JPS60200434A - Cathode filament - Google Patents

Cathode filament

Info

Publication number
JPS60200434A
JPS60200434A JP5678984A JP5678984A JPS60200434A JP S60200434 A JPS60200434 A JP S60200434A JP 5678984 A JP5678984 A JP 5678984A JP 5678984 A JP5678984 A JP 5678984A JP S60200434 A JPS60200434 A JP S60200434A
Authority
JP
Japan
Prior art keywords
base material
tip
discharge
electron discharge
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5678984A
Other languages
Japanese (ja)
Other versions
JPH0354825B2 (en
Inventor
Kiyoshi Inoue
潔 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inoue Japax Research Inc
Original Assignee
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inoue Japax Research Inc filed Critical Inoue Japax Research Inc
Priority to JP5678984A priority Critical patent/JPS60200434A/en
Publication of JPS60200434A publication Critical patent/JPS60200434A/en
Publication of JPH0354825B2 publication Critical patent/JPH0354825B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/04Manufacture of electrodes or electrode systems of thermionic cathodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)

Abstract

PURPOSE:To improve consumption resistance of cathode filaments by forming discharge covering layer of an electron discharge material or ion plant layer containing rare earth metal and boron on the surface of an electrode base metal in a vacuum or inactive gas atmosphere. CONSTITUTION:A thin covering layer 31 of an electron discharge material is formed on the surface of a base material 4 of a heat resistant metal, the electron discharge material bonding thereon by diffusion. As the electron discharge material, those composed of Ba, Ca, and Sr containing rare earth elements such as La, Pr, and Ce; and boron B are used. For example, a covering material tip 3 is attached to an end chuck 2 and the tip 3 facing to the base material 4 repeats touching and detaching thereto by the vibration of a vibrator 1 and the inside of an airtight vessel 6 is supplied with inactive gas from a gas cylinder 8 while being evacuated by a vacuum pump 7. Discharging occurs when the covering material tip 3 comes down close to the base material 4 and the tip material 3 melted by the discharge heat is deposited to the base material 4 and in each vibration cycle, the tip material 3 is repeatedly coated inside the base material in a partly diffused state by the discharge current.

Description

【発明の詳細な説明】 本発明は耐熱性金属線からなるフィラメント又は陰極材
の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in filaments or cathode materials made of heat-resistant metal wires.

従来耐熱性金属のタングステンの表面に電子放出性物質
のバリウム、ストロンチウム、カルシウムを主体とした
酸化物を塗布して用いることが行なわれている。
Conventionally, the surface of tungsten, which is a heat-resistant metal, is coated with oxides mainly containing electron-emitting substances such as barium, strontium, and calcium.

本発明は更に電子放出効率を高めるために電子放出性物
質に希土類金属と硼素を含有する物質を用い、これを母
材表面に単に塗布するのではなくて、被覆材と母材との
間に放電を行ない母材表面に一部拡散する状態の被覆層
を形成するか被覆材のイオン打込による拡散層を形成す
ることにより耐消耗性を高めるように設けたことを特徴
どするものである。
In order to further improve electron emission efficiency, the present invention uses a substance containing rare earth metals and boron as an electron-emitting substance, and instead of simply coating it on the surface of the base material, it is placed between the coating material and the base material. It is characterized in that it is provided to increase wear resistance by forming a coating layer that partially diffuses on the surface of the base material by performing electric discharge, or by forming a diffusion layer by ion implantation of the coating material. .

以下一実施例によって説明する。第1図は本発明の一実
施例断面図で、耐熱性金属の母材4の表面に拡散結合す
る電子放出性物質の薄い被覆層31を形成する。母材の
耐熱性金属としては、W、Ta、pt、lrのような融
点が高く良導電性の電子放出性材を用いる。この母材表
面に被覆する電子放出性物質としては、1aSprXC
e等の希土類と硼素Bを含み、3a 、 Ca 、3r
からなるもので、pr (Ba o、s Bo、4 )
 e 、pr (Cao、s % Sro、r、 )s
 )La (BaO−3、Bo、7 )e 、Ce (
Ca0.2 % Sro、4% Bo、4 >6等を用
いる。
An example will be explained below. FIG. 1 is a cross-sectional view of one embodiment of the present invention, in which a thin coating layer 31 of an electron-emitting substance is formed on the surface of a heat-resistant metal base material 4 to be diffuse-bonded. As the heat-resistant metal of the base material, an electron-emitting material having a high melting point and good conductivity, such as W, Ta, PT, and lr, is used. As the electron-emitting substance coated on the surface of this base material, 1aSprXC
Contains rare earth elements such as e and boron B, 3a, Ca, 3r
consisting of pr (Ba o, s Bo, 4)
e, pr (Cao, s % Sro, r, )s
) La (BaO-3, Bo, 7) e, Ce (
Ca0.2% Sro, 4% Bo, 4>6, etc. are used.

母材4へのこれら電子放出性物質31の被覆には第2図
の放電被覆手段が用いられる。1はバイブレータで、振
動ヘッドを構成し、先端チセツク2に被覆材チップ3を
取付け、母材4に対向して先端をバイブレータ 1の振
動によって接触開離を繰返すように設定する。5はチッ
プ3と母材4間に放電を行なわせるパルス電源である。
The discharge coating means shown in FIG. 2 is used to coat the base material 4 with these electron-emitting substances 31. Reference numeral 1 denotes a vibrator, which constitutes a vibrating head, has a coating material tip 3 attached to a tip tip 2, and sets its tip so as to repeatedly contact and separate by the vibration of the vibrator 1, facing the base material 4. Reference numeral 5 denotes a pulse power source for causing discharge between the chip 3 and the base material 4.

被覆加工雰囲気は不活性ガス雰囲気とづるために気密容
器6で囲まれ内部を真空ポンプ7により排気するととも
にボンベ8から不活性ガスを供給する。尚、気密容器6
にはベローズ6aが一部設けてあり、上下振動は自在に
行なわれる。
The coating processing atmosphere is an inert gas atmosphere, so the container is surrounded by an airtight container 6, the inside of which is evacuated by a vacuum pump 7, and an inert gas is supplied from a cylinder 8. In addition, airtight container 6
A bellows 6a is provided in a part of the holder, so that vertical vibration can be freely performed.

放電による被覆加工は、被覆材チップ3が下降して母材
4に接近したとき放電が発生し放電熱で溶解したチップ
月が母材4に接触溶着し、これを振動ザイクル毎に繰返
して被覆が行なわれ、加工は放電電界により母材4内に
一部拡散する状態で被覆され母材4の移動により被覆部
分を変えることにより、母材4の所定部分若しくは全面
に被覆層31を形成することができる。実験は被覆材デ
ツプ3の振動数を100〜4001−lzで振動させ、
放電電源5のパルス幅を1〜50μs、放電電流波高値
Ipを50〜200Aで行なった。被覆層の厚さは通常
10μm以下が用いられる。
In coating processing by electrical discharge, when the coating material chip 3 descends and approaches the base material 4, an electrical discharge occurs, and the chips melted by the discharge heat contact and weld to the base material 4, and this is repeated every vibration cycle to coat the base material. The machining process is performed by coating the base material 4 in a state where it is partially diffused by a discharge electric field, and by changing the covered portion by moving the base material 4, a coating layer 31 is formed on a predetermined portion or the entire surface of the base material 4. be able to. In the experiment, the frequency of the coating material depth 3 was vibrated at a frequency of 100 to 4001-lz,
The pulse width of the discharge power source 5 was 1 to 50 μs, and the discharge current peak value Ip was 50 to 200 A. The thickness of the coating layer is usually 10 μm or less.

又被覆加工は前記被覆lデツプ3の振動に加え、或いは
単独にデツプ3を軸を中心に回転を加えて行なうことが
でき、被覆効果が向上できる。
The coating process can be carried out by vibrating the coating layer 3 or by rotating the coating layer 3 about an axis, thereby improving the coating effect.

又被覆材のイオンプラントを行なうことができ、イオン
打込みは雰囲気圧を10(7orr程度にし被覆材に放
電を行ないイオン発生を行なっても電界加速制御して打
込むようにする。又被1+Jのワイヤを電極間に張って
おいて、これを衝撃放電にJ:つて溶融飛散させて母材
に衝突溶着させたり、被覆材の粉末を放電衝撃により噴
q4させて衝突溶着させる方法等を利用して被覆するこ
とができる。
In addition, it is possible to carry out an ion plant for the coating material.Ion implantation is performed by setting the atmospheric pressure to about 10 (7 orr) and discharging the coating material to generate ions, which are implanted by controlling electric field acceleration. A wire is stretched between electrodes, and the wire is melted and scattered by impact discharge to cause collision welding to the base material, or by impact welding by spraying the powder of the coating material by discharge impact. It can be coated with

次に本発明の電子放出性物質を被覆した陰極材のエミッ
ション効果を説明すると、W線を1000°Cに加熱し
保持したときの放射効率を1とした場合に比較して次の
表の通りであった。
Next, to explain the emission effect of the cathode material coated with the electron-emitting substance of the present invention, the radiation efficiency when heating and holding the W line at 1000°C is set as 1, as shown in the following table. Met.

尚いずれも1000℃に加熱した。In addition, both were heated to 1000°C.

用材 被 覆 祠 効率 W な し 1 pr (Ba o、s、Bo、4) s 6pr (C
a o、s、Sr O,4) 6 5,31 a (B
a O,3,80,7) 67.6〃 Ce(Cao、
2.Sro、4、Bo、4)s 8.4以上のように 
極めて効率の高い安定したエミッション効果が得られ、
実用使用状態の加熱温度は360℃程麿であるので、充
分安定した利用ができることが確認された。
Material Covering Efficiency W None 1 pr (Ba o, s, Bo, 4) s 6 pr (C
a o, s, Sr O, 4) 6 5, 31 a (B
a O, 3, 80, 7) 67.6〃 Ce(Cao,
2. Sro, 4, Bo, 4)s 8.4 as above
Extremely efficient and stable emission effects can be obtained,
Since the heating temperature in practical use is about 360°C, it was confirmed that it can be used in a sufficiently stable manner.

又被覆層は用材に対して一部拡散する状態に結合してお
り、電子、イオン等の衝撃に対しても強く、寿命が高く
良好な陰極が得られる効果がある。
Further, the coating layer is bonded to the material in a state where it is partially diffused, and is strong against the impact of electrons, ions, etc., and has the effect of providing a good cathode with a long life.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一部切断面図、第2図は被覆装置の一
実施例構成図である。 4・・・・・・・・・母材 31・・・・・・・・・被覆層 5− ;fll沼 才2濶
FIG. 1 is a partially cutaway view of the present invention, and FIG. 2 is a configuration diagram of one embodiment of the coating device. 4...Base material 31...Coating layer 5-;

Claims (1)

【特許請求の範囲】[Claims] タングステン等の電極母材の表面に真空中若しくは不活
性ガス雰囲気中で、希土類金属と硼素を含有する電子放
出性物質の放電被覆層若しくはイオンプラント層を形成
したことを特徴とする陰極フィラメント。
A cathode filament characterized in that a discharge coating layer or an ion plant layer of an electron-emitting substance containing a rare earth metal and boron is formed on the surface of an electrode base material such as tungsten in a vacuum or an inert gas atmosphere.
JP5678984A 1984-03-23 1984-03-23 Cathode filament Granted JPS60200434A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5678984A JPS60200434A (en) 1984-03-23 1984-03-23 Cathode filament

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5678984A JPS60200434A (en) 1984-03-23 1984-03-23 Cathode filament

Publications (2)

Publication Number Publication Date
JPS60200434A true JPS60200434A (en) 1985-10-09
JPH0354825B2 JPH0354825B2 (en) 1991-08-21

Family

ID=13037178

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5678984A Granted JPS60200434A (en) 1984-03-23 1984-03-23 Cathode filament

Country Status (1)

Country Link
JP (1) JPS60200434A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5611981A (en) * 1979-06-21 1981-02-05 Raybestos Manhattan Inc Abrasive composition
JPS57128436A (en) * 1981-02-02 1982-08-10 Koichi Kanetani Manufacture of lanthanum-boride thermionic emission electrode
JPS60130023A (en) * 1983-12-16 1985-07-11 Inoue Japax Res Inc Electrode filament

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5611981A (en) * 1979-06-21 1981-02-05 Raybestos Manhattan Inc Abrasive composition
JPS57128436A (en) * 1981-02-02 1982-08-10 Koichi Kanetani Manufacture of lanthanum-boride thermionic emission electrode
JPS60130023A (en) * 1983-12-16 1985-07-11 Inoue Japax Res Inc Electrode filament

Also Published As

Publication number Publication date
JPH0354825B2 (en) 1991-08-21

Similar Documents

Publication Publication Date Title
CA2103695C (en) Low pressure discharge lamp having sintered "cold cathode" discharge electrodes
WO2003094199A1 (en) Gas discharge tube
JPS60221566A (en) Thin film forming device
JPS60200434A (en) Cathode filament
US4673842A (en) Graphite cathode cup for gridded x-ray tubes
JPH026184B2 (en)
WO2000045417A1 (en) Electrode for discharge tube and discharge tube using it
JPH11273894A (en) Thin film forming device
JPS5941509B2 (en) Equipment for depositing highly adhesive, particularly hard carbon layers over large areas
JP2716715B2 (en) Thin film forming equipment
JPS59190357A (en) Supersaturated electron type ion plating method
JP3727519B2 (en) Sleeve for hot cathode assembly and method for manufacturing the same
JPS6345734Y2 (en)
JP2000294118A (en) Manufacture of electron emission source, electron emission source and fluorescent light display
JPH065198A (en) Cathode including cathode element
US1921065A (en) Electron emitter and process of making same
JP3715790B2 (en) Method for producing impregnated cathode for discharge tube
JPH06260084A (en) Manufacture of cathode
JPS63133685A (en) Method for manufacturing laser cathode
JPH11154489A (en) Cathode for discharge tube, manufacture of the cathode and arc lamp
JPH0785800A (en) Gas discharge display panel cathode and method for forming it
JPH04322029A (en) Impregnated type cathode and manufacture thereof
JPS60130023A (en) Electrode filament
JP2004014420A (en) Electron emission source
JPS62192294A (en) Electrode bar for inert gas arc welding