JPS60210596A - 粒子線エピタキシヤル装置の成長速度制御方法 - Google Patents
粒子線エピタキシヤル装置の成長速度制御方法Info
- Publication number
- JPS60210596A JPS60210596A JP59064822A JP6482284A JPS60210596A JP S60210596 A JPS60210596 A JP S60210596A JP 59064822 A JP59064822 A JP 59064822A JP 6482284 A JP6482284 A JP 6482284A JP S60210596 A JPS60210596 A JP S60210596A
- Authority
- JP
- Japan
- Prior art keywords
- particle beam
- substrate
- chamber
- corpuscular radiation
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/002—Controlling or regulating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59064822A JPS60210596A (ja) | 1984-03-31 | 1984-03-31 | 粒子線エピタキシヤル装置の成長速度制御方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59064822A JPS60210596A (ja) | 1984-03-31 | 1984-03-31 | 粒子線エピタキシヤル装置の成長速度制御方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60210596A true JPS60210596A (ja) | 1985-10-23 |
| JPH054360B2 JPH054360B2 (enExample) | 1993-01-19 |
Family
ID=13269326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59064822A Granted JPS60210596A (ja) | 1984-03-31 | 1984-03-31 | 粒子線エピタキシヤル装置の成長速度制御方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60210596A (enExample) |
-
1984
- 1984-03-31 JP JP59064822A patent/JPS60210596A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH054360B2 (enExample) | 1993-01-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6667475B1 (en) | Method and apparatus for cleaning an analytical instrument while operating the analytical instrument | |
| JP2003504616A (ja) | 二次イオンの収量を高める方法及び装置 | |
| US5397895A (en) | Photoionization mass spectroscopy flux monitor | |
| KR20080082614A (ko) | 기체의 도입을 통한 이온 주입 공정 중에 오염을 완화하여표면 특성을 수정하는 시스템 및 방법 | |
| JPS60210596A (ja) | 粒子線エピタキシヤル装置の成長速度制御方法 | |
| GB2358955A (en) | Charged particle beam exposure apparatus and Method | |
| US3876305A (en) | Demountable sputtering cathode for atomic absorption spectroscopy | |
| US6057233A (en) | Process for producing thin film | |
| US4842679A (en) | Method for the production of semiconductor devices | |
| JPH0810720B2 (ja) | 表面揮発性物質検知装置 | |
| JP2000123996A (ja) | 原子状ラジカル測定方法及び装置 | |
| JPS61132591A (ja) | 粒子線エピタキシヤル装置の粒子線強度制御装置 | |
| JPH054359B2 (enExample) | ||
| JPH055797B2 (enExample) | ||
| JPH06224183A (ja) | プラズマ利用装置 | |
| JPS60210594A (ja) | 粒子線エピタキシャル装置 | |
| JPS5931550A (ja) | プラズマエツチング中のラジカルおよび励起分子測定装置 | |
| JPS61219790A (ja) | 粒子線エピタキシヤル装置 | |
| JPH0123937B2 (enExample) | ||
| JPS61219792A (ja) | 粒子線エピタキシヤル装置における粒子線強度検出制御装置 | |
| JP2004294275A (ja) | 深さ方向元素分布測定方法及び深さ方向元素分布測定装置 | |
| JPS61219789A (ja) | 粒子線エピタキシヤル装置 | |
| Coburn | Mechanisms in plasma-assisted etching | |
| JPS61242990A (ja) | 粒子線エピタキシヤル装置の粒子線源 | |
| Lancok et al. | Influence of additional rf discharge on the properties of carbon nitride thin films deposited by PLD |