JPS60204876A - クラスタビ−ム蒸着装置 - Google Patents
クラスタビ−ム蒸着装置Info
- Publication number
- JPS60204876A JPS60204876A JP5823084A JP5823084A JPS60204876A JP S60204876 A JPS60204876 A JP S60204876A JP 5823084 A JP5823084 A JP 5823084A JP 5823084 A JP5823084 A JP 5823084A JP S60204876 A JPS60204876 A JP S60204876A
- Authority
- JP
- Japan
- Prior art keywords
- clusters
- substrate
- deposited
- ionized
- crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5823084A JPS60204876A (ja) | 1984-03-28 | 1984-03-28 | クラスタビ−ム蒸着装置 |
| KR1019840006920A KR890002747B1 (ko) | 1983-11-07 | 1984-11-05 | 이온 빔에 의한 성막방법 및 그 장치 |
| EP84113348A EP0141417B1 (en) | 1983-11-07 | 1984-11-06 | Apparatus for forming film by ion beam |
| US06/668,843 US4687939A (en) | 1983-11-07 | 1984-11-06 | Method and apparatus for forming film by ion beam |
| DE8484113348T DE3485563D1 (de) | 1983-11-07 | 1984-11-06 | Vorrichtung zur herstellung eines filmes mittels ionenstrahl. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5823084A JPS60204876A (ja) | 1984-03-28 | 1984-03-28 | クラスタビ−ム蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60204876A true JPS60204876A (ja) | 1985-10-16 |
| JPH0536504B2 JPH0536504B2 (en:Method) | 1993-05-31 |
Family
ID=13078280
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5823084A Granted JPS60204876A (ja) | 1983-11-07 | 1984-03-28 | クラスタビ−ム蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60204876A (en:Method) |
-
1984
- 1984-03-28 JP JP5823084A patent/JPS60204876A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0536504B2 (en:Method) | 1993-05-31 |
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