JPS60237442A - Developer for photosensitive lithographic plate - Google Patents

Developer for photosensitive lithographic plate

Info

Publication number
JPS60237442A
JPS60237442A JP9339984A JP9339984A JPS60237442A JP S60237442 A JPS60237442 A JP S60237442A JP 9339984 A JP9339984 A JP 9339984A JP 9339984 A JP9339984 A JP 9339984A JP S60237442 A JPS60237442 A JP S60237442A
Authority
JP
Japan
Prior art keywords
developer
water
sodium
plate
reducing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9339984A
Other languages
Japanese (ja)
Inventor
Yuzo Yokota
横田 雄三
Hidekazu Takai
高井 英一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Foil Manufacturing Co Ltd
Original Assignee
Nippon Foil Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Foil Manufacturing Co Ltd filed Critical Nippon Foil Manufacturing Co Ltd
Priority to JP9339984A priority Critical patent/JPS60237442A/en
Publication of JPS60237442A publication Critical patent/JPS60237442A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enhance hydrophilicness of the surface of aluminum to be exposed without impairing oleophilicness of image parts by incorporating a specified ether compd., an anionic surfactant, an alkaline substance, and a water-soluble reducing agent, and rapidly dissolving off the resin layer of the nonimage parts. CONSTITUTION:The developer contains an ether compd. represented by the formula: R-O-CH2CH2OH, R being phenyl or benzyl; an anionic surfactant, such as alkylnaphthalenesulfonate; an alkaline substance, such as a combination of water glass and sodium metasilicate; and a water-soluble reducing agent, preferably, one of compds., such as sodium bisulfite, sodium biphosphite, and hydrazine. A negative type PS plate prepared by a long term before can be effectively developed by using a developer composed of these 4 as effective components without causing no stain on each nonimage part of the printing plate, and good results can be obtained, too, by applying it to each PS plate avilable in the markets.

Description

【発明の詳細な説明】 「産業上の利用分野−1 本発明は、あらかじめアルミニウム支持体の表面に感光
性組成物を塗布1.て成る平版印刷版材(オフセラ)P
S版)の現像剤に関するものでネガタイプルs版(感光
性組成物がジアゾ化合物を主体としている)やポジタイ
プルs版(感光性組成物がキノンアジド化合物を主体と
している)を露光したあと非画像部を除去するだめの現
像剤に関するものである、 「発明が解決しようとする問題」 現在市販されているps版は、ネガタイプにあってiP
−ジアゾフェニルアミンのホルムアルデヒド縮合物に代
表されるジアゾ化合物と、また、ポジタイプにあっては
キノンジアジド化合物と画像部強化の目的で配合された
カルボン酸を含有するアクリル系多元共重合体とより成
る感光性組成物及び表面親水性を付与したアルミニウム
板から構成されている。か\るps版を用いて平版印刷
版をつくる過程において現像剤の極めて大きな役割は、
速やかに非画像部の感光性樹脂層を溶解除去し、且つ現
像によって露出したアルミ表面の親水性を低下させず、
むしろそれを助長l2、一方活性光線により硬化した画
像部の樹脂層の親油性を損なわないことである。
DETAILED DESCRIPTION OF THE INVENTION "Industrial Application Field-1 The present invention is a lithographic printing plate material (Offcera) P made by coating a photosensitive composition on the surface of an aluminum support in advance.
This is related to the developer for the negative type S plate (the photosensitive composition is mainly a diazo compound) or the positive type S plate (the photosensitive composition is mainly a quinone azide compound). ``Problem to be Solved by the Invention'' The PS version currently on the market is a negative type, and the iP
- Photosensitive material consisting of a diazo compound such as a formaldehyde condensate of diazophenylamine, and in the case of positive type, an acrylic multi-component copolymer containing a quinonediazide compound and a carboxylic acid blended for the purpose of strengthening the image area. It consists of a hydrophilic composition and an aluminum plate with a hydrophilic surface. The extremely important role of the developer in the process of making lithographic printing plates using PS plates is as follows:
The photosensitive resin layer in the non-image area is quickly dissolved and removed, and the hydrophilicity of the aluminum surface exposed by development is not reduced.
Rather, the aim is to promote this while not impairing the lipophilicity of the resin layer in the image area that has been cured by actinic rays.

本発明者は、先に上記の条件を十分満足すべきネガタイ
プ用現像剤として一般式R−0−CH2CH20H(式
中Rはフェニル基又はベンジル基を示す−以下同符号は
、同じものを意味する。)で表わされるエーテル化合物
、アニオン型界面活性剤、アルカリ性物質を含む現像剤
を提案し、更に、この発明のアルカリ性物質を周期律表
第1属人に属するアルカリ金属の水酸化物、珪酸塩、及
び四ホーサン塩とする、ネガ・ポジ両用タイプの現像剤
を提案した。然しなから製造後1年以上を経時したネガ
タイプ用現像剤を現像1.た場合、特に高温、多湿の悪
条件下に保存されたものについて非画像部に汚れが発生
する欠点のあることが判明した。
The present inventor first developed a negative type developer which fully satisfies the above conditions with the general formula R-0-CH2CH20H (wherein R represents a phenyl group or a benzyl group - hereinafter the same symbols mean the same thing). ), an anionic surfactant, and an alkaline substance. We proposed a developer for both negative and positive use, which uses , and four-hosan salt. However, if you use a negative type developer that has been used for more than one year since its manufacture, it is difficult to develop 1. It has been found that, when stored under adverse conditions such as high temperature and high humidity, there is a problem in that stains occur in non-image areas.

この理由は明らかでないが、恐らくアルミ層と感光性樹
脂層の界面において、酸化作用が促進されアルミ表面の
親水性が低下するものと考えられる。
Although the reason for this is not clear, it is thought that oxidation is promoted at the interface between the aluminum layer and the photosensitive resin layer, resulting in a decrease in the hydrophilicity of the aluminum surface.

「問題点を解決するだめの手段とその作用−1本発明者
等は本発明者が既に提案した前記発明につき、その利点
を頂うことなく上記欠点のみを解消することのできる現
像剤を提供すべく鋭意研究を行なった結果、所期する目
的を達成することのできる新規な現像剤の発明に到達し
、た−即ち本発明は、一般式R−0−CH2CH20H
で表わされるエーテル化合物、陰イオン界面活性剤、ア
ルカリ性物質、及び水溶性還元剤を含むことを特徴とす
る感光性平版印刷版用現像剤を提供するものである。
"Means for Solving the Problems and Their Effects - 1 The present inventors have provided a developer which can eliminate only the above disadvantages without obtaining the advantages of the above-mentioned invention already proposed by the present inventors. As a result of intensive research, we have arrived at the invention of a new developer that can achieve the desired purpose.
The present invention provides a developer for a photosensitive lithographic printing plate, which is characterized by containing an ether compound represented by the following formula, an anionic surfactant, an alkaline substance, and a water-soluble reducing agent.

こ\において、陰イオン界面活性剤としては脂肪酸塩(
(R’ Coo )nMm )、アルキルベンゼンスル
ホン酸塩((R’ +S Os )n Mm l−アル
キルスルホン酸塩((R” 03 ) n Mm l、
α−オレフィンスルホン酸塩((R’−qH2−R’S
O,)と(R’ CH=CHR2S % )n Mmの
混合)、ポリオキシエチレンアルキルエーテル)Y酸塩
(〔R1−〇−(CH2CH20猜−D −0−1,、
MI+。
In this case, the anionic surfactant is fatty acid salt (
(R'Coo)nMm), alkylbenzenesulfonate ((R'+SOs)nMml), alkylsulfonate ((R"03)nMml,
α-olefin sulfonate ((R'-qH2-R'S
O, ) and (R' CH=CHR2S % )n Mm), polyoxyethylene alkyl ether)Y acid salt ([R1-〇-(CH2CH20猜-D -0-1,,
MI+.

ナフタレンスルホン酸塩ホルムアルデヒド縮合物ナフタ
レンスルホン酸塩((R1−頭−So、 ) yrn 
)(但し、上記化学式中R1、R2,けアルキル基、n
、m、o、p、は重合鎖長又は結合基数(整数)を示1
,2Mはアルカリ塩を示す。) など各種のものを使用することが出来るが、これらの中
でもアルキルベンゼンスルホン酸塩、アルキルナフタレ
ンスルホン酸塩、ポリオキシエチレンアルキルフェニル
エーテル硫酸塩、とりわけアルキルナフタレンスルホン
酸塩が先に示した一般式のエーテル化合物との組合せに
おいて少4・でしかも現像効果があるので好適である。
naphthalene sulfonate formaldehyde condensate naphthalene sulfonate ((R1-head-So, ) yrn
) (However, in the above chemical formula, R1, R2, key alkyl group, n
, m, o, p indicate the polymer chain length or the number of bonding groups (integer) 1
, 2M indicates an alkali salt. ), among which alkylbenzene sulfonates, alkylnaphthalene sulfonates, polyoxyethylene alkylphenyl ether sulfates, and especially alkylnaphthalene sulfonates of the general formula shown above can be used. In combination with an ether compound, it is suitable because it has a small amount of 4% and has a developing effect.

本発明に用いるアルカリ性物質としては、水酸化カリウ
ム、水酸化ナトリウム、水酸化リチウム等の無機強アル
カリ、及び炭酸ソーダ、重炭酸ソーダ、ケイ酸カリウム
、ケイ酸ナトリウム、メタケイ酸ナトリウム、第三リン
酸ナトリウム2第ニリン酸ナトリウム、第三リン酸アン
モニウム、第ニリン酸アンモニウム、アンモニアなどの
弱アルカリ性無機物質、ならびにモノエチルアミン、ジ
メチルアミン、トリメチルアミン、モノエチルアミン、
ジエチルアミン、トリエチルアミン、モノインプロピル
アミン、ジイソプロピルアミン、n−ブチルアミン類、
モノエタノールアミン類、ジェタノールアミン、モノイ
ソプロパツールアミン、エチレンイミン、エチレンジア
ミン等の有機アミン化合物がある。
The alkaline substances used in the present invention include strong inorganic alkalis such as potassium hydroxide, sodium hydroxide, and lithium hydroxide, and sodium carbonate, sodium bicarbonate, potassium silicate, sodium silicate, sodium metasilicate, and sodium triphosphate 2. Weakly alkaline inorganic substances such as sodium diphosphate, tertiary ammonium phosphate, diammonium diphosphate, and ammonia, as well as monoethylamine, dimethylamine, trimethylamine, monoethylamine,
diethylamine, triethylamine, monoinpropylamine, diisopropylamine, n-butylamines,
There are organic amine compounds such as monoethanolamines, jetanolamine, monoisopropanolamine, ethyleneimine, and ethylenediamine.

ネガタイプP8版用の現像剤の調製にあたっては、これ
らの中でも弱アルカリ性無機物質を使用することが好ま
しいがアンモニアは悪臭があり、気散1〜やすく、それ
を用いた現像液がくりかえし使用するうち、その寿命が
短命となる恐れがあり好ましくない。
When preparing a developer for a negative type P8 plate, it is preferable to use a weakly alkaline inorganic substance among these, but ammonia has a bad odor and is easily dispersed, and as a developer using it is repeatedly used, This is not preferable since its life may be shortened.

有機アミン類が適当でkいのけ悪臭があるからであり、
強アルカリ性物質が適当でないのは、画像部や非画像部
を腐蝕する恐れがあるからである。
This is because organic amines are inappropriate and have a bad odor.
Strong alkaline substances are not suitable because they may corrode image areas and non-image areas.

しかしながら、ネガ・ポジps版両用タイプの現像剤の
調製にあたっては、水酸化カリウム等の強アルカリ物質
が必須であり、ただその際にも、強アルカリによる前記
腐蝕作用を緩和させみために珪酸塩を、また非画像部の
アルミニウム表面の変色防止を防ぐために四ホー酸塩を
併用干る。
However, when preparing a developer for both negative and positive PS plates, a strong alkaline substance such as potassium hydroxide is essential. Also, dry with tetraphorate to prevent discoloration of the aluminum surface in the non-image area.

本発明に用いる水溶性還元剤としては亜硫酸水素ナトリ
ウム、チオ硫酸ナトリウム、亜ジチオン酸ナトリウム、
亜硫酸ソーダ、亜硫酸カリウム等の硫黄化合物、水加ヒ
ドラジン、硫酸ヒドラジン、塩化ヒドラジン、亜硝酸ソ
ーダ等の窒素化合物、リン酸水素2ナトリウムなどの燐
化合物がある。
The water-soluble reducing agents used in the present invention include sodium bisulfite, sodium thiosulfate, sodium dithionite,
These include sulfur compounds such as sodium sulfite and potassium sulfite, nitrogen compounds such as hydrazine hydrate, hydrazine sulfate, hydrazine chloride, and sodium nitrite, and phosphorus compounds such as disodium hydrogen phosphate.

これ等の中で特に亜硫酸水素ナトリウム、水加ヒドラジ
ン、リン酸水素2ナトリウムを使用することが少量の添
加で効果が大きく好ましい。
Among these, it is particularly preferable to use sodium bisulfite, hydrazine hydrate, and disodium hydrogen phosphate because they are highly effective even when added in small amounts.

その他の水溶性還元剤として塩素化ヒドロシラン、水素
化エチルシラン等の金属水素化合物、水素化アルミニウ
ムリチウム、水素化ホー素ナトリウム等の金属水素錯化
合物、水素化ホー素亜鉛、水素化ホー素テトラアルキル
アンモニウム等の水素化ホー素亜鉛、トリエチルホスフ
ィツト、トリフェニルホスフィン等のリン化合物、ジボ
ラン、置換ボラン、ジイミド、塩挙げることが出来るが
、これ等還元剤は、水分解性が強く効果は小さい、本発
明の現像剤における各成分の配合にあたっては、ネガタ
イプ用とする場合には前記一般式のエーテル化合物10
0部(重量部以下同じ)に対し、陰イオン界面活性剤を
50〜300部、同エーテル化合物100部に対し、ア
ルカリ性物質10〜100部、同エーテル化合物100
部に対1〜水溶性還元剤5〜50部となるようにすれば
よい、 このうちでも陰イオン界面活性剤の好まし論配合量は、
200部前後であり、水溶性還元剤の好ま【7い配合量
は10部前後である、アルカリ性物質の好ましい配合量
はアルカリ性物質の種類によって一概にいえ々bが例え
ば弱アルカリ性無機物質の場合で60部前後である〜陰
イオン界面活性剤、アルカリ性物質及び水溶性還元剤の
エーテル化合物への配合量は臨界的に定まるものでは方
いが陰イオン界面活性剤が少なくカリすぎると、陰イオ
ン界面活性剤の主な作用−エーテル化合物の水への溶解
性を向上させる作用や、エーテル化合物、アルカリ性物
質、及び水溶性還元剤の感光性樹脂層への浸透性を向上
させる作用−が不充分となり、逆に多すぎても、現像作
用に悪影響を及ぼす、アルカリ性物質は、エーテル化合
物とともに感光性樹脂層を溶解する直接的な作用を発揮
するものであり、その量が少な過ぎると現像スピードが
不充分となる。逆にアルカリ性物質の量が多すぎると、
非画像部のアルミ表面の親水性を低下させるばかりか、
画像部を損傷させる。水溶性還元剤はアルミ層と感光性
樹脂層の界面におけるアルミ表面を清浄化しネガ型18
版の製造後長期間保存した版材でも汚れのない印刷版を
得るものでその添加量が少なければその効果が小さくな
る。逆に量が多すぎてもその効果はは七んど変化せず不
経済となる〜 ネガ・ポジps版両用タイプの現像剤における陰イオン
界面活性剤、アルカリ性物質、水溶性還元剤の配合割合
制限の意味は、前記の場合と同様であるがこ具体的配合
量は、前記とけ多少異なり次の通りである。
Other water-soluble reducing agents include metal hydride compounds such as chlorinated hydrosilane and ethylsilane hydride, metal hydride complex compounds such as lithium aluminum hydride and sodium borohydride, zinc borohydride, and tetraalkylammonium borohydride. Examples include zinc borohydride, phosphorus compounds such as triethylphosphite, triphenylphosphine, diborane, substituted borane, diimide, and salts. When formulating each component in the developer of the invention, when it is used for a negative type, an ether compound of the general formula 10
0 parts (the same below weight parts), 50 to 300 parts of anionic surfactant, 10 to 100 parts of alkaline substance, 100 parts of alkaline substance, and 100 parts of the same ether compound.
The amount of the anionic surfactant is preferably 1 to 5 to 50 parts per part of the water-soluble reducing agent.
The preferred amount of the water-soluble reducing agent is around 10 parts.The preferred amount of the alkaline substance varies depending on the type of alkaline substance. The amount of anionic surfactant, alkaline substance, and water-soluble reducing agent added to the ether compound is not critical, but if the amount of anionic surfactant is too low and too strong, the anionic interface The main action of the activator - the action of improving the solubility of the ether compound in water, and the action of improving the permeability of the ether compound, alkaline substance, and water-soluble reducing agent into the photosensitive resin layer - becomes insufficient. On the other hand, if the amount is too large, it will have a negative effect on the development effect.Alkaline substances, along with the ether compound, have a direct effect of dissolving the photosensitive resin layer, and if the amount is too small, the development speed will be impaired. It will be enough. On the other hand, if the amount of alkaline substances is too large,
Not only does it reduce the hydrophilicity of the aluminum surface in the non-image area,
Damage the image area. The water-soluble reducing agent cleans the aluminum surface at the interface between the aluminum layer and the photosensitive resin layer, and
A stain-free printing plate can be obtained even if the printing plate is stored for a long period of time after the printing plate has been manufactured, and the smaller the amount added, the smaller the effect will be. On the other hand, if the amount is too large, the effect will not change and it will become uneconomical. - Mixing ratio of anionic surfactant, alkaline substance, and water-soluble reducing agent in a developer for both negative and positive PS plates. The meaning of the restriction is the same as in the above case, but the specific amount to be added is slightly different from the above, and is as follows.

即ちエーテル化合物100部に対し陰イオン界面活性剤
は200〜800部、好ましくけ500部前後、アルカ
リ性物質は50〜200部、好ましくは100部前後、
水溶性還元剤は5〜50部、好ましくは10部前後であ
る7 このうちアルカリ性物質の配合にあたっては、n期律表
第−属AVcliするアルカリ金属の水酸化物100部
に対し珪酸塩20〜200部、同様に四ホーサン塩5〜
20部になるようにすればよい、なかでも好ましい配合
量は珪酸塩で50部前後、四ホーサン塩で10部前後で
ある〜 以北の本発明て係る現像剤はその使用に際し、従来にお
ける場合と同様に水溶液として調製する部となるように
すれば良い、 「発明の効果」 本発明は、前述1.たとおり、エーテル化合物、陰イオ
ン界面活性剤、アルカリ性物質、及び水溶性還元剤の四
成分を有効成分とするものであり、製造後長期にわたり
経時したネガ型PS版に対(7有効に作用して、印刷版
の非画像部によごれを発生させることがない良好な現像
効果を発揮する。
That is, for 100 parts of the ether compound, the anionic surfactant is 200 to 800 parts, preferably around 500 parts, and the alkaline substance is 50 to 200 parts, preferably around 100 parts.
The amount of the water-soluble reducing agent is 5 to 50 parts, preferably around 10 parts.7 Among these, when blending the alkaline substance, 20 to 20 parts of the silicate to 100 parts of the alkali metal hydroxide in Group AVcli of the N period table. 200 parts, similarly Siho San salt 5 ~
The preferred amount is around 50 parts for silicate and around 10 parts for tetrahosan salt. ``Advantageous Effects of the Invention'' The present invention has the advantages of the above-mentioned 1. As mentioned above, the four active ingredients are an ether compound, an anionic surfactant, an alkaline substance, and a water-soluble reducing agent. As a result, a good developing effect is achieved without staining the non-image areas of the printing plate.

又、従来市販されている各社のps版に共通して適応で
きるという特徴をも有する、 以下本発明を実施例等により、更に具体的に説明する。
It also has the feature that it can be commonly applied to PS versions of various companies that have been commercially available.The present invention will be explained in more detail below with reference to Examples.

「実施例及び効果試験」 実施例1゜ あらかじめ、清浄な逆流コンデンサー付11容ガラス製
反応容器にブチルセロソルブ4009’′ を注入し、
反応容器内に窒素を流入しながら攪拌し、反応容器の外
部より加温する、ブチルセロソルブの温度が80℃にな
れば次に示す組成物を上部分液炉斗よす1g゛/分の割
合で反応容器内に滴下し反応させる〜この時反応温度は
80〜86°Cの範囲で調製する7 メチルメタアクリレート 459 スチレン 10g アクリル酸 401F 2−wポリブタジェングリコール 5g(数平均分子量
1350±50 日本曹達製品a−1ooo) アゾビスイソブチロニトリル 2g 反応時間は上記組成物を滴下しはじめてから4〜5時間
時間騒々応終了後常温にて得られた四元共重合体溶液に
P−ジアゾジフェニルアミンとパラホルムアルデヒドの
縮合物の2−メトキシ−4−ヒドロキシ−5−ベンゾイ
ルベンゼンスルホン酸塩60gとオイルプルーナ603
の005g及び1.69のエチレンジアミンテトラ酢酸
(EDTA)次いでブチルセロソルブ240gを加えて
室温にて3時間攪拌混合した後、ブフナーp斗を用いて
東洋濾紙1250M−131を通して吸引濾過する。
"Examples and Effect Tests" Example 1゜Butyl cellosolve 4009'' was injected into a clean 11-volume glass reaction vessel equipped with a backflow condenser in advance.
Stir while flowing nitrogen into the reaction vessel and heat it from the outside of the reaction vessel. When the temperature of the butyl cellosolve reaches 80°C, add the following composition to the upper liquid furnace at a rate of 1 g/min. Drop into the reaction container and react. At this time, the reaction temperature is adjusted within the range of 80 to 86°C. Soda product a-1ooo) 2 g of azobisisobutyronitrile The reaction time was 4 to 5 hours from the time when the above composition was first added dropwise. After the noisy reaction, P-diazo 60g of 2-methoxy-4-hydroxy-5-benzoylbenzene sulfonate, a condensate of diphenylamine and paraformaldehyde, and Oil Pruner 603
After adding 005 g of 1.69 g of ethylenediaminetetraacetic acid (EDTA) and 240 g of butyl cellosolve and stirring and mixing at room temperature for 3 hours, the mixture was suction-filtered through Toyo Roshi 1250M-131 using a Buchner PTO.

次に得られたp液のうち255gをインプロピルアルコ
ール15009 、キシレン200g および鉛酸エチ
ル200gから成る混合溶媒で希釈し、感光性樹脂組成
物溶液を調製した。
Next, 255 g of the obtained p solution was diluted with a mixed solvent consisting of 15009 inpropyl alcohol, 200 g of xylene, and 200 g of ethyl leadate to prepare a photosensitive resin composition solution.

次に、この感光性樹脂組成物溶液をあらかじめ線面化し
、親水化処理された厚さo、zsm/n のアルミニウ
ム2S材上にバーコーターf6を用いて塗布【−た後1
00°Cの熱風乾燥器にて1分間乾燥して感光性樹脂板
を作成した、乾燥塗布重量は20か?であった。この感
光性樹脂板を温度90°Cの熱風乾燥機中に8時間とい
う過酷条体に放置した後真空焼枠中で陰画を通して4K
W容超高圧水鎖灯にて1mの距離から20秒間露光し、
次に示す現像液にて25℃で1分間浸漬後とり出し水洗
して乾燥し平版印刷版を得た。
Next, this photosensitive resin composition solution was linearized in advance and coated on an aluminum 2S material having a thickness of o and zsm/n which had been subjected to a hydrophilic treatment using a bar coater F6.
A photosensitive resin plate was created by drying in a hot air dryer at 00°C for 1 minute.The dry coating weight was 20? Met. This photosensitive resin plate was left in a hot air dryer at a temperature of 90°C for 8 hours, and then a negative image was printed in a vacuum baking frame.
Exposure for 20 seconds from a distance of 1 m using a double ultra-high pressure water chain lamp.
The plate was immersed in the following developer at 25° C. for 1 minute, taken out, washed with water, and dried to obtain a lithographic printing plate.

エチレングリコールモノフェニルエーテル 35 gア
ルキルナフタレンスルホン酸ソーダ 70 9第三燐酸
ナトリウム 79 水ガラス(1183号)8g ヒドラジン水化物(含有量80%) 3 g水 100
0 f この印刷版をハイデルGTO印刷機にかけて上質紙に印
刷したところ10万部以上印刷することが出来た。
Ethylene glycol monophenyl ether 35 g Sodium alkylnaphthalene sulfonate 70 9 Sodium triphosphate 79 Water glass (No. 1183) 8 g Hydrazine hydrate (content 80%) 3 g Water 100
0 f When this printing plate was printed on high-quality paper using a Heidel GTO printing machine, more than 100,000 copies could be printed.

同様に上記現像液組成よりヒドラジン水化物を除いた組
成の現像液で現像【−で得られた印刷版で印刷をしたと
ころ1000部を印刷した時点から非画像部に地よごれ
を発生し1500部で印刷不能となった。
Similarly, when printing was carried out with the printing plate obtained by developing with a developer having a composition other than hydrazine hydrate from the above developer composition, staining occurred in the non-image area after printing 1000 copies. It became impossible to print.

実施例2゜ 実施例1と全く同じ方法で感光性樹脂液を調製し、アル
ミ板上に塗布1.て28版を作成し、温度90°Cの熱
風乾燥機の中に8時間という過酷条件の下に放置した後
、真空焼枠中で陰画を通して4KW容超高圧水銀灯にて
1mの距離から20秒間露光し、水洗して乾燥し平版印
刷版を得た、エチレンクリコールモノフェニルエーテル
 30 9アルキルナフタレンスルホン酸ソーダ 60
 gメタ珪酸ソーダ 6g 水ガラス(5183号)7g 重亜硫酸ソーダ 2g 水 1000 g この印刷版をハイデルGTO印刷機にかけて上質紙に印
刷1−だところ10万部以上印刷することが出来た、 実施例5 実施例1に準じてps版を作成1−1同様に20秒間露
光したものを次に示す現像液にて25°Cで30秒間浸
漬後とり出]−1水洗して乾燥し平版印刷版を得た。
Example 2 A photosensitive resin liquid was prepared in exactly the same manner as in Example 1, and coated on an aluminum plate. 28 plates were created, and after being left in a hot air dryer at a temperature of 90°C for 8 hours under harsh conditions, the negatives were passed through a vacuum printing frame for 20 seconds from a distance of 1 meter using a 4KW ultra-high pressure mercury lamp. Ethylene glycol monophenyl ether 30 9 Sodium alkylnaphthalene sulfonate 60
g Sodium metasilicate 6g Water glass (No. 5183) 7g Sodium bisulfite 2g Water 1000g This printing plate was printed on high-quality paper using a Heidel GTO printing machine.It was possible to print more than 100,000 copies on high-quality paper.Example 5 A PS plate was prepared according to Example 1. It was exposed to light for 20 seconds in the same manner as in 1-1, and then immersed in the following developer at 25°C for 30 seconds and then taken out]-1 Washed with water and dried to form a lithographic printing plate. Obtained.

エチレングリコールモノベンジルエーテル 40 9ア
ルキルナフタレンスルホン酸ソーp−80gセスキ炭酸
ソーダ 6g 水ガラス(1185号) 8(7 重亜燐酸ソーダ 4g 水 1000 g この平版印刷版を用いて実施例1と同様印刷を行なった
結果10万部以上地よごれの発生もなく印刷出来た。
Ethylene glycol monobenzyl ether 40 9 Alkylnaphthalene sulfonic acid salt p-80 g Sodium sesquicarbonate 6 g Water glass (No. 1185) 8 (7 Sodium biphosphite 4 g Water 1000 g Printing was carried out in the same manner as in Example 1 using this lithographic printing plate. As a result, we were able to print over 100,000 copies without any stains.

実施例4゜ 製造後2年間を経時した日本製箔(株)製の市販のポジ
タイプPS版(アルスターPS)とネガタイプルs版(
アルスターNS)に、それぞれ陽画、陰画の画像フィル
ムを重ねて、4 KW超高圧水銀灯にて1mの距離から
50秒間露光した後、次に示す現像液にて現像し水洗乾
燥して平版印刷版を得た。
Example 4゜A commercially available positive type PS plate (Ulstar PS) and negative type S plate (made by Nippon Foil Co., Ltd.) were used for two years after manufacture.
After stacking the positive and negative image films on a 4KW ultra-high pressure mercury lamp for 50 seconds from a distance of 1 m, they were developed with the following developer, washed with water, and dried to form a lithographic printing plate. Obtained.

エチレングリコールモノフェニルエーテル 30 fア
ルキルナフタリンスルホン酸ソーダ 180 9水酸化
ナトリウム 109 水ガラス(1186号)25g ヒドラジン水化物 10g 四ホーサンンーダ 2g 水 1000 9 この印刷版をハイデルGTO印刷機にかけて上質紙に印
刷したところポジタイプPS版(アルスターps)を用
いたものは5万部以上、ネガ24128版(アルスター
NS)を用いたものは10万部以上印刷することが出来
た。同様に上記現像液組成よりヒドラジンを除すた組成
の現像液で現像して得られた印刷版で印刷をしたところ
ポジタイプルs版(アルスターps)を用いた印刷版け
15000部を、又ネガ24128版(アルスターNS
)を用いた印刷版は1000部を印刷した時点から各々
地よごれを発生し印刷不能とhつだ。
Ethylene glycol monophenyl ether 30 f Sodium alkylnaphthalene sulfonate 180 9 Sodium hydroxide 109 Water glass (No. 1186) 25 g Hydrazine hydrate 10 g Shihosanunda 2 g Water 1000 9 This printing plate was printed on high-quality paper using a Heidel GTO printing machine. We were able to print over 50,000 copies using the positive type PS plate (Ulster PS) and over 100,000 copies using the negative 24128 plate (Ulster NS). Similarly, when printing was carried out using a printing plate obtained by developing with a developer having a composition with the above developer composition minus hydrazine, 15,000 copies of the printing plate using a positive pull S plate (Ulster PS) were printed, and a negative 24,128 copies were printed. Edition (Ulster NS
) printing plates began to smudge and became unprintable after 1,000 copies had been printed.

実施例5゜ 入手後2年間を経時した富士写真フィルム@)製の市販
のポジタイプルs版(FPD)とネガタイプルs版(F
NS)VClそれぞれ陽画、陰画の画像フィルムを重ね
て4 KW超高圧水銀灯にて1mの距離から50秒間露
光した後、次に示す現像液にて現像し、水洗乾燥し7て
平版印刷版を得たーエチレンクリコールモノフェニルエ
ーテル 25 9アルキルナフタリンスルホン酸ソーダ
 150 g水酸化カリウム 109 水ガラス(5183号)20g 重亜硫酸ソーダ 109 四ホーサンンーダ 2g 水 1000 9 この印刷版を実施例4に準じてハイデルGTO印刷機を
用いて印刷したところポジタイプps版(FPD’)を
用いた印刷版は5万部以上、ネガタイプPS版CFMS
 )を用いたものは10万部以上印刷することが出来だ
。同様に上記現像液組成より重亜硫酸ソーダを除いた組
成の現像液で現像して得られた印刷版で印刷をしたとこ
ろポジ241フ8版で10000部を、又ネガタイプF
S版では、尽1り出1.の時点から地よごれが発生1.
印刷不能となった。
Example 5 Commercially available positive type S plate (FPD) and negative type S plate (FPD) manufactured by Fuji Photo Film @) were used for two years after acquisition.
NS) VCl Positive and negative image films were stacked and exposed for 50 seconds from a distance of 1 m using a 4 KW ultra-high pressure mercury lamp, then developed with the following developer, washed with water and dried (7) to obtain a lithographic printing plate. ter-ethylene glycol monophenyl ether 25 Sodium 9-alkylnaphthalene sulfonate 150 g Potassium hydroxide 109 Water glass (No. 5183) 20 g Sodium bisulfite 109 Four-hothannda 2 g Water 1000 9 This printing plate was prepared using Heidel GTO according to Example 4. When printed using a printing machine, more than 50,000 copies were printed using a positive type PS plate (FPD'), and more than 50,000 copies were printed using a negative type PS plate (CFMS).
) can print more than 100,000 copies. Similarly, printing was carried out using a printing plate obtained by developing with a developer having a composition other than the above-mentioned developer composition except for sodium bisulfite.
In the S version, there are 1. Ground stains occurred from the point of 1.
It became impossible to print.

試験例1〜17 実施例1にて製造し90℃で8時間苛酷処理したps版
を真空焼枠中で陰画を通1−で4KW超高圧水銀灯にて
1mの距離から20秒間露光した後表−1に示す現像液
にて平版印刷版を得た。その結果を同表に併せて示す、 尚表中の米1、米2、米5、米4、及び米5部分の意味
は次の通りである。
Test Examples 1 to 17 The PS plate manufactured in Example 1 and subjected to severe treatment at 90°C for 8 hours was exposed in a vacuum printing frame for 20 seconds from a distance of 1 m with a 4KW ultra-high pressure mercury lamp at 1-1000 kHz, and then the front side was exposed. A lithographic printing plate was obtained using the developer shown in -1. The results are shown in the same table. The meanings of rice 1, rice 2, rice 5, rice 4, and rice 5 in the table are as follows.

米I A;エチンQ−リ*−ルモノフェニルエーテルB
;アルキルナフクレンスルホン酸ソーダC;第三燐酸ナ
トリウム D;水ガラス(5183号) E;ヒドラジン水利物(80%溶液) F;水 米225°Cの現像液中にps版を浸漬し肉眼にて現像
完了を確認するまでの時間。
Rice I A; Ethyne Q-lyl monophenyl ether B
; Sodium alkylnafucrene sulfonate C; Sodium triphosphate D; Water glass (No. 5183) E; Hydrazine aquarium (80% solution) F; Water rice immersed in a developer solution at 225°C to visualize with the naked eye The time it takes to confirm that development is complete.

米3 Pa版を現像終了后水洗乾燥したものの非画像部
の接触角。(ゴニオメータ−による測定値) 米A PS版を現像終了后水洗乾燥したものの非画像部
にオフセット用印刷インキをローラーにて塗布し40°
C温水をインキ表面に流しっ5スポンジにてインキ面を
こすりインキの脱落状態を示す。
Contact angle of the non-image area of a 3Pa plate washed with water and dried after development. (Measurement value using a goniometer) A US A PS plate was washed and dried after development, and offset printing ink was applied with a roller to the non-image area at 40°.
C. Pour warm water onto the ink surface and rub the ink surface with a sponge to see how the ink comes off.

1:インキが全く脱落しない 2:わずかに脱落する 3=はとんど脱落するが版の表面に薄く残留する4:脱
落する(強くスポンジにて拭う)5:脱落する(軽くス
ポンジにて拭う)米5 自動現像機(富士写真フィルム
# 400−K )にて現像しPS版の通し枚数毎によ
ごれ特性を測定し、そのよごれ特性が米4における4〜
5に評価される範囲の通し枚数を現像液11に対する平
方メートル(面積)にて示す。
1: Ink does not fall off at all 2: Slightly falls off 3 = Most of the ink falls off, but a thin layer remains on the surface of the plate 4: It falls off (wipe it hard with a sponge) 5: It falls off (wipe it lightly with a sponge) ) Rice 5 was developed with an automatic processor (Fuji Photo Film #400-K) and the staining characteristics were measured for each number of PS plates passed through, and the staining characteristics were 4 to 4 in Rice 4.
The number of sheets passed through the range evaluated as 5 is shown in square meters (area) with respect to the developer 11.

試験例1B 次に示す市販のPE1版6種を90°Cで8時間苛酷処
理1−だものを次に示す市販の現像液及び実施例1の本
発明の現像液にて温度25°Cで1分間現像し、水洗乾
燥后試験例1〜17に準じて版面の汚れテストを実施し
た。その結果は表−2に示すとうりで汚れ性について遜
色なく使用した市販の28版のすべてに適用できるすぐ
れた現像性を示した・ 〔使用したPS版〕 (1)アルマックスTAN 応化工業@)製(2)FN
C−B 富士写真フィルム(株)製(5) F N E
l 富士写真フィルム(株)製(4) F N D 富
士写真フィルム(株)製(5) B W IN 小西六
写真工業(株)製(6)アルスターNS 日本製箔(株
)製〔使用した現像液〕 (1)N−200応化工業@)製 (2) D N −3C富士写真フィルム(株)製(5
)S D N −:21 小西六写真工業c株)製(5
)本発明 試験例19へ21 製造后3年を経時したps版アルスターMSを用いて実
施例1に準じて露光を行ない還元剤以外はすべて実施例
1と全く同じ組成の現像液にて、現像して印刷用原版を
作成し、版籍性を測定した結果表−6に示すとうりで還
元剤の種類によって効果に差はみられるもの\現像性が
改善される。
Test Example 1B The following six types of commercially available PE 1 plates were subjected to severe treatment at 90°C for 8 hours. After developing for 1 minute and washing with water and drying, a stain test on the plate surface was conducted according to Test Examples 1 to 17. The results are shown in Table 2, showing excellent developability applicable to all of the 28 commercially available plates used, with comparable stain resistance. [PS plates used] (1) Almax TAN Ohka Kogyo @ ) made (2) FN
C-B Manufactured by Fuji Photo Film Co., Ltd. (5) F N E
l Manufactured by Fuji Photo Film Co., Ltd. (4) F N D Manufactured by Fuji Photo Film Co., Ltd. (5) B W IN Manufactured by Konishiroku Photo Industry Co., Ltd. (6) Ulster NS Manufactured by Nippon Seifuku Co., Ltd. Developer] (1) N-200 manufactured by Ohka Kogyo @) (2) D N-3C manufactured by Fuji Photo Film Co., Ltd. (5
) S D N -: 21 Konishiroku Photo Industry C Co., Ltd.) (5
) Go to Test Example 19 of the Present Invention 21 Exposure was carried out according to Example 1 using a PS version Ulster MS that had been manufactured for 3 years, and development was carried out using a developer having the same composition as in Example 1 except for the reducing agent. A printing original plate was prepared using the same method, and the plate properties were measured. As shown in Table 6, although there are differences in effectiveness depending on the type of reducing agent, the developability is improved.

表 −6 特許出願人 日本製箔株式会社 代理人 弁理士井田完二 手続補正書(自発) 1、事件の表示 特許m昭5q年第93301cl 号 2、発明の名称 感光性平版印刷版用現像剤 3、補正をする者 事件との関係 41JR−出願人 住所 大阪府吹田市東御旅町10番70号氏名 日本製
箔株式会社 代表者 松 井 元 義 6補正の内容 明細書第5頁第4行目乃至第5行目に します。
Table-6 Patent applicant Nippon Foil Co., Ltd. Patent attorney Kanji Ida Procedural amendment (spontaneous) 1. Indication of the case Patent No. 93301cl of 1973 2. Name of the invention Developer for photosensitive lithographic printing plates 3. Relationship with the case of the person making the amendment 41JR - Applicant Address 10-70 Higashiomitabicho, Suita City, Osaka Prefecture Name Nippon Foil Co., Ltd. Representative Moto Matsui Giji 6th Amendment Details, Page 5, Line 4 Put it on the 5th line.

Claims (1)

【特許請求の範囲】 ■一般式R−0+ CH2CH20H(式中Rけフェニ
ル基又はベンジル基を示す)で表わされるエーテル化合
物、陰イオン界面活性剤、アルカリ性物質及び水溶性還
元剤を含むことを特徴とする、感光性平版印刷版用現像
剤。 ■陰イオン界面活性剤がアルキルナフタレンスルホン酸
塩である特許請求の範囲第0項記載の感光性平版印刷版
用現像剤。 ■アルカリ性物質が水ガラスとメタ珪酸ソーダとから成
る、特許請求の範囲第0項記載の感光性感光刷版印刷版
剤。 ■水溶性還元剤が重亜硫酸ソーダ、重亜燐酸ソーダ及び
ヒドラジンから選ばれる1種以上から成る特許請求の範
囲第0項記載の感光性平版印刷版用現像剤。
[Claims] ■Characterized by containing an ether compound represented by the general formula R-0+ CH2CH20H (in the formula R represents a phenyl group or a benzyl group), an anionic surfactant, an alkaline substance, and a water-soluble reducing agent. A developer for photosensitive lithographic printing plates. (2) The developer for photosensitive lithographic printing plates according to claim 0, wherein the anionic surfactant is an alkylnaphthalene sulfonate. (2) The photosensitive printing plate preparation according to claim 0, wherein the alkaline substance consists of water glass and sodium metasilicate. (2) The developer for a photosensitive lithographic printing plate according to claim 0, wherein the water-soluble reducing agent is one or more selected from sodium bisulfite, sodium biphosphite, and hydrazine.
JP9339984A 1984-05-09 1984-05-09 Developer for photosensitive lithographic plate Pending JPS60237442A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9339984A JPS60237442A (en) 1984-05-09 1984-05-09 Developer for photosensitive lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9339984A JPS60237442A (en) 1984-05-09 1984-05-09 Developer for photosensitive lithographic plate

Publications (1)

Publication Number Publication Date
JPS60237442A true JPS60237442A (en) 1985-11-26

Family

ID=14081218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9339984A Pending JPS60237442A (en) 1984-05-09 1984-05-09 Developer for photosensitive lithographic plate

Country Status (1)

Country Link
JP (1) JPS60237442A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63188142A (en) * 1987-01-30 1988-08-03 Konica Corp Developing solution and developing method and photosensitive planographic printing plate improved in foamability and developing speed
JPH01282549A (en) * 1988-05-10 1989-11-14 Fuji Photo Film Co Ltd Composition of developing solution for planographic printing plate and developing process

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5486328A (en) * 1977-12-21 1979-07-09 Okamoto Kagaku Kogyo Kk Composition of developing solution
JPS5854341A (en) * 1981-09-28 1983-03-31 Fuji Photo Film Co Ltd Developing method and developing solution
JPS6097358A (en) * 1983-11-01 1985-05-31 Nippon Seihaku Kk Developer for photosensitive lithographic printing plate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5486328A (en) * 1977-12-21 1979-07-09 Okamoto Kagaku Kogyo Kk Composition of developing solution
JPS5854341A (en) * 1981-09-28 1983-03-31 Fuji Photo Film Co Ltd Developing method and developing solution
JPS6097358A (en) * 1983-11-01 1985-05-31 Nippon Seihaku Kk Developer for photosensitive lithographic printing plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63188142A (en) * 1987-01-30 1988-08-03 Konica Corp Developing solution and developing method and photosensitive planographic printing plate improved in foamability and developing speed
JPH01282549A (en) * 1988-05-10 1989-11-14 Fuji Photo Film Co Ltd Composition of developing solution for planographic printing plate and developing process

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