JPS60204372A - Surface-cleaning method for nozzle - Google Patents

Surface-cleaning method for nozzle

Info

Publication number
JPS60204372A
JPS60204372A JP59061089A JP6108984A JPS60204372A JP S60204372 A JPS60204372 A JP S60204372A JP 59061089 A JP59061089 A JP 59061089A JP 6108984 A JP6108984 A JP 6108984A JP S60204372 A JPS60204372 A JP S60204372A
Authority
JP
Japan
Prior art keywords
nozzle
nozzles
plasma
chamber
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59061089A
Other languages
Japanese (ja)
Inventor
Kazuaki Masuda
益田 和明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59061089A priority Critical patent/JPS60204372A/en
Publication of JPS60204372A publication Critical patent/JPS60204372A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/165Preventing or detecting of nozzle clogging, e.g. cleaning, capping or moistening for nozzles
    • B41J2/16517Cleaning of print head nozzles

Abstract

PURPOSE:To enhance reliability of nozzles, a head or the like through an excellent cleaning effect and clean the surfaces of nozzles speedily, efficiently and inexpensively, by subjecting the nozzles for ejecting liquid droplets to a plasma treatment. CONSTITUTION:The nozzles for ejecting liquid droplets are subjected to a plasma treatment by, e.g., a plasma treating device, to clean the nozzles. To preferably perform the treatment, for example, a multiplicity of nozzles 1 are set in a plasma-generating chamber 3 through holding jigs 2, a vacuum pump 4 is operated to draw a vacuum in the chamber 3, an inorganic gas is introduced into the chamber 3 through a gas inflow port 5, and an RF oscillator 6 connected to electrodes 7 is operated to impress an HF current on the electodes 7, thereby bringing the gas in the chamber 3 into a plasma state.

Description

【発明の詳細な説明】 [技術分野] 本発明はノズルの表面浄化方法に関し、特に液滴を吐出
するノズルで、液体噴射記録ヘッド等に用いられるノズ
ルの表面浄化方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for cleaning the surface of a nozzle, and particularly to a method for cleaning the surface of a nozzle that discharges droplets and is used in a liquid jet recording head or the like.

[従来技術] 上記のいわゆるインクジェットヘッドに用いられ記録用
液体インクを液滴として吐出するノズルの製造工程にお
いてはまずガラスやセラミックス等の材料からノズルが
形成されるが、その方法としては以下のようなものが知
られている。
[Prior Art] In the manufacturing process of the nozzle used in the above-mentioned so-called inkjet head to eject recording liquid ink as droplets, the nozzle is first formed from a material such as glass or ceramics, and the method is as follows. something is known.

(a)ガラスまたはセラミックスからなる板材に細かい
溝を切削してノズル壁を形成した後、この板材に対して
上記の材質からなる別の平板材を接着等により接合して
ノズルとする方法。
(a) A method in which a nozzle wall is formed by cutting fine grooves in a plate made of glass or ceramics, and then another flat plate made of the above-mentioned material is bonded to this plate to form a nozzle.

(b)感光性ガラスあるいは感光性樹脂を用いてノズル
壁を形成した後、 (a)と同様に別の平板材を接合し
てノズルとする方法。
(b) A method in which a nozzle wall is formed using photosensitive glass or photosensitive resin, and then another flat plate material is joined to form a nozzle in the same manner as in (a).

(C)ガラス細管の一部を加熱によって軟化させるとと
もに、加熱部の両端部を引張ることにより両端部に先細
りのテーパ部を形成した後、所望部分で切断してノズル
とする方法゛。
(C) A method in which a part of the glass tube is softened by heating and a tapered part is formed at both ends by pulling both ends of the heating part, and then cut at a desired part to form a nozzle.

以上の様な種々の方法によりノズルを形成した後、ノズ
ルの表面浄化処理を行なう。
After the nozzle is formed by the various methods described above, the surface of the nozzle is purified.

ここで浄化を行なう理由は、ノズルの形成材料にもとも
と付着していた汚れやノズル形成中にノズルに付着した
ゴミ等の異物を除去し、インクの流路を確保するためと
、ノズル内面を清浄にすることによりノズルのインクに
対する燻れ性を向−1ニさせ、気泡の付着を防ぎ、イン
ク吐出特性を安定化するためである。
The reason for cleaning here is to remove foreign matter such as dirt that originally adhered to the nozzle forming material and dust that adhered to the nozzle during nozzle formation to ensure an ink flow path, and to clean the inside of the nozzle. This is to improve the smoldering property of the nozzle against the ink, prevent the adhesion of air bubbles, and stabilize the ink ejection characteristics.

従来ではこの浄化方法はノズルを洗浄することによって
行なっており、具体的には例えば界面活性材や有機溶剤
等の洗浄液中にノズルを浸漬して揺動させた後、さらに
水洗して前述の洗浄液を洗い流し、しかる後にノズルを
加熱して水分を乾燥させる方法が一般的である。この洗
浄によりノズルが完成する。
Conventionally, this cleaning method has been carried out by cleaning the nozzle. Specifically, for example, the nozzle is immersed in a cleaning liquid such as a surfactant or an organic solvent, shaken, and then rinsed with water to remove the above-mentioned cleaning liquid. A common method is to wash away the water, then heat the nozzle to dry the water. This cleaning completes the nozzle.

しかしながらこのような洗浄による浄化方法によると、
インクジェットヘッド用のノズルの内径が数pLm〜数
百p、m程度と極めて小さいために以下のような問題が
生じている。
However, according to this cleaning method,
Since the inner diameter of the nozzle for an inkjet head is extremely small, ranging from several pLm to several hundred p.m, the following problems occur.

(イ)洗浄液がノズル内に入りにくいため、洗浄効果が
充分に−1−、がらない。
(a) The cleaning effect is not sufficient because it is difficult for the cleaning liquid to enter the nozzle.

(ロ)洗浄液による洗浄後の水洗においても同様に水が
入りにくいため洗浄液が完全に洗い流されずにノズル内
に残留し、ノズル内面の濡れ性が阻害される。
(b) Similarly, when rinsing with water after cleaning with a cleaning liquid, it is difficult for water to enter the nozzle, so the cleaning liquid remains in the nozzle without being completely washed away, impairing the wettability of the inner surface of the nozzle.

(ハ)上記の(イ)、(ロ)の問題をカバーし、充分な
浄化を行なうためには長時間の洗浄が必要となり、ノズ
ルの生産効率が悪くなる。
(c) In order to overcome the problems in (a) and (b) above and perform sufficient purification, a long cleaning time is required, resulting in poor nozzle production efficiency.

以」−の問題はインクジェットヘッドのノズルに限らず
同様の種類の液滴を吐出するノズルの表面浄化方法に共
通する。
The following problems are not limited to nozzles of inkjet heads, but are common to surface cleaning methods for nozzles that eject similar types of droplets.

[目 的] 本発明は以」二のような従来方法の問題に鑑みてなされ
たもので、短時間で効率良く安価に浄化を行なえ、しか
も浄化作用に優れたノズルの表面浄化方法の提供を目的
としている。
[Purpose] The present invention has been made in view of the problems of the conventional methods as described below.It is an object of the present invention to provide a method for purifying the surface of a nozzle, which can be purified efficiently and inexpensively in a short time, and which has an excellent purifying effect. The purpose is

[実施例] 以下、本発明の実施例を図を参照して説明する。なお実
施例では先述のインクジェットヘッド用のノズルを対象
としている。
[Example] Hereinafter, an example of the present invention will be described with reference to the drawings. In the embodiment, the nozzle for the above-mentioned inkjet head is targeted.

本発明においてはノズルに対してプラズマ処理を施すこ
とによりノズル表面の浄化を行なう。
In the present invention, the nozzle surface is cleaned by subjecting the nozzle to plasma treatment.

具体的なプラズマ処理方法としては、第1図に示す市販
されているプラズマ処理装置を用いて行なう。
As a specific plasma processing method, a commercially available plasma processing apparatus shown in FIG. 1 is used.

まず同図に示すように装置のプラズマ発生用のチャンバ
ー3内に多数本のノズルlを保持用の治具2を介してセ
ラI・した後、チャンバー3に連結された真空ポンプ4
を作動させて刊気を行ないチャンバー3内を真空状態に
する。
First, as shown in the figure, a large number of nozzles 1 are installed in a chamber 3 for plasma generation of the device via a holding jig 2, and then a vacuum pump 4 connected to the chamber 3 is installed.
is activated to generate air and make the inside of the chamber 3 into a vacuum state.

次にプラズマを形成する無機系のガスをガス流入口5か
らチャンバー3内に流入させる。この流入はチャンバー
3内の前記のガス圧力が所望の低圧、好ましくは0.1
〜数mmm1(となるまで行なう。
Next, an inorganic gas that forms plasma is allowed to flow into the chamber 3 from the gas inlet 5 . This inflow is such that the gas pressure in chamber 3 is at the desired low pressure, preferably 0.1
Continue until it becomes ~ several mm 1 (.

なおこの場合のガスとしては酸素、チッソ、ヘリウム、
アルゴン等あるいはこれらの混合ガスを用いることがで
きるが、浄化作用の強さ1価格等を考慮すると酸素を用
いるのが好ましい。
In this case, the gases include oxygen, nitrogen, helium,
Although argon or a mixed gas of these gases can be used, it is preferable to use oxygen in view of the strength of the purifying action, price, etc.

しかる後にチャンバー3内に設けられた電極7.7に接
続されたR F (Radio Frequency 
)発信器6を作動させて電極7,7に高周波電流を印加
してチャンバー3内のガスをプラズマ状態とする。この
場合RF発振器6の出力は50〜500W程度が好まし
い。
After that, the R F (Radio Frequency) connected to the electrode 7.7 provided in the chamber 3 is
) Activate the transmitter 6 to apply a high frequency current to the electrodes 7, 7 to bring the gas in the chamber 3 into a plasma state. In this case, the output of the RF oscillator 6 is preferably about 50 to 500W.

以−ヒのようにしてチャンバー3内に発生されたプラズ
マ中にノズルlが曝されることにより、ノズルlの表面
に付着していた微少なゴミ、汚れ。
As the nozzle 1 is exposed to the plasma generated in the chamber 3 as described above, minute dust and dirt adhere to the surface of the nozzle 1.

異物等が酸化等の化学現象によって分解、除去され、ノ
ズルlの表面が浄化される。またプラズマの発生に伴な
ってチャンバー3内に発生する高温により上記の酸化1
分解が促進され、上記のプラズマによる浄化作用がより
高められる。
Foreign matter and the like are decomposed and removed by chemical phenomena such as oxidation, and the surface of the nozzle l is purified. In addition, due to the high temperature generated in the chamber 3 due to the generation of plasma, the above oxidation 1
Decomposition is promoted, and the purification effect of the plasma described above is further enhanced.

なおこのプラズマ処理に要する時間は5分〜20分程度
である。
Note that the time required for this plasma treatment is about 5 minutes to 20 minutes.

以上の本実施例方法によれば」―記のようにプラズマ処
理時間は5〜20分稈爪の短時間であり、また一度に多
数本のノズル1を処理できるので極めて効率良く浄化を
行なえる。
According to the above-described method of this embodiment, the plasma treatment time is 5 to 20 minutes as described above, and a large number of nozzles 1 can be treated at the same time, making it possible to perform extremely efficient purification. .

ちなみに上記方法と従来の洗浄による方法により実際に
それぞれサンプルのノズルの表面浄化を行ない、浄化後
のノズルについてノズル内面の濡れ性試験を行なった。
Incidentally, the surfaces of sample nozzles were actually cleaned using the above method and the conventional cleaning method, and a nozzle inner surface wettability test was conducted on the cleaned nozzles.

その具体的な処理条件、Wlれ性試験結果および浄化に
要した時間のデータを下記の表に′示す、なおこの場合
のノズルのサンプルとしてはガラスから内径0.6騰m
、全長25IIImの円筒形状に形成したものを用いた
The specific processing conditions, Wl resistance test results, and data on the time required for purification are shown in the table below.
, which was formed into a cylindrical shape with a total length of 25 III m was used.

この表に示すように従来方法においては、50本のノズ
ルのサンプルに対して洗剤を用いて室温で超音波洗節を
25分間行なった後さらに流水中で超音波洗炸を25分
間行なった。すなわち浄化に 哄要した時間はこの後の乾燥を除いても50分間であっ
た。なおこの場合洗剤としては界面活性剤でMERCK
礼製のエキストランMA・Olを用いた。
As shown in this table, in the conventional method, samples of 50 nozzles were subjected to ultrasonic washing for 25 minutes at room temperature using a detergent, and then ultrasonic washing was further performed for 25 minutes under running water. That is, the time required for purification was 50 minutes, excluding the subsequent drying. In this case, the detergent is MERCK as a surfactant.
Extran MA・Ol made by Reisu was used.

また実施例による方法では、前述のプラズマ処理装置に
より50木ずつのサンプルに対して例1〜例5に示す5
通りのプラズマ処理を施した。すなわち使用ガスは酸素
で、その圧力は1mm1gという共通の条件で、前述の
RF発振器6の出力と処理時間を表に示すように異なる
絹合わせに設定して5通りの処理を行なった。
In addition, in the method according to the example, the plasma processing apparatus described above is used to treat samples of 50 trees each with the 5
It was subjected to regular plasma treatment. That is, under the common conditions that the gas used was oxygen and the pressure was 1 mm 1 g, five treatments were performed with the output of the RF oscillator 6 and the processing time set to different silks as shown in the table.

ように、浄化処理済のノズルlの後端を、インク容器8
中に満たされたインク9の液面に漬けてノズル1をイン
ク液面−ヒに直立させ、インクがノズルlの後端から先
端まで毛管現象により上昇するのに要した時間を計測し
た。
Connect the rear end of the purified nozzle l to the ink container 8.
The nozzle 1 was immersed in the liquid level of the ink 9 filled therein, and the nozzle 1 was stood upright on the ink liquid level, and the time required for the ink to rise from the rear end of the nozzle 1 to the tip by capillary action was measured.

このような濡れ性試験を従来方法と本実施例方法とでそ
れぞれ表面浄化を行なった50本ずつのサンプルに対し
て行なったところ上記の表に示す範囲の結果を得た。
When such a wettability test was conducted on 50 samples each whose surface was purified by the conventional method and the method of this embodiment, the results were obtained in the range shown in the table above.

表から明らかなように本実施例方法によれば浄化に要し
た時間が例1〜例3で10分9例4で5分9例5で20
分であって従来方法の50分に比較して極めて短時間で
ある。また実施例の例1〜例5のいずれにおいても濡れ
性試験におけるインク上昇時間が従来方法の場合より大
幅に短く、本実施例方法が従来方法より優れた浄化効果
を有していることが確認された。
As is clear from the table, according to the method of this example, the time required for purification was 10 minutes in Examples 1 to 3, 9 5 minutes in Example 4, 9 20 minutes in Example 5.
This is an extremely short time compared to 50 minutes of the conventional method. In addition, in all of Examples 1 to 5, the ink rise time in the wettability test was significantly shorter than that of the conventional method, confirming that the method of this example has a purification effect superior to that of the conventional method. It was done.

なお本発明方法はインクジェットヘッドのノズルに限ら
ず、これと同様の液滴を吐出するノズルの表面浄化に適
用できるのは勿論である。
Note that the method of the present invention is of course applicable not only to the nozzles of inkjet heads, but also to surface cleaning of nozzles that eject similar droplets.

[効 果] 以上の説明から明らかなように、本発明のノズルの表面
浄化方法によれば、ノズルに対してプラズマ処理を施す
ことにより、浄化を行なうので極めて短時間で効率よく
浄化を行なうことができ、ノズルのコストダウンを図れ
るとともに、優れた浄化効果でノズルの信頼性を向」二
でき、インクジェットヘッドのノズルの場合は、ヘッド
の信頼性を向上できる。
[Effects] As is clear from the above explanation, according to the nozzle surface purification method of the present invention, the nozzle is purified by plasma treatment, so that the nozzle can be purified efficiently in an extremely short time. This makes it possible to reduce the cost of the nozzle, and improve the reliability of the nozzle due to its excellent purification effect. In the case of nozzles for inkjet heads, the reliability of the head can be improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明によるノズルの表面浄化方法におけるプ
ラズマ処理の構成を示す説明図、第2図は毛管上昇法に
よる濡れ性試験を示す説明図である。 1・・・ノズル 2・・・治具 3・・・チャンバー 4・・・真空ポンプ6・・・RF
発振器 7・・・電極 8・・・インク容器 9・・・インク 0 第19 () 2 察2冨
FIG. 1 is an explanatory diagram showing the configuration of plasma treatment in the nozzle surface purification method according to the present invention, and FIG. 2 is an explanatory diagram showing a wettability test by the capillary rise method. 1... Nozzle 2... Jig 3... Chamber 4... Vacuum pump 6... RF
Oscillator 7... Electrode 8... Ink container 9... Ink 0 19th () 2 Sense 2 Tomi

Claims (1)

【特許請求の範囲】[Claims] 液滴を吐出するノズルの表面浄化方法において、ノズル
に対してプラズマ処理を施すことにより前記の浄化を行
なうことを特徴とするノズルの表面浄化方法。
A method for purifying the surface of a nozzle that discharges liquid droplets, the method comprising performing the aforementioned purification by subjecting the nozzle to plasma treatment.
JP59061089A 1984-03-30 1984-03-30 Surface-cleaning method for nozzle Pending JPS60204372A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59061089A JPS60204372A (en) 1984-03-30 1984-03-30 Surface-cleaning method for nozzle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59061089A JPS60204372A (en) 1984-03-30 1984-03-30 Surface-cleaning method for nozzle

Publications (1)

Publication Number Publication Date
JPS60204372A true JPS60204372A (en) 1985-10-15

Family

ID=13161010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59061089A Pending JPS60204372A (en) 1984-03-30 1984-03-30 Surface-cleaning method for nozzle

Country Status (1)

Country Link
JP (1) JPS60204372A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009051654A3 (en) * 2007-10-17 2009-06-18 Eastman Kodak Co Ambient plasma treament of printer components

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009051654A3 (en) * 2007-10-17 2009-06-18 Eastman Kodak Co Ambient plasma treament of printer components
US8029105B2 (en) 2007-10-17 2011-10-04 Eastman Kodak Company Ambient plasma treatment of printer components

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