JPS60221562A - 耐摩耗膜 - Google Patents

耐摩耗膜

Info

Publication number
JPS60221562A
JPS60221562A JP59076927A JP7692784A JPS60221562A JP S60221562 A JPS60221562 A JP S60221562A JP 59076927 A JP59076927 A JP 59076927A JP 7692784 A JP7692784 A JP 7692784A JP S60221562 A JPS60221562 A JP S60221562A
Authority
JP
Japan
Prior art keywords
wear
film
silicon
substrate
silicon carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59076927A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6252028B2 (enExample
Inventor
Kazuhisa Matsumoto
和久 松本
Zen Sadai
禪 定井
Kazuo Ogata
一雄 緒方
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59076927A priority Critical patent/JPS60221562A/ja
Publication of JPS60221562A publication Critical patent/JPS60221562A/ja
Publication of JPS6252028B2 publication Critical patent/JPS6252028B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0084—Producing gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electronic Switches (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
JP59076927A 1984-04-17 1984-04-17 耐摩耗膜 Granted JPS60221562A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59076927A JPS60221562A (ja) 1984-04-17 1984-04-17 耐摩耗膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59076927A JPS60221562A (ja) 1984-04-17 1984-04-17 耐摩耗膜

Publications (2)

Publication Number Publication Date
JPS60221562A true JPS60221562A (ja) 1985-11-06
JPS6252028B2 JPS6252028B2 (enExample) 1987-11-02

Family

ID=13619349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59076927A Granted JPS60221562A (ja) 1984-04-17 1984-04-17 耐摩耗膜

Country Status (1)

Country Link
JP (1) JPS60221562A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0254754A (ja) * 1988-08-19 1990-02-23 Agency Of Ind Science & Technol 傾斜組成制御膜の形成法
JP4733890B2 (ja) * 1999-10-13 2011-07-27 Ａｇｃセラミックス株式会社 ＳｉＯ２を主成分とする膜の成膜方法
KR101287694B1 (ko) * 2012-02-16 2013-08-07 신크론 컴퍼니 리미티드 투광성 경질 박막

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102400101A (zh) * 2010-09-09 2012-04-04 鸿富锦精密工业（深圳）有限公司 镀膜件及其制备方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0254754A (ja) * 1988-08-19 1990-02-23 Agency Of Ind Science & Technol 傾斜組成制御膜の形成法
JP4733890B2 (ja) * 1999-10-13 2011-07-27 Ａｇｃセラミックス株式会社 ＳｉＯ２を主成分とする膜の成膜方法
KR101287694B1 (ko) * 2012-02-16 2013-08-07 신크론 컴퍼니 리미티드 투광성 경질 박막
WO2013121552A1 (ja) 2012-02-16 2013-08-22 株式会社シンクロン 透光性硬質薄膜
US9422620B2 (en) 2012-02-16 2016-08-23 Shincron Co., Ltd. Translucent hard thin film

Also Published As

Publication number Publication date
JPS6252028B2 (enExample) 1987-11-02

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