JPS6018153A - Eye refraction measuring instrument - Google Patents

Eye refraction measuring instrument

Info

Publication number
JPS6018153A
JPS6018153A JP58126349A JP12634983A JPS6018153A JP S6018153 A JPS6018153 A JP S6018153A JP 58126349 A JP58126349 A JP 58126349A JP 12634983 A JP12634983 A JP 12634983A JP S6018153 A JPS6018153 A JP S6018153A
Authority
JP
Japan
Prior art keywords
eye
fundus
pattern
pupil
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58126349A
Other languages
Japanese (ja)
Inventor
小早川 嘉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58126349A priority Critical patent/JPS6018153A/en
Publication of JPS6018153A publication Critical patent/JPS6018153A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は、眼科医院や眼鏡店などで使用するに好適な眼
屈折測定器に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an ocular refractometer suitable for use in eye clinics, opticians, and the like.

従来の眼屈折測定器には種々のものが用いられているが
、一般に機械的な可動部を有するため構造画に複雑で、
精度も十分に期待できないという問題点がある。
Various types of conventional eye refractometers are used, but they generally have mechanically movable parts, making it difficult to visualize the structure.
There is a problem in that sufficient accuracy cannot be expected.

本発明の目的は、従来のような機械的な可動部を用いず
、構造が簡単でコストも低廉で、かつ精度も高い眼屈折
測定器を提供することにあり、その要旨は、被検眼瞳孔
の少なくとも3個所の異なる位置を経由して眼底に順次
にパターンを投影する投影光学系と、前記眼底からの反
射光を位置検出素子で受光する受光光学系とから成り、
前記眼底上のパターン像の二次元的位置情報から眼屈折
値をめることを特徴とするものである。
An object of the present invention is to provide an eye refraction measuring instrument that does not use conventional mechanical movable parts, has a simple structure, is low in cost, and has high accuracy. comprising a projection optical system that sequentially projects a pattern onto the fundus of the eye via at least three different positions, and a light receiving optical system that receives reflected light from the fundus with a position detection element,
This method is characterized in that an eye refraction value is calculated from two-dimensional positional information of the pattern image on the fundus.

以下に本発明を図示の実施例に基づいて詳細に説明する
The present invention will be explained in detail below based on illustrated embodiments.

第1図は本発明の一実施例を示し、被検眼Eの眼底Ef
にパターンを投影する投影光学系において、第2図に示
すように光軸を中心にして対称な位置に配置された3個
の光源1a、1b、ICからの光は、リレーレンズ3、
第3図に示す円形の開ロバターン40を有する眼底共役
絞り4、リレーレンズ5、第4図に示すような3個の開
口6a、6b、6cを有する瞳共役絞り6を通過した後
に、穴開きミラー7で反則し対物レンズ8を介して瞳孔
Epの異なる3個所から眼底Efに到達し、開ロバター
ン40を眼底Efに投影するようにされている。一方、
受光光学系において、眼底Efで反則された反射光は対
物レンズ8、穴開きミラー7を通過して中心に開口90
を有する瞳共役絞り9及びリレーレンズ10を経て、例
えば半導体から成る二次元的位置検出素子11で受光さ
れるようになっている。ここで、光’IQ 1 a、l
b、ICは絞り6.9、瞳孔Epと共役であり、また絞
り4は対物レンズ8の後側焦点位動に置かれ、正視の被
検眼Eの眼底Ef及び検出素子11にそれぞれ共役の位
置関係とされている。
FIG. 1 shows an embodiment of the present invention, in which the fundus Ef of the eye E to be examined is
In a projection optical system for projecting a pattern onto a light source, three light sources 1a and 1b are placed at symmetrical positions with respect to the optical axis as shown in FIG.
After passing through a fundus conjugate diaphragm 4 having a circular opening pattern 40 shown in FIG. 3, a relay lens 5, and a pupil conjugate diaphragm 6 having three apertures 6a, 6b, 6c as shown in FIG. The light is deflected by the mirror 7 and reaches the fundus Ef from three different locations of the pupil Ep via the objective lens 8, and an open pattern 40 is projected onto the fundus Ef. on the other hand,
In the light-receiving optical system, the reflected light reflected by the fundus Ef passes through the objective lens 8 and the perforated mirror 7, and enters the aperture 90 in the center.
The light passes through a pupil conjugate aperture 9 and a relay lens 10, and is received by a two-dimensional position detection element 11 made of, for example, a semiconductor. Here, light'IQ 1 a, l
b, IC has an aperture of 6.9 and is conjugate with the pupil Ep, and the aperture 4 is placed at the back focal position of the objective lens 8, and is in a position conjugate with the fundus Ef of the emmetropic eye E and the detection element 11, respectively. It is said to be related.

この実施例では、瞳孔Epの周辺部から被検眼E内に投
影光学系による開ロバターン40の像光を入射し、眼底
Efからの反射光を受光光学系により瞳孔Epの中心部
から取出して二次元的位置検出、、t;子11で受光す
るようにしており、検出素子11上に得られたパターン
像Pが第6図〜第9図に例示されている。
In this embodiment, the image light of the opening pattern 40 is made to enter the subject's eye E from the periphery of the pupil Ep by the projection optical system, and the reflected light from the fundus Ef is extracted from the center of the pupil Ep by the light receiving optical system. Dimensional position detection: Light is received by the element 11, and pattern images P obtained on the detection element 11 are illustrated in FIGS. 6 to 9.

即ち、眼底Efが正視の位置にある場合には、瞳孔Ep
の周辺部の3点から順次に入射した光は眼底Efで全て
合致するので、第6図に示すように検出素子11上には
1個のパターン像Pが形成される。
That is, when the fundus Ef is in the position of emmetropia, the pupil Ep
Since the lights that are sequentially incident from three points on the periphery of the eye all coincide at the fundus Ef, one pattern image P is formed on the detection element 11 as shown in FIG.

また、遠視の場合は瞳孔Epの上部、つまり第3図に示
す開口6aから入射した光は被検眼Eの屈折力が弱いた
めに十分に屈折されずに、眼底Efでは第7図に示すよ
うに3点のパターン像Pa、 Pb、Pcになり、パタ
ーン像Pa、Pb、 Pcのぼけ量が大きくなる。
In addition, in the case of hyperopia, the light incident from the upper part of the pupil Ep, that is, the aperture 6a shown in FIG. Then, there are three pattern images Pa, Pb, and Pc, and the amount of blur of the pattern images Pa, Pb, and Pc increases.

逆に近視の場合は、第8図に示すように遠視と同様に3
点のパターン像Pa、 Pb、 Pcとなるが、その位
置は遠視の場合と対称となる。更に、第9図は縦方向が
遠視、横方向が正視の乱視眼のパターン像Pを示してい
る。この場合は、絞り9の開口6b、6Cからのパター
ン像Pb、 Pcが眼底Efで重なり、開口6aからの
パターン像Paは重ならずに、パターン像Pa、Pb、
 P−cは幾らか楕円状にぼけることになる。
Conversely, in the case of myopia, as shown in Figure 8, 3
The point pattern images Pa, Pb, and Pc are obtained, and their positions are symmetrical to those in the case of farsightedness. Furthermore, FIG. 9 shows a pattern image P of an astigmatic eye with farsightedness in the vertical direction and emmetropia in the horizontal direction. In this case, the pattern images Pb and Pc from the apertures 6b and 6C of the aperture 9 overlap on the fundus Ef, and the pattern images Pa from the aperture 6a do not overlap, but the pattern images Pa, Pb,
P-c will be somewhat elliptically blurred.

二次元的位置検出素子11は所謂CCDのようなセンサ
アレイでもよいが、両端の電圧関係によってアナログ的
に位置情報が01・られる半心体位置検出素子を用いる
ことが好適である。
The two-dimensional position detecting element 11 may be a sensor array such as a so-called CCD, but it is preferable to use a semi-central position detecting element whose position information can be determined in an analog manner by the voltage relationship between both ends.

このようにして、光源1’a、lb、1cを順次に点灯
することにより、それぞれの検出素子11上におけるパ
ターン像Pa、 Pb、 Pcの位置を検出し、被検眼
Eの屈折状態を知ることができる。この屈折値を示す球
面度数、乱視度数、乱視角をめるには未知数が3個であ
るから、少なくとも3個所から光を入射して測定する必
要がある。なお、対物レンズ8と被検眼Eとの距離によ
る誤差は、開ロバターン40からの入用光を光軸に平行
にすることによって除くことができる。
In this way, by sequentially lighting up the light sources 1'a, lb, and 1c, the positions of the pattern images Pa, Pb, and Pc on the respective detection elements 11 are detected, and the refractive state of the eye E to be examined is known. Can be done. In order to calculate the spherical power, astigmatic power, and astigmatic angle that indicate this refraction value, there are three unknowns, so it is necessary to make measurements by entering light from at least three locations. Note that errors due to the distance between the objective lens 8 and the eye E to be examined can be eliminated by making the input light from the open rotor pattern 40 parallel to the optical axis.

第10図〜第12Mは本発明の第2の実施例を示し、眼
底共役絞り4の開ロパクーン41は第1O図に示すよう
に四角形とぶれ、二次元的位置検出素子11は第11図
に示すように「田」の字状に配列された4個のフォトタ
イオートlla、11b、lie、lidから成る4素
子フオトデイデクタが用いられている。812図はその
検出素子11上にパターン像Pa、 Pb、Pcが入射
した状態を示している。
10 to 12M show a second embodiment of the present invention, in which the open ropacoon 41 of the fundus conjugate diaphragm 4 is square and blurred as shown in FIG. 1O, and the two-dimensional position detection element 11 is as shown in FIG. 11. As shown, a four-element photodetector consisting of four photodiodes lla, 11b, lie, and lid arranged in a ``ta'' shape is used. FIG. 812 shows a state in which pattern images Pa, Pb, and Pc are incident on the detection element 11.

この場合も先の第1の実施例と同様に、正視眼ならば四
角のパターン像Pa’、 Pb、 Pcは中心で重なり
、各ダイオードlla〜lidからは同一の信号が出力
される。しかし、パターン像Pa、Pb、 Pcが第1
2図に示すように中心からずれた場合には、各ダイオー
ドlla〜lidの出力信号に大小関係が生ずるので、
これによってそのパターン像Pa、 Pb、Pcの位置
を検出することができる。
In this case, as in the first embodiment, if the eye is emmetropic, the square pattern images Pa', Pb, and Pc overlap at the center, and the same signal is output from each of the diodes lla to lid. However, the pattern images Pa, Pb, and Pc are the first
As shown in Figure 2, if the output signal is off-center, there will be a magnitude relationship between the output signals of the diodes lla to lid.
This allows the positions of the pattern images Pa, Pb, and Pc to be detected.

第13図は本発明の第3の実施例を示すものであり、こ
の場合は第1図の絞り4に相当する眼底共役絞り12の
開ロバターン12a、12bが、第14図に示すように
互いに直角をなす2個のスリットで構成されている。ま
た、検出には2個の一次元位置検出器子13.14がそ
の延長線が直交するようにして配置されている。これら
の位置検出素子13.14はアレイ素子によるデジタル
式又はアナログ式の一次元位置検出器でよい。検出素子
13.14の直前には、測定に無関係な方向に光を集光
するために、検出素子13.14の長さ方向に母線を有
するシリンドリカルレンズ15.16が付加されている
FIG. 13 shows a third embodiment of the present invention, in which opening patterns 12a and 12b of the fundus conjugate diaphragm 12, which corresponds to the diaphragm 4 in FIG. 1, are mutually arranged as shown in FIG. It consists of two slits that are at right angles. Further, for detection, two one-dimensional position detector elements 13 and 14 are arranged so that their extension lines are perpendicular to each other. These position sensing elements 13, 14 may be digital or analog one-dimensional position sensing devices using array elements. Immediately in front of the detection element 13.14, a cylindrical lens 15.16 having a generatrix in the length direction of the detection element 13.14 is added in order to focus light in a direction unrelated to measurement.

第15図は位置検出素子13.14」二に結像されたパ
ターン像Pa、Pbを表しており、これらの位置を数値
的にめることとより、先の実施例と同様の測定がなし得
る。
FIG. 15 shows the pattern images Pa and Pb formed on the position detection elements 13 and 14, and by numerically determining these positions, the same measurements as in the previous example can be avoided. obtain.

このように本発明に係る眼屈折測定器は、機械的な可動
部を有さず、しかも全体の構造を簡易に小型化にでき、
迅速に測定がなし得る利点かある。また、被検眼と対物
レンズとの距離による誤差を、開ロバターンからの入射
光を光軸と平行にすることにより除去することができる
ので、測定精度も高いという長所を持っている。
As described above, the ocular refractometer according to the present invention has no mechanically movable parts, and the overall structure can be easily miniaturized.
There are advantages to rapid measurement. Furthermore, since errors caused by the distance between the eye to be examined and the objective lens can be removed by making the incident light from the open rotor pattern parallel to the optical axis, it has the advantage of high measurement accuracy.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明に係る眼屈折測定器の実施例を示し、第1
図は第1の実施例の禍成図、第2図は光源の配置図、第
3図〜第5図は絞りの正面図、第6図〜第9図は検出素
子上のパターン像の説明図、第1O図は第2の実施例の
眼底共役絞りの正面図、第″11図は検出素子の配置図
、第12図は検出素子上のパターン像の説明図、第13
図は第3の実施例の構成図、第14図は眼底共役絞りの
正面図、第15図は検出素子上のパターン像の説明図で
ある。 符号1a、lb、IQは光源、4は眼底共役絞り、6.
9.12は瞳共役絞り、40.41.6a、6b、6c
、12a、l 2. bは開ロバターン、7は穴開きミ
ラー、8は対物レンズ、11は二次元的位置検出素子、
lla、llb、11c、lidはフォトダイオード、
13.14は一次元的位置検出素子、15.16はシリ
ンドリカルレンズ、Eは被検眼、EPは瞳孔、Efは眼
底、Pa、 Pb、Pcはパターン像である。 特許出願人 キャノン株式会社
The drawings show an embodiment of the ocular refractometer according to the present invention, and the first
The figure is a diagram of the failure of the first embodiment, Figure 2 is a layout diagram of the light source, Figures 3 to 5 are front views of the aperture, and Figures 6 to 9 are explanations of pattern images on the detection element. 10 is a front view of the fundus conjugate aperture of the second embodiment, FIG.
14 is a front view of a fundus conjugate aperture, and FIG. 15 is an explanatory diagram of a pattern image on a detection element. 1a, lb, and IQ are light sources; 4 is a fundus conjugate aperture; 6.
9.12 is the pupil conjugate aperture, 40.41.6a, 6b, 6c
, 12a, l 2. b is an open rotor pattern, 7 is a mirror with a hole, 8 is an objective lens, 11 is a two-dimensional position detection element,
lla, llb, 11c, lid are photodiodes,
13.14 is a one-dimensional position detection element, 15.16 is a cylindrical lens, E is the eye to be examined, EP is the pupil, Ef is the fundus, and Pa, Pb, and Pc are pattern images. Patent applicant Canon Co., Ltd.

Claims (1)

【特許請求の範囲】 1、被検眼瞳孔の少なくとも3個所の異なる位置を経由
して眼底に順次にパターンを投影する投影光学系と、前
記眼、底からの反射光を位置検出素子で受光する受光光
学系とから成り、前記眼底上のパターン像の二次元的位
置情報から眼屈折値をめることを特徴とする眼屈折測定
器。 2、前記投影光学系は順次に点灯される3個の光源によ
って、前記眼底に順次にパターンを投影するようにした
特許請求の範囲第1項に記載の眼屈折測定器。 3、前記パターンを被検眼瞳孔の周辺部の3点から投影
し、前記眼底からの反射光を瞳孔の中心部から取出して
、二次元位置検出素子で受光するようにした特許請求の
範囲第1項に記載の眼屈折測定器。 4、 前記パターンは正方形をなし、該パターンを瞳孔
の周辺部の3点から投影し、前記眼底からの反射光を瞳
孔の中心部から取出して、4素子を平面的に配列した検
出素子で受光するようにした特許請求の範囲第1項に記
載の眼屈折測定器。 5、 前記パターンは相互に直角をなす2個の矩形状の
スリットから成り、該パターンを瞳孔の周辺部の3点か
ら投影し、前記眼底からの反射光を瞳孔の中心部から取
出して、2個の一部元位1δ検出素子で受光するように
した特許請求の範囲第1項に記載の眼屈折測定器。 6、 前記2個の一次元位置検出素子の前に、検出位置
方向に母線を有するシリトリカルレンズを乱行した特許
請求の範囲第5項に記・伎の眼屈折測定器。
[Scope of Claims] 1. A projection optical system that sequentially projects a pattern onto the fundus of the eye via at least three different positions of the pupil of the eye to be examined, and a position detection element that receives reflected light from the eye and the fundus. 1. An eye refraction measuring instrument comprising a light receiving optical system, and calculating an eye refraction value from two-dimensional positional information of the pattern image on the fundus. 2. The ocular refractometer according to claim 1, wherein the projection optical system sequentially projects a pattern onto the fundus of the eye using three light sources that are sequentially turned on. 3. The pattern is projected from three points on the periphery of the pupil of the eye to be examined, and the reflected light from the fundus is extracted from the center of the pupil and received by a two-dimensional position detection element. The ocular refraction measuring device described in Section 1. 4. The pattern has a square shape, the pattern is projected from three points on the periphery of the pupil, and the reflected light from the fundus is extracted from the center of the pupil and received by a detection element having four elements arranged in a plane. An eye refractometer according to claim 1, wherein the ocular refractometer is configured to: 5. The pattern consists of two rectangular slits at right angles to each other, the pattern is projected from three points on the periphery of the pupil, and the reflected light from the fundus is extracted from the center of the pupil. The eye refraction measuring device according to claim 1, wherein light is received by a plurality of partial element 1δ detection elements. 6. The eye refractometer according to claim 5, wherein a silitoric lens having a generatrix in the direction of the detection position is disposed in front of the two one-dimensional position detection elements.
JP58126349A 1983-07-12 1983-07-12 Eye refraction measuring instrument Pending JPS6018153A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58126349A JPS6018153A (en) 1983-07-12 1983-07-12 Eye refraction measuring instrument

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58126349A JPS6018153A (en) 1983-07-12 1983-07-12 Eye refraction measuring instrument

Publications (1)

Publication Number Publication Date
JPS6018153A true JPS6018153A (en) 1985-01-30

Family

ID=14932969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58126349A Pending JPS6018153A (en) 1983-07-12 1983-07-12 Eye refraction measuring instrument

Country Status (1)

Country Link
JP (1) JPS6018153A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4952049A (en) * 1985-04-12 1990-08-28 Canon Kabushiki Kaisha Apparatus for measuring the refraction of eye
JPH0898803A (en) * 1995-09-04 1996-04-16 Canon Inc Eye refraction measuring instrument

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4952049A (en) * 1985-04-12 1990-08-28 Canon Kabushiki Kaisha Apparatus for measuring the refraction of eye
JPH0898803A (en) * 1995-09-04 1996-04-16 Canon Inc Eye refraction measuring instrument

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