JPS60203452A - Liquid jet recording head - Google Patents

Liquid jet recording head

Info

Publication number
JPS60203452A
JPS60203452A JP5952384A JP5952384A JPS60203452A JP S60203452 A JPS60203452 A JP S60203452A JP 5952384 A JP5952384 A JP 5952384A JP 5952384 A JP5952384 A JP 5952384A JP S60203452 A JPS60203452 A JP S60203452A
Authority
JP
Japan
Prior art keywords
liquid
recording head
jet recording
layer
liquid jet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5952384A
Other languages
Japanese (ja)
Inventor
Masami Ikeda
雅美 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP5952384A priority Critical patent/JPS60203452A/en
Publication of JPS60203452A publication Critical patent/JPS60203452A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14016Structure of bubble jet print heads
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14387Front shooter
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01Embodiments of or processes related to ink-jet heads
    • B41J2202/03Specific materials used

Abstract

PURPOSE:To stably maintain good liquid droplets-forming characteristics for long periods of time by raising the comprehensive durability by designating the surface roughness of a base material with an energy generator to a given value. CONSTITUTION:A base plate 101 having the electric heat converter 104 of an energy generator for a liquid jet recording head 100 is made up of a supporting base plate 102 and the smooth layer 103 of the base material. The surface roughness of the smooth layer 103 is controlled to be Ra<=0.1mum, where Ra is the average roughness of central line. The recessed and projected portions of the base plate 102 are buried and covered with the layer 103 to practically smoothen and flaten the uneven surface, and they are further covered with an upper layer 114, etc., without damaging the covering characteristics. As a result, a liquid jet recording head capable of stably maintaining good liquid droplets-forming characteristics for long periods of time and having improved durability can be formed.

Description

【発明の詳細な説明】 〔技術分野〕 本発明は、液体を噴射し、飛翔液滴を形成して記録を行
う液体噴射記録ヘッドに関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a liquid jet recording head that performs recording by jetting liquid and forming flying droplets.

〔従来技術〕[Prior art]

インクジェット記録法などの液体噴射記録法は、記録時
における騒音の発生が無視し得る程度に極めて小さく、
かつ高速記録が可能でアシ、シかも普通紙に定着という
特別な処理を必要とせずに記録が行える点で最近関心を
集めている。
Liquid jet recording methods such as inkjet recording generate very little noise during recording, which can be ignored.
It has recently attracted attention because it is capable of high-speed recording and can record without the need for special processing such as fixing reeds and edges on plain paper.

その中でも、例えば特開昭54−51837号公報、ド
イツ公開(DOLS )第2843064号公報に記載
されている液体噴射記録法は、熱エネルギーを液体に作
用させて、液滴吐出の為の原動力を得るという点におい
て、他の液体噴射記録法とは、異なる特徴を有している
Among them, for example, the liquid jet recording method described in Japanese Patent Application Laid-Open No. 54-51837 and German Opening Publication (DOLS) No. 2843064 applies thermal energy to the liquid to generate the driving force for ejecting droplets. This method has different characteristics from other liquid jet recording methods in terms of the amount of information obtained.

すなわち、上記の公報に開示されている記録法では、熱
エネルギーの作用を受けた液体が急激な体積の増大を伴
う状態変化を起し、その状態変化に基づく作用力によっ
て、記録ヘッド部先端のオリフイスから液体が吐出され
るが、そのときに形成される飛翔的液滴を被記録部材に
付着させるこる液体噴射記録法は、所謂drop−an
 demand記録法に極めて有効に適用されるばかシ
ではなく、記録ヘッド部をfull 1ineタイプで
高密度にマルチオリフィス化した記録ヘッドが容易に具
現化出来るので、高解像度、高品質の画像が高速で得ら
れるという特徴を有している。
That is, in the recording method disclosed in the above-mentioned publication, the liquid subjected to the action of thermal energy undergoes a state change accompanied by a sudden increase in volume, and the acting force based on this state change causes the tip of the recording head to change. A liquid jet recording method in which liquid is ejected from an orifice and flying droplets formed at that time are attached to a recording member is a so-called drop-an method.
This is not a stupid idea that is very effectively applied to the demand recording method, but it is possible to easily realize a recording head with a full 1ine type recording head and a high density multi-orifice, so it is possible to produce high-resolution, high-quality images at high speed. It has the characteristic that it can be obtained.

この記録法に適用される装置の記録ヘッド部は、液体を
吐出する為に設けられたオリアイスと、該オリフィスに
連通し、液滴を吐出する為の熱エネルギーが液体に作用
する部分である熱作用部を構成の一部とする液流路とを
有する液吐出部と、熱エネルギーを発生する手段として
の電気熱度一体とを具備している。
The recording head section of the apparatus applied to this recording method consists of an orifice provided for ejecting liquid, and a part that communicates with the orifice and where thermal energy acts on the liquid to eject droplets. It is equipped with a liquid discharge part having a liquid flow path of which the action part is a part of the structure, and an electric heat unit as a means for generating thermal energy.

しかして、この電気熱変換体は、一対の電極と、これ等
の電極に接続し、これ等の電極の間に発熱する領域の熱
発生部を有する発熱抵抗層とを具備している。
This electrothermal converter includes a pair of electrodes, and a heat generating resistor layer connected to these electrodes and having a heat generating portion in a heat generating region between these electrodes.

この様な液体噴射記録ヘッドの構造の典型的な例を第1
図(6)、及び第1図(B)に示す。
A typical example of the structure of such a liquid jet recording head is shown in the first example.
This is shown in Figure (6) and Figure 1 (B).

ここで、1は液体噴射用の記録ヘッドであシ、2はその
基板、3は記録用液体をヘッドに流通させるための液通
孔である。更に、基板2上には熱エネルギーを発生させ
る電気熱変換体4が所定の間隔で配設されていて、これ
らの電気熱変換4の三方を第1図(A)に示すよう々ジ
グザグ型の囲壁部材5で取囲むようにして所定深さおよ
び幅を有する液流路部6が、更にまたこの囲壁部材5と
周壁部材7とで液室部8が形設されている。
Here, 1 is a recording head for ejecting liquid, 2 is a substrate thereof, and 3 is a liquid passage hole for circulating recording liquid to the head. Furthermore, electrothermal converters 4 that generate thermal energy are arranged on the substrate 2 at predetermined intervals, and three sides of these electrothermal converters 4 are arranged in a zigzag shape as shown in FIG. 1(A). A liquid flow path portion 6 having a predetermined depth and width is surrounded by the surrounding wall member 5, and a liquid chamber portion 8 is formed by the surrounding wall member 5 and the peripheral wall member 7.

9は電気熱変換体4の上面すなわち変換体4が液体と接
触を保つ熱作用面4Aの直上方にあ九る吐出板lOの位
置に穿設されている液吐出孔すなわちオリフィスでアシ
、熱作用面4Aからこのオリフィス9までの間に介在す
る液流路部60部分には、電気熱変換体4からの発生熱
エネルギーの供給を受けた液に気泡を発生させてその体
積を急激に膨張させた)、収縮させたシする熱作用域6
Aが構成されている。
Reference numeral 9 denotes a liquid discharge hole, or orifice, which is bored at the position of the discharge plate 10 located directly above the upper surface of the electrothermal converter 4, that is, the heat acting surface 4A where the converter 4 maintains contact with the liquid. In the liquid flow path section 60 interposed between the working surface 4A and this orifice 9, bubbles are generated in the liquid that has been supplied with generated thermal energy from the electrothermal converter 4, and its volume is rapidly expanded. heat action area 6
A is configured.

更に電気熱変換体4は、第1図(B)に示すように基板
2の上面に取付けられた発熱抵抗層11と、この発熱抵
抗層11に通電させて発熱させるための共通電極12お
よび個々の電気熱変換体4に選択発熱させるための選択
電極13とで構成されておシ、とこで共通電極12およ
び選択電極13はそれぞれ部材5の両側に形成されてい
る液室部8から液流路部6にまたがるように配設されて
いる。
Furthermore, as shown in FIG. 1(B), the electrothermal converter 4 includes a heat generating resistor layer 11 attached to the upper surface of the substrate 2, a common electrode 12 for energizing the heat generating resistor layer 11 to generate heat, and individual electrodes. and a selection electrode 13 for selectively generating heat in the electrothermal converter 4, where the common electrode 12 and the selection electrode 13 are connected to the liquid flow from the liquid chamber 8 formed on both sides of the member 5, respectively. It is arranged so as to straddle the road section 6.

かくして、共通電極12と個々の選択電極13とが発熱
抵抗層11に電気的に接続されていることによシミ焦熱
変換体4が構成されるが、このようにして形成された電
気熱変換体4の上面および電極12.13の上面には更
に上部層14が形設されていて、この上部層工4によシ
発熱抵抗層11が熱作用域6Aを含む液流路部6に充満
している液と接触して化学的または物理的な反応を起さ
ないよう保饅していると共に、液を介して電極12と電
極13とが短絡するのを防止している。なお、以下の説
明では電気変換体4とその上面を覆蓋した上部層14の
部分を含めて熱発生部24といい更にまた熱作用域6ム
とオリフィス9とを含めて液吐出部25という。
In this way, the common electrode 12 and the individual selection electrodes 13 are electrically connected to the heating resistance layer 11, thereby forming the stain pyrothermal converter 4, and the electrothermal converter formed in this way Further, an upper layer 14 is formed on the upper surface of 4 and the upper surface of the electrode 12.13, and this upper layer 4 causes a heating resistance layer 11 to fill the liquid flow path section 6 including the heat action area 6A. This protects the electrodes 12 and 13 from causing a chemical or physical reaction when they come into contact with the liquid, and prevents the electrodes 12 and 13 from being short-circuited via the liquid. In the following description, the electric converter 4 and the upper layer 14 covering its upper surface are referred to as a heat generating section 24, and the heat acting area 6 and orifice 9 are also referred to as a liquid discharge section 25.

更にまた、上部層14u、隣接する電極間における電気
的リークを防止する役目をも荷っているもので殊に、各
選択電極13間に於ける電気的リークの防止、または各
液流路6下にある電極12や13が何等かの理由で電極
と液体とが接触し、これに通電することによって起る電
蝕の防止は、重要であって、この為にこの様な保護層的
機能を有する上部層14が少なくとも液流路下に於ける
電極12および13上にも設けられるようにしている。
Furthermore, the upper layer 14u also has the role of preventing electrical leakage between adjacent electrodes, and in particular, preventing electrical leakage between each selection electrode 13 or each liquid flow path 6. It is important to prevent electrolytic corrosion that occurs when the underlying electrodes 12 and 13 come into contact with liquid for some reason and are energized, and for this reason, such a protective layer function is required. The upper layer 14 having the same structure is also provided on at least the electrodes 12 and 13 below the liquid flow path.

特に、各液吐出部25に設けられている液流路部6は、
各液吐出部25の上流で、流路の一部を構成している共
通液室部8を介して連通されているが、各液吐出部25
に設けられた電気熱変換体4に接続されている電極12
および13は、その設計上の都合によシ、熱作用域6人
の上流側にあたる共通な液室部8の下を通る様に配設さ
れているので、この部分においても電極12および13
が液体と接触するのを防止する必要があった。
In particular, the liquid flow path section 6 provided in each liquid discharge section 25 is
Upstream of each liquid discharge part 25, each liquid discharge part 25 communicates with each other via a common liquid chamber part 8 that constitutes a part of the flow path.
An electrode 12 connected to an electrothermal converter 4 provided in
Due to design considerations, the electrodes 12 and 13 are disposed so as to pass under the common liquid chamber 8, which is the upstream side of the six heat-acting areas.
It was necessary to prevent the liquid from coming into contact with the liquid.

しかしながら、このように構成された液体噴射記録ヘッ
ドでは上記の上部層14に対して要求される特性が設け
られる場所に依ってそれぞれ異なっている。
However, in the liquid jet recording head configured in this way, the characteristics required for the above-mentioned upper layer 14 differ depending on the location where it is provided.

すなわち、例えば熱発生部24においては、特性として
耐熱性、耐液性、液浸透防止性、熱伝導性、酸化防止性
及び耐破傷性に優れていることが要求され、熱発生部2
4以外の領域においては熱的条件で緩和されるが液浸透
防止性、耐液性及び耐破傷性に拡充公使れていることが
要求される。
That is, for example, the heat generating part 24 is required to have excellent properties such as heat resistance, liquid resistance, liquid permeation prevention property, thermal conductivity, antioxidant property, and tear resistance.
In areas other than 4, although they can be alleviated by thermal conditions, they are required to have enhanced liquid penetration prevention properties, liquid resistance, and puncture resistance.

ところで、上述した特性の総てを所望通シに充分満足す
るような上部層14の構成材料は、今のところなくこれ
らの特性のうち幾つかを緩和して使用しているのが現状
である。
By the way, at present, there is no material for forming the upper layer 14 that fully satisfies all of the above-mentioned characteristics as desired, and the material is currently used with some of these characteristics relaxed. .

すなわち、熱発生部24においては、耐熱性、熱伝導性
および酸化防止性に優先が置かれ、他方熱発生部24以
外の例えば電極被覆部においては、耐液性、液浸透防止
性および耐破傷性が優先条件となる。
That is, in the heat generating section 24, priority is given to heat resistance, thermal conductivity, and anti-oxidation properties, while on the other hand, in areas other than the heat generating section 24, for example, the electrode covering section, liquid resistance, liquid penetration prevention properties, and breakage resistance are prioritized. Vulnerability becomes a priority condition.

また、一方の基板2は、安価な点、IJII工性の良い
点、電気的絶縁性および、熱伝導率の良い点などからセ
ラミックス等の基板材料が適しているが、セラミックス
基板の場合は、その表面に、微細な凸凹が形成されるの
で、その段差の部分で上部層14の被覆性が保持しにく
い。
In addition, for one of the substrates 2, a substrate material such as ceramics is suitable because of its low cost, good workability, electrical insulation, and good thermal conductivity, but in the case of a ceramic substrate, Since fine irregularities are formed on the surface, it is difficult to maintain coverage of the upper layer 14 at the stepped portions.

すなわち、この基板表面の粗さに対して上部層14の被
覆性が悪いとその部分から液体の浸透が起こシ、電蝕若
しくは、電気的絶縁破壊を起こす誘因となる。
That is, if the coverage of the upper layer 14 is poor with respect to the roughness of the substrate surface, liquid may penetrate from that portion, causing electrolytic corrosion or electrical breakdown.

そこで、これらのことを配慮すると、基板2の表面とし
ては、少なくとも電極12および13や発熱抵抗層11
の接液する部位における上部層14の被覆性が損われな
いだけの平滑性が必要とされる0 しかるに蔦従来の液体噴射記録ヘッドでは、このような
要求の総てが満足できる基板2や上部層14を具え、使
用耐久性が総合的に保証できる優れたものがなかった。
Therefore, taking these things into consideration, the surface of the substrate 2 should include at least the electrodes 12 and 13 and the heating resistor layer 11.
However, in the conventional liquid jet recording head, the substrate 2 and the upper layer 14 are required to have a smoothness that does not impair the coverage of the upper layer 14 at the portions that come into contact with the liquid. There has been no excellent product that has layer 14 and can guarantee overall durability in use.

〔目 的 〕〔the purpose 〕

本発明の目的は上述した諸点に鑑みて、頻繁なる繰返し
使用や長時間の連続使用において総合的な耐久性に優れ
、初期の良好な液滴形成特性を長期にわたって安定的に
維持し得る液体噴射記録ヘッドを提供することにある。
In view of the above-mentioned points, the object of the present invention is to provide a liquid jet that has excellent overall durability in frequent repeated use and long-term continuous use, and is capable of stably maintaining good initial droplet formation characteristics over a long period of time. The purpose is to provide a recording head.

更に、本発明の他の目的は、製造加工上に於ける信頼性
の高い液体噴射記録ヘッドを提供することにある。
Furthermore, another object of the present invention is to provide a liquid jet recording head that is highly reliable in manufacturing and processing.

更にまた、マルチオリフィス化した場合にも製造歩留シ
の高い液体噴射記録ヘッドを提供することにある。
Furthermore, it is an object of the present invention to provide a liquid jet recording head that has a high manufacturing yield even when it has multiple orifices.

〔構成〕〔composition〕

かかる目的を達成するために、本発明では、液体を吐出
して飛翔的液滴を形成する為のオリフィスと、該オリフ
ィスに連通する液流路と、該液流路に沿って基体上に設
けられ、前記液滴を形成する為に利用されるエネルギー
を発生するエネルギー発生体とを有する液体噴射記録ヘ
ッドにおいて、前記エネルギー発生体が設けられる基体
の表面粗さがJIS規格で、中心線平均の粗さRaにお
いてRa≦0.1μmである事を特徴とするものである
0 〔実施例〕 以下に、図面に基づいて本発明の詳細な説明する。
In order to achieve such an object, the present invention provides an orifice for ejecting liquid to form flying droplets, a liquid flow path communicating with the orifice, and a liquid flow path provided on a substrate along the liquid flow path. In a liquid jet recording head having an energy generating body that generates energy used to form the droplets, the surface roughness of the substrate on which the energy generating body is provided is JIS standard, and the center line average The roughness Ra is characterized in that Ra≦0.1 μm. [Example] The present invention will be described in detail below based on the drawings.

第2図(ト)および(J3)は本発明の一実施例を示し
、本例の液体噴射記録ヘッド100では基板101を支
持基板102と平滑層103とで構成する。そこで、支
持基板102については従来と同様に、例えばセラミッ
クス、樹脂系材料または金属などで形成してもよく、そ
の上部表面の粗度は粗いものでよい。
FIGS. 2(G) and 2(J3) show an embodiment of the present invention. In the liquid jet recording head 100 of this embodiment, the substrate 101 is composed of a support substrate 102 and a smooth layer 103. Therefore, the support substrate 102 may be formed of, for example, ceramics, a resin material, or metal, as in the conventional case, and the roughness of its upper surface may be rough.

この支持基板102の上部表面上における少なくとも記
録用液体と関連がある部分にわたシ平滑層103を形成
するが、この平滑層103は従来例での上部層14が基
板2の上面の凹凸のためにその被覆性が損われていたの
を防止するために設けるものでアシ、材料としては後述
するようなガラス系セラミックスや有機樹脂等が好適で
、これらの材料によシ、例えば印刷法によって得られる
グレーズ層などの平滑な面が表面上に得られるようにす
る0 そこで、このような平滑面としてめられる粗さはJIS
に規定されている中心線平均粗さにおいて0.1μm以
下に保持されることが望ましい。すなわち、この平滑層
103を設けることによって、支持基板102上の凹部
を埋め更に凸部をも被覆してその凹凸を平滑にするもの
で、かくすることによシ、この上面に発熱抵抗層111
を装着し、更に発熱抵抗層111の上面に共通電極12
および選択電極13を配設して、これらの電極12およ
び13によシ被扱されない抵抗層111の部分ならびに
電極12および13上に上部層114を完全な被覆状態
を保つように被装することができる。
A smooth layer 103 is formed on the upper surface of the supporting substrate 102 at least in a portion related to the recording liquid. This is provided to prevent the coating properties from being damaged during the process, and suitable materials include glass-based ceramics and organic resins, which will be described later. Therefore, the roughness required for such a smooth surface is determined by JIS.
It is desirable that the centerline average roughness is maintained at 0.1 μm or less as defined in . That is, by providing this smooth layer 103, it fills in the recesses on the support substrate 102 and also covers the convex parts to smooth out the irregularities.
A common electrode 12 is mounted on the upper surface of the heating resistance layer 111.
and selective electrodes 13 are disposed, and the upper layer 114 is completely coated on the portions of the resistive layer 111 not covered by these electrodes 12 and 13 and on the electrodes 12 and 13. I can do it.

なお、この平滑層103は、熱発生部124から発生す
る熱が支持基板102側に流れるのを制御する役目をも
担持するもので、熱作用域25において液体に熱エネル
ギーを供給して作用させる場合には、熱発生部124か
ら発生する熱をできるだけ熱発生部124側に多く導く
ようになし、電気熱変換体104への通電をしゃ断した
場合に線熱発生部124に残留している熱を支持基板1
02側に速やかに逃す機能を有する。
Note that this smooth layer 103 also has the role of controlling the flow of heat generated from the heat generating section 124 toward the support substrate 102, and supplies thermal energy to the liquid in the heat action area 25 to act on it. In this case, the heat generated from the heat generating section 124 is guided as much as possible to the heat generating section 124 side, so that when the electricity to the electrothermal converter 104 is cut off, the heat remaining in the linear heat generating section 124 is removed. Supporting board 1
02 side has a function to quickly escape.

そこで、このような機能を発揮させるに好適な平滑層1
03の構成材料としては、ガラスSingの他に酸化ジ
ルコニウム、酸化タンタル、酸化マグネシウム、酸化ア
ルミニウム等の金属酸化物に代表される無機質材料が挙
げられる。
Therefore, smooth layer 1 suitable for exhibiting such functions
In addition to glass Sing, the constituent materials of 03 include inorganic materials typified by metal oxides such as zirconium oxide, tantalum oxide, magnesium oxide, and aluminum oxide.

さらには、アクリル系樹脂、環化ブタジェン系ゴム、ポ
リイミド系樹脂、シリコン2ダー系樹脂等の有機絶縁物
に代表される有機質材料でもよい。
Furthermore, organic materials such as organic insulators such as acrylic resins, cyclized butadiene rubbers, polyimide resins, and silicone 2 resins may also be used.

なおその製造方法としては、印刷法、スパッタリング法
、蒸着法、CvD法、気相反応法、液体コーティング法
、溶射法等で形成することが出来、一般に、その粗さは
Raで0.1μm以下、好ましくはRaで0.03μm
以下とされることが望ましい。
The manufacturing method can be a printing method, a sputtering method, a vapor deposition method, a CvD method, a gas phase reaction method, a liquid coating method, a thermal spraying method, etc., and the roughness is generally 0.1 μm or less in Ra. , preferably 0.03 μm in Ra
It is desirable that it is as follows.

更にまた、本例では上部層114を構成する材料として
、上述したような無機質材料の他に酸化チタン、酸化バ
ナジウム、酸化ニオブ、酸化モリブデン、酸化タンタル
、酸化タングステン、酸化クロム、酸化ジルコニウム、
酸化ハフニウム、酸化ランタン、酸化イツトリウム、酸
化マンガン等の遷移金属酸化物、更に酸化アルミニウム
、酸化カルシウム、酸化ストロンチウム、酸化バリウム
、酸化シリコン、等の金属酸化物及びそれらの複合体、
窒化シリコン、窒化アルミニウム、窒化ボロン、窒化タ
ンタル等高抵抗窒化物及びこれら酸化物、窒化物の複合
体、更にアモルファスシリコン、アモルファスセレン等
の半導体などバルクでは低抵抗であってもスパッタリン
グ法、CvD法、蒸着法、気相反応法、液体コーティン
グ法等の製造過程で高抵抗化し得る薄膜材料を挙げると
とが出来、その層厚としては一般に0.1μm〜5μm
1好ましくは0.2μm〜3pm とするのが望ましい
Furthermore, in this example, in addition to the above-mentioned inorganic materials, materials constituting the upper layer 114 include titanium oxide, vanadium oxide, niobium oxide, molybdenum oxide, tantalum oxide, tungsten oxide, chromium oxide, zirconium oxide,
Transition metal oxides such as hafnium oxide, lanthanum oxide, yttrium oxide, and manganese oxide; metal oxides such as aluminum oxide, calcium oxide, strontium oxide, barium oxide, and silicon oxide; and complexes thereof;
High-resistance nitrides such as silicon nitride, aluminum nitride, boron nitride, tantalum nitride, composites of these oxides and nitrides, and semiconductors such as amorphous silicon and amorphous selenium can be processed using sputtering and CvD methods even if they have low resistance in bulk. Thin film materials that can be made highly resistive through manufacturing processes such as vapor deposition, vapor phase reaction, and liquid coating are listed below, and the layer thickness is generally 0.1 μm to 5 μm.
1, preferably 0.2 μm to 3 pm.

なお、発熱抵抗層111を構成する材料としては、通電
されることによって、所望通シの熱が発生するものであ
れば大概のものを採用することができる0 そこで、材料としては、例えば窒化タンタル、ニクロム
、銀−パラジウム合金、シリコン半導体、或イハ、ハフ
ニウム、ランタン、ジルコニウム、チタン、タンタル、
タングステン、モリブデン、ニオブ、クロム、バナジウ
ム等の金属の硼化物等が好ましいものとして挙げられる
As the material constituting the heating resistance layer 111, almost any material can be used as long as it generates a desired amount of heat when energized.Therefore, as the material, for example, tantalum nitride, , nichrome, silver-palladium alloy, silicon semiconductor, Iha, hafnium, lanthanum, zirconium, titanium, tantalum,
Preferred examples include borides of metals such as tungsten, molybdenum, niobium, chromium, and vanadium.

これ等の発熱抵抗層111を構成する材料のうち、殊に
金属硼化物を優れたものとして挙げることが出来、その
中でも最も特性の優れているのが硼化ハフニウムでアシ
、次いで硼化ジルコニウム、硼化ランタン、硼化タンタ
ル、硼化バナジウム、硼化ニオブの順となっている。
Among these materials constituting the heating resistance layer 111, metal borides are particularly excellent. Among them, hafnium boride has the best properties, followed by zirconium boride, The order is lanthanum boride, tantalum boride, vanadium boride, and niobium boride.

発熱抵抗層111は、上記の材料を使用して、電子ビー
ム蒸着やスパッタ/リング等の手法を用いて形成するこ
とが出来る。
The heat generating resistor layer 111 can be formed using the above-mentioned materials by techniques such as electron beam evaporation and sputtering/ring.

また、電極12および13を構成する材料としては、例
えば、At、Ta、Ti、Mg、 Hf、 Zr 。
Furthermore, examples of the materials constituting the electrodes 12 and 13 include At, Ta, Ti, Mg, Hf, and Zr.

V、W、No、Nb、Si等及びこれらの合金を挙げる
ことができ、これらを使用して、蒸着、スパッタ、Cv
D等の手法で、所定位置に所定の大きさ、形状、厚さと
する。
V, W, No, Nb, Si, etc. and their alloys can be mentioned, and these can be used for vapor deposition, sputtering, Cv
A method such as D is used to provide a predetermined size, shape, and thickness at a predetermined position.

更にまた、覆蓋板10.囲壁部材5および周壁部材7を
構成する材料としては、記録ヘッドの作製時、あるいは
使用時の環境下においてその形状に熱的影響を受けない
か若しくはほとんど受けないものであって、使用中の液
体によっても影響を受けないものかほとんど受けないも
のであることが要求される。さらに微細精密加工が容易
に適用可能であると共に面精度が所望通シ容易に得られ
、かつ、それ等によって形成される流路中を液体がスム
ーズに流れ得る様に加工し得るものであれば、大概のも
のが有効である。
Furthermore, the cover plate 10. The materials constituting the surrounding wall member 5 and the surrounding wall member 7 are those whose shape is not or hardly affected by heat during the production of the recording head or under the environment during use, and whose shape is not affected by heat or is hardly affected by the liquid during use. It is required that it be unaffected by, or hardly influenced by, Furthermore, if micro-precision machining can be easily applied, the desired surface accuracy can be easily obtained, and the liquid can be processed so that the liquid can flow smoothly through the flow path formed by them. , most of them are valid.

例えば、感光性樹脂、感光性ガラス、メッキ、電鋳、ス
クリーン印刷等によって形成することができ、更にまた
、吐出板10、囲壁部材5および周壁部材7の材料や成
形手法は必要に応じて個々に上記のような材料、手法の
うちから選択すればよいことは勿論である。
For example, they can be formed by photosensitive resin, photosensitive glass, plating, electroforming, screen printing, etc. Furthermore, the materials and molding methods of the discharge plate 10, the surrounding wall member 5, and the surrounding wall member 7 may be changed as necessary. Of course, the materials and methods described above may be selected.

〔実施例〕〔Example〕

次に、本発明の液体噴射記録ヘッドの好適な一つの作製
手順を一例として説明する。
Next, one preferred procedure for manufacturing the liquid jet recording head of the present invention will be described as an example.

本例では4X3cInのアルミナセラミックの支持基板
102上に印刷法によシ、グレーズ層を平滑層103と
して厚さ30μmで基板中央部3×2CMの範囲に焼成
し基板101とした0この基板101にスノ(ツタによ
り発熱抵抗層111としてホウ化)・フニウムHfB 
、を150OA の厚みに形成し、続いて電子ビーム蒸
着によpTi層50A、At層5000 Aを連続的に
堆積した。
In this example, a 4 x 3 cIn alumina ceramic support substrate 102 was printed using a printing method, and a glaze layer was made into a smooth layer 103 and fired to a thickness of 30 μm in an area of 3 x 2 cm at the center of the substrate to form a substrate 101. Snow (boronized as heat generating resistance layer 111 by ivy) Funium HfB
, was formed to a thickness of 150 OA, and then a pTi layer of 50 A and an At layer of 5000 A were successively deposited by electron beam evaporation.

ついで7オトリソエ程によシ、電極層、発熱抵抗層の?
(ターンを順次にエツチングによって形成し、30μm
幅、150μm長の熱作用面、のサイドとし、At電極
の抵抗を含めて120オームとした。
Next, what about the electrode layer and heating resistor layer?
(Turns are formed by sequential etching, with a thickness of 30 μm.
The width and side of the heat-active surface were 150 μm long, and the resistance including the At electrode resistance was 120 Ω.

さらに2酸化けい素SiO□ を上部層114としてハ
イレートスパッタによシ20μm堆積させ、液体噴射記
録ヘッドの基板101を形成した。次にレーザ加工によ
51Vm径の液体供給用口3を2ケ所基板101に設け
、次に板厚50μm1パーマネントタイプ/感光性樹脂
を基板101に積層した。かくしてこの感光性樹脂から
所望の液流路部6や液室部8の形状を7オトリソエ程に
よシエッチング加工し、(流路中80μm、液室巾0.
7wL)、その上部に50μm径の吐出孔9をあらかじ
め加工しおいた板厚30μmのNi電鋳板を覆蓋板10
として電気熱変換体104の上部に吐出孔9が来るよう
にして接着し、以て液体噴射記録ヘッド100を得た。
Furthermore, silicon dioxide (SiO□) was deposited as an upper layer 114 to a thickness of 20 μm by high-rate sputtering to form the substrate 101 of the liquid jet recording head. Next, two liquid supply ports 3 with a diameter of 51 Vm were provided on the substrate 101 by laser machining, and then a permanent type/photosensitive resin with a thickness of 50 μm was laminated on the substrate 101. Thus, the desired shapes of the liquid flow path section 6 and the liquid chamber section 8 are etched from this photosensitive resin in 7 etching steps (flow path is 80 μm, liquid chamber width is 0.5 μm).
7wL), and a cover plate 10 is made of a Ni electroformed plate with a thickness of 30 μm, on which a discharge hole 9 with a diameter of 50 μm has been previously machined.
Then, the electrothermal transducer 104 was bonded so that the ejection holes 9 were located above it, thereby obtaining a liquid jet recording head 100.

なお、以上の例では、平滑層103を記録用液体にして
もよく、マた、接液する部分のみとして例えば、囲壁部
材5や周壁部材7の下部には設けていない構造であって
も、同様な効果が得られることは勿論である。さらには
、電極パターンと同じような微細加工が可能な場合は、
電極12.13および発熱抵抗層111の下部のみとす
ることもできるO 更にまた、本実施例では、電気熱変換体104に対して
吐出方向が垂直であるいわゆるサイドシュータ−型であ
るが、電気熱変換体104に対して吐出方向が平行ない
わゆるエッヂシュータ−型の液体噴射記録ヘッドにおい
ても同様な効果が得られることはいうまでもない。
In addition, in the above example, the smooth layer 103 may be a recording liquid, or it may be provided only in the portion that comes into contact with the liquid, for example, and not in the lower part of the surrounding wall member 5 or the surrounding wall member 7. Of course, similar effects can be obtained. Furthermore, if microfabrication similar to the electrode pattern is possible,
Further, in this embodiment, the discharge direction is perpendicular to the electrothermal converter 104, which is a so-called side shooter type, but the electric It goes without saying that similar effects can be obtained in a so-called edge shooter type liquid jet recording head in which the ejection direction is parallel to the heat converter 104.

また、その上部層114に必要であれば、欠陥部保護の
だめの有機樹脂層を更に設けても良く、さらに耐キャビ
テーションを向上させるために金属層を積層するように
しても良い。
Further, if necessary, an organic resin layer for protecting defective portions may be further provided on the upper layer 114, and a metal layer may be laminated to further improve cavitation resistance.

本発明者紘、実験によ)この様に作成した記録ヘッドの
電気熱変換体104に10μSの30Vの矩形電圧を8
00 Hzで印加し、印加信号に応じて液体がオリフィ
スから吐出されて、飛翔的液滴が安定的に形成できるこ
とを確認した。すなわち従来の平面平滑度の劣悪な基板
を用いた記録ヘッドにおいては、この様な液滴の形成を
繰シ返すと、At電極、HfB、抵抗体の電蝕や、抵抗
体の抵抗変化率が大きく、電極間の絶縁破壊による断線
、抵抗値の増大が発生して、インクを吐出しなくなるが
、本例ではそのような故障を防止することができて、か
かる繰返し回数すなわち耐久回数を向上させることがで
きる。
The present inventor, Hiro, conducted an experiment to apply a 30V rectangular voltage of 10μS to the electrothermal transducer 104 of the recording head created in this way.
It was confirmed that the liquid was ejected from the orifice in accordance with the applied signal and that flying droplets could be stably formed. In other words, in a conventional recording head using a substrate with poor planar smoothness, repeated formation of such droplets can cause electrolytic corrosion of the At electrode, HfB, and resistor, and increase the rate of change in resistance of the resistor. Generally speaking, disconnection due to dielectric breakdown between the electrodes and an increase in resistance value occur, causing ink to no longer be ejected, but in this example, such failures can be prevented and the number of repetitions, that is, the number of durability can be increased. be able to.

さらにまた、このような従来の平滑度の劣悪な基板を用
いると、製造時における歩留シも低下する。その大きな
要因は、抵抗値の不ぞろいや電極、抵抗体の短絡さらに
は、平滑でない為にパターンの境界が見きわめにくいこ
とがらくる作業ミス等によるものであるが、本発明によ
れば、製造時の歩留シ向上にも貢献する。
Furthermore, when such a conventional substrate with poor smoothness is used, the yield during manufacturing is also reduced. The main causes of this are irregularities in resistance values, short circuits between electrodes and resistors, and work errors that make it difficult to see the boundaries of patterns because they are not smooth.According to the present invention, however, it is possible to It also contributes to improving yield.

なお次の第1表に基板表面の平滑度と歩留シ及び耐久回
数を比較した例を示す。
Table 1 below shows an example comparing the smoothness of the substrate surface, the yield rate, and the number of durability cycles.

表1 ◎ 90チ以上 Q 70%以上 Δ 50%以上× 
50チ以上 第1表の結果から明らかなように、平滑な層を設けた本
発明のヘッドでは耐久回数109回を安定して達成する
ことが出来た。
Table 1 ◎ 90 inches or more Q 70% or more Δ 50% or more ×
As is clear from the results in Table 1, the head of the present invention provided with a smooth layer was able to stably achieve a durability of 109 times.

〔効果〕〔effect〕

以上説明してきたように、液体噴射記録ヘッドの基板の
平滑性は接液部において非常に重要であシ、本発明によ
れば、表面が粗い支持基板面上にその中心線平均あらさ
Raが0.1μm以下の表面が形成可能な平滑層を設け
たことによシ、頻繁なる繰返し使用や長時間の連続使用
においても総合的な耐久性に優れ、初期の良好な液滴形
成特性を長期に亘って安定的に維持し得る液体噴射記録
ヘッドを提供することが可能となった。
As explained above, the smoothness of the substrate of a liquid jet recording head is very important in the liquid contact part, and according to the present invention, the center line average roughness Ra can be set to 0 on the surface of the supporting substrate having a rough surface. .By providing a smooth layer that can form a surface of 1 μm or less, it has excellent overall durability even after frequent repeated use and long-term continuous use, and maintains its initial good droplet formation properties over a long period of time. It has now become possible to provide a liquid jet recording head that can be stably maintained over a long period of time.

更にまた、本発明によれば、製造加工上の歩留シと共に
、その使用上の信頼性を従来に比し著しく高めることが
できる。
Furthermore, according to the present invention, it is possible to significantly improve the yield in manufacturing and processing as well as the reliability in use compared to the prior art.

なお、本発明の適用は複数の液体噴射用オリアイスを有
する記録ヘッドに限られるものではなく、単一のオリフ
ィスを設けた記録ヘッドにも適用できることはいうまで
もない。
It goes without saying that the application of the present invention is not limited to a recording head having a plurality of liquid ejecting orifices, but can also be applied to a recording head provided with a single orifice.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(A)は従来の液体噴射記録ヘッドの構成の一例
を模型的に分解して示す斜視図、 第1図φンはそのX−X線断面図、 第2図(ト)は本発明液体噴射記録ヘッドの構成の一例
を模型的に分解して示す斜視図、 第2図(B)はそのY−Y線断面図である。 1 、100・・・ 記録ヘッド 2 、101 、102・・・ 基板 3・・・ 流通孔 4 、104・・・ 電気熱変換体 4A・・・ 熱作用面 5・・・ 囲壁部材 6・・ 液流路部 6A・・ 熱作用域 7・・・ 周壁部材 8・・・液室部 9・・・オリフィス 10・・・吐出板 11.111・・・ 発熱抵抗層 12.13・・ 電極 14.114・・・ 上部層 24 、124・・・ 熱発生部 25・・・ 液吐出部。
FIG. 1(A) is a perspective view schematically showing an example of the configuration of a conventional liquid jet recording head, FIG. FIG. 2B is a perspective view schematically showing an example of the configuration of the liquid jet recording head according to the invention, and FIG. 2B is a cross-sectional view taken along the line Y-Y. 1, 100... Recording heads 2, 101, 102... Substrate 3... Distribution holes 4, 104... Electrothermal converter 4A... Heat acting surface 5... Surrounding wall member 6... Liquid Flow path section 6A... Heat action area 7... Surrounding wall member 8... Liquid chamber section 9... Orifice 10... Discharge plate 11.111... Heat generating resistance layer 12.13... Electrode 14. 114... Upper layer 24, 124... Heat generating section 25... Liquid discharge section.

Claims (1)

【特許請求の範囲】 液体を吐出して飛翔的液滴を形成する為のオリフィスと
為該オリフィスに連通ずる液流路と、該液流路に活って
基体上に設けられ、前記液滴を形成する為に利用される
エネルギーを発生するエネルギー発生体とを有する液体
噴射記録ヘッドにおいて、前記エネルギー発生体が設け
られる基体の表面粗さがJIS規格で、中心線平均の粗
さRaにおいてRa≦0.1μmである事を特徴とする
液体噴射記録ヘッド。 (以下余白)
[Scope of Claims] An orifice for discharging a liquid to form flying droplets; a liquid flow path communicating with the orifice; In a liquid jet recording head having an energy generating body that generates energy used for forming the energy generating body, the surface roughness of the substrate on which the energy generating body is provided is JIS standard, and the center line average roughness Ra is Ra. A liquid jet recording head characterized in that the particle diameter is ≦0.1 μm. (Margin below)
JP5952384A 1984-03-29 1984-03-29 Liquid jet recording head Pending JPS60203452A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5952384A JPS60203452A (en) 1984-03-29 1984-03-29 Liquid jet recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5952384A JPS60203452A (en) 1984-03-29 1984-03-29 Liquid jet recording head

Publications (1)

Publication Number Publication Date
JPS60203452A true JPS60203452A (en) 1985-10-15

Family

ID=13115707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5952384A Pending JPS60203452A (en) 1984-03-29 1984-03-29 Liquid jet recording head

Country Status (1)

Country Link
JP (1) JPS60203452A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5610470A (en) * 1979-07-04 1981-02-02 Canon Inc Liquid drop jetting type recording device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5610470A (en) * 1979-07-04 1981-02-02 Canon Inc Liquid drop jetting type recording device

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