JPS60208430A - 金属沃化物から高純度金属の製造法 - Google Patents

金属沃化物から高純度金属の製造法

Info

Publication number
JPS60208430A
JPS60208430A JP6105984A JP6105984A JPS60208430A JP S60208430 A JPS60208430 A JP S60208430A JP 6105984 A JP6105984 A JP 6105984A JP 6105984 A JP6105984 A JP 6105984A JP S60208430 A JPS60208430 A JP S60208430A
Authority
JP
Japan
Prior art keywords
iodide
low
metal
temp
metallic iodide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6105984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0411609B2 (enExample
Inventor
Keiichiro Nishizawa
西沢　恵一郎
Hajime Sudo
一 須藤
Itsuo Hirano
逸雄 平野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Toyo Soda Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Soda Manufacturing Co Ltd filed Critical Toyo Soda Manufacturing Co Ltd
Priority to JP6105984A priority Critical patent/JPS60208430A/ja
Publication of JPS60208430A publication Critical patent/JPS60208430A/ja
Publication of JPH0411609B2 publication Critical patent/JPH0411609B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Manufacture And Refinement Of Metals (AREA)
JP6105984A 1984-03-30 1984-03-30 金属沃化物から高純度金属の製造法 Granted JPS60208430A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6105984A JPS60208430A (ja) 1984-03-30 1984-03-30 金属沃化物から高純度金属の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6105984A JPS60208430A (ja) 1984-03-30 1984-03-30 金属沃化物から高純度金属の製造法

Publications (2)

Publication Number Publication Date
JPS60208430A true JPS60208430A (ja) 1985-10-21
JPH0411609B2 JPH0411609B2 (enExample) 1992-03-02

Family

ID=13160225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6105984A Granted JPS60208430A (ja) 1984-03-30 1984-03-30 金属沃化物から高純度金属の製造法

Country Status (1)

Country Link
JP (1) JPS60208430A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5196916A (en) * 1990-02-15 1993-03-23 Kabushiki Kaisha Toshiba Highly purified metal material and sputtering target using the same
JP2023500801A (ja) * 2019-10-18 2023-01-11 パリ サイエンス エ レトレ プラズマを用いた組成物の処理

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55157325A (en) * 1979-04-17 1980-12-08 Plasma Holdings Method of treating body by low temperature plasma

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55157325A (en) * 1979-04-17 1980-12-08 Plasma Holdings Method of treating body by low temperature plasma

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5196916A (en) * 1990-02-15 1993-03-23 Kabushiki Kaisha Toshiba Highly purified metal material and sputtering target using the same
JP2023500801A (ja) * 2019-10-18 2023-01-11 パリ サイエンス エ レトレ プラズマを用いた組成物の処理

Also Published As

Publication number Publication date
JPH0411609B2 (enExample) 1992-03-02

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