JPH0433792B2 - - Google Patents
Info
- Publication number
- JPH0433792B2 JPH0433792B2 JP60089938A JP8993885A JPH0433792B2 JP H0433792 B2 JPH0433792 B2 JP H0433792B2 JP 60089938 A JP60089938 A JP 60089938A JP 8993885 A JP8993885 A JP 8993885A JP H0433792 B2 JPH0433792 B2 JP H0433792B2
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- reaction
- compound
- formula
- syn
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical class NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 27
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 18
- 239000002904 solvent Substances 0.000 description 18
- -1 for example Chemical group 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000013078 crystal Substances 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical class [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 8
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- IKWLIQXIPRUIDU-ZCFIWIBFSA-N (6r)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid Chemical compound OC(=O)C1=CCS[C@@H]2CC(=O)N12 IKWLIQXIPRUIDU-ZCFIWIBFSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- 229930186147 Cephalosporin Natural products 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N DMSO Substances CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 229940124587 cephalosporin Drugs 0.000 description 4
- 150000001780 cephalosporins Chemical class 0.000 description 4
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 4
- 235000017557 sodium bicarbonate Nutrition 0.000 description 4
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229910015900 BF3 Inorganic materials 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 239000002168 alkylating agent Substances 0.000 description 3
- 229940100198 alkylating agent Drugs 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 238000007363 ring formation reaction Methods 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- LXFQSRIDYRFTJW-UHFFFAOYSA-M 2,4,6-trimethylbenzenesulfonate Chemical compound CC1=CC(C)=C(S([O-])(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-M 0.000 description 2
- LIKWMDGAWXCECN-UHFFFAOYSA-N 2,4,6-trimethylbenzenesulfonic acid;dihydrate Chemical compound O.O.CC1=CC(C)=C(S(O)(=O)=O)C(C)=C1 LIKWMDGAWXCECN-UHFFFAOYSA-N 0.000 description 2
- UKYBHEPQCODSCP-UHFFFAOYSA-N 2-hydroxyimino-3-oxobutanamide Chemical compound CC(=O)C(=NO)C(N)=O UKYBHEPQCODSCP-UHFFFAOYSA-N 0.000 description 2
- TYEYBOSBBBHJIV-UHFFFAOYSA-N 2-oxobutanoic acid Chemical compound CCC(=O)C(O)=O TYEYBOSBBBHJIV-UHFFFAOYSA-N 0.000 description 2
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 2
- GCPWJFKTWGFEHH-UHFFFAOYSA-N acetoacetamide Chemical compound CC(=O)CC(N)=O GCPWJFKTWGFEHH-UHFFFAOYSA-N 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- WLXALCKAKGDNAT-UHFFFAOYSA-N diazoethane Chemical compound CC=[N+]=[N-] WLXALCKAKGDNAT-UHFFFAOYSA-N 0.000 description 2
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000002140 halogenating effect Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 235000010288 sodium nitrite Nutrition 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- DVVGIUUJYPYENY-UHFFFAOYSA-N 1-methylpyridin-2-one Chemical compound CN1C=CC=CC1=O DVVGIUUJYPYENY-UHFFFAOYSA-N 0.000 description 1
- MARXMDRWROUXMD-UHFFFAOYSA-N 2-bromoisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(Br)C(=O)C2=C1 MARXMDRWROUXMD-UHFFFAOYSA-N 0.000 description 1
- FLYPZWDELZKIOY-UHFFFAOYSA-O 2-carboxyethyl(triphenyl)phosphanium Chemical compound C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCC(=O)O)C1=CC=CC=C1 FLYPZWDELZKIOY-UHFFFAOYSA-O 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- JQJPBYFTQAANLE-UHFFFAOYSA-N Butyl nitrite Chemical compound CCCCON=O JQJPBYFTQAANLE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- 239000004157 Nitrosyl chloride Substances 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- AZFNGPAYDKGCRB-XCPIVNJJSA-M [(1s,2s)-2-amino-1,2-diphenylethyl]-(4-methylphenyl)sulfonylazanide;chlororuthenium(1+);1-methyl-4-propan-2-ylbenzene Chemical compound [Ru+]Cl.CC(C)C1=CC=C(C)C=C1.C1=CC(C)=CC=C1S(=O)(=O)[N-][C@@H](C=1C=CC=CC=1)[C@@H](N)C1=CC=CC=C1 AZFNGPAYDKGCRB-XCPIVNJJSA-M 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229940090012 bentyl Drugs 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- CUILPNURFADTPE-UHFFFAOYSA-N hypobromous acid Chemical compound BrO CUILPNURFADTPE-UHFFFAOYSA-N 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- GBMDVOWEEQVZKZ-UHFFFAOYSA-N methanol;hydrate Chemical compound O.OC GBMDVOWEEQVZKZ-UHFFFAOYSA-N 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- NSBNSZAXNUGWDJ-UHFFFAOYSA-O monopyridin-1-ium tribromide Chemical compound Br[Br-]Br.C1=CC=[NH+]C=C1 NSBNSZAXNUGWDJ-UHFFFAOYSA-O 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000007034 nitrosation reaction Methods 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- BMNDJWSIKZECMH-UHFFFAOYSA-N nitrosyl bromide Chemical compound BrN=O BMNDJWSIKZECMH-UHFFFAOYSA-N 0.000 description 1
- VPCDQGACGWYTMC-UHFFFAOYSA-N nitrosyl chloride Chemical compound ClN=O VPCDQGACGWYTMC-UHFFFAOYSA-N 0.000 description 1
- 235000019392 nitrosyl chloride Nutrition 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000004304 potassium nitrite Substances 0.000 description 1
- 235000010289 potassium nitrite Nutrition 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Thiazole And Isothizaole Compounds (AREA)
- Cephalosporin Compounds (AREA)
Description
〔産業上の利用分野〕
本発明は、2−アミノチアゾール誘導体、さら
に詳しくは、次の一般式
〔式中、R1は低級アルキル基を示す。〕
で表わされる2−アミノチアゾール誘導体(シン
異性体)に関する。
〔従来の技術〕
本発明者らは、既に、一般式
〔式中、R1は前記と同じ意味を有し、R2は水
素原子またはカルボキシル保護基を、R3は3位
エキソメチレン基と炭素−窒素結合する置換され
ていてもよい複素環式基を示す。〕
で表わされるセフアロスポリン(シン異性体)お
よびその塩が抗菌剤として極めて有用な化合物で
あることを見出し、特に特許出願した(特開昭57
−99592号、同59−93085号、同59−193893号、同
60−4191号、同60−6694号)。
〔本発明が解決しようとする問題点〕
本発明の目的は、優れた抗菌スペクトルを有す
る一般式〔〕のセフアロスポリン(シン異性
体)またはその塩の有用な中間体である一般式
〔I〕の新規な化合物(シン異性体)を提供する
ことにある。
〔問題点を解決するための手段〕
本発明者らは上記目的を達成すべく鋭意研究を
重ねた結果、遊離のアミノ基を有する一般式
〔I〕で表わされる2−アミノチアゾール誘導体
(シン異性体)を三弗化硼素またはその錯化合物
の存在下に一般式
〔式中、R2およびR3は前記と同じ意味を有す
る。〕
の化合物と反応させることによつて、はじめて一
般式〔〕のセフアロスポリン(シン異性体)ま
たはその塩が高収率にかつ容易に得られたことを
見出し、本発明を完成するに至つたものである。
以下、本発明を詳細に説明する。
一般式〔I〕におけるR1の低級アルキル基と
は直鎖または分枝鎖状C1〜5アルキル、たとえば、
メチル、エチル、n−プロピル、イソプロピル、
n−ブチル、イソブチル、sec.−ブチル、tert.−
ブチル、ペンチルなどを意味する。
つぎに、一般式〔I〕の化合物の製造法につい
て説明する。この化合物は、たとえば、下に示す
製造法に従つて製造することができる。
〔式中、R1は前記と同じ意味を有し、Xはハ
ロゲン原子を、はシンまたはアンチ異性体また
はそれらの混合物でもよいことを示す。〕
(1) 一般式〔V〕の化合物の製造
一般式〔V〕のニトロソ体は、一般式〔〕の
化合物にニトロソ化剤を反応させることによつて
得ることができる。
この反応は、通常溶媒中で行われ、使用される
溶媒としては、たとえば、水、酢酸、ベンゼン、
メタノール、エタノール、テトラヒドロフランな
どの反応に不活性な溶媒が挙げられる。また、こ
れらの溶媒を二種以上混合して用いることもでき
る。
つぎに、この反応で使用される好ましいニトロ
ソ化剤としては、亜硝酸およびその誘導体、たと
えば、塩化ニトロシル、臭化ニトロシルなどのハ
ロゲン化ニトロシル;亜硝酸ナトリウム、亜硝酸
カリウムなどの亜硝酸アルカリ金属塩;亜硝酸ブ
チルエステル、亜硝酸ベンチルエステルなどの亜
硝酸アルキルエステルなどが挙げられる。ニトロ
ソ化剤として亜硝酸の塩を使用する場合には、塩
酸、硫酸、ギ酸、酢酸などの無機酸もしくは有機
酸の存在下に反応を行うのが好ましい。また、ニ
トロソ化剤として亜硝酸アルキルエステルを使用
する場合には、アルカリ金属アルコキシドのよう
な強塩基の存在下に行うとよい。
このニトロソ化反応は、0℃〜30℃で、10分〜
10時間で完了する。
(2) 一般式〔〕の化合物の製造
一般式〔〕の化合物は、一般式〔V〕の化合
物にアルキル化剤を反応させることによつて得る
ことができる。
このアルキル化反応は、常法に従つて行うこと
ができ、通常−20〜60℃で、5分〜10時間で完了
する。ここで使用される溶媒としては、反応に悪
影響を与えない限りいかなる溶媒でもよく、たと
えば、テトラヒドロフラン、ジオキサン、メタノ
ール、エタノール、クロロホルム、塩化メチレ
ン、酢酸エチル、酢酸ブチル、N,N−ジメチル
ホルムアミド、N,N−ジメチルアセトアミド、
水などが挙げられる。また、これらの溶媒を二種
以上混合して用いることもできる。また、使用さ
れるアルキル化剤としては、たとえば、ヨウ化メ
チル、臭化メチル、ヨウ化エチル、臭化エチルな
どのハロゲン化低級アルキル、硫酸ジメチル、硫
酸ジエチル、ジアゾメタン、ジアゾエタンまたは
p−トルエンスルホン酸メチルなどが挙げられ
る。アルキル化剤としてジアゾメタン、ジアゾエ
タン以外の化合物を使用する場合には、通常炭酸
サトリウム、炭酸カリウムなどのアルカリ金属の
炭酸塩、水酸化ナトリウム、水酸化カリウムなど
のアルカリ金属の水酸化物、トリエチルアミン、
ビリジンなどの塩基の存在下に反応させるのがよ
い。
(3) 一般式〔〕の化合物の製造
一般式〔〕のハロゲン体は、一般式〔〕の
化合物にハロゲン化剤を反応させることによつて
得ることができる。
この反応は、通常溶媒中で行われ、使用される
溶媒としては、塩化メチレン、クロロホルムなど
のハロゲン化炭化水素;酢酸、プロピオン酸など
の有機酸;テトラヒドロフラン、ジオキサンなど
のエーテルなどの反応に悪影響を与えない溶媒が
挙げられる。また、これらの溶媒を二種以上混合
して用いることもできる。
このハロゲン化反応は、通常0〜50℃で、30分
〜24時間で完了する。
使用されるハロゲン化剤としては、臭素、塩素
などのハロゲン;塩化スルフリルなどのハロゲン
化スルフリル;次亜塩素酸、次亜臭素酸、次亜塩
素酸ナトリウムなどの次亜ハロゲン酸またはその
塩;N−ブロモスクシンイミド、N−クロロスク
シンイミド、N−ブロモフタルイミドなどのN−
ハロゲン化イミド化合物;ピリジニウムハイドロ
ブロマイド・パーブロマイド、2−カルボキシエ
チルトリフエニルホスホニウム・パーブロマイド
などのパーブロマイド化合物などが挙げられる。
(4) 一般式〔I〕の化合物の製造
一般式〔I〕の化合物は、一般式〔〕の化合
物にチオ尿素で閉環反応させることによつて得る
ことができる。この閉環反応は、通常溶媒中で行
われ、使用される溶媒としては、本反応に悪影響
を与えない限りいかなるものでもよく、たとえ
ば、水、メタノール、エタノール、アセトン、テ
トラヒドロフラン、ジオキサン、N,N−ジメチ
ルホルムアミド、N,N−ジメチルアセトアミ
ド、N−メチルピリドンなどが挙げられる。ま
た、これらの溶媒を二種以上混合して用いること
もできる。
また、この反応において、脱酸剤を添加すると
円滑に反応が進行することもあり、使用される脱
酸剤としては、たとえば、水酸化アルカリ金属
塩、炭酸水素アルカリ金属塩、トリエチルアミ
ン、ピリジン、N,N−ジメチルアニリンなどの
無機または有機塩基などが挙げられる。
反応時間は、通常1〜48時間、好ましくは1〜
10時間である。
この閉環反応は、0〜100℃の範囲で行われ、
チオ尿素は、一般式〔〕の化合物に対して、通
常1〜数倍モル使用するのがよい。
以上のようにして、一般式〔I〕のチアゾール
化合物のシン異性体を選択的に、高収率かつ安価
に得ることができる。
〔実施例〕
つぎに、本発明を実施例および参考例を挙げて
説明するが、本発明は、これに限定されるもので
はない。
実施例 1
(1) アセト酢酸アミド10.1gを水35mlに溶解さ
せ、氷冷下、亜硝酸ナトリウム6.9gを加えて、
0〜5℃で撹拌下に4N硫酸25mlを30分を要し
て滴下する。滴下終了後、同温度で30分間反応
させた後、飽和炭酸水素ナトリウム水溶液でPH
6.0に調整する。
不溶物を去した後、減圧下に水を留去し、
得られた残留物に酢酸エチル20mlを加えて析出
結晶を取すれば、融点96〜97℃を示す2−ヒ
ドロキシイミノ−3−オキソ酪酸アミド8.6g
(収率66.2%)を得る。
IR(KBr)cm-1;νc=p1670
NMR(d6−DMSO)δ値;
2.26(3H,s,CH3CO−),
7.46(1H,bs,
[Industrial Field of Application] The present invention relates to 2-aminothiazole derivatives, more specifically, the following general formula: [In the formula, R 1 represents a lower alkyl group. ] It is related with the 2-aminothiazole derivative (syn isomer) represented by these. [Prior Art] The present inventors have already developed the general formula [In the formula, R 1 has the same meaning as above, R 2 is a hydrogen atom or a carboxyl protecting group, and R 3 is an optionally substituted heterocyclic group that has a carbon-nitrogen bond with the exomethylene group at the 3-position shows. ] We discovered that cephalosporin (syn isomer) and its salts represented by
-99592, 59-93085, 59-193893, same
60-4191, 60-6694). [Problems to be Solved by the Present Invention] The object of the present invention is to provide a cephalosporin (synisomer) of the general formula [] having an excellent antibacterial spectrum or a useful intermediate of a salt thereof, the cephalosporin of the general formula [I]. The purpose of the present invention is to provide a new compound (syn isomer). [Means for Solving the Problems] As a result of intensive research to achieve the above object, the present inventors found that a 2-aminothiazole derivative (synisomer) represented by the general formula [I] having a free amino group body) in the presence of boron trifluoride or its complex compound to give the general formula [In the formula, R 2 and R 3 have the same meanings as above. ] It was discovered that cephalosporin (syn isomer) of the general formula [] or its salt could be easily obtained in high yield by reacting with the compound [], and the present invention was completed based on this discovery. It is. The present invention will be explained in detail below. The lower alkyl group of R 1 in general formula [I] refers to straight chain or branched C 1-5 alkyl, for example,
Methyl, ethyl, n-propyl, isopropyl,
n-butyl, isobutyl, sec.-butyl, tert.-
Meaning butyl, pentyl, etc. Next, a method for producing the compound of general formula [I] will be explained. This compound can be produced, for example, according to the production method shown below. [In the formula, R 1 has the same meaning as above, and X represents a halogen atom, which may be a syn or anti isomer or a mixture thereof. (1) Production of compound of general formula [V] The nitroso form of general formula [V] can be obtained by reacting the compound of general formula [] with a nitrosating agent. This reaction is usually carried out in a solvent, and the solvents used include, for example, water, acetic acid, benzene,
Examples include solvents that are inert to the reaction, such as methanol, ethanol, and tetrahydrofuran. Moreover, two or more kinds of these solvents can also be used as a mixture. Next, preferred nitrosating agents used in this reaction include nitrous acid and its derivatives, such as nitrosyl halides such as nitrosyl chloride and nitrosyl bromide; alkali metal salts of nitrite such as sodium nitrite and potassium nitrite; Examples include alkyl nitrites such as butyl nitrite and bentyl nitrite. When using a salt of nitrous acid as a nitrosating agent, the reaction is preferably carried out in the presence of an inorganic or organic acid such as hydrochloric acid, sulfuric acid, formic acid, or acetic acid. Furthermore, when a nitrous acid alkyl ester is used as a nitrosating agent, it is preferably carried out in the presence of a strong base such as an alkali metal alkoxide. This nitrosation reaction is carried out at 0°C to 30°C for 10 minutes to
Complete in 10 hours. (2) Production of compound of general formula [] The compound of general formula [] can be obtained by reacting the compound of general formula [V] with an alkylating agent. This alkylation reaction can be carried out according to a conventional method, and is usually completed in 5 minutes to 10 hours at -20 to 60°C. The solvent used here may be any solvent as long as it does not adversely affect the reaction, such as tetrahydrofuran, dioxane, methanol, ethanol, chloroform, methylene chloride, ethyl acetate, butyl acetate, N,N-dimethylformamide, N , N-dimethylacetamide,
Examples include water. Moreover, two or more kinds of these solvents can also be used as a mixture. The alkylating agents used include, for example, lower alkyl halides such as methyl iodide, methyl bromide, ethyl iodide, and ethyl bromide, dimethyl sulfate, diethyl sulfate, diazomethane, diazoethane, or p-toluenesulfonic acid. Examples include methyl. When a compound other than diazomethane or diazoethane is used as an alkylating agent, it is usually an alkali metal carbonate such as sodium carbonate or potassium carbonate, an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide, triethylamine,
The reaction is preferably carried out in the presence of a base such as pyridine. (3) Production of compound of general formula [] The halogen compound of general formula [] can be obtained by reacting the compound of general formula [] with a halogenating agent. This reaction is usually carried out in a solvent, and the solvents used include halogenated hydrocarbons such as methylene chloride and chloroform; organic acids such as acetic acid and propionic acid; and ethers such as tetrahydrofuran and dioxane, which adversely affect the reaction. Examples include solvents that do not give Moreover, two or more kinds of these solvents can also be used as a mixture. This halogenation reaction is usually completed at 0 to 50°C in 30 minutes to 24 hours. The halogenating agents used include halogens such as bromine and chlorine; sulfuryl halides such as sulfuryl chloride; hypohalous acids or salts thereof such as hypochlorous acid, hypobromous acid, and sodium hypochlorite; N - N- such as bromosuccinimide, N-chlorosuccinimide, N-bromophthalimide, etc.
Halogenated imide compounds; perbromide compounds such as pyridinium hydrobromide perbromide and 2-carboxyethyl triphenylphosphonium perbromide; and the like. (4) Production of compound of general formula [I] The compound of general formula [I] can be obtained by subjecting the compound of general formula [] to a ring-closing reaction with thiourea. This ring-closing reaction is usually carried out in a solvent, and any solvent may be used as long as it does not adversely affect the reaction. For example, water, methanol, ethanol, acetone, tetrahydrofuran, dioxane, N,N- Examples include dimethylformamide, N,N-dimethylacetamide, and N-methylpyridone. Moreover, two or more kinds of these solvents can also be used as a mixture. In addition, in this reaction, the reaction may proceed smoothly if a deoxidizing agent is added, and the deoxidizing agents used include, for example, alkali metal hydroxide, alkali metal hydrogen carbonate, triethylamine, pyridine, N , N-dimethylaniline, and other inorganic or organic bases. The reaction time is usually 1 to 48 hours, preferably 1 to 48 hours.
It is 10 hours. This ring-closing reaction is carried out in the range of 0 to 100°C,
Thiourea is usually used in an amount of 1 to several times the amount of the compound of general formula []. As described above, the syn isomer of the thiazole compound of general formula [I] can be selectively obtained in high yield and at low cost. [Example] Next, the present invention will be described with reference to Examples and Reference Examples, but the present invention is not limited thereto. Example 1 (1) 10.1 g of acetoacetamide was dissolved in 35 ml of water, and 6.9 g of sodium nitrite was added under ice cooling.
Add 25 ml of 4N sulfuric acid dropwise over 30 minutes while stirring at 0-5°C. After dropping, react at the same temperature for 30 minutes, then PH with saturated sodium bicarbonate aqueous solution.
Adjust to 6.0. After removing the insoluble matter, water was distilled off under reduced pressure,
Add 20 ml of ethyl acetate to the resulting residue and collect the precipitated crystals to obtain 8.6 g of 2-hydroxyimino-3-oxobutyric acid amide with a melting point of 96-97°C.
(yield 66.2%). IR (KBr) cm -1 ; ν c=p 1670 NMR (d 6 −DMSO) δ value; 2.26 (3H, s, CH 3 CO−), 7.46 (1H, bs,
【式】), 7.62(1H,bs,【formula】), 7.62 (1H, bs,
【式】),
12.60(1H,s,=N〜OH)
(2) 2−ヒドロキシイミノ−3−オキソ酪酸アミ
ド6.5gおよび無水炭酸ナトリウム5.6gを20℃
で水20mlに溶解させる。さらに、硫酸ジメチル
6.6gを20〜25℃で加えて、同温度で2時間撹
拌する。ついで、析出物を取し、得られた析
出物にメタノール100mlを加えて40〜50℃で30
分間撹拌する。ついで、不溶物を去した後、
減圧下に溶媒を留去し、得られた残留物にエタ
ノール20mlを加えて結晶を取すれば、融点
156〜157℃の2−(シン)−メトキシイミノ−3
−オキソ酪酸アミド5.2g(収率72.2%)を得
る。
IR(KBr)cm-1;νc=p1700,1670
NMR(d6−DMSO)δ値;
2.26(3H,s,CH3CO−),
3.96(3H,s,−OCH3),
7.46(1H,bs,[Formula]), 12.60 (1H, s, = N ~ OH ) (2) 6.5 g of 2-hydroxyimino-3-oxobutyric acid amide and 5.6 g of anhydrous sodium carbonate were heated at 20°C.
Dissolve in 20ml of water. Furthermore, dimethyl sulfate
Add 6.6g at 20-25°C and stir at the same temperature for 2 hours. Next, collect the precipitate, add 100ml of methanol to the obtained precipitate, and heat at 40-50℃ for 30 minutes.
Stir for a minute. Then, after removing the insoluble matter,
The solvent is distilled off under reduced pressure, and 20 ml of ethanol is added to the resulting residue to collect crystals, and the melting point is
2-(syn)-methoxyimino-3 at 156-157℃
- Obtain 5.2 g (yield 72.2%) of oxobutyric acid amide. IR (KBr) cm -1 ; ν c=p 1700, 1670 NMR (d 6 −DMSO) δ value; 2.26 (3H, s, CH 3 CO−), 3.96 (3H, s, −OCH 3 ), 7.46 ( 1H, bs,
【式】), 7.58(1H,bs,【formula】), 7.58 (1H, bs,
【式】)
(3) 2−(シン)−メトキシイミノ−3−オキソ酪
酸アミド7.2gをテトラヒドロフラン36mlに懸
濁させ、40℃で臭素0.8gを撹拌下に加える。
臭素による着色が消失するのを確認した後、25
〜30℃で、さらに臭素7.2gを撹拌下に加える。
同温度で1時間反応させた後、減圧下に溶媒を
留去する。得られた残渣に酢酸エチル50mlおよ
び水20mlを加え、飽和炭酸水素ナトリウム水溶
液でPH6.0に調整した後、有機層を分取し、飽
和食塩水20mlで洗浄する。ついで、無水硫酸マ
グネシウムで乾燥させた後、減圧下に溶媒を留
去する。得られた残留物にジイソプロピルエー
テル−酢酸エチル(1:1)の混合溶媒20mlを
加えて結晶を取すれば、融点112〜113℃の4
−プロモ−2−(シン)−メトキシイミノ−3−
オキソ酪酸アミド9.2g(収率82.1%)を得る。
IR(KBr)cm-1;νc=p1715,1660
NMR(d6−DMSO)δ値;
4.02(3H,s,−OCH3),
4.58(2H,s,BrCH2CO−),
7.72(2H,bs,−CONH2)
(4) 4−ブロモ−2−(シン)−メトキシイミノ−
3−オキソ酪酸アミド4.5gをエタノール13.5
mlに懸濁させ、チオ尿素1.5gを加えて20〜30
℃で1時間反応させる。析出晶を取し、エタ
ノールで洗浄した後、水25mlに懸濁させ、飽和
炭酸水素ナトリウム水溶液でPH6.0に調整する。
ついで、結晶を取し、水−メタノール(1:
1)の混合溶媒15mlで再結晶すれば、融点208
〜209℃の2−(2−アミノチアゾール−4−イ
ル)−2−(シン)−メトキシイミノ酢酸アミド
2.9g(収率71.8%)を得る。
IR(KBr)cm-1;νc=p1665
NMR(d6−DMSO)δ値;
3.84(3H,s,−OCH3),
6.75(1H,s,[Formula]) (3) 7.2 g of 2-(syn)-methoxyimino-3-oxobutyric acid amide is suspended in 36 ml of tetrahydrofuran, and 0.8 g of bromine is added under stirring at 40°C.
After confirming that the coloring caused by bromine has disappeared, 25
At ~30°C, add a further 7.2 g of bromine with stirring.
After reacting at the same temperature for 1 hour, the solvent was distilled off under reduced pressure. Add 50 ml of ethyl acetate and 20 ml of water to the resulting residue, adjust the pH to 6.0 with a saturated aqueous sodium bicarbonate solution, and then separate the organic layer and wash with 20 ml of saturated brine. After drying over anhydrous magnesium sulfate, the solvent is distilled off under reduced pressure. 20 ml of a mixed solvent of diisopropyl ether and ethyl acetate (1:1) is added to the resulting residue to collect crystals, resulting in 4.
-promo-2-(syn)-methoxyimino-3-
9.2 g (yield 82.1%) of oxobutyric acid amide is obtained. IR (KBr) cm -1 ; ν c=p 1715, 1660 NMR (d 6 −DMSO) δ value; 4.02 (3H, s, −OCH 3 ), 4.58 (2H, s, BrCH 2 CO−), 7.72 ( 2H, bs, -CONH 2 ) (4) 4-bromo-2-(syn)-methoxyimino-
4.5g of 3-oxobutyric acid amide and 13.5g of ethanol
ml, add 1.5 g of thiourea, and add 20 to 30 g of thiourea.
Incubate at ℃ for 1 hour. Collect the precipitated crystals, wash them with ethanol, suspend them in 25 ml of water, and adjust the pH to 6.0 with a saturated aqueous sodium bicarbonate solution.
Next, the crystals were collected and mixed with water-methanol (1:
If recrystallized with 15 ml of the mixed solvent of 1), the melting point will be 208.
2-(2-aminothiazol-4-yl)-2-(syn)-methoxyiminoacetic acid amide at ~209°C
Obtain 2.9 g (yield 71.8%). IR (KBr) cm -1 ; ν c=p 1665 NMR (d 6 -DMSO) δ value; 3.84 (3H, s, -OCH 3 ), 6.75 (1H, s,
【式】), 7.26(2H,bs,−NH2), 7.61(1H,bs,[Formula]), 7.26 (2H, bs, −NH 2 ), 7.61 (1H, bs,
【式】), 7.91(1H,bs,【formula】), 7.91 (1H, bs,
【式】)
実施例 2
2−(2−アミノチアゾール−4−イル)−2
−(シン)−メトキシイミノ酢酸アミド10.0gを、
三弗化硼素10.2g含むスルホラン20mlおよび無水
塩化メチレン20mlの混合溶媒中へ加える。室温で
1時間反応させた後、結晶を取する。ついで、
結晶を酢酸エチル100mlに懸濁させ、1時間撹拌
した後取する。酢酸エチル20mlで2回洗浄し、
乾燥すれば、結晶を14.1g得る。
IR(KBr)cm-1;1680,1650,1620,1200〜
1000
参考例 1
ピバロイルオキシメチル=7−アミノ−3−
(5−メチル−1,2,3,4−テトラゾール−
2−イル)メチル−Δ3−セフエム−4−カルボ
キシレート4.10gを酢酸エチル41mlに溶解させ、
実施例2で得られた結晶を3.36gを加えて室温で
3時間反応させる。ついで、反応液に水41mlを加
え、炭酸水素ナトリウムでPH4.5に調整する。有
機層を分取し、水20mlで洗浄した後、無水硫酸マ
グネシウムで乾燥させる。ついで、メシチレンス
ルホン酸・2水和物2.4gを加えて室温で1時間
反応させる。得られた結晶を取し、酢酸エチル
5mlで洗浄すれば、融点218〜220℃(分解)を示
すピバロイルオキシメチル=7−〔2−(2−アミ
ノチアゾール−4−イル)−2−(シン)−メトキ
シイミノアセトアミド〕−3−〔(5−メチル−1,
2,3,4−テトラゾール−2−イル)メチル〕
−Δ3−セフエム−4−カルボキシレートのメシ
チレンスルホン酸塩7.18g(収率90.5%)を得
る。
参考例 2
2−(2−アミノチアゾール−4−イル)−2−
(シン)−メトキシイミノ酢酸アミド6.0gを無水
塩化メチレン13mlに懸濁させ、15〜20℃で三弗化
硼素2.72gを含むスルホラン−無水塩化メチレン
(1:1)の混合溶液10.3mlを加えて同温度で10
分間反応させる。ついで、ピバロイルオキシメチ
ル=7−アミノ−3−(5−メチル−1,2,3,
4−テトラゾール−2−イル)メチル−Δ3−セ
フエム−4−カルボキシレート4.10gを含む無水
塩化メチレン溶液13mlを加えて30〜35℃で2時間
30分反応させる。ついで、反応液を氷水15ml中へ
導入し、飽和炭酸水素ナトリウム水溶液でPH5.5
に調整する。ついで、不溶物を去した後、有機
層を分取し、飽和食塩水15mlで洗浄した後、無水
硫酸マグネシウムで乾燥させる。減圧下に溶媒を
留去し、得られた残留物に酢酸エチル60mlを加え
て溶解させた後、メシチレンスルホン酸・2水和
物2.36gを加えて30分間撹拌し、析出晶を取す
れば、融点218〜220℃(分解)を示すピバロイル
オキシメチル=7−〔2−(2−アミノチアゾール
−4−イル)−2−(シン)−メトキシイミノアセ
トアミド〕−3−(5−メチル−1,2,3,4−
テトラゾール−2−イル)メチル−Δ3−セフエ
ム−4−カルボキシレートのメシチレンスルホン
酸塩6.37g(収率80.2%)を得る。
IR(KBr)cm-1;νc=p1782,1745,1680[Formula]) Example 2 2-(2-aminothiazol-4-yl)-2
-(Syn)-methoxyiminoacetic acid amide 10.0g,
Add to a mixed solvent of 20 ml of sulfolane and 20 ml of anhydrous methylene chloride containing 10.2 g of boron trifluoride. After reacting for 1 hour at room temperature, the crystals are collected. Then,
The crystals were suspended in 100 ml of ethyl acetate, stirred for 1 hour, and then collected. Wash twice with 20 ml of ethyl acetate,
After drying, 14.1 g of crystals are obtained. IR (KBr) cm -1 ; 1680, 1650, 1620, 1200~
1000 Reference example 1 Pivaloyloxymethyl = 7-amino-3-
(5-methyl-1,2,3,4-tetrazole-
Dissolve 4.10 g of 2-yl)methyl-Δ 3 -cephem-4-carboxylate in 41 ml of ethyl acetate,
Add 3.36 g of the crystals obtained in Example 2 and react at room temperature for 3 hours. Next, add 41 ml of water to the reaction solution, and adjust the pH to 4.5 with sodium hydrogen carbonate. The organic layer is separated, washed with 20 ml of water, and then dried over anhydrous magnesium sulfate. Then, 2.4 g of mesitylene sulfonic acid dihydrate was added and reacted for 1 hour at room temperature. The obtained crystals are collected and washed with 5 ml of ethyl acetate to give pivaloyloxymethyl 7-[2-(2-aminothiazol-4-yl)-2-, which has a melting point of 218-220°C (decomposition). (syn)-methoxyiminoacetamide]-3-[(5-methyl-1,
2,3,4-tetrazol-2-yl)methyl]
7.18 g (yield 90.5%) of mesitylene sulfonate of -Δ 3 -cephem-4-carboxylate is obtained. Reference example 2 2-(2-aminothiazol-4-yl)-2-
6.0 g of (syn)-methoxyiminoacetic acid amide was suspended in 13 ml of anhydrous methylene chloride, and 10.3 ml of a mixed solution of sulfolane-anhydrous methylene chloride (1:1) containing 2.72 g of boron trifluoride was added at 15 to 20°C. 10 at the same temperature
Let it react for a minute. Then, pivaloyloxymethyl=7-amino-3-(5-methyl-1,2,3,
Add 13 ml of anhydrous methylene chloride solution containing 4.10 g of 4-tetrazol-2-yl)methyl-Δ 3 -cephem-4-carboxylate and heat at 30 to 35°C for 2 hours.
Incubate for 30 minutes. Then, the reaction solution was introduced into 15 ml of ice water, and the pH was adjusted to 5.5 with a saturated aqueous sodium bicarbonate solution.
Adjust to. Then, after removing insoluble materials, the organic layer is separated, washed with 15 ml of saturated brine, and dried over anhydrous magnesium sulfate. The solvent was distilled off under reduced pressure, and 60 ml of ethyl acetate was added to the resulting residue to dissolve it, then 2.36 g of mesitylene sulfonic acid dihydrate was added and stirred for 30 minutes to remove the precipitated crystals. , pivaloyloxymethyl 7-[2-(2-aminothiazol-4-yl)-2-(syn)-methoxyiminoacetamide]-3-(5-methyl) with a melting point of 218-220°C (decomposed) -1,2,3,4-
6.37 g (yield: 80.2%) of mesitylene sulfonate of methyl-Δ 3 -cephem-4-carboxylate (tetrazol-2-yl) is obtained. IR (KBr) cm -1 ; ν c=p 1782, 1745, 1680
Claims (1)
異性体)。[Claims] 1. General formula [In the formula, R 1 represents a lower alkyl group. ] A 2-aminothiazole derivative (syn isomer) represented by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60089938A JPS60252473A (en) | 1985-04-27 | 1985-04-27 | 2-aminothiazole derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60089938A JPS60252473A (en) | 1985-04-27 | 1985-04-27 | 2-aminothiazole derivative |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59104759A Division JPS60248691A (en) | 1984-05-25 | 1984-05-25 | Novel preparation of cephalosporin compound and its intermediate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60252473A JPS60252473A (en) | 1985-12-13 |
JPH0433792B2 true JPH0433792B2 (en) | 1992-06-04 |
Family
ID=13984639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60089938A Granted JPS60252473A (en) | 1985-04-27 | 1985-04-27 | 2-aminothiazole derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60252473A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4283396A (en) * | 1976-01-23 | 1981-08-11 | Roussel Uclaf | 3-Acetoxymethyl-7-(hydroxyiminoacetamido)-cephalosporanic acid derivatives |
-
1985
- 1985-04-27 JP JP60089938A patent/JPS60252473A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4283396A (en) * | 1976-01-23 | 1981-08-11 | Roussel Uclaf | 3-Acetoxymethyl-7-(hydroxyiminoacetamido)-cephalosporanic acid derivatives |
Also Published As
Publication number | Publication date |
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JPS60252473A (en) | 1985-12-13 |
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