JPS60208824A - 気相成長装置 - Google Patents

気相成長装置

Info

Publication number
JPS60208824A
JPS60208824A JP6606484A JP6606484A JPS60208824A JP S60208824 A JPS60208824 A JP S60208824A JP 6606484 A JP6606484 A JP 6606484A JP 6606484 A JP6606484 A JP 6606484A JP S60208824 A JPS60208824 A JP S60208824A
Authority
JP
Japan
Prior art keywords
cooling
chamber
reaction
gas
transparent plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6606484A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0518250B2 (ko
Inventor
Masato Mitani
三谷 眞人
Takashi Ichiyanagi
一柳 高畤
Junichi Nozaki
野崎 順一
Masaki Suzuki
正樹 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6606484A priority Critical patent/JPS60208824A/ja
Publication of JPS60208824A publication Critical patent/JPS60208824A/ja
Publication of JPH0518250B2 publication Critical patent/JPH0518250B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/0262Reduction or decomposition of gaseous compounds, e.g. CVD
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02524Group 14 semiconducting materials
    • H01L21/02532Silicon, silicon germanium, germanium

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP6606484A 1984-04-03 1984-04-03 気相成長装置 Granted JPS60208824A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6606484A JPS60208824A (ja) 1984-04-03 1984-04-03 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6606484A JPS60208824A (ja) 1984-04-03 1984-04-03 気相成長装置

Publications (2)

Publication Number Publication Date
JPS60208824A true JPS60208824A (ja) 1985-10-21
JPH0518250B2 JPH0518250B2 (ko) 1993-03-11

Family

ID=13305048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6606484A Granted JPS60208824A (ja) 1984-04-03 1984-04-03 気相成長装置

Country Status (1)

Country Link
JP (1) JPS60208824A (ko)

Also Published As

Publication number Publication date
JPH0518250B2 (ko) 1993-03-11

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