1.59を加え又20〜30℃で1時間反応させる
。析出晶を1取し、エタノールで洗浄した後、水25;
[懸濁させ、飽和炭酸水素ナトリウム水浴液でpH60
に調整する。ついで、結晶なP取し、水−メタノール(
1:1)の混合溶媒15Rtで再結晶すれば、融点20
8へ209℃の2−(2−アミノチアゾール−4−イル
)−2−(シン)−メトキシイミノ酢酸アミド2.91
(収率71.8%)を得る。7.72 (2H, bs, CO NHz) (4) 4-Flomo 2-(syn)-methoxyimino-6-oxobutyric acid amide 457 was suspended in 13.5 mK of ethanol, 1.59 mK of thiourea was added, and 20~ React at 30°C for 1 hour. Take 1 portion of the precipitated crystals, wash with ethanol, and then add 25 minutes of water;
[Suspend and adjust to pH 60 with saturated sodium bicarbonate water bath solution]
Adjust to. Next, the crystalline P was removed, and water-methanol (
If recrystallized with 15Rt mixed solvent of 1:1), the melting point will be 20
2-(2-aminothiazol-4-yl)-2-(syn)-methoxyiminoacetic acid amide at 209°C to 8 2.91
(yield 71.8%).
−1、ν
IB(KBr) cm 、C=0 1665NMR(a
s DMSO)δ値;
3.84 (3)I、 s、−0(Jら)。-1, ν IB(KBr) cm, C=0 1665NMR(a
s DMSO) δ value; 3.84 (3) I, s, -0 (J et al.).
6.75(IH,”、s][IIH)。6.75(IH,”,s][IIH).
7.26(2H,ba、NHx )。7.26 (2H, ba, NHx).
実施例2
(112−(2−アミノチアゾール−4−イル)−2−
(シン)−メトキシイミノ酢酸アミド10.0りを、三
弗化硼素10.2g言むスルホラン201および無水塩
化メチレン20jljの混合溶媒中へ加える。室温で1
時間反応させた後、結晶をP取する。ついで、結晶を酢
酸エチル100dに懸濁させ、1時間攪拌した後P取す
る。酢酸エチル20Mで2回洗浄し、乾燥すれば、結晶
を14.1g得る。Example 2 (112-(2-aminothiazol-4-yl)-2-
10.0 g of (syn)-methoxyiminoacetic acid amide is added to a mixed solvent of 10.2 g of boron trifluoride, 201 sulfolane, and 20 lj of anhydrous methylene chloride. 1 at room temperature
After reacting for some time, the crystals are collected. Next, the crystals were suspended in 100 d of ethyl acetate, stirred for 1 hour, and then P was collected. Washing twice with 20M ethyl acetate and drying yields 14.1 g of crystals.
IR,(KBr) an 、 16B0.1650.1
620゜1200〜1000
(2)ヒバロイルオキシメチル=7−アミノ−3−〔(
5−メチル−1,2,3,4−テトラゾール−2−イル
)メチル〕−Δ3−セフェムー4−カルボキシレート4
.10gを酢酸エチル41 jj&c浴解させ、(1)
で得られた結晶666vを加えて室温で6時間反応させ
る。ついで、反応液に水41117を加え、炭酸水素ナ
トリウムでpH4,5に調整する。有機層を一分取し、
水20ばて洗浄した後、無水硫酸マグネシウムで乾燥さ
せる。ついで、メシチレンスルホン酸・2水和物2.4
gを加えて室温で1時間反応させる。得られた結晶を1
取し、酢酸エチル511tで洗浄すれば、融点218〜
220℃(分解)を示すピバロイルオキシメチル−7−
j2−(2−アミノチアゾール−4−イル)−2−(シ
ン)−メトキシイミノアセトアミド)−3−[(5−メ
チル−1゜2、 !l、 4−テトラゾール−2−イル
)メチル〕−Δ1−セフェムー4−カルボキシ1ノート
のメシチレンスルホン酸塩7.189(収率905%)
を得る。IR, (KBr) an, 16B0.1650.1
620°1200-1000 (2) Hybaloyloxymethyl = 7-amino-3-[(
5-Methyl-1,2,3,4-tetrazol-2-yl)methyl]-Δ3-cephemu 4-carboxylate 4
.. 10g was dissolved in ethyl acetate 41 jj&c bath, (1)
Add the crystal 666v obtained in step 1 and allow the reaction to proceed at room temperature for 6 hours. Then, water 41117 was added to the reaction solution, and the pH was adjusted to 4.5 with sodium hydrogen carbonate. Take a portion of the organic layer,
After washing with water for 20 minutes, it is dried with anhydrous magnesium sulfate. Then, mesitylene sulfonic acid dihydrate 2.4
g and react at room temperature for 1 hour. 1 of the obtained crystals
If taken and washed with 511 tons of ethyl acetate, the melting point will be 218 ~
Pivaloyloxymethyl-7- showing 220°C (decomposition)
j2-(2-aminothiazol-4-yl)-2-(syn)-methoxyiminoacetamide)-3-[(5-methyl-1°2, !l, 4-tetrazol-2-yl)methyl]- Mesitylene sulfonate of Δ1-cephemu 4-carboxy 1 note 7.189 (905% yield)
get.
実施例6
(112−(2−アミノチアゾール−4−イル)−2−
(シン)−メトキシイミノ酢酸アミド6、 Ogを無水
塩化メチレン13a/[懸濁させ、15〜20℃で三弗
化硼素2.729を含むスルホラン−無水塩化メチレン
(1: 1)の混合溶i10.3紅を加えて同温度で1
0分間反応させる。ついで、ピバロイルオキシメチル−
7−アミノ−3−(5−メチル−1,2,3,4−テト
ラゾール−2−イル)メチル−Δ3−セフェムー4−カ
ルボキシレー) 4.109を含む無水塩化メチレン浴
液13111を加えて30〜35℃で2時間60分反応
させる。ついで、反応液を氷水15−中へ導入し、飽8
′0炭酸水素ナトリウム水溶液でpH5,5に調濱する
。Example 6 (112-(2-aminothiazol-4-yl)-2-
(Syn)-methoxyiminoacetic acid amide 6, Og was suspended in anhydrous methylene chloride 13a/[, and mixed solution of sulfolane-anhydrous methylene chloride (1:1) containing 2.729 boron trifluoride at 15-20°C i10 .3 Add red beni and boil at the same temperature.
Let it react for 0 minutes. Then, pivaloyloxymethyl-
Add anhydrous methylene chloride bath solution 13111 containing 7-amino-3-(5-methyl-1,2,3,4-tetrazol-2-yl)methyl-Δ3-cephemu-4-carboxylene) React for 2 hours and 60 minutes at ~35°C. Then, the reaction solution was introduced into ice water and heated to 80°C.
Adjust the pH to 5.5 with an aqueous sodium bicarbonate solution.
ついで、不溶物を除去した後、有機層を分取し、飽和食
塩水15azで洗浄した後、無水硫酸マグネシウムで乾
燥させる0減圧下に溶媒を留去し、得られた残留物に酢
酸エチル60Jl’2IOえて溶解させた後、メシチレ
ンスルホン酸・2水和物2、369を加えて60分間攪
拌し、析出晶′?P取すれば、融点218〜220℃(
分解)を示すピバロイルオキシメチル=7−(2−(2
−アミノチアゾール−4−イル)−2−(シン)−メト
キシイミノアセトアミド1)−3−(5−メチル−1,
2,5,4−テトラゾール−2−イル)メチル−Δ3−
セフェムー4−カルボキシレートのメシチレンスルホン
酸q6.579(収率802%)を得る。After removing insoluble matter, the organic layer was separated, washed with 15 az of saturated brine, and dried over anhydrous magnesium sulfate. The solvent was distilled off under reduced pressure, and the resulting residue was added with 60 Jl of ethyl acetate. After diluting and dissolving 2IO, mesitylene sulfonic acid dihydrate 2,369 was added and stirred for 60 minutes to precipitate crystals. If P is taken, the melting point is 218-220℃ (
pivaloyloxymethyl = 7-(2-(2
-aminothiazol-4-yl)-2-(syn)-methoxyiminoacetamide 1)-3-(5-methyl-1,
2,5,4-tetrazol-2-yl)methyl-Δ3-
Cephemu 4-carboxylate mesitylene sulfonic acid q6.579 (yield 802%) is obtained.
IR(KBr)am 、C−01782,1745,1
680(2) 表−2に示す反応条件で、上記(1)と
同様に反応を行えば、ピバロイルオキシメチル=7−(
2−(2−アミノチアゾール−4−イル)−2−(シン
)−メトキシイミノアセトアミド〕−3−(5−メチル
−1,2,3,4−テトラゾール−2−イル)メチル−
Δ3−セフェムー4−カルボキシレートのメシチレンス
ルホン酸塩ヲ得る。なお、得られたものの物性(融点、
XR)は、上記(1)で得られた化合物の物性と一致し
た。IR(KBr)am, C-01782,1745,1
680(2) If the reaction is carried out in the same manner as in (1) above under the reaction conditions shown in Table 2, pivaloyloxymethyl =7-(
2-(2-aminothiazol-4-yl)-2-(syn)-methoxyiminoacetamide]-3-(5-methyl-1,2,3,4-tetrazol-2-yl)methyl-
Mesitylene sulfonate of Δ3-cephemu 4-carboxylate is obtained. In addition, the physical properties of the obtained product (melting point,
XR) were consistent with the physical properties of the compound obtained in (1) above.
(3)2−(2−アミノチアゾール−4−イル)−2−
(シン)−メトキシイミノ酢酸アミドの代わりに表−6
に示す原料化合物を用いて、上記(1)と同様に反応を
行えば、ピバロイルオキシメチル−7−(I2−(2−
アミノチアゾール−4−イル)−2−(シン)−メトキ
シイミノアセトアミド)−5−(5−メチル−1,2,
5,4−テトラゾール−2−イル)メチル−Δ1−セフ
ェムー4−カルボキシレートのメシチレンスルホン酸塩
を得る。なお、得られたものの物性(融点、IR)は上
記(1)で得られた化合物の物性実施例4
(1) 2−(2−アミノチアゾール−4−イル)−2
−(シン)−メトキシイミノ酢酸アミド60グを無水塩
化メチレン16m[懸濁させ、15〜20℃で三弗化硼
素272gを含むスルホラン−無水塩化メチレン(1:
1)の混合溶液10.3μを加えて同温度で10分間反
応させる。(3) 2-(2-aminothiazol-4-yl)-2-
Table 6 instead of (syn)-methoxyiminoacetic acid amide
If the reaction is carried out in the same manner as in (1) above using the starting material compound shown in , pivaloyloxymethyl-7-(I2-(2-
aminothiazol-4-yl)-2-(syn)-methoxyiminoacetamide)-5-(5-methyl-1,2,
Mesitylene sulfonate of 5,4-tetrazol-2-yl)methyl-Δ1-cephemu 4-carboxylate is obtained. The physical properties (melting point, IR) of the obtained product are those of the compound obtained in (1) above, Example 4 (1) 2-(2-aminothiazol-4-yl)-2
Suspend 60 g of -(syn)-methoxyiminoacetic acid amide in 16 m of anhydrous methylene chloride [1:
Add 10.3μ of the mixed solution of 1) and react at the same temperature for 10 minutes.
ついで、ジフェニルメチル−7−アミノ−6−(5−メ
チル−1,2,5,4−テトラゾール−2−イル)メチ
ル−Δ3−セフェムー4−カルポキシレー) 4.62
9を言む無水塩化メチレン酸g40−を加えて60〜3
5℃で6時間反応させる。反応液を水5Q++u中に導
入した後、炭酸水素ナトリウムでpH5,5vc調整す
る。不俗物を除去した後有機層を分取し、飽和食塩水2
0ばで洗浄した後、無水硫酸マグネシウムで乾燥させる
。減圧下Vc浴各課留去し、得られた残留物をカラムク
ロマトグラフィー(和光シリカゲル(ニー200、浴出
溶媒:クロロホルム−メタノール)で精製すれば、融点
102〜105℃(分りを示すジフェニルメチル=7−
[2−(2−アミノチアゾール−4−イル)−2−(シ
ン)−メトキシイミノアセトアミド〕−3−(5−メチ
ル−1,2,5,4−テトラソ゛−ルー2−イル)メチ
ル−Δ3−セフェムー4−カルボキンレート4.2 g
(収1;i65.1%)を得る。Then, diphenylmethyl-7-amino-6-(5-methyl-1,2,5,4-tetrazol-2-yl)methyl-Δ3-cephemu-4-carpoxyle) 4.62
Add 9 g of anhydrous methylene chloride to 60 to 3
React at 5°C for 6 hours. After introducing the reaction solution into 5Q++u of water, the pH was adjusted to 5.5vc with sodium hydrogen carbonate. After removing impurities, separate the organic layer and add saturated saline solution 2
After washing under vacuum, it is dried over anhydrous magnesium sulfate. The residue was purified by column chromatography (Wako silica gel (Nie 200, bathing solvent: chloroform-methanol), with a melting point of 102-105°C (diphenylmethyl = 7-
[2-(2-aminothiazol-4-yl)-2-(syn)-methoxyiminoacetamide]-3-(5-methyl-1,2,5,4-tetrasoyl-2-yl)methyl-Δ3 -Cefemu 4-carboxinerate 4.2 g
(Yield 1; i65.1%) was obtained.
XR(KBr) cm 、C−oi778.1720゜
660
(2) (1)で得られたジフェニルメチル−7−42
−(2−アミノチアゾール−4−イル)−2−(シン)
−メトキシイミノアセトアミド)−3−(5−メチル−
1,2,s、 4−テトラゾール−2−イル)メチル−
Δ3−セフェムー4−カルボキシレート645gケトリ
フルオロ11酸35a+7およびアニソール1Qm/の
混合溶媒に啓解させ、室温で1時間反応させる。ついで
、減圧下に溶媒を留去し、残留物にジエチルエーテルを
加えて、得られた結晶なP取し、ジエチルエーテルで十
分洗浄した後乾燥すれば、融点123〜125℃(分解
)を示す7−[2−(2−アミノチアゾール−4−イル
)−2−(シン)−メトキシイミノアセトアミド]−5
−(5−メチル−1,2,3,4−テトラゾール−2−
イル)メチル−Δ3−セフェムー4−カルボン酸ノドリ
フルオロ酢酸塩5.469 (収率92.1チ)を得る
。XR(KBr) cm, C-oi778.1720° 660 (2) Diphenylmethyl-7-42 obtained in (1)
-(2-aminothiazol-4-yl)-2-(syn)
-methoxyiminoacetamide)-3-(5-methyl-
1,2,s,4-tetrazol-2-yl)methyl-
645 g of Δ3-cephemu 4-carboxylate was dissolved in a mixed solvent of 35a+7 ketotrifluoro-11 acid and 1 Qm/anisole, and reacted at room temperature for 1 hour. Then, the solvent was distilled off under reduced pressure, diethyl ether was added to the residue, and the resulting crystalline P was collected, thoroughly washed with diethyl ether, and then dried, showing a melting point of 123-125°C (decomposition). 7-[2-(2-aminothiazol-4-yl)-2-(syn)-methoxyiminoacetamide]-5
-(5-methyl-1,2,3,4-tetrazole-2-
5.469 (yield: 92.1) of methyl-Δ3-cephemu-4-carboxylic acid nodorifluoroacetate is obtained.
−1,ν
xn(xnr)cm 、c−o 1790.1720〜
1635実施例5
実施例2,6または4と同様に反応させて、表−5に示
す化合物を65〜85%の収率で得た。-1, ν xn (xnr) cm, c-o 1790.1720 ~
1635 Example 5 The reaction was carried out in the same manner as in Examples 2, 6 or 4 to obtain the compounds shown in Table 5 in a yield of 65 to 85%.
表−5
(シン異性体)
*塩酸塩(常温で反「ムさせ、塩酸塩ビ得た。)**
ジアステレオマ一体
手 続 補 正 書
昭和60年4月27日
特許庁長官 志 賀 学 殿
1 事件の表示
昭和59年特許願第104759号
2、発明の名称
セファロスポリン類の新規製造法
6、補正をする者
電話 (03) 34B −6611
4、補正命令の日付 自発
5、4正の対象
1)願書の1発明の名称」の佃
1+)明細書の「発明の名称」の欄
l11)明細書の「特許請求の範囲」の欄lv)明細書
の「発明の詳細な説明」の欄6 補正の内容
(I)願書の「発明の名称」の欄の補正「セファロスポ
リン類の新規製造法およびその中間体」の記載を[セフ
ァロスポリン類の新規製造法」と訂正する。Table 5 (Syn isomer) *Hydrochloride (reacted at room temperature to obtain vinyl hydrochloride)**
Diastereomer Integration Procedures Amendment Written April 27, 1985 Manabu Shiga, Commissioner of the Patent Office 1 Indication of the case 1982 Patent Application No. 104759 2 Title of invention New method for manufacturing cephalosporins 6 Amendment. Telephone: (03) 34B-6611 4. Date of amendment order Vol. “Claims” column 1v) “Detailed description of the invention” column 6 of the specification Contents of amendment (I) Amendment to the “Title of the invention” column of the application The description of ``intermediates thereof'' has been corrected to ``a new method for producing cephalosporins''.
(II)明細書の「発明の名称」の欄の補正「セファロ
スポリン類の新規製造法およびその中間体」の記載を[
セファロスポリン類の新規製造法」と訂正する。(II) Amend the “Title of the Invention” column of the specification to include the description “Novel method for producing cephalosporins and intermediates thereof” [
"A new method for producing cephalosporins."
〔め明細書の「特許請求の範1」の欄の補正別紙のとお
り
(ト)明細書の「発明の詳細な説明」の欄の補正1)明
細書第4頁第3行〜第4行
「およびその中間体」の記載を削除する。[Amendment to the "Claims 1" column of the specification As shown in the appendix (g) Amendment to the "Detailed Description of the Invention" column of the specification 1) Page 4, lines 3 to 4 of the specification The description of "and its intermediates" will be deleted.
2)同第5頁下から第6行〜第7行
「および一般式(I)で表わされる有用な中間体」の記
載を削除する。2) The description of "and useful intermediates represented by general formula (I)" in lines 6 and 7 from the bottom of page 5 is deleted.
3)同第5頁最下行〜第6頁第1行
「特願昭57−200382号、同58−7)7871
号、同5B−113565号、同58−114313号
)。」の記載を、
「同59−95085号、同59−193893号、同
60−4191号、同60−6694号)。Jと訂正す
る。3) Page 5, bottom line to page 6, line 1 “Patent Application No. 57-200382, No. 58-7) 7871
No. 5B-113565, No. 58-114313). " has been corrected to "No. 59-95085, No. 59-193893, No. 60-4191, No. 60-6694).J.
4)同第6頁第20行〜第7頁第1行
「および一般式(1)の新規な化合物(シン異性体)」
の記載を削除する。4) Page 6, line 20 to page 7, line 1 “and a novel compound of general formula (1) (syn isomer)”
Delete the description.
5)同第13頁第6行〜第9行
「特願昭57−200382号、同57−206875
号、同5B−67871号、同58−113565号、
同58−114513号」の記載を
[同59−91085号、同59−98089号、同5
9−193893号、同60−4191号、同60−6
694号」と訂正する。5) Page 13, lines 6 to 9 “Patent Application No. 57-200382, No. 57-206875”
No. 5B-67871, No. 58-113565,
No. 58-114513” was changed to “No. 59-91085, No. 59-98089, No. 5
No. 9-193893, No. 60-4191, No. 60-6
No. 694” is corrected.
6)同第16頁第18行〜第20行
「なお、図式中の・・・・・有用な中間体である。」の
記載を削除する。6) On page 16, lines 18 to 20, the statement ``In the diagram... is a useful intermediate.'' is deleted.
7)同第18頁第16行 「硝酸」の記載を、「亜硝酸」と訂正する。7) Page 18, line 16 The description of "nitric acid" has been corrected to "nitrous acid."
8)同第23頁第18行
「実施例」の記載を「参考例および実施例」と訂正する
。8) On page 23, line 18, "Examples" is corrected to "Reference Examples and Examples."
9)同第24頁第1行 「実施例1」の記載を「参考例1」と訂正する0 10)同第30頁第1行 「実施例2」の記載を「実施例1」と訂正する0 11)同第31頁第12行 「実施例3」の記載を「実施例2」と訂正する。9) Page 24, line 1 Correct the description of “Example 1” to “Reference Example 1”0 10) Page 30, line 1 Correct the description of “Example 2” to “Example 1”0 11) Page 31, line 12 The description of "Example 3" is corrected to "Example 2."
12)同第66頁第1行
「実施例4」の記載を「実施例3」と訂正する0
13)同第40頁第1行
「実施例5」の記載を「実施例4」と訂正する0
14)同第40頁第2行
−・ + −L + l ^ i】 養I イー 「
佑 ね上剥1,2または6」と訂正する。12) The description of “Example 4” in the first line of page 66 is corrected to “Example 3”0 13) The description of “Example 5” in the first line of page 40 is corrected as “Example 4” 0 14) Page 40, line 2 - + -L + l ^ i]
Correct it to ``乑 え え え 1, 2, or 6''.
以 上
(別紙)
[2、特許請求の範囲
(1)一般式
で表わされる化合物(シン異性体)と
一般式
で表わされる化合物を、三弗化硼素またばその錯化合物
の存在下に反応させ、必要に応じ、カルボキシル保論基
を脱離または塩に変換させることを特徴とする
一般式
で表わされるセファロスポリン(シン異性体)またはそ
の塩の製造法。Above (Attachment) [2. Claims (1) A compound represented by the general formula (syn isomer) and a compound represented by the general formula are reacted in the presence of boron trifluoride or its complex compound. , A method for producing a cephalosporin (syn isomer) represented by the general formula or a salt thereof, which comprises, if necessary, eliminating a carboxyl group or converting it into a salt.
(2) R’が水素原子である特許請求の範囲第(1)
項記載のセファロスポリン(シン異性体)またはその塩
の製造法。(2) Claim No. (1) in which R' is a hydrogen atom
A method for producing a cephalosporin (syn isomer) or a salt thereof as described in .
(s) R’が置換されていてもよいアルキル基である
特許請求の範囲第(1)項記載のセファロスポリン(シ
ン異性体)またはその塩の製造法。(s) The method for producing a cephalosporin (syn isomer) or a salt thereof according to claim (1), wherein R' is an optionally substituted alkyl group.
(4) R1が置換されていてもよいアリール基である
特許請求の範囲第(1)項記載のセファロスポリン(シ
ン異性体)貰たけその塩の製造法。(4) The method for producing a salt of a cephalosporin (synisomer) according to claim (1), wherein R1 is an optionally substituted aryl group.
(5) 反応を有機溶媒中で行う特許請求の範囲第(1
)〜(4)項いずれかの項記載のセファロスポリン(シ
ン異性体)またはその塩の製造法。(5) Claim No. 1 in which the reaction is carried out in an organic solvent
) to (4) A method for producing a cephalosporin (syn isomer) or a salt thereof according to any one of the items.
(6)有機溶媒が、ニトロアルカン類、エステル類、ハ
ロゲン化炭化水素類、ニトリル類またはスルホランであ
る特許請求の範囲第(5)項記載のセファロスポリン(
シン異性体)またけその塩の製造法。 」(6) The cephalosporin according to claim (5), wherein the organic solvent is a nitroalkane, an ester, a halogenated hydrocarbon, a nitrile, or a sulfolane (
Synthetic isomer) Matakeso salt manufacturing method. ”
Claims (1)
の存在下に反応させ、必要に応じ、カルボキシル保護基
を脱離または塩に変換させることを特徴とする 一般式 で表わされるセファロスポリン(シン異性体)またはそ
の塩の製造法。 f21 R1が水素原子である特許請求の範囲第(1)
項記載のセファロスポリン(シン異性体)またはその塩
の製造法。 (3) R”が置換されていてもよいアルキル基である
特許請求の範囲第11)項記載のセファロスポリン(シ
ン異性体)またはその塩の製造法。 (41R”が置換されていてもよい了り−ル基である特
許請求の範囲第(1)項記載のセファロスポリン(シン
異性体)またはその塩の製造法。 (5)反応を有機溶媒中で行う特許請求の範囲第(1)
〜(4)項いずれかの項記載のセファロスポリン(シン
異性体)またはその塩の製造法。 +6) 有機溶媒が、ニトロアルカン類、エステル類、
ハロゲン化炭化水素類、ニトリル類またはスルホランで
ある特許請求の範囲第(5)項記載のセファロスポリン
(シン異性体)またはその塩の製造法。 (7) 一般式 で表わされる化合物(シン異性体)。[Claims] (1) A compound represented by the general formula (syn isomer) and a compound represented by the general formula are reacted in the presence of boron trifluoride or its complex compound, and if necessary, carboxyl protection is achieved. A method for producing a cephalosporin (syn isomer) represented by the general formula or a salt thereof, characterized by eliminating a group or converting it into a salt. Claim No. (1) in which f21 R1 is a hydrogen atom
A method for producing a cephalosporin (syn isomer) or a salt thereof as described in . (3) A method for producing a cephalosporin (syn isomer) or a salt thereof according to claim 11), wherein R'' is an optionally substituted alkyl group. (Even if 41R'' is substituted) A method for producing a cephalosporin (syn isomer) or a salt thereof according to claim (1), which is a good oryl group. (5) A method for producing a cephalosporin (syn isomer) or a salt thereof according to claim 1)
A method for producing a cephalosporin (syn isomer) or a salt thereof according to any one of items 1 to 4. +6) The organic solvent is nitroalkanes, esters,
The method for producing a cephalosporin (syn isomer) or a salt thereof according to claim (5), which is a halogenated hydrocarbon, a nitrile, or a sulfolane. (7) A compound represented by the general formula (syn isomer).
Priority Applications (48)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59104759A JPS60248691A (en) | 1984-05-25 | 1984-05-25 | Novel preparation of cephalosporin compound and its intermediate |
GB08424417A GB2161476B (en) | 1984-05-25 | 1984-09-27 | 2-aminothiazolyl-2-methoxyimino acetamides and their use in preparing cephalosporins |
PH31281A PH20486A (en) | 1984-05-25 | 1984-09-28 | A process for producing a cephalosporin |
CA000464295A CA1225391A (en) | 1984-05-25 | 1984-09-28 | Process for producing a cephalosporin, an intermediate for the cephalosporin and a process for producing the intermediate |
IN701/CAL/84A IN163562B (en) | 1984-05-25 | 1984-09-29 | |
NZ209725A NZ209725A (en) | 1984-05-25 | 1984-10-01 | Production of cephalosporin derivatives |
AU33751/84A AU555399B2 (en) | 1984-05-25 | 1984-10-01 | 2-amino thiazole derivatives |
ZA847713A ZA847713B (en) | 1984-05-25 | 1984-10-01 | Process for producing a cephalosporin,an intermediate for the cephalosporin,and a process for producing the intermediate |
NZ219361A NZ219361A (en) | 1984-05-25 | 1984-10-01 | Thiazole derivatives |
DE19843436603 DE3436603A1 (en) | 1984-05-25 | 1984-10-05 | NEW METHOD FOR PRODUCING A CEPHALOSPORINE, AN INTERMEDIATE PRODUCT FOR THE CEPHALOSPORINE AND A METHOD FOR PRODUCING THE INTERMEDIATE PRODUCT |
EG621/84A EG16588A (en) | 1984-05-25 | 1984-10-07 | A novel process for producing cephalosporins |
DD84268154A DD234272A5 (en) | 1984-05-25 | 1984-10-08 | NEW METHOD FOR PRODUCING A CEPHALOSPORIN |
CS847593A CS247185B2 (en) | 1984-05-25 | 1984-10-08 | Method of cephalosporine production |
IT48974/84A IT1199207B (en) | 1984-05-25 | 1984-10-08 | PROCEDURE FOR PRODUCING A CEPHALOSPORINE AND AN INTERMEDIATE FOR IT |
BE0/213793A BE900770A (en) | 1984-05-25 | 1984-10-08 | PROCESS FOR THE PRODUCTION OF A CEPHALOSPORIN, AN INTERMEDIATE FOR THE SYNTHESIS OF THIS CEPHALOSPORIN AND A PROCESS FOR THE PRODUCTION OF THIS INTERMEDIATE. |
FR8415373A FR2564840B1 (en) | 1984-05-25 | 1984-10-08 | PROCESS FOR THE PRODUCTION OF A CEPHALOSPORIN, AN INTERMEDIATE FOR THE SYNTHESIS OF THIS CEPHALOSPORIN AND A PROCESS FOR THE PRODUCTION OF THIS INTERMEDIATE |
DD84290158A DD253819A5 (en) | 1984-05-25 | 1984-10-08 | PROCESS FOR PREPARING A NEW INTERMEDIATE PRODUCT FOR CEPHALOSPORINES |
CH4822/84A CH664965A5 (en) | 1984-05-25 | 1984-10-08 | METHOD FOR PRODUCING CEPHALOSPORINES. |
RO121801A RO92777B (en) | 1984-05-25 | 1984-10-09 | Process for the preparation of thiazole derivatives |
AT0320884A AT386412B (en) | 1984-05-25 | 1984-10-09 | METHOD FOR PRODUCING A CEPHALOSPORINE |
FI843959A FI80886C (en) | 1984-05-25 | 1984-10-09 | NYTT FOERFARANDE FOER FRAMSTAELLNING AV 7- / 2- (2-AMINOTIAZOL-4-YL) -2- (SYN) -SUBSTITUERAD OXIMINOACETAMIDO / CEFALOSPORIN. |
ES536633A ES8603895A1 (en) | 1984-05-25 | 1984-10-09 | Novel preparation of cephalosporin compound and its intermediate |
HU843797A HU192469B (en) | 1984-05-25 | 1984-10-09 | Process for production of derivatives of cefem-carbonic acid and their intermediers |
PT79331A PT79331B (en) | 1984-05-25 | 1984-10-09 | Process for producing cephalosporins and of intermediate compounds used for preparing the same |
HU863366A HU201034B (en) | 1984-05-25 | 1984-10-09 | Process for production of intermediere compositions of tiasole of cefalosporine |
NO844036A NO164772C (en) | 1984-05-25 | 1984-10-09 | PROCEDURE FOR THE PREPARATION OF CEPHALOSPORINE DERIVATIVES. |
SE8405043A SE463973B (en) | 1984-05-25 | 1984-10-09 | PROCEDURES FOR PRODUCING A CEPHALOSPORIN, INTERMEDIATE PRODUCT FOR CEFALOSPORIN AND PROCEDURES FOR PRODUCING THE INTERMEDIATE PRODUCT |
PL1984249955A PL144987B1 (en) | 1984-05-25 | 1984-10-09 | Method of obtaining cephalosporines |
RO84115929A RO89363A (en) | 1984-05-25 | 1984-10-09 | PROCESS FOR THE PREPARATION OF CEFALOSPORINE |
PL1984255588A PL145022B1 (en) | 1984-05-25 | 1984-10-09 | Method of obtaining novel derivatives of iminacetamide |
NL8403069A NL8403069A (en) | 1984-05-25 | 1984-10-09 | NEW PROCESS FOR PREPARING A CEPHALOSPORIN, AN INTERMEDIATE PRODUCT FOR THE CEPHALOSPORIN, AND METHOD FOR PREPARING THE INTERMEDIATE PRODUCT. |
DK482184A DK482184A (en) | 1984-05-25 | 1984-10-09 | PROCEDURE FOR MANUFACTURING CEPHALOSPORINES AND INTERMEDIATES FOR USE |
AR298215A AR240827A1 (en) | 1984-05-25 | 1984-10-09 | PROCEDURE FOR THE PREPARATION OF A CEPHALOSPORIN AND COMPOUND EXCLUSIVELY AS AN INTERMEDIARY FOR THE PROCEDURE. |
KR1019840006266A KR870001251B1 (en) | 1984-05-25 | 1984-10-10 | Process for preparing cephalosporin derivatives |
IL73234A IL73234A (en) | 1984-05-25 | 1984-10-14 | Process for producing a cephalosporin,an intermediate for the cephalosporin,and a process for producing the intermediate |
CS853551A CS247197B2 (en) | 1984-05-25 | 1985-05-17 | Method of new intermediate product production for cephalosporines |
LU85909A LU85909A1 (en) | 1984-05-25 | 1985-05-22 | NOVEL PROCESS FOR THE PRODUCTION OF CEPHALOSPORIN, AN INTERMEDIATE PRODUCT FOR CEPHALOSPORINE AND PROCESS FOR THE PRODUCTION OF THE INTERMEDIATE PRODUCT |
US06/753,942 US4656287A (en) | 1984-05-25 | 1985-07-11 | Aminothiazole intermediate for a cephalosporin |
ES546296A ES8604181A1 (en) | 1984-05-25 | 1985-08-20 | Aminothiazole intermediate for a cephalosporin |
NO853578A NO165293C (en) | 1984-05-25 | 1985-09-12 | NEW CEPHALOSPORIN INTERMEDIATES. |
PH33048A PH21264A (en) | 1984-05-25 | 1985-11-12 | 2-(syn)-methoxyiminoacetamide derivatives and process for preparing thereof |
US06/879,540 US4736026A (en) | 1984-05-25 | 1986-06-24 | Novel process for producing a cephalosporin |
AT0024887A AT397086B (en) | 1984-05-25 | 1987-02-06 | Process for the preparation of novel 2-(2-aminothiazol-4- yl)-2-(syn)-alkoxyiminoacetamides |
CA000532283A CA1231343A (en) | 1984-05-25 | 1987-03-17 | 2-(2-aminothiazol-4-yl)-2 (syn)-alkoxyiminoacetamide intermediates |
KR1019870004590A KR870001250B1 (en) | 1984-05-25 | 1987-05-11 | Process for preparing intermediates for cephalosporin |
IN515/CAL/87A IN163740B (en) | 1984-05-25 | 1987-07-03 | |
FI882603A FI82830C (en) | 1984-05-25 | 1988-06-02 | NY FOERENING SOM AER ANVAENDBAR SOM MELLANPRODUKT VID FRAMSTAELLNING AV CEFALOSPORINER OCH FOERFARANDE FOER DESS FRAMSTAELLNING. |
SE8804101A SE502208C2 (en) | 1984-05-25 | 1988-11-14 | Intermediate for cephalosporin and process for its preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59104759A JPS60248691A (en) | 1984-05-25 | 1984-05-25 | Novel preparation of cephalosporin compound and its intermediate |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60089938A Division JPS60252473A (en) | 1985-04-27 | 1985-04-27 | 2-aminothiazole derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60248691A true JPS60248691A (en) | 1985-12-09 |
JPH026757B2 JPH026757B2 (en) | 1990-02-13 |
Family
ID=14389414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59104759A Granted JPS60248691A (en) | 1984-05-25 | 1984-05-25 | Novel preparation of cephalosporin compound and its intermediate |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS60248691A (en) |
AU (1) | AU555399B2 (en) |
DD (2) | DD253819A5 (en) |
ES (1) | ES8603895A1 (en) |
HU (1) | HU201034B (en) |
IN (1) | IN163562B (en) |
PL (1) | PL145022B1 (en) |
ZA (1) | ZA847713B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6172788A (en) * | 1984-09-17 | 1986-04-14 | Toyama Chem Co Ltd | Novel synthetic method of cephalosporin |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8614710D0 (en) * | 1986-06-17 | 1986-07-23 | Ici Plc | Process |
-
1984
- 1984-05-25 JP JP59104759A patent/JPS60248691A/en active Granted
- 1984-09-29 IN IN701/CAL/84A patent/IN163562B/en unknown
- 1984-10-01 ZA ZA847713A patent/ZA847713B/en unknown
- 1984-10-01 AU AU33751/84A patent/AU555399B2/en not_active Ceased
- 1984-10-08 DD DD84290158A patent/DD253819A5/en not_active IP Right Cessation
- 1984-10-08 DD DD84268154A patent/DD234272A5/en not_active IP Right Cessation
- 1984-10-09 PL PL1984255588A patent/PL145022B1/en unknown
- 1984-10-09 HU HU863366A patent/HU201034B/en not_active IP Right Cessation
- 1984-10-09 ES ES536633A patent/ES8603895A1/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6172788A (en) * | 1984-09-17 | 1986-04-14 | Toyama Chem Co Ltd | Novel synthetic method of cephalosporin |
JPH0342278B2 (en) * | 1984-09-17 | 1991-06-26 |
Also Published As
Publication number | Publication date |
---|---|
ZA847713B (en) | 1986-05-28 |
ES536633A0 (en) | 1986-01-01 |
AU555399B2 (en) | 1986-09-25 |
DD253819A5 (en) | 1988-02-03 |
PL255588A1 (en) | 1986-10-21 |
AU3375184A (en) | 1985-11-28 |
JPH026757B2 (en) | 1990-02-13 |
ES8603895A1 (en) | 1986-01-01 |
PL145022B1 (en) | 1988-07-30 |
DD234272A5 (en) | 1986-03-26 |
IN163562B (en) | 1988-10-08 |
HU201034B (en) | 1990-09-28 |
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