JPS60217629A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS60217629A
JPS60217629A JP59073456A JP7345684A JPS60217629A JP S60217629 A JPS60217629 A JP S60217629A JP 59073456 A JP59073456 A JP 59073456A JP 7345684 A JP7345684 A JP 7345684A JP S60217629 A JPS60217629 A JP S60217629A
Authority
JP
Japan
Prior art keywords
mask
key pattern
wafer
pattern
mask alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59073456A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0336290B2 (enExample
Inventor
Takeshi Takanori
高乗　健
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP59073456A priority Critical patent/JPS60217629A/ja
Publication of JPS60217629A publication Critical patent/JPS60217629A/ja
Publication of JPH0336290B2 publication Critical patent/JPH0336290B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59073456A 1984-04-12 1984-04-12 半導体装置の製造方法 Granted JPS60217629A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59073456A JPS60217629A (ja) 1984-04-12 1984-04-12 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59073456A JPS60217629A (ja) 1984-04-12 1984-04-12 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS60217629A true JPS60217629A (ja) 1985-10-31
JPH0336290B2 JPH0336290B2 (enExample) 1991-05-31

Family

ID=13518759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59073456A Granted JPS60217629A (ja) 1984-04-12 1984-04-12 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS60217629A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63262835A (ja) * 1987-04-21 1988-10-31 Seiko Epson Corp 半導体装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63262835A (ja) * 1987-04-21 1988-10-31 Seiko Epson Corp 半導体装置

Also Published As

Publication number Publication date
JPH0336290B2 (enExample) 1991-05-31

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