JPS60164330A - 半導体薄膜の分解装置 - Google Patents

半導体薄膜の分解装置

Info

Publication number
JPS60164330A
JPS60164330A JP1846484A JP1846484A JPS60164330A JP S60164330 A JPS60164330 A JP S60164330A JP 1846484 A JP1846484 A JP 1846484A JP 1846484 A JP1846484 A JP 1846484A JP S60164330 A JPS60164330 A JP S60164330A
Authority
JP
Japan
Prior art keywords
liquid
decomposition
semiconductor thin
thin film
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1846484A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0566727B2 (cs
Inventor
Ayako Shimazaki
嶋崎　綾子
Chiyo Mayahara
馬屋原　千代
Rie Yamayoshi
山吉　理恵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Device Solutions Corp
Original Assignee
Toshiba Corp
Toshiba Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Microelectronics Corp filed Critical Toshiba Corp
Priority to JP1846484A priority Critical patent/JPS60164330A/ja
Publication of JPS60164330A publication Critical patent/JPS60164330A/ja
Publication of JPH0566727B2 publication Critical patent/JPH0566727B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
JP1846484A 1984-02-06 1984-02-06 半導体薄膜の分解装置 Granted JPS60164330A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1846484A JPS60164330A (ja) 1984-02-06 1984-02-06 半導体薄膜の分解装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1846484A JPS60164330A (ja) 1984-02-06 1984-02-06 半導体薄膜の分解装置

Publications (2)

Publication Number Publication Date
JPS60164330A true JPS60164330A (ja) 1985-08-27
JPH0566727B2 JPH0566727B2 (cs) 1993-09-22

Family

ID=11972354

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1846484A Granted JPS60164330A (ja) 1984-02-06 1984-02-06 半導体薄膜の分解装置

Country Status (1)

Country Link
JP (1) JPS60164330A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5395482A (en) * 1992-11-13 1995-03-07 Fuji Photo Film Co., Ltd. Ultra high purity vapor phase treatment
JP2006059925A (ja) * 2004-08-18 2006-03-02 Komatsu Electronic Metals Co Ltd 処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5395482A (en) * 1992-11-13 1995-03-07 Fuji Photo Film Co., Ltd. Ultra high purity vapor phase treatment
JP2006059925A (ja) * 2004-08-18 2006-03-02 Komatsu Electronic Metals Co Ltd 処理装置

Also Published As

Publication number Publication date
JPH0566727B2 (cs) 1993-09-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term