JP3361613B2 - Rinse water for lithographic printing plates and plate making method for lithographic printing plates - Google Patents

Rinse water for lithographic printing plates and plate making method for lithographic printing plates

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Publication number
JP3361613B2
JP3361613B2 JP10977394A JP10977394A JP3361613B2 JP 3361613 B2 JP3361613 B2 JP 3361613B2 JP 10977394 A JP10977394 A JP 10977394A JP 10977394 A JP10977394 A JP 10977394A JP 3361613 B2 JP3361613 B2 JP 3361613B2
Authority
JP
Japan
Prior art keywords
lithographic printing
water
plate
washing
washing water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10977394A
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Japanese (ja)
Other versions
JPH07319171A (en
Inventor
敦 坂本
忠夫 登山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP10977394A priority Critical patent/JP3361613B2/en
Publication of JPH07319171A publication Critical patent/JPH07319171A/en
Application granted granted Critical
Publication of JP3361613B2 publication Critical patent/JP3361613B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Description

【発明の詳細な説明】 【0001】 【産業上の利用分野】本発明は平版印刷版の製版時に用
いる水洗水及びこれを使用した感光性平版印刷版の製版
方法に関するものであり、特に印刷スタート時のインキ
着肉性を向上させた水洗水及びこれを使用した感光性平
版印刷版の製版方法に関するものである。 【0002】 【従来技術及びその問題点】従来、感光性平版印刷版は
一般に現像工程、水洗工程、親水性版面保護層を設ける
工程等の処理工程を経て処理される。一般に現像された
印刷版上に現像液やそれに溶出した感光層成分が残留す
るのを防ぐため、現像後、水洗処理が行われる。自動現
像装置においては、節水等の目的で水洗水を循環して繰
返し用いることが通常行なわれているが、繰り返し使用
された水洗水で水洗処理された平版印刷版ではその画像
部上へ印刷インキが付きにくくなる、いわゆる着肉不良
が発生することがあった。この着肉不良の対策として、
平版印刷版一版毎に新鮮水を用いて水洗する方法もある
が、大量の水洗水を用いた場合は着肉不良対策として有
効であったが、廃水量が大巾に増えて好ましくなく、ま
た少量の新鮮水による水洗では着肉不良の完全な対策に
はならなかった。 【0003】 【発明が解決しようとする課題】従って本発明の目的
は、感光性平版印刷版の現像処理後の水洗工程にくり返
し水洗水を用いても、あるいは、少量の新鮮水を用いた
場合でもスタート時のインキ着肉不良を起こさないよう
な水洗水及びこれを用いた平版印刷版の製版方法を提供
することである。 【0004】 【課題を解決するための手段】本発明者らは上記目的を
達成すべく鋭意検討を重ねた結果、着肉不良を効果的に
防ぐことのできる水洗水を見出し、本発明を成すに至っ
たものであり、下記(1)に記載の構成により本発明の
目的を達成することができる。 (1)感光性平版印刷版を画像感光する工程と、現像す
る工程と、前記現像する工程の後に水洗する工程と、親
水性版面保護層を印刷版上に設ける工程とを有する平版
印刷版の製版方法において、前記水洗する工程の水洗水
が下記一般式〔I〕若しくは〔II〕で示される化合物
を含有することを特徴とする感光性平版印刷版の製版方
法。 【0005】 【化2】【0006】 【0007】以下、本発明を詳しく説明する。本発明の
平版印刷版の水洗水に含有される一般式〔I〕、〔II〕
の化合物又は化合物群(a)の化合物はスタート時のイ
ンキ着肉性向上に有効である。そのメカニズムは明確で
はないが、水洗水中の現像液親水性成分画像部への吸着
防止の作用があるものと思われる。本発明に使用される
一般式〔I〕、〔II〕に示される代表的具体例を以下に
示すが本発明はこれらに限定されるものではない。 (例示化合物) 【0008】 【化3】【0009】 【化4】【0010】これらの化合物の中で〔I〕−2、〔I〕
−3、〔I〕−4、〔II〕−2、〔II〕−3および〔I
I〕−4が水に溶け易く好ましい。本発明において、平
版印刷版の水洗水へ含有される下記一般式〔I〕又は
〔II〕で示される化合物は、単独もしくは2種以上を組
合わせて使用することができる。これらの化合物の水洗
水への添加量は、水洗水に対して0.001〜5重量%
であり、より好ましくは0.001〜1重量%、特に好
ましくは0.001〜0.5重量%である。添加量が
0.001重量%より少ない場合は、本発明の目的であ
る着肉性の向上の効果が小さく、一方、5重量%以上で
は着肉性向上効果は平衡状態に達し、それ以上の添加は
ランニングコスト上不利となり、また、水洗水の物性に
も悪影響が表れる。 【0011】 【0012】本発明の水洗水は、一般式〔I〕、〔I
I〕の化合物に加えて、キレート剤を含有することが好
ましい。キレート剤は、化合物〔I〕、〔II〕の水洗水
中での安定性増加のために有効である。本発明に使用さ
れるキレート剤としては例えばEDTA(エチレンジア
ミン四酢酸)及びその塩、NTA(ニトリロ三酢酸)及
びその塩、HEDTA(ヒドロキシエチルエチレンジア
ミン三酢酸)及びその塩、DPTA(ジエチレントリア
ミン五酢酸)及びその塩、TTHA(トリエチレンテト
ラミン六酢酸)及びその塩、HIDA(ヒドロキシエチ
ルイミノ二酢酸)及びその塩、DHEG(ジヒドロキシ
エチルグリシン)及びその塩、CyDTA(シクロヘキ
サンジアミン四酢酸)及びその塩、EHPG〔エチレン
ビス(ヒドロキシフェニルグリシン)〕及びその塩、H
EDP(1−ヒドロキシエチリデン−1,1−ジホスホ
ン酸)及びその塩、ATMP〔アミノトリ(メチレンホ
スホン酸)〕及びその塩、高分子電解質、例えばポリア
クリル酸ナトリウム、ポリメタクリル酸ナトリウム、ポ
リマレイン酸ナトリウム、ポリイタコン酸ナトリウム及
びそれらの共重合体等が挙げられるが、金属イオンに対
してキレート化力を発揮するものであればこれらに限定
されるものではない。本発明におけるキレート剤は、1
種又は2種以上を組合せて使用することができる。キレ
ート剤の好ましい使用量は水洗水に対して0.0001
〜0.01重量%であり、より好ましくは0.001〜
0.005重量%、特に好ましくは0.002〜0.0
03重量%である。キレート剤の使用量が0.0001
〜0.01重量%の範囲であると化合物〔I〕、〔I
I〕の安定性を低下させる金属イオンのキレート化に適
した濃度であり好ましい。0.0001重量%未満で
は、キレート化できない金属イオンが残存し、0.01
重量%を越えると残存金属イオンはわずかになり、それ
以上添加するとランニングコスト上不利になる。以上の
水洗水に含有される本発明の添加剤(式〔I〕、〔I
I〕の化合物、化合物群(a)を示す)は、粉体、錠剤
で水洗水に添加してもよいが、予め水や適当な有機溶剤
に溶かした溶液で水洗水に加えることができ、水洗水へ
の混合し易さを考慮すると溶液型の方が好ましい。この
場合の溶液型の化合物は、一般式〔I〕、〔II〕の化合
物又は化合物群(a)の化合物を1重量%以上含有する
ことが好ましく、より好ましくは5重量%以上である。
本発明の水洗水は、一般式〔I〕、〔II〕の化合物と化
合物群(a)の化合物を併用することもできる。 【0013】本発明の添加剤が加えられた水洗水は、ポ
ジ型及びネガ型感光性平版印刷版(以下PS版と略す)
の製版時の水洗工程で用いることができる。本発明が適
用できるポジ型PS版は例えば特公昭43−28403
号、特開昭62−14652号、同63−226641
号、特開平2−8663号各公報に詳しく記載されてい
るようなPS版が好ましく用いられる。ネガ型PS版
は、例えば感光物としてジアゾ化合物を用いる物、光架
橋性化合物を用いる物、及び光重合性化合物を用いる物
がある。上記ジアゾ化合物としては従来公知の物が適宜
使用できる。その例としては、例えば、p−ジアゾジフ
ェニルアミンとホルムアルデヒドまたはアセトアルデヒ
ドの縮合物と、ヘキサフルオロリン酸塩、テトラフルオ
ロホウ酸塩との有機溶媒可溶の反応生成物であるジアゾ
樹脂無機塩、また米国特許第3,300,309号明細
書に記載されているような、前記縮合物とスルホン酸類
例えばパラトルエンスルホン酸またはその塩、ホスフィ
ン酸類例えばベンゼンホスフィン酸またはその塩、さら
に特公昭49−48001号公報、特開平2−2965
0号公報に記載された芳香族化合物との共縮合ジアゾ樹
脂も好ましく用いられる。光架橋性化合物としては、例
えば、特開平2−236552号公報に記載されたマレ
イミド基を側鎖に有する物があり、光重合組成物として
は、例えば特開昭63−257749号公報に記載され
た物があげられる。PS版は透明原図を通してカーボン
アーク灯、水銀灯、メタルハライドランプ、タングステ
ンランプ等の活性光線の豊富な光源により露光され、次
いで湿式処理による現像処理工程にて現像される。本発
明の製版方法には特開平5−2271号公報又は特願平
5−71589号明細書に記載されているような現像液
が好ましく用いられる。上記のような現像液で画像露光
させたPS版を現像する方法としては従来公知の種々の
方法が可能である。具体的には、画像露光されたPS版
を現像液中に浸漬する方法、PS版の感光層に対して多
数のノズルから現像液を噴射する方法、現像液で湿潤さ
れたスポンジでPS版の感光層を拭う方法、PS版の感
光層の表面に現像液をローラ塗布する方法などが挙げら
れる。また、このようにしてPS版の感光層に現像液が
施された後、感光層の表面をブラシなどで軽く擦ること
もできる。 【0014】上記のような現像処理を施して得られた平
版印刷版は続く水洗処理工程にて水洗されるが、水洗に
先立って版面上の現像液の量が少なくなる様にスクイズ
されることが望ましい。スクイズする方法としては、例
えばエアーナイフにより版面上の現像液をかき取る方
法、あるいは表面の滑らかな弾性プラスチック材料を版
面と摺接させて版面上の現像液をかき取る方法、あるい
はゴムのような弾性部材をローラー表面に被覆した弾性
ローラー対の間に版を通してニップ圧により版面の現像
液を除去する方法等が挙げられるが、自動現像機を使用
する場合には弾性ローラー対を使用する方法が好まし
い。 【0015】続く平版印刷版の水洗処理工程における水
洗水は繰り返し循環使用されてもよいし、平版印刷版の
1版ごとに新鮮な水を使用してもよく、更には循環水洗
水の一部を随時新鮮水で補填しながら用いてもよい。水
洗水が繰返し循環使用される場合の本発明の添加剤の水
洗水への添加方法は、例えば特開平2−2569号明細
書に記述されているような自動現像機の水洗部タンクに
水洗水を所定量満たし、そこへ適当な方法により計量し
た本発明の添加剤を加える方法、あるいはあらかじめ所
定量の水洗水と適当な方法により計量した本発明の添加
剤を混合し、その後、水洗部タンクへ仕込む方法等が挙
げられる。上記のように水洗水が繰返し循環使用される
場合には、水洗後の工程にて用いられる不感脂化(ガム
引き)処理液への循環使用した水洗水中の現像液成分の
混入を少なくするために新鮮水が水洗部タンクへ補充さ
れることがある。このような場合には新鮮水へ本発明の
添加剤を加えることは言うまでもないが、添加方法とし
ては新鮮水の貯蔵タンクへ新しい水を所定量満たしそこ
へ適当な方法により計量した本発明の添加剤を加える方
法、あるいはあらかじめ所定量の水洗水と、適当な方法
により計量した本発明の添加剤を混合し、その後貯蔵タ
ンクへ仕込む方法等が挙げられる。あるいは貯蔵タンク
がフローター管理により自動的に水位を一定に保つ型式
ならば、一定期間ごとに一定量の本添加剤を貯蔵タンク
内に加える方法も有効である。 【0016】また、使用される水洗水が平版印刷版の一
版ごとに新鮮な水である場合の本発明の添加剤の水洗水
への添加方法は、例えば特開平2−3065号公報又は
特願平5−73672号明細書に記述されている様な自
動現像機の水洗水の貯蔵タンクへ新しい水を所定量満た
し、そこへ適当な方法により計量した本発明の添加剤を
加える方法、あるいはあらかじめ所定量の水洗水と、適
当な方法により計量した本発明の添加剤を混合し、その
後貯蔵タンクへ仕込む方法等が挙げられる。あるいは貯
蔵タンクがフローター管理により自動的に水位を一定に
保つ型式ならば、一定期間ごとに一定量の本添加剤を貯
蔵タンク内に加える方法も有効である。これら本発明の
添加剤が加えられた水洗水により、平版印刷版を水洗す
る方法としては、例えば水洗水を満たした槽中に平版印
刷版を浸漬し、好ましくは攪拌を行ない取り出す方法、
平版印刷版上に単独あるいは複数の細口を有するパイプ
等を通して水洗水を版上に供給する方法等がある。自動
現像機を使用する場合には後者の方法が有利である。こ
の場合の水洗水はPS版の水洗部の通過に合わせてタイ
ミングよく適量が供給されることが好ましい。好ましい
水洗水量は5〜300cc/m2であるが、より好ましくは
10〜100cc/m2、特に好ましくは20〜80cc/m2
である。5cc/m2 未満では平版印刷版の水洗が不十
分になり、300cc/m2 を越えると廃水量が多くな
り好ましくない。水洗した平版印刷版は版面上に残存す
る水洗水が少なくなるようにスクイズされることが好ま
しく、該スクイズの方法としては前記の現像液をスクイ
ズする方法が可能であるが自動現像機を使用する場合に
は弾性ローラー対を用いる方法が好ましい。 【0017】また平版印刷版の製版工程においては、水
洗工程の後に必要に応じて種々の処理工程を設けること
が可能である。水洗工程の後に続く工程としては、主に
不感脂化(ガム引き)処理が挙げられる。本発明に適用
できる不感脂化処理液としては、例えば特開平2−11
3997号、特公平5−19920号明細書に詳しく記
載されているような不感脂化処理液がある。また水洗工
程の後に続くその他の工程として、界面活性剤を含む水
溶液による処理も挙げられる。本発明に適用できる界面
活性剤を含む水溶液としては、例えば特開昭63−16
9645、同63−169646、同63−16964
7、同63−172270各号明細書に詳しく記載され
ているような界面活性剤を含む水溶液がある。その他に
も現像インキ盛り、画像部の修正等の工程が行われる
が、本発明の添加剤は水洗後の工程の種類に関係なく、
使用することが可能である。本発明の添加剤が加えられ
た水洗水は、上記の平版印刷版の現像後の水洗だけでな
く、例えば消去後の自動水洗機の水洗水としてまた、静
電写真法で形成したトナー像をマスクに下層の有機樹脂
層を溶出して画像を形成する材料の溶出工程後の水洗水
としても適当に用いられる。更には、ハロゲン化銀拡散
転写法や、銀を重合開始に用いた感光材料の現像後の水
洗水としても用いられる。 【0018】 【実施例】以下実施例をもって本発明を詳細に説明す
る。 実施例1 [SiO2]/[M2O]比1.2、SiO21.5重量
%のケイ酸カリウム水溶液からなり、N−アルキル−
N,N−ジヒドロキシエチルベタイン両性界面活性剤を
0.04重量%含む現像液を22リットル調整し、富士
写真フイルム(株)製PSプロセッサーPS900NP
(水洗水が繰返し循環使用されるタイプの自動現像機)
に仕込み30℃に保温した。さらに水洗部には水道水7
リットルに化合物〔I〕−4を7g及びEDTAの4N
a塩を0.14g添加しよく攪拌した水溶液を仕込ん
だ。さらに後処理槽には富士写真フイルム(株)製PS
−プレートフィニッシングガムFP−2W 50重量
部、水道水50重量部から成る不感脂化液7リットルを
仕込んだ。次に厚さ0.3mmのアルミニウム板をナイ
ロンブラシと400メッシュのパミストンの水懸濁液を
用いその表面を砂目立てした後、よく水で洗浄した。1
0%水酸化ナトリウムに70℃で60秒間浸漬してエッ
チングした後、流水で水洗後20%HNO3で中和洗
浄、水洗した。これをVA=12.7Vの条件下で正弦
波の交番波形電流を用いて1%硝酸水溶液中で160ク
ーロン/dm2の陽極時電気量で電解粗面化処理を行っ
た。その表面粗さを測定したところ0.6μ(Ra表
示)であった。ひきつづいて30%のH2SO4水溶液中
に浸漬し55℃で2分間デスマットした後、20%H2
SO4水溶液中で、砂目立てした面に陰極を配置して電
流密度2A/dm2において厚さが2.7g/m2になるよ
うに陽極酸化し、基板を作製した。 【0019】このように処理された基板の裏面に下記の
ゾル−ゲル反応液をバーコーターで塗布し、100℃で
1分間乾燥し、乾燥後の塗布量が50mg/m2のバックコ
ート層を設けた基板を作製した。 ゾル−ゲル反応液 テトラエチルシリケート 50 重量部 水 21.6重量部 メタノール 10.8重量部 硝酸 0.05重量部 上記成分を混合、攪拌すると約5分で発熱した。10分
間反応させた後、メタノールを700重量部加えること
によりバックコート塗布液を調製した。続いて、上記の
基板の表面に下記感光液を塗布し、乾燥後の塗布重量が
2.5g/m2となるように感光層を設けた。 感光液 1,2−ジアゾナフトキノン−5−スルホニルクロリドと ピロガロール−アセトン樹脂とのエステル化物 (米国特許第3,635,709号明細書の実施例1に記載されて いるもの) 45重量部 クレゾールホルムアルデヒドノボラック樹脂 110重量部 2−(p−メトキシフェニル)−4,6−ビス(トリク ロロメチル)−s−トリアジン 2重量部 オイルブルー#603(オリエント化学工業(株)製) 1重量部 メガファックF−177 (大日本インキ化学工業(株)製フッ素系界面活性剤) 0.4重量部 メチルエチルケトン 1000重量部 プロピレングリコールモノメチルエーテル 1000重量部 【0020】このようにして作製した感光層の表面に下
記の様にしてマット層形成用樹脂液を吹き付けてマット
層を設けたPS版を得た。マット層形成用樹脂液として
メチルメタクリレート/エチルアクリレート/アクリル
酸(仕込重量比65:20:15)共重合体の一部をナ
トリウム塩とした12%水溶液を準備し、回転霧化静電
塗布機で霧化頭回転数25,000rpm、樹脂液の送液
量は40ml/分、霧化頭への印加電圧は−90kV、塗
布時の周囲温度は25℃、相対湿度は50%とし、塗布
後2.5秒で塗布面に蒸気を吹き付けて湿潤させ、つい
で湿潤した3秒後に温度60℃、湿度10%の温風を5
秒間吹き付けて乾燥させた。マットの高さは平均約6μ
m、大きさは平均30μm、塗布量は150mg/m2であ
った。このようにした得られたPS版を1,003mm×
800mmの大きさに裁断したものを多数枚用意し、これ
らに原稿フィルムを通して1mの距離から3kWのメタ
ルハライドランプを用いて、60秒間露光した。上記の
露光したPS版を上記のPSプロセッサーで1日あたり
24m2、計3日間処理し、最後に処理した版を印刷用の
試料とした。 【0021】参考例1 実施例1において水洗部に、化合物〔I〕−4を7gの
代わりに、1−(3−クロロアリル)−3,5,7−ト
リアザ−1−アゾニアアダマンタンクロリドを7g添加
した以外は、実施例1と全く同様の処理を行ない最後の
版を印刷用試料とした。 実施例 実施例1において1−(3−クロロアリル)−3,5,
7−トリアザ−1−アゾニアアダマンタンクロリドを7
g添加する以外は、実施例1と全く同様の処理を行ない
最後の版を印刷用試料とした。 実施例 実施例1において、化合物〔I〕−4を7gの代わり
に、化合物〔II〕−4を14g添加する以外は、実施例
1と全く同様の処理を行ない最後の版を印刷用試料とし
た。 【0022】実施例 実施例において、PSプロセッサーPS−900NP
を富士写真フイルム(株)製PS−900V(水洗水が
一版ごとに新鮮な水であるタイプの自動現像機)に変え
た以外は実施例と全く同様の処理を行ない最後の版を
印刷用試料とした。参考例2 参考例1 において、1−(3−クロロアリル)−3,
5,7−トリアザ−1−アゾニアアダマンタンクロリド
の7gの代わりに、1,3,5−トリスヒドロキシエチ
ルヘキサヒドロ−S−トリアジンの7gを水洗水に添加
し、PSプロセッサーPS−900NPをPS−900
Vに変えた以外は参考例1と全く同様の処理を行ない最
後の版を印刷用試料とした。参考例3 参考例1 においてPSプロセッサーPS−900NPを
PS−900Vに変えた以外は参考例1と全く同様の処
理を行ない最後の版を印刷用試料とした。 実施例5,6 参考例3 において、それぞれ化合物〔I〕−2を7g,
化合物〔I〕−3を7gを追加した以外は、参考例3
全く同様の処理を行なって印刷用試料を作成した。 実施例 参考例2 において、化合物〔I〕−4を7g添加し、
1,3,5−トリスヒドロキシエチルヘキサヒドロ−S
−トリアジンの7gの代わりに、3−メチル−4−イソ
プロピルフェノールを7gとジエチレングリコールを3
5g添加した以外は参考例2と全く同様の処理を行な
い、最後の版を印刷用試料とした。 【0023】比較例1,2 実施例1およびにおいて、水洗部に水道水のみを使用
し、他は実施例1およびと同様な処理を行ないそれぞ
れ最後の版を印刷用試料とした。 【0024】これら実施例1〜7、参考例1〜3及び比
較例1〜2の印刷用試料のインキ着肉性を評価するため
に予め試料を35℃85%の条件下に3日間放置した。
それらの試料を印刷機ハリスオーレリア125オフセッ
ト印刷機に取り付け通常の方法に従って印刷を開始し
た。その時のインキが画像部に付着して良好な印刷物が
得られるまでの印刷枚数を表−1のインキ着肉性の欄に
記した。 【0025】 【表1】【0026】この結果によれば添加化合物として一般式
〔I〕、〔II〕の化合物を水洗水へ添加した系(実施例
1〜)はインキ着肉性に優れていたが、水洗水を水道
水のみとした系(比較例1〜2)はインキ着肉性に劣っ
ていた。また、これら添加剤化合物は殺菌剤としての作
用も有し、水洗部の腐敗防止にも有効であった。更に実
施例4、参考例2、参考例3、実施例5、6および7
PS−900Vでは、その機構上、本発明の添加剤が加
えられた水洗水は、その供給タンクから、現像液、フィ
ニッシングガムおよびフィニッシングリンス液の希釈水
としても利用されるが、それらの性能への影響は全くみ
られなかった。 【0027】 【発明の効果】本発明の平版印刷版の水洗水用添加剤
は、平版印刷版の印刷スタート時の着肉性の低下を防止
する効果がある。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to washing water used in plate making of a lithographic printing plate and a plate making method of a photosensitive lithographic printing plate using the same. The present invention relates to rinsing water with improved ink adhesion at the time of printing and a method for making a photosensitive lithographic printing plate using the same. 2. Description of the Related Art Conventionally, a photosensitive lithographic printing plate is generally processed through processing steps such as a developing step, a washing step, and a step of providing a hydrophilic plate surface protective layer. Generally, in order to prevent the developer and the photosensitive layer components eluted therefrom from remaining on the developed printing plate, a water washing treatment is performed after the development. In an automatic developing device, it is common practice to circulate and repeatedly use washing water for the purpose of saving water, etc., but in the case of a lithographic printing plate washed with repeatedly used washing water, the printing ink is printed on the image area. There is a case where so-called poor inking occurs, which makes it difficult to adhere. As a countermeasure for this poor inlay,
There is also a method of washing with fresh water for each lithographic printing plate, but if a large amount of washing water is used, it was effective as a countermeasure for inking, but the amount of wastewater increased undesirably, In addition, washing with a small amount of fresh water did not provide a complete measure against poor inking. [0003] Accordingly, an object of the present invention is to provide a photosensitive lithographic printing plate which can be used repeatedly in the washing step after the development processing, or when a small amount of fresh water is used. However, it is an object of the present invention to provide a washing water which does not cause an ink deposition failure at the start and a method of making a lithographic printing plate using the same. Means for Solving the Problems The inventors of the present invention have conducted intensive studies to achieve the above object, and as a result, have found washing water that can effectively prevent poor inking, and constitute the present invention. The object of the present invention can be achieved by the configuration described in (1) below. (1) Image-sensitizing a photosensitive lithographic printing plate and developing
A step of washing with water after the step of developing;
Providing an aqueous plate surface protective layer on a printing plate
In the printing plate making method, the washing water in the washing step is used.
Is a compound represented by the following general formula [I] or [II]
For making a photosensitive lithographic printing plate characterized by containing
Law. [0005] Hereinafter, the present invention will be described in detail. General formulas [I] and [II] contained in the washing water of the lithographic printing plate of the present invention.
The compound of the formula (a) or the compound of the compound group (a) is effective for improving the ink adhesion at the start. Although the mechanism is not clear, it is considered that it has an action of preventing adsorption to the image portion of the developer hydrophilic component in the washing water. Representative examples of the general formulas [I] and [II] used in the present invention are shown below, but the present invention is not limited thereto. (Exemplary compound) [0009] [0010] Among these compounds, [I] -2 and [I]
-3, [I] -4, [II] -2, [II] -3 and [I
I] -4 is preferable because it is easily dissolved in water. In the present invention, the compounds represented by the following general formula [I] or [II] contained in the rinsing water of the lithographic printing plate can be used alone or in combination of two or more. The amount of these compounds added to the washing water is 0.001 to 5% by weight based on the washing water.
, More preferably 0.001 to 1% by weight, particularly preferably 0.001 to 0.5% by weight. When the amount is less than 0.001% by weight, the effect of improving the inking property, which is the object of the present invention, is small. The addition is disadvantageous in running cost, and adversely affects the physical properties of the washing water. The washing water of the present invention has the general formula [I], [I
It is preferable to contain a chelating agent in addition to the compound of I). The chelating agent is effective for increasing the stability of the compounds [I] and [II] in the washing water. Examples of the chelating agent used in the present invention include EDTA (ethylenediaminetetraacetic acid) and its salts, NTA (nitrilotriacetic acid) and its salts, HEDTA (hydroxyethylethylenediaminetriacetic acid) and its salts, DPTA (diethylenetriaminepentaacetic acid) and Its salts, TTHA (triethylenetetramine hexaacetic acid) and its salts, HIDA (hydroxyethyliminodiacetic acid) and its salts, DHEG (dihydroxyethylglycine) and its salts, CyDTA (cyclohexanediaminetetraacetic acid) and its salts, EHPG [ Ethylenebis (hydroxyphenylglycine)] and salts thereof, H
EDP (1-hydroxyethylidene-1,1-diphosphonic acid) and its salts, ATMP [aminotri (methylene phosphonic acid)] and its salts, polymer electrolytes such as sodium polyacrylate, sodium polymethacrylate, sodium polymaleate, Examples thereof include sodium polyitaconate and a copolymer thereof, but are not limited to these as long as they exhibit chelating power to metal ions. The chelating agent in the present invention comprises 1
Species or a combination of two or more can be used. The preferred amount of the chelating agent is 0.0001 to the washing water.
To 0.01% by weight, more preferably 0.001 to
0.005% by weight, particularly preferably 0.002 to 0.0
03% by weight. The amount of chelating agent used is 0.0001
When the content is in the range of 0.01 to 0.01% by weight, the compounds [I] and [I
The concentration is suitable for chelating a metal ion that reduces the stability of I). If the content is less than 0.0001% by weight, metal ions that cannot be chelated remain and 0.01%
If the amount exceeds 10% by weight, residual metal ions become small, and if it is added more than that, the running cost becomes disadvantageous. The additives of the present invention (formulas [I] and [I]
The compound (I), compound group (a)) may be added to the washing water as a powder or tablet, but may be added to the washing water with a solution previously dissolved in water or a suitable organic solvent. Considering the ease of mixing with washing water, the solution type is preferred. The solution type compound in this case preferably contains the compound of the general formulas [I] and [II] or the compound of the compound group (a) in an amount of 1% by weight or more, more preferably 5% by weight or more.
In the washing water of the present invention, the compounds of the general formulas [I] and [II] and the compounds of the compound group (a) can be used in combination. The washing water to which the additive of the present invention is added can be used as a positive or negative photosensitive lithographic printing plate (hereinafter abbreviated as PS plate).
Can be used in the water washing step during plate making. Positive PS plates to which the present invention can be applied are described in, for example, JP-B-43-28403.
No., JP-A-62-14652, 63-226641
And a PS plate as described in detail in JP-A-2-8663. Negative PS plates include, for example, those using a diazo compound as a photosensitive material, those using a photocrosslinkable compound, and those using a photopolymerizable compound. As the diazo compound, conventionally known ones can be appropriately used. Examples thereof include diazo resin inorganic salts, which are organic solvent-soluble reaction products of a condensate of p-diazodiphenylamine and formaldehyde or acetaldehyde with hexafluorophosphate and tetrafluoroborate, and US As described in Japanese Patent No. 3,300,309, the condensate and a sulfonic acid such as paratoluenesulfonic acid or a salt thereof, a phosphinic acid such as benzenephosphinic acid or a salt thereof, and JP-B-49-48001. Gazette, JP-A-2-2965
A co-condensed diazo resin with an aromatic compound described in Japanese Patent Publication No. 0 is also preferably used. Examples of the photocrosslinkable compound include those having a maleimide group in a side chain described in JP-A-2-236552, and examples of the photopolymerizable composition include those described in JP-A-63-257747. Items. The PS plate is exposed through a transparent original drawing by a light source rich in actinic rays such as a carbon arc lamp, a mercury lamp, a metal halide lamp, and a tungsten lamp, and then developed in a developing process by a wet process. In the plate making method of the present invention, a developer as described in JP-A-5-2271 or Japanese Patent Application No. 5-71589 is preferably used. As a method for developing the PS plate that has been image-exposed with the above-described developer, various conventionally known methods can be used. Specifically, a method of immersing an image-exposed PS plate in a developer, a method of spraying a developer from a number of nozzles on a photosensitive layer of the PS plate, and a method of spraying a PS plate with a sponge wetted with a developer Examples of the method include a method of wiping the photosensitive layer and a method of applying a developing solution to the surface of the photosensitive layer of the PS plate with a roller. After the developer is applied to the photosensitive layer of the PS plate in this manner, the surface of the photosensitive layer can be lightly rubbed with a brush or the like. The lithographic printing plate obtained by performing the above-described development processing is washed with water in a subsequent washing step, but it is necessary that the lithographic printing plate is squeezed so that the amount of the developing solution on the plate surface is reduced prior to washing. Is desirable. As a squeezing method, for example, a method of scraping the developer on the plate surface with an air knife, a method of scraping the developer on the plate surface by sliding an elastic plastic material having a smooth surface against the plate surface, or a method such as rubber. There is a method of removing the developer on the plate surface by nip pressure through a plate between an elastic roller pair having an elastic member coated on the roller surface, and a method using an elastic roller pair when an automatic developing machine is used. preferable. The rinsing water in the subsequent lithographic printing plate rinsing treatment step may be repeatedly circulated or used, or fresh water may be used for each lithographic printing plate. May be used while supplementing with fresh water as needed. The method of adding the additive of the present invention to the washing water when the washing water is repeatedly circulated is described in, for example, Japanese Patent Application Laid-Open No. 2-2569. Is filled with a predetermined amount, and an additive of the present invention measured by an appropriate method is added thereto, or a predetermined amount of washing water is mixed with an additive of the present invention measured in an appropriate method in advance, and then, a washing tank And the like. When the washing water is repeatedly used as described above, in order to reduce the mixing of the developer component in the washing water used for circulation to the desensitizing (gumming) processing solution used in the process after the washing. In some cases, fresh water may be replenished to the washing section tank. In such a case, it is needless to say that the additive of the present invention is added to fresh water, but as an adding method, a fresh water storage tank is filled with a predetermined amount of fresh water and measured by an appropriate method. A method of adding an agent, or a method of mixing a predetermined amount of washing water in advance with the additive of the present invention measured by an appropriate method, and then charging the mixture into a storage tank. Alternatively, if the storage tank is of a type that automatically keeps the water level constant by floater management, a method of adding a constant amount of the present additive to the storage tank at regular intervals is also effective. When the washing water to be used is fresh water for each plate of the lithographic printing plate, the method of adding the additive of the present invention to the washing water is described, for example, in JP-A-2-3065 or JP-A-2-3065. A method of filling a predetermined amount of fresh water into a washing water storage tank of an automatic processor as described in Japanese Patent Application No. 5-73672, and adding thereto a measured amount of the additive of the present invention, or There is a method in which a predetermined amount of washing water is mixed in advance with the additive of the present invention measured by an appropriate method, and then the mixture is charged into a storage tank. Alternatively, if the storage tank is of a type that automatically keeps the water level constant by floater management, a method of adding a constant amount of the present additive to the storage tank at regular intervals is also effective. As a method of washing the lithographic printing plate with washing water to which these additives of the present invention have been added, for example, a method of immersing the lithographic printing plate in a tank filled with washing water, preferably stirring and removing the plate,
There is a method in which washing water is supplied onto a lithographic printing plate through a pipe having a single or a plurality of narrow holes or the like. When an automatic developing machine is used, the latter method is advantageous. In this case, it is preferable that an appropriate amount of washing water is supplied at a proper timing in accordance with the passage of the PS plate through the washing section. The preferred washing water amount is 5 to 300 cc / m 2 , more preferably 10 to 100 cc / m 2 , and particularly preferably 20 to 80 cc / m 2.
It is. If it is less than 5 cc / m 2 , the lithographic printing plate will not be sufficiently washed with water, and if it exceeds 300 cc / m 2 , the amount of wastewater will be undesirably large. The washed lithographic printing plate is preferably squeezed so as to reduce the amount of washing water remaining on the plate surface. As the squeezing method, the method of squeezing the developing solution described above is possible, but an automatic developing machine is used. In this case, a method using an elastic roller pair is preferable. In the lithographic printing plate making process, it is possible to provide various processing steps as necessary after the water washing step. The step following the water washing step mainly includes a desensitization (gumming) treatment. Examples of the desensitizing solution applicable to the present invention include, for example, JP-A No. 2-11
There is a desensitizing solution as described in detail in Japanese Patent Publication No. 3997 and Japanese Patent Publication No. 5-19920. Further, as another step following the water washing step, treatment with an aqueous solution containing a surfactant may also be mentioned. Examples of the aqueous solution containing a surfactant applicable to the present invention include, for example, JP-A-63-16
9645, 63-169646, 63-16964
7, there is an aqueous solution containing a surfactant as described in detail in each of the specifications of JP-A 63-172270. In addition, development ink filling, a process such as correction of the image area is performed, but the additive of the present invention is independent of the type of the process after washing with water,
It is possible to use. The washing water to which the additive of the present invention has been added is used not only for washing after the development of the lithographic printing plate, but also for example as washing water for an automatic washing machine after erasing, and a toner image formed by electrostatography. It is also suitably used as washing water after the elution step of a material for forming an image by eluting the lower organic resin layer on the mask. Further, it is also used as a washing transfer water after development of a photosensitive material using silver halide diffusion transfer method or silver polymerization initiation. The present invention will be described in detail with reference to the following examples. Example 1 An aqueous solution of potassium silicate having a ratio of [SiO 2 ] / [M 2 O] of 1.2 and SiO 2 of 1.5% by weight was prepared.
22 liters of a developing solution containing 0.04% by weight of N, N-dihydroxyethylbetaine amphoteric surfactant was adjusted, and PS processor PS900NP manufactured by Fuji Photo Film Co., Ltd. was used.
(A type of automatic processor where washing water is repeatedly used)
And kept at 30 ° C. In addition, tap water 7
In a liter, 7 g of compound [I] -4 and 4N of EDTA were added.
0.14 g of salt a was added, and an aqueous solution that was well stirred was charged. The post-processing tank has a PS manufactured by Fuji Photo Film Co., Ltd.
-7 liters of a desensitizing liquid consisting of 50 parts by weight of plate finishing gum FP-2W and 50 parts by weight of tap water was charged. Next, an aluminum plate having a thickness of 0.3 mm was grained with a nylon brush and a 400-mesh water suspension of pamistone, and then washed thoroughly with water. 1
After etching by dipping in 0% sodium hydroxide at 70 ° C. for 60 seconds, the substrate was washed with running water, neutralized with 20% HNO 3 , and washed with water. This was subjected to electrolytic surface roughening treatment in a 1% nitric acid aqueous solution at an anode-time electricity quantity of 160 coulomb / dm 2 using a sinusoidal alternating waveform current under the condition of V A = 12.7 V. When the surface roughness was measured, it was 0.6 μ (Ra display). Subsequently, after immersing in a 30% H 2 SO 4 aqueous solution and desmutting at 55 ° C. for 2 minutes, 20% H 2 SO 4 was added.
In an SO 4 aqueous solution, a cathode was placed on the grained surface, and anodized so that the thickness became 2.7 g / m 2 at a current density of 2 A / dm 2 , thereby producing a substrate. The sol-gel reaction solution described below was coated on the back surface of the substrate treated as described above with a bar coater, dried at 100 ° C. for 1 minute, and dried to form a back coat layer having a coating amount of 50 mg / m 2. The provided substrate was produced. Sol-gel reaction liquid Tetraethyl silicate 50 parts by weight Water 21.6 parts by weight Methanol 10.8 parts by weight Nitric acid 0.05 parts by weight When the above components were mixed and stirred, heat was generated in about 5 minutes. After reacting for 10 minutes, 700 parts by weight of methanol was added to prepare a back coat coating solution. Subsequently, the following photosensitive solution was applied to the surface of the substrate, and a photosensitive layer was provided so that the applied weight after drying was 2.5 g / m 2 . Photosensitive solution Esterified product of 1,2-diazonaphthoquinone-5-sulfonyl chloride and pyrogallol-acetone resin (described in Example 1 of U.S. Pat. No. 3,635,709) 45 parts by weight Cresol formaldehyde novolak resin 110 parts by weight Part 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine 2 parts by weight Oil Blue # 603 (manufactured by Orient Chemical Industry Co., Ltd.) 1 part by weight Megafac F-177 (Dainippon) 0.4 parts by weight Methyl ethyl ketone 1000 parts by weight Propylene glycol monomethyl ether 1000 parts by weight A mat layer is formed on the surface of the photosensitive layer thus prepared as follows. A PS plate provided with a mat layer was obtained by spraying a forming resin liquid. . A 12% aqueous solution in which a part of a copolymer of methyl methacrylate / ethyl acrylate / acrylic acid (weight ratio 65:20:15) was prepared as a resin solution for forming a mat layer was prepared, and a rotary atomizing electrostatic coating machine was used. The number of rotations of the atomizing head is 25,000 rpm, the amount of the resin solution fed is 40 ml / min, the voltage applied to the atomizing head is -90 kV, the ambient temperature at the time of coating is 25 ° C, and the relative humidity is 50%. Steam is sprayed on the coated surface in 2.5 seconds to moisten, and 3 seconds after moistening, hot air having a temperature of 60 ° C and a humidity of 10% is blown for 5 seconds.
Sprayed for 2 seconds to dry. Mat height is about 6μ on average
m, the average size was 30 μm, and the applied amount was 150 mg / m 2 . The PS plate obtained in this way is 1,003 mm ×
A large number of sheets cut to a size of 800 mm were prepared, and these were exposed through a document film for 60 seconds from a distance of 1 m using a 3 kW metal halide lamp. The exposed PS plate was treated with the PS processor at a rate of 24 m 2 per day for a total of 3 days, and the finally treated plate was used as a sample for printing. Reference Example 1 In the washing section in Example 1, 7 g of 1- (3-chloroallyl) -3,5,7-triaza-1-azoniaadamantanchloride was used instead of 7 g of the compound [I] -4. Except for the addition, the same processing as in Example 1 was performed, and the final plate was used as a printing sample. Example 2 In Example 1, 1- (3-chloroallyl) -3,5,
7-Triaza-1-azonia adamantane chloride
Except for adding g, the same processing as in Example 1 was performed, and the final plate was used as a printing sample. Example 3 A printing plate was prepared in the same manner as in Example 1, except that compound [II] -4 was added in an amount of 14 g instead of 7 g of compound [I] -4. And Embodiment 4 In Embodiment 2 , a PS processor PS-900NP is used.
Was changed to Fuji Photo Film Co., Ltd. PS-900V (an automatic developing machine in which washing water is fresh water for each plate), and the same process as in Example 2 was performed to print the last plate. Sample. Reference Example 2 In Reference Example 1 , 1- (3-chloroallyl) -3,
Instead of 7 g of 5,7-triaza-1-azoniaadamantanchloride, 7 g of 1,3,5-trishydroxyethylhexahydro-S-triazine was added to the washing water, and the PS processor PS-900NP was added to PS-900. 900
Except for changing to V, the same processing as in Reference Example 1 was performed, and the final plate was used as a printing sample. The PS Processor PS-900NP was replaced with PS-900V was printed sample the last version performs exactly the same processing as in Reference Example 1 Reference Example 3 Reference Example 1. Examples 5 and 6 In Reference Example 3 , 7 g of compound [I] -2 was used,
A printing sample was prepared in exactly the same manner as in Reference Example 3 , except that 7 g of Compound [I] -3 was added. Example 7 In Reference Example 2 , 7 g of compound [I] -4 was added,
1,3,5-trishydroxyethylhexahydro-S
-Instead of 7 g of triazine, 7 g of 3-methyl-4-isopropylphenol and 3 g of diethylene glycol
Except that 5 g was added, the same processing as in Reference Example 2 was performed, and the last plate was used as a printing sample. COMPARATIVE EXAMPLES 1 AND 2 In Examples 1 and 4 , only tap water was used in the water washing section, except that the same treatment as in Examples 1 and 4 was performed, and the last plates were used as printing samples. In order to evaluate the ink adhesion of the printing samples of Examples 1 to 7, Reference Examples 1 to 3, and Comparative Examples 1 and 2, the samples were previously left at 35 ° C. and 85% for 3 days. .
The samples were mounted on a Harris Aurelia 125 offset printing press and printing commenced according to conventional methods. The number of prints until the ink adhered to the image area and a good printed matter was obtained is shown in the column of ink adhesion in Table 1. [Table 1] [0026] Formula (I) as an additive compound according to the result, the compound added with the system to wash water [II] (Example 1-7) has been excellent in ink receptivity, washing water (Comparative Examples 1 and 2) using only tap water was inferior in the ink deposition property. In addition, these additive compounds also acted as fungicides, and were also effective in preventing decay of the washing section. Further, in the PS-900V of Example 4, Reference Example 2, Reference Example 3, Examples 5, 6 and 7 , due to its mechanism, the washing water to which the additive of the present invention was added was supplied from the supply tank to the developing solution. It is also used as a diluting water for finishing gums and finishing rinses, but their performance was not affected at all. The additive for rinsing water of a lithographic printing plate according to the present invention has an effect of preventing a decrease in the inking property at the start of printing of the lithographic printing plate.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平3−218895(JP,A) 特開 平6−43700(JP,A) 特開 昭63−172269(JP,A) 特開 昭51−127082(JP,A) 特開 昭51−82378(JP,A) 特開 昭54−27569(JP,A) (58)調査した分野(Int.Cl.7,DB名) G03F 7/00 - 7/42 ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-3-218895 (JP, A) JP-A-6-43700 (JP, A) JP-A-63-172269 (JP, A) JP-A-51- 127082 (JP, A) JP-A-51-82378 (JP, A) JP-A-54-27569 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) G03F 7/ 00-7 / 42

Claims (1)

(57)【特許請求の範囲】 【請求項1】感光性平版印刷版を画像感光する工程と、
現像する工程と、前記現像する工程の後に水洗する工程
と、親水性版面保護層を印刷版上に設ける工程とを有す
る平版印刷版の製版方法において、前記水洗する工程の
水洗水が下記一般式〔I〕若しくは〔II〕で示される
化合物を含有することを特徴とする感光性平版印刷版の
製版方法。 【化1】
(57) [Claims] [Claim 1] Image-sensitizing a photosensitive lithographic printing plate;
A step of developing and a step of washing with water after the step of developing
And providing a hydrophilic plate surface protective layer on the printing plate.
In the method of making a lithographic printing plate,
The washing water is represented by the following general formula [I] or [II]
Of a photosensitive lithographic printing plate characterized by containing a compound
Plate making method. Embedded image
JP10977394A 1994-05-24 1994-05-24 Rinse water for lithographic printing plates and plate making method for lithographic printing plates Expired - Fee Related JP3361613B2 (en)

Priority Applications (1)

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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10977394A JP3361613B2 (en) 1994-05-24 1994-05-24 Rinse water for lithographic printing plates and plate making method for lithographic printing plates

Publications (2)

Publication Number Publication Date
JPH07319171A JPH07319171A (en) 1995-12-08
JP3361613B2 true JP3361613B2 (en) 2003-01-07

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Country Link
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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001051404A (en) * 1999-08-05 2001-02-23 Mitsubishi Chemicals Corp Plate making process for planographic printing plate
JP4459857B2 (en) * 2004-12-09 2010-04-28 東京応化工業株式会社 Lithographic cleaning liquid and resist pattern forming method using the same

Also Published As

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