JPS60206655A - Liquid jet recording head - Google Patents

Liquid jet recording head

Info

Publication number
JPS60206655A
JPS60206655A JP6410484A JP6410484A JPS60206655A JP S60206655 A JPS60206655 A JP S60206655A JP 6410484 A JP6410484 A JP 6410484A JP 6410484 A JP6410484 A JP 6410484A JP S60206655 A JPS60206655 A JP S60206655A
Authority
JP
Japan
Prior art keywords
liquid
substrate
recording head
flow path
jet recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6410484A
Other languages
Japanese (ja)
Inventor
Masami Ikeda
雅実 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP6410484A priority Critical patent/JPS60206655A/en
Publication of JPS60206655A publication Critical patent/JPS60206655A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14016Structure of bubble jet print heads
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14387Front shooter
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01Embodiments of or processes related to ink-jet heads
    • B41J2202/03Specific materials used

Abstract

PURPOSE:To maintain stabilized characteristics of liquid drop formation of an initial stage for a long time by establishing a surface roughness of the portion, at least, in which a liquid flow path in a substrate is provided as Ra<=0.1mum where an average roughness of the centerline according to Japanese Industrial Standard is Ra. CONSTITUTION:Pertaining to a liquid jet recording head of the type in which liquid drips are formed and discharged by an electrothermal converter 4, by maintaining the surface smoothness of a substrate below 0.1mum when an average roughness is Ra by the indication as defined by JIS (Japanese Industrial Standard), an overall durability is enhanced and yield rate of production is improved. The portion in which the surface roughness Ra is maintained below 0.1mum may be the whole surface area of the substrate, but the portions that are necessary for durability and production process are the areas under electrodes 12,13 or a heat generating resistor layers 11 that have a probability of contacting the liquid, and for the practical purposes it is sufficient enough to keep the surface smooth where there are concerned with the liquid such as a liquid chamber, liquid flow path, etc.

Description

【発明の詳細な説明】 〔技術分野〕 本発明は、液体を噴ン飛翔液滴を形成して記録を行う液
体噴射記録ヘッドに関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a liquid jet recording head that performs recording by jetting liquid to form flying droplets.

〔従来技術〕[Prior art]

インクジェット記録法などの液体噴射記録法は、記録時
における騒音の発生が無視し得る程度に極めて小さく、
かつ高速記録が可能であシ、シかも所甜普通紙に定着と
いう特別な処理を必要とせずに記録が行える点で最近関
心を集めている。
Liquid jet recording methods such as inkjet recording generate very little noise during recording, which can be ignored.
It has recently attracted attention because it is capable of high-speed recording and can be recorded on plain paper without the need for special processing such as fixing.

その中でも、例えば特開昭54−51837号公報、ド
イツ公開(DOLS )第2843064号公報に記載
されている液体噴射記録法は、熱エネルギーを液体に作
用させて、液滴吐出の為の原動力を得るという点におい
て、他の液体噴射記録法とは、異なる特徴を有している
Among them, for example, the liquid jet recording method described in Japanese Patent Application Laid-Open No. 54-51837 and German Opening Publication (DOLS) No. 2843064 applies thermal energy to the liquid to generate the driving force for ejecting droplets. This method has different characteristics from other liquid jet recording methods in terms of the amount of information obtained.

すなわち、上記の公報に開示されている記録法では、熱
エネルギーの作用を受けた液体が急激な体積の増大を伴
う状態変化を起し、その状態変化に基づく作用力によっ
て、記録ヘッド部先端のオリフイスから液体が吐出され
るが、そのときに形成される飛翔的液滴を被記録部材に
付着させることにより記録が行われる。
That is, in the recording method disclosed in the above-mentioned publication, the liquid subjected to the action of thermal energy undergoes a state change accompanied by a sudden increase in volume, and the acting force based on this state change causes the tip of the recording head to change. Liquid is ejected from the orifice, and recording is performed by making flying droplets that are formed at this time adhere to a recording member.

殊に、DOL32843064号公報に開示されている
液体噴射記録法は、所1ii1 drop−on de
manclオリフィス化した記録ヘッドが容易に具現化
出来るので、高解像度、高品質の画像が高速で得られる
という特徴を有している。
In particular, the liquid jet recording method disclosed in DOL32843064 is
Since a recording head with a mancl orifice can be easily implemented, it has the feature that high resolution and high quality images can be obtained at high speed.

この記録法に適用される装置の記録ヘッド部は、液体を
吐出する為に設けられたオリフィスと、該オリフィスに
連通し、液滴を吐出する為の熱エネルギーが液体に作用
する部分である熱作用部を構成の一部とする液流路とを
有する液吐出部と、熱エネルギーを発生する手段として
の電気熱変換体とを具備している。
The recording head section of the device applied to this recording method includes an orifice provided for ejecting liquid, and a heat exchanger that communicates with the orifice and is a part where thermal energy acts on the liquid to eject droplets. The apparatus includes a liquid discharge part having a liquid flow path of which the action part is a part of the structure, and an electrothermal converter as a means for generating thermal energy.

しかして、この電気熱変換体は、一対の電極と、これ等
の電極に接続し、これ等の電極の間に発熱する一瀬域の
熱発生部を有する発熱抵抗層とを具備している。
This electrothermal converter includes a pair of electrodes, and a heat generating resistor layer connected to these electrodes and having a heat generating part in the Ichinose region that generates heat between these electrodes.

この様な液体噴射記録ヘッドの措造の典型的な例を第1
図(A)、及び第1図(B)に示す。
A typical example of the structure of such a liquid jet recording head is shown in the first example.
It is shown in Figure (A) and Figure 1 (B).

ここで、1は液体噴射用の記録ヘッドであシ、2はその
基板、3は記録用液体をヘッドに流通させるだめの流通
孔である。更に、基板2上には熱エネルギーを発生させ
る電気熱変換体4が所定の間隔で配設されていて、これ
らの電気熱変換4の三方を第1図(A)に示すようなジ
グザグ型の囲壁部材5で取囲むようにして、所定深さお
よび幅を有する液流路部6が、更にまたとの囲壁部材5
と周壁部材7とで液室部8が形設されている。
Here, 1 is a recording head for ejecting liquid, 2 is a substrate thereof, and 3 is a communication hole through which a recording liquid flows to the head. Furthermore, electrothermal converters 4 that generate thermal energy are arranged at predetermined intervals on the substrate 2, and three sides of these electrothermal converters 4 are arranged in a zigzag shape as shown in FIG. 1(A). A liquid flow path section 6 having a predetermined depth and width is further surrounded by the surrounding wall member 5 and has a predetermined depth and width.
A liquid chamber portion 8 is formed by the peripheral wall member 7 and the peripheral wall member 7.

9は電気熱変換体4の上面す々わち変換体4が液体と接
触を保つ熱作用面4Aの直上方にあたる吐出板10の位
置に穿設されている液吐出孔すなわちオリフィスであシ
、熱作用面4Aからとのオリフィス9までの間に介在す
る液流路部6の部分には、電気熱変換体4からの発生熱
エネルギーの供給を受けた液に気泡を発生させてその体
積を急 ′激に膨張させたシ、収縮させたルする熱作用
域6Aが構成されている。
Reference numeral 9 denotes a liquid discharge hole, that is, an orifice, which is formed at the upper surface of the electrothermal converter 4, that is, at the position of the discharge plate 10, which is directly above the heat acting surface 4A where the converter 4 maintains contact with the liquid. In the portion of the liquid flow path section 6 interposed between the heat acting surface 4A and the orifice 9, bubbles are generated in the liquid that has been supplied with generated thermal energy from the electrothermal converter 4 to increase its volume. A heat action area 6A is configured to cause rapid expansion and contraction.

更に電気熱変換体4は、第1図(J3)に示すように基
板2の上面に取付けられた発熱抵抗層11と、この発熱
抵抗層11に通電させて発熱させるための共通電極12
および個々の電気熱変換体4 FL選択発熱させるだめ
の選択電極13とで構成されておシ、ここで共通電極1
2および選択電極13はそれぞれ部材5の両側に形成さ
れている液室部8から液流路部6にまたがるように配設
されている。
Further, the electrothermal converter 4 includes a heat generating resistor layer 11 attached to the upper surface of the substrate 2 as shown in FIG.
and an individual electrothermal converter 4 and a selection electrode 13 for selectively generating heat from the FL, where the common electrode 1
2 and the selection electrode 13 are arranged so as to extend from the liquid chamber part 8 formed on both sides of the member 5 to the liquid flow path part 6, respectively.

かくして、共通電極12と個々の選択電極13とが発熱
抵抗層11に電気的に接続されていることによシミ伝熱
変換体4が構成されるが、このようにして形成された電
気熱変換体4の上面および電極12.13の上面には更
に上部層14が形設されていて、この上部層14によシ
発熱抵抗層11が熱作用域6Aを含む液流路部6に充満
している液と接触して化学的または物理的な反応を起さ
ないよう保設していると共に、液を介して電極12と電
極13とが短絡するのを防止している。なお、以下の説
明では電気変換体4とその上面を覆蓋した上部層14の
部分を含めて熱発生部24といい更にまた熱作用域6A
とオリフィス9とを含めて液吐出部25という。
Thus, the common electrode 12 and the individual selection electrodes 13 are electrically connected to the heating resistance layer 11, thereby forming the stain heat transfer converter 4, and the electrothermal converter formed in this way An upper layer 14 is further formed on the upper surface of the body 4 and the upper surface of the electrode 12.13, and the upper layer 14 fills the liquid flow path section 6 including the heat action area 6A with the heating resistance layer 11. The electrodes 12 and 13 are kept so as not to cause a chemical or physical reaction when they come into contact with the liquid, and are also prevented from short-circuiting between the electrodes 12 and 13 via the liquid. In the following description, the electric converter 4 and the upper layer 14 that covers its upper surface are referred to as the heat generating section 24, and the heat acting area 6A is also referred to as the heat generating section 24.
and the orifice 9 are collectively referred to as a liquid discharge section 25.

更にまた、上部層14は、隣接する電極間における電気
的リークを防止する役目をも荷っているもので、殊に、
各選択電極13間に於ける電気的リークの防止、または
各液流路6下にある電極12や13が何等かの理由で電
極と液体とが接触し、これに通電することによって起る
電蝕の防止は、重要であって、この為にこの様な保獲層
的機能を有する上部層14が少なくとも液流路下に於け
る電極12および13上に設けられるようにしている0 特に、各液吐出部25に設けられている液流路部6は、
各液吐出部25の上流で、流路の一部を構成している共
通液室部8を介して連通されているが、各液吐出部25
に設けられた電気熱変換体4に接続されている電極12
および13は、その設計上の都合により、熱作用域6A
の上流側にあたる共通な液室部8の下を通る様に設けら
れてぃるので、この部分においても電極12および13
が液体と接触するのを防止する必要があった。
Furthermore, the upper layer 14 also has the role of preventing electrical leakage between adjacent electrodes, and in particular,
To prevent electrical leakage between each selection electrode 13, or to prevent electrical leakage caused by the electrodes 12 and 13 below each liquid flow path 6 coming into contact with the liquid for some reason and energizing them. Preventing corrosion is important, and for this purpose, an upper layer 14 having the function of a retention layer is provided at least on the electrodes 12 and 13 below the liquid flow path.In particular, The liquid flow path section 6 provided in each liquid discharge section 25 is
Upstream of each liquid discharge part 25, each liquid discharge part 25 communicates with each other via a common liquid chamber part 8 that constitutes a part of the flow path.
An electrode 12 connected to an electrothermal converter 4 provided in
and 13 is the heat action area 6A due to its design convenience.
Since the electrodes 12 and 13 are provided so as to pass under the common liquid chamber 8 on the upstream side of the
It was necessary to prevent the liquid from coming into contact with the liquid.

しかしながら、このように構成されだ液体噴射記録ヘッ
ドでは上記の上部層14に対して要求される特性が設け
られる場所に依ってそれぞれ異なっている。
However, in a liquid jet recording head constructed in this way, the characteristics required for the upper layer 14 differ depending on the location where it is provided.

すなわち、例えば熱発生部24においては、特性として
、耐熱性、耐液性、液浸透防止性、熱伝導性、酸化防止
性及び耐破傷性に優れていることが要求され、熱発生部
24以外の領域においては熱的条件で緩和されるが液浸
透防止性、耐液性及び耐破傷性には充分優れていること
が要求される。
That is, for example, the heat generating part 24 is required to have excellent properties such as heat resistance, liquid resistance, liquid permeation prevention property, thermal conductivity, antioxidant property, and tear resistance. In other areas, it is required to have sufficiently excellent liquid permeation prevention properties, liquid resistance, and tear resistance, although they can be alleviated by thermal conditions.

ところで、上述し/ζ特性の総てを所望通りに充分満足
するような上部層14の構成材料は、今のところなく、
これらの特性の幾つかを緩和して使用しているのが現状
である。
By the way, there is currently no material for forming the upper layer 14 that fully satisfies all of the above-mentioned /ζ characteristics as desired.
Currently, some of these characteristics are relaxed.

すなわち、熱発生部24においては、耐熱性、熱伝尋性
訃よび酸化防止性に優先が置かれ、他方熱発生部24以
外の例えば電極被覆部においては、@j液性、液浸透防
止性および破傷性が優先条件となる。
That is, in the heat generating part 24, priority is given to heat resistance, thermal conductivity, and anti-oxidation property, while on the other hand, in the electrode coating part other than the heat generating part 24, priority is given to @j liquid property and liquid penetration prevention property. and tetanicity are priority conditions.

また一方、基板2は安価な点、加工性の良い点、電気的
絶縁性および熱伝導率の良い点などから、セラミックス
等の基板材料が適しているが、セラミックス基板の場合
はその表面に、微細な凸凹が形成されるので、その段差
の部分で上部層14の被覆性が保持しにくい。
On the other hand, a substrate material such as ceramics is suitable for the substrate 2 because of its low cost, good workability, good electrical insulation and thermal conductivity, but in the case of a ceramic substrate, there are Since fine irregularities are formed, it is difficult to maintain coverage of the upper layer 14 at the stepped portions.

すなわち、この基板表面の粗さに対して、上部層14の
被覆性が悪いとその部分から液体の浸透が起とシ、電蝕
若しくは、電気的絶縁破壊を起す訴因となる。
That is, if the coverage of the upper layer 14 is poor in relation to the roughness of the substrate surface, liquid may penetrate from that portion, causing electrolytic corrosion or electrical breakdown.

そこで、これらのことを配慮すると、基板2の表面とし
ては、少なくとも電極12および13や発熱抵抗層11
の接液する部位における上部層14の被覆性が損なわれ
ないだけの平滑性が必要とされる。
Therefore, taking these things into consideration, the surface of the substrate 2 should include at least the electrodes 12 and 13 and the heating resistor layer 11.
Smoothness is required that does not impair the coverage of the upper layer 14 at the portions that come into contact with the liquid.

しかるに、従来の液体噴射記録ヘッドではこのような要
求の総てが満足できる基板2や上部層14を具えた使用
耐久性が総合的に保証できる優れたものがなかった。
However, there has been no conventional liquid jet recording head that has a substrate 2 and an upper layer 14 that satisfy all of these requirements, and that can comprehensively guarantee durability in use.

例えば第2図(A) 、 (B)および(C)は従来の
記録へ〉ド】における基板2の模型的断面をその構成順
にしたがって示すもので、第2図(4)はアルミナセラ
ミックスで形成されブこ基板2本体の顕微鏡的な模型断
面である。
For example, Figures 2 (A), (B), and (C) show schematic cross sections of the substrate 2 in the conventional recording method in the order of their construction, and Figure 2 (4) shows the substrate 2 made of alumina ceramics. This is a cross section of a microscopic model of the main body of the board 2.

ことで、202はアルミナの微結晶粒であJ 、203
はバインダーおよび空腔である。このように焼結された
基板2上に液体噴射記録を行う為の電気熱変換体4を形
成したのが第2図(B)であり、ここで、11は発熱抵
抗層、12Aおよび13Aは電極層である。才だ、14
は電極層12A、13Aおよび発熱抵抗層11を液体か
ら保訓するだめの保獲層すなわち上部層である。
Therefore, 202 is a microcrystalline grain of alumina J, 203
is the binder and the void. FIG. 2(B) shows an electrothermal transducer 4 for performing liquid jet recording formed on the substrate 2 sintered in this way, where 11 is a heating resistance layer, 12A and 13A are heating resistance layers. This is an electrode layer. He's 14 years old.
is a retention layer, ie, an upper layer, for insulating the electrode layers 12A, 13A and the heating resistance layer 11 from liquid.

このようなJJy、形順序を経て形成された液体噴射記
録ヘッドの液体接触部では第3図(C)で示すように、
基板2の表面粗さやステップカバレージ法からくるピン
ホール等の欠陥部302が生じるために液体210に接
触する電極層12A、13Aや抵抗層11に、電蝕It
が発生したために短絡してしまう問題があり、さらには
、抵抗層110表面積が実質上大きくなシ、所望の抵抗
値が得られず、その表面粗さのだめに抵抗値のバラツキ
が大きくなる。
In the liquid contact portion of a liquid jet recording head formed through such a JJy shape sequence, as shown in FIG. 3(C),
Because defects 302 such as pinholes occur due to the surface roughness of the substrate 2 and the step coverage method, electrolytic corrosion is applied to the electrode layers 12A, 13A and the resistance layer 11 that come into contact with the liquid 210.
Furthermore, since the surface area of the resistance layer 110 is substantially large, a desired resistance value cannot be obtained, and the variation in resistance value becomes large due to the surface roughness.

そこで、これらの問題を解決するために、基板2上に積
層する膜厚を厚くすることが考えられるが、熱設計上の
点からすると簡単に厚くすることは許されない。
Therefore, in order to solve these problems, it is conceivable to increase the thickness of the film laminated on the substrate 2, but from the viewpoint of thermal design, it is not permissible to simply increase the thickness.

〔目 的 〕〔the purpose 〕

本発明の目的は上述した諸点に鑑みて、頻繁なる繰返し
使用や長時間の連続使用において総合的な耐久性に優れ
、初期の良好な液滴形成特性を長期にわたって安定的に
維持し得る液体噴射記録ヘッドを提供することにある。
In view of the above-mentioned points, the object of the present invention is to provide a liquid jet that has excellent overall durability in frequent repeated use and long-term continuous use, and is capable of stably maintaining good initial droplet formation characteristics over a long period of time. The purpose is to provide a recording head.

更に、本発明の他の目的は、製造加工上に於ける信頼性
の高い液体噴射記録ヘッドを提供することにある。
Furthermore, another object of the present invention is to provide a liquid jet recording head that is highly reliable in manufacturing and processing.

更にまた、マルチオリフィス化した場合にも製造歩留シ
の高い液体噴射記録ヘッドを提供することにある。
Furthermore, it is an object of the present invention to provide a liquid jet recording head that has a high manufacturing yield even when it has multiple orifices.

〔構成〕〔composition〕

かかる目的を達成するために、本発明では、液体を吐出
して飛翔的液滴を形成する為のオリフィスと該オリフィ
スに連通ずる液流路と、該液流路に沿って基体上〆設け
られ前記液滴とを形成する為のエネルギーを発生するエ
ネルギー発生体とを有する液体吹射記録ヘッドにおいて
、少なくとも前記基体の液流路の設けである部分の表面
粗さがJISによる中心線平均の粗さRaにおいてRa
≦0.1μmであることを特徴とするものである。
In order to achieve such an object, the present invention includes an orifice for discharging a liquid to form flying droplets, a liquid flow path communicating with the orifice, and a liquid flow path provided on a substrate along the liquid flow path. In the liquid spray recording head having the liquid droplet and an energy generating body that generates energy for forming the liquid droplet, the surface roughness of at least the portion of the substrate where the liquid flow path is provided is equal to or less than the center line average roughness according to JIS. Ra in Ra
It is characterized by being ≦0.1 μm.

〔実施例〕〔Example〕

以下で、基板上にこのような平滑面を形成する実施例を
図面によシ説明するが、詳細の説明に先だちかかる平滑
面を必要とする根拠について述べる0 まず、保設層として設けられる上部層14は、熱発生部
24にめられる耐熱性の点から、その膜厚を3μm以下
に押える必要があシ、一方、この上部層14に保獲層と
しての機能を保持させるには、上部層14を被装する基
板2の表面粗さをRaで上部層14の膜厚の1/30以
下に保持する必要のあることを本発明者は実験によシ確
認した。
Below, an example of forming such a smooth surface on a substrate will be explained with reference to the drawings, but before explaining the details, the basis for requiring such a smooth surface will be described. The layer 14 needs to have a thickness of 3 μm or less in view of the heat resistance required for the heat generating part 24. On the other hand, in order for the upper layer 14 to maintain its function as a retention layer, The present inventor has confirmed through experiments that the surface roughness of the substrate 2 on which the layer 14 is coated needs to be kept at 1/30 or less of the thickness of the upper layer 14 in terms of Ra.

更にまた、抵抗mllについても上述したような保饅層
としての上部層14の被覆性や抵抗層11と電極層12
Aおよび13Aの相互間になされるエネルギー授受の効
率を考慮した場合、その膜厚を3μm以下に保持しなけ
ればならず、この点からしても基板表面粗さRaを上部
層14の膜厚に対してその1/30以下に保持すること
が望まれる。
Furthermore, regarding the resistance mll, the coverage of the upper layer 14 as a protective layer and the resistance layer 11 and the electrode layer 12 as described above are also considered.
Considering the efficiency of energy transfer between A and 13A, the film thickness must be kept at 3 μm or less, and from this point of view, the substrate surface roughness Ra should be determined by the film thickness of the upper layer 14. It is desirable to keep it at 1/30 or less.

そこで、本発明者は、電気熱変換体4によって液滴を形
成し吐出させるタイプの液体噴射記録ヘッドにおいて、
その基板2の表面平滑度を、JISで規定されている十
点平均あらさの表示でRaで0.1μm以下に保つこと
によシ総金的な耐久性を高めかつ製造上の歩留りを向上
させることができることを確信した。
Therefore, the present inventor has developed a liquid jet recording head of a type in which droplets are formed and ejected by the electrothermal transducer 4.
By keeping the surface smoothness of the substrate 2 at 0.1 μm or less in terms of Ra in 10-point average roughness specified by JIS, overall durability is increased and manufacturing yield is improved. I was convinced that I could do it.

第3図(4)は従来壓の基板2の面を研磨することによ
シ表面粗さRa < 0.1μmとしだ例を顕微鏡的模
型図として示し、更に第3図の)はアルミナ微結晶粒の
粒径を細かくすることによって表面平滑度をRa < 
0.1μmにした例を示す。すなわち、第3図(5)に
おいて、2人は研磨法によって得られた平滑面であシ、
第3図(B)において、2Bはアルミナの微結晶粒であ
る。
Fig. 3 (4) shows a microscopic model of an example in which the surface roughness Ra < 0.1 μm has been obtained by polishing the surface of the substrate 2 of a conventional glass. By reducing the grain size, the surface smoothness can be reduced to Ra <
An example in which the thickness is set to 0.1 μm is shown. In other words, in Figure 3 (5), two people are using a smooth surface obtained by the polishing method.
In FIG. 3(B), 2B is a microcrystalline grain of alumina.

このように表面粗さRaを0.1μm以下とするμmで
あることがさらに望ましい。
In this way, it is more desirable that the surface roughness Ra is 0.1 μm or less.

また表m」粗さRaを0.1μm以下に保持する部分は
基板2の全面であってもがまわないが、耐久性や製造過
程上で必要な部分は、接液の可能性のある電極12.1
3もしくは発熱抵抗層11の下であシ、かかる作業は非
常に微細な加工技術が要求されることでもあシ、実用上
は液室、及び液流路部分等液体と関連のある範囲の面を
平滑に保持することで十分である。
In addition, the part where the roughness Ra is kept at 0.1 μm or less may be the entire surface of the substrate 2, but the part that is necessary for durability and the manufacturing process should be the electrode that may come into contact with liquid. 12.1
3 or under the heat-generating resistor layer 11. Such work requires extremely fine processing technology, and in practical terms, it is necessary to process surfaces in a range related to liquid, such as the liquid chamber and liquid flow path. It is sufficient to hold it smooth.

特に、接液部以外の基板表面は、むしろ適度にちれてい
る方が配線の基板2に対する密着度が向上する為、記録
ヘッドlとしては好ましい。
In particular, it is preferable for the recording head 1 to have the surface of the substrate other than the liquid-contacted portion moderately curved, since this improves the degree of adhesion of the wiring to the substrate 2.

このように、基板2上の平滑面を形成するにあたっては
、基板2の表面を研磨するが、あるいは基板2を形成す
る結晶粒を微細化すること等によって達成でき、平滑な
面が得られれば、本発明の効果は得られるものであって
、例えば、化学的なエツチングによって基板表面を平滑
にしても良い。
In this way, forming a smooth surface on the substrate 2 can be achieved by polishing the surface of the substrate 2 or by making the crystal grains forming the substrate 2 finer. The effects of the present invention can be obtained by, for example, making the substrate surface smooth by chemical etching.

ただし、この場合はバインダーと結晶粒とのエツチング
レートを適度に選択しないとかえって表面層してしまう
處もある。
However, in this case, if the etching rate between the binder and the crystal grains is not appropriately selected, a surface layer may form instead.

さらに杜、物理的エツチング法として知られる真空中で
のプラズマによるスパッタエッチンク、または反応性ガ
ス等を用いる反応性プラズマエツチング等の方法によっ
ても良い。
Furthermore, sputter etching using plasma in a vacuum, which is known as a physical etching method, or reactive plasma etching using a reactive gas or the like may be used.

更にまた、局部的にかあるいは表面層のみを高温に加熱
し、基板2の溶解にょシ、基板表面を平滑にしても良く
、例えば、レーザー等にょシ加熱する方法もある。
Furthermore, the substrate 2 may be melted or the surface of the substrate may be smoothed by heating locally or only the surface layer to a high temperature. For example, there is also a method of heating using a laser or the like.

さらには、通常の基板2の上に、微細な結晶粒からなる
第2の基板層を設けて基板体を構成することもできる。
Furthermore, the substrate body can be constructed by providing a second substrate layer made of fine crystal grains on the normal substrate 2.

また、以上の説明では、電気熱変換体4に対して吐出方
向が垂直であるいわゆるサイドシュータ−型の場合につ
いて述べたが、電気熱変換体4に対して吐出方向が平行
ないわゆるエッヂシュータ−型の液体噴射記録ヘッドに
おいても同様な効果が得られることはいうまでもない。
Furthermore, in the above explanation, the so-called side shooter type case in which the discharge direction is perpendicular to the electrothermal converter 4 has been described, but the so-called edge shooter type case in which the discharge direction is parallel to the electrothermal converter 4 has been described. It goes without saying that similar effects can be obtained with a type of liquid jet recording head.

また、その上部層14には必要であれば、欠陥部保設の
ため有機樹脂層を設けても良く、さらに面]キャビテー
ションを向上させるために金属層を積層するようにして
も良い。
Further, if necessary, an organic resin layer may be provided on the upper layer 14 to preserve defective portions, and a metal layer may be laminated to improve surface cavitation.

本発明者は、実験によりこの様に作成した記録ヘツ、ド
の電気熱変換体4に10pSの30Vの矩形電圧を80
0Hzで印加し、印加信号に応じて液体がオリフィスか
ら吐出されて、飛翔的液滴が安定的に形成できることを
確認した。すなわち、従来の平面平滑度の劣悪な基板を
用いた記録ヘッドにおいては、この様な液滴の形成を繰
シ返すと、At電極、HfB2抵抗体の電蝕や、抵抗体
の抵抗変化率が大きく、電極間の絶縁破壊による断線、
抵抗値の増大が発生して、インクを吐出しなくなるが、
本例ではそのような故障を防止することができて、かか
る繰返し回数すなわち耐久回数を向上させることができ
る。
Through experiments, the inventor applied a rectangular voltage of 30 V of 10 pS to the electrothermal transducer 4 of the recording head 80
It was confirmed that the liquid was ejected from the orifice according to the applied signal by applying the signal at 0 Hz, and that flying droplets could be stably formed. In other words, in a conventional recording head using a substrate with poor planar smoothness, repeated formation of such droplets causes electrolytic corrosion of the At electrode and HfB2 resistor, and the resistance change rate of the resistor increases. Mainly, disconnection due to dielectric breakdown between electrodes,
The resistance value increases and ink stops being ejected, but
In this example, such failures can be prevented and the number of repetitions, that is, the number of durability can be increased.

さらにまた、このような従来の平滑度の劣悪な基板を用
いると、製造時における歩留シも低下する。その大きな
要因は、抵抗値の不ぞろいや、電極、抵抗体の短絡さら
には、平滑でない為にパターンの境界が見きわめにくい
ことからくる作業ミス等によるものであるが、本発明に
よれば、製造時の歩留シ向上にも貢献する。
Furthermore, when such a conventional substrate with poor smoothness is used, the yield during manufacturing is also reduced. The major causes of this are unevenness in resistance values, short circuits between electrodes and resistors, and work errors caused by difficulty in identifying pattern boundaries due to unevenness.According to the present invention, however, during manufacturing This also contributes to improved yields.

なお次の第1表に基板表面の平滑度と歩留シ及び耐久回
数を比較した例を示す。
Table 1 below shows an example comparing the smoothness of the substrate surface, the yield rate, and the number of durability cycles.

表1 ◎ 90チ以上 Q 70%以上 △ 50%以上× 
50%以下 第1表の結果から明らかなように平滑な層を設けた本発
明のヘッドでは耐久回数10’回を安定して達成するこ
とが出来た。
Table 1 ◎ 90 inches or more Q 70% or more △ 50% or more ×
50% or less As is clear from the results in Table 1, the head of the present invention provided with a smooth layer was able to stably achieve durability of 10' cycles.

〔効果〕〔effect〕

以上説明してきたように液体噴射記録ヘッドの基板の平
1’Tf性は接液部において非常に重要であシ、本発明
によれば、基板面をJISでの中心線平均あらさRaで
0.1 μm以下に形成したことにょシ、頻繁なる繰返
し使用や長時間の連続使用においても総合的な耐久性に
優れ、初期の良好な液滴形成特性を長期にわたって安定
的に維持し得る液体噴射記録ヘッドを提供することが可
能となった。
As explained above, the flat 1'Tf property of the substrate of a liquid jet recording head is very important in the liquid contact area, and according to the present invention, the substrate surface has a JIS center line average roughness Ra of 0. A liquid jet recorder that is formed to a diameter of 1 μm or less, has excellent overall durability even under frequent repeated use and long-term continuous use, and can stably maintain good initial droplet formation characteristics over a long period of time. It is now possible to provide the head.

更にまた、本発明によれば、製造加工上の歩留シと共に
、その信用上の信頼性を従来に比し著しく高めることが
できる。
Furthermore, according to the present invention, not only the manufacturing yield but also the reliability can be significantly improved compared to the conventional method.

な訃、本丸り」の適用は複数の液体噴射用オリフィスを
有する記録ヘッドに限られるものではなく、単一のオリ
フィスを設けた記録ヘッドにも適用できることはいうま
でもない。
It goes without saying that the application of "Nao, Honmaru" is not limited to a recording head having a plurality of liquid ejecting orifices, but can also be applied to a recording head provided with a single orifice.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(A)は従来の液体噴射記録ヘッドの構成の一例
を模型的に分解して示す斜視図、 第1図(J3)はそのX−X線断面図、第2図(A)お
よび(B)はその基板の表面部における微粒子の結合状
態を基板のみの状態および基板上に種の層を形成した状
態で模型的にそれぞれ示す断面図、 第2図(0)は第2図CB)の形成形態で接液部に電蝕
が発生する状態を模型的に示す断面図、第3図(A)は
本発明の構成要素をなす基板の表面を研磨方法によって
得たときの状態を一例として模型的に示す断面図、 第3図03)はその基板の表面を微結晶粒子の結合によ
シ得だときの状態を一例として模型的に示す断面図であ
る。 1・・・ 記録ヘッド 2・・・ 基板 2A・・・ 研磨面 2B・・・ 微結晶粒子 3・・・ 流通孔 4・・・ 電気熱変換体 4A・・・ 熱作用面 5・・・ 囲壁部材 6・・・ 液流路部 6A・・・ 熱作用域 7・・・ 周壁部材 8・・・ 液室部 9・・・ オリフィス 10・・・ 吐出板 11・・・ 抵抗層 12.13・・・ 電極 12A 、 13A ・ 電極層 14・・・ 上部層 24・° 熱発生部 25・・ 液吐出部 202・・ 微結晶粒 203・・・ バインダーおよび空腔 210・・ 液体 310 欠陥部。
FIG. 1(A) is a schematic exploded perspective view of an example of the configuration of a conventional liquid jet recording head, FIG. 1(J3) is a sectional view taken along line X-X, FIG. 2(A) and (B) is a cross-sectional view schematically showing the bonding state of fine particles on the surface of the substrate with only the substrate and with a seed layer formed on the substrate, and Figure 2 (0) is Figure 2 CB. 3(A) is a cross-sectional view schematically showing a state in which electrolytic corrosion occurs in the liquid-contacted part in the formation form shown in FIG. FIG. 3 is a cross-sectional view schematically showing a state in which the surface of the substrate can be bonded with microcrystalline particles. 1... Recording head 2... Substrate 2A... Polished surface 2B... Microcrystalline particle 3... Communication hole 4... Electrothermal converter 4A... Heat action surface 5... Surrounding wall Member 6... Liquid flow path section 6A... Heat action area 7... Surrounding wall member 8... Liquid chamber section 9... Orifice 10... Discharge plate 11... Resistance layer 12.13. ... Electrodes 12A, 13A, Electrode layer 14, Upper layer 24, ° Heat generating part 25, Liquid discharge part 202, Microcrystalline grains 203, Binder and cavity 210, Liquid 310 Defect part.

Claims (1)

【特許請求の範囲】 液体を吐出して飛翔的液滴を形成する為のオリフィスと
該オリフィスに連通ずる液流路と、該液流路に沿って基
体上に設けられ前記液滴とを形成する為のエネルギーを
発生するエネルギー発生体とを有する液体噴射記録ヘッ
ドにおいて、少なくとも前記基体の液流路の設けである
部分の表面粗さがJISによる中心線平均の粗さRaに
おいてRa≦0.1μmであることを特徴とする液体噴
射記録ヘッド。 (以下余白)
[Scope of Claims] An orifice for ejecting liquid to form flying droplets, a liquid flow path communicating with the orifice, and a liquid flow path provided on a substrate along the liquid flow path to form the droplets. In the liquid jet recording head, the surface roughness of at least the portion of the substrate where the liquid flow path is provided satisfies a centerline average roughness Ra according to JIS of Ra≦0. A liquid jet recording head characterized in that the diameter is 1 μm. (Margin below)
JP6410484A 1984-03-31 1984-03-31 Liquid jet recording head Pending JPS60206655A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6410484A JPS60206655A (en) 1984-03-31 1984-03-31 Liquid jet recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6410484A JPS60206655A (en) 1984-03-31 1984-03-31 Liquid jet recording head

Publications (1)

Publication Number Publication Date
JPS60206655A true JPS60206655A (en) 1985-10-18

Family

ID=13248434

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6410484A Pending JPS60206655A (en) 1984-03-31 1984-03-31 Liquid jet recording head

Country Status (1)

Country Link
JP (1) JPS60206655A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62103158A (en) * 1985-10-30 1987-05-13 Futaki Itsuo Thermal head
EP1453680A1 (en) * 2001-12-11 2004-09-08 Ricoh Company, Ltd. Drop discharge head and method of producing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62103158A (en) * 1985-10-30 1987-05-13 Futaki Itsuo Thermal head
EP1453680A1 (en) * 2001-12-11 2004-09-08 Ricoh Company, Ltd. Drop discharge head and method of producing the same
US7232202B2 (en) 2001-12-11 2007-06-19 Ricoh Company, Ltd. Drop discharge head and method of producing the same
EP1453680A4 (en) * 2001-12-11 2007-10-24 Ricoh Kk Drop discharge head and method of producing the same
US7571984B2 (en) 2001-12-11 2009-08-11 Ricoh Company, Ltd. Drop discharge head and method of producing the same

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