JPS60226428A - Light transmission path - Google Patents
Light transmission pathInfo
- Publication number
- JPS60226428A JPS60226428A JP59081587A JP8158784A JPS60226428A JP S60226428 A JPS60226428 A JP S60226428A JP 59081587 A JP59081587 A JP 59081587A JP 8158784 A JP8158784 A JP 8158784A JP S60226428 A JPS60226428 A JP S60226428A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- oxide
- high refractive
- light transmission
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C13/00—Fibre or filament compositions
- C03C13/04—Fibre optics, e.g. core and clad fibre compositions
- C03C13/045—Silica-containing oxide glass compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/28—Doped silica-based glasses containing non-metals other than boron or halide containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/31—Doped silica-based glasses containing metals containing germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
- C03C2203/42—Gas-phase processes using silicon halides as starting materials
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】
(#業主の利用分野)
本発明は光通信に用いる石英ガラス系光伝送路の改良に
関する。DETAILED DESCRIPTION OF THE INVENTION (#Field of Application for Business Owners) The present invention relates to improvements in silica glass optical transmission lines used in optical communications.
(従 来 技 術)
一般に1通信用の光伝送路(光ファイバ)は高純度の石
英ガラスを主成分としているが、そのコア部には屈折率
調整用(高屈折率用)の成分として酸化ゲルマニウムが
ドープされており、場合により酸化リンや醸化ホウ素が
ドープされた石英ガラスも用いられている。(Conventional technology) Generally, an optical transmission line (optical fiber) for communication uses high-purity silica glass as its main component, but its core contains oxidized as a component for adjusting the refractive index (for high refractive index). Quartz glass doped with germanium and, in some cases, phosphorus oxide or boron oxide is also used.
しかしこれらガラスの場合、そのガラス中に酸されて光
ファイバの伝送損失増を招起することがすでに指摘され
ている。However, in the case of these glasses, it has already been pointed out that acidification occurs in the glass, causing an increase in the transmission loss of the optical fiber.
そのため光フアイバ製造時の各種処理条件を改善する試
みがなされているが、これには高度の技術が要求され、
製造難度をともなうのが実状である。For this reason, attempts have been made to improve various processing conditions during optical fiber manufacturing, but this requires advanced technology.
The reality is that manufacturing is difficult.
(発明の目的)
本発明は上記の問題点に艦み、光伝送路の高屈折率部を
構成するガラス組成を改良することにより、長期的に伝
送特性の安定した信頼性の高い光伝送路を提供しようと
するものである。(Object of the Invention) The present invention addresses the above-mentioned problems and improves the composition of the glass constituting the high refractive index portion of the optical transmission line, thereby creating a highly reliable optical transmission line with stable transmission characteristics over the long term. This is what we are trying to provide.
(発明の構成)
本発明に係る光伝送路は、光透過用の高屈折率部が耐化
亜鉛0.0G1〜5重量%、酸化ゲルマニウム0〜15
重量%、鹸化リン0〜5重量%、酸化ケイ素80〜81
1.1199ij量%からなるガラスで構成されている
ことを特徴としている。(Structure of the Invention) In the optical transmission line according to the present invention, the high refractive index portion for light transmission is made of zinc resistant 0.0G1 to 5% by weight and germanium oxide 0 to 15% by weight.
% by weight, saponified phosphorus 0-5% by weight, silicon oxide 80-81
It is characterized by being made of glass consisting of 1.1199ij amount %.
(実 施 例)
以下本発明の実施例につき1図面等を参照して図におい
てlは光伝送路(光ファイバ)、2はその高屈折率部(
コア)、3はその低屈折率部(クラッド)である。(Example) In the following, with reference to the drawings and the like, l represents an optical transmission line (optical fiber), and 2 represents a high refractive index portion thereof (
3 is its low refractive index portion (cladding).
上記高屈折率部2を構成しているガラスは既述の各組成
を所定の範囲で含有し、低屈折率部3は純石英ガラスか
、もしくはフッ素ドープト石英からなる。The glass constituting the high refractive index section 2 contains each of the aforementioned compositions within a predetermined range, and the low refractive index section 3 is made of pure silica glass or fluorine-doped quartz.
高屈折率部2が酸化亜鉛を含有している上記光伝送路l
の場合、後述の具体例で明らかなように伝送損失増が抑
制できるのであり、これは酸化亜鉛が添加されているこ
とにより酸素欠陥を生じにくいガラス構造をとるためと
推定できる。The optical transmission line l in which the high refractive index portion 2 contains zinc oxide
In the case of , the increase in transmission loss can be suppressed, as will be clear from the specific examples described below, and this can be presumed to be due to the addition of zinc oxide, which creates a glass structure in which oxygen defects are less likely to occur.
本来、ガラス中の欠陥は量的に多くなく、高屈折率部2
の酸化亜鉛の量が微量であっても上記効果は得られるが
、0.001重篭%以下の酸化亜鉛量ではその効果が顕
著でなく、シたがって高屈折率部2における酸化亜鉛量
は0.001重量%以上がよい。Originally, there are not many defects in glass, and the high refractive index part 2
Although the above effect can be obtained even if the amount of zinc oxide in the high refractive index region 2 is very small, the effect is not noticeable when the amount of zinc oxide is less than 0.001% by weight. The content is preferably 0.001% by weight or more.
酸化亜鉛量が5重量%以上になると高屈折率部2のガラ
ス安定性が損なわれるので、これは5重量%以下がよい
。If the amount of zinc oxide is 5% by weight or more, the glass stability of the high refractive index portion 2 will be impaired, so it is preferably 5% by weight or less.
高屈折率部2がZ n OS r O2の二成分ガラス
系で構成されることもあり、この場合、低屈折率部3は
前述したフッ素ドープト石英により構成される。The high refractive index section 2 may be composed of a binary glass system of ZnOSrO2, and in this case, the low refractive index section 3 is composed of the aforementioned fluorine-doped quartz.
屈折率を高める目的で上記二成分ガラス系の高屈折率部
2に酸化ゲルマニウムが添加されていてもよく、この三
成分ガラスにおいても酸化亜鉛の効果は失われない。Germanium oxide may be added to the high refractive index portion 2 of the two-component glass system for the purpose of increasing the refractive index, and the effect of zinc oxide is not lost even in this three-component glass.
この際の酸化ゲルマニウム量につき、特にその上限を規
定する理由はないが、実用的には同量を15重量%以下
とするのが望ましい。Although there is no reason to specify an upper limit to the amount of germanium oxide in this case, it is practically desirable that the same amount be 15% by weight or less.
さらに高屈折率部2がZnO−5iO2系、あるいはZ
n OG e OS r 02系からなるとき、これ
らに酸化リン(P2O3)が添加されてもよい。Furthermore, the high refractive index portion 2 is made of ZnO-5iO2 system or Z
When consisting of the n OG e OS r 02 system, phosphorous oxide (P2O3) may be added to these.
酸化リンはこれの添加量が前記酸化亜鉛量と同等または
それ以下であるとき、酸化亜鉛添加の効果が失われない
。When the amount of phosphorus oxide added is equal to or less than the amount of zinc oxide, the effect of adding zinc oxide is not lost.
高屈折率部2における酸化リンの含有量が多すぎるとき
、ガラスの耐候性が低下するので望ましくなく、当該酸
化リンの含有量は5重量%以下がよい。If the content of phosphorus oxide in the high refractive index portion 2 is too large, the weather resistance of the glass will deteriorate, which is undesirable, and the content of phosphorus oxide is preferably 5% by weight or less.
つぎに本発明のより具体的な例を説明する。Next, a more specific example of the present invention will be explained.
具体例1
四塩化ケイ素の液体をアルゴンガスによりl<ブリング
して気化した原料ガスと、アルゴンガスにより希釈した
ジメチル亜鉛ガスとを酸水素喪中に導入してこれらを酸
化・加水分解し、この際の反応により生成された酸化物
微粒子をターゲy)(石英棒)の軸方向に堆積させてコ
ア用の多孔質ガラス母材を形成した。Specific example 1 Raw material gas obtained by bubbling silicon tetrachloride liquid with argon gas and dimethyl zinc gas diluted with argon gas are introduced into an oxyhydrogen atmosphere to oxidize and hydrolyze them. The oxide fine particles produced by the reaction were deposited in the axial direction of the target (quartz rod) to form a porous glass base material for the core.
その後、多孔質ガラス母材を電気炉中において1200
℃の温度にて焼結し、透明なガラス母材とした。Thereafter, the porous glass base material was placed in an electric furnace for 1200 min.
It was sintered at a temperature of °C to form a transparent glass base material.
上記では母材中の酸化亜鉛の含有量が0〜5重量%範囲
内で変化させることができた。In the above, the content of zinc oxide in the base material could be varied within the range of 0 to 5% by weight.
つぎに透明ガラス母材の外周には、火炎加水分解法によ
り石英系としたクラッド用の多孔質ガラス層を形成し、
これを六フッ化イオウ濃度1モル%のヘリウムガス雰囲
気中にて焼結することにより当該ガラス層をフッ素含有
の低屈折率ガラスとした。Next, on the outer periphery of the transparent glass base material, a quartz-based porous glass layer for cladding is formed using a flame hydrolysis method.
By sintering this in a helium gas atmosphere with a sulfur hexafluoride concentration of 1 mol %, the glass layer was made into a fluorine-containing low refractive index glass.
こうして得られた光フアイバ母材を既知の紡糸手段(加
熱延伸)により紡糸して光ファイバを製造した。The optical fiber preform thus obtained was spun using known spinning means (heat drawing) to produce an optical fiber.
この光ファイバを水素雰囲気中にて100℃、24時間
加熱し、これの水酸基の発生の有無を測定すべき加速試
験を行なったところ、0.8〜1.5pmの波長範囲に
おいては伝送損失の変化がみられなかった。When this optical fiber was heated in a hydrogen atmosphere at 100°C for 24 hours and an accelerated test was conducted to measure the generation of hydroxyl groups, it was found that the transmission loss was low in the wavelength range of 0.8 to 1.5 pm. No change was observed.
具体例2
コア形成用バーナとクラッド形成用バーナ゛とを用いた
既知のWAD法におい乙コア形成用バーナには四塩化ケ
イ素、四塩化ゲルマニウム、ジメチル亜鉛を供給すると
ともにクラッド形成用バーすには四塩化ケイ素、ジメチ
ル亜鉛を供給して多孔質ガラス母材を作製し、これを透
明ガラス化した後、該透明ガラス母材を具体例1と同様
に紡糸して光ファイバを得た。Specific Example 2 In a known WAD method using a core forming burner and a cladding burner, silicon tetrachloride, germanium tetrachloride, and dimethyl zinc are supplied to the core forming burner, and the cladding burner is supplied with silicon tetrachloride, germanium tetrachloride, and dimethyl zinc. Silicon tetrachloride and dimethylzinc were supplied to prepare a porous glass preform, which was made into transparent glass, and then the transparent glass preform was spun in the same manner as in Example 1 to obtain an optical fiber.
この光ファイバの場合、コアが酸化ゲルマニウムの分布
によりグレーテッド型の屈折率分布を呈しており、その
コアガラス中には平均濃度として0.5重量%の酸化亜
鉛が含まれたいた。In the case of this optical fiber, the core exhibited a graded refractive index distribution due to the distribution of germanium oxide, and the core glass contained zinc oxide at an average concentration of 0.5% by weight.
クラッドは低屈折率の高純度石英ガラスからなるもので
あった。The cladding was made of high purity quartz glass with a low refractive index.
上記光ファイバを具体例1と同様、水素中にて100℃
、24時間加熱したところ、この場合も伝送損失の増加
が認められなかった。The above optical fiber was heated in hydrogen at 100°C as in Example 1.
When heated for 24 hours, no increase in transmission loss was observed in this case as well.
(発明の効果)
以上説明した通り、本発明に係る光伝送路は単に石英系
であるだけでなく、その光透過用の高屈折率部が0.0
01〜5重量%の酸化亜鉛を含有しているので、長期的
に伝送特性の安定した信頼性の高いものとなる。(Effects of the Invention) As explained above, the optical transmission line according to the present invention is not only made of quartz, but also has a high refractive index part for light transmission of 0.0
Since it contains 01 to 5% by weight of zinc oxide, it has stable transmission characteristics and high reliability over a long period of time.
図面は本発明に係る光伝送路の断面図である。 l−拳・光伝送路 2・壷・高屈折率部 3・−−低屈折率部 代理人 弁理士 斎 藤 義 雄 The drawing is a sectional view of an optical transmission line according to the present invention. l-fist/optical transmission line 2. Urn, high refractive index part 3.--Low refractive index part Agent: Patent Attorney Yoshio Sai Fuji
Claims (1)
、#I化ゲルマニウム0〜15重量%、酸化リンθ〜5
重量%、a化ケ4 * 80〜!19J911重景%か
らなるガラスで構成されている光伝送路。The high refractive index part for light transmission is 0.001 to 5% zinc saponide.
, germanium #I 0 to 15% by weight, phosphorus oxide θ to 5
Weight %, a 4 * 80~! An optical transmission line made of glass made of 19J911%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59081587A JPS60226428A (en) | 1984-04-23 | 1984-04-23 | Light transmission path |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59081587A JPS60226428A (en) | 1984-04-23 | 1984-04-23 | Light transmission path |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60226428A true JPS60226428A (en) | 1985-11-11 |
JPH0525821B2 JPH0525821B2 (en) | 1993-04-14 |
Family
ID=13750447
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59081587A Granted JPS60226428A (en) | 1984-04-23 | 1984-04-23 | Light transmission path |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60226428A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5324539A (en) * | 1991-04-15 | 1994-06-28 | Semiconductor Process Laboratory | Method for forming CVD thin glass films |
-
1984
- 1984-04-23 JP JP59081587A patent/JPS60226428A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5324539A (en) * | 1991-04-15 | 1994-06-28 | Semiconductor Process Laboratory | Method for forming CVD thin glass films |
Also Published As
Publication number | Publication date |
---|---|
JPH0525821B2 (en) | 1993-04-14 |
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