JPH07319171A - Washing water for planographic printing plate and plate making method of planographic printing plate - Google Patents

Washing water for planographic printing plate and plate making method of planographic printing plate

Info

Publication number
JPH07319171A
JPH07319171A JP10977394A JP10977394A JPH07319171A JP H07319171 A JPH07319171 A JP H07319171A JP 10977394 A JP10977394 A JP 10977394A JP 10977394 A JP10977394 A JP 10977394A JP H07319171 A JPH07319171 A JP H07319171A
Authority
JP
Japan
Prior art keywords
water
plate
printing plate
washing water
additive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10977394A
Other languages
Japanese (ja)
Other versions
JP3361613B2 (en
Inventor
Atsushi Sakamoto
敦 坂本
Tadao Toyama
忠夫 登山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP10977394A priority Critical patent/JP3361613B2/en
Publication of JPH07319171A publication Critical patent/JPH07319171A/en
Application granted granted Critical
Publication of JP3361613B2 publication Critical patent/JP3361613B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To prevent fault of inking in the initial stage of the process even when recycled water is used in a washing process with water after development or a small amt. of fresh water is used, by incorporating at least one kind of compd. selected from specified compds. as an additive. CONSTITUTION:This washing water for planographic printing contains at least one kind of compd. selected from compds. expressed by formulae I, II as an additive. In formula, R is a hydrogen atom, NH4, or alkali metal such as Li, K, and Na. A single material or combination of two or more compds. may be used for the washing water for a planographic printing plate. The amt. of the compd. added to the washing water is 0.001-5wt.% to the washing water, and preferably 0.001-1wt., and more preferably 0.001-0.5wt.%. If the amt. is less than 0.001wt.%, the effect to improve the buildup property is not enough. If the amt. is >=5wt.%, it is disadvantageous for the running cost and bad influences are given to the physical property of the washing water.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は平版印刷版の製版時に用
いる水洗水及びこれを使用した感光性平版印刷版の製版
方法に関するものであり、特に印刷スタート時のインキ
着肉性を向上させた水洗水及びこれを使用した感光性平
版印刷版の製版方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to rinsing water used for making a lithographic printing plate and a method for making a photosensitive lithographic printing plate using the rinsing water. In particular, the ink receptivity at the start of printing is improved. The present invention relates to washing water and a method for making a photosensitive lithographic printing plate using the same.

【0002】[0002]

【従来技術及びその問題点】従来、感光性平版印刷版は
一般に現像工程、水洗工程、親水性版面保護層を設ける
工程等の処理工程を経て処理される。一般に現像された
印刷版上に現像液やそれに溶出した感光層成分が残留す
るのを防ぐため、現像後、水洗処理が行われる。自動現
像装置においては、節水等の目的で水洗水を循環して繰
返し用いることが通常行なわれているが、繰り返し使用
された水洗水で水洗処理された平版印刷版ではその画像
部上へ印刷インキが付きにくくなる、いわゆる着肉不良
が発生することがあった。この着肉不良の対策として、
平版印刷版一版毎に新鮮水を用いて水洗する方法もある
が、大量の水洗水を用いた場合は着肉不良対策として有
効であったが、廃水量が大巾に増えて好ましくなく、ま
た少量の新鮮水による水洗では着肉不良の完全な対策に
はならなかった。
2. Description of the Related Art Conventionally, a photosensitive lithographic printing plate is generally processed through processing steps such as a developing step, a water washing step, and a step of providing a hydrophilic plate surface protective layer. Generally, in order to prevent the developing solution and the components of the photosensitive layer eluted into the developing solution from remaining on the developed printing plate, a washing treatment is carried out after the development. In an automatic developing device, it is usual to circulate and repeatedly use washing water for the purpose of saving water, etc., but in a lithographic printing plate that has been subjected to washing treatment with repeatedly used washing water, the printing ink is printed on the image area. There was a case where a so-called defective inking, which is difficult to attach, occurred. As a countermeasure for this poor meat filling,
There is also a method of rinsing with fresh water for each lithographic printing plate, but when a large amount of rinsing water was used, it was effective as a measure against inking defects, but the amount of wastewater increased drastically, which is not preferable. In addition, washing with a small amount of fresh water was not a complete countermeasure for defective inking.

【0003】[0003]

【発明が解決しようとする課題】従って本発明の目的
は、感光性平版印刷版の現像処理後の水洗工程にくり返
し水洗水を用いても、あるいは、少量の新鮮水を用いた
場合でもスタート時のインキ着肉不良を起こさないよう
な水洗水及びこれを用いた平版印刷版の製版方法を提供
することである。
SUMMARY OF THE INVENTION Therefore, the object of the present invention is to start at the start even if repeated washing water is used in the washing step after the development processing of the photosensitive lithographic printing plate or a small amount of fresh water is used. Another object of the present invention is to provide a rinsing water that does not cause the ink inking defect and a method for making a lithographic printing plate using the rinsing water.

【0004】[0004]

【課題を解決するための手段】本発明者らは上記目的を
達成すべく鋭意検討を重ねた結果、着肉不良を効果的に
防ぐことのできる水洗水を見出し、本発明を成すに至っ
たものであり、下記(1)〜(5)に記載の構成により
本発明の目的を達成することができる。 (1)下記一般式〔I〕、〔II〕で示される化合物から
選ばれた少なくとも一種の化合物を添加剤として含有す
ることを特徴とする平版印刷版用水洗水。
Means for Solving the Problems As a result of intensive studies to achieve the above object, the inventors of the present invention found a rinsing water capable of effectively preventing defective inking, and completed the present invention. However, the objects of the present invention can be achieved by the configurations described in (1) to (5) below. (1) A rinsing water for a lithographic printing plate comprising at least one compound selected from compounds represented by the following general formulas [I] and [II] as an additive.

【0005】[0005]

【化2】 [Chemical 2]

【0006】(2)下記に示される化合物群(a)から
選ばれた少なくとも一種の化合物を添加剤として含有す
ることを特徴とする平版印刷版用水洗水。 〔化合物群(a)〕1,3,5−トリスヒドロキシエチ
ルヘキサヒドロ−S−トリアジン、1,3,5−トリス
ヒドロキシメチルヘキサヒドロ−S−トリアジン、1−
(3−クロロアリル)−3,5,7−トリアザ−1−ア
ゾニアアダマンタンクロリド、2−フェノキシエタノー
ル、α−ブロムシンナムアルデヒド、1,2−ベンズイ
ソチアゾリン、2−ベンツイミダゾリルカルバミン酸メ
チル、3−メチル−4−イソプロピルフェノール、N−
メチルジチオカルバミン酸ナトリウム、5−メチル−
1,2,4−トリアゾロ[3.4−b]ベンゾチアゾー
ル、N−ラウロイル−サルコシンナトリウム、N−ラウ
ロイル−N−メチル−β−アミノプロピオン酸ナトリウ
ム、レゾルシノール、ピロガロール、レゾルシンモノア
セテート、アルギン酸ナトリウム、エチレンビスジチオ
カルバミン酸二ナトリウム、10,10′−オキシビス
フェノキサアルシン、クレゾール、2,5−ジクロル−
4−ブロムフェノール、2−(4′−チアゾリル)−ベ
ンツイミダゾール、2,4,4′−トリクロロ−2′−
ヒドロオキシジフェニルエーテル及びそれらの塩。 (3)該添加剤の添加量が水洗水の0.001〜5重量
%であることを特徴とする前記(1)又は(2)に記載
の平版印刷版用水洗水。 (4)感光性平版印刷版を画像露光した後、現像、水洗
し、さらに親水性版面保護層を印刷版上に設ける製版方
法において、水洗時の水洗水が前記一般式〔I〕若しく
は〔II〕、又は前記化合物群(a)で示される化合物
を添加剤として含有することを特徴とする製版方法。 (5)該水洗水が更にキレート剤を含有することを特徴
とする前記(1)〜(3)のいずれかに記載の平版印刷
版用水洗水。
(2) A rinsing water for a lithographic printing plate containing at least one compound selected from the following compound group (a) as an additive. [Compound Group (a)] 1,3,5-Trishydroxyethylhexahydro-S-triazine, 1,3,5-trishydroxymethylhexahydro-S-triazine, 1-
(3-chloroallyl) -3,5,7-triaza-1-azonia adamantan chloride, 2-phenoxyethanol, α-bromocinnamaldehyde, 1,2-benzisothiazoline, methyl 2-benzimidazolylcarbamate, 3-methyl- 4-isopropylphenol, N-
Sodium methyldithiocarbamate, 5-methyl-
1,2,4-triazolo [3.4-b] benzothiazole, N-lauroyl-sarcosine sodium, N-lauroyl-N-methyl-β-aminopropionate sodium, resorcinol, pyrogallol, resorcinol monoacetate, sodium alginate, Disodium ethylenebisdithiocarbamate, 10,10'-oxybisphenoxaarsine, cresol, 2,5-dichloro-
4-bromophenol, 2- (4'-thiazolyl) -benzimidazole, 2,4,4'-trichloro-2'-
Hydroxydiphenyl ether and salts thereof. (3) The rinsing water for lithographic printing plates as described in (1) or (2) above, wherein the amount of the additive added is 0.001 to 5% by weight of rinsing water. (4) In the plate-making method in which the photosensitive lithographic printing plate is imagewise exposed, then developed, washed with water, and a hydrophilic plate surface protective layer is provided on the printing plate, the rinsing water at the time of rinsing is represented by the general formula [I] or [II]. ] Or a compound represented by the above-mentioned compound group (a) is contained as an additive. (5) The rinsing water for a lithographic printing plate as described in any of (1) to (3) above, wherein the rinsing water further contains a chelating agent.

【0007】以下、本発明を詳しく説明する。本発明の
平版印刷版の水洗水に含有される一般式〔I〕、〔II〕
の化合物又は化合物群(a)の化合物はスタート時のイ
ンキ着肉性向上に有効である。そのメカニズムは明確で
はないが、水洗水中の現像液親水性成分画像部への吸着
防止の作用があるものと思われる。本発明に使用される
一般式〔I〕、〔II〕に示される代表的具体例を以下に
示すが本発明はこれらに限定されるものではない。 (例示化合物)
The present invention will be described in detail below. General formulas [I] and [II] contained in the washing water of the lithographic printing plate of the present invention
The compound of 1) or the compound of the compound group (a) is effective for improving the ink receptivity at the start. The mechanism is not clear, but it is considered that there is an action of preventing adsorption to the image area of the hydrophilic component of the developer in washing water. Typical specific examples represented by the general formulas [I] and [II] used in the present invention are shown below, but the present invention is not limited thereto. (Exemplified compound)

【0008】[0008]

【化3】 [Chemical 3]

【0009】[0009]

【化4】 [Chemical 4]

【0010】これらの化合物の中で〔I〕−2、〔I〕
−3、〔I〕−4、〔II〕−2、〔II〕−3および〔I
I〕−4が水に溶け易く好ましい。本発明において、平
版印刷版の水洗水へ含有される下記一般式〔I〕又は
〔II〕で示される化合物は、単独もしくは2種以上を組
合わせて使用することができる。これらの化合物の水洗
水への添加量は、水洗水に対して0.001〜5重量%
であり、より好ましくは0.001〜1重量%、特に好
ましくは0.001〜0.5重量%である。添加量が
0.001重量%より少ない場合は、本発明の目的であ
る着肉性の向上の効果が小さく、一方、5重量%以上で
は着肉性向上効果は平衡状態に達し、それ以上の添加は
ランニングコスト上不利となり、また、水洗水の物性に
も悪影響が表れる。
Among these compounds, [I] -2, [I]
-3, [I] -4, [II] -2, [II] -3 and [I]
I] -4 is preferable because it easily dissolves in water. In the present invention, the compounds represented by the following general formula [I] or [II] contained in the washing water of the lithographic printing plate can be used alone or in combination of two or more kinds. The amount of these compounds added to the wash water is 0.001 to 5% by weight based on the wash water.
And more preferably 0.001 to 1% by weight, and particularly preferably 0.001 to 0.5% by weight. If the addition amount is less than 0.001% by weight, the effect of improving the inking property, which is the object of the present invention, is small, while if it is 5% by weight or more, the effect of improving the inking property reaches an equilibrium state. Addition is disadvantageous in terms of running cost and also has an adverse effect on the physical properties of washing water.

【0011】本発明の水洗水に含有される一般式
〔I〕、〔II〕の化合物の代わりに、前記本発明の化合
物群(a)(1,3,5−トリスヒドロキシエチルヘキ
サヒドロ−S−トリアジン、1,3,5−トリスヒドロ
キシメチルヘキサヒドロ−S−トリアジン、1−(3−
クロロアリル)−3,5,7−トリアザ−1−アゾニア
アダマンタンクロリド、2−フェノキシエタノール、α
−ブロムシンナムアルデヒド、1,2−ベンズイソチア
ゾリン、2−ベンツイミダゾリルカルバミン酸メチル、
3−メチル−4−イソプロピルフェノール、N−メチル
ジチオカルバミン酸ナトリウム、5−メチル−1,2,
4−トリアゾロ[3.4−b]ベンゾチアゾール、N−
ラウロイル−サルコシンナトリウム、N−ラウロイル−
N−メチル−β−アミノプロピオン酸ナトリウム、レゾ
ルシノール、ピロガロール、レゾルシンモノアセテー
ト、アルギン酸ナトリウム、エチレンビスジチオカルバ
ミン酸二ナトリウム、10,10′−オキシビスフェノ
キサアルシン、クレゾール、2,5−ジクロル−4−ブ
ロムフェノール、2−(4′−チアゾリル)−ベンツイ
ミダゾール、2,4,4′−トリクロロ−2′−ヒドロ
オキシジフェニルエーテル及びそれらの塩等の強アルカ
リ中にて安定な化合物)を用いることで、一般式
〔I〕、〔II〕の化合物を含有した場合と同様に、スタ
ート時のインキ着肉性向上に有効であり、また、そのメ
カニズムは明確ではないが、水洗水中の現像液親水性成
分画像部への吸着防止の作用があるものと思われる。本
発明の化合物群(a)は、単独でも2種以上を組み合わ
せて使用してもよく、本発明の構成(5)の化合物の中
でも1,3,5−トリスヒドロキシエチルヘキサヒドロ
−S−トリアジンが好適に用いられる。これらの本発明
の化合物群(a)の水洗水への添加量は、一般式
〔I〕、〔II〕の化合物の場合と同様である。前記の
式〔I〕、〔II〕の化合物及び本発明の化合物群(a)
の中には水に不溶の化合物もあるが適当な方法、例えば
グリコール系溶剤に溶解するか、水へ分散させた懸濁液
にする等の形態で水洗水の中へ均一に分散することがで
きる。
Instead of the compounds of the general formulas [I] and [II] contained in the washing water of the present invention, the compound group (a) (1,3,5-trishydroxyethylhexahydro-S) of the present invention is used. -Triazine, 1,3,5-trishydroxymethylhexahydro-S-triazine, 1- (3-
(Chloroallyl) -3,5,7-triaza-1-azoniaadamantan chloride, 2-phenoxyethanol, α
-Bromcinnamaldehyde, 1,2-benzisothiazoline, methyl 2-benzimidazolylcarbamate,
3-methyl-4-isopropylphenol, sodium N-methyldithiocarbamate, 5-methyl-1,2,
4-triazolo [3.4-b] benzothiazole, N-
Lauroyl-sarcosine sodium, N-lauroyl-
Sodium N-methyl-β-aminopropionate, resorcinol, pyrogallol, resorcinol monoacetate, sodium alginate, disodium ethylenebisdithiocarbamate 10,10'-oxybisphenoxaarsine, cresol, 2,5-dichloro-4- Bromphenol, 2- (4'-thiazolyl) -benzimidazole, 2,4,4'-trichloro-2'-hydroxydiphenyl ether and salts thereof, which are stable in a strong alkali, are used. Similar to the case of containing the compounds of the general formulas [I] and [II], it is effective in improving the ink receptivity at the start, and the mechanism is not clear, but the hydrophilic component of the developer in the wash water is not clear. It seems to have a function of preventing adsorption to the image area. The compound group (a) of the present invention may be used alone or in combination of two or more, and among the compounds of the constitution (5) of the present invention, 1,3,5-trishydroxyethylhexahydro-S-triazine Is preferably used. The amount of the compound group (a) of the present invention added to the washing water is the same as in the case of the compounds of the general formulas [I] and [II]. The compounds of the above formulas [I] and [II] and the compound group (a) of the present invention
There are some compounds that are insoluble in water, but it is possible to disperse them uniformly in the rinsing water in a suitable manner, for example, by dissolving them in a glycol solvent or forming a suspension in which they are dispersed in water. it can.

【0012】本発明の水洗水は、一般式〔I〕、〔I
I〕の化合物に加えて、キレート剤を含有することが好
ましい。キレート剤は、化合物〔I〕、〔II〕の水洗水
中での安定性増加のために有効である。本発明に使用さ
れるキレート剤としては例えばEDTA(エチレンジア
ミン四酢酸)及びその塩、NTA(ニトリロ三酢酸)及
びその塩、HEDTA(ヒドロキシエチルエチレンジア
ミン三酢酸)及びその塩、DPTA(ジエチレントリア
ミン五酢酸)及びその塩、TTHA(トリエチレンテト
ラミン六酢酸)及びその塩、HIDA(ヒドロキシエチ
ルイミノ二酢酸)及びその塩、DHEG(ジヒドロキシ
エチルグリシン)及びその塩、CyDTA(シクロヘキ
サンジアミン四酢酸)及びその塩、EHPG〔エチレン
ビス(ヒドロキシフェニルグリシン)〕及びその塩、H
EDP(1−ヒドロキシエチリデン−1,1−ジホスホ
ン酸)及びその塩、ATMP〔アミノトリ(メチレンホ
スホン酸)〕及びその塩、高分子電解質、例えばポリア
クリル酸ナトリウム、ポリメタクリル酸ナトリウム、ポ
リマレイン酸ナトリウム、ポリイタコン酸ナトリウム及
びそれらの共重合体等が挙げられるが、金属イオンに対
してキレート化力を発揮するものであればこれらに限定
されるものではない。本発明におけるキレート剤は、1
種又は2種以上を組合せて使用することができる。キレ
ート剤の好ましい使用量は水洗水に対して0.0001
〜0.01重量%であり、より好ましくは0.001〜
0.005重量%、特に好ましくは0.002〜0.0
03重量%である。キレート剤の使用量が0.0001
〜0.01重量%の範囲であると化合物〔I〕、〔I
I〕の安定性を低下させる金属イオンのキレート化に適
した濃度であり好ましい。0.0001重量%未満で
は、キレート化できない金属イオンが残存し、0.01
重量%を越えると残存金属イオンはわずかになり、それ
以上添加するとランニングコスト上不利になる。以上の
水洗水に含有される本発明の添加剤(式〔I〕、〔I
I〕の化合物、化合物群(a)を示す)は、粉体、錠剤
で水洗水に添加してもよいが、予め水や適当な有機溶剤
に溶かした溶液で水洗水に加えることができ、水洗水へ
の混合し易さを考慮すると溶液型の方が好ましい。この
場合の溶液型の化合物は、一般式〔I〕、〔II〕の化合
物又は化合物群(a)の化合物を1重量%以上含有する
ことが好ましく、より好ましくは5重量%以上である。
本発明の水洗水は、一般式〔I〕、〔II〕の化合物と化
合物群(a)の化合物を併用することもできる。
The washing water of the present invention has the general formulas [I] and [I]
In addition to the compound I], it is preferable to contain a chelating agent. The chelating agent is effective for increasing the stability of the compounds [I] and [II] in the wash water. Examples of the chelating agent used in the present invention include EDTA (ethylenediaminetetraacetic acid) and its salts, NTA (nitrilotriacetic acid) and its salts, HEDTA (hydroxyethylethylenediaminetriacetic acid) and its salts, DPTA (diethylenetriaminepentaacetic acid) and Its salts, TTHA (triethylenetetramine hexaacetic acid) and its salts, HIDA (hydroxyethyliminodiacetic acid) and its salts, DHEG (dihydroxyethylglycine) and its salts, CyDTA (cyclohexanediaminetetraacetic acid) and its salts, EHPG [ Ethylene bis (hydroxyphenylglycine)] and salts thereof, H
EDP (1-hydroxyethylidene-1,1-diphosphonic acid) and its salts, ATMP [aminotri (methylenephosphonic acid)] and its salts, polyelectrolytes such as sodium polyacrylate, sodium polymethacrylate, sodium polymaleate, Examples thereof include sodium polyitaconate and copolymers thereof, but are not limited thereto as long as they exhibit a chelating power for metal ions. The chelating agent in the present invention is 1
One kind or a combination of two or more kinds can be used. The preferred amount of chelating agent used is 0.0001 with respect to the washing water.
To 0.01% by weight, and more preferably 0.001 to
0.005% by weight, particularly preferably 0.002-0.0
It is 03% by weight. The amount of chelating agent used is 0.0001
To 0.01% by weight, the compounds [I], [I
The concentration is suitable for chelating a metal ion that reduces the stability of [I], which is preferable. If it is less than 0.0001% by weight, metal ions that cannot be chelated remain, and
If the amount exceeds 5% by weight, the amount of residual metal ions becomes small, and if the amount is more than that, the running cost becomes disadvantageous. The additive of the present invention (formula [I], [I
The compound of [I], which represents the compound group (a)), may be added to the washing water in the form of powder or tablets, but it can be added to the washing water in the form of a solution previously dissolved in water or a suitable organic solvent. The solution type is preferred in consideration of easiness of mixing with washing water. In this case, the solution type compound preferably contains the compound of the general formula [I] or [II] or the compound of the compound group (a) in an amount of 1% by weight or more, more preferably 5% by weight or more.
In the washing water of the present invention, the compounds of the general formulas [I] and [II] and the compounds of the compound group (a) can be used in combination.

【0013】本発明の添加剤が加えられた水洗水は、ポ
ジ型及びネガ型感光性平版印刷版(以下PS版と略す)
の製版時の水洗工程で用いることができる。本発明が適
用できるポジ型PS版は例えば特公昭43−28403
号、特開昭62−14652号、同63−226641
号、特開平2−8663号各公報に詳しく記載されてい
るようなPS版が好ましく用いられる。ネガ型PS版
は、例えば感光物としてジアゾ化合物を用いる物、光架
橋性化合物を用いる物、及び光重合性化合物を用いる物
がある。上記ジアゾ化合物としては従来公知の物が適宜
使用できる。その例としては、例えば、p−ジアゾジフ
ェニルアミンとホルムアルデヒドまたはアセトアルデヒ
ドの縮合物と、ヘキサフルオロリン酸塩、テトラフルオ
ロホウ酸塩との有機溶媒可溶の反応生成物であるジアゾ
樹脂無機塩、また米国特許第3,300,309号明細
書に記載されているような、前記縮合物とスルホン酸類
例えばパラトルエンスルホン酸またはその塩、ホスフィ
ン酸類例えばベンゼンホスフィン酸またはその塩、さら
に特公昭49−48001号公報、特開平2−2965
0号公報に記載された芳香族化合物との共縮合ジアゾ樹
脂も好ましく用いられる。光架橋性化合物としては、例
えば、特開平2−236552号公報に記載されたマレ
イミド基を側鎖に有する物があり、光重合組成物として
は、例えば特開昭63−257749号公報に記載され
た物があげられる。PS版は透明原図を通してカーボン
アーク灯、水銀灯、メタルハライドランプ、タングステ
ンランプ等の活性光線の豊富な光源により露光され、次
いで湿式処理による現像処理工程にて現像される。本発
明の製版方法には特開平5−2271号公報又は特願平
5−71589号明細書に記載されているような現像液
が好ましく用いられる。上記のような現像液で画像露光
させたPS版を現像する方法としては従来公知の種々の
方法が可能である。具体的には、画像露光されたPS版
を現像液中に浸漬する方法、PS版の感光層に対して多
数のノズルから現像液を噴射する方法、現像液で湿潤さ
れたスポンジでPS版の感光層を拭う方法、PS版の感
光層の表面に現像液をローラ塗布する方法などが挙げら
れる。また、このようにしてPS版の感光層に現像液が
施された後、感光層の表面をブラシなどで軽く擦ること
もできる。
The washing water to which the additive of the present invention is added is a positive or negative photosensitive lithographic printing plate (hereinafter abbreviated as PS plate).
It can be used in the water washing step during plate making. The positive PS plate to which the present invention can be applied is, for example, Japanese Patent Publication No.
JP-A-62-14652, 63-226641
A PS plate as described in detail in JP-A No. 2-8663 and JP-A No. 2-8663 is preferably used. Negative PS plates include, for example, those using a diazo compound as a photosensitive material, those using a photocrosslinkable compound, and those using a photopolymerizable compound. As the diazo compound, conventionally known compounds can be appropriately used. Examples thereof include diazo resin inorganic salts, which are organic solvent-soluble reaction products of a condensate of p-diazodiphenylamine and formaldehyde or acetaldehyde, and hexafluorophosphate and tetrafluoroborate, and US As described in Japanese Patent No. 3,300,309, the condensate and sulfonic acids such as paratoluenesulfonic acid or a salt thereof, phosphinic acids such as benzenephosphinic acid or a salt thereof, and JP-B-49-48001. Publication, JP-A-2-2965
A co-condensation diazo resin with an aromatic compound described in JP-A-0 is also preferably used. Examples of the photocrosslinkable compound include those having a maleimide group in the side chain described in JP-A-2-236552, and examples of the photopolymerizable composition are described in JP-A-63-257749. I can give you something. The PS plate is exposed through a transparent original image by a light source rich in actinic rays such as a carbon arc lamp, a mercury lamp, a metal halide lamp, and a tungsten lamp, and then developed in a developing process by a wet process. For the plate-making method of the present invention, a developer as described in JP-A-5-2271 or Japanese Patent Application No. 5-71589 is preferably used. As a method for developing the PS plate imagewise exposed with the above-mentioned developing solution, various conventionally known methods can be used. Specifically, a method of immersing the image-exposed PS plate in a developer, a method of spraying the developer from a large number of nozzles onto the photosensitive layer of the PS plate, and a sponge wetted with the developer Examples thereof include a method of wiping the photosensitive layer and a method of roller-coating a developing solution on the surface of the photosensitive layer of the PS plate. Further, after the developing solution is applied to the photosensitive layer of the PS plate in this way, the surface of the photosensitive layer can be lightly rubbed with a brush or the like.

【0014】上記のような現像処理を施して得られた平
版印刷版は続く水洗処理工程にて水洗されるが、水洗に
先立って版面上の現像液の量が少なくなる様にスクイズ
されることが望ましい。スクイズする方法としては、例
えばエアーナイフにより版面上の現像液をかき取る方
法、あるいは表面の滑らかな弾性プラスチック材料を版
面と摺接させて版面上の現像液をかき取る方法、あるい
はゴムのような弾性部材をローラー表面に被覆した弾性
ローラー対の間に版を通してニップ圧により版面の現像
液を除去する方法等が挙げられるが、自動現像機を使用
する場合には弾性ローラー対を使用する方法が好まし
い。
The lithographic printing plate obtained by the above-mentioned development treatment is washed with water in the subsequent washing treatment step, but is squeezed so that the amount of the developing solution on the plate surface is reduced prior to washing with water. Is desirable. Examples of the squeezing method include a method of scraping off the developing solution on the plate surface with an air knife, a method of scraping off the developing solution on the plate surface by bringing an elastic plastic material having a smooth surface into sliding contact with the plate surface, and a method such as rubber. Examples include a method of removing the developer on the plate surface by nip pressure by passing a plate between an elastic roller pair in which an elastic member is coated on the roller surface, but when using an automatic developing machine, a method of using the elastic roller pair is used. preferable.

【0015】続く平版印刷版の水洗処理工程における水
洗水は繰り返し循環使用されてもよいし、平版印刷版の
1版ごとに新鮮な水を使用してもよく、更には循環水洗
水の一部を随時新鮮水で補填しながら用いてもよい。水
洗水が繰返し循環使用される場合の本発明の添加剤の水
洗水への添加方法は、例えば特開平2−2569号明細
書に記述されているような自動現像機の水洗部タンクに
水洗水を所定量満たし、そこへ適当な方法により計量し
た本発明の添加剤を加える方法、あるいはあらかじめ所
定量の水洗水と適当な方法により計量した本発明の添加
剤を混合し、その後、水洗部タンクへ仕込む方法等が挙
げられる。上記のように水洗水が繰返し循環使用される
場合には、水洗後の工程にて用いられる不感脂化(ガム
引き)処理液への循環使用した水洗水中の現像液成分の
混入を少なくするために新鮮水が水洗部タンクへ補充さ
れることがある。このような場合には新鮮水へ本発明の
添加剤を加えることは言うまでもないが、添加方法とし
ては新鮮水の貯蔵タンクへ新しい水を所定量満たしそこ
へ適当な方法により計量した本発明の添加剤を加える方
法、あるいはあらかじめ所定量の水洗水と、適当な方法
により計量した本発明の添加剤を混合し、その後貯蔵タ
ンクへ仕込む方法等が挙げられる。あるいは貯蔵タンク
がフローター管理により自動的に水位を一定に保つ型式
ならば、一定期間ごとに一定量の本添加剤を貯蔵タンク
内に加える方法も有効である。
The rinsing water in the subsequent lithographic printing plate washing step may be repeatedly circulated, or fresh water may be used for each lithographic printing plate, and a part of the circulated rinsing water may be used. May be used while being supplemented with fresh water at any time. The method of adding the additive of the present invention to the washing water when the washing water is repeatedly circulated is described in, for example, a washing section tank of an automatic processor as described in JP-A-2-2569. A predetermined amount of the additive of the present invention, which is measured by an appropriate method, or a predetermined amount of washing water and the additive of the present invention, which is measured by an appropriate method, are mixed, and then a water washing section tank The method of charging to When the wash water is repeatedly circulated as described above, in order to reduce the mixing of the developer component in the rinsing water used for circulation to the desensitizing (gumming) treatment liquid used in the step after the wash. In addition, fresh water may be added to the flush tank. In such a case, it goes without saying that the additive of the present invention is added to fresh water, but the addition method is to add a predetermined amount of fresh water to a storage tank of fresh water and add the additive of the present invention measured by an appropriate method. Examples thereof include a method of adding an agent, a method of mixing a predetermined amount of washing water with an additive of the present invention measured by an appropriate method, and then charging the mixture in a storage tank. Alternatively, if the storage tank is of a type in which the water level is automatically kept constant by floater control, a method of adding a fixed amount of the present additive to the storage tank at fixed intervals is also effective.

【0016】また、使用される水洗水が平版印刷版の一
版ごとに新鮮な水である場合の本発明の添加剤の水洗水
への添加方法は、例えば特開平2−3065号公報又は
特願平5−73672号明細書に記述されている様な自
動現像機の水洗水の貯蔵タンクへ新しい水を所定量満た
し、そこへ適当な方法により計量した本発明の添加剤を
加える方法、あるいはあらかじめ所定量の水洗水と、適
当な方法により計量した本発明の添加剤を混合し、その
後貯蔵タンクへ仕込む方法等が挙げられる。あるいは貯
蔵タンクがフローター管理により自動的に水位を一定に
保つ型式ならば、一定期間ごとに一定量の本添加剤を貯
蔵タンク内に加える方法も有効である。これら本発明の
添加剤が加えられた水洗水により、平版印刷版を水洗す
る方法としては、例えば水洗水を満たした槽中に平版印
刷版を浸漬し、好ましくは攪拌を行ない取り出す方法、
平版印刷版上に単独あるいは複数の細口を有するパイプ
等を通して水洗水を版上に供給する方法等がある。自動
現像機を使用する場合には後者の方法が有利である。こ
の場合の水洗水はPS版の水洗部の通過に合わせてタイ
ミングよく適量が供給されることが好ましい。好ましい
水洗水量は5〜300cc/m2であるが、より好ましくは
10〜100cc/m2、特に好ましくは20〜80cc/m2
である。5cc/m2 未満では平版印刷版の水洗が不十
分になり、300cc/m2 を越えると廃水量が多くな
り好ましくない。水洗した平版印刷版は版面上に残存す
る水洗水が少なくなるようにスクイズされることが好ま
しく、該スクイズの方法としては前記の現像液をスクイ
ズする方法が可能であるが自動現像機を使用する場合に
は弾性ローラー対を用いる方法が好ましい。
Further, when the washing water used is fresh water for each plate of the planographic printing plate, the method of adding the additive of the present invention to the washing water is described in, for example, JP-A-2-3065 or A method of adding a predetermined amount of fresh water to a storage tank for washing water of an automatic processor as described in Japanese Patent Application No. 5-73672, and adding the additive of the present invention to the storage tank, or Examples include a method in which a predetermined amount of washing water and the additive of the present invention measured by an appropriate method are mixed in advance and then charged into a storage tank. Alternatively, if the storage tank is of a type in which the water level is automatically kept constant by floater control, a method of adding a fixed amount of the present additive to the storage tank at fixed intervals is also effective. As a method of rinsing the lithographic printing plate with the rinsing water to which the additive of the present invention has been added, for example, a method of immersing the lithographic printing plate in a tank filled with rinsing water, and preferably taking out by stirring,
There is a method of supplying washing water onto the plate through a pipe or the like having a single or a plurality of narrow holes on the planographic printing plate. The latter method is advantageous when using an automatic processor. In this case, it is preferable that an appropriate amount of washing water is supplied in a timely manner as it passes through the washing section of the PS plate. Preferred amount of washing water is 5~300cc / m 2, but more preferably 10~100cc / m 2, particularly preferably 20~80cc / m 2
Is. If it is less than 5 cc / m 2 , washing of the lithographic printing plate becomes insufficient, and if it exceeds 300 cc / m 2 , the amount of waste water increases, which is not preferable. The lithographic printing plate washed with water is preferably squeezed so that the washing water remaining on the plate surface is reduced, and the squeezing method may be the method of squeezing the developing solution, but an automatic developing machine is used. In this case, a method using a pair of elastic rollers is preferable.

【0017】また平版印刷版の製版工程においては、水
洗工程の後に必要に応じて種々の処理工程を設けること
が可能である。水洗工程の後に続く工程としては、主に
不感脂化(ガム引き)処理が挙げられる。本発明に適用
できる不感脂化処理液としては、例えば特開平2−11
3997号、特公平5−19920号明細書に詳しく記
載されているような不感脂化処理液がある。また水洗工
程の後に続くその他の工程として、界面活性剤を含む水
溶液による処理も挙げられる。本発明に適用できる界面
活性剤を含む水溶液としては、例えば特開昭63−16
9645、同63−169646、同63−16964
7、同63−172270各号明細書に詳しく記載され
ているような界面活性剤を含む水溶液がある。その他に
も現像インキ盛り、画像部の修正等の工程が行われる
が、本発明の添加剤は水洗後の工程の種類に関係なく、
使用することが可能である。本発明の添加剤が加えられ
た水洗水は、上記の平版印刷版の現像後の水洗だけでな
く、例えば消去後の自動水洗機の水洗水としてまた、静
電写真法で形成したトナー像をマスクに下層の有機樹脂
層を溶出して画像を形成する材料の溶出工程後の水洗水
としても適当に用いられる。更には、ハロゲン化銀拡散
転写法や、銀を重合開始に用いた感光材料の現像後の水
洗水としても用いられる。
Further, in the plate making process of the lithographic printing plate, various treatment steps can be provided as needed after the washing step. Examples of the step following the water washing step mainly include desensitizing (gumming) treatment. Examples of the desensitizing treatment liquid applicable to the present invention include, for example, JP-A-2-11.
There are desensitizing treatment liquids as described in detail in Japanese Patent No. 3997 and Japanese Patent Publication No. 5-19920. Further, as another step following the water washing step, treatment with an aqueous solution containing a surfactant can be mentioned. Examples of the aqueous solution containing a surfactant applicable to the present invention include, for example, JP-A-63-16.
9645, 63-169646, 63-16964
7, 63-172270, there is an aqueous solution containing a surfactant as described in detail. In addition to these, steps such as developing ink piling and correction of the image area are carried out, but the additive of the present invention, regardless of the type of step after washing with water,
It is possible to use. The washing water to which the additive of the present invention has been added is used not only as the washing water after the development of the lithographic printing plate described above, but also as the washing water of the automatic washing machine after erasing, and also the toner image formed by the electrostatic photography method. It is also suitably used as washing water after the step of eluting the material for forming an image by eluting the lower organic resin layer on the mask. Further, it is also used as a silver halide diffusion transfer method or as washing water after development of a light-sensitive material using silver as a polymerization initiator.

【0018】[0018]

【実施例】以下実施例をもって本発明を詳細に説明す
る。 実施例1 [SiO2]/[M2O]比1.2、SiO21.5重量
%のケイ酸カリウム水溶液からなり、N−アルキル−
N,N−ジヒドロキシエチルベタイン両性界面活性剤を
0.04重量%含む現像液を22リットル調整し、富士
写真フイルム(株)製PSプロセッサーPS900NP
(水洗水が繰返し循環使用されるタイプの自動現像機)
に仕込み30℃に保温した。さらに水洗部には水道水7
リットルに化合物〔I〕−4を7g及びEDTAの4N
a塩を0.14g添加しよく攪拌した水溶液を仕込ん
だ。さらに後処理槽には富士写真フイルム(株)製PS
−プレートフィニッシングガムFP−2W 50重量
部、水道水50重量部から成る不感脂化液7リットルを
仕込んだ。次に厚さ0.3mmのアルミニウム板をナイ
ロンブラシと400メッシュのパミストンの水懸濁液を
用いその表面を砂目立てした後、よく水で洗浄した。1
0%水酸化ナトリウムに70℃で60秒間浸漬してエッ
チングした後、流水で水洗後20%HNO3で中和洗
浄、水洗した。これをVA=12.7Vの条件下で正弦
波の交番波形電流を用いて1%硝酸水溶液中で160ク
ーロン/dm2の陽極時電気量で電解粗面化処理を行っ
た。その表面粗さを測定したところ0.6μ(Ra表
示)であった。ひきつづいて30%のH2SO4水溶液中
に浸漬し55℃で2分間デスマットした後、20%H2
SO4水溶液中で、砂目立てした面に陰極を配置して電
流密度2A/dm2において厚さが2.7g/m2になるよ
うに陽極酸化し、基板を作製した。
The present invention will be described in detail with reference to the following examples. Example 1 A [SiO 2 ] / [M 2 O] ratio of 1.2 and an aqueous potassium silicate solution containing 1.5 wt% of SiO 2 were used.
22 liters of a developer containing 0.04% by weight of N, N-dihydroxyethyl betaine amphoteric surfactant was prepared, and PS processor PS900NP manufactured by Fuji Photo Film Co., Ltd.
(Automatic processor of the type where wash water is repeatedly circulated)
And kept at 30 ° C. Furthermore, tap water 7
7 g of compound [I] -4 and 4N of EDTA per liter
0.14 g of salt a was added, and an aqueous solution with good stirring was charged. In addition, PS from Fuji Photo Film Co., Ltd.
-Plate finishing gum FP-2W 7 liters of desensitizing liquid consisting of 50 parts by weight and 50 parts by weight of tap water were charged. Next, an aluminum plate having a thickness of 0.3 mm was grained on its surface using a nylon brush and an aqueous suspension of 400 mesh pumice, and then washed thoroughly with water. 1
It was immersed in 0% sodium hydroxide at 70 ° C. for 60 seconds for etching, washed with running water, neutralized with 20% HNO 3 and washed with water. This was subjected to electrolytic surface-roughening treatment in an aqueous 1% nitric acid solution under the condition of V A = 12.7 V in an aqueous 1% nitric acid solution at an anode-time electric quantity of 160 coulomb / dm 2 . The surface roughness was measured and found to be 0.6 μ (Ra indication). Then, it is immersed in 30% H 2 SO 4 aqueous solution and desmutted at 55 ° C. for 2 minutes, and then 20% H 2
A cathode was placed on a grained surface in an SO 4 aqueous solution and anodized to a thickness of 2.7 g / m 2 at a current density of 2 A / dm 2 to prepare a substrate.

【0019】このように処理された基板の裏面に下記の
ゾル−ゲル反応液をバーコーターで塗布し、100℃で
1分間乾燥し、乾燥後の塗布量が50mg/m2のバックコ
ート層を設けた基板を作製した。 ゾル−ゲル反応液 テトラエチルシリケート 50 重量部 水 21.6重量部 メタノール 10.8重量部 硝酸 0.05重量部 上記成分を混合、攪拌すると約5分で発熱した。10分
間反応させた後、メタノールを700重量部加えること
によりバックコート塗布液を調製した。続いて、上記の
基板の表面に下記感光液を塗布し、乾燥後の塗布重量が
2.5g/m2となるように感光層を設けた。 感光液 1,2−ジアゾナフトキノン−5−スルホニルクロリドと ピロガロール−アセトン樹脂とのエステル化物 (米国特許第3,635,709号明細書の実施例1に記載されて いるもの) 45重量部 クレゾールホルムアルデヒドノボラック樹脂 110重量部 2−(p−メトキシフェニル)−4,6−ビス(トリク ロロメチル)−s−トリアジン 2重量部 オイルブルー#603(オリエント化学工業(株)製) 1重量部 メガファックF−177 (大日本インキ化学工業(株)製フッ素系界面活性剤) 0.4重量部 メチルエチルケトン 1000重量部 プロピレングリコールモノメチルエーテル 1000重量部
The back surface of the substrate thus treated was coated with the sol-gel reaction solution described below with a bar coater and dried at 100 ° C. for 1 minute to form a back coat layer having a coating amount of 50 mg / m 2 after drying. The provided substrate was produced. Sol-gel reaction solution Tetraethyl silicate 50 parts by weight Water 21.6 parts by weight Methanol 10.8 parts by weight Nitric acid 0.05 parts by weight When the above components were mixed and stirred, heat was generated in about 5 minutes. After reacting for 10 minutes, 700 parts by weight of methanol was added to prepare a back coat coating solution. Subsequently, the following photosensitive solution was applied to the surface of the above substrate, and a photosensitive layer was provided so that the coating weight after drying was 2.5 g / m 2 . Photosensitive solution Esterified product of 1,2-diazonaphthoquinone-5-sulfonyl chloride and pyrogallol-acetone resin (described in Example 1 of US Pat. No. 3,635,709) 45 parts by weight Cresol formaldehyde novolak resin 110 parts by weight 2 parts by weight 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine 2 parts by weight Oil Blue # 603 (manufactured by Orient Chemical Industry Co., Ltd.) 1 part by weight Megafac F-177 (Dai Nippon) Fluorochemical surfactant manufactured by Ink Chemical Co., Ltd.) 0.4 parts by weight Methyl ethyl ketone 1000 parts by weight Propylene glycol monomethyl ether 1000 parts by weight

【0020】このようにして作製した感光層の表面に下
記の様にしてマット層形成用樹脂液を吹き付けてマット
層を設けたPS版を得た。マット層形成用樹脂液として
メチルメタクリレート/エチルアクリレート/アクリル
酸(仕込重量比65:20:15)共重合体の一部をナ
トリウム塩とした12%水溶液を準備し、回転霧化静電
塗布機で霧化頭回転数25,000rpm、樹脂液の送液
量は40ml/分、霧化頭への印加電圧は−90kV、塗
布時の周囲温度は25℃、相対湿度は50%とし、塗布
後2.5秒で塗布面に蒸気を吹き付けて湿潤させ、つい
で湿潤した3秒後に温度60℃、湿度10%の温風を5
秒間吹き付けて乾燥させた。マットの高さは平均約6μ
m、大きさは平均30μm、塗布量は150mg/m2であ
った。このようにした得られたPS版を1,003mm×
800mmの大きさに裁断したものを多数枚用意し、これ
らに原稿フィルムを通して1mの距離から3kWのメタ
ルハライドランプを用いて、60秒間露光した。上記の
露光したPS版を上記のPSプロセッサーで1日あたり
24m2、計3日間処理し、最後に処理した版を印刷用の
試料とした。
A matte layer-provided PS plate was obtained by spraying the matte layer-forming resin liquid on the surface of the photosensitive layer thus prepared in the following manner. A 12% aqueous solution of methyl methacrylate / ethyl acrylate / acrylic acid (weight ratio of 65:20:15) copolymer with a part of sodium salt was prepared as a mat layer forming resin liquid, and a rotary atomizing electrostatic coating machine was prepared. The atomizing head rotation speed is 25,000 rpm, the resin liquid feed rate is 40 ml / min, the voltage applied to the atomizing head is -90 kV, the ambient temperature during application is 25 ° C, and the relative humidity is 50%. Spray the coated surface with steam for 2.5 seconds to moisten it, and then 3 seconds after moistening, apply warm air with a temperature of 60 ° C. and a humidity of 10% to 5 seconds.
Sprayed for 2 seconds to dry. The height of the mat is about 6μ on average
m, the average size was 30 μm, and the coating amount was 150 mg / m 2 . The PS plate thus obtained is 1,003 mm ×
A large number of pieces cut into a size of 800 mm were prepared, and these were exposed through a document film for 60 seconds using a metal halide lamp of 3 kW from a distance of 1 m. The exposed PS plate was treated with the PS processor at 24 m 2 per day for a total of 3 days, and the finally treated plate was used as a sample for printing.

【0021】実施例2 実施例1において水洗部に、化合物〔I〕−4を7gの
代わりに、1−(3−クロロアリル)−3,5,7−ト
リアザ−1−アゾニアアダマンタンクロリドを7g添加
した以外は、実施例1と全く同様の処理を行ない最後の
版を印刷用試料とした。 実施例3 実施例1において1−(3−クロロアリル)−3,5,
7−トリアザ−1−アゾニアアダマンタンクロリドを7
g添加する以外は、実施例1と全く同様の処理を行ない
最後の版を印刷用試料とした。 実施例4 実施例1において、化合物〔I〕−4を7gの代わり
に、化合物〔II〕−4を14g添加する以外は、実施例
1と全く同様の処理を行ない最後の版を印刷用試料とし
た。
Example 2 In Example 1, instead of 7 g of compound [I] -4, 7 g of 1- (3-chloroallyl) -3,5,7-triaza-1-azoniaadamantan chloride was added to the water-washed portion. The same process as in Example 1 was carried out except that the final plate was used as a printing sample. Example 3 In Example 1, 1- (3-chloroallyl) -3,5,
7-triaza-1-azonia adamantan chloride
The same process as in Example 1 was performed except that g was added, and the last plate was used as a printing sample. Example 4 The same procedure as in Example 1 was carried out except that 14 g of compound [II] -4 was added instead of 7 g of compound [I] -4 in Example 1, and the last plate was used as a printing sample. And

【0022】実施例5 実施例3において、PSプロセッサーPS−900NP
を富士写真フイルム(株)製PS−900V(水洗水が
一版ごとに新鮮な水であるタイプの自動現像機)に変え
た以外は実施例3と全く同様の処理を行ない最後の版を
印刷用試料とした。 実施例6 実施例2において、1−(3−クロロアリル)−3,
5,7−トリアザ−1−アゾニアアダマンタンクロリド
の7gの代わりに、1,3,5−トリスヒドロキシエチ
ルヘキサヒドロ−S−トリアジンの7gを水洗水に添加
し、PSプロセッサーPS−900NPをPS−900
Vに変えた以外は実施例2と全く同様の処理を行ない最
後の版を印刷用試料とした。 実施例7 実施例2においてPSプロセッサーPS−900NPを
PS−900Vに変えた以外は実施例2と全く同様の処
理を行ない最後の版を印刷用試料とした。 実施例8,9 実施例7において、それぞれ化合物〔I〕−2を7g,
化合物〔I〕−3を7gを追加した以外は、実施例7と
全く同様の処理を行なって印刷用試料を作成した。 実施例10 実施例6において、化合物〔I〕−4を7g添加し、
1,3,5−トリスヒドロキシエチルヘキサヒドロ−S
−トリアジンの7gの代わりに、3−メチル−4−イソ
プロピルフェノールを7gとジエチレングリコールを3
5g添加した以外は実施例6と全く同様の処理を行な
い、最後の版を印刷用試料とした。
Example 5 In Example 3, PS processor PS-900NP
Was changed to PS-900V manufactured by Fuji Photo Film Co., Ltd. (automatic processor of a type in which the washing water was fresh water for each plate), and the same process as in Example 3 was performed to print the last plate. It was used as a sample. Example 6 In Example 2, 1- (3-chloroallyl) -3,
Instead of 7 g of 5,7-triaza-1-azoniaadamantan chloride, 7 g of 1,3,5-trishydroxyethylhexahydro-S-triazine was added to washing water, and PS processor PS-900NP was added to PS- 900
The same process as in Example 2 was performed except that V was changed to V, and the final plate was used as a printing sample. Example 7 Except that the PS processor PS-900NP was changed to PS-900V in Example 2, the same process as in Example 2 was performed, and the final plate was used as a printing sample. Examples 8 and 9 In Example 7, 7 g of compound [I] -2,
A printing sample was prepared in the same manner as in Example 7, except that 7 g of the compound [I] -3 was added. Example 10 In Example 6, 7 g of compound [I] -4 was added,
1,3,5-Trishydroxyethylhexahydro-S
-Instead of 7 g of triazine, 7 g of 3-methyl-4-isopropylphenol and 3 g of diethylene glycol
The same process as in Example 6 was performed except that 5 g was added, and the final plate was used as a printing sample.

【0023】比較例1,2 実施例1および5において、水洗部に水道水のみを使用
し、他は実施例1および5と同様な処理を行ないそれぞ
れ最後の版を印刷用試料とした。
Comparative Examples 1 and 2 In Examples 1 and 5, only tap water was used in the washing section, and the same treatments as in Examples 1 and 5 were carried out except that the last plates were used as printing samples.

【0024】これら実施例1〜10及び比較例1〜2の
印刷用試料のインキ着肉性を評価するために予め試料を
35℃85%の条件下に3日間放置した。それらの試料
を印刷機ハリスオーレリア125オフセット印刷機に取
り付け通常の方法に従って印刷を開始した。その時のイ
ンキが画像部に付着して良好な印刷物が得られるまでの
印刷枚数を表−1のインキ着肉性の欄に記した。
In order to evaluate the ink receptivity of the printing samples of Examples 1 to 10 and Comparative Examples 1 and 2, the samples were left in advance at 35 ° C. and 85% for 3 days. The samples were mounted on a printing press Harris Aurelia 125 offset printing press and printing was started according to conventional methods. The number of prints until the ink adhered to the image area at that time and a good printed matter was obtained is shown in the column of ink receptivity in Table-1.

【0025】[0025]

【表1】 [Table 1]

【0026】この結果によれば添加化合物として一般式
〔I〕、〔II〕の化合物及び/又は本発明の構成(5)
の化合物を水洗水へ添加した系(実施例1〜10)はイ
ンキ着肉性に優れていたが、水洗水を水道水のみとした
系(比較例1〜2)はインキ着肉性に劣っていた。ま
た、これら添加剤化合物は殺菌剤としての作用も有し、
水洗部の腐敗防止にも有効であった。更に実施例5、
6、7、8、9および10のPS−900Vでは、その
機構上、本発明の添加剤が加えられた水洗水は、その供
給タンクから、現像液、フィニッシングガムおよびフィ
ニッシングリンス液の希釈水としても利用されるが、そ
れらの性能への影響は全くみられなかった。
According to these results, the compounds of the general formulas [I] and [II] and / or the constitution (5) of the present invention were used as the added compounds.
The systems in which the compound of Example 1 was added to the wash water (Examples 1 to 10) were excellent in ink receptivity, but the systems in which only the wash water was tap water (Comparative Examples 1 and 2) were inferior in ink receptivity. Was there. In addition, these additive compounds also have a bactericidal action,
It was also effective in preventing spoilage in the water-washed part. Further, Example 5
In PS-900V of 6, 7, 8, 9 and 10, due to its mechanism, the washing water to which the additive of the present invention was added was used as a diluting water for the developing solution, the finishing gum and the finishing rinse solution from the supply tank. Were also used, but there was no effect on their performance.

【0027】[0027]

【発明の効果】本発明の平版印刷版の水洗水用添加剤
は、平版印刷版の印刷スタート時の着肉性の低下を防止
する効果がある。
INDUSTRIAL APPLICABILITY The additive for washing water of a lithographic printing plate according to the present invention has an effect of preventing a decrease in ink receptivity at the start of printing of the lithographic printing plate.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式〔I〕、〔II〕で示される化
合物から選ばれた少なくとも一種の化合物を添加剤とし
て含有することを特徴とする平版印刷版用水洗水。 【化1】
1. A rinsing water for a lithographic printing plate comprising at least one compound selected from compounds represented by the following general formulas [I] and [II] as an additive. [Chemical 1]
【請求項2】 下記に示される化合物群(a)から選ば
れた少なくとも一種の化合物を添加剤として含有するこ
とを特徴とする平版印刷版用水洗水。 〔化合物群(a)〕1,3,5−トリスヒドロキシエチ
ルヘキサヒドロ−S−トリアジン、1,3,5−トリス
ヒドロキシメチルヘキサヒドロ−S−トリアジン、1−
(3−クロロアリル)−3,5,7−トリアザ−1−ア
ゾニアアダマンタンクロリド、2−フェノキシエタノー
ル、α−ブロムシンナムアルデヒド、1,2−ベンズイ
ソチアゾリン、2−ベンツイミダゾリルカルバミン酸メ
チル、3−メチル−4−イソプロピルフェノール、N−
メチルジチオカルバミン酸ナトリウム、5−メチル−
1,2,4−トリアゾロ[3.4−b]ベンゾチアゾー
ル、N−ラウロイル−サルコシンナトリウム、N−ラウ
ロイル−N−メチル−β−アミノプロピオン酸ナトリウ
ム、レゾルシノール、ピロガロール、レゾルシンモノア
セテート、アルギン酸ナトリウム、エチレンビスジチオ
カルバミン酸二ナトリウム、10,10′−オキシビス
フェノキサアルシン、クレゾール、2,5−ジクロル−
4−ブロムフェノール、2−(4′−チアゾリル)−ベ
ンツイミダゾール、2,4,4′−トリクロロ−2′−
ヒドロオキシジフェニルエーテル及びそれらの塩。
2. A rinsing water for a lithographic printing plate comprising at least one compound selected from the compound group (a) shown below as an additive. [Compound Group (a)] 1,3,5-Trishydroxyethylhexahydro-S-triazine, 1,3,5-trishydroxymethylhexahydro-S-triazine, 1-
(3-chloroallyl) -3,5,7-triaza-1-azonia adamantan chloride, 2-phenoxyethanol, α-bromocinnamaldehyde, 1,2-benzisothiazoline, methyl 2-benzimidazolylcarbamate, 3-methyl- 4-isopropylphenol, N-
Sodium methyldithiocarbamate, 5-methyl-
1,2,4-triazolo [3.4-b] benzothiazole, N-lauroyl-sarcosine sodium, N-lauroyl-N-methyl-β-aminopropionate sodium, resorcinol, pyrogallol, resorcinol monoacetate, sodium alginate, Disodium ethylenebisdithiocarbamate, 10,10'-oxybisphenoxaarsine, cresol, 2,5-dichloro-
4-bromophenol, 2- (4'-thiazolyl) -benzimidazole, 2,4,4'-trichloro-2'-
Hydroxydiphenyl ether and salts thereof.
【請求項3】 該添加剤の添加量が水洗水の0.001
〜5重量%であることを特徴とする請求項1又は2に記
載の平版印刷版用水洗水。
3. The additive amount of the wash water is 0.001.
The washing water for lithographic printing plates according to claim 1 or 2, characterized in that
【請求項4】 感光性平版印刷版を画像露光した後、現
像、水洗し、さらに親水性版面保護層を印刷版上に設け
る製版方法において、水洗時の水洗水が前記一般式
〔I〕若しくは〔II〕、又は前記化合物群(a)で示
される化合物を添加剤として含有することを特徴とする
製版方法。
4. A plate-making method in which a photosensitive lithographic printing plate is imagewise exposed, then developed, washed with water, and a hydrophilic plate surface protective layer is further provided on the printing plate. [II], or a compound represented by the compound group (a) as an additive, which is a plate making method.
JP10977394A 1994-05-24 1994-05-24 Rinse water for lithographic printing plates and plate making method for lithographic printing plates Expired - Fee Related JP3361613B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10977394A JP3361613B2 (en) 1994-05-24 1994-05-24 Rinse water for lithographic printing plates and plate making method for lithographic printing plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10977394A JP3361613B2 (en) 1994-05-24 1994-05-24 Rinse water for lithographic printing plates and plate making method for lithographic printing plates

Publications (2)

Publication Number Publication Date
JPH07319171A true JPH07319171A (en) 1995-12-08
JP3361613B2 JP3361613B2 (en) 2003-01-07

Family

ID=14518868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10977394A Expired - Fee Related JP3361613B2 (en) 1994-05-24 1994-05-24 Rinse water for lithographic printing plates and plate making method for lithographic printing plates

Country Status (1)

Country Link
JP (1) JP3361613B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001051404A (en) * 1999-08-05 2001-02-23 Mitsubishi Chemicals Corp Plate making process for planographic printing plate
WO2006062005A1 (en) * 2004-12-09 2006-06-15 Tokyo Ohka Kogyo Co., Ltd. Cleaning liquid for lithography and method for resist pattern formation

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001051404A (en) * 1999-08-05 2001-02-23 Mitsubishi Chemicals Corp Plate making process for planographic printing plate
WO2006062005A1 (en) * 2004-12-09 2006-06-15 Tokyo Ohka Kogyo Co., Ltd. Cleaning liquid for lithography and method for resist pattern formation
US7795197B2 (en) 2004-12-09 2010-09-14 Tokyo Ohka Kogyo Co., Ltd. Cleaning liquid for lithography and method for resist pattern formation

Also Published As

Publication number Publication date
JP3361613B2 (en) 2003-01-07

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