JPS6176699A - Manufacture of alumite substrate for high density magnetic recording material - Google Patents

Manufacture of alumite substrate for high density magnetic recording material

Info

Publication number
JPS6176699A
JPS6176699A JP19884884A JP19884884A JPS6176699A JP S6176699 A JPS6176699 A JP S6176699A JP 19884884 A JP19884884 A JP 19884884A JP 19884884 A JP19884884 A JP 19884884A JP S6176699 A JPS6176699 A JP S6176699A
Authority
JP
Japan
Prior art keywords
alumite
chromic acid
acid
magnetic recording
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19884884A
Other languages
Japanese (ja)
Inventor
Yoshio Hirayama
平山 良夫
Yasushi Egami
江上 泰
Takashi Kajiyama
梶山 隆
Yasuo Oka
安夫 岡
Hirobumi Iwasa
岩佐 博文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Light Metal Co Ltd
Original Assignee
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Light Metal Co Ltd filed Critical Nippon Light Metal Co Ltd
Priority to JP19884884A priority Critical patent/JPS6176699A/en
Publication of JPS6176699A publication Critical patent/JPS6176699A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To shorten the treatment time and to improve the work efficiency without deteriorating the superior characteristics of an alumite film when an alumite substrate for a high density magnetic recording material is manufactured by anodic oxidation with chromic acid, by adding a specified org. acid or a salt thereof to a chromic acid soln. CONSTITUTION:When an alumite substrate for a high density magnetic recording material as a magnetic recording substrate for a magnetic disk or the like is manufactured by anodic oxidation with chromic acid, an Al or Al alloy material is immersed in a soln. contg. 15-150g/l chromic acid and one or more kinds of compounds selected among sulfonic acid, sulfonates, sulfamic acid and sulfamates. The concn. of the compounds is 1/100-1/4 time the concn. of chromic acid. The Al or Al alloy material is anodically oxidized in the soln. by supplying electric current. An alumite film having superior hardness, smoothness and heat resistance and free from black spots can be formed on the surface of the Al or Al alloy material in a short time.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 クロム酸陽極酸化法による高密度磁気記録材用アルマイ
ト基板の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method of manufacturing an alumite substrate for high-density magnetic recording material using a chromic acid anodization method.

〔従来の技術〕[Conventional technology]

磁気ディスク等の磁気記録基板として要望される耐摩耗
性が優れ、研摩性も良好で高精度の平滑面が得られ易く
、容易にその表面に薄膜の磁性層が形成できるものとし
て、アルマイト処理を施したアルミニウム又はアルミニ
ウム合金が用いられている。しかしながら、このアルマ
イト基板には、アルミニウム又はアルミニウム合金素材
中に存在する鉄、ケイ素等の不純物が金属間化合物とし
て晶出し、これが素材表面に点在してアルマイト処理に
際してこの部分がごく微小なアルマイト皮膜欠陥部とな
るいわゆる黒点欠陥といわれる欠陥が生じ、この欠陥部
は、当初はサブミクロン単位のごく微小なものであるが
アルマイト皮膜の成長とともに拡大して5μm以上の皮
膜厚のアルマイト層では、5〜10μmのピット状微小
欠陥となるのでこの数が多い程磁気記録材における信号
エラーが多くなるものであって好ましくない、又、高密
度磁気記録板とする場合にアルマイト基板上に。
Alumite treatment is used because it has excellent abrasion resistance, which is required for magnetic recording substrates such as magnetic disks, has good abrasiveness, makes it easy to obtain a highly accurate smooth surface, and can easily form a thin magnetic layer on the surface. Coated aluminum or aluminum alloys are used. However, in this alumite substrate, impurities such as iron and silicon that are present in the aluminum or aluminum alloy material crystallize as intermetallic compounds, and these impurities are dotted on the surface of the material and during alumite treatment, these parts become a very small alumite film. Defects called so-called black spot defects occur, and these defects are initially very small on the submicron scale, but expand as the alumite film grows, and in an alumite layer with a film thickness of 5 μm or more, 5 μm. The larger the number of pit-like micro defects of ~10 μm, the more signal errors will occur in the magnetic recording material, which is not preferable.

α−Fag O,をスパッタリングその他の方法によっ
て被着させ、300〜400°Cに加熱してγ−F e
 203化する必要があるが、このような高温加熱を行
なった場合、アルマイト皮膜に亀裂を生じこのため製品
不良を起し易いといった問題が69.そのためにアルマ
イト層の皮膜厚を1〜3μm程度といった極端に薄い皮
膜にしなければならずアルマイト基板の対ヘツドクラッ
シュ性低下の原因となるものであった。
α-Fag O, is deposited by sputtering or other methods and heated to 300-400°C to form
However, when such high-temperature heating is performed, cracks occur in the alumite film, which tends to cause product defects. Therefore, the thickness of the alumite layer must be extremely thin, on the order of 1 to 3 .mu.m, which causes a decrease in the head crush resistance of the alumite substrate.

これらの問題を解決する手段として、さきにアルミニウ
ム又はアルミニウム合金材をクロム酸溶液中で定電圧法
で通常使用される電解電圧よシ高い電圧でアルマイト処
理する方法を提案した(特願昭58−44364)。し
かしながら、この方法においては、電流密度が低く、た
とえば硫酸浴を使用する硫酸アルマイト法では、厚さが
10μmの皮膜を得るのには、20〜35分であるのに
対してクロム酸アルマイト法では、70〜200分を要
するようにアルマイト皮膜の生成速度が遅いという問題
が認められた。しかして、電流密度を上げるためには、
印加電圧を大きくするか、又は浴温を上げて電流を流れ
易くする必要があるが。
As a means to solve these problems, we have previously proposed a method of alumite treatment of aluminum or aluminum alloy materials in a chromic acid solution at a voltage higher than the electrolytic voltage normally used in the constant voltage method (Japanese Patent Application No. 1983- 44364). However, in this method, the current density is low; for example, in the sulfuric acid alumite method that uses a sulfuric acid bath, it takes 20 to 35 minutes to obtain a film with a thickness of 10 μm, whereas in the chromic acid alumite method, it takes 20 to 35 minutes to obtain a 10 μm thick film. The problem was recognized that the rate of formation of the alumite film was slow, requiring 70 to 200 minutes. However, in order to increase the current density,
It is necessary to increase the applied voltage or raise the bath temperature to facilitate the flow of current.

クロム酸アルマイト法では、望ましくはbov以上の高
い電圧t″要するものであって、さらに電圧を上げると
皮膜破壊を生じるために電圧を上げるのにも限度がある
ものであシ、又、浴温を上げることは皮膜生成効果がい
ちじるしいが皮膜が軟化するためにスパッタリング下地
としての強度が不十分となるのでこれもまた限度がある
ものでめった。
The chromic acid alumite method requires a high voltage t'', preferably higher than bov, and if the voltage is increased further, the film will break, so there is a limit to how much the voltage can be increased. Increasing the amount of heat has a remarkable effect on film formation, but the film becomes soft and has insufficient strength as a sputtering base, so this also has a limit and is rarely used.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

クロム酸陽極酸化法による高密度磁気記録用アルマイト
基板の製造方法の欠点である処理時間が長いのを解決し
ようとするものである。
This is an attempt to solve the long processing time, which is a drawback of the method of manufacturing an alumite substrate for high-density magnetic recording using the chromic acid anodization method.

〔問題点を解決するための手段〕[Means for solving problems]

本発明者等は、クロム酸の利点を残しながら処理時間を
短縮し得る方法を得るべく研究を重ねた結果、クロム酸
溶液にスルホン酸、スルホン酸塩、スルファミン酸およ
びスルファミン酸塩のうちの1種又は2種以上(以下、
添加物という。)を添加することによって目的を達する
ことを見い出して本発明を完成したものである。
As a result of repeated research in order to obtain a method that can shorten the processing time while retaining the advantages of chromic acid, the present inventors have discovered that one of sulfonic acid, sulfonate, sulfamic acid, and sulfamate is added to chromic acid solution. species or two or more species (hereinafter referred to as
It's called an additive. ) The present invention was completed by discovering that the object could be achieved by adding the following.

即ち2本発明はアルミニウム又はアルミニウム合金材を
クロム酸濃度に対して1/100以上。
That is, in the second aspect of the present invention, the concentration of aluminum or aluminum alloy material is 1/100 or more relative to the chromic acid concentration.

1/4以下の濃度の添加物を含有する15〜150P/
43のクロム酸溶液中でアルマイト処理することを特徴
とする高密度磁気記録材用アルマイト基板の製造方法で
ある。
15-150P/ containing additives with a concentration of 1/4 or less
This is a method for producing an alumite substrate for a high-density magnetic recording material, which is characterized by carrying out an alumite treatment in a chromic acid solution of No. 43.

本発明において使用するアルミニウム又はアルミニウム
合金材としては9通常の板材を使用し得るが、黒点欠陥
の点からは鉄、ケイ素等の含有量の少ないものの方が好
ましい。
As the aluminum or aluminum alloy material used in the present invention, ordinary plate materials can be used, but from the viewpoint of black spot defects, those containing less iron, silicon, etc. are preferable.

又、アルマイト用電解浴としては、クロム酸溶液は、濃
度が15〜150 f/J3の範囲で使用するものであ
シ、この範囲外では本発明による効果を十分には発揮し
得ないものである。
Furthermore, as an electrolytic bath for alumite, a chromic acid solution should be used with a concentration in the range of 15 to 150 f/J3, and the effects of the present invention cannot be fully exhibited outside this range. be.

本発明で言うスルホン酸とはベンゼンスルホン酸、トル
エンスルホン酸等であり、スルホン酸塩とはそれらの塩
である。スルホン酸のうち特定なものに限定したのはク
ロム酸浴に添加した時悪い影響を与えないことが必要だ
からである。水酸基(−OH)を有すると、クロム酸中
のCr’+を還元しCr3+とするため、電解しずらく
なシ、また浴自体も黒く変色する。カルボキシル基(−
COOH)を含む場合も、その中に一〇Hに相当する構
造を有するため、添加することは出来ない。
The sulfonic acids referred to in the present invention include benzenesulfonic acid, toluenesulfonic acid, etc., and the sulfonic acid salts are salts thereof. The reason why sulfonic acids were limited to specific ones is that it is necessary that they do not have any adverse effects when added to the chromic acid bath. When it has a hydroxyl group (-OH), Cr'+ in chromic acid is reduced to Cr3+, making it difficult to electrolyze and also causing the bath itself to turn black. Carboxyl group (-
Even if it contains COOH, it cannot be added because it has a structure corresponding to 10H.

添加物の濃度は、クロム酸の濃度の1/100以上、1
74以下の濃度範囲で使用するものであって、添加物の
製置が小さすぎると添加の効果が乏しく、′tた大きす
ぎると電解電流値の低下をもたらし、電解の挙動が不安
定となる。
The concentration of the additive is 1/100 or more of the concentration of chromic acid, 1
74 or less, and if the additive is placed too small, the effect of the addition will be poor, and if it is too large, the electrolytic current value will decrease and the electrolytic behavior will become unstable. .

〜〔作  用〕 クロム酸浴に添加物を添加すると、生成されたアルマイ
トの再溶解が抑制され、細孔の拡大が少ないため、BL
膜の硬度が向上する。一方、クロム酸陽極酸化法では浴
温の電流値に及はす影響が大きく、電流を増すためには
浴温の上昇が最も有効であるが、浴温の上昇によシアル
マイトの再溶解が顕著となシ、皮膜硬度の低下を引き起
こすことになる。その結果、添加物を添加することによ
って、皮膜硬度が低下するのを抑えながら電流値を増加
させることが可能となるものである。
~ [Function] When additives are added to the chromic acid bath, re-dissolution of the generated alumite is suppressed and pore expansion is small, so BL
The hardness of the film is improved. On the other hand, in the chromic acid anodization method, the bath temperature has a large effect on the current value, and increasing the bath temperature is the most effective way to increase the current, but increasing the bath temperature may cause re-dissolution of sialumite. This will cause a noticeable decrease in film hardness. As a result, by adding the additive, it is possible to increase the current value while suppressing a decrease in film hardness.

〔発明の効果〕〔Effect of the invention〕

従来のクロム酸アルマイトの持つ皮膜の硬度。 The hardness of the film of conventional chromic acid alumite.

黒点欠陥、平滑度、耐熱性などの優れた特性を低下させ
ることなく、処理時間を短縮できるものである。
Processing time can be shortened without degrading excellent properties such as black spot defects, smoothness, and heat resistance.

以下を実施例により詳細に説明する。The following will be explained in detail with reference to examples.

実施例1゜ 高密度磁気記録基板用アルミニウム合金(A−19−4
1け合金、内径75縣、外径200箇、厚さ2瓢)を所
定の表面研摩を施こした後、非侵食性洗浄剤によって洗
浄し、陽極酸化に供した。陽極酸化浴としてクロム酸に
トルエンスルホン酸を添加して使用した。この混酸浴は
クロム酸の還元による変色は生じなかった。実験に用い
た浴成分及び電解条件を第1表に示す。
Example 1 Aluminum alloy for high-density magnetic recording substrate (A-19-4
A 1-piece alloy (75 pieces in inner diameter, 200 pieces in outer diameter, 2 pieces in thickness) was subjected to a prescribed surface polishing, then cleaned with a non-erosive cleaning agent, and subjected to anodization. Toluenesulfonic acid was added to chromic acid and used as an anodizing bath. This mixed acid bath did not undergo discoloration due to reduction of chromic acid. Table 1 shows the bath components and electrolytic conditions used in the experiment.

第  1  表 第1表に示す電解中性で約10μmのアルマイトを生成
し、得られた試験片は、マイクロヴイツカース硬度1表
面状態を調べた。また、電解中の電流密度も測定した。
Table 1 An alumite of about 10 μm was produced with electrolytic neutrality as shown in Table 1, and the surface condition of the obtained test piece was examined for microvitskas hardness 1. The current density during electrolysis was also measured.

これらの結果を第2表に示す。These results are shown in Table 2.

第  2  表 註)1)電lll密度の単位 A/da+”2)硬度は
表工よりの測定  Hマ 3)表面状n   o:*好  Δ:大欠陥p第2表の
結果より明らかな通り同一硬度を得る場合、トルエンス
ルホン酸を添加すればよシ高温での処理が可能であシ、
その際電流密度は増すことにより、所定の膜厚を得るた
めの処理時間は大巾に短縮できた。
Table 2 Note) 1) Unit of electric density A/da+"2) Hardness is measured from the surface finish Hma3) Surface condition no: *Good Δ: Large defect p As is clear from the results in Table 2 In order to obtain the same hardness, it is better to add toluenesulfonic acid, which allows treatment at high temperatures.
At that time, by increasing the current density, the processing time to obtain a predetermined film thickness could be significantly shortened.

また、この皮膜をさらに350°C2時間加熱した後、
顕微鏡で観察したがクラックは皆無であった。
In addition, after further heating this film at 350°C for 2 hours,
When observed under a microscope, there were no cracks at all.

実施例2 実施例1.と同様の供試材に対し、クロム酸にスルファ
ミン酸を添加した浴にてアルマイトを施こした。さらに
、出来上った試験片を実施例1.と同様の測定・観察を
行なった。処理条件を第3表に。
Example 2 Example 1. Alumite was applied to the same test material in a bath containing chromic acid and sulfamic acid. Furthermore, the completed test piece was tested in Example 1. The same measurements and observations were carried out. The processing conditions are shown in Table 3.

結果を第4表に示す。The results are shown in Table 4.

第  3  表 第  4  表 実施例1.と同じ結論を得た。Table 3 Table 4 Example 1. got the same conclusion.

実施例五゛ 実施例1.と同様の供試材に対し、クロム酸にベンゼン
スルホン酸及びベンゼンスルホン酸ソーダを添加した浴
にてアルマイトを約10μm施こした。
Example 5 Example 1. Alumite was applied to a sample material similar to the above to a thickness of about 10 μm in a bath containing benzenesulfonic acid and sodium benzenesulfonate added to chromic acid.

電解電圧は70Vであった。さらに出来上った試験片を
実施例1.と同様の測定・観察を行なった。
The electrolysis voltage was 70V. Furthermore, the completed test piece was used in Example 1. The same measurements and observations were carried out.

処理条件及び結果を第5表に示す。The treatment conditions and results are shown in Table 5.

Claims (1)

【特許請求の範囲】[Claims] アルミニウム又はアルミニウム合金材をクロム酸濃度に
対して1/100以上、1/4以下の濃度のスルホン酸
、スルホン酸塩、スルファミン酸およびスルファミン酸
塩のうちの1種又は2種以上を含有する15〜150g
/lのクロム酸溶液中でアルマイト処理することを特徴
とする高密度磁気記録材用アルマイト基板の製造方法。
15 containing one or more of sulfonic acid, sulfonate, sulfamic acid, and sulfamate at a concentration of 1/100 or more and 1/4 or less of the chromic acid concentration in aluminum or aluminum alloy material ~150g
1. A method for producing an alumite substrate for a high-density magnetic recording material, characterized by carrying out an alumite treatment in a chromic acid solution of /l.
JP19884884A 1984-09-22 1984-09-22 Manufacture of alumite substrate for high density magnetic recording material Pending JPS6176699A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19884884A JPS6176699A (en) 1984-09-22 1984-09-22 Manufacture of alumite substrate for high density magnetic recording material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19884884A JPS6176699A (en) 1984-09-22 1984-09-22 Manufacture of alumite substrate for high density magnetic recording material

Publications (1)

Publication Number Publication Date
JPS6176699A true JPS6176699A (en) 1986-04-19

Family

ID=16397910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19884884A Pending JPS6176699A (en) 1984-09-22 1984-09-22 Manufacture of alumite substrate for high density magnetic recording material

Country Status (1)

Country Link
JP (1) JPS6176699A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1014727C2 (en) * 2000-03-23 2001-09-25 Univ Eindhoven Tech A method for electrolytically polishing a metal in the presence of an electrolyte composition, as well as a molded article obtained by such a method.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1014727C2 (en) * 2000-03-23 2001-09-25 Univ Eindhoven Tech A method for electrolytically polishing a metal in the presence of an electrolyte composition, as well as a molded article obtained by such a method.
WO2001071068A1 (en) * 2000-03-23 2001-09-27 Technische Universiteit Eindhoven Method for the electrolytic polishing of a metal in the presence of an electrolyte composition, as well as a moulded element obtained by using such a method

Similar Documents

Publication Publication Date Title
US4631112A (en) Surface-treated aluminum alloy substrates for magnetic disks
US3886052A (en) Method of making a magnetic recording disc
EP0216543B1 (en) Method of manufacturing of an anodized memory disc substrate
JPS6176699A (en) Manufacture of alumite substrate for high density magnetic recording material
US4507179A (en) Process of producing aluminum substrate for magnetic recording media
JPS62278294A (en) Production of substrate for magnetic recording medium
GB2136448A (en) Anodising Aluminium Substrate for Magnetic Recording Media
JP2001209925A (en) Aluminum substrate for magnetic recording medium and method for producing same
JPH025836B2 (en)
JPH0568772B2 (en)
JPH01133218A (en) Production of aluminum substrate for magnetic disk
JPS60175219A (en) Production of alumite substrate for high-density magnetic recording
JPS62207899A (en) Production of substrate for magnetic recording medium
JPS60164927A (en) Production of alumite substrate for high-density magnetic recording material
US4316778A (en) Method for the manufacture of recording substrates for capacitance electronic discs
JPS6260478B2 (en)
JPS6033392A (en) Preparation of alumite substrate for magnetic recording medium
JPS63303096A (en) Production of aluminum alloy substrate for magnetic disk
JPS60181297A (en) Manufacture of alumite substrate for high density magnetic recording material
JPH01223628A (en) High heat resistant substrate and production thereof
JPS60175211A (en) Substrate for heat resistant magnetic disk
JPS6139934A (en) Aluminum substrate for magnetic disk and its production
JPS60169594A (en) Manufacture of alumite substrate for high density magnetic recording material
JPH0316019A (en) Aluminum substrate
JPS6230276B2 (en)