JPS6351389A - Cephalosporin derivative, production thereof and composition having antimicrobial activity - Google Patents
Cephalosporin derivative, production thereof and composition having antimicrobial activityInfo
- Publication number
- JPS6351389A JPS6351389A JP61195657A JP19565786A JPS6351389A JP S6351389 A JPS6351389 A JP S6351389A JP 61195657 A JP61195657 A JP 61195657A JP 19565786 A JP19565786 A JP 19565786A JP S6351389 A JPS6351389 A JP S6351389A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- salt
- group
- compound
- tables
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229930186147 Cephalosporin Natural products 0.000 title claims abstract description 33
- 229940124587 cephalosporin Drugs 0.000 title claims abstract description 33
- 239000000203 mixture Substances 0.000 title claims description 30
- 150000001780 cephalosporins Chemical class 0.000 title claims description 28
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 230000000845 anti-microbial effect Effects 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims abstract description 124
- 150000003839 salts Chemical class 0.000 claims abstract description 120
- -1 (substituted)phenyl Chemical group 0.000 claims abstract description 89
- 238000005886 esterification reaction Methods 0.000 claims abstract description 17
- 230000032050 esterification Effects 0.000 claims abstract description 16
- 125000006239 protecting group Chemical group 0.000 claims abstract description 13
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 3
- 125000004423 acyloxy group Chemical group 0.000 claims abstract 2
- 229910052736 halogen Chemical group 0.000 claims abstract 2
- 150000002367 halogens Chemical group 0.000 claims abstract 2
- 125000005842 heteroatom Chemical group 0.000 claims abstract 2
- 229910052760 oxygen Inorganic materials 0.000 claims abstract 2
- 150000002148 esters Chemical class 0.000 claims description 38
- 238000006722 reduction reaction Methods 0.000 claims description 16
- 238000010511 deprotection reaction Methods 0.000 claims description 14
- 230000000844 anti-bacterial effect Effects 0.000 claims description 12
- 125000005843 halogen group Chemical group 0.000 claims description 12
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 238000005755 formation reaction Methods 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 5
- 125000000623 heterocyclic group Chemical group 0.000 claims description 5
- 239000004480 active ingredient Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims 1
- NYUKTFZVAKBIDK-UHFFFAOYSA-N 1h-pyrazole;1,3-thiazole Chemical class C=1C=NNC=1.C1=CSC=N1 NYUKTFZVAKBIDK-UHFFFAOYSA-N 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 125000005210 alkyl ammonium group Chemical group 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000003937 drug carrier Substances 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 claims 1
- 239000011593 sulfur Chemical group 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 85
- 241000894006 Bacteria Species 0.000 abstract description 8
- 230000002829 reductive effect Effects 0.000 abstract description 7
- 238000002360 preparation method Methods 0.000 abstract description 2
- 239000004599 antimicrobial Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 235000002639 sodium chloride Nutrition 0.000 description 111
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 33
- 239000002253 acid Substances 0.000 description 26
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 24
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 21
- 239000000243 solution Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 16
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- 239000002585 base Substances 0.000 description 15
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical class OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 14
- HQOQSFITXGQQDM-SSDOTTSWSA-N methyl (6R)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound COC(=O)C1=CCS[C@@H]2CC(=O)N12 HQOQSFITXGQQDM-SSDOTTSWSA-N 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- 239000007795 chemical reaction product Substances 0.000 description 12
- 125000001424 substituent group Chemical group 0.000 description 12
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical group CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 11
- 239000003960 organic solvent Substances 0.000 description 11
- 238000002425 crystallisation Methods 0.000 description 10
- 230000008025 crystallization Effects 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- NYBWUHOMYZZKOR-UHFFFAOYSA-N tes-adt Chemical class C1=C2C(C#C[Si](CC)(CC)CC)=C(C=C3C(SC=C3)=C3)C3=C(C#C[Si](CC)(CC)CC)C2=CC2=C1SC=C2 NYBWUHOMYZZKOR-UHFFFAOYSA-N 0.000 description 9
- 238000001816 cooling Methods 0.000 description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 7
- 239000004020 conductor Substances 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 239000012046 mixed solvent Substances 0.000 description 7
- 150000007530 organic bases Chemical class 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 7
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 6
- 150000008064 anhydrides Chemical class 0.000 description 6
- 238000004587 chromatography analysis Methods 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 239000003456 ion exchange resin Substances 0.000 description 6
- 229920003303 ion-exchange polymer Polymers 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 238000007363 ring formation reaction Methods 0.000 description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 6
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- 241000191967 Staphylococcus aureus Species 0.000 description 5
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 5
- 125000003545 alkoxy group Chemical group 0.000 description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 5
- 229910052794 bromium Inorganic materials 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical group C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 5
- 238000000638 solvent extraction Methods 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- RJQXTJLFIWVMTO-TYNCELHUSA-N Methicillin Chemical compound COC1=CC=CC(OC)=C1C(=O)N[C@@H]1C(=O)N2[C@@H](C(O)=O)C(C)(C)S[C@@H]21 RJQXTJLFIWVMTO-TYNCELHUSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 150000001338 aliphatic hydrocarbons Chemical group 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000012442 inert solvent Substances 0.000 description 4
- VFQXVTODMYMSMJ-UHFFFAOYSA-N isonicotinamide Chemical compound NC(=O)C1=CC=NC=C1 VFQXVTODMYMSMJ-UHFFFAOYSA-N 0.000 description 4
- 229960003085 meticillin Drugs 0.000 description 4
- 230000036961 partial effect Effects 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 238000000338 in vitro Methods 0.000 description 3
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 3
- GBMDVOWEEQVZKZ-UHFFFAOYSA-N methanol;hydrate Chemical compound O.OC GBMDVOWEEQVZKZ-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- 239000012453 solvate Substances 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 125000004665 trialkylsilyl group Chemical group 0.000 description 3
- XOCUEKDOGKUIHR-ZCFIWIBFSA-N (6r)-3-(iodomethyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid Chemical compound OC(=O)C1=C(CI)CS[C@@H]2CC(=O)N12 XOCUEKDOGKUIHR-ZCFIWIBFSA-N 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 2
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000004217 4-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1OC([H])([H])[H])C([H])([H])* 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- 229920001817 Agar Polymers 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- 241000192125 Firmicutes Species 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 241000594009 Phoxinus phoxinus Species 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 241000589517 Pseudomonas aeruginosa Species 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 2
- 229910052770 Uranium Inorganic materials 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000008272 agar Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 230000001580 bacterial effect Effects 0.000 description 2
- PWLXILYCJRRXMU-VBORYMHYSA-N benzhydryl (6r,7r)-3-[(z)-2-(4-methyl-1,3-thiazol-5-yl)ethenyl]-8-oxo-7-[(2-phenylacetyl)amino]-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound N1=CSC(\C=C/C=2CS[C@H]3N(C([C@H]3NC(=O)CC=3C=CC=CC=3)=O)C=2C(=O)OC(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1C PWLXILYCJRRXMU-VBORYMHYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 150000008050 dialkyl sulfates Chemical class 0.000 description 2
- 239000002552 dosage form Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003623 enhancer Substances 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 2
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 208000015181 infectious disease Diseases 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 2
- 125000001148 pentyloxycarbonyl group Chemical group 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 159000000001 potassium salts Chemical class 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 150000003222 pyridines Chemical class 0.000 description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000000829 suppository Substances 0.000 description 2
- 208000024891 symptom Diseases 0.000 description 2
- 229940095064 tartrate Drugs 0.000 description 2
- 150000003536 tetrazoles Chemical class 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- 125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 description 2
- BPJMKZXQPQAFCR-OMNKOJBGSA-N trimethylsilyl (6R)-4-methyl-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound C[Si](C)(C)OC(=O)C1=CC(S[C@H]2N1C(C2)=O)C BPJMKZXQPQAFCR-OMNKOJBGSA-N 0.000 description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
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- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
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Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Cephalosporin Compounds (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
く技術分野〉
本発明はセファ0スポリ/誘導体、その製造法及び抗菌
活性組成物に関する。更に詳細には、本発明は強力な抗
菌活性を有し、多数のダラム陽性菌、ダラム陰性菌の生
育を強力に阻止する新規セフ70スポリン誘導体、その
製造法及び抗菌活性組成物に関する。DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a CefaOspoli/derivative, a method for producing the same, and an antibacterial active composition. More specifically, the present invention relates to a novel Cef70sporin derivative that has strong antibacterial activity and strongly inhibits the growth of a large number of Durum-positive and Durum-negative bacteria, a method for producing the same, and an antibacterial active composition.
〈背景技術〉
セフアルスポリン骨格の7位に、2−フエノキシイミ/
−2−(2−7ミノチ7ゾールー4−イル)アセトアミ
ド基を有するセファロスポリン誘導体は、知られており
特開昭54−9296号公報にフェノキシイミノ基の例
が開示されている。しかしながら3位の置換基について
は具体的には非常に狭い範囲に限られており第4級アン
モニウムメチル基のものは合成はおろかその明細書中に
は何等の具体的開示もなされていない。<Background technology> 2-phenoxyimide/
Cephalosporin derivatives having a -2-(2-7 minothi-7zol-4-yl)acetamide group are known, and an example of a phenoxyimino group is disclosed in JP-A-54-9296. However, the substituent at the 3-position is specifically limited to a very narrow range, and the quaternary ammonium methyl group is not synthesized or even specifically disclosed in the specification.
一方、3位に第4級7ンモニクムメチル基を有する七フ
7I:Iスポリン肪導体は数多く知られており例えば特
開昭58−210093号、59−1490号+59−
t0593号+ 59 13786゜13787.13
788号+59−21695号、59−31791号、
59−82390号、 59−130888号、59−
130294.130295号+ 59−176293
号、59−1.90994号+60−81186号、6
〇−67484号、60−78988号、60−105
684号。On the other hand, many heptaph 7I:I sporin fatty conductors having a quaternary heptammonicum methyl group at the 3-position are known, such as JP-A-58-210093 and JP-A-59-1490+59-
No. t0593 + 59 13786°13787.13
No. 788 + No. 59-21695, No. 59-31791,
No. 59-82390, No. 59-130888, 59-
130294.130295 + 59-176293
No. 59-1.90994 + No. 60-81186, 6
〇-67484, 60-78988, 60-105
No. 684.
60−97982号、60−94984号、 60−1
20889号、60−136586.136587号、
60−166689号、60−16388号、60−
163816号、6〇−181090号、60−188
389号、60−197692号、60−224694
号、 60−226884.226885号、60−2
28487号、60−237090号、6o−2524
85号、61−7280号+61−17515号。No. 60-97982, No. 60-94984, 60-1
No. 20889, No. 60-136586.136587,
No. 60-166689, No. 60-16388, 60-
No. 163816, No. 60-181090, No. 60-188
No. 389, No. 60-197692, No. 60-224694
No. 60-226884.226885, 60-2
No. 28487, No. 60-237090, No. 6o-2524
No. 85, No. 61-7280 + No. 61-17515.
61−22089号、61−63685号、61−78
792号、61−91192号、61−97291号、
61−115087号等が挙げられる。しかしながらこ
れらは7位の7シル置換基に7リールオキシイミノ基を
有する七77gスポリン誘導体はついては全(何も触れ
られていない。61-22089, 61-63685, 61-78
No. 792, No. 61-91192, No. 61-97291,
61-115087 and the like. However, these are all 777g sporin derivatives having a 7-lyloxyimino group in the 7-syl substituent at the 7-position (no mention is made of them).
〈発明の開示)
本発明の目的は7位に特定構造の7リールオキシイミ7
基を有する7シル置換基を持ち、3位に第4級芳香族ア
ンモニウムメチル基を有する新規なセファ0スポリン誘
導体を提供することi℃ある。<Disclosure of the Invention> The object of the present invention is to provide a 7-aryl oxyimide 7 with a specific structure at the 7th position.
It is an object of the present invention to provide novel Cephalosporin derivatives having a 7-syl substituent with a quaternary aromatic ammonium methyl group in the 3-position.
本発明の更に他の目的は、ダラム陽性菌及びダラム陰性
菌に対して強力な抗菌活性を有する新規なセファ0スポ
リン誘導体を提供することにある。Still another object of the present invention is to provide a novel cephalosporin derivative having strong antibacterial activity against Durum-positive and Durum-negative bacteria.
本発明の更に他の目的は近年ダラム陽性暇感染症に用い
られて来たセファロスポリン系抗生物質に耐性を示すメ
チシリン耐性黄色ブドー球菌等にも充分な抗菌力を有す
るセファμスボリ/誘導体を提供することにある。Still another object of the present invention is to develop cephalosporins/derivatives that have sufficient antibacterial activity against methicillin-resistant Staphylococcus aureus, etc., which are resistant to cephalosporin antibiotics that have been used to treat Durham-positive infections in recent years. It is about providing.
本発明の更に他の目的は、新規なセファロスポリン誘導
体の製造法及び抗菌活性組成物を提供することにある。Still another object of the present invention is to provide a novel method for producing cephalosporin derivatives and an antibacterial active composition.
本発明の他の目的及び利点は以下の記述から明らかとな
ろう。Other objects and advantages of the invention will become apparent from the description below.
本発明によれば、こtlらの目的及び利点は次のセフア
ルスポリン肪導体によって達成される。According to the present invention, these objects and advantages are achieved by the following cephalsporin fat conductor.
すなわち、本発明は下記式(1) で表わされる七77pスポリン誘導体である。That is, the present invention is based on the following formula (1) It is a 777p sporin derivative represented by
〈発明を実施するための最良の形態〉
式(1)のセファロスポリン誘導体は、式で表わされる
2−7ミノチ7ゾールー4−イル基の部分構造を有する
。該部分構造は2−アミノチアゾリン−4−イル基に容
易に異性化することが可能である。それ故、本発明の式
(1)のセファ0スポリン誘導体は、これらのいずれの
互変異性体であってもよく、本発明においては、いずれ
の互変異性体も包含される。<BEST MODE FOR CARRYING OUT THE INVENTION> The cephalosporin derivative of formula (1) has a partial structure of a 2-7 minothi7zol-4-yl group represented by the formula. This partial structure can be easily isomerized to a 2-aminothiazolin-4-yl group. Therefore, the Cefa-Osporin derivative of formula (1) of the present invention may be any of these tautomers, and the present invention includes any of these tautomers.
式(1)のセファロスポリン誘導体においては、式
で表わされる部分構造を有している。該部分構造は式
%式%
で表わされるシン型、式
C−
R”O’
で表わされるアンチ型、あるいはこれら二ツの異性体の
任意の割合いの混合であってもよい。The cephalosporin derivative of formula (1) has a partial structure represented by the formula. The partial structure may be a syn-type represented by the formula %, an anti-type represented by the formula CR"O', or a mixture of these two isomers in any proportion.
本発明のセファ0スポリン誘導体においては、シン型が
強力な抗菌活性を有するので好ましい。Among the Cefa-Osporin derivatives of the present invention, the syn-type is preferred because it has strong antibacterial activity.
式(1)において、R1は水素原子又はアミン基の保護
基を表わす。アミ7基の保護基としては、7シル基、置
換されていてもよい7ラルキル基。In formula (1), R1 represents a hydrogen atom or a protecting group for an amine group. As a protecting group for the amine 7 group, a 7 syl group and an optionally substituted 7 ralkyl group are used.
トリアルキルシリル基等が拳げられる。かかる7シル基
としては、例えばホルミル、アセチル。Trialkylsilyl groups, etc. are exposed. Examples of such 7-syl group include formyl and acetyl.
プロピオニル、ブチリル、 1so−ブチリルtバレリ
ル+ iso /Cレリル、オキザリル、スクシニル
、ピバロイルなどの低級フルカッイル基;メトキシカル
ボニル、エトキシカルボニル、プロポキシカルボニル、
1so−プロポキシカルボニル、ブトキシカルボニル
、ペンチルオキシカルボニルなどの低級アルコキシカル
ボニル基;メシル、エタンスルホニル、プロパンスルホ
ニル、1so−7’ロパンスルホニル、ブタンスルホニ
ルナトノ低級アルカンスルホニル基;ベンゾイル、トル
オイル、ナフトイル、フタロイルなどの70イル基;フ
ェニル7セチル、フェニルプロピオニルなどの7ラカノ
イル基;ベンゾイルオキシカルボニルなどの7ラルコキ
シカルボニル基等が挙げられる。かかるアシル基は、適
当な置換基を1個以上有していてもよい。置換基として
は例えば、塩素、臭素、ヨウ素、弗素ナトのハーグン原
子;シアノ基;メチル、エチル、プロピル、ブチルなど
の低級フルキル基等が挙げられる。Propionyl, butyryl, 1so-butyryl tvaleryl + iso /C lower furucyl groups such as leryl, oxalyl, succinyl, pivaloyl; methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl,
Lower alkoxycarbonyl groups such as 1so-propoxycarbonyl, butoxycarbonyl, pentyloxycarbonyl; mesyl, ethanesulfonyl, propanesulfonyl, 1so-7'ropanesulfonyl, butanesulfonyl natono lower alkanesulfonyl groups; benzoyl, toluoyl, naphthoyl, phthaloyl, etc. Examples include 70yl group; 7lakanoyl group such as phenyl 7cetyl and phenylpropionyl; 7ralkoxycarbonyl group such as benzoyloxycarbonyl; and the like. Such an acyl group may have one or more suitable substituents. Examples of the substituent include Hagun atoms such as chlorine, bromine, iodine, and fluorine; cyano groups; and lower furkyl groups such as methyl, ethyl, propyl, and butyl.
置換基を有していてもよい7ラルキル基としては例えば
、ベンジル、4−メトキシベンジル。Examples of the 7ralkyl group which may have a substituent include benzyl and 4-methoxybenzyl.
フェネチル、トリチル、3.4−ンメトキシベンジルな
どが挙げられる。トリフルキルシリル基としては例えば
、トリメチルシリルvトリエチルシリル、トリブチルシ
リル、t−ブチルジメチルシリルなどのトリアルキルシ
リル基等が挙げられる。Examples include phenethyl, trityl, 3,4-methoxybenzyl and the like. Examples of the triflukylsilyl group include trialkylsilyl groups such as trimethylsilyl v triethylsilyl, tributylsilyl, and t-butyldimethylsilyl.
式(1)におけるR”は置換もしくは非置換のフェニル
基であり1g1換基を有する場合その例とし【はメチル
9エチヌ、プロピル、 1so−プロピル等の直鎖もし
くは分岐鎖状のC1〜C4フルキル基;フルオーメチル
、トリフルオルメチル、2−フルオルエチル!りppメ
チルνジクロロメチル、トリクI:Igメチル、ブロモ
メチル、ヨードメチル等の低級ハロゲノフルキル基;ビ
ニル7リル等のCオルC,アルケニル基;エチニル、2
−プロピニル等のC!〜C,アルキニル基;シクロプロ
ピル、シクロペンチル、シクロヘキシル等のC5−C,
ジクロフルキル基;シアノ基;カルボキシル基;カルボ
キシメチル基;カルボキシメチルオキシ基;スルホ基;
スルホメチル基;スルホエチル基;カルバモイル基;カ
ルバモイルオキシ基;ヒドロキシ基;ヒドロキシメチル
基;塩素、臭素、ヨウ素、弗素のハロゲン原子;低級フ
ルキルカルボニルオキシ基;アミノ基;7ミノメチル基
;ホルミル7ミ7基;低級アルキルカルボニノL−7ミ
7基;スルホン7ミド基;低級フルキルカルボニル基;
低級アルコキシ基;チオカルバモイル基及び置換又は非
置換の7リール基等があげられるが好ましくは式6Xn
〔ここでXはハロゲン原子、低級フルキル基。In the formula (1), R'' is a substituted or unsubstituted phenyl group, and when it has 1g1 substituent, an example thereof is a linear or branched C1-C4 furkyl group such as methyl9ethinu, propyl, 1so-propyl, etc. Groups: fluoromethyl, trifluoromethyl, 2-fluoroethyl!trippmethylvdichloromethyl, lower halogenofurkyl groups such as Ig-methyl, bromomethyl, iodomethyl; C-ol C, alkenyl groups such as vinyl 7-lyl; ethynyl, 2
-C such as propynyl! ~C, alkynyl group; C5-C such as cyclopropyl, cyclopentyl, cyclohexyl,
Dichlorofurkyl group; cyano group; carboxyl group; carboxymethyl group; carboxymethyloxy group; sulfo group;
Sulfomethyl group; Sulfoethyl group; Carbamoyl group; Carbamoyloxy group; Hydroxy group; Hydroxymethyl group; Halogen atoms of chlorine, bromine, iodine, and fluorine; Lower fulkylcarbonyloxy group; Amino group; 7minomethyl group; Formyl 7m7 group ; lower alkyl carbonino L-7 group; sulfone 7 group; lower furkyl carbonyl group;
Lower alkoxy group; examples include thiocarbamoyl group and substituted or unsubstituted 7-aryl group, preferably those of formula 6Xn
[Here, X is a halogen atom or a lower furkyl group.
低級アルコキシ基、ハpゲノ低級フルキル基。Lower alkoxy group, hapgeno lower furkyl group.
低級フルケニル基、低駁アルキニル基、炭素数3〜7の
ジクロフルキル基、フェニル基、シフ)基1−CONH
,または−〇)l(CL)m C00Y (ここでY
は水素原子もしくは低級フルキル基、 1.mは0また
は1を示す)を示しnは1〜5の整数を示す〕で表わさ
れる置換フェニル基である。Lower fulkenyl group, lower alkynyl group, dichlorofurkyl group having 3 to 7 carbon atoms, phenyl group, Schiff) group 1-CONH
, or -〇)l(CL)m C00Y (where Y
is a hydrogen atom or a lower furkyl group, 1. m represents 0 or 1) and n represents an integer of 1 to 5].
ゲン原子、ハロゲノ低級フルキル基、 −CON)(。Gen atom, halogeno lower furkyl group, -CON) (.
または、 (OIAI (CHりm cooy (こ
こでYは水素原子モジくは低級アルキル基を、1.mは
0または1を示す)で表わされる置換フェニル基である
。Alternatively, it is a substituted phenyl group represented by (OIAI(CHrimcooy) (where Y represents a hydrogen atom or a lower alkyl group, and 1.m represents 0 or 1).
特に弗素等のハロゲン原子はメチシリン耐性黄色ブドー
球菌に対する活性を著しく向上させるので特に好ましい
。In particular, halogen atoms such as fluorine are particularly preferred since they significantly improve the activity against methicillin-resistant Staphylococcus aureus.
またカルボキシル基、カルバモイル基はセファ0スポリ
ン誘導体の水溶性を向上させるため注射剤としての用途
にvfK好ましい。Further, a carboxyl group and a carbamoyl group improve the water solubility of the Cephasporin derivative, so vfK is preferable for use as an injection.
R1の〜○で示される複素芳香族カチオンは含窒素芳香
族アミンから誘導される第4級アンモニウム基であり対
応する塩基として例えばピラゾール、イミダゾール、ト
リアゾール?テトラゾール、インキサゾール、オキサゾ
ール。The heteroaromatic cation represented by ~○ in R1 is a quaternary ammonium group derived from a nitrogen-containing aromatic amine, and the corresponding base includes, for example, pyrazole, imidazole, triazole? Tetrazole, inxazole, oxazole.
チアゾール、チアジアゾール、インチアゾール。Thiazole, thiadiazole, inthiazole.
オキサジアゾール、ピリンン、ピリダジン、ピリミジン
、ピラジン、トリアジン等が挙げられる。Examples include oxadiazole, pyrin, pyridazine, pyrimidine, pyrazine, triazine and the like.
またこれらのアンモニウム基は1個以上の同−又は相異
なる置換基で置換されていても良くかかるru置換基し
て置換もしくは非置換のフルキル基;シアノ基;カルボ
キシ基;アルコキシカルボニル基;カルバモイル基;カ
ルバモイルオキシ基;複素環基;水酸基;アルコキシ基
;又はハロゲン原子が挙げられる。Furthermore, these ammonium groups may be substituted with one or more of the same or different substituents, and the ru substituent may be a substituted or unsubstituted furkyl group; a cyano group; a carboxy group; an alkoxycarbonyl group; a carbamoyl group. ; carbamoyloxy group; heterocyclic group; hydroxyl group; alkoxy group; or halogen atom.
非置換のフルキル基としては、例えば、メチル、エチル
、プロピル+ 1so−プロピル、ブチル、5ee−ブ
チル、 tert−ブチル書ベンチルッヘキシルなどの
直鎖もしくは分岐状のC+ −Co フルキル基が挙げ
られる。かかるフルキル基の置換基としては1例えば、
水酸基;シアノ基;カルバモイルオキシ基;メトキシ、
フトキシ、ブトキシ、ペンチルオキシ、ヘキシルオキシ
などのC,−C,低級アルコキシ基;カルボキシ基;2
15−ジヒドq −2−メチル−5−オキソトリ7ジン
ー3−イル、2,5−ジヒドq −6−ヒドpキシ−2
−メチル−5−オキソトリフジン−3−イルなどの複素
環基等が挙げられる。Examples of the unsubstituted furkyl group include linear or branched C+-Co furkyl groups such as methyl, ethyl, propyl+1so-propyl, butyl, 5ee-butyl, tert-butyl, and benzylhexyl. Examples of substituents for such a furkyl group include, for example,
Hydroxyl group; Cyano group; Carbamoyloxy group; Methoxy,
C, -C, lower alkoxy groups such as phthoxy, butoxy, pentyloxy, hexyloxy; carboxy group; 2
15-dihydroq -2-methyl-5-oxotri7din-3-yl, 2,5-dihydroq -6-hydropx-2
Examples include heterocyclic groups such as -methyl-5-oxotrifudin-3-yl.
フル;キシカルボニル基としては、例えば、メトキシカ
ルボニル、エトキシカルボニルpポキシカルポニル,ブ
トキシカルボニル、ペンチルオーキシカルボニル、ヘキ
シルオキシカルボニルなどが挙げられる。Examples of the full;oxycarbonyl group include methoxycarbonyl, ethoxycarbonyl p-poxycarbonyl, butoxycarbonyl, pentyloxycarbonyl, hexyloxycarbonyl, and the like.
複素環基としては、例えば、2,5−ジヒドロ−2−メ
チル−5−オキソトリ7ジンー3−イル、2.5−ジヒ
ドロ−6−ヒドpキシ−2−メチル−5−オキソトリア
ジン−3ーイル、2−7ミノチ7ゾールー4−イルなど
が挙げられる。Examples of the heterocyclic group include 2,5-dihydro-2-methyl-5-oxotriazin-3-yl, 2,5-dihydro-6-hydro-poxy-2-methyl-5-oxotriazin-3-yl , 2-7minothi7sol-4-yl, and the like.
アルコキシ基としては,例えば、メトキシ。Examples of alkoxy groups include methoxy.
エトキシ、プpポキン,ブトキシ、ペンチルオキシなど
が挙げられる。Examples include ethoxy, pupoquine, butoxy, pentyloxy and the like.
/% Iffゲン原子とし【は、例えば塩素,臭素。/% Iff gene atom [ is, for example, chlorine, bromine.
ヨウ素などが挙ザられる。Examples include iodine.
また縮合する環は前記複素芳香環でも良く又ベンゼン環
,ナフタレン環等の芳香族炭化水素環,シクロペンタン
環等の飽和脂肪族炭化水素環,シクロペンテン環等の不
飽和脂肪族炭化水素環であっても良い。The condensed ring may be the above-mentioned heteroaromatic ring, or may be an aromatic hydrocarbon ring such as a benzene ring or a naphthalene ring, a saturated aliphatic hydrocarbon ring such as a cyclopentane ring, or an unsaturated aliphatic hydrocarbon ring such as a cyclopentene ring. It's okay.
またこれらの飽和あるいは不飽和の脂肪族炭化水素環は
酸素原子,硫黄原子,窒素原子により更に置換されてい
ても良い。Further, these saturated or unsaturated aliphatic hydrocarbon rings may be further substituted with an oxygen atom, a sulfur atom, or a nitrogen atom.
好ましい複素芳香族カチオンの例としてはビラゾリクム
ー,チアゾリウム、オキザゾリウムーまたはビリジニク
ムーカチオンが挙げられる。Examples of preferred heteroaromatic cations include the virazolium, thiazolium, oxazolium or viridinic moo cations.
式(1)の七77戸スポリン誘導体はベタイン構造を有
するが、本発明のセファI:Iスポリン誘導体は、例え
ばこれらのベタイン構造から誘導される塩であってもよ
い。かかる塩としてl’L f3付加塩が挙げられ、例
えば、塩酸塩,臭化水素酸塩。Although the seven-sporin derivative of formula (1) has a betaine structure, the Cepha I:I sporin derivative of the present invention may be, for example, a salt derived from these betaine structures. Such salts include l'L f3 addition salts, such as hydrochloride, hydrobromide.
硫酸塩,リン酸塩などの無機酸塩:酢e塩,トリクpロ
酢酸塩,トリフルオロ酢酸塩,g酸塩。Inorganic acid salts such as sulfates and phosphates: acetic acid salts, trichloroacetic acid salts, trifluoroacetic acid salts, g salts.
フマール酸塩,マレイン酸塩,酒石酸塩,メタンスルホ
ン酸塩,ベンゼンスルホンWR 塩+ トルエンスルホ
ン酸塩などの有機酸塩;7ルギン酸塩!アスパラギン酸
塩,グルタミン酸塩などのアミノ酸塩等が挙げられる。Organic acid salts such as fumarate, maleate, tartrate, methanesulfonate, benzenesulfone WR salt + toluenesulfonate; 7 ruginate! Examples include amino acid salts such as aspartate and glutamate.
これらの酸付加塩は例えば下記式(1’) l (1”
)で表わされる(下記式においては% R’を7ミノ基
として例示している。)5
OOH
式(1’) + (1”) K i=: イテ, Ar
’? ハ、Cle, Bre。These acid addition salts are, for example, represented by the following formula (1') l (1"
) (In the following formula, % R' is exemplified as a 7-mino group.) 5 OOH Formula (1') + (1") K i =: Ite, Ar
'? Ha, Cle, Bre.
CH,Coo”、 CCl,Cooe, CF,COO
etL 、!l’ ノー[ a 酸)陰イオンを表わし
、AQはso!e, c,oρ などの二塩基酸の陰イ
オンを表わし、AQはpo:eなどの三塩基酸の陰イオ
ンを表わす。CH,Coo", CCl,Cooe, CF,COO
etL,! l' represents no [a acid) anion, and AQ is so! AQ represents an anion of a dibasic acid such as e, c, oρ, etc., and AQ represents an anion of a tribasic acid such as po:e.
式(11のセファ0スポリン誘導体の他の壇としては、
4位のjJルポキシ基における塩が挙げられる。かかる
塩としては、例えばアルカリ金属塩(ナトリウム塩,カ
リウム塩など)、7ン七ニウム塩,有機塩基との塩(ト
リエチルアミン塩,トリメチルアミン塩,ピリジン塩な
ど)等が挙げられる。Other formulas for the Cephasporin derivative of formula (11) are:
Examples include salts at the jJ lupoxy group at the 4-position. Examples of such salts include alkali metal salts (sodium salts, potassium salts, etc.), heptadium salts, salts with organic bases (triethylamine salts, trimethylamine salts, pyridine salts, etc.), and the like.
式(1)のセファロスポリン舖導体は、4位のカルボキ
シ基がニスフル化されたエステル体であつ【もよい。か
かるエステルとしては生町学的に容易に加水分解される
ものが好ましい。このようなエステルとしては,例えば
、メトキシメチルラエトキツメチル,メトキシエチル、
エトキシエチルエステルなどのフルコキシフルキルエス
テル;7セトキシメチル、プロピオニルオキシメチル、
ブチリルオキシメチル、バレリルオキシメチル、ピバロ
イルオキシメチルエステルなどのフルカッイルオキシア
ルキルエステル;インダニル、フクリジル、グリシルオ
キシメチル、フェニルグリシルオキシメチルエステル等
が挙げられる。The cephalosporin conductor of formula (1) may be an ester in which the carboxy group at the 4-position is nisfurated. Such esters are preferably those that are easily hydrolyzed from a biochemical standpoint. Such esters include, for example, methoxymethyllaethoxymethyl, methoxyethyl,
Flukoxyfurkyl esters such as ethoxyethyl ester; 7-cetoxymethyl, propionyloxymethyl,
Examples include flucyloxyalkyl esters such as butyryloxymethyl, valeryloxymethyl, and pivaloyloxymethyl ester; indanyl, fucridyl, glycyloxymethyl, and phenylglycyloxymethyl ester.
本発明のセファ0スポリン誘導体、その塩又はそのエス
テルは、結晶の形態にあるものが化学的に安定である。The Cefa-Osporin derivative, its salt, or its ester of the present invention is chemically stable if it is in the form of a crystal.
それ故、結晶性のセファロスポリン誘導体、その塩又は
そのニス゛チルが、医薬組成物の活性成分として使用さ
れる時に好ましい。かかる結晶は、無水物あるいは水和
物であってもよい。Therefore, crystalline cephalosporin derivatives, their salts or their nitrite are preferred when used as active ingredients in pharmaceutical compositions. Such crystals may be anhydrous or hydrated.
本発明のセファロスポリン誘導体の好ましい具体例を次
に挙げる。Preferred specific examples of the cephalosporin derivatives of the present invention are listed below.
1、 (6R,7R)−7−((Z)−2−(2−7
ミノチアゾールー4−イル)−2−フェノキシイミノ7
セト7ミド〕−3−ピラゾリニウムメチル−3−セフェ
ム−4−カルボキシレート
2、 (6R,7R)−7−((Z)−2−(2−7
ミノチ7ゾールー4−イル)−2−(p−メチル−フェ
ノキシイミノ)アセトアミドツー3−チアゾリウムメチ
ル−3−セフェム−4−カルボキシレート
3、 (6R,7R)−7−(E)−2−(2−7ミ
ノチアゾールー4−イル) −2−(m−メトキシフェ
ノキシイミノ)7セト7ミド〕−3−才キサゾリウムメ
チル−3−セフェム−4−カルボキシレート
4、 (6R,7R)−7−((3)−2−(2−7
ミノチ7ゾールー4−イル) −2−(o−りpルフエ
ノキシイミノ)アセトアミド) −3−ヒリジニウムメ
チル−3−セフェム−4−力ルポキシレート
s、 (sRt7R)−’y−CI:t)−2−(2
−7ミノチ7ゾールー4−イル)−2−(p−ブロモフ
ェノキシイミノ)7セトアミド〕−3−(2,3−シp
qベンテノビリジニクム)メチル−3−セフェム−4−
カルボキシレート6、 (6R,7R)−7−((Z
)−2−(2−7ミノチ7ゾールー4−イル) −2−
(o−フルオルフェノキシイミノ)7セト7ミド〕−3
−(4−カルボキシビリンニウム)メチル−3−セフェ
ム−4−カルボキシレート?、 (6R,7R
ン −7−〔G乙)−2−(2−7ミノチ7ゾールー4
−イル)−2−(p−フルオルフェノ千シイξ))7セ
ト7ミド〕−3−(4−カルバモイルビリジニウム)メ
チル−3−セフェム−4−カルボキシレートs、
(6R17R) 7 (叱l−2−(2−7ミ
ノチ7ゾールー4−イル) −2−(m−トリフルオー
メチルフェノキシイミノ)アセト7ミドー3−(3−ス
ルホピリジニウム)メチル−3−セフェム−4−カルボ
キシレート9、 (6R,7R)−7−((2)l−
2−(2−7ミノチ7ゾールー4−イル)−2−(p−
フェニルフェノキシイミノ)7セト7ミド〕−3−(4
−スルホエチルビリンニウム)メチル−3−セフェム−
4−カルボキシレート10、 (GR,7R)−7−
((Zl−2−(2−7ミノナ7ゾールー4−イル)
−2−(m−メトキシ力ルポニルフエ/サシイミノ)ア
セトアミド〕−3−
11、(6R+7R)−7−((Z)−2−(2−7ミ
ノチ7ゾールー4−イル)−2−(p−メトキシカルボ
ニルメチルフェノキシイミノ)−3−チェノ(2,3−
b)ピリジニウムメチル−3−セフェム−4−カルボキ
シレート
12、 (6R,7R)−7−((Z)−2−(1
−7ミノチ7ゾールー4−イル)−2−(m−7セトキ
シフエノキシイミノ)7セトアミド〕−3−インキノリ
ニウムメチル−3−づフエムー4−カルにキシレート
13、 (6R,7R)−7−(りl−2−(27ミ
ノチアゾールー4−イル)−2−(p−シアノフェノキ
シイミノ)7セトアミド)−3−(m−ヒドロキシメチ
ル)ビリンニウム−3−セフェム−4−カルポキシレー
ト
14、 (6R,7R)−7−(り)−2−(2−ナ
フチルオキシイミノ)7セトアミド)−3−(4−(テ
トラゾール−5−イル)メチルピリジニウムメチルクー
3−セフェム−4−カルボキシレート
1s、 (6R,7R)−7−[:(Z)−2−(
3,4=ジフルオロフェノキシイミノ)アセトアミド〕
3 (1+2+4 )リアゾール−1−イオ)メ
チル−3−セフェム−4−カルボキシレート
16、 (6R、7R)−7−〔(Z)−2−(2
−7ミ7チアゾールー4−イル)−2−(3,5−ジフ
ルオロフェノキシイミノ)7セト7ミド〕−3−(1,
3,4−チアジアゾール−4−イオ)メチル−3−セフ
ェム−4−カルボキシレート
17、 (6R,7R)−7−(伝l−2−(2−
7ミノチ7ゾールー4−イル) −2−(m−力ルバモ
イルフエノキシイミ/)7セト7ミド〕−3−(3−メ
チル1,3.4− )す7ゾールー1−イオ)メチル−
3−セフェム−4−カルボキシレート
18、 (6R,7R)−7−(り)−2−(2−
7ミノチ7ゾールー4−イル)−2−(p−カルバモイ
ルメチルフェノキシイミノ)アセトアミド)−3−(ビ
ラジル−1−イオ)メチル−3−セフェム−4−カルボ
キシレート19、 (6R,7R)=7−((Z)
−2−(2−7ミノチ7ゾールー4−イル) −2−(
m−力ルポキシフェノキシイミノ)7セト7ミドー((
4−(215ジヒドt= −6−ヒドロキシ−2−メチ
ル−5−オキソトリフジン−3−イル)−チオメチル〕
ピリジニウムメチル〕=3−セフェム−4−カルボキシ
レート
本発明のセファ0スボソン誘導体の製造法について以下
に詳述する。1, (6R,7R)-7-((Z)-2-(2-7
Minothiazol-4-yl)-2-phenoximino 7
ceto7mido]-3-pyrazolinium methyl-3-cephem-4-carboxylate 2, (6R,7R)-7-((Z)-2-(2-7
(6R,7R)-7-(E)-2 -(2-7minothiazol-4-yl) -2-(m-methoxyphenoxyimino)7ceto7mido]-3-year-old xazolium methyl-3-cephem-4-carboxylate 4, (6R,7R)- 7-((3)-2-(2-7
(sRt7R)-'y-CI:t )-2-(2
-7minothi7zol-4-yl)-2-(p-bromophenoximino)7cetamido]-3-(2,3-cyp
qbentenoviridinicum) methyl-3-cephem-4-
Carboxylate 6, (6R,7R)-7-((Z
)-2-(2-7minotizol-4-yl)-2-
(o-fluorophenoxyimino)7ceto7mido]-3
-(4-carboxybilinium)methyl-3-cephem-4-carboxylate? , (6R,7R
-7-[G Otsu]-2-(2-7 Minochi 7zoru-4
-yl)-2-(p-fluorophenochlorideξ))7ceto7mid]-3-(4-carbamoylviridinium)methyl-3-cephem-4-carboxylate s,
(6R17R) 7 (l-2-(2-7minotizol-4-yl) -2-(m-trifluoromethylphenoximino)aceto7mido-3-(3-sulfopyridinium)methyl-3-cephem- 4-carboxylate 9, (6R,7R)-7-((2)l-
2-(2-7minotizol-4-yl)-2-(p-
phenylphenoximino)7ceto7mido]-3-(4
-sulfoethylvinium)methyl-3-cephem-
4-carboxylate 10, (GR,7R)-7-
((Zl-2-(2-7minona7zol-4-yl)
-2-(m-methoxyluponylphene/sacyimino)acetamide]-3-11, (6R+7R)-7-((Z)-2-(2-7minothi7zol-4-yl)-2-(p-methoxy carbonylmethylphenoximino)-3-cheno(2,3-
b) Pyridinium methyl-3-cephem-4-carboxylate 12, (6R,7R)-7-((Z)-2-(1
-7 minothi7zol-4-yl)-2-(m-7cetoxyphenoximino)7cetamido]-3-inquinolinium methyl-3-dimethyl-4-carxylate 13, (6R,7R)- 7-(ri-2-(27minothiazol-4-yl)-2-(p-cyanophenoximino)7cetamido)-3-(m-hydroxymethyl)bilinium-3-cephem-4-carpoxylate 14, (6R,7R)-7-(ri)-2-(2-naphthyloxyimino)7cetamido)-3-(4-(tetrazol-5-yl)methylpyridinium methylcou 3-cephem-4-carboxylate 1s , (6R,7R)-7-[:(Z)-2-(
3,4=difluorophenoxyimino)acetamide]
3 (1+2+4) lyazole-1-io)methyl-3-cephem-4-carboxylate 16, (6R,7R)-7-[(Z)-2-(2
-7thiazol-4-yl)-2-(3,5-difluorophenoxyimino)7ceto7mido]-3-(1,
3,4-thiadiazole-4-io)methyl-3-cephem-4-carboxylate 17, (6R,7R)-7-(transl-2-(2-
7minoti7zol-4-yl) -2-(m-rubamoylphenoximine/)7ceto7mido]-3-(3-methyl1,3.4-)su7zol-1-io)methyl −
3-cephem-4-carboxylate 18, (6R,7R)-7-(ri)-2-(2-
7minothy7zol-4-yl)-2-(p-carbamoylmethylphenoximino)acetamide)-3-(biladyl-1-io)methyl-3-cephem-4-carboxylate 19, (6R,7R)=7 −((Z)
-2-(2-7minoti7zol-4-yl) -2-(
m-lupoxyphenoxyimino)7set7mido((
4-(215dihydrot=-6-hydroxy-2-methyl-5-oxotrifudin-3-yl)-thiomethyl]
Pyridinium methyl]=3-cephem-4-carboxylate The method for producing the cephalosubosone derivative of the present invention will be described in detail below.
本発明のセファ0スポリン誘導体は以下に詳述する各種
の方法(反応式A−E)Kよって装造することができる
。The CefaOsporin derivative of the present invention can be prepared by various methods (reaction formulas A to E) K described in detail below.
反応式A
反応式Aでは、式(2)のセフアルスポリン化合物又は
その塩と、式(3)の化合物又はその塩とを反応せしめ
る。反応生成物は必要に応じて脱保護、環生成、エステ
ル化及び/又は還元反応に付される。Reaction Formula A In Reaction Formula A, the cephalosporin compound of formula (2) or its salt is reacted with the compound of formula (3) or its salt. The reaction product is subjected to deprotection, ring formation, esterification and/or reduction reactions as necessary.
式(2)において、R1及びR意は式(1)の定義と同
様であり、Qは7シルオキシ基、カルバモイルオキシ基
又はハロゲン原子を表わし%pは0又はlを表わし、R
4は水素原子又は保護基を表わす。In formula (2), R1 and R are the same as defined in formula (1), Q represents a 7-syloxy group, a carbamoyloxy group, or a halogen atom, %p represents 0 or l, and R
4 represents a hydrogen atom or a protective group.
7シルオキシ基の好ましい例としては、例えば、7セチ
ルオキシ、トリフルオルアセチルオキシ、トリクI:+
pアセチルオキシ、プルピオニルオキシ、3−オキンプ
チリルオキシ、3−カルボキシプロピオニルオキシ
ベンゾイルオキシ、4−カルボキシブチリルオキシ、マ
ンゾリルオキシ+2 (カルボエトキズカルバモイル
)ベンゾイルオキシ+2 (カルボエトキシスルフ7
モイル)ベンゾイルオキシ、3−エトキシカルバモイル
プロビオニルオキシなどが挙げられる。Preferred examples of the 7-syloxy group include 7-cetyloxy, trifluoroacetyloxy, Tric I:+
p-acetyloxy, propionyloxy, 3-ocymptyryloxy, 3-carboxypropionyloxybenzoyloxy, 4-carboxybutyryloxy, manzolyloxy +2 (carboethoxycarbamoyl)benzoyloxy +2 (carboethoxysulf7
(moyl)benzoyloxy, 3-ethoxycarbamoylprobionyloxy, and the like.
ハロゲン原子としては,例えば、ヨウ素,臭素,塩素な
どが挙げられる。Examples of the halogen atom include iodine, bromine, and chlorine.
1びの保護基としては例えば、メチル、エチル。Examples of protective groups include methyl and ethyl.
プロピル、 iso−プロピル、ブチル、ペンチル。Propyl, iso-propyl, butyl, pentyl.
ヘキシルなどの低級フルキル基;7セトキシメチルツプ
ロピオニルオキシメチル、ブチリルオキシメチル、バレ
リルオキシメチル、ピパロイルオキシメチルなどのフル
カッイルオキシフルキル基:メトキシメチル,エトキシ
メチル、メトキシェチル、エトキシエチルなどのフルコ
キシアルキル基;ベンジル、4−メトキシベンンル、4
−二トpベンジル、フェネチル、トリチル、ジフェニル
メチル、ビス(メトキシフェニル)メチル、3,4−ジ
メトキシベンジルなどの置換されていてもよいアラルキ
ル基;2−ヨードエチル+ 2+2,2 ) !Jジ
クロロチルなどのノ1pゲン化フルキル基;ビニル、ア
リルなどのフルケニル基:フェニル、4−クロロフェニ
ル。Lower furkyl groups such as hexyl; 7-furkyloxyfurkyl groups such as cetoxymethyltupropionyloxymethyl, butyryloxymethyl, valeryloxymethyl, piparoyloxymethyl: methoxymethyl, ethoxymethyl, methoxyethyl, ethoxyethyl, etc. Flucoxyalkyl group; benzyl, 4-methoxybenzene, 4
-Optionally substituted aralkyl group such as -ditopbenzyl, phenethyl, trityl, diphenylmethyl, bis(methoxyphenyl)methyl, 3,4-dimethoxybenzyl; 2-iodoethyl+2+2,2)! Genated furkyl groups such as J dichlorotyl; fulkenyl groups such as vinyl and allyl: phenyl, 4-chlorophenyl.
トリル、キシリル、メシチルなどの置換されていてもよ
いアリル基;トリメチルシリル、トリエチルシリル、
tert −スチルジメチルシリル。Optionally substituted allyl groups such as tolyl, xylyl, mesityl; trimethylsilyl, triethylsilyl,
tert -stildimethylsilyl.
トリブチルシリルなどのトリフルキルシリル基等が挙げ
られる。なかでも、Rはトリフルキルシリル基が好まし
い。R4がトリアルキルシリル基である場合、反応式A
の反応において式(1)のセファロスポリン誘導体の△
8−異性体の生成が抑制されるため、目的とする式(1
)のセファロスポリン誘導体が高収率で得られる。Examples include trifurkylsilyl groups such as tributylsilyl. Among these, R is preferably a triflukylsilyl group. When R4 is a trialkylsilyl group, reaction formula A
△ of the cephalosporin derivative of formula (1) in the reaction of
Since the formation of 8-isomer is suppressed, the desired formula (1
) are obtained in high yield.
式(2)のセファロスポリン化合物は、その塩であって
もよい。好ましい塩としては1式(1′)。The cephalosporin compound of formula (2) may be a salt thereof. A preferred salt is formula 1 (1').
(1”)のセファ0スポリン誘導体において、例示した
塩と同様の塩が挙げられる。Regarding the Cefa-Osporin derivative (1''), salts similar to the exemplified salts may be mentioned.
式(3)において、R”で表わされろ化合物はIt3に
対応する塩基である。式(3)の化合物は、その塩であ
ってもよ(゛、好ましい塩としては、例えば、無機酸塩
(塩酸塩、A化水ネ酸塩、硫酸塩、リン酸塩など)、有
機酸塩(酢酸塩、マレイン酸塩、酒石酸塩、ベンゼンス
ルホン酸塩、トルエンスルホン酸塩など)等が挙げられ
る。In formula (3), the compound represented by R'' is a base corresponding to It3. The compound of formula (3) may be a salt thereof (preferable salts include, for example, an inorganic acid salt ( Examples include hydrochloride, Ahydrone salt, sulfate, phosphate, etc.), organic acid salts (acetate, maleate, tartrate, benzenesulfonate, toluenesulfonate, etc.).
式(2)のセファロスポリン誘導体又はその塩と式(3
)の化合物又はその塩との反応は、不活性有機溶媒中で
両者を接触せしめることにより行なわれる。The cephalosporin derivative of formula (2) or its salt and the formula (3)
) with the compound or its salt is carried out by bringing the two into contact in an inert organic solvent.
不活性有機溶媒としては、例えば、メチレンクロライド
、ジクprxメタン、クロロホルム。Examples of inert organic solvents include methylene chloride, diprxmethane, and chloroform.
四塩化炭素、l、2−ジクロロエタンなどのハロゲン化
炭化水素類;ジエチルエーテル、テトラヒドロフラン、
ジオキサン、ジメトギシエタンナトノエーテル類;−キ
サン、ベンゼン、トル二ン、キシレンなどの炭化水2類
;アセトニトリル;ジメチルホルムアミド;ジエチルア
セトアミド;ジメチルスルホキシド;酢酸エチル等が挙
げられる。Halogenated hydrocarbons such as carbon tetrachloride, l,2-dichloroethane; diethyl ether, tetrahydrofuran,
Examples include dioxane, dimethoxyethane natonoethers; second class hydrocarbons such as -xane, benzene, toluine, and xylene; acetonitrile; dimethylformamide; diethylacetamide; dimethyl sulfoxide; and ethyl acetate.
反応温度は室温もしくはそれ以下の温度が好ましく、通
常−30℃〜+50℃の範囲で実施するのがよい。The reaction temperature is preferably room temperature or lower, and is usually carried out in the range of -30°C to +50°C.
式(2)の七フ7pスポリン化合物もしくはその塩と1
式(3)の化合物もしくはその塩とは等モル量が反応す
るが、反応を行なうに際しては、通常、式(2)のセフ
ァロスポリン化合物もしくはその塩に対して、式(3)
の化合物もしくはその塩は0.7〜lO倍モル、好まし
くi′:tl、0−10倍モル使用される。7p 7p sporin compound of formula (2) or a salt thereof and 1
Equimolar amounts of the compound of formula (3) or its salt are reacted, but when carrying out the reaction, usually the cephalosporin compound of formula (2) or its salt is reacted with the compound of formula (3) or its salt.
The compound or its salt is used in an amount of 0.7 to 10 times the mole, preferably i':tl, 0 to 10 times the mole.
反応は両者を単に攪拌するだけで進行し、反応時間は反
応溶媒、反応温度等によって異なるが、通常5分〜3時
間である。The reaction proceeds by simply stirring the two, and the reaction time varies depending on the reaction solvent, reaction temperature, etc., but is usually 5 minutes to 3 hours.
反応生成物は溶媒抽出、晶析、りpマドグラフィ等の公
知の手段によって単離精製することができる。The reaction product can be isolated and purified by known means such as solvent extraction, crystallization, and polymerography.
本反応においては、原料化合物として、化合物(2)の
シン異性体を用いた場合には、シン異性体の目的物(1
)が得られる。化合物(2)のシフ及びアンチ異性体の
混合物を原料とl−て用いた場合には、目的物(1)の
シン及びアンチ異性体の混合物が得られる。°かかる混
合物は、晶析、クロマトグラフィー印)の通常の手段に
より分離できる。In this reaction, when the syn isomer of compound (2) is used as the starting compound, the target compound of the syn isomer (1
) is obtained. When a mixture of Schiff and anti isomers of compound (2) is used as a raw material, a mixture of syn and anti isomers of target compound (1) is obtained. °Such mixtures can be separated by conventional means of crystallization, chromatography).
反応生成物は、必要に応じて、税保朦、塩生成、エステ
ル化、及び又は還元反応に付さnる。The reaction product is subjected to tax protection, salt formation, esterification, and/or reduction reactions as required.
脱保護反応はそれ自体公知の反応であり、カルボキシル
基の保護基は、酸もしくはアルカリの存在下での加水分
解反応等によって除去することかできる。アミ7基の保
護基は、酸あるいは接触還元等によって除去することか
できる( U、S、Patent No 4,152,
433 ;U、S、Patent Nn4.298,6
06 )。The deprotection reaction is a known reaction per se, and the protecting group for the carboxyl group can be removed by a hydrolysis reaction in the presence of an acid or an alkali. The protecting group of amine 7 group can be removed by acid or catalytic reduction (U, S, Patent No. 4,152,
433; U, S, Patent Nn4.298,6
06).
塩生成反応はそれ自体公知の反応であり、例えば上記反
応で得られる式(1)のベタイン構造の化合物を、ζ醜
、臭化水素酸、硫酸、硝酸、リン酸、酢酸、トリフルオ
ー酢酸等の酸;あるいはベタインを酸の存在下、塩化ナ
トリウム、ヨウ化ナトリウム、塩化カリウム等の塩で処
理することによって行なわれる。The salt-forming reaction is a well-known reaction in itself. For example, the compound having the betaine structure of formula (1) obtained by the above reaction is treated with ζ-ugly, hydrobromic acid, sulfuric acid, nitric acid, phosphoric acid, acetic acid, trifluoroacetic acid, etc. acid; or by treating betaine with a salt such as sodium chloride, sodium iodide, potassium chloride, etc. in the presence of an acid.
エステル化反応は、それ自体公知の反応であり、得られ
る式(1)のセファロスポリン誘導体又はその塩とフル
カッイルオキシフルキルハライド、アルフキシフルキル
ノ曳ライド等とを、アセトン、ジメチルホルムアミド等
の不活性有機溶媒中で反応せしめることによって行なわ
れる( United Kingdom Patent
Nn240,921 )。The esterification reaction is a reaction known per se, and the resulting cephalosporin derivative of formula (1) or a salt thereof is mixed with acetone, dimethylformamide, etc. (United Kingdom Patent
Nn240,921).
還元反応は、それ自体公知の反応であり、式(1)にお
いてpが1であるセファ0スポリン誘導体を7セチルク
ロライド等で処理し、次いでヨードイオン、亜ジチオン
酸ナトリウム等で還元することによって行なわれる(
United KingdomPatent Nn24
0,921 )。The reduction reaction is a well-known reaction in itself, and is carried out by treating the Cephasporin derivative in which p is 1 in formula (1) with 7 cetyl chloride, etc., and then reducing it with iodide ions, sodium dithionite, etc. (
United KingdomPatent Nn24
0,921).
結晶性の本発明のセファ0スポリン訪専体を得るには例
えば以下の方法がある。For example, the following method can be used to obtain the crystalline CefaOsporin complex of the present invention.
式(1)のセフ 7 +=+スポリン誘導体のアモルフ
ァスな粉末を水;メタノール、エタノール、7セ)71
テ)ラヒドロフラン、ジオキサン+7セトニトリル等の
有機溶剤;あるいはこれらの混合溶剤に溶解せしめ、放
置することによって結晶として沈澱させる方法;アモル
ファスな粉末を、これらの溶剤を用いて再結晶させる方
法;あるいはアモルファスな粉末を水に溶解し、次いで
上記の有機溶剤を加えて結晶として沈澱させる方法など
がある。The amorphous powder of the formula (1) 7+=+sporin derivative is mixed with water;
Te) organic solvents such as hydrofuran, dioxane + 7cetonitrile; or a method of dissolving it in a mixed solvent of these and leaving it to precipitate as a crystal; a method of recrystallizing an amorphous powder using these solvents; or a method of recrystallizing an amorphous powder using these solvents; There is a method of dissolving the powder in water and then adding the above-mentioned organic solvent to precipitate it as crystals.
一方、他の方法としては、式(1)のセフアルスポリン
誘導体の酸付加塩を、水又はメタノールエタノール、プ
ルパノール、などの有機溶媒、あるいはこれらの混合溶
媒に溶解せしめ、次いでトリエチルアミン、水酸化ナト
リウム、炭酸ナトリウムなどの塩基で中和して結晶を得
る方法もある・
上記の如く、水もしくは水を含む溶液中で結晶化もしく
は再結晶せしめる場合には、通常結晶性の水和物が得ら
れる。また有機溶剤中で結晶化せしめる場合には、結晶
性の無水物もしくは溶媒和物が得られる。溶媒和物は容
易に無水物に変換される。結晶性の無水物もしくは溶媒
和物は、水蒸気を含む気体中に放置することKよって水
和物に変換することができる。On the other hand, as another method, the acid addition salt of the cephalsporin derivative of formula (1) is dissolved in water, an organic solvent such as methanol, ethanol, purpanol, or a mixed solvent thereof, and then triethylamine and sodium hydroxide are added. There is also a method of obtaining crystals by neutralizing with a base such as sodium carbonate. As mentioned above, when crystallizing or recrystallizing in water or a solution containing water, a crystalline hydrate is usually obtained. . When crystallized in an organic solvent, a crystalline anhydride or solvate can be obtained. Solvates are easily converted to anhydrides. A crystalline anhydride or solvate can be converted into a hydrate by standing in a gas containing water vapor.
反応式B
反応式Bでは、式(4)の化合物、その塩又はその反応
性誘導体と、式(5)の化合物、その塩、そのエステル
又はその反応性誘導体とを反応せしめる。反応生成物は
、必要に応じて脱保護、塩生成、エステル化及び/又は
還元反応に付される。Reaction Formula B In Reaction Formula B, a compound of formula (4), a salt thereof, or a reactive derivative thereof is reacted with a compound of formula (5), a salt thereof, an ester thereof, or a reactive derivative thereof. The reaction product is subjected to deprotection, salt formation, esterification and/or reduction reactions as necessary.
式(4)において、R1及びR2は前記定義に同じであ
る。In formula (4), R1 and R2 are the same as defined above.
式(4)の化合物は、塩であってもよく、塩としては酸
付加塩がある。かかる酸付加塩としては反応式Aの式(
3)の化合物の酸付加塩として例示したものが同様に挙
げられる。The compound of formula (4) may be a salt, and examples of the salt include acid addition salts. As such an acid addition salt, the formula of reaction formula A (
Those exemplified as the acid addition salts of the compounds in 3) can also be mentioned.
式(4)の化合物の反応性誘導体としては、例えば、醗
ハライド、酸無水物、混合酸無水物、活性化7ミド、活
性化エステル等がある。Examples of reactive derivatives of the compound of formula (4) include halides, acid anhydrides, mixed acid anhydrides, activated 7amides, activated esters, and the like.
酸ハライドとしては1例えば、酸クロライド酸ブロマイ
ドが挙げられる。混合酸無水物としては、例えば、ジア
ルキルリン酸、フェニルリン酸、ピパリン酸、ペンタン
酸などの酸との混合酸無水物が挙げられる。活性化アミ
ドとしては、例えば、イミダゾール、トリアゾール、テ
トラゾール、ジメチルピラゾールなどで活性化されたア
ミド等が挙げられる。活性化エステルとしては、例えば
、シアノメチルエステル、メトキシメチルエステル、ジ
メチルイミノメチルエステル、p−二トpフェニルエス
テル、メシルフェニルエステルなどが挙げられる。Examples of the acid halide include acid chloride and acid bromide. Examples of the mixed acid anhydride include mixed acid anhydrides with acids such as dialkyl phosphoric acid, phenyl phosphoric acid, piparic acid, and pentanoic acid. Examples of activated amides include amides activated with imidazole, triazole, tetrazole, dimethylpyrazole, and the like. Examples of the activated ester include cyanomethyl ester, methoxymethyl ester, dimethyliminomethyl ester, p-ditophenyl ester, and mesylphenyl ester.
式(5)において、R3およびpは前記定義に同じであ
る。式(5)の化合物の塩としては、ナトリウム塩、カ
リウム塩などのアルカリ金属塩;カルシウム塩、マグネ
シウム塩などのアルカリ土類金iA塩; 7ンモニウム
塩ニトリメチルアミン塩。In formula (5), R3 and p are the same as defined above. Salts of the compound of formula (5) include alkali metal salts such as sodium salts and potassium salts; alkaline earth gold iA salts such as calcium salts and magnesium salts; heptammonium salts and nitrimethylamine salts.
トリエチルアミン塩、ピリジン塩などの有機塩基との塩
;あるいは前記したと同様の酸付加塩等が挙げられる。Examples include salts with organic bases such as triethylamine salts and pyridine salts; and acid addition salts similar to those mentioned above.
式(5)の化合物のエステルとしては、例えば、反応武
人の式(2)の化合物におけるR4の保穫基として例示
したと同様の基でエステル化された化合物を挙げること
ができる。Examples of the ester of the compound of formula (5) include compounds esterified with the same groups as those exemplified as the protecting group of R4 in the compound of formula (2) of the reactor.
式(5)の化合物の反応性O1導体としては、例えば、
7セト酢酸などのカルボニル化合物との反応によって形
成されるシッフ塩基型イミノ化合物又はそのエナミンタ
イプの異性体;ビス(トリメチルシリル)7セト7ミド
、トリメチルクロロミラン+ tert−プチルジメチ
ルクpロシランなどのシリル化合物との反応忙より生成
するシリル訪導体;三塩化リン、ホスゲンとの反応によ
って得られる誘導体等が挙げられる。As the reactive O1 conductor of the compound of formula (5), for example,
Schiff base-type imino compounds or their enamine-type isomers formed by reaction with carbonyl compounds such as 7cetoacetic acid; silyl compounds such as bis(trimethylsilyl)7ceto7mide, trimethylchloromilane + tert-butyldimethylcuprosilane Examples include silyl visiting conductors produced by reactions with compounds; derivatives obtained by reactions with phosphorus trichloride and phosgene, and the like.
式(5)の化合物は次の方法によって15造しく3る。The compound of formula (5) can be synthesized by the following method.
(5’) (3)
上記の反応は1反応式Aで示した式(2)の化合物と式
(3)の化合物との反応と同様にして行なうことができ
る。(5') (3) The above reaction can be carried out in the same manner as the reaction between the compound of formula (2) and the compound of formula (3) shown in Reaction Scheme A.
化合物(4)、その塩又はそれらの反応往訪導体と化合
物(5)、その塩、そのエステル又はそれらの反応往訪
導体との反応は、不活性有機溶媒中、必要により縮合剤
もしくは塩基の存在下で1両者を接触することにより行
なわれる。The reaction of compound (4), its salt, or its reactive conductor with compound (5), its salt, its ester, or their reactive conductor is carried out in an inert organic solvent, if necessary in the presence of a condensing agent or a base. This is done by bringing the two into contact with each other.
不活性有機溶媒としては、例えば、メチレンクルライド
、ジクpロメタン、クロロホルム。Examples of inert organic solvents include methylene chloride, dichloromethane, and chloroform.
四塩化炭素、l、2−ジク+:++:Iエタンなどのノ
・ロゲフ化炭化水g類;ジエチルエーテル、テトラヒド
ロフラン、ジオキサン、ジメトキシエタンナトのエーテ
ル類:ヘキサン、ベンゼン!トルエン、キシレンなどの
炭化水素類;アセトニトリル:ジメチルホルム7ミド;
ジエチル7セト7ミド;ジメチルスルホキシド等が挙げ
られる。Carbon tetrachloride, l,2-dichlorohydrocarbons such as ++:I ethane; ethers of diethyl ether, tetrahydrofuran, dioxane, dimethoxyethanat: hexane, benzene! Hydrocarbons such as toluene and xylene; Acetonitrile: Dimethylform 7mide;
Examples include diethyl 7ceto7mide; dimethyl sulfoxide.
反応に際しては塩基を添加してもよい。かかる塩基とし
ては1例えば水酸化アルカリ金属。A base may be added during the reaction. Such bases include, for example, alkali metal hydroxides.
炭酸水素アルカリ金属、炭酸7 /l−カリ金属、トリ
フルキル7ミン、 N、N−ジフルキルベンジルアミン
、ピリジン、N−フルキルモルホリン等の有機もしくは
無機の塩基が挙げられろ。かかる塩基の使用量は通常化
合物(4)、その塩又はそれらの反応性誘導体に対して
等モル−3倍モルである。Examples include organic or inorganic bases such as alkali metal hydrogen carbonate, potash metal carbonate, triflukyl amine, N,N-difurkylbenzylamine, pyridine, and N-furkylmorpholine. The amount of the base to be used is usually equivalent to three times the mole of the compound (4), its salt, or its reactive derivative.
化合物(4)又はその塩を反応に用いる場合には、縮合
剤を添加してもよい。縮合剤としては、例え)l N、
N’−ジシクロへキシルカルボジイミド。When compound (4) or a salt thereof is used in the reaction, a condensing agent may be added. As a condensing agent, for example) lN,
N'-dicyclohexylcarbodiimide.
N−シクロヘキシル−N′−モルホリノエチルカルボジ
イミド、 N、N’−ジエチルカルボジイミド。N-cyclohexyl-N'-morpholinoethylcarbodiimide, N,N'-diethylcarbodiimide.
トリメチルホスファイト、トリフェニルホスフィン、2
−エチル−7−ヒドpキシベンズインオキサシリウム塩
などが挙げられる。かかる縮合剤の使用量は通常、化合
物(4)又はその塩に対して1〜3倍モルである。Trimethylphosphite, triphenylphosphine, 2
-Ethyl-7-hydro p-oxybenzin oxacillium salt and the like. The amount of such a condensing agent used is usually 1 to 3 times the mole of compound (4) or its salt.
化合物(4)、その塩又はそれらの反応性誘導体と化合
物(5)、その塩、そのエステル又はそれらの反応性誘
導体とは通常はぼ等モル童を用いて反応を行なう。Compound (4), a salt thereof, or a reactive derivative thereof and compound (5), a salt thereof, an ester thereof, or a reactive derivative thereof are usually reacted using an equimolecular compound.
反応温度は、通常冷却下もしくは室温で行なわれる。The reaction temperature is usually carried out under cooling or at room temperature.
反応は通常、数分〜数十時間で終了する。The reaction usually completes in several minutes to several tens of hours.
反応生成物は溶媒抽出、晶析、クロマトグラフィー等の
公知の手段によって単mMIAすることができる。The reaction product can be subjected to single mMIA by known means such as solvent extraction, crystallization, chromatography, etc.
反応生成物の脱保護、塩生成、エステル化及び/又は還
元反応は反応式Aで示したと同様の方法により行なうこ
とができる。目的物の結晶を得る場合にも反応式Aで示
した方法と同様にして行なうことができる。Deprotection, salt formation, esterification and/or reduction of the reaction product can be carried out in the same manner as shown in Reaction Formula A. The same method as shown in Reaction Formula A can be used to obtain crystals of the target product.
本反応においては、原料化合物として、化合物(4)の
シン異性体を用いた場合にはシン異性体の目的物(1)
が得られる。化合物(4)のシン及びアンチ異性体の混
合物を原料として用いた場合には目的物(1)のシン及
びアンチ異性体の混合物が得られる。かかる混合物は、
晶析、りμマドグラフィー等の通常の手段により分離で
きる。In this reaction, when the syn isomer of compound (4) is used as the starting compound, the target compound (1) of the syn isomer is
is obtained. When a mixture of syn and anti isomers of compound (4) is used as a raw material, a mixture of syn and anti isomers of target compound (1) is obtained. Such a mixture is
It can be separated by conventional means such as crystallization and micromaturography.
反応式C
(6)(力
反応式Cでは、式(6)の化合物、その塩又はそのニス
デルと、式(7)の化合物、その保護された化合物又は
その塩と反応せしめる。反応生成物は、必要に応じて脱
保護、環生成、エステル化及び/又は還元反応に付され
る。Reaction formula C (6) (For reaction formula C, the compound of formula (6), its salt, or its Nisdel is reacted with the compound of formula (7), its protected compound, or its salt. The reaction product is , and subjected to deprotection, ring formation, esterification and/or reduction reactions as necessary.
式(6)において、R”及びpは前記定義に同じである
。In formula (6), R'' and p are the same as defined above.
式(6)の化合物の塩としては、酸付加塩、あるいはア
ルカリ金g4塩、アルカリ土類金属塩、アンモニウム塩
、あるいは有機塩基との塩がある。Salts of the compound of formula (6) include acid addition salts, alkali gold g4 salts, alkaline earth metal salts, ammonium salts, and salts with organic bases.
これらの塩の具体例としては式(1)の化合物で記述し
たものと同様の塩が挙げられる。Specific examples of these salts include the same salts as described for the compound of formula (1).
式(6)の化合物のエステルとしては、例えば、反応式
Aにおける式(2)の化合物のIt’の保I基として例
示したと同様の基でエステル化された化合物を挙げるこ
とができる。Examples of the ester of the compound of formula (6) include compounds esterified with the same group as exemplified as the I group of It' of the compound of formula (2) in reaction formula A.
式(う)の化合物は次の方法によって製造し得る。The compound of formula (U) can be produced by the following method.
(6’ ) (3)上記の反応は
、反応武人において示した、式(2)の化合物と式(3
)の化合物との反応と同様にして行なうことができる。(6') (3) The above reaction is performed by combining the compound of formula (2) and the formula (3) shown in Reaction Bujin.
) can be carried out in the same manner as the reaction with the compound.
式(7)において、R2は前記定義に同じである。In formula (7), R2 is the same as defined above.
化合物(7)の保護さ几た化合物としては、R2がカル
ボキシ基等の活性な置換基を冶する場合、これらの置換
基を慣用的に使用きれる保護基で保護した化合物が誉げ
られる。As the protected compound of compound (7), when R2 represents an active substituent such as a carboxy group, compounds in which these substituents are protected with a conventionally used protecting group are preferred.
化合物(7)の塩としては、酸付加塩が挙げられこれら
の具体例は前記したと同様のものが挙げられる。Examples of the salt of compound (7) include acid addition salts, and specific examples thereof are the same as those mentioned above.
式(7)の化合物は公知の化合物であり、ヒドロキシフ
タルイミドを用いる公知の方法(13ulletinS
ociety、833.1976)や2.4−ジニトロ
フx 二/L。The compound of formula (7) is a known compound and can be prepared by a known method using hydroxyphthalimide (13ulletin S
ociety, 833.1976) and 2.4-dinitroph x2/L.
ヒドロキシルアミンを用いる公知の方法(特開昭60−
169446号公報)等の方法によって製造し得る。A known method using hydroxylamine (Japanese Unexamined Patent Publication No. 1983-
169446).
化合物(6)、その塩又はそのエステルと化合物(7)
、その保詮された化合物又はその塩との反応は、不活性
有機溶媒中で、必要に応じて塩基の存在下、両者を接触
せしめることKより行なわれる。Compound (6), its salt or its ester and compound (7)
The reaction with the preserved compound or its salt is carried out by bringing the two into contact in an inert organic solvent, if necessary in the presence of a base.
不活性有機溶媒としては、例えばメタノール。Examples of inert organic solvents include methanol.
エタノール、プロパツール、ブタノールなどのアルコー
ル類が挙げられる。これら不活性有機溶媒は水を含んで
いてもよい。Examples include alcohols such as ethanol, propatool, and butanol. These inert organic solvents may contain water.
必要に応じて添加される塩基としては、Reactio
n Scheme Bの反応で用いた塩基と同様のもの
が挙げられる。As the base added as necessary, Reactio
n The same bases as those used in the reaction in Scheme B can be mentioned.
かかる塩基の使用量は、式(6)の化合物、その基又)
まそのエステルに対し、通常L〜3倍モルである。式(
6)の化合物、その塩又はそのエステルと式(7)の化
合物、その保護された化合物、又はその塩とは通常、そ
れぞれ等モル量用いて反応が行なわれる。The amount of such base to be used is determined based on the compound of formula (6), its group or
The amount is usually L to 3 times the mole of the masono ester. formula(
The reaction is usually carried out using equimolar amounts of the compound of formula (6), its salt, or its ester and the compound of formula (7), its protected compound, or its salt.
反応温度は通常、冷却下もしくは室温で行なわれる。The reaction temperature is usually carried out under cooling or at room temperature.
反応時間は通常、数分〜数十時間である0反応生成物は
溶媒抽出、晶析、クロマトグラフィー等の公知の手段に
よって単離精製することが・できる。The reaction time is usually several minutes to several tens of hours.The reaction product can be isolated and purified by known means such as solvent extraction, crystallization, and chromatography.
本反応においては、化合物のシン及びアンチ異性体の混
合物が得られる。In this reaction, a mixture of syn and anti isomers of the compound is obtained.
かかる混合物は、晶析、クロマトグラフィー等の通常の
手段によつ”〔分離することができる。Such mixtures can be separated by conventional means such as crystallization, chromatography, etc.
脱保護、環生成、エステル化及び/又は還元反応は反応
式Aと同様にして行なうことができる。目的物の結晶性
無水物もしくは水和物を得る場合にも、反応式Aで示し
た方法と同様にして行なうことかできる。Deprotection, ring formation, esterification and/or reduction reactions can be carried out in the same manner as in Reaction Formula A. When obtaining a crystalline anhydride or hydrate of the target product, the same method as shown in Reaction Formula A can be used.
反応式D
(8)(“))
反応式りでは、式(8)の化合物、その塩又はそのエス
テルと1式(9)の化合物又はその塩とを反応せしめる
。反応生成物は、必要に応じて、脱保護、環生成、エス
テル化及び/又は還元反応に付される。Reaction formula D (8) (“)) In the reaction formula, a compound of formula (8), a salt thereof, or an ester thereof is reacted with a compound of formula (9) or a salt thereof.The reaction product is Depending, it is subjected to deprotection, ring formation, esterification and/or reduction reactions.
式(8) K オイテ、R’、R”、R’及ヒp lt
前E定MK同じであり、Rは、塩素、臭素、ヨウ素など
のハロゲン原子を表わす。Formula (8) K oiite, R', R", R' and hip lt
The same is true for E constant MK, and R represents a halogen atom such as chlorine, bromine, or iodine.
式(8)の化合物の塩としては1例えばアルカリ金属塩
、アルカリ土類金属塩、アンモニウム塩。Examples of the salts of the compound of formula (8) include alkali metal salts, alkaline earth metal salts, and ammonium salts.
有機塩基との塩あるいは酸付加塩がある。これらの塩の
具体例としては、化合物(])で記述したものと同様の
塩が挙げられる。There are salts with organic bases or acid addition salts. Specific examples of these salts include the same salts as those described for compound (]).
式(8)の化合物のエステルとしては、例えば。Examples of the ester of the compound of formula (8) include:
反応式Aにおける式(2)の化合物のR4の保獲基と同
様の基でエステル化された化合物が挙げられる。Examples include compounds esterified with a group similar to the R4 retaining group of the compound of formula (2) in Reaction Formula A.
式(8)の化合物(2以下のようにして製造される。The compound of formula (8) (2) is produced as follows.
上記反応において1式(5′)の化合物と式(3)の化
合物との反応は1反応式Aにおいて述べた反応と同様に
して行なわれる。式(5)の化合物と式(8′)の化合
物との反応は、Reaction Schema Bに
おいて述べた反応と同fJ K して行なわれる。In the above reaction, the reaction between the compound of Formula 1 (5') and the compound of Formula (3) is carried out in the same manner as the reaction described in 1 Reaction Scheme A. The reaction between the compound of formula (5) and the compound of formula (8') is carried out using the same fJ K reaction as described in Reaction Schema B.
式(8′)の化合物は公知の化合物であり、公知の方法
(United Kingdom Patent m2
,012,276 )によって製造し得る。The compound of formula (8') is a known compound and can be prepared by a known method (United Kingdom Patent m2
, 012, 276).
式(9)において、R1は水素原子又は保1基を表わす
。式(9)の化合物JX公知の化合物である(LS、P
atent m4,298.606 )。In formula (9), R1 represents a hydrogen atom or a hydroxyl group. Compound JX of formula (9) is a known compound (LS, P
agent m4, 298.606).
式(9)の化合物の塩としては、酸付加塩が挙げられ、
かかる酸付加塩の具体例としては、式(IIの化合物で
記述したものと同様の酸付加塩が挙げられる。Examples of the salt of the compound of formula (9) include acid addition salts,
Specific examples of such acid addition salts include acid addition salts similar to those described for the compound of formula (II).
式(8)の化合物、その塩又はそのエステルと式(9)
の化合物又はその塩との反応は、不活性溶媒中で、両者
を接触することに行なわれる。The compound of formula (8), its salt or its ester and formula (9)
The reaction with the compound or its salt is carried out by bringing the two into contact in an inert solvent.
不活性溶媒としては、例えば、水;メタノール、エタノ
ール、フルパノール、フタノールなどのアルコール類;
ジエチルエーテル、テトラヒドロフラン、ジオキサンな
どのエーテル類;ジメチルホルム7ミド;ジメチルアセ
トアミド;メチルピペリドン等が挙げられる。これらの
溶媒の混合物も同様に用いることができる。Examples of inert solvents include water; alcohols such as methanol, ethanol, flupanol, and phthanol;
Examples include ethers such as diethyl ether, tetrahydrofuran and dioxane; dimethylformamide; dimethylacetamide; methylpiperidone and the like. Mixtures of these solvents can be used as well.
式(9)の化合物又はその塩は、通常、式(8)の化合
物、その塩又はそのゴスチルに対して1〜3倍モル用い
られる。The compound of formula (9) or its salt is usually used in a molar amount of 1 to 3 times that of the compound of formula (8), its salt, or Gostil.
反応温度は特に限定されないが、通常、室温から溶媒の
沸点程度の温度で行たわれる。Although the reaction temperature is not particularly limited, it is usually carried out at a temperature ranging from room temperature to the boiling point of the solvent.
反応時間は通常、1−10時間程度である。The reaction time is usually about 1 to 10 hours.
反応生成物は溶媒抽出、晶析、クロマトグラフィー等の
公知の手段によって単離fR1JJすることができる。The reaction product can be isolated fR1JJ by known means such as solvent extraction, crystallization, and chromatography.
本反応1でおいては、原料化合物として化合物(8)の
シン異性体を用いた場合には、化合物(1)のシン異性
体が得られる。化合物(8)のシン及びアンチ異性体を
用いた場合には、化合物Q)のシン及びアンチ異性体の
混合物が得られる。かかる混合物は、晶析、クロマトグ
ラフィー等の通常の手段により分離できる。In this reaction 1, when the syn isomer of compound (8) is used as the starting compound, the syn isomer of compound (1) is obtained. If syn and anti isomers of compound (8) are used, a mixture of syn and anti isomers of compound Q) is obtained. Such mixtures can be separated by conventional means such as crystallization, chromatography, etc.
脱係11!絆塩生成、エステル及び/又は還元反応は反
応式Aで示した方法と同様にして行なうことができろ。Detachment 11! Bonding salt formation, esterification and/or reduction reactions can be carried out in the same manner as shown in Reaction Scheme A.
目的物の結晶性無水物もしくは水和物を得る場合にも1
反応式Aで示した方法と同様にして行な5ことができる
。1 also when obtaining the crystalline anhydride or hydrate of the target product.
This reaction can be carried out in the same manner as shown in Reaction Scheme A.
反応式E
(1″つ
(11反応式Eでは1式(l″りの化合物、その塩又は
そのエステルと、式α1の化合物、ジフルキル硫酸又は
ジアゾフルカンとを反応せしめる。反応生成物は必vK
応じて、脱保護、環生成、エステル化及び/又は還元反
応に付される。Reaction formula E (1″
(11 In reaction formula E, a compound of formula 1, its salt, or its ester is reacted with a compound of formula α1, difurkyl sulfate, or diazoflucan. The reaction product must be vK
Depending, it is subjected to deprotection, ring formation, esterification and/or reduction reactions.
式(l//りにおいてR1、Rm及びpは前記定義に同
じである。In the formula (l//ri, R1, Rm and p are the same as defined above.
式(1/// )の化合物の塩としては、酸付加塩、あ
る〜・はアルカリ金属塩、アルカリ土類金属塩。Examples of the salt of the compound of formula (1///) include acid addition salts, alkali metal salts and alkaline earth metal salts.
アンモニウム塩、有機塩基との塩などがある。Examples include ammonium salts and salts with organic bases.
これらの塩の具体例としては式(1)の化合物で記述し
たものと同様の塩が挙げられる。Specific examples of these salts include the same salts as described for the compound of formula (1).
式<1111つの化合物のエステルとしては、反応式A
の式(2)の化合物におけるR4の保護基と同じ基でエ
ステル化された化合物を挙げることができる。Formula <111As an ester of one compound, reaction formula A
Examples include compounds esterified with the same group as the protecting group for R4 in the compound of formula (2).
式(l///リ の化合物は次の方法により製造し得る
。A compound of formula (l///li) can be produced by the following method.
上記反応において、式(5′)の化合物と式(3)の化
合物との反応は、反応式Aで述べた反応と同様にして行
なうことができ1式(5)の化合物と式(4つの化合物
との反応は、Reaction Scheme Bで述
べた反応と同様にして行なうことができる。In the above reaction, the reaction between the compound of formula (5') and the compound of formula (3) can be carried out in the same manner as the reaction described in reaction formula A. The reaction with the compound can be carried out in the same manner as the reaction described in Reaction Scheme B.
式(4つの化合物は公知の化合物であり、公知の方法(
U、S、Patent Nn4,298,606 )
Kより袈造し得る。Formula (the four compounds are known compounds, and the known method (
U,S,Patent Nn4,298,606)
It is possible to make a kimono from K.
式(1(1において nuは置換もしくは非置換のフル
キル基、置換もしくは非置換のジクロフルキル基、又は
置換もしくは非置換の複素環基を表わす。Hatは、塩
素、A素、ヨウ素などの−・pゲン原子を表わす。式(
至)の化合物は、相当する脂肪族炭化水素、環式脂肪族
炭化水素あるいは複素環化合物を慣用の手段によりノ・
pゲン化することKよって得られる。In the formula (1 (1), nu represents a substituted or unsubstituted furkyl group, a substituted or unsubstituted dichlorofurkyl group, or a substituted or unsubstituted heterocyclic group. Represents a gen atom.Formula (
(to) can be obtained by converting the corresponding aliphatic hydrocarbon, cycloaliphatic hydrocarbon or heterocyclic compound into
It can be obtained by p-genation.
ジアルキル硫酸としては1例えばジメチル硫酸、ジエチ
ル硫酸などが挙げられる。Examples of the dialkyl sulfate include dimethyl sulfate and diethyl sulfate.
ジアゾフルカンとしては1例えば、ジアゾメタンなどが
挙げられる。Examples of diazoflucan include diazomethane.
式(1//f )の化合物、その塩又はそのエステルと
式(ト)の化合物、ジアルキル硫酸、又はジアゾアルカ
ンとの反応は、不活性溶媒中で、必要に応じて塩基の存
在下に、両者を接触せしめることにより行なわれる。The reaction of the compound of formula (1//f), its salt, or its ester with the compound of formula (g), dialkyl sulfuric acid, or diazoalkane is carried out in an inert solvent, if necessary in the presence of a base, This is done by bringing the two into contact.
不活性溶媒としては、例えば、メタノール。Examples of inert solvents include methanol.
エタノール、プロパツール、ブタノールなどのアルコー
ル類;メチレンクロライド1ジクt’ypメタン!クロ
ロホルム、四塩化炭素、l、2−ジアゾメタンなどの/
% gllノン炭化水素類;ジエチルエーテル、テトラ
ヒドロフラン、ジオキサン、ジメトキシエタンなどのエ
ーテル類;ジメチルホルム7ミド、ジエチル7セト7ミ
ド;酢酸エチル;水などが挙げられる。Alcohols such as ethanol, propatool, butanol; methylene chloride 1 dit'yp methane! Chloroform, carbon tetrachloride, l,2-diazomethane, etc./
Non-hydrocarbons; ethers such as diethyl ether, tetrahydrofuran, dioxane and dimethoxyethane; dimethylformamide, diethylamide; ethyl acetate; water and the like.
必要に応じて、塩基の存在下に反応を行なってもよ(・
。かかる塩基としては、例えば水酸化アルカリ金属、炭
酸水素アルカリ金属、炭酸アルカリ金属、トリフルキル
アミン、 N、N−ンフルキルペンジルアミン、ピリジ
ン、N−フルキルモルホリン等の有機もしくは無機の塩
基が挙げられる。かかる塩基の使用量は1通常式(1/
//)の化合物、その塩又はエステルに対して、1〜3
倍モルである。If necessary, the reaction may be carried out in the presence of a base (・
. Examples of such bases include organic or inorganic bases such as alkali metal hydroxide, alkali metal hydrogencarbonate, alkali metal carbonate, triflukylamine, N,N-furkylpenzylamine, pyridine, and N-furkylmorpholine. It will be done. The amount of such base to be used is 1 normal formula (1/
//) for the compound, its salt or ester, 1 to 3
It is twice the mole.
式(111の化合物、ジアルキル硫酸、又はジアゾフル
カンは、式(l“りの化合物、その塩、又はそのエステ
ルに対して、通常1〜3倍モル用(・られる。The compound of formula (111), dialkyl sulfate, or diazoflucan is usually used in a molar amount of 1 to 3 times the amount of the compound of formula (l), its salt, or its ester.
反応温度は特に限定されないが、通常、冷却下〜溶媒の
沸点程度の加熱下に行なわれる。Although the reaction temperature is not particularly limited, it is usually carried out under cooling to heating to about the boiling point of the solvent.
反応時間は1通常、数分〜数十時間である。The reaction time is usually several minutes to several tens of hours.
反応生成物は、溶媒抽出、晶析、りpマドグラフィー等
の公知の手段によって単離精製することができる。本反
応においては、原料化合物として、化合物(1″つのシ
ン異性体を用いた場合には、化合物(1″′勺 のシン
異性体が得られる。The reaction product can be isolated and purified by known means such as solvent extraction, crystallization, and polymerography. In this reaction, when a compound (1" syn isomer) is used as a starting compound, a compound (1" syn isomer) is obtained.
化合物(1′//)のシン及びアンチ異性体の混合物を
用いて場合には、化合物(1″つ のシン及びアンチ異
性体の混合物が得られる。かかる混合物は晶析、りpマ
ドグラフィー等の通常の手段により分離できる。When a mixture of syn and anti isomers of compound (1'//) is used, a mixture of syn and anti isomers of compound (1'//) is obtained. Such a mixture can be prepared by crystallization, lipography, etc. can be separated by conventional means.
脱保護、環生成、エステル化、還元反応は、反応式Aで
示した方法と同様にして行なうことができる。目的物の
結晶性無水物もしくは水和物を得る場合にも、反応式A
で示した方法と同様にして行なうことができる。Deprotection, ring formation, esterification, and reduction reactions can be carried out in the same manner as shown in reaction formula A. Also when obtaining a crystalline anhydride or hydrate of the target product, reaction formula A
This can be done in the same manner as shown in .
本発明の式(1)のセファ0スポリン誘導体、特にR1
が水素原子である式(1)のセファI:+スポリン誘導
体又はその薬学的に許容し5る塩又はそのエステルは、
広範囲のダラム陽性およびダラム陰性菌に対して高い抗
菌活性を示し1人を含む動物の細菌感染症の治療に有用
である。本発明のセファ0スポリン誘導体は、緑膿菌、
チフス菌、エンテロバクタ−等のダラム陰性函、黄色ブ
ドー状球菌、化膿しンサ球菌、枯草閉等のダラム陽性菌
に対し強力な抗菌活性を有する。また本発明のセファロ
スボリン誘導体は作用持続時間が長いという特徴を有す
る。Cephasporin derivatives of formula (1) of the present invention, especially R1
The Sepha I:+sporin derivative of formula (1), or a pharmaceutically acceptable salt thereof, or an ester thereof, wherein is a hydrogen atom,
It exhibits high antibacterial activity against a wide range of Durham-positive and Durham-negative bacteria and is useful for treating bacterial infections in animals, including humans. The Cefa-Osporin derivative of the present invention is Pseudomonas aeruginosa, Pseudomonas aeruginosa,
It has strong antibacterial activity against Durham-negative bacteria such as Salmonella typhi and Enterobacter, and against Durham-positive bacteria such as Staphylococcus aureus, Streptococcus pyogenes, and S. subtilis. Furthermore, the cephalosborin derivative of the present invention is characterized by a long duration of action.
本発明のセファ0スポリン誘導体、その薬学的に許容し
得る塩又はそのエステルは、非経口的または経口的に投
与される。非経口的tこ投与する剤型としては1例えば
静脈もしくは筋肉内注射剤、坐剤等がある。注射剤は水
性もしくは油性溶液、懸濁液等の形感なとることができ
る。The cephalosporin derivatives, pharmaceutically acceptable salts or esters thereof of the present invention are administered parenterally or orally. Examples of dosage forms for parenteral administration include intravenous or intramuscular injections, suppositories, and the like. Injectables can be in the form of aqueous or oily solutions, suspensions, and the like.
また投与前Kff菌水で再調合して使用する粉末。Also, the powder is reconstituted with Kff bacteria water before administration.
結晶であってもよい。坐剤はコフ7バター、グリセリド
等の通常の賦形剤K、必ffK応じて吸収促進剤を含有
せしめてなる製剤が挙げられる。It may be a crystal. Examples of suppositories include preparations containing ordinary excipients such as Coff7 butter and glyceride, and absorption enhancers as required.
経口的に投与する場合には1通常のカプセル剤1錠剤、
顆粒剤等があり、これらKは吸収促進剤、保存剤等を含
有せしめろことができる。When administered orally, 1 regular capsule 1 tablet;
There are granules and the like, and these K can contain absorption enhancers, preservatives, etc.
これら各種の製剤は当業界周知の方法で製造することが
できる。These various formulations can be manufactured by methods well known in the art.
本発明のセファ0スポリン誘導体、その薬学“・的に許
容しうる塩又はそのエステルの投与量は、年令、症状、
投与形態により異なるが、通常−・20〜2ooow/
日である。The dosage of the Cephasporin derivative of the present invention, its pharmaceutically acceptable salt, or its ester is determined based on age, symptoms,
It varies depending on the dosage form, but usually -20 to 2ooow/
It is day.
以下本発明を実施例により更に詳細に説明する。The present invention will be explained in more detail below with reference to Examples.
実施例1
(6R、7R)−7−(e乙)−2−(2−) リチ
ル7ミノチ7ゾールー4−イル)−2−フェノキシイミ
ノアセトアミド〕−3−トメチル−3−セフェム−4−
カルボン酸ベンツヒドリルエステル530■?エーテル
30jt64KM濁し℃おき79■を加え室温で1.5
時間よく攪拌した。Example 1 (6R, 7R)-7-(eot)-2-(2-) lythyl 7minothi7zol-4-yl)-2-phenoxyiminoacetamide]-3-tomethyl-3-cephem-4-
Carboxylic acid benzhydryl ester 530■? Add ether 30jt64KM to turbidity and add 79cm at room temperature to 1.5cm.
Stir well for a while.
沈澱物を濾過し、Fさい(500〜)にトリフロル酢酸
3 mlを加えて室温で1.5時間攪拌した。The precipitate was filtered, 3 ml of trifluoroacetic acid was added to F (500~), and the mixture was stirred at room temperature for 1.5 hours.
次いで20℃以下で減圧でトリフロル酢酸を除き、得ら
れる残査をエーテルでつぶして濾過捕IIシ、これを少
量のメタノールにとかしてHP−20イオン交換樹脂の
カラムを用いて水−メタノール混合溶媒系でメタノール
容量比を0条から40%まで頴次増しつつ精製した。Next, trifluoroacetic acid was removed under reduced pressure at 20°C or below, the resulting residue was triturated with ether and collected by filtration, and this was dissolved in a small amount of methanol and purified with a water-methanol mixed solvent using an HP-20 ion exchange resin column. Purification was carried out using the system while increasing the methanol volume ratio from 0% to 40%.
メタノール20%〜40%で溶出した分画を凍結乾燥し
目的とする(6R,7R)−7−〔(2))−2−7二
ノキシー2−(2−7ミノチアゾールー4−イル)7セ
ト7ミド〕−3−ピリジニウムメチル−3−セフェム−
4−カルボキシレートを含む粉末28■が得られた。The fraction eluted with 20% to 40% methanol was lyophilized to obtain the target (6R,7R)-7-[(2))-2-7dinoxy-2-(2-7minothiazol-4-yl)7set. 7mido]-3-pyridiniummethyl-3-cephem-
28 ml of powder containing 4-carboxylate was obtained.
IR(函−1)ニ
ア76
NMR(D、DMS 0−D20 ) δ:5.1
0 1 H(d15.8 5
1 H(d16.9〜8.1
11H
実施例2
(1) アセトニトリル250MK(6R,7R)−
7−アミノ−3−ヨードメチル−3−セフェム−4−カ
ルボン酸20.9を懸濁せしめ、水浴上で冷却しつつビ
ストリメチルシリル7セトアミド44ゴを滴下した。滴
下後さらに1時間攪拌した。IR (Box-1) Near 76 NMR (D, DMS 0-D20) δ:5.1
0 1 H (d15.8 5
1 H (d16.9-8.1
11H Example 2 (1) Acetonitrile 250MK(6R,7R)-
20.9 g of 7-amino-3-iodomethyl-3-cephem-4-carboxylic acid was suspended, and 44 g. of bistrimethylsilyl 7cetamide was added dropwise while cooling on a water bath. After the dropwise addition, the mixture was further stirred for 1 hour.
別の反応容器で100m/のCH,CJ、中、30.2
1の(Zl−2−フェノキシイミノ−2−(2−)リチ
ル7ミノチアゾールー4−イル)酢酸と13.2 gの
PCI sを室温で反応させ、すばやく氷水で洗浄後、
硫醗マグネシウム乾燥、濾過して(8)−2−フェノキ
シイミノ−2−(2−)リチル7ミノチ7ゾールー4−
イル)112りpライドのCH,C1t溶液を得た。こ
の溶液を前記7セトニトリル溶液中に氷冷下ゆっくり加
えた。加え終ってから室温で3θ分間攪拌し、(6R,
7R)−7−〔りl−2−(2−トリチル7ミノチ7ゾ
ールー4−イル) −2−フェノキシイミ/7セト7ミ
ド〕−3−ヨードメチル−3−セフェム−4−カルボン
酸トリメチルシリルエステルの7セトニトリル一ジクp
ロメタン混合溶液を得た。In another reaction vessel, 100 m/CH, CJ, medium, 30.2
1 of (Zl-2-phenoximino-2-(2-)lytyl-7minothiazol-4-yl)acetic acid and 13.2 g of PCI s were reacted at room temperature, and after quickly washing with ice water,
Dry magnesium sulfate and filter to obtain (8)-2-phenoximino-2-(2-)lythyl 7minotizole-4-
A CH, C1t solution of 112 chloride was obtained. This solution was slowly added to the above 7 settonitrile solution under ice cooling. After the addition was completed, stirred at room temperature for 3θ minutes, (6R,
7R)-7-[ri-2-(2-trityl7minotizol-4-yl)-2-phenoximide/7ceto7mide]-3-iodomethyl-3-cephem-4-carboxylic acid trimethylsilyl ester 7 Setonitrile 1 dikp
A mixed solution of lomethane was obtained.
(iil 該混合溶液を一20℃に冷却し、4−カル
バモイルピリジン5.5 、?を7セトニトリル5゜I
LIK溶解したものをゆっくり滴下した。滴下終了後同
温度でさらに2時間攪拌し徐々に室温まで温度を上げた
。(iii) Cool the mixed solution to -20°C, add 5.5°C of 4-carbamoylpyridine and 5°I of 7cetonitrile.
The dissolved LIK was slowly added dropwise. After the dropwise addition was completed, the mixture was stirred at the same temperature for an additional 2 hours, and the temperature was gradually raised to room temperature.
減圧下1c溶媒を留去し次いで10%の水を含むトリフ
ロー酢酸50mを加えて室温で約2時間はげしく攪拌し
た。攪拌終了後500 mlのジエチルエーテル中に注
いで得られた沈澱物を濾過し、乾燥すると約41gの固
体が得られた。The 1c solvent was distilled off under reduced pressure, and then 50 ml of trifluoroacetic acid containing 10% water was added, followed by vigorous stirring at room temperature for about 2 hours. After stirring, the resulting precipitate was poured into 500 ml of diethyl ether, filtered, and dried to obtain about 41 g of solid.
得られた固体を粉砕し水抽出し水を濃縮した後エタノー
ルを加えた。The obtained solid was crushed, extracted with water, the water was concentrated, and then ethanol was added.
エタノール溶液を水冷下放置すると沈澱が生じた。沈澱
を濾過して21gの(6R,7R)−7−〔(3)−2
−(2−7ミノチ7ゾールー4−イル)−2−フェノキ
シイミノ7セトアミド〕−3−ピリジニウムメチル−3
−セフェム−4−カルボキシレート・2−トリフルオロ
酢酸塩を得た。これを少量のメタノールにとかしてHP
−20イオン交換樹脂のカラムを用いて水−メタノール
混合溶媒系でメタノニル容量比をOチから40%やで順
次増しつつ精製した。When the ethanol solution was left to cool with water, a precipitate formed. The precipitate was filtered to obtain 21 g of (6R,7R)-7-[(3)-2
-(2-7minothi7zol-4-yl)-2-phenoximino7cetamido]-3-pyridiniummethyl-3
-cephem-4-carboxylate 2-trifluoroacetate was obtained. Dissolve this in a small amount of methanol and HP
Purification was carried out using a -20 ion exchange resin column in a water-methanol mixed solvent system while gradually increasing the methanol volume ratio from O to 40%.
メタノール20%−40チで溶出した分画を集めた。Fractions eluted with methanol 20%-40% were collected.
(iii) 該トリフルオロ酢酸塩溶液を穐型7ンバ
ーライトIRA−410イオン交換樹脂カラムを通した
後凍結乾燥して目的の(6R+ 7 R) −7−〔(
Zl−2−(2−7ミノチ7ゾールー4−イル)フェノ
キシイミノ7セト7ミド)−3−(ヒリジニウム)メチ
ル−3−セフェム−4−カルポギシレー) 5.0.9
を得た。(iii) The trifluoroacetate solution was passed through a 7-Amberlite IRA-410 ion exchange resin column and lyophilized to obtain the desired (6R+7R)-7-[(
5.0.9
I got it.
IR(crn−”) : 1775NMR(d、−
DMSO−D、O) δ:5.15 1
H(d1
5.90 1H(d)
6.9〜7.5 6 H
8,352)1(d1
9.15 2H(d)
実施例3
7セトニトリル2!中に(6R,7R)−7−7ミノー
3−ヨードメチル−3−セフェム−4−カルボン酸20
0.9を懸濁させ水浴上で冷却しつつビストリメチルシ
リル7セトアミド435 Illを滴下した。滴下後、
水冷下さらlC1時間攪拌した後、−20℃に冷却して
、(6R97R)−7−ピスドリメチルシリルアミノー
3−ヨードメチル−3−セフェム−4−カルボン酸トリ
メチルシリルエステルを得た。これに、攪拌しながら、
4−カルバモイルピリジン56Iを7セトニトリル40
0 rqlに溶かしたものをゆっくり滴下して、(6R
,7R)−7−ピスドリメチルシリル7ミノー3− (
4−カルバモイルピリジニウム)メチル−3−セフェム
−4−カルボン酸トリメチルシリルエステルの7セトニ
トリル溶液を得た。IR(crn-”): 1775NMR(d,-
DMSO-D, O) δ:5.15 1
H(d1 5.90 1H(d) 6.9-7.5 6 H 8,352) 1(d1 9.15 2H(d) Example 3 (6R,7R)-7- in 7cetonitrile 2! 7 minnow 3-iodomethyl-3-cephem-4-carboxylic acid 20
0.9 was suspended, and 435 Ill of bistrimethylsilyl 7cetamide was added dropwise while cooling on a water bath. After dripping,
After stirring for 1 hour under water cooling, the mixture was cooled to -20°C to obtain (6R97R)-7-pisdrimethylsilylamino-3-iodomethyl-3-cephem-4-carboxylic acid trimethylsilyl ester. Add to this while stirring,
4-carbamoylpyridine 56I to 7cetonitrile 40
Slowly drop the solution dissolved in 0 rql (6R
,7R)-7-pisdolymethylsilyl7minnow3- (
A solution of 4-carbamoylpyridinium) methyl-3-cephem-4-carboxylic acid trimethylsilyl ester in 7cetonitrile was obtained.
(11) 得られた溶液の温度を室温にまで高めた。(11) The temperature of the obtained solution was raised to room temperature.
別途、llのジグ2ルメタン中300.9の(3)−2
−フェノキシイSノー2−(2−トyチルアミノチアプ
ールー4−イル)酢酸と132.9の五塩化リンとから
調製したに)−2−メトキシイミノ−2−(2−)リチ
ル7ミノチ7ゾールー4−イル)酢酸りρライドの溶液
を前記溶液に一度に加えた。室温で1時間攪拌した後、
減圧にて大部分の溶媒を除去し、10チの水を含むトリ
フルオロ酢酸60 Q atを加えて室温で2時間攪拌
した。減圧にてトリフルオロ酢酸の大部分を留去し激し
く攪拌しつつジェチエーテル51を加えた。得られた沈
澱物を戸別し、Pさいより約1.51の水で抽出した。Separately, 300.9 (3)-2 in 1 l of jig 2 methane
-phenoxyimino-2-(2-methoxyimino-2-(2-)lythyl 7) prepared from 2-(2-tythylaminothiapur-4-yl)acetic acid and 132.9 phosphorus pentachloride A solution of minotizol-4-yl) acetic acid trichloride was added to the solution all at once. After stirring for 1 hour at room temperature,
Most of the solvent was removed under reduced pressure, and 60 Q at of trifluoroacetic acid containing 10 at of water was added, followed by stirring at room temperature for 2 hours. Most of the trifluoroacetic acid was distilled off under reduced pressure, and Jethiether 51 was added while stirring vigorously. The resulting precipitate was separated and extracted with approximately 1.51 liters of water.
抽出物を濃縮した後、約21のエタノールを加えて、冷
却放置し、得られた沈澱物を濾過すると(6R,7R)
−7−〔(2))−2−(2−7ミノチ7ゾールー4−
イル)−2−フェノキシイミノ7セト7ミド〕−3−(
4−カットハモイルピリジニウム)メチル−3−セフェ
ム−4−カルボキシレートの2−トリフルオロ酢酸塩を
得た。After concentrating the extract, add about 21 ml of ethanol, leave to cool, and filter the resulting precipitate (6R, 7R)
-7-[(2))-2-(2-7 minotizole-4-
yl)-2-phenoxyimino7ceto7mid]-3-(
2-trifluoroacetate of 4-cut hamoylpyridinium) methyl-3-cephem-4-carboxylate was obtained.
010 該トリフルオロ酢酸塩を水に溶解しNa型フ
′ンバーライ)IRA−410イオン交換樹脂カラムを
通した技凍結乾燥して目的の(6R,7R)−7−〔ン
l−2−(2−アミノチアゾール−4−イ/L、 )フ
ェノキシイミノ〕7セト7ξド〕−3−(4−カルバモ
イルピリジニウム)メチル〕3−セフェム−4−カルホ
キシレー)285.1i’を得た。010 The trifluoroacetate was dissolved in water and lyophilized through an IRA-410 ion exchange resin column to obtain the desired (6R,7R)-7-[l-2-(2)]. -Aminothiazol-4-i/L, )phenoximino]7cet7ξdo]-3-(4-carbamoylpyridinium)methyl]3-cephem-4-carboxyle) 285.1i' was obtained.
スペクトルデータ(IR,NMR)は実施例2で得られ
たものと一致した。Spectral data (IR, NMR) were consistent with those obtained in Example 2.
実施例4
実施例3の(i)と同様にして、500itの7でトニ
トリル中に(6R,7R)−7−7ミ/−3−ヨードメ
チル−3−セフェム−4−カルボン酸50.5’f!:
懸濁させ、110.?のビストリメチルシリルアセトア
ミドと14.?の4−カルバモイルピリジンとから(6
R,7R)−7−ピスドリメチルシリルアミノー3−(
4−カルバモイルピリンニウム)メチル−3−セフェム
−4−カルボン酸トリメチルシリルエステルの7セトニ
トリル溶液を得た。上記溶液に埴化メチレン300 r
R/中、35gの(2−1’pI:y7−t=+ルアミ
ノチアゾール−4−イル)グリオキシル酸と32gの五
塩化リンより調製した酸クロリド溶液を水冷下加えた。Example 4 Similarly to Example 3 (i), (6R,7R)-7-7mi/-3-iodomethyl-3-cephem-4-carboxylic acid 50.5' in tonitrile with 500 it of 7 f! :
suspend, 110. ? bistrimethylsilylacetamide and 14. ? from 4-carbamoylpyridine (6
R,7R)-7-pisdrimethylsilylamino-3-(
A solution of 4-carbamoylpyrinium) methyl-3-cephem-4-carboxylic acid trimethylsilyl ester in 7cetonitrile was obtained. Add 300 r of methylene to the above solution.
In R/, an acid chloride solution prepared from 35 g of (2-1'pI:y7-t=+ruaminothiazol-4-yl)glyoxylic acid and 32 g of phosphorus pentachloride was added under water cooling.
添加終了後、室温で30分攪拌した。続いて溶媒を留去
して固形状の残留物を得た。固形物をメタノール700
mlに溶解せしめ、! 6.5.9のO−フェニルヒ
ドロキ・Zレアミンを加えて室温にて16時間反応→t
しめた。After the addition was completed, the mixture was stirred at room temperature for 30 minutes. Subsequently, the solvent was distilled off to obtain a solid residue. methanol 700ml
Dissolve in ml! 6.5.9 O-phenylhydroxy-Zleamine was added and reacted at room temperature for 16 hours → t
Closed.
反応後溶媒を減圧留去したのちN N’−ジメチルホル
ムアミド100 rrlを加えて再度溶解し、千オ尿素
21Nを加え室温で3時間攪拌した。After the reaction, the solvent was distilled off under reduced pressure, 100 rrl of N N'-dimethylformamide was added to dissolve again, 21N of 1,000 urea was added, and the mixture was stirred at room temperature for 3 hours.
次いでこの反応溶液をllの7セトン中に加え沈澱物を
得た。Next, this reaction solution was added to 7 liters of setone to obtain a precipitate.
得られた固体をH−P−20イオン交換樹脂を用いて7
セトン水−混合溶媒系で7七トンの量比を0から40%
まで顆次増しつつ精製し、標記化合物を含む粉末16F
を得た。得られた化合物を液体クロマトグラフィー〔カ
ラム:RP−18、溶出溶媒:水−メタノール混合溶媒
ν検出: UV at 260nm)により分取して目
的化合物を得た。スペクトルデータ(IR,NMR)は
実施例2で得られたものと一致した。The obtained solid was purified using H-P-20 ion exchange resin.
Setone water-mixed solvent system with a quantitative ratio of 77 tons from 0 to 40%
Powder 16F containing the title compound was purified with increasing granularity until
I got it. The obtained compound was fractionated by liquid chromatography (column: RP-18, elution solvent: water-methanol mixed solvent ν detection: UV at 260 nm) to obtain the target compound. Spectral data (IR, NMR) were consistent with those obtained in Example 2.
実施例5
ルポキシレートの反応式DKよる合成
(1) 実施例3の(r+と同様にして、(6R,7
R)−7−7ミノー3−ヨードメチル−3−セフェム−
4−カルボン酸3.4 g+ 7セトニトリル50d及
び4−カルバモイルピリジン1.1.9より(6R,7
R)−7−ピスドリメチルシリルアミノー3−(4−カ
ルバモイルピリジニウム)メチル−3−セフェム−4−
カルボン酸トリメチルシリルエステルのアセトニトリル
溶液を得た。Example 5 Synthesis of lupoxylate according to reaction formula DK (1) In the same manner as (r+) in Example 3, (6R,7
R)-7-7 minnow 3-iodomethyl-3-cephem-
4-carboxylic acid 3.4 g + 7 from setonitrile 50d and 4-carbamoylpyridine 1.1.9 (6R, 7
R)-7-pisdrimethylsilylamino-3-(4-carbamoylpyridinium)methyl-3-cephem-4-
An acetonitrile solution of carboxylic acid trimethylsilyl ester was obtained.
一方、4−クロロ−3−オキンー(2)〕−〕2−フェ
ノキシイミノ酢酸2.2と、ジクpルメタン50U’中
室温で五塩化リン2.2gと反応せしめて4−クーp
−3−オキンーに)−2−フェノキシイミノ酢酸りpラ
イドのジクparメタン溶液を調製しておき、これを先
に得られたアセトニトリル溶液に一20℃でゆっくり加
えた。添加後徐々に室温まで温度を上げ、さらに1時間
攪拌した。反応後減圧にて溶媒を留去し泡状固形物s
3.0 gを得た。On the other hand, 2.2 g of 4-chloro-3-okine-(2)]-]2-phenoximinoacetic acid was reacted with 2.2 g of phosphorus pentachloride in 50 U' of dichloromethane at room temperature to produce 4-Cup.
A dipar methane solution of -2-phenoxyiminoacetic acid trilide was prepared in advance, and this was slowly added to the acetonitrile solution obtained earlier at -20°C. After the addition, the temperature was gradually raised to room temperature, and the mixture was further stirred for 1 hour. After the reaction, the solvent was distilled off under reduced pressure to form a foamy solid.
3.0 g was obtained.
+i) 該泡状固形物をジメチルホルムアミド60i
dKとかしてこれにチオ尿fi 1.9.9を加えて室
温で1晩攪拌した。+i) The foamy solid is dimethylformamide 60i
dK was dissolved, thiourine fi 1.9.9 was added thereto, and the mixture was stirred at room temperature overnight.
反応液をそのまま500dのジエチルエーテル中に投入
すると粘ちょうな液状物が分離し、エーテルをデカンテ
ーションして除いた後アセトン50m/を加えてかきま
わすと固形物が得られた。When the reaction solution was directly poured into 500 ml of diethyl ether, a viscous liquid was separated, and after the ether was removed by decantation, 50 ml of acetone was added and stirred to obtain a solid.
得られた固形物を水に溶かしてHP−20イオン交換樹
脂カラムを用い、水−7七トン混合溶媒系を月いて、ア
セトンの量比をOから40チまでj瓢次増しつつ待類し
標記化合物を含む残留物として480ηの白色個体が得
られた。これを高速液体クロマトグラフィーにより目庇
し推定純度は8G外であった。The obtained solid was dissolved in water, and a HP-20 ion exchange resin column was used, and a water-77 ton mixed solvent system was added to the mixture, and the acetone ratio was gradually increased from 0 to 40. A white solid of 480 η was obtained as a residue containing the title compound. This was checked by high performance liquid chromatography and the estimated purity was outside 8G.
実施例6
In vitro 抗菌活性
In vitro tft菌活性を、寒天平板希釈法
によって測定した。Example 6 In vitro antibacterial activity In vitro tft bacterial activity was measured by the agar plate dilution method.
各種試験菌をトリプトケース−ソイプロス中−夜培養し
、その−白金耳(生菌数I Q’/ ml )を、本発
明化合物を各種濃度で含むミュラー−ヒントン寒天に画
線し、37℃で16時間培養し、最小発育阻止濃度(M
IC,μg / ml )を求めた。Various test bacteria were cultured overnight in Tryptocase-Soypros, and a platinum loop (viable bacterial count IQ'/ml) was streaked onto Mueller-Hinton agar containing various concentrations of the compound of the present invention, and incubated at 37°C for 16 hours. The minimum inhibitory concentration (M
IC, μg/ml) was determined.
結果は表−Iに示した通りである。The results are shown in Table I.
表−I MIC(μg/鑓)
実施例7
34℃で培養する以外は実施例と同様にしてメチシリン
耐性黄色プ1!−球菌に対するInvitro活性を測
定した。Table-I MIC (μg/pigment) Example 7 Methicillin-resistant yellow P1! - In vitro activity against cocci was determined.
表−II MIC(μm/xi) チ CAD (セフタジジム) LH。Table-II MIC (μm/xi) Chi CAD (Ceftazidim) LH.
実施例8
次に他のよ発明の化合物についてのメチレリン耐性黄色
ブドー球菌に対する活性な(6R97R)−7−[(2
)−2−(2−7ミノチ7ゾールー4−イル)−2−フ
ェノキシイミノアセトアミド]−3−’アセトキシメチ
ルー3−セフェム−4−カルボン酸(比較化合物A)と
比較して示す。Example 8 Next, other inventive compounds were shown to be active against methyleneline-resistant Staphylococcus aureus (6R97R)-7-[(2
)-2-(2-7minothi7zol-4-yl)-2-phenoxyiminoacetamide]-3-'acetoxymethyl-3-cephem-4-carboxylic acid (comparative compound A).
化合物1:(6R,7R)−7−(り)−2−(2−7
ミ/チアノール−イーイル)−2−フェノキシイミノ7
セト7ミト’ ) −3−(4−カルボキシピリジニウ
ム)メチル−3−セフェム−4−カルボキシレート
化合物■;(6Rl 7R)−7−C(Z)−2−(2
−アミノチアゾール−4−イル)2−(o−フルオロフ
ェノキシイミノ)アセトアミドツー3−ピリジニウムメ
チル−3−セフェム−4−カルボキシレート
化合物111 ; (6R、7R)−7−((Zl−2
−(2−7ミノチ7プールー4−イル)−2−(p−フ
ルオロフェノキシイミノ)7セトアミド〕−3−ピリジ
ニウムメチル−3−セフェム−4−カルボキシレート
化合物■;(θR、71屯)−7−(に)−2−(2−
7ミノチ7ゾールー4−イル) −2−(p −フルオ
ロフェノキシイミノ)アセトアミド〕−3−(4−カル
ボキシピリジニウム)メチル−3−セフェム−4−カル
ボキシレート
化合物V ; (6R,7R)−7−C(2)−2−(
2−7ミノチ7ゾールー4−イル)−2−(p−フルオ
ロフェノキシイミノ)7セトアミド〕−3−(4−カル
バモイルピリジニウム)メチル−3−セフェム−4−カ
ルボキシレート化合物■; (6R,7R)−7−Cン
)−2−(2−7ミノチアゾールー4−イル) −2−
(m −トリフルオロメチルフェノキシイミノ)アセト
アミド) −3−(4−カルボキシピリジニウム)メチ
ル−3−セフェム−4−カルボキシレート化合物■;(
6RT7R) 7 (C12(2−7ミノチ7ゾー
ルー4−イル)−2−(m−トリフルオロメチルフェノ
キシイミノ)アセトアミド)−3−(4−カルバモイル
ピリンニウム)メチル−3−セフェム−4−カルボキシ
し一ト
化合物■; (6R、7R)−7−((Z)−2−(2
−アミンチアゾール−4−イル) −2−(m −トリ
フルオロメチルフェノやソイミノ)7セトアミド)−3
−(4−スルホエチルピリジニウム)メチル−3−セフ
ェム−4−カルボキシレート
化合物IX ; (GR、7R)−7−Cに)−2−(
2−7ミノチ7ゾールー4−イル)−2−(p−フルオ
ロフェノキシイミノ)アセトアミド〕−3−(3−スル
ホピリジニウム)メチル−3−セフェム−4−カルボキ
シレート
〈産業上の利用分野〉
本発明の七フ70スポリ二/誘導体、その塩又はそのニ
スデルは、強力な抗菌性を有し、多数のグラム陽性菌特
にメチシリン耐性黄色ブドー球菌、グラム陽性菌の生育
を強力に阻止し、各種の感染j症の治療、予防(で有用
である。Compound 1: (6R,7R)-7-(ri)-2-(2-7
(mi/thianol-eyl)-2-phenoximino 7
(6Rl 7R) -7-C(Z)-2-(2
-aminothiazol-4-yl)2-(o-fluorophenoxyimino)acetamide-3-pyridiniummethyl-3-cephem-4-carboxylate Compound 111; (6R,7R)-7-((Zl-2
-(2-7minothi7p-4-yl)-2-(p-fluorophenoxyimino)7cetamido]-3-pyridiniummethyl-3-cephem-4-carboxylate compound ■; (θR, 71 tons) -7 -(ni)-2-(2-
(6R,7R)-7- C(2)-2-(
2-7minothi7zol-4-yl)-2-(p-fluorophenoxyimino)7cetamido]-3-(4-carbamoylpyridinium)methyl-3-cephem-4-carboxylate compound ■; (6R,7R) -7-C-2-(2-7minothiazol-4-yl) -2-
(m-trifluoromethylphenoximino)acetamide) -3-(4-carboxypyridinium)methyl-3-cephem-4-carboxylate compound ■;(
6RT7R) 7 (C12(2-7minothi7zol-4-yl)-2-(m-trifluoromethylphenoximino)acetamide)-3-(4-carbamoylpyrinium)methyl-3-cephem-4-carboxylate compound ■; (6R,7R)-7-((Z)-2-(2
-aminethiazol-4-yl) -2-(m-trifluoromethylpheno or soimino)7cetamido)-3
-(4-sulfoethylpyridinium)methyl-3-cephem-4-carboxylate compound IX; (GR,7R)-7-C)-2-(
2-7 minothi7zol-4-yl)-2-(p-fluorophenoxyimino)acetamide]-3-(3-sulfopyridinium)methyl-3-cephem-4-carboxylate <Industrial field of application> The present invention Seven F70 sporini/derivatives, their salts, or their Nisdels have strong antibacterial properties, strongly inhibiting the growth of many Gram-positive bacteria, especially methicillin-resistant Staphylococcus aureus, and Gram-positive bacteria, and are effective against various infections. It is useful for the treatment and prevention of J-symptoms.
Claims (1)
は置換もしくは非置換のフェニル基、R^3は▲数式、
化学式、表等があります▼で表わされる置換もしくは非
置換の5〜6員環複素芳香族カチオンで該環は環中に酸
素、硫黄、窒素より撰択されるヘテロ原子を更に含有す
ることができまた他の環と縮合することもできる。〕 で表わされるセフアロスポリン誘導体。 2、R^2は式▲数式、化学式、表等があります▼〔こ
こでXはハロゲン原子低級アルキル基、低級アルコキシ
基、ハロゲノ低級アルサル基、低級アルケニル基、低級
アルキニル基、炭素数3〜7のシクロアルキル基、フェ
ニル基、シアノ基、−CONH_2または−(O)_l
(CH_2)m−COO_Y(ここでYは水素原子もし
くは低級アルキル基を、l、mは0または1を示す)を
示し、nは1〜5の整数を示す〕で表わされる置換フェ
ニル基である請求の範囲第1項のセフアロスポリン誘導
体。 3、R^2は式▲数式、化学式、表等があります▼〔こ
こでX′はハロゲン原子、ハロゲン低級アルキル基、−
CONH_2または−(O)_l(CH_2)m−CO
OY(ここでYは水素原子もしくは低級アルキル基を、
l、mは0または1を示す)で表わされる置換フエニル
基である請求の範囲第1項記載のセフアロスポリン誘導
体。 4、R^3は置換もしくは非置換のピラゾリウム−チア
ゾリウム−、オキサゾリウム−またはピリジニウム−カ
チオンである請求の範囲第1項記載のセフアロスポリン
誘導体。 5、下記式(2) ▲数式、化学式、表等があります▼(2) 〔式中、R^1及びR^2は上記定義に同じ、R^4は
水素原子又は保護基を表わす。Qはアシルオキシ基、カ
ルバモイルオキシ基又はハロゲン原子を表わす。pは0
又は1を表わす。〕 で表わされるセフアロスポリン化合物又はその塩と、下
記式(3) R^3′(3) 〔式中、R^3′は第4級アルキルアンモニウム基R^
3に対応する塩基〕 で表わされる化合物又はその塩とを反応せしめ、必要に
応じて脱保護、塩生成、エステル化及び/又は還元反応
に付すことを特徴とする下記式(1) ▲数式、化学式、表等があります▼(1) 〔式中、R^1、R^2、R^3は上記定義に同じ。〕
で表わされるセフアロスポリン誘導体、その塩はそのエ
ステルの製造法。 6、下記式(4) ▲数式、化学式、表等があります▼(4) 〔式中、R^1及びR^2は上記定義に同じ。〕で表わ
される化合物、その塩又はその反応性誘導体と下記式(
5) ▲数式、化学式、表等があります▼(5) 〔式中、R^3及びpは上記定義に同じ。〕で表わされ
る化合物、その塩、そのエステル又はその反応性誘導体
とを反応せしめ、必要に応じて脱保護、塩生成、エステ
ル化及び/又は還元反応に付すことを特徴とする下記式
(1)▲数式、化学式、表等があります▼(1) 〔式中、R^1、R^2、R^3は上記定義に同じ。〕
で表わされるセフアロスポリン誘導体、その塩又はその
エステルの製造法。 7、下記式(6) ▲数式、化学式、表等があります▼(6) 〔式中、R^1、R^3及びpは上記定義に同じ。〕で
表わされるセフアロスポリン誘導体、その塩又はそのエ
ステルと下記式(7) H_2N−OR^2(7) 〔式中、R^2は上記定義に同じ。〕 で表わされる化合物、その保護された化合物又はその塩
とを反応せしめ、必要に応じて脱保護、塩生成、エステ
ル化及び/又は還元反応に付すことを特徴とする下記式
(1) ▲数式、化学式、表等があります▼(1) 〔式中、R^1、R^2、R^3は上記定義に同じ。〕
で表わされるセフアロスポリン誘導体、その塩又はその
エステルの製造法。 8、下記式(8) ▲数式、化学式、表等があります▼(8) 〔式中、R^2、R^3及びpは上記定義に同じ。^5
はハロゲン原子を表わす。〕 で表わされる化合物、その塩又はそのエステルと下記式
(9) ▲数式、化学式、表等があります▼(9) 〔式中、R^1は上記定義に同じ。〕 で表わされる化合物又はその塩とを反応せしめ、必要に
応じて脱保護、塩生成、エステル化、及び/又は還元反
応に付すことを特徴とする下記式(1) ▲数式、化学式、表等があります▼(1) 〔式中、R^1、R^2、R^3は上記定義に同じ。〕
で表わされるセフアロスポリン誘導体、その塩又はその
エステルの製造法。 9、下記式(1″′) ▲数式、化学式、表等があります▼(1″′) 〔式中、R^1、R^3、R^4、R^5、l、m、n
、X及びpは上記定義に同じ。〕 で表わされるセフアロスポリン誘導体、その塩又はその
エステルと下記式(10) Hal−R^2′(10) 〔式中、R^2′は置換もしくは非置換のアルキル基、
置換もしくは非置換のシクロアルキル基又は置換もしく
は非置換の複素環基を表わすHalはハロゲン原子を表
わす。〕 で表わされる化合物とを反応せしめ、必要に応じて脱保
護、塩生成、エステル化、及び/又は還元反応に付すこ
とを特徴とする下記式(1″″)▲数式、化学式、表等
があります▼(1″″) 〔式中、R^1、R^2′、R^3は上記定義に同じ。 〕で表わされるセフアロスポリン誘導体、その塩又はそ
のエステルの製造法。 10、活性成分として請求の範囲第1項記載のセフアロ
スポリン誘導体、その塩又はそのエステル、及び必要に
応じて薬学的に許容しうる担体とからなる抗菌活性組成
物。[Claims] 1. The following formula (1) ▲There are numerical formulas, chemical formulas, tables, etc.▼ (1) [In the formula, R^1 represents a hydrogen atom or a protective group. R^2
is a substituted or unsubstituted phenyl group, R^3 is ▲ formula,
Chemical formulas, tables, etc. are available.A substituted or unsubstituted 5- to 6-membered ring heteroaromatic cation represented by ▼, which can further contain a heteroatom selected from oxygen, sulfur, and nitrogen in the ring. It can also be fused with other rings. ] A cephalosporin derivative represented by 2. R^2 is a formula ▲ Numerical formula, chemical formula, table, etc. ▼ [Here, cycloalkyl group, phenyl group, cyano group, -CONH_2 or -(O)_l
(CH_2) m-COO_Y (where Y represents a hydrogen atom or a lower alkyl group, l and m represent 0 or 1), and n represents an integer of 1 to 5] is a substituted phenyl group represented by A cephalosporin derivative according to claim 1. 3. R^2 is a formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [Here, X' is a halogen atom, a halogen lower alkyl group, -
CONH_2 or -(O)_l(CH_2)m-CO
OY (where Y is a hydrogen atom or a lower alkyl group,
2. The cephalosporin derivative according to claim 1, which is a substituted phenyl group represented by (l and m represent 0 or 1). 4. The cephalosporin derivative according to claim 1, wherein R^3 is a substituted or unsubstituted pyrazolium-thiazolium-, oxazolium- or pyridinium-cation. 5. Formula (2) below ▲ Numerical formulas, chemical formulas, tables, etc. are available ▼ (2) [In the formula, R^1 and R^2 are the same as defined above, and R^4 represents a hydrogen atom or a protective group. Q represents an acyloxy group, a carbamoyloxy group or a halogen atom. p is 0
Or represents 1. ] A cephalosporin compound or a salt thereof represented by the following formula (3) R^3' (3) [wherein R^3' is a quaternary alkylammonium group R^
3] The following formula (1) is characterized by reacting with a compound represented by or a salt thereof, and subjecting it to deprotection, salt formation, esterification and/or reduction reaction as necessary ▲ Formula, There are chemical formulas, tables, etc.▼(1) [In the formula, R^1, R^2, and R^3 are the same as the definitions above. ]
A method for producing cephalosporin derivatives, their salts and esters. 6. Formula (4) below ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (4) [In the formula, R^1 and R^2 are the same as the definitions above. ], its salt or its reactive derivative and the following formula (
5) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(5) [In the formula, R^3 and p are the same as the above definitions. ], a salt thereof, an ester thereof, or a reactive derivative thereof is reacted with the following formula (1), which is subjected to deprotection, salt formation, esterification and/or reduction reaction as necessary. ▲There are mathematical formulas, chemical formulas, tables, etc.▼(1) [In the formula, R^1, R^2, and R^3 are the same as the above definitions. ]
A method for producing a cephalosporin derivative, a salt thereof, or an ester thereof. 7. The following formula (6) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (6) [In the formula, R^1, R^3 and p are the same as the above definitions. ] A cephalosporin derivative, its salt, or its ester represented by the following formula (7) H_2N-OR^2 (7) [wherein R^2 is the same as the above definition. ] The following formula (1) is characterized by reacting the compound represented by the formula, its protected compound or its salt, and subjecting it to deprotection, salt formation, esterification and/or reduction reaction as necessary. , chemical formulas, tables, etc.▼(1) [In the formula, R^1, R^2, and R^3 are the same as the above definitions. ]
A method for producing a cephalosporin derivative, a salt thereof, or an ester thereof. 8. The following formula (8) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (8) [In the formula, R^2, R^3 and p are the same as the above definitions. ^5
represents a halogen atom. ] The compound represented by, its salt, or its ester and the following formula (9) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (9) [In the formula, R^1 is the same as the above definition. ] The following formula (1) is characterized by reacting with a compound represented by or a salt thereof and subjecting it to deprotection, salt formation, esterification, and/or reduction reaction as necessary ▲ Numerical formula, chemical formula, table, etc. ▼(1) [In the formula, R^1, R^2, and R^3 are the same as the above definitions. ]
A method for producing a cephalosporin derivative, a salt thereof, or an ester thereof. 9. The following formula (1''') ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (1''') [In the formula, R^1, R^3, R^4, R^5, l, m, n
, X and p are the same as defined above. ] A cephalosporin derivative represented by the following formula (10) Hal-R^2' (10) [wherein R^2' is a substituted or unsubstituted alkyl group,
Hal representing a substituted or unsubstituted cycloalkyl group or a substituted or unsubstituted heterocyclic group represents a halogen atom. ] The following formula (1″″) is characterized by reacting with a compound represented by and subjecting it to deprotection, salt formation, esterification, and/or reduction reaction as necessary. Yes▼(1″″) [In the formula, R^1, R^2', and R^3 are the same as the above definitions. ] A method for producing a cephalosporin derivative, a salt thereof, or an ester thereof. 10. An antibacterial active composition comprising the cephalosporin derivative according to claim 1, a salt thereof or an ester thereof as an active ingredient, and optionally a pharmaceutically acceptable carrier.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61195657A JPS6351389A (en) | 1986-08-22 | 1986-08-22 | Cephalosporin derivative, production thereof and composition having antimicrobial activity |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61195657A JPS6351389A (en) | 1986-08-22 | 1986-08-22 | Cephalosporin derivative, production thereof and composition having antimicrobial activity |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6351389A true JPS6351389A (en) | 1988-03-04 |
Family
ID=16344820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61195657A Pending JPS6351389A (en) | 1986-08-22 | 1986-08-22 | Cephalosporin derivative, production thereof and composition having antimicrobial activity |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6351389A (en) |
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US8968753B2 (en) | 2013-03-15 | 2015-03-03 | Calixa Therapeutics, Inc. | Ceftolozane-tazobactam pharmaceutical compositions |
US9044485B2 (en) | 2013-03-15 | 2015-06-02 | Calixa Therapeutics, Inc. | Ceftolozane antibiotic compositions |
US9724353B2 (en) | 2011-09-09 | 2017-08-08 | Merck Sharp & Dohme Corp. | Methods for treating intrapulmonary infections |
US9872906B2 (en) | 2013-03-15 | 2018-01-23 | Merck Sharp & Dohme Corp. | Ceftolozane antibiotic compositions |
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-
1986
- 1986-08-22 JP JP61195657A patent/JPS6351389A/en active Pending
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US9724353B2 (en) | 2011-09-09 | 2017-08-08 | Merck Sharp & Dohme Corp. | Methods for treating intrapulmonary infections |
US10028963B2 (en) | 2011-09-09 | 2018-07-24 | Merck Sharp & Dohme Corp. | Methods for treating intrapulmonary infections |
US8968753B2 (en) | 2013-03-15 | 2015-03-03 | Calixa Therapeutics, Inc. | Ceftolozane-tazobactam pharmaceutical compositions |
US9044485B2 (en) | 2013-03-15 | 2015-06-02 | Calixa Therapeutics, Inc. | Ceftolozane antibiotic compositions |
US9320740B2 (en) | 2013-03-15 | 2016-04-26 | Merck Sharp & Dohme Corp. | Ceftolozane-tazobactam pharmaceutical compositions |
US9872906B2 (en) | 2013-03-15 | 2018-01-23 | Merck Sharp & Dohme Corp. | Ceftolozane antibiotic compositions |
US10420841B2 (en) | 2013-03-15 | 2019-09-24 | Merck, Sharp & Dohme Corp. | Ceftolozane antibiotic compositions |
US11278622B2 (en) | 2013-03-15 | 2022-03-22 | Merck Sharp & Dohme Corp. | Ceftolozane antibiotic compositions |
US10376496B2 (en) | 2013-09-09 | 2019-08-13 | Merck, Sharp & Dohme Corp. | Treating infections with ceftolozane/tazobactam in subjects having impaired renal function |
US10933053B2 (en) | 2013-09-09 | 2021-03-02 | Merck Sharp & Dohme Corp. | Treating infections with ceftolozane/tazobactam in subjects having impaired renal function |
US8906898B1 (en) | 2013-09-27 | 2014-12-09 | Calixa Therapeutics, Inc. | Solid forms of ceftolozane |
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