JPS6022721A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS6022721A
JPS6022721A JP12872083A JP12872083A JPS6022721A JP S6022721 A JPS6022721 A JP S6022721A JP 12872083 A JP12872083 A JP 12872083A JP 12872083 A JP12872083 A JP 12872083A JP S6022721 A JPS6022721 A JP S6022721A
Authority
JP
Japan
Prior art keywords
thin film
magnetic head
core
content
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12872083A
Other languages
Japanese (ja)
Inventor
Hiromi Nakajima
中嶋 啓視
Takashi Hatauchi
隆史 畑内
Koichi Mukasa
幸一 武笠
Hiroshi Shimada
寛 島田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP12872083A priority Critical patent/JPS6022721A/en
Publication of JPS6022721A publication Critical patent/JPS6022721A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To improve the recording/reproducing efficiency of a magnetic head by using a ternary amorphous alloy essentially made of cobalt with addition of a slight amount of hafnium and niobium to form a core thin film of a thin magnetic head. CONSTITUTION:A core thin film 6 is formed on a substrate 1 via a core thin film 2, an insulated thin film 3, a conductive thin film 4 and an insulated thin film 5 respectively. The films 2 and 6 are made of a ternary amorphous alloy of Co-Hf-Nb with the contents of 91.1, 2.2 and 6.7atom% respectively. These three components are obtained through a heat treatment in a rotary magnetic field at 300-400 deg.C, at 10-20rpm, with >=100Oe intensity of magnetic field and in >=3hr respectively. As a result, the anisotropic magnetic field can be reduced.

Description

【発明の詳細な説明】 本発明は、薄膜磁気ヘッドに係り、特にそれのコア薄膜
の材質に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin film magnetic head, and particularly to the material of the core thin film thereof.

薄膜磁気記録ヘッドは、非磁性材からなる基板上に第1
のコア薄膜と、非磁性材薄膜と、第2のコア薄膜とがス
パッタリングや蒸着などによって積層状態に形成された
ものから構成されている。
A thin film magnetic recording head has a first magnetic recording head on a substrate made of a non-magnetic material.
The core thin film, a nonmagnetic material thin film, and a second core thin film are formed in a laminated state by sputtering, vapor deposition, or the like.

この薄膜磁気記録ヘッドは薄膜磁気再生ヘッドと対にな
って薄膜磁気ヘッドを構成し、例えば電子計算機の記憶
装置などに用いられる。薄膜磁気記録ヘッドにおいては
記録効率を高めるために第1および第2のコア薄膜に、
高透磁率で高い飽和磁束密度を有する軟磁性材料を用い
ることが必要である。
This thin film magnetic recording head is paired with a thin film magnetic reproducing head to form a thin film magnetic head, which is used, for example, in a storage device of an electronic computer. In a thin film magnetic recording head, in order to increase recording efficiency, the first and second core thin films are coated with
It is necessary to use soft magnetic materials with high magnetic permeability and high saturation magnetic flux density.

従来、この種磁気ヘッドの第1および第2のコア薄膜と
して例えばパーマロイなどが用いられていたが、このも
のは飽和磁束密度が低い。低飽和磁束密度であると記録
時にコア薄膜が磁気飽和してしまい、特にメタルテープ
やクロムテープなどのような飽和磁束密度の高い磁気記
録媒体に対して信号をiil!録する場合、記録効率が
悪い。
Conventionally, permalloy or the like has been used as the first and second core thin films of this type of magnetic head, but this material has a low saturation magnetic flux density. If the saturation magnetic flux density is low, the core thin film will be magnetically saturated during recording, and the signal will not be processed, especially for magnetic recording media with high saturation magnetic flux density such as metal tape or chrome tape. When recording, the recording efficiency is poor.

そのため、コイルのターン数を増やしたり、記録電流を
増大したりして記録効率の低下を抑制することが考えら
れる。しかしコイルのターン数を増やすことは薄膜磁気
ヘッドの構造上困難で、3〜5タ一ン程度に制限され、
十分な効果が得られない。一方、記録電流を増大すると
発熱量が大きくなり、断線を生じたりコア薄膜の磁性劣
化を生じる。
Therefore, it is possible to suppress the decrease in recording efficiency by increasing the number of turns of the coil or increasing the recording current. However, increasing the number of turns in the coil is difficult due to the structure of the thin film magnetic head, and is limited to 3 to 5 turns.
Not enough effect. On the other hand, when the recording current is increased, the amount of heat generated increases, causing wire breakage and magnetic deterioration of the core thin film.

本発明者らは、スパッタリングなどによって得られるア
モルファス合金薄膜について種々研究した結果、コバル
ト(G o )を主成分とし、少量のハフニウム(Hf
)とニオブ(Nb)を添加したGo−Hf−Nbの3成
分系のアモルファス合金からなる薄膜が、薄膜磁気ヘッ
ドのコア薄膜として非常に好適であることを見出した。
As a result of various studies on amorphous alloy thin films obtained by sputtering etc., the present inventors found that the main component is cobalt (G o ) and a small amount of hafnium (Hf).
) and niobium (Nb) are added to a ternary amorphous alloy of Go-Hf-Nb, which is very suitable as the core thin film of a thin-film magnetic head.

基板に結晶化ガラスを用い、コバルトディスク(直径1
01.6+nm、厚さ5mm )上にハフニウムのペレ
ットとニオブのペレット(いずれのペレットも縦Lom
m、横10mmt厚さ1ml11)を中心より放射状に
交互に配置し、ターゲット上のペレットの数を調整する
ことにより合金組成が変えられるようむこする。そして
真空度がI X、 10−’ Tor r以下の高真空
にし、アルゴンガスの雰囲気中で、高周波電力2W/a
m”でスパッタリングを行な0、基板上にコバルトを主
成分とするGo−Hf−Nbの3成分系のアモルファス
合金薄膜を作成することができる。このようにして作成
された各種組成の合金試料が後述の各特性試験に使用さ
れる。
Using crystallized glass as the substrate, a cobalt disk (diameter 1
Hafnium pellets and niobium pellets (both pellets are vertically
The pellets are arranged alternately radially from the center, and the alloy composition can be changed by adjusting the number of pellets on the target. Then, the degree of vacuum was set to a high vacuum of less than I
By performing sputtering at 0 m'', it is possible to create a three-component Go-Hf-Nb amorphous alloy thin film with cobalt as the main component on the substrate. Alloy samples of various compositions created in this way is used for each characteristic test described below.

第1図は、後記の合金組成表において合金中のNb含有
率Yが常に6.7原子%になるようにして、Hf含有率
Xを種々変えた場合の磁気特性図である。
FIG. 1 is a magnetic characteristic diagram when the Hf content X is varied while the Nb content Y in the alloy is always 6.7 atomic % in the alloy composition table described later.

合金組成表 なお図中において曲線Bsは飽和磁束密度9曲線μeは
周波数500KHzにおける困難軸方向の透磁率2曲線
Heは困難軸方向の保磁力である。
In the alloy composition table, the curve Bs is the saturation magnetic flux density; the curve μe is the magnetic permeability in the hard axis direction at a frequency of 500 KHz; the curve He is the coercive force in the hard axis direction.

この図から明らかなように、Hf含有率が0原子%のC
o −N b 2成分系合金は、Bsは高いが、Heが
高過ぎ、Heが低い。これにHfを少量添加するとHe
が極端に下がり、Heは逆に高くなる。なお、Hfの含
有率がある程度以上になると、Heは高くなり、Heは
低くなる。一方、Bsは極端ではないがHfの含有率の
増大とともに低下する傾向にある。
As is clear from this figure, C with an Hf content of 0 atomic %
The o -N b binary alloy has high Bs, but too high He and low He. When a small amount of Hf is added to this, He
decreases extremely, while He increases. Note that when the content of Hf exceeds a certain level, He becomes high and He becomes low. On the other hand, Bs tends to decrease as the Hf content increases, although it is not extreme.

このような特性傾向のなかで、Bsを高く維持したまま
、Heを下げ、高μeにするためには、Hfの含有率X
を1原子%以上でがっ5原子%未満の範囲、好ましくは
1.5〜3原子%の範囲に規制する必要がある。このこ
とはNb含有率Yを若干変化させても同様である。
Given these characteristic trends, in order to lower He and increase μe while maintaining Bs high, the Hf content X
It is necessary to limit the content to a range of 1 atomic % or more and less than 5 atomic %, preferably 1.5 to 3 atomic %. This holds true even if the Nb content Y is slightly changed.

第2図は、前記合金組成表において合金中のHf含有率
Xが常に2.2原子%になるようにして、Nb含有率Y
を種々変えた場合の磁気特性図である。
Figure 2 shows that in the alloy composition table, the Hf content X in the alloy is always 2.2 at%, and the Nb content Y
It is a magnetic characteristic diagram when changing variously.

この図から明らかなように、Nb含有率が0原子%のC
o−Hf2成分系合金も前述と同様に、Bsは高いが、
Hcが高過ぎ、Heが低い。これにNbを少量添加する
ことによりHeが極端に下がり、Heが逆に高くなる。
As is clear from this figure, C with a Nb content of 0 at%
As mentioned above, the o-Hf binary alloy also has high Bs, but
Hc is too high and He is low. By adding a small amount of Nb to this, the He content decreases extremely, and on the contrary, the He content increases.

なお、Nbの含有率がある程度以上になると−Heは高
くなり、Heは低くなる。一方、Bsは極端ではないが
Nbの含有率の増大とともに低下する傾向がある。
Note that when the Nb content exceeds a certain level, -He becomes high and He becomes low. On the other hand, Bs tends to decrease as the Nb content increases, although this is not extreme.

このような特性傾向のなかで、Bsを高く維持したまま
、Heを下げ、高μeにするためには、Nbの含有率Y
を4〜8原子%、好ましくは4〜6原子%の範囲に規制
する必要がある。このことはHf含有率Xを若干変化さ
せても同様である。
Given these characteristic trends, in order to lower He and increase μe while maintaining Bs high, the Nb content Y
It is necessary to control the content within the range of 4 to 8 atom %, preferably 4 to 6 atom %. This holds true even if the Hf content X is slightly changed.

本発明に係るG o −Hf −N bの3成分系アモ
ルファス合金は誘導磁気異方性が出やす(Xため、高周
波特性を考慮して、アモルファス合金の磁化困難軸方向
をコア薄膜の動作方向に向けることができる。ところで
G o −Hf −N bの3成分系合金は、スパッタ
リング直後の薄膜の異方性磁界Hkは大きい。この異方
性磁界を小さくする手段について種々検討した結果、コ
ア薄膜として形成された前記3成分系のアモルファス合
金薄膜を回転磁界中で熱処理する方法が有効であること
を見出した。この回転磁界中の熱処理で、温度は300
〜400(℃)、回転速度は10〜2Q (r、p、m
、)、磁界の強さは100(Oe)以上、処理時間は3
時間以上が適当である。例えば温度を350(”C)、
回転速度を10 (r、p、m、)磁界の強さを100
(Oe)、処理時間を3時間に設定して、スパッタリン
グによって形成したコア薄膜を処理すれば、異方性磁界
Hkを約4(Oe)程度まで下げることができる。
The three-component amorphous alloy of Go - Hf - N b according to the present invention tends to exhibit induced magnetic anisotropy (X). By the way, in the case of a ternary alloy of G o -Hf -Nb, the anisotropic magnetic field Hk of the thin film immediately after sputtering is large.As a result of various studies on means to reduce this anisotropic magnetic field, we found that the core We have found that it is effective to heat-treat the three-component amorphous alloy thin film formed as a thin film in a rotating magnetic field.
~400 (℃), rotation speed is 10~2Q (r, p, m
), magnetic field strength is 100 (Oe) or more, processing time is 3
More than an hour is appropriate. For example, if the temperature is 350 ("C),
Rotation speed: 10 (r, p, m,) Magnetic field strength: 100
(Oe), by setting the processing time to 3 hours and treating the core thin film formed by sputtering, the anisotropic magnetic field Hk can be lowered to about 4 (Oe).

第3図は、本発明の実施例に係る薄膜磁気記録ヘッドの
一部を断面にした斜視図である。ガラスやシリコンなど
の非磁性材からなる基板1の上には、最初節1のコア薄
yA2が形成され、その上に非磁性材の絶縁#膜3.心
電薄膜4ならびに絶縁薄膜5を介して第2のコア薄膜6
が形成される。
FIG. 3 is a partially sectional perspective view of a thin film magnetic recording head according to an embodiment of the present invention. On a substrate 1 made of a non-magnetic material such as glass or silicon, a thin core yA2 with a first node 1 is formed, and an insulating # film 3 made of a non-magnetic material is formed thereon. The second core thin film 6 is passed through the electrocardiogram thin film 4 and the insulating thin film 5.
is formed.

これら第1のコア薄[2,絶縁薄膜3.導電薄膜4、絶
縁薄[5ならびに第2のコア薄膜6は、スパッタリング
などの成膜技術によって順次所定の厚さに形成される。
These first core thin films [2, insulating thin films 3. The conductive thin film 4, the insulating thin film 5, and the second core thin film 6 are sequentially formed to a predetermined thickness by a film forming technique such as sputtering.

なお、4a、4bは外部接続用端子部である。Note that 4a and 4b are terminal portions for external connection.

前記第1のコア薄膜2ならびに第2のコア薄膜6はGo
−Hf−Nbの3成分系アモルファス合金薄膜からなり
Goの含有率は91.1原子%。
The first core thin film 2 and the second core thin film 6 are Go
It is made of a three-component amorphous alloy thin film of -Hf-Nb and has a Go content of 91.1 at%.

Hfの含有率は2.2原子%、Nbの含有率は6.7原
子%であり、前述の条件下において回転磁界中で熱処理
される。
The Hf content is 2.2 atomic %, the Nb content is 6.7 atomic %, and heat treatment is performed in a rotating magnetic field under the above-mentioned conditions.

本発明は前述のように薄膜磁気ヘッドのコア薄膜を、コ
バルトを主成分とし、それにハフニウムとニオブを少量
添加した3成分系アモルファス合金で構成し7たことを
特徴とするものである。この3成分系アモルファス合金
は、高い飽和磁束密度と透磁率とを有しているから、磁
気ヘッドの記録効率および再生効率を高めることができ
る。
As described above, the present invention is characterized in that the core thin film of the thin-film magnetic head is composed of a three-component amorphous alloy containing cobalt as a main component and to which small amounts of hafnium and niobium are added. Since this three-component amorphous alloy has high saturation magnetic flux density and magnetic permeability, it is possible to improve the recording efficiency and reproduction efficiency of the magnetic head.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係るG o −Hf −N b系アモ
ルファス合金中のHf含有率と各種磁気特性との関係を
示す特性図、第2図は前記合金中のNb含有率と各種磁
気特性との関係を示す特性図、第3図は本発明の実施例
に係る薄膜磁気ヘッドの一部を断面にした斜視図である
。 1・・・基板、2・・・第1のコア薄膜、3・・・絶縁
薄膜、4・・・導電薄膜、5・・・M縁薄膜、6・・・
第2のコア薄膜。 第2図 Nb含有キ(at%) 第3図
FIG. 1 is a characteristic diagram showing the relationship between the Hf content and various magnetic properties in the Go-Hf-Nb-based amorphous alloy according to the present invention, and FIG. 2 is a characteristic diagram showing the relationship between the Nb content in the alloy and various magnetic properties. FIG. 3 is a partially sectional perspective view of a thin film magnetic head according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Substrate, 2... First core thin film, 3... Insulating thin film, 4... Conductive thin film, 5... M edge thin film, 6...
Second core thin film. Figure 2 Nb content (at%) Figure 3

Claims (1)

【特許請求の範囲】 (1)非磁性材からなる基板上に第1のコア薄膜と非磁
性材薄膜と、第2のコア薄膜とが積層状態で形成される
薄膜磁気ヘッドにおいて、前記コア薄膜が、コバルトを
主成分とし、少量のハフニウムとニオブとを添加した3
成分系のアモルファス合金で構成されていることを特徴
とする薄膜磁気ヘッド。 (2、特許請求の範囲@(1)項記載において、前記ハ
フニウムの含有率がIM子%以上でかつ5原子%未満、
ニオブの含有率が4原子%以上でかつ8原子%以下に規
制されていることを特徴とする薄膜磁気ヘッド。 (3)特許請求の範囲第(1)項記載において、前記コ
ア薄膜として形成されたコバルト−ハフニウム−ニオブ
の3成分系アモルファス合金薄膜が回転磁界中で熱処理
されたことを特徴とする薄膜磁気ヘッド。
Scope of Claims: (1) In a thin film magnetic head in which a first core thin film, a nonmagnetic material thin film, and a second core thin film are formed in a laminated state on a substrate made of a nonmagnetic material, the core thin film However, 3 contains cobalt as the main component and small amounts of hafnium and niobium are added.
A thin film magnetic head characterized by being composed of an amorphous alloy. (2. Claims@(1), wherein the hafnium content is IM % or more and less than 5 atomic %,
A thin film magnetic head characterized in that the content of niobium is regulated to be 4 atomic % or more and 8 atomic % or less. (3) A thin film magnetic head according to claim (1), characterized in that the thin film of a ternary amorphous alloy of cobalt-hafnium-niobium formed as the core thin film is heat-treated in a rotating magnetic field. .
JP12872083A 1983-07-16 1983-07-16 Thin film magnetic head Pending JPS6022721A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12872083A JPS6022721A (en) 1983-07-16 1983-07-16 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12872083A JPS6022721A (en) 1983-07-16 1983-07-16 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS6022721A true JPS6022721A (en) 1985-02-05

Family

ID=14991757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12872083A Pending JPS6022721A (en) 1983-07-16 1983-07-16 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS6022721A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62282879A (en) * 1986-05-28 1987-12-08 日立金属株式会社 Method of centering end surface of cylindrical body
EP0373793A2 (en) * 1988-12-14 1990-06-20 Hewlett-Packard Company Lift-off process for patterning shields in thin magnetic recording heads

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62282879A (en) * 1986-05-28 1987-12-08 日立金属株式会社 Method of centering end surface of cylindrical body
EP0373793A2 (en) * 1988-12-14 1990-06-20 Hewlett-Packard Company Lift-off process for patterning shields in thin magnetic recording heads

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