JPS60189932A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS60189932A
JPS60189932A JP59046804A JP4680484A JPS60189932A JP S60189932 A JPS60189932 A JP S60189932A JP 59046804 A JP59046804 A JP 59046804A JP 4680484 A JP4680484 A JP 4680484A JP S60189932 A JPS60189932 A JP S60189932A
Authority
JP
Japan
Prior art keywords
exposure
stage
exposed
deflection
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59046804A
Other languages
English (en)
Japanese (ja)
Other versions
JPH047583B2 (enExample
Inventor
Mineo Goto
後藤　峰夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59046804A priority Critical patent/JPS60189932A/ja
Publication of JPS60189932A publication Critical patent/JPS60189932A/ja
Publication of JPH047583B2 publication Critical patent/JPH047583B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electron Beam Exposure (AREA)
JP59046804A 1984-03-12 1984-03-12 電子ビ−ム露光方法 Granted JPS60189932A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59046804A JPS60189932A (ja) 1984-03-12 1984-03-12 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59046804A JPS60189932A (ja) 1984-03-12 1984-03-12 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS60189932A true JPS60189932A (ja) 1985-09-27
JPH047583B2 JPH047583B2 (enExample) 1992-02-12

Family

ID=12757515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59046804A Granted JPS60189932A (ja) 1984-03-12 1984-03-12 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS60189932A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62250636A (ja) * 1986-04-23 1987-10-31 Advantest Corp 荷電粒子ビ−ム露光装置
JPS63283130A (ja) * 1987-05-15 1988-11-21 Toshiba Mach Co Ltd 荷電ビ−ム描画方法及び描画装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62250636A (ja) * 1986-04-23 1987-10-31 Advantest Corp 荷電粒子ビ−ム露光装置
JPS63283130A (ja) * 1987-05-15 1988-11-21 Toshiba Mach Co Ltd 荷電ビ−ム描画方法及び描画装置

Also Published As

Publication number Publication date
JPH047583B2 (enExample) 1992-02-12

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees