JPS6021522A - レジストパタ−ン形成方法 - Google Patents

レジストパタ−ン形成方法

Info

Publication number
JPS6021522A
JPS6021522A JP58128912A JP12891283A JPS6021522A JP S6021522 A JPS6021522 A JP S6021522A JP 58128912 A JP58128912 A JP 58128912A JP 12891283 A JP12891283 A JP 12891283A JP S6021522 A JPS6021522 A JP S6021522A
Authority
JP
Japan
Prior art keywords
resist
cooling
baking
temperature
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58128912A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0546091B2 (enrdf_load_stackoverflow
Inventor
Kei Kirita
桐田　慶
Yoshihide Kato
加藤　芳秀
Toshiaki Shinozaki
篠崎　俊昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58128912A priority Critical patent/JPS6021522A/ja
Publication of JPS6021522A publication Critical patent/JPS6021522A/ja
Publication of JPH0546091B2 publication Critical patent/JPH0546091B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58128912A 1983-07-15 1983-07-15 レジストパタ−ン形成方法 Granted JPS6021522A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58128912A JPS6021522A (ja) 1983-07-15 1983-07-15 レジストパタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58128912A JPS6021522A (ja) 1983-07-15 1983-07-15 レジストパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6021522A true JPS6021522A (ja) 1985-02-02
JPH0546091B2 JPH0546091B2 (enrdf_load_stackoverflow) 1993-07-13

Family

ID=14996435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58128912A Granted JPS6021522A (ja) 1983-07-15 1983-07-15 レジストパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6021522A (enrdf_load_stackoverflow)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4717645A (en) * 1983-01-19 1988-01-05 Tokyo Shibaura Denki Kabushiki Kaisha Method and apparatus for forming resist pattern
JPS63107116A (ja) * 1986-10-24 1988-05-12 Fujitsu Ltd レジストベ−キング方法
US4777116A (en) * 1985-10-22 1988-10-11 Kuraray Co., Ltd. Method for manufacturing phase gratings of a combination pattern-refraction modification type
JPS63161803U (enrdf_load_stackoverflow) * 1987-04-10 1988-10-21
JPS63259559A (ja) * 1987-04-16 1988-10-26 Hitachi Condenser Co Ltd 印刷配線板のパタ−ン形成方法
JPH01133621U (enrdf_load_stackoverflow) * 1988-02-29 1989-09-12
KR100369571B1 (ko) * 1994-12-28 2003-04-10 도레이 가부시끼가이샤 도포방법및도포장치
US8053174B2 (en) 2003-02-05 2011-11-08 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method for wiring
CN104204550A (zh) * 2012-03-23 2014-12-10 萱场工业株式会社 流体压缸

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4717645A (en) * 1983-01-19 1988-01-05 Tokyo Shibaura Denki Kabushiki Kaisha Method and apparatus for forming resist pattern
US4777116A (en) * 1985-10-22 1988-10-11 Kuraray Co., Ltd. Method for manufacturing phase gratings of a combination pattern-refraction modification type
JPS63107116A (ja) * 1986-10-24 1988-05-12 Fujitsu Ltd レジストベ−キング方法
JPS63161803U (enrdf_load_stackoverflow) * 1987-04-10 1988-10-21
JPS63259559A (ja) * 1987-04-16 1988-10-26 Hitachi Condenser Co Ltd 印刷配線板のパタ−ン形成方法
JPH01133621U (enrdf_load_stackoverflow) * 1988-02-29 1989-09-12
KR100369571B1 (ko) * 1994-12-28 2003-04-10 도레이 가부시끼가이샤 도포방법및도포장치
US8053174B2 (en) 2003-02-05 2011-11-08 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method for wiring
US8460857B2 (en) 2003-02-05 2013-06-11 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method for wiring
CN104204550A (zh) * 2012-03-23 2014-12-10 萱场工业株式会社 流体压缸

Also Published As

Publication number Publication date
JPH0546091B2 (enrdf_load_stackoverflow) 1993-07-13

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