JPS60181297A - Manufacture of alumite substrate for high density magnetic recording material - Google Patents

Manufacture of alumite substrate for high density magnetic recording material

Info

Publication number
JPS60181297A
JPS60181297A JP3539584A JP3539584A JPS60181297A JP S60181297 A JPS60181297 A JP S60181297A JP 3539584 A JP3539584 A JP 3539584A JP 3539584 A JP3539584 A JP 3539584A JP S60181297 A JPS60181297 A JP S60181297A
Authority
JP
Japan
Prior art keywords
alumite
film
magnetic recording
chromic acid
high density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3539584A
Other languages
Japanese (ja)
Inventor
Koichi Yoshida
幸一 吉田
Yoshio Hirayama
平山 良夫
Takashi Kajiyama
梶山 隆
Yasuo Oka
安夫 岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Light Metal Co Ltd
Original Assignee
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Light Metal Co Ltd filed Critical Nippon Light Metal Co Ltd
Priority to JP3539584A priority Critical patent/JPS60181297A/en
Publication of JPS60181297A publication Critical patent/JPS60181297A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain an alumite substrate for a high density magnetic recording material having no black spots, superior smoothness and heat resistance in a shortened treatment time by treating an Al material in a chromic acid soln. contg. a specified amount of oxalic acid. CONSTITUTION:An Al or Al alloy plate is immersed in a soln. contg. chromic acid by 15-150g/l and oxalic acid by 1g/l or <1/5 of the amount of chromic acid, and it is treated at constant voltage and prescribed current density to form an opaline smooth alumite film. By this method, an alumite substrate for a high density magnetic recording material provided with a film having superior hardness and preventing cracking is obtd.

Description

【発明の詳細な説明】 本発明は、クロム酸アルマイト法においてアルマイト処
理時間を短縮し得て黒点欠陥がなく平滑度や耐熱性が優
れている高密度磁気記録用アルマイト基板の製造方法に
関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing an alumite substrate for high-density magnetic recording, which can shorten the alumite treatment time using the chromic acid alumite method, has no black spot defects, and has excellent smoothness and heat resistance. be.

磁気ディスク等の磁気記録基板として要望される耐摩耗
性が優れ、研摩性も良好で高精度の平滑面が得られ易く
、容易にその表面に薄膜の磁性層が形成できるものとし
て、アルマイト処理を施行したアルミニウム又はアルミ
ニウム合金が用いられている。しかしながら、このアル
マイト基板には、アルミニウム又はアルミニウム合金素
材中に存在する鉄、ケイ素等の不純物が金属間化合物と
して晶出し、これが素材表面に点在してアルマイト処理
に際してこの部分がごく微小なアルマイト皮膜欠陥部と
なるいわゆる黒点欠陥といわれる欠陥が生じ、この欠陥
部は、当初はサブミクロン単位のごく微小なものである
がアルマイト皮膜の成長とともに拡大して5Rn以上の
皮膜環のアルマイト層では、5〜10μmのピット状微
小欠陥となるのでこの数が多い程磁気記録材における信
号エラーが多くなるものであって好ましくない。又、高
密度磁気記録板とする場合にアルマイト基板上に。
Alumite treatment is used because it has excellent abrasion resistance, which is required for magnetic recording substrates such as magnetic disks, has good abrasiveness, makes it easy to obtain a highly accurate smooth surface, and can easily form a thin magnetic layer on the surface. aluminum or aluminum alloys are used. However, in this alumite substrate, impurities such as iron and silicon that are present in the aluminum or aluminum alloy material crystallize as intermetallic compounds, and these impurities are dotted on the surface of the material and during alumite treatment, these parts become a very small alumite film. A defect called a so-called black spot defect occurs, and this defect is initially very small on the submicron scale, but expands as the alumite film grows and becomes 5Rn or more in the alumite layer of the film ring. Since the pit-like minute defects are 10 μm in size, the larger the number, the more signal errors in the magnetic recording material will occur, which is not preferable. Also, when making a high-density magnetic recording plate, on an alumite substrate.

α−Fe=04をスパッタリングその他の方法によって
被着させ、300〜400℃に加熱して1−Pe菅Os
化する必要があるが、このような高温加熱を行なった場
合、アルマイト皮膜に亀裂を生じこのため製品不良を起
し易いといった問題があり、そのためにアルマイト層の
皮膜厚を1〜3urn程度といった極端に薄い皮膜にし
なければならずアルマイト基板の耐ヘツドクラツシユ性
低下の原因となるものであった、 これらの問題を解決する手段として、さきにアルミニウ
ム又はアルミニウム合金材をクロム酸溶液中で定電圧法
で通常使用される電解電圧より高い電圧でアルマイト処
理する方法を提案した。(特願昭48−44364) 
Lかしながら、この方法においては、電流督度が低く、
たとえば硫酸浴を使用する硫酸アルマイト法では、厚さ
が10割の皮膜を得るのには、20〜35分であるのに
対してクロム酸アルマイト法では、70〜200分を要
するようにアルマイト皮膜の生成速度が遅いという問題
が認められた。しかして、電流密度を上げるためには。
α-Fe=04 was deposited by sputtering or other method and heated to 300-400°C to form 1-Pe tube Os.
However, when such high-temperature heating is performed, there is a problem that cracks occur in the alumite film, which can easily cause product defects. As a means to solve these problems, we first applied a constant voltage method to aluminum or aluminum alloy materials in a chromic acid solution. We proposed a method for alumite treatment at a voltage higher than the commonly used electrolytic voltage. (Patent application 1973-44364)
However, in this method, the current rating is low,
For example, in the sulfuric acid alumite method, which uses a sulfuric acid bath, it takes 20 to 35 minutes to obtain a 100% thick film, whereas in the chromic acid alumite method, it takes 70 to 200 minutes to form an alumite film. The problem of slow production speed was recognized. However, in order to increase the current density.

印加電圧を大きくするか、又は浴温を上げて電流を流れ
易くする必要があるが、クロム酸アルマイト法では、望
ましくは60V以上の高い電圧を要するものであって、
さらに電圧を上げると皮膜破壊を生じるために電圧を上
げるのにも限度があるものであり、又、浴温を上げるこ
とは効果がいちじるしいが皮膜が軟化するためにスパッ
タリング下地としての強度が不十分となるのでこれもま
た限度があるものであったー。
It is necessary to increase the applied voltage or raise the bath temperature to facilitate the flow of current, but the chromic acid alumite method requires a high voltage, preferably 60 V or more,
Furthermore, there is a limit to how much voltage can be raised because the film will break if the voltage is increased, and although raising the bath temperature is very effective, the film becomes soft and its strength as a sputtering base is insufficient. Therefore, this also had its limits.

本発明者らは、クロム酸使用の利点を残しながら処理時
間を短縮し得る方法を得べく研究を重ねた結果、クロム
酸溶液に7ニウ削を適量添加することによって目的を達
しイ4ることを認めて本発明をなしたものであるのすな
わち9本発明は、アル ・ミニラム又はアルミニウム合
金材をl g/l乃至クロム酸に対して115tを超え
ない量のシュウ酸を含有スる15〜150 g/lのク
ロム酸溶液中でアルマイト処理する高密度磁気記録用ア
ルマイト基板の製造方法である。
As a result of repeated research to find a method that could shorten the processing time while retaining the advantages of using chromic acid, the present inventors found that the objective could be achieved by adding an appropriate amount of 7-niu shavings to the chromic acid solution. The present invention was made in recognition of the above.9 The present invention is based on the following: Al minilum or aluminum alloy material containing oxalic acid in an amount not exceeding 115 tons per 1 g/l to chromic acid. This is a method for manufacturing an alumite substrate for high-density magnetic recording in which alumite treatment is performed in a 150 g/l chromic acid solution.

本発明において使用するアルミニウム又はアルミニウム
合金材としては9通常の板材を使用し得るが、黒点欠陥
の点からは鉄、ケイ素等の含有量の少ないものの方が好
ましい。
As the aluminum or aluminum alloy material used in the present invention, ordinary plate materials can be used, but from the viewpoint of black spot defects, those containing less iron, silicon, etc. are preferable.

又、アルマイト用′屯解浴としては、クロム酸溶液は、
濃度が15〜150 g/lの範囲で使用するものであ
シ、この範囲外では本発明による効果を十分には発揮し
得ないものであり、混在させるシュウ酸の濃度は、1f
i/l乃至クロム酸の115を超えない量の範囲で使用
するものでありて、シュウ酸含量が1971以下では添
加効果が少なく、クロム酸の175量以上添加するとア
ルマイト皮膜の硬度は高くなるがビッカース硬度が40
0Hvを超えると熱クラツクを発生し易くなるので好1
しくない0次に、 Al−4%Mg合金材を使用してC
rα509/1浴にシュウ酸の添加量を変えて添加した
浴中で浴温度を変えて電圧を100v一定でアルマイト
処理を行ない、その時の電流密度A/dm”乃びビッカ
ース硬度Hv(荷重15g0表面から測定)を測定した
結果を次表に示す。なお、アルマイト皮膜の厚さは、1
0μmとなるようにした。ただし、30℃シュウ酸無添
加では200分電解しても5μmの膜厚しか得られず、
ここで中止した。
In addition, as a chlorination bath for alumite, chromic acid solution is
The concentration of oxalic acid used should be within the range of 15 to 150 g/l; outside this range, the effects of the present invention cannot be fully exhibited, and the concentration of oxalic acid to be mixed should be 1 f.
It is used in an amount that does not exceed i/l or 115 of chromic acid; if the oxalic acid content is less than 1971, the effect of addition is small, and if the amount of chromic acid is added in an amount of 175 or more, the hardness of the alumite film increases. Vickers hardness is 40
If it exceeds 0Hv, thermal cracks are likely to occur, so it is preferable.
C
Alumite treatment was carried out in a rα509/1 bath with varying amounts of oxalic acid added, while changing the bath temperature and keeping the voltage constant at 100V. The results of the measurements are shown in the table below.The thickness of the alumite film is 1.
The thickness was set to 0 μm. However, at 30°C without the addition of oxalic acid, a film thickness of only 5 μm can be obtained even after 200 minutes of electrolysis.
I stopped here.

(5) 上表にみられるように2通常のグツサード法と呼ばれる
定電圧クロム酸アルマイト法においては。
(5) As shown in the table above, 2. In the constant voltage chromic acid alumite method called the usual Gutsard method.

浴温度は35〜50℃で行なうが浴温度が高いと皮膜が
軟化するものであるが、シュウ酸を添加することによっ
て、同じ浴温度の場合には皮膜硬度を高くし得るもので
あり、同程度の硬度の皮膜が得られればよい場合には浴
温度を高くすることができ。
The bath temperature is 35 to 50°C, but if the bath temperature is high, the film will soften, but by adding oxalic acid, the film hardness can be increased at the same bath temperature. If it is sufficient to obtain a film with a certain degree of hardness, the bath temperature can be increased.

したがって電流密度の増大を可能とし、処理時間を短縮
することができるものである。すなわち。
Therefore, it is possible to increase the current density and shorten the processing time. Namely.

一定の電圧と浴温度での処理を行なう場合は、30℃近
傍のような比較的低温度域ではシュウ酸添加による電流
密度の上昇がいちじるしいために浴温度を一定にしてお
いて処理時間を大巾に短縮する(6) ことができる。又、浴温度が35℃以上では、電流密度
はあまり変化しないが皮膜硬度の上昇効果が顕在化する
だめに、同じ浴温度、電圧のまま硬度の高い皮膜を得る
ことができ、硬度を一ト昇させる必要がなければたとえ
ば電圧を一定とし浴fRWを35℃から40℃に上昇さ
せることにより電流密度を1.5倍程度上昇させること
が可能(処理時間は電流密度にほぼ反比例する)であり
、したがって処理時間を大巾に短縮し得しかも硬度を低
下させずにすむものである。このように、浴温度は、目
的が硬度噌大か9時間短縮かによって30〜50℃の範
囲で選択し得るものである。なお、電圧は、グツサード
法の40Vより高<60℃以上であり、70〜100■
であることが好ましい。
When processing at a constant voltage and bath temperature, the current density increases significantly due to the addition of oxalic acid in a relatively low temperature range such as around 30°C, so it is necessary to keep the bath temperature constant and increase the processing time. It can be shortened to width (6). In addition, when the bath temperature is 35°C or higher, the current density does not change much, but the effect of increasing film hardness becomes obvious. If there is no need to increase the current density, for example, by keeping the voltage constant and increasing the bath fRW from 35°C to 40°C, it is possible to increase the current density by about 1.5 times (the processing time is approximately inversely proportional to the current density). Therefore, the processing time can be greatly shortened without reducing the hardness. Thus, the bath temperature can be selected within the range of 30 to 50°C depending on whether the objective is to increase the hardness or shorten the time by 9 hours. In addition, the voltage is higher than 40V for the Gutsard method and is 60℃ or higher, and 70 to 100V.
It is preferable that

このようにして得られたアルマイト基板は、微小黒点の
発生が見られず、又、耐ヘッドクラツシユ性を高めるた
めに皮膜厚を10師以上に成長させても大きく成長した
黒点も見当らないし、又。
In the alumite substrate obtained in this way, no minute sunspots were observed, and even when the film was grown to a thickness of 10 or more in order to improve head crushing resistance, no large sunspots were found. or.

耐熱性も優れていて磁性膜形成のため300〜400℃
に加熱保持してもクラックの発生がおこらなかっっだ〇 本発明は、クロム酸浴を使用するアルマイト処理に際し
て、クロム酸溶液に適量のシュウ酸を添加した浴を使用
するようにしたので、学独のクロム酸浴使用時に較べて
、皮膜の硬度、黒点欠陥。
Excellent heat resistance, 300-400℃ for forming magnetic film
Cracks did not occur even when heated and held at a temperature of Compared to when using German chromic acid bath, film hardness and black spot defects were improved.

平滑度、耐熱性などのよい特性を低下させることなく、
処理時間を短縮し得るものであり、硬度についてはむし
ろ大巾に増大し得るものであるなど優れた効果が認めら
れる。
without reducing good properties such as smoothness and heat resistance.
Excellent effects have been recognized, such as the ability to shorten processing time and the ability to significantly increase hardness.

次に9本発明方法の実施例を述べる。Next, nine examples of the method of the present invention will be described.

実施例1 高密度磁気記録用アルミニウム合金(AJ−4%Mg合
金、内径755m、外径200■、厚さ2m+)を所定
の表面研摩を施した後、非浸食性洗浄剤によって洗浄し
、30℃に加熱した50g/lクロム酸溶液にシュウ酸
10g/lを添加した浴中に浸漬してアノードとし、電
圧は100V一定としてアルマイト処理し。
Example 1 An aluminum alloy for high-density magnetic recording (AJ-4% Mg alloy, inner diameter 755 m, outer diameter 200 mm, thickness 2 m+) was subjected to a specified surface polishing, and then washed with a non-erosive cleaning agent for 30 minutes. The anode was immersed in a bath containing 10 g/l of oxalic acid added to a 50 g/l chromic acid solution heated to 0.degree. C., and the voltage was kept constant at 100 V for alumite treatment.

10師の乳白色の平滑なアルマイト皮膜を形成させた。A smooth milky white alumite film was formed.

このときの電流密度は、030A/、イであり。The current density at this time is 030 A/.

処理時間は190分間であった。The treatment time was 190 minutes.

得られた皮膜のビッカース硬度は351Hvであり。The Vickers hardness of the obtained film was 351 Hv.

顕微鏡で観察したが黒点欠陥は認められず、又。When observed under a microscope, no sunspot defects were observed.

この皮膜をさらに350℃に2時間加熱した後、顕微鏡
で観察したがクラックの発生は皆無であった。
After this film was further heated to 350° C. for 2 hours, it was observed under a microscope, and no cracks were observed.

比較例 シュウ酸を添加せずに、実施例1と同じ条件でクロム酸
のみの溶液中でアルマイト処理を行なった。このときの
電流密度は、0.16 ’/dm−であり。
Comparative Example Alumite treatment was carried out in a solution containing only chromic acid under the same conditions as in Example 1 without adding oxalic acid. The current density at this time was 0.16'/dm-.

処理時間は200分間でも5IHnの膜厚しか得られな
かった。
Even when the treatment time was 200 minutes, a film thickness of only 5IHn was obtained.

得られた皮膜のビッカース硬度は、膜厚が不十分で測定
できなかったが、黒点欠陥、クラック等の諸観察では異
状は認められなかった。
Although the Vickers hardness of the obtained film could not be measured due to insufficient film thickness, no abnormalities such as black spot defects and cracks were observed during various observations.

実施例2 シュウ酸添加量を59々とじ、浴温度を40℃とした以
外は、実施例1と同様にしてアルマイト処理を行なった
。このときの電流密度は、 0.651Vdm・であり
、処理時間は、75分間であった。
Example 2 Alumite treatment was carried out in the same manner as in Example 1, except that the amount of oxalic acid added was 59% and the bath temperature was 40°C. The current density at this time was 0.651 Vdm·, and the treatment time was 75 minutes.

得られた皮膜のビッカース硬度は、351Hvであ如、
黒点欠陥、クラック等の諸観察では異状は認(9) められなかった。
The Vickers hardness of the obtained film was 351Hv.
No abnormalities such as black spot defects or cracks were observed (9).

比較例2 シュウ酸を添加せず、浴温度を35℃とした以外は実施
例1と同様にしてクロム酸のみの溶液中でアルマイト処
理を行なった。このときの電流密度は、0.43 k/
dm”であり、処理時間は、110分間であった。
Comparative Example 2 Alumite treatment was performed in a solution containing only chromic acid in the same manner as in Example 1 except that oxalic acid was not added and the bath temperature was 35°C. The current density at this time is 0.43 k/
dm'' and the treatment time was 110 minutes.

得られた皮膜のビッカース硬度は、359Hvであり、
黒点欠陥、クラック等の諸観察では異状は認められなか
った。
The Vickers hardness of the obtained film was 359Hv,
No abnormalities such as black spot defects and cracks were observed.

比較例3 シュウ酸を添加せず、浴温度を40℃とした以外は、実
施例1と同様にしてクロム酸のみの溶液中でアルマイト
処理を行なった。このときの電流密度は、0.66 A
Jdm、であり、処理時間は、73分間であったが、得
られた皮膜のビッカース硬度は、2481(vであって
硬度が低かった。
Comparative Example 3 Alumite treatment was performed in a solution containing only chromic acid in the same manner as in Example 1, except that oxalic acid was not added and the bath temperature was 40°C. The current density at this time is 0.66 A
Jdm, and the treatment time was 73 minutes, but the Vickers hardness of the obtained film was 2481 (v), which was low.

特許出願人 日本軽金属株式会社 (10)Patent applicant: Nippon Light Metal Co., Ltd. (10)

Claims (1)

【特許請求の範囲】[Claims] 1)アルミニウム又はアルミニウム合金材を1し乃至ク
ロム酸に対して115を超えない量のシュウ酸を含有す
る15〜150 flのクロム酸溶液中でアルマイト処
理することを特徴とする高密度磁気記録用アルマイト基
板の製造方法。
1) For high-density magnetic recording, characterized in that aluminum or aluminum alloy material is alumite-treated in a chromic acid solution of 15 to 150 fl containing an amount of oxalic acid not exceeding 115 to 1 to chromic acid. A method for manufacturing an alumite substrate.
JP3539584A 1984-02-28 1984-02-28 Manufacture of alumite substrate for high density magnetic recording material Pending JPS60181297A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3539584A JPS60181297A (en) 1984-02-28 1984-02-28 Manufacture of alumite substrate for high density magnetic recording material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3539584A JPS60181297A (en) 1984-02-28 1984-02-28 Manufacture of alumite substrate for high density magnetic recording material

Publications (1)

Publication Number Publication Date
JPS60181297A true JPS60181297A (en) 1985-09-14

Family

ID=12440729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3539584A Pending JPS60181297A (en) 1984-02-28 1984-02-28 Manufacture of alumite substrate for high density magnetic recording material

Country Status (1)

Country Link
JP (1) JPS60181297A (en)

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