JPS60204612A - 高純度二酸化珪素の製造方法 - Google Patents
高純度二酸化珪素の製造方法Info
- Publication number
- JPS60204612A JPS60204612A JP6174284A JP6174284A JPS60204612A JP S60204612 A JPS60204612 A JP S60204612A JP 6174284 A JP6174284 A JP 6174284A JP 6174284 A JP6174284 A JP 6174284A JP S60204612 A JPS60204612 A JP S60204612A
- Authority
- JP
- Japan
- Prior art keywords
- silicon dioxide
- raw material
- mineral acid
- hydrated silicate
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 160
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 80
- 235000012239 silicon dioxide Nutrition 0.000 title claims abstract description 80
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000002253 acid Substances 0.000 claims abstract description 64
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 61
- 239000002994 raw material Substances 0.000 claims abstract description 60
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 51
- 239000011707 mineral Substances 0.000 claims abstract description 51
- 229910021426 porous silicon Inorganic materials 0.000 claims abstract description 16
- 238000006482 condensation reaction Methods 0.000 claims abstract description 14
- 125000005372 silanol group Chemical group 0.000 claims abstract description 10
- 239000007788 liquid Substances 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 24
- 239000005368 silicate glass Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 44
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract description 13
- 239000000463 material Substances 0.000 abstract description 7
- 239000004115 Sodium Silicate Substances 0.000 abstract description 2
- 229910052911 sodium silicate Inorganic materials 0.000 abstract description 2
- 238000005342 ion exchange Methods 0.000 abstract 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 30
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 239000000741 silica gel Substances 0.000 description 14
- 229910002027 silica gel Inorganic materials 0.000 description 14
- 229910052710 silicon Inorganic materials 0.000 description 14
- 239000010703 silicon Substances 0.000 description 14
- 239000012535 impurity Substances 0.000 description 13
- 238000005406 washing Methods 0.000 description 12
- 235000019353 potassium silicate Nutrition 0.000 description 11
- 238000004140 cleaning Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 5
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 229910017604 nitric acid Inorganic materials 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 239000000499 gel Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- -1 silicate salt Chemical class 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- ZVBWPVOCTORPLM-UHFFFAOYSA-N formylsilicon Chemical group [Si]C=O ZVBWPVOCTORPLM-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000007863 gel particle Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000001637 plasma atomic emission spectroscopy Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000004677 spark ionization mass spectrometry Methods 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6174284A JPS60204612A (ja) | 1984-03-29 | 1984-03-29 | 高純度二酸化珪素の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6174284A JPS60204612A (ja) | 1984-03-29 | 1984-03-29 | 高純度二酸化珪素の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60204612A true JPS60204612A (ja) | 1985-10-16 |
| JPH0457606B2 JPH0457606B2 (enrdf_load_stackoverflow) | 1992-09-14 |
Family
ID=13179933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6174284A Granted JPS60204612A (ja) | 1984-03-29 | 1984-03-29 | 高純度二酸化珪素の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60204612A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6148422A (ja) * | 1984-08-17 | 1986-03-10 | Nippon Chem Ind Co Ltd:The | 高純度シリカ及びその製法 |
| US4683128A (en) * | 1985-06-27 | 1987-07-28 | Nitto Chemical Industry Co., Ltd. | Process for manufacturing high purity silica |
| JP2013209243A (ja) * | 2012-03-30 | 2013-10-10 | Taiheiyo Cement Corp | 高純度シリカの製造方法 |
| JP2014514229A (ja) * | 2011-02-22 | 2014-06-19 | エボニック デグサ ゲーエムベーハー | 石英ガラス適用のための高純度シリカ顆粒並びにその製造法 |
| JP2016141726A (ja) * | 2015-01-30 | 2016-08-08 | 清水建設株式会社 | 地盤改良材 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2338463A (en) * | 1937-08-19 | 1944-01-04 | Skaupy Franz | Process of making filaments consisting of pure silicic acid |
| JPS51112924A (en) * | 1975-03-28 | 1976-10-05 | Asahi Chem Ind Co Ltd | A process for producing silicate fibers |
-
1984
- 1984-03-29 JP JP6174284A patent/JPS60204612A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2338463A (en) * | 1937-08-19 | 1944-01-04 | Skaupy Franz | Process of making filaments consisting of pure silicic acid |
| JPS51112924A (en) * | 1975-03-28 | 1976-10-05 | Asahi Chem Ind Co Ltd | A process for producing silicate fibers |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6148422A (ja) * | 1984-08-17 | 1986-03-10 | Nippon Chem Ind Co Ltd:The | 高純度シリカ及びその製法 |
| US4683128A (en) * | 1985-06-27 | 1987-07-28 | Nitto Chemical Industry Co., Ltd. | Process for manufacturing high purity silica |
| JP2014514229A (ja) * | 2011-02-22 | 2014-06-19 | エボニック デグサ ゲーエムベーハー | 石英ガラス適用のための高純度シリカ顆粒並びにその製造法 |
| JP2013209243A (ja) * | 2012-03-30 | 2013-10-10 | Taiheiyo Cement Corp | 高純度シリカの製造方法 |
| JP2016141726A (ja) * | 2015-01-30 | 2016-08-08 | 清水建設株式会社 | 地盤改良材 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0457606B2 (enrdf_load_stackoverflow) | 1992-09-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105905908B (zh) | 一种基于埃洛石原料制备纳米硅的方法 | |
| CN101979443A (zh) | 一种改性白炭黑的生产方法 | |
| CN102350225B (zh) | 吸附重金属离子的pvdf杂化平板膜 | |
| JPS60204613A (ja) | 高純度シリカゲルの製造方法 | |
| KR100720016B1 (ko) | 실리카 입자, 합성 석영 가루 및 합성 석영 유리의 합성방법 | |
| CN108328619A (zh) | 一种工业硅湿法冶金除硼的方法 | |
| Boualem et al. | Synthesis and characterization of mesoporous silica from Algerian river sand for solar grade silicon: Effect of alkaline concentration on the porosity and purity of silica powder | |
| CN115676842A (zh) | 一种利用超细硅粉制备高纯石英砂的方法 | |
| JPS60204612A (ja) | 高純度二酸化珪素の製造方法 | |
| CA1142501A (fr) | Procede industriel de fabrication en semi-continu de zeolithe a | |
| CN101172610B (zh) | 一种高温二氧化硅粉体的制备方法 | |
| WO2022144038A1 (zh) | 一种利用工业级丁基锂制备高纯硫化锂的方法 | |
| CN114436266A (zh) | 一种利用微波加热氯化焙烧提纯石英的方法 | |
| CN105271322A (zh) | 一种束状三水碳酸镁晶体的制备方法 | |
| CN101983919A (zh) | 一种利用多晶硅切割废料碱洗废水生产白碳黑的方法 | |
| JP2011241132A (ja) | ケイ酸塩無機高分子で被覆された酸化マンガン複合体及びその製造方法 | |
| CN112707404A (zh) | 一种湿法水玻璃及其制备工艺 | |
| CN116119632B (zh) | 一种高纯微米磷酸锂粉末的制备方法 | |
| US3345132A (en) | Process of preparing silicic acid in a two-dimensional structure | |
| CN108585003A (zh) | 一种利用铝灰制备片状氧化铝的方法 | |
| JP3442120B2 (ja) | シリカヒドロゲルを洗浄する方法 | |
| JP4504491B2 (ja) | 高純度合成石英粉の製造方法 | |
| CN105329907A (zh) | 一种蛭石制备沉淀白炭黑的方法及使用该制备过程的废弃物制备聚硅酸铝镁絮凝剂的方法 | |
| CN115872435B (zh) | 一种晶相重构制备高纯石膏的方法 | |
| CN104556074B (zh) | 一种以海泡石为原料快速制得均匀SiO2纳米管的制备方法 |