JPS60169594A - Manufacture of alumite substrate for high density magnetic recording material - Google Patents

Manufacture of alumite substrate for high density magnetic recording material

Info

Publication number
JPS60169594A
JPS60169594A JP2195884A JP2195884A JPS60169594A JP S60169594 A JPS60169594 A JP S60169594A JP 2195884 A JP2195884 A JP 2195884A JP 2195884 A JP2195884 A JP 2195884A JP S60169594 A JPS60169594 A JP S60169594A
Authority
JP
Japan
Prior art keywords
alumite
magnetic recording
manufacture
specified
recording material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2195884A
Other languages
Japanese (ja)
Inventor
Koichi Yoshida
幸一 吉田
Yoshio Hirayama
平山 良夫
Takashi Kajiyama
梶山 隆
Yasuo Oka
安夫 岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Light Metal Co Ltd
Original Assignee
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Light Metal Co Ltd filed Critical Nippon Light Metal Co Ltd
Priority to JP2195884A priority Critical patent/JPS60169594A/en
Publication of JPS60169594A publication Critical patent/JPS60169594A/en
Pending legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To manufacture the titled alumite substrate free from black spots and having superior smoothness and heat resistance by anodizing Al in a sulfamic acid soln. having a specified concn. at a specified bath temp., a specified current density and a specified voltage. CONSTITUTION:An Al or Al alloy material is anodizing by electrolysis in a sulfamic acid soln. having >=1wt%, preferably 5-18wt% concn. at 10-80 deg.C, preferably 20-50 deg.C bath temp., 0.1-10A/dm<2>, preferably 0.5-5A/dm<2> current density and 10-100V, preferably 20-80V voltage. The electrolysis time is about 10- 15min. It is preferable that the Al or Al alloy material has low Fe and Si contents.

Description

【発明の詳細な説明】 黒点欠陥がなく,平滑度,耐熱性などがすぐれている高
密度磁気記録相川アルマイト基板の製造法に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a high-density magnetic recording Aikawa alumite substrate that has no black spot defects and has excellent smoothness, heat resistance, etc.

磁気ディスクのような磁気記録利基板として要望される
耐摩耗性がすぐれ,研摩性が良好で高精度の平滑面が得
られ易く,容易にその表面に薄膜の磁性層をl]多成し
得るものとして,アルマイトを施行したアルミニウム又
はアルミニウム合金利が用いられている。しかしながら
、このアルマイト基板には,アルミニウム又はアルミニ
ウム合金累月中に存在する鉄,ケイ素などの不純物が金
属間化合物として晶出し,これが素旧表面に点在してア
ルマイト処理に際してこの部分がごく微小なアルマイト
皮j換欠陥部となるいわゆる黒点欠陥か生じ,この欠陥
部は当初はサブミクロン単位のごく微小なものであるが
,アルマイト皮膜の成長とともに拡大して5μm以上の
皮膜厚のアルマイト層では,5〜10μmのピント状微
小欠陥となるのでこの数が多いほど磁気記録材における
信号エラーが多くなるので好捷しくないものである。又
,高智度磁気記録板とする場合にアルマイト基板上にα
−Fe3stをスパツタリングその他の方法によって被
着させて,300〜400℃に加熱してγ−Fez03
化する必要かあるか,このような高温加熱を行なった場
合,アルマイト皮膜に亀裂を生じ,このため製品不良を
おこし易いといった問題もあり,その/ζめにアルマイ
ト層の皮膜厚を1〜3μ78程度とい゛ っだ極端に薄
い皮膜厚にしなければならず、アルマイト板拐の1制ヘ
ノドクラノノコ性低下の原因となるものである。
It has excellent abrasion resistance, which is required for magnetic recording substrates such as magnetic disks, has good abrasiveness, makes it easy to obtain a highly accurate smooth surface, and can easily form multiple thin magnetic layers on the surface. As a material, anodized aluminum or aluminum alloy is used. However, in this alumite substrate, impurities such as iron and silicon that are present in the aluminum or aluminum alloy crystallize as intermetallic compounds, and these are scattered on the old surface and this part becomes extremely small during the alumite treatment. A so-called black spot defect, which is an alumite coating defect, occurs. Initially, this defect is very small on the submicron scale, but as the alumite film grows, it expands and becomes a black spot defect in an alumite layer with a film thickness of 5 μm or more. Since these are focused minute defects of 5 to 10 μm in size, the larger the number, the more signal errors occur in the magnetic recording material, which is undesirable. In addition, when making a high-intelligence magnetic recording plate, α
-Fe3st is deposited by sputtering or other method and heated to 300-400°C to form γ-Fez03.
Is it necessary to heat the alumite layer at such a high temperature?There is a problem that cracks occur in the alumite film, which can easily cause product defects. The thickness of the coating must be extremely thin, which causes a decrease in the consistency of the alumite plate.

本発明者らは、これらの問題を解決するためにイリ[死
を重ねた結果、電解浴としてスルファミノ酸溶液を使用
して電解条件を選定することによって目的を達し得るこ
とを認めて本発明をなしたものである。すなわち1本発
明は、アルミニウム又はアルミニウム合金材をIM量係
以上のスルファミノ酸溶液中で、浴温度10〜80℃、
電流密度0.1〜10 A/d+□2.電圧10〜10
0■でアルマイト処理する高密度磁気記録材用アルマイ
ト基板の製【告法である。
As a result of repeated efforts to solve these problems, the present inventors recognized that the objective could be achieved by selecting electrolytic conditions using a sulfamino acid solution as an electrolytic bath, and developed the present invention. This is what was done. That is, in the present invention, aluminum or aluminum alloy material is heated in a sulfamino acid solution having an IM quantity coefficient or higher at a bath temperature of 10 to 80°C.
Current density 0.1-10 A/d+□2. voltage 10~10
This is a method for manufacturing an alumite substrate for high-density magnetic recording materials, which is anodized at a temperature of 0.

本発明において使用するアルミニウム又はアルミニウム
合金イぢとしては1通常の板材が使用し得るが、黒点欠
陥の点からは鉄、ケイ累などの含有量が少ないものの方
が好捷しい。
As the aluminum or aluminum alloy used in the present invention, an ordinary plate material can be used, but from the viewpoint of black spot defects, it is preferable to use a material with a small content of iron, silica, etc.

アルマイト電解浴としては、スルファミノ酸溶液を使用
するのであるが、スルファミノ酸の濃度(は、1重量%
以上飽和甘での範囲て使用できるが。
A sulfamino acid solution is used as the alumite electrolytic bath, and the concentration of sulfamino acid (1% by weight) is
It can be used in a range of over saturated sweetness.

5〜18重量係の範囲内に維持することが好ましい。濃
度が1重量製以下では溶液の電導性が低くなりずきるし
、飽第1]以」二は無意味である。なお。
It is preferable to maintain it within the range of 5 to 18 weight coefficients. When the concentration is less than 1 weight, the conductivity of the solution becomes low, and the above is meaningless. In addition.

スルファミノ酸電解液中に少量の硫酸を除却すると浴の
電導性、皮膜構造、安定性などを改善することができる
Removing a small amount of sulfuric acid from the sulfamic acid electrolyte can improve the conductivity, film structure, stability, etc. of the bath.

浴温度は、10〜80℃、好甘しくは、20〜50℃の
範囲で施行することが経済的でありかつ効果的である。
It is economical and effective to maintain the bath temperature in the range of 10 to 80°C, preferably 20 to 50°C.

電解時間は、とくに制限されないが、長い処理時間はそ
れだけ厚い皮膜を生成することになるが10〜15分間
電解することが好捷しい。
The electrolysis time is not particularly limited, but it is preferable to electrolyze for 10 to 15 minutes, although a longer treatment time will result in a thicker film.

電圧は、10〜100V、好ましくは、20〜80■の
範囲で、電流密度は、01〜10A/dn、2.好丑し
くは、0.5〜5A/dm2の範囲で施行するものであ
る。
The voltage is in the range of 10-100V, preferably 20-80V, and the current density is 01-10A/dn, 2. Preferably, it is carried out within the range of 0.5 to 5 A/dm2.

このようにして得られたアルマイト基板は、は 1とん
ど微小黒点の発生が認められず、又、耐ヘノドクラノ/
ユ性を高めるために皮膜厚σを10μm以上に成長させ
ても大きく成長した黒点が認められない。さらに耐熱性
もすぐれていて磁性膜形成のために300〜400℃に
加熱保持してもクラックの発生がおこらないものである
The alumite substrate obtained in this way has almost no microscopic black spots and is resistant to henodokrano
Even if the film thickness σ is grown to 10 μm or more in order to improve the durability, large black spots are not observed. Furthermore, it has excellent heat resistance and does not generate cracks even when heated and held at 300 to 400° C. for forming a magnetic film.

次に、アルミニウム合金側(A2−3%M7合金)を4
0℃に保持した15重量饅スルファミノ酸溶液を使用し
て電流密度IA/dr、?で20〜80分間直流電角イ
を行ない種々の厚さの皮膜を形成したアルマイト基板を
作成し、黒点発生及び350℃に2時間加熱することに
よるクランク発生状況ならびに耐ヘノドクラノ/ユ性に
関連する皮膜硬度を測定した。
Next, the aluminum alloy side (A2-3% M7 alloy) was
Current density IA/dr, ? using a 15 wt steamed sulfamino acid solution kept at 0°C. Alumite substrates were prepared with films of various thicknesses formed by applying direct current electrical angle heating for 20 to 80 minutes, and the occurrence of sunspots and crank formation by heating to 350°C for 2 hours, as well as the coatings related to henodecanoic/yellow resistance. Hardness was measured.

結果を次表に示す。なお、比較のため従来から行なわれ
ている硫酸浴を使用して作成したアルマイト基板につい
て同様に行なった結果をも併ぜて示す・ 黒点の評価は、顕微鏡視野(0,36mj)において、
Oは2.5μm以下、△は35μm以下、×は5μm以
下の黒点が1ケ以下であることを示し、又。
The results are shown in the table below. For comparison, we also show the results of similar tests on an alumite substrate made using a conventional sulfuric acid bath.Evaluation of sunspots was performed in a microscopic field of view (0.36mj).
O indicates 2.5 μm or less, Δ indicates 35 μm or less, and × indicates no more than 1 black spot of 5 μm or less.

クランクの評価は、加熱処理後のアルマイト基板を顕微
鏡観察し、Oはクラックの全くないもの、△は部分的に
クラックを生じたもの、×は全面的にクラックが生じた
ものとして示し、硬度の評価は。
The crank was evaluated by observing the alumite board after heat treatment under a microscope. O indicates no cracks at all, △ indicates partially cracked, and Evaluation.

微小硬度言」を使用して測定した結果を、○は250H
v以上、△は200〜250Hv 、 Xは200 H
v以下であることを示す。
○ indicates 250H.
V or more, △ is 200-250Hv, X is 200H
Indicates that it is less than or equal to v.

訂、〕ス浴:スルファミン酸浴 硫浴;硫酸浴 上表にみられるように1本発明のスルファミノ酸溶液を
使用してアルマイト処理を施したアルマイト基板は、黒
点やクラックの発生は全くあるいはほとんど認められず
、従来の典型的なアルマイト処理法である硫酸浴では、
黒点、クラック、硬度の三条性をすべて満足し得る基板
を得ることができないことがわかる。
[edited] Sulfur bath: Sulfuric acid bath Sulfuric acid bath As shown in the table above, alumite substrates treated with alumite using the sulfamino acid solution of the present invention have no or almost no black spots or cracks. However, in the sulfuric acid bath, which is the typical conventional alumite treatment method,
It can be seen that it is not possible to obtain a substrate that satisfies all three characteristics of black spots, cracks, and hardness.

本発明は、アルミニウム又はアルミニウム合金利をスル
ファミノ酸溶液を電解浴とし電解条件を選定するように
したので、高密度磁気記録材用アルマイト基板において
もっとも問題とされている黒点の発生、高温処理時のク
ラック発生及び耐ヘットクラッシュ性などの問題を解決
し得てこれらに対してすぐれた特性を有するアルマイト
基板を製作し得たものであ−てすぐれた幼果が認められ
る。
In the present invention, the electrolytic conditions are selected using aluminum or aluminum alloy as a sulfamino acid solution in the electrolytic bath. It was possible to solve the problems of crack generation and heat crush resistance, and to produce an alumite substrate having excellent properties against these problems, and excellent young fruits were observed.

次に1本発明方法の実施例を述べる。Next, an example of the method of the present invention will be described.

実施例 高密度磁気記録用アルミニウム合金材(At−3%My
合金、内径75祁、外径200 mm 、厚さ2鴫)を
所定の表面研摩を施した後、非浸食性洗浄剤によって洗
浄した後、40℃に加熱保持した15重量係のスルファ
ミノ酸溶液中に浸漬し、アノードとして直流で電流密度
をI Vdm”一定とし、電圧は20〜27Vに変動し
ていき、10μmの淡白色の平滑なアルマイト皮膜を形
成させた。処理時間は、40分間であった。
Example Aluminum alloy material for high-density magnetic recording (At-3%My
An alloy (inner diameter: 75mm, outer diameter: 200mm, thickness: 2mm) was subjected to specified surface polishing, washed with a non-erosive detergent, and then heated and maintained at 40°C in a sulfamino acid solution of 15% by weight. The current density was kept constant at I Vdm'' as an anode, and the voltage was varied from 20 to 27 V to form a pale white smooth alumite film of 10 μm. The treatment time was 40 minutes. Ta.

イ4Iら11だアルマイト皮膜を顕微鏡で観堅し、/6
−か黒点欠陥は認められなかった。又、この皮膜をさら
に350℃で2時間加熱処理した後、顕微鏡で観察した
がクラックの発生は皆無であった。なお。
I4I et al. 11 Examine the alumite film with a microscope, /6
- or black spot defects were not observed. Further, after further heat-treating this film at 350° C. for 2 hours, it was observed under a microscope and no cracks were observed. In addition.

皮膜のビッカース硬度は290 Hvであった。The Vickers hardness of the film was 290 Hv.

比較例 実施例と同様の月料を用い、同様の前処理を施した後、
10℃に保持した15重量係の硫酸溶液中に浸漬し、ア
ノードとして直流で1.2A/dm2の電流を印加した
。電圧は約15Vとなり、30分で10μmの透明アル
マイト皮膜を形成させた。イ44られたアルマイト皮膜
は、ビッカース硬度は満足した値を示したが、黒点及び
クラックはいちじるしく発生し、スルファミノ酸による
皮膜より劣っていた。
Comparative Example After using the same monthly fee as in the example and applying the same pretreatment,
It was immersed in a 15% sulfuric acid solution maintained at 10° C., and a direct current of 1.2 A/dm 2 was applied as an anode. The voltage was about 15V, and a 10 μm transparent alumite film was formed in 30 minutes. The alumite film prepared by I44 had a satisfactory Vickers hardness, but black spots and cracks were noticeable, and it was inferior to the film made of sulfamino acid.

特許出願人 日本軽金属株式会社Patent applicant: Nippon Light Metal Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 1)アルミニウム又はアルミニウム合金制を1軍量%以
上のスルファミノ酸溶液中で、浴温度10〜80℃、電
流密度01〜10 A/dm2. %圧10〜100V
でアルマイト処理することを特徴とする高密度磁気記録
材用アルマイト基板の製造法。
1) Aluminum or aluminum alloy is heated in a sulfamino acid solution of 1% or more by weight at a bath temperature of 10 to 80°C and a current density of 01 to 10 A/dm2. % pressure 10~100V
1. A method for producing an alumite substrate for high-density magnetic recording material, characterized by alumite treatment.
JP2195884A 1984-02-10 1984-02-10 Manufacture of alumite substrate for high density magnetic recording material Pending JPS60169594A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2195884A JPS60169594A (en) 1984-02-10 1984-02-10 Manufacture of alumite substrate for high density magnetic recording material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2195884A JPS60169594A (en) 1984-02-10 1984-02-10 Manufacture of alumite substrate for high density magnetic recording material

Publications (1)

Publication Number Publication Date
JPS60169594A true JPS60169594A (en) 1985-09-03

Family

ID=12069573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2195884A Pending JPS60169594A (en) 1984-02-10 1984-02-10 Manufacture of alumite substrate for high density magnetic recording material

Country Status (1)

Country Link
JP (1) JPS60169594A (en)

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