JPS6022101A - Antireflection film for plastic optical parts - Google Patents
Antireflection film for plastic optical partsInfo
- Publication number
- JPS6022101A JPS6022101A JP58130522A JP13052283A JPS6022101A JP S6022101 A JPS6022101 A JP S6022101A JP 58130522 A JP58130522 A JP 58130522A JP 13052283 A JP13052283 A JP 13052283A JP S6022101 A JPS6022101 A JP S6022101A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- antireflection film
- plastic
- optical
- plastic optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔鈍明の目的″〕本発明ね、グロジェクシッンデレビ、
ビデオカメラ、スチルカメラなどの光学系に使用さnる
プラスチック製光学部品の反射防止膜に関するものであ
って、その目的とするところは、耐久性および耐熟性に
すぐれ、硬度が高く、かつ、量産に適したプラスチック
製光学部品の反射防止膜を提供することにある。[Detailed description of the invention] [The purpose of dullness''] This invention, Grojeksindelevy,
It relates to anti-reflection coatings for plastic optical parts used in optical systems such as video cameras and still cameras, and its purpose is to have excellent durability and aging resistance, high hardness, and The purpose of the present invention is to provide an antireflection coating for plastic optical components that is suitable for mass production.
光学部品に祉無機ガラスが多く使用されてきたが、近年
、軽量で加工が容易であシ、かつ量産に適している点で
すぐれているプラスチックが光学部品の素材として用い
られるようになってきた。ところで、プラスチックレン
ズなどのプラスチック製光学部品社無機ガラスと同様r
c、表面での光の反射が大きく分光透過特性が悪いため
に、無機ガラスの表向に形成される反射防止膜と同様な
反射防止膜をプラスチックの表面に形成することが行な
われる。Inorganic glass has been widely used for optical components, but in recent years plastics have come to be used as materials for optical components because they are lightweight, easy to process, and suitable for mass production. . By the way, similar to inorganic glass, plastic optical components such as plastic lenses
c. Since light reflection on the surface is large and spectral transmission characteristics are poor, an antireflection film similar to the antireflection film formed on the surface of inorganic glass is formed on the surface of plastic.
以下、従来のプラスチック製光学部品の反射防止膜を第
1図について説明する。同図において1はプラスチック
基板、2は弗化マグネシウム(MfF、 )よシなる反
射防止膜である。この反射防止膜2は一般には真空蒸着
法によって形成されるが、プラスチックは流動温度、熱
変形温度が低いため、〔例えばメタクリル樹脂(アクリ
ベラ)VH三菱レしヨンL K、商品名)で熱変形温度
100℃、流動温度170℃)、無機ガラス基板に蒸°
着膜を形成する時のような基板加熱(通常200℃〜4
oo℃)を行なうことができない。そのためにり従来は
、50℃以下の低温でプラスチックの表面に弗化マグネ
シウムの反射防止膜を形成していたが、仁の低温で形成
された反射防止膜は耐久性、耐熱性および硬度が非常に
低い。そこで耐久性、耐熱性および硬度を向上させるた
めに基板を50℃〜80℃に加熱して反射防止膜を形成
する方法やRPイオンブレーティング法を用いて反射防
止膜を形成する方法が行なわれているが、これらの方法
による反射防止膜祉、第2図に示すようなりラック4が
反射防止膜全体に亘って生ずることがある。このような
りラックは耐久性、特に経時変化による反射防止膜のく
もりおよび剥離の原因になるので好ましくない。また、
これらの方法は反射防止膜の形成条件を一定にしてプラ
スチックの表面の物性的状態を均一に管理するのが困難
なため量産に適しない。Hereinafter, a conventional antireflection coating for plastic optical components will be explained with reference to FIG. In the figure, 1 is a plastic substrate, and 2 is an antireflection film made of magnesium fluoride (MfF). This anti-reflection film 2 is generally formed by a vacuum evaporation method, but since plastic has a low flow temperature and heat deformation temperature, it can be thermally deformed using methacrylic resin (Acrybella VH Mitsubishi Rayon L K, trade name). Temperature: 100°C, flow temperature: 170°C), vaporized onto an inorganic glass substrate.
Substrate heating such as when forming a deposit (usually 200°C to 4°C)
oo°C) cannot be carried out. For this reason, in the past, an anti-reflective film of magnesium fluoride was formed on the surface of plastic at a low temperature of 50 degrees Celsius or less, but the anti-reflective film formed at a low temperature of 30 degrees is extremely durable, heat resistant, and hard. low. Therefore, in order to improve durability, heat resistance, and hardness, there are methods of forming an antireflection film by heating the substrate to 50°C to 80°C and methods of forming an antireflection film using the RP ion blating method. However, in the antireflection film produced by these methods, a rack 4 may be formed over the entire antireflection film as shown in FIG. Such a rack is undesirable because it causes problems in durability, especially clouding and peeling of the antireflection film due to changes over time. Also,
These methods are not suitable for mass production because it is difficult to maintain uniform formation conditions for the antireflection film and to uniformly control the physical properties of the plastic surface.
本発明は、上記従来技術のもつ以上のような問題点を解
決することを意図するものであって、クラックの発生が
なく、耐久性および耐熱性にすぐれ、硬度が高く、かつ
、量産に適したプラスチック製光学部品の反射防止膜を
提供することを目的とするものである。The present invention is intended to solve the above-mentioned problems of the prior art. The object of the present invention is to provide an antireflection coating for plastic optical components.
〔発明の構成〕本発明のプラスチック製光学部品の反射
防止膜は、プラスチック製光学部品の表面に二酸化ケイ
素(sio2)よシなる第1層が形成さj、該第1層の
上に弗化マグネシウム(Mnrt )よりなる第2層が
形成されて反射防止膜を構成する構造において前記第1
層および第d1、設計基準波長をλ0としたとき、各層
の光学的膜厚N1 dlおよびN、d、が設計基準波長
λ。[Structure of the Invention] The antireflection coating for a plastic optical component of the present invention includes a first layer made of silicon dioxide (SIO2) formed on the surface of the plastic optical component, and a fluoride film formed on the first layer. In the structure in which a second layer made of magnesium (Mnrt) is formed to constitute an antireflection film, the first layer
When the design standard wavelength of the layer and d1 is λ0, the optical thickness N1 dl of each layer and N, d are the design standard wavelength λ.
に対し、
o、 o s oλ。<’N+ ’t < CL 52
0λ00.125λo <Nt dt <α375λ。For o, o s oλ. <'N+ 't < CL 52
0λ00.125λo <Nt dt <α375λ.
の範囲内にあることを特徴とするものであって、前記第
1層および第2層はプラスチック製光学部品を70℃〜
100℃に加熱した状態で真空蒸着法により、あるいは
その他の方法によって形成される。The first layer and the second layer are characterized in that the temperature of the plastic optical component is within the range of 70°C to 70°C.
It is formed by vacuum evaporation in a state heated to 100° C. or by other methods.
本発明において、第1層の光学的膜厚N、 dlをo、
o s oλ0 <Mldt <o、s 20λ。と
したのは、反射防止膜のクラック防止と耐熱性向上のた
めであシ、第1層の光学的膜厚が、o、osoλ。以下
では、第2層を形成した後クラックが発生し易く、また
0、520λ0以上では反射防止の効果と光学部品の形
状変動の点から好ましくないからである。また、第2層
の光学的膜厚n、 ’tをQ、125λo <It d
l <α575λ。としたの紘第1層と第2層とによっ
て反射防止の効果をもたせ −るときに、第1層の光学
的膜厚の相違にょシ反射防止の特性に変動があっても第
2層の光学的膜厚を0.125λ0から0.575λ0
の範囲内で適当な値を選択することによって実用上必要
な特性をもつ反射防止膜をうろことができるからである
。なお、以上の数字は実験によって確認したものである
。In the present invention, the optical thickness N, dl of the first layer is o,
o s oλ0 <Mldt <o, s 20λ. The reason for this is to prevent cracks in the antireflection film and improve heat resistance, and the optical thickness of the first layer is o, osoλ. This is because cracks are likely to occur after the second layer is formed, and a thickness of 0.520λ0 or more is not preferable from the viewpoint of antireflection effect and shape variation of the optical component. Also, the optical thickness of the second layer n, 't is Q, 125λo <It d
l < α575λ. When providing an antireflection effect using the first and second layers, even if there is a variation in the antireflection properties due to a difference in the optical thickness of the first layer, the second layer's Optical film thickness from 0.125λ0 to 0.575λ0
This is because by selecting an appropriate value within the range of , it is possible to obtain an antireflection film with practically necessary characteristics. Note that the above numbers were confirmed through experiments.
〔発明の効果〕本発明の反射防止膜の作用効果を確認す
るために下記の2実施例による本発明の反射防止膜と従
来の反射防止膜との特性を比較する実験を行なった。[Effects of the Invention] In order to confirm the effects of the anti-reflection film of the present invention, an experiment was conducted to compare the characteristics of the anti-reflection film of the present invention and a conventional anti-reflection film according to the following two examples.
第3図(イ)は本発明の第1実施例、(ロ)は第2実施
例である。同図において、1はプラスチック製光学部品
としてのポリメチルメタクリレート(PMMA)製光学
レンズで、その表面には二酸化ケイ素の第1゛層3と弗
化マグネシウムの第2層2が反射防止膜として形成され
ている。その具体的内容は下記の第1表および第2表に
示すとおシである。なお、設計基準波長λ。は560μ
mで、反射防止膜は、第1実施例において社光学レンズ
を75℃前後の温度に保持した状態の下で、第2実施例
は室温の下で、それぞれ真空蒸着法によシ形成した。FIG. 3(a) shows a first embodiment of the present invention, and FIG. 3(b) shows a second embodiment. In the figure, 1 is an optical lens made of polymethyl methacrylate (PMMA) as a plastic optical component, and a first layer 3 of silicon dioxide and a second layer 2 of magnesium fluoride are formed on the surface as an antireflection film. has been done. The specific contents are shown in Tables 1 and 2 below. In addition, the design reference wavelength λ. is 560μ
In Example 1, the antireflection film was formed by a vacuum evaporation method while the optical lens was maintained at a temperature of around 75° C. in Example 1, and at room temperature in Example 2.
詑1表(第1実施例)
第2表(第2実施例)
上記第1実施例および第2実施例の本発明の反射防止膜
と従来の反射防止膜との特性を比較するために行なった
実験は、(1)耐久性の試験(温度40℃、相対を度9
5チの高温・高湿雰゛囲気中に約1000時間放置、(
2)耐熱性の試験(呈温から10℃づ\温度をあげ、一
定温度で2時間放置した後、光学レンズの表面を倍率2
00倍の顕微鏡で観察し、クラックの発生した温度を耐
熱温度とした)(6)鉛維硬度試験(、r■sK 54
00)で、比較のための従来の反射防止膜はポリメチル
メタクリレート製光学レンズの表面に弗化マグネシウム
の反射防止膜を真空蒸着法によって形成した。試験の結
果は第3表に示すとおりである。Table 1 (First Example) Table 2 (Second Example) This was carried out to compare the characteristics of the anti-reflection film of the present invention in the first example and the second example and the conventional anti-reflection film. The experiments were as follows: (1) Durability test (temperature 40℃, relative temperature 9 degrees)
Leave it in a high temperature, high humidity atmosphere for about 1000 hours, (
2) Heat resistance test (Raise the temperature by 10℃ from the initial temperature, leave it at a constant temperature for 2 hours, and then test the surface of the optical lens at a magnification of 2
(6) Lead fiber hardness test (, r■sK 54
In 00), a conventional antireflection film for comparison was a magnesium fluoride antireflection film formed on the surface of an optical lens made of polymethyl methacrylate by vacuum evaporation. The test results are shown in Table 3.
止[mi Z 、’L 狭千−、、MW 、よび破瓜の
点ですぐj、ている。また、従来例は、反射防止膜形成
時にクラックが発生することがあったが本発明の実施例
においては反射防止膜は常時安定していた0
来の反射防止膜を有するPMMA製光学レンズ、Cは第
1実施例の反射防止膜を有するPMMA $1!光学レ
ンズ、dは第2実施例の反射防止膜を有する1’MMA
製光学レンズの分光反射率を示している。同図かられか
るように本発明の反射防止膜を備えたPMMA製光学レ
ンズの分光反射率は従来例に比べてなんら遜色はなく、
急岐な特性を有する点で色調改善の面からむしろ有利で
ある。Stop [mi Z, 'L narrow, MW, and immediately at the point of the melon. In addition, in the conventional example, cracks sometimes occurred during the formation of the anti-reflection film, but in the embodiment of the present invention, the anti-reflection film was always stable. is PMMA having the anti-reflection film of the first embodiment $1! Optical lens, d is 1'MMA with antireflection film of the second embodiment
It shows the spectral reflectance of manufactured optical lenses. As can be seen from the figure, the spectral reflectance of the PMMA optical lens equipped with the antireflection film of the present invention is no inferior to that of the conventional example.
It is rather advantageous in terms of color tone improvement because it has sharp characteristics.
以上述べたように本発明においては二酸化ケイ素の第1
層を設けることによって反射防止膜を有するプラスチッ
ク光学部品の耐久性および耐熱性を向上すると共にクラ
ックの発生を阻止するので従来例のもつ欠点を解消する
効果を有する。また本発明は実施例に示すPMMA製光
学レンズ以外のプラスチック製品にも適用できるのでそ
の実用的価値りきわめて大である。As mentioned above, in the present invention, the first silicon dioxide
Providing this layer improves the durability and heat resistance of plastic optical components having an antireflection film, and also prevents the occurrence of cracks, thereby having the effect of eliminating the drawbacks of the prior art. Furthermore, the present invention can be applied to plastic products other than the PMMA optical lenses shown in the examples, so its practical value is extremely high.
第1薗:従来のプラスチック製光学部品の反射防止膜を
示す図
第2図:第1図の反射防止膜に発生したクラックを示す
図
第31二本発明のプラスチック製光学部品の反射防止膜
を示す図で、(イ)は第1実施例、(ロ)は第2実施例
第4N:本発明および従来の反射防止膜を備えたプラス
チック光学レンズの分光反射
率を示すグラフ
ト・・プラスチック基板(光学レンズ)2・・・第2層
(弗化マグネシウム)
5・・・第1層(二酸化ケイ素)
4・−・クラック
第1図
2
牙2図
24iに
女毫Jμ机)Figure 1: Diagram showing the anti-reflection coating of the conventional plastic optical component Figure 2: Diagram showing the cracks that occurred in the anti-reflection coating of Figure 1 In the diagrams, (a) is the first example, (b) is the second example, No. 4N: Grafted plastic substrate ( Optical lens) 2... 2nd layer (magnesium fluoride) 5... 1st layer (silicon dioxide) 4... Crack
Claims (2)
(sio、 )より力る第1層が形成され、該第1層の
上に弗化マグネシウム(Msv、 )よシなる第2層が
形成さ牡て反射防止膜を構成する構造において、前記第
1層および第2層はその屈折率をN、 、 N、、幾例
学的膜厚をdl、dl、設計基準波長を4とするとき、
各層の光学的膜厚Nl ’1およびIJ、 d、が設計
基準波長λ0に対し、 0、050λ。<N、 d、 (0,520λ00、1
25λo(N、 d!(0,375λ0の範囲内にある
ことを特徴と、するプラスチック製光学部品の反射防止
膜(1) A first layer made of silicon dioxide (SIO, ) is formed on the surface of a plastic optical component, and a second layer made of magnesium fluoride (MSV, ) is formed on the first layer. In the structure constituting an anti-reflection film, the first layer and the second layer have refractive indexes of N, , N, geometric thicknesses of dl and dl, and a design reference wavelength of 4,
The optical thickness Nl'1 and IJ,d of each layer are 0,050λ with respect to the design reference wavelength λ0. <N, d, (0,520λ00,1
Anti-reflection coating for plastic optical components, characterized in that it is within the range of 25λo(N, d!(0,375λ0)
品を、70℃〜100℃に保持した状態で形成されたも
のであることを特徴とする特許請求の範囲第1項記載の
プラスチック製光学部品の反射防止膜0(2) The first layer and the second layer are made of plastic according to claim 1, wherein the first layer and the second layer are formed by holding a plastic optical component at a temperature of 70°C to 100°C. Anti-reflection coating for optical parts 0
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58130522A JPS6022101A (en) | 1983-07-18 | 1983-07-18 | Antireflection film for plastic optical parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58130522A JPS6022101A (en) | 1983-07-18 | 1983-07-18 | Antireflection film for plastic optical parts |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6022101A true JPS6022101A (en) | 1985-02-04 |
JPH0474681B2 JPH0474681B2 (en) | 1992-11-26 |
Family
ID=15036306
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58130522A Granted JPS6022101A (en) | 1983-07-18 | 1983-07-18 | Antireflection film for plastic optical parts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6022101A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL9401408A (en) * | 1993-08-31 | 1995-03-16 | Sumitomo Cement Co | Anti-glare film. |
JPH0926501A (en) * | 1995-07-11 | 1997-01-28 | Konica Corp | Synthetic resin optical parts having antireflection film |
FR2817267A1 (en) * | 2000-11-28 | 2002-05-31 | Essilor Int | METHOD FOR DEPOSITING COLD ANTI-REFLECTIVE LAYER ON ORGANIC SUBSTRATE |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54183360U (en) * | 1978-06-15 | 1979-12-26 | ||
JPS5881501U (en) * | 1981-11-27 | 1983-06-02 | 東京光学機械株式会社 | Immersion tip lens |
-
1983
- 1983-07-18 JP JP58130522A patent/JPS6022101A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54183360U (en) * | 1978-06-15 | 1979-12-26 | ||
JPS5881501U (en) * | 1981-11-27 | 1983-06-02 | 東京光学機械株式会社 | Immersion tip lens |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL9401408A (en) * | 1993-08-31 | 1995-03-16 | Sumitomo Cement Co | Anti-glare film. |
JPH0926501A (en) * | 1995-07-11 | 1997-01-28 | Konica Corp | Synthetic resin optical parts having antireflection film |
FR2817267A1 (en) * | 2000-11-28 | 2002-05-31 | Essilor Int | METHOD FOR DEPOSITING COLD ANTI-REFLECTIVE LAYER ON ORGANIC SUBSTRATE |
WO2002044440A1 (en) * | 2000-11-28 | 2002-06-06 | Essilor International | Method for cold process deposition of an antiglare layer |
AU2002222043B2 (en) * | 2000-11-28 | 2006-10-12 | Essilor International | Method for cold process deposition of an antiglare layer |
US7175878B2 (en) | 2000-11-28 | 2007-02-13 | Essilor International | Cold antireflection layer deposition process |
KR100845244B1 (en) | 2000-11-28 | 2008-07-10 | 에씰로아 인터내셔날/콩파니에 제네랄 도프티크 | Method For Cold Process Deposition Of An Antiglare Layer |
Also Published As
Publication number | Publication date |
---|---|
JPH0474681B2 (en) | 1992-11-26 |
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