JPS60209246A - 光化学反応装置 - Google Patents

光化学反応装置

Info

Publication number
JPS60209246A
JPS60209246A JP6341184A JP6341184A JPS60209246A JP S60209246 A JPS60209246 A JP S60209246A JP 6341184 A JP6341184 A JP 6341184A JP 6341184 A JP6341184 A JP 6341184A JP S60209246 A JPS60209246 A JP S60209246A
Authority
JP
Japan
Prior art keywords
reaction
ultraviolet
reaction vessel
photochemical reaction
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6341184A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6250553B2 (enExample
Inventor
Shinji Sugioka
晋次 杉岡
Shinji Suzuki
信二 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP6341184A priority Critical patent/JPS60209246A/ja
Publication of JPS60209246A publication Critical patent/JPS60209246A/ja
Publication of JPS6250553B2 publication Critical patent/JPS6250553B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/488—Protection of windows for introduction of radiation into the coating chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP6341184A 1984-04-02 1984-04-02 光化学反応装置 Granted JPS60209246A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6341184A JPS60209246A (ja) 1984-04-02 1984-04-02 光化学反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6341184A JPS60209246A (ja) 1984-04-02 1984-04-02 光化学反応装置

Publications (2)

Publication Number Publication Date
JPS60209246A true JPS60209246A (ja) 1985-10-21
JPS6250553B2 JPS6250553B2 (enExample) 1987-10-26

Family

ID=13228519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6341184A Granted JPS60209246A (ja) 1984-04-02 1984-04-02 光化学反応装置

Country Status (1)

Country Link
JP (1) JPS60209246A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03134171A (ja) * 1989-10-19 1991-06-07 Inco Ltd 赤外線透明窓の曇りを防止する金属メッキ装置及びその方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60126822A (ja) * 1983-12-14 1985-07-06 Toshiba Corp 光気相成長方法及び光気相成長装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60126822A (ja) * 1983-12-14 1985-07-06 Toshiba Corp 光気相成長方法及び光気相成長装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03134171A (ja) * 1989-10-19 1991-06-07 Inco Ltd 赤外線透明窓の曇りを防止する金属メッキ装置及びその方法

Also Published As

Publication number Publication date
JPS6250553B2 (enExample) 1987-10-26

Similar Documents

Publication Publication Date Title
US6533902B1 (en) Ultraviolet processing apparatus and ultraviolet processing method
JPS6150150B2 (enExample)
EP0110882A1 (en) Maskless growth of patterned films
JPS60212220A (ja) 光化学反応装置
JPS60209246A (ja) 光化学反応装置
JPS60117711A (ja) 薄膜形成装置
EP0054189A1 (en) Improved photochemical vapor deposition method
JPS60209248A (ja) 光化学反応装置
JPS60209247A (ja) 光化学反応装置
JPS60212222A (ja) 光化学反応装置
JPS60212224A (ja) 光化学反応装置
JPS63260132A (ja) 表面改質装置
JPS6150151B2 (enExample)
JPS60212221A (ja) 光化学反応装置
JPH0353391B2 (enExample)
JPH04365318A (ja) 表面処理装置
JPH0644553B2 (ja) 光気相成長方法及び光気相成長装置
JPS6156279A (ja) 成膜方法
US4842828A (en) Apparatus for treating surface of object with ultraviolet rays and reaction gas
JPH03287767A (ja) 成膜装置用ローディング室
JP3010065B2 (ja) 光励起プロセス装置
JPS59129771A (ja) 光化学蒸着方法
JPH0621234Y2 (ja) 半導体製造装置
JPH04105314A (ja) 非晶質シリコンの製造方法
JPS61231715A (ja) 光プロセス装置