JPS60155594A - Method for pulling up single crystal and apparatus therefor - Google Patents
Method for pulling up single crystal and apparatus thereforInfo
- Publication number
- JPS60155594A JPS60155594A JP1145784A JP1145784A JPS60155594A JP S60155594 A JPS60155594 A JP S60155594A JP 1145784 A JP1145784 A JP 1145784A JP 1145784 A JP1145784 A JP 1145784A JP S60155594 A JPS60155594 A JP S60155594A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- heating element
- pulling
- crucible
- sides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
Abstract
Description
【発明の詳細な説明】
本発明は抵抗加熱方式で結晶材料の融液より単結晶を引
上げ育成するための単結晶引上げ方法及びその装置に関
し、特にそれに用いられる抵抗加熱体の形状と配置を改
良して引上げ装置炉内部の温度分布を自由に制御するよ
うにした方法及び装置に関するものである。Detailed Description of the Invention The present invention relates to a single crystal pulling method and apparatus for pulling and growing a single crystal from a melt of a crystal material using a resistance heating method, and particularly improves the shape and arrangement of the resistance heating body used therein. The present invention relates to a method and apparatus for freely controlling the temperature distribution inside a pulling equipment furnace.
従来半導体等の単結晶の引上げにおいては、引上げ装置
の炉内において第1図及び第2図に示すような形状の抵
抗加熱体によって作られるホットゾーンの中の結晶溶解
用ルツボを設置し、この中に結晶材料を入れて溶解し、
種結晶を接触させた後単結晶を引上げていた。Conventionally, when pulling single crystals such as semiconductors, a crucible for melting the crystal is installed in a hot zone created by a resistance heating element shaped as shown in Figures 1 and 2 in the furnace of the pulling equipment. Put the crystal material inside and dissolve it,
After contacting the seed crystal, the single crystal was pulled up.
従って目的とする高品質単結晶を得るためには引上げ炉
内の温度分布、特にルツボ及び育成された単結晶近傍の
ホットゾーンの温度分布の制御が重要となるが、前記第
1図及び第2図のような形状の抵抗加熱体では一定の温
度分布しか得られず、希望どおりに引上げ炉内のホット
ゾーンの温度分布を制御することは困難であった。Therefore, in order to obtain the desired high-quality single crystal, it is important to control the temperature distribution inside the pulling furnace, especially the temperature distribution in the hot zone near the crucible and the grown single crystal. With a resistance heating element shaped like the one shown in the figure, only a constant temperature distribution could be obtained, and it was difficult to control the temperature distribution in the hot zone in the pulling furnace as desired.
本発明はこのような問題に対処してなされたもので、抵
抗加熱体の形状と配置を一改良することにより引上げ炉
内特にルツボ及び育成された単結晶近傍の温度分布を自
由に制御するようにした新規な単結晶引上げ方法及びそ
の装置を提供するものである。The present invention was made in response to these problems, and by improving the shape and arrangement of the resistance heating element, it is possible to freely control the temperature distribution in the pulling furnace, especially in the vicinity of the crucible and the grown single crystal. The present invention provides a novel method for pulling a single crystal and an apparatus therefor.
即ち本発明は抵抗加熱方式で結晶材料の融液より半導体
等の単結晶を引上げて育成するに際し、融液を収容する
ルツボの外周に同心的に、四角形の3辺、三角形の2辺
及び円の半円周のうちのいずれか1種からなる形状で曲
面を有する基本エレメントの端部を順次相互に連結して
ジグザグ状の円筒状に形成した加熱体の複数個を、夫々
上部の加熱体のジグザグ部の凹部にその下部の加熱体の
ジグザグ部の凸部が所定の間隔を保って重合するように
順次炉の上下方向に配置し、かつ各加熱体に所定の電力
を入力することにより、ルツボ及び育成された単結晶近
傍の温度を所定の分布に保持して引上げを行なう単結晶
の引上げ方法及びこれを実施するための前記装置に係わ
るものである。That is, in the present invention, when pulling and growing a single crystal such as a semiconductor from a melt of a crystal material using a resistance heating method, three sides of a quadrilateral, two sides of a triangle, and a circle are placed concentrically around the outer periphery of a crucible containing the melt. A plurality of heating bodies each formed into a zigzag cylindrical shape by sequentially interconnecting the ends of basic elements each having a curved surface and a shape consisting of one of the semi-circumferences of By sequentially arranging the heating element in the vertical direction of the furnace so that the convex part of the zigzag part of the lower heating element overlaps with the concave part of the zigzag part of the heating element, and by inputting a prescribed electric power to each heating element. This invention relates to a method for pulling a single crystal in which pulling is carried out while maintaining a predetermined temperature distribution in the vicinity of the crucible and the grown single crystal, and to the apparatus for carrying out the method.
以下図面に基づいて本発明を説明する。The present invention will be explained below based on the drawings.
第3図は本発明を実施した単結晶引上げ装置の一例の主
要断面図で、カーボンサセプター30に結晶溶解用ルツ
ボ31が組込まれて、下軸シャフト32の上下により所
定の位置にセットされる。ルツボ31中には結晶材料の
融液33が入れられており、のぞき窓34を通して見な
がらシャフト35を回転することにより単結晶36が引
上げられ育成される。ルツボ31の外周には円筒状の上
部カーボン抵抗加熱体37と下部同加熱体38が所定の
間隔を保って接触することのないよづにして重合し、炉
の上下方向に同心的に設置され、その外側には円筒状の
断熱材39が設置されている。40はN2ガス又はAr
ガス等の不活性ガスでチャンバー41内に充填されてい
る。単結晶引上げに際して炉内温度分布、特にルツボ3
1及び育成された単結晶36近傍のホットゾーンの温度
分布を所望の程度に保持するためには、主として上部加
熱体31と下部加熱体38の配置関係とその発熱量を制
御することよりなされる。上部加熱体37及び下部加熱
体38の夫々の底部には電極板が取付けられており、こ
れら電極板の調整により加熱体37と38を上下方向に
移動させ、加熱体37と38相互の関係位置及びそれら
加熱体37.38とルツボとの関係位置を自由に制御す
ると共に、それら加熱体37.38への入力を独立に制
御することによりホットゾーンを最適の温度分布に保持
することができる。FIG. 3 is a main sectional view of an example of a single crystal pulling apparatus embodying the present invention, in which a crystal melting crucible 31 is assembled into a carbon susceptor 30 and set at a predetermined position by the upper and lower ends of a lower shaft 32. A melt 33 of crystalline material is placed in the crucible 31, and a single crystal 36 is pulled up and grown by rotating the shaft 35 while looking through the viewing window 34. On the outer periphery of the crucible 31, a cylindrical upper carbon resistance heating element 37 and a lower carbon resistance heating element 38 are placed concentrically in the vertical direction of the furnace, with a predetermined spacing between them for polymerization without contact. A cylindrical heat insulating material 39 is installed on the outside thereof. 40 is N2 gas or Ar
The chamber 41 is filled with an inert gas such as gas. When pulling a single crystal, the temperature distribution inside the furnace, especially the crucible 3
1 and the temperature distribution in the hot zone near the grown single crystal 36 is maintained at a desired level by controlling the positional relationship between the upper heating element 31 and the lower heating element 38 and the amount of heat generated therefrom. . An electrode plate is attached to the bottom of each of the upper heating element 37 and the lower heating element 38, and by adjusting these electrode plates, the heating elements 37 and 38 are moved in the vertical direction, and the relative position of the heating elements 37 and 38 is adjusted. By freely controlling the relative positions of these heating bodies 37, 38 and the crucible, and by independently controlling the input to these heating bodies 37, 38, the hot zone can be maintained at an optimal temperature distribution.
第4図及び第5図に例示するものは加熱体の部分拡大斜
視図であり、第4図のものは四角形の3辺からなる形状
で、連結して円筒状にした場合の曲面を夫々有している
基本エレメントAをその端部で順次相互に連結して、全
体でジグザグ状を呈しながら円筒状に形成した上部加熱
体47の凹部に、同様の基本エレメントAから形成した
下部加熱体48の凸部が間隔aを保って相互に接触しな
いように重合して1組の加熱体を構成している。The examples shown in FIGS. 4 and 5 are partially enlarged perspective views of the heating body, and the one shown in FIG. A lower heating element 48 formed from similar basic elements A is placed in a concave portion of an upper heating element 47 formed into a cylindrical shape with a zigzag shape as a whole by interconnecting basic elements A at their ends one after another. The convex portions of the heating elements are overlapped with each other so as not to contact each other with a distance a between them to form a set of heating elements.
第5図に示すものは三角形の2辺からなる形状で夫々曲
面を有する基本エレメントBから形成した上部加熱体5
1に同様の基本エレメントBがら形成した下部加熱体5
8が間隔すを保って重合し1紺の加熱体を構成している
ものである。The upper heating body 5 shown in FIG. 5 is formed from a basic element B having a triangular shape with two sides each having a curved surface.
Lower heating body 5 formed from basic element B similar to 1.
8 are polymerized while maintaining intervals to form a navy blue heating element.
これらは前記第3図に示されるような加熱体として用い
られるが、例示した上下2段のものに限らず、必要に応
じてそれ以上の複数段を組み合わせ用いて、それらの関
係位置と発熱量を制御することより、ルツボ及び育成さ
れた単結晶近傍の温度分布を自由に制御することが可能
であり、このような本発明によれば、例えば高品質の半
導体単結晶を有利に育成することができる。These are used as heating bodies as shown in Fig. 3 above, but they are not limited to the two upper and lower stages illustrated, but more stages may be used in combination as necessary to determine their relative positions and heat output. By controlling the above, it is possible to freely control the temperature distribution in the vicinity of the crucible and the grown single crystal, and according to the present invention, for example, high quality semiconductor single crystals can be grown advantageously. Can be done.
第1図及び第2図は従来の抵抗加熱体の一例の断面図で
ある。第3図は本発明を実施した単結晶引上げ装置の主
要断面図であり、第4図及び第5図は夫々本発明に使用
する抵抗加熱体を組み合わせたものの部分拡大斜視図で
ある。
10.20 ・・・・・・・・・ 抵抗加熱体30 ・
・・・・・・・・・・・・・・ カーボンサセプター3
1 ・・・・・・・・・・・・・・・ ルツボ33 ・
・・・・・・・・・・・・・・ 融 液36 ・・・・
;・・・・・・・・・・ 単結晶37.47.57 ・
・・ 上部抵抗加熱体38.48.58 ・・・ 下部
抵抗加熱体39 ・・・・・・・・・・・・・・・ 断
熱材第1図
第3図
第2図
第4図
第5図FIGS. 1 and 2 are cross-sectional views of an example of a conventional resistance heating body. FIG. 3 is a main sectional view of a single crystal pulling apparatus embodying the present invention, and FIGS. 4 and 5 are partially enlarged perspective views of a combination of resistance heating elements used in the present invention. 10.20 ...... Resistance heating element 30 ・
・・・・・・・・・・・・・・・ Carbon susceptor 3
1 ・・・・・・・・・・・・ Crucible 33 ・
・・・・・・・・・・・・・・・ Melt 36 ・・・・
;・・・・・・・・・ Single crystal 37.47.57 ・
... Upper resistance heating element 38.48.58 ... Lower resistance heating element 39 ... Insulation material Figure 1 Figure 3 Figure 2 Figure 4 Figure 5 figure
Claims (3)
げて育成するに際し、融液を収容するルツボの外周に同
心的に、四角形の3辺、三角形の2辺及び円の半円周の
うちのいずれか1種からなる形状で曲面を有する基本エ
レメントの端部を順次相互に連結してジグザグ状の円筒
状に形成した加熱体の複数個を、夫々上部の加熱体のジ
グザグ部の凹部にその下部の加熱体のジグザグ部の凸部
が所定の間隔を保って重合するように順次炉の上下方向
に配置し、かつ各加熱体に所定の電力を入力することに
より、ルツボ及び育成された単結晶近傍の温度を所定の
分布に保持して引上げを行なうことを特徴とする単結晶
の引上げ方法。(1) When pulling and growing a single crystal from a melt of a crystal material using a resistance heating method, three sides of a quadrilateral, two sides of a triangle, and a semicircle around the circumference of a circle are placed concentrically around the outer periphery of the crucible containing the melt. A plurality of heating bodies each formed into a zigzag cylindrical shape by sequentially interconnecting the ends of basic elements each having a curved surface in the shape of one of By sequentially arranging the convex parts of the zigzag part of the lower heating element in the recessed part in the vertical direction of the furnace so that they polymerize while maintaining a predetermined interval, and by inputting a predetermined electric power to each heating element, the crucible and the growth are performed. 1. A method for pulling a single crystal, characterized in that pulling is carried out while maintaining the temperature near the single crystal in a predetermined distribution.
1)項記載の単結晶の引上げ方法。(2) Claims in which the single crystal is a semiconductor single crystal (
1) Single crystal pulling method described in section 1).
げて育成する装置において、融液を収容するルツボの外
周に同心的に、四角形の3辺、三角形の2辺及び円の半
円周のうちのいずれか1種からなる形状で曲面を有する
基本エレメントの端部な順次相互に連結してジグザグ状
の円筒状に形成した加熱体の複数個を、その電極部を調
整することにより夫々上部の加熱体のジグザグ部の凹部
にその下部の加熱体のジグザグ部の凸部が所定の間隔を
保って重合するように順次炉の上下方向に配置すると共
に、各加熱体に所望の電力を独立に入力しつるようにし
て各加熱体の配置関係と発熱量を制御してルツボ及び育
成された単結晶近傍の温度分布を自由に制御しうるよう
にしたことを特徴とする単結晶引上げ装置。(3) In an apparatus that uses a resistance heating method to pull and grow a single crystal from a melt of a crystal material, three sides of a quadrilateral, two sides of a triangle, and a semicircle of a circle are placed concentrically around the outer periphery of a crucible containing the melt. By adjusting the electrode portions of a plurality of heating bodies formed in a zigzag cylindrical shape by sequentially interconnecting the ends of a basic element having a curved surface in the shape of any one of the circumferences, The convex parts of the zigzag part of the lower heating element are arranged in order in the vertical direction of the furnace so that the convex part of the zigzag part of the upper heating element overlaps with the concave part of the zigzag part of the upper heating element, and the desired electric power is applied to each heating element. A method for pulling a single crystal characterized in that the temperature distribution in the vicinity of the crucible and the grown single crystal can be freely controlled by independently inputting and controlling the arrangement relationship and calorific value of each heating element. Device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1145784A JPS60155594A (en) | 1984-01-25 | 1984-01-25 | Method for pulling up single crystal and apparatus therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1145784A JPS60155594A (en) | 1984-01-25 | 1984-01-25 | Method for pulling up single crystal and apparatus therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60155594A true JPS60155594A (en) | 1985-08-15 |
Family
ID=11778621
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1145784A Pending JPS60155594A (en) | 1984-01-25 | 1984-01-25 | Method for pulling up single crystal and apparatus therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60155594A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH075101U (en) * | 1993-06-25 | 1995-01-24 | 恵和商工株式会社 | Composite sheet material |
WO1999063133A1 (en) * | 1998-06-05 | 1999-12-09 | Memc Electronic Materials, Inc. | Electrical resistance heater for crystal growing apparatus |
US6053974A (en) * | 1997-09-30 | 2000-04-25 | Memc Electronic Materials, Inc. | Heat shield for crystal puller |
EP1107646A1 (en) * | 1999-12-09 | 2001-06-13 | Freiberger Compound Materials GmbH | Heating element for smelt crucibles and arrangement of heating elements |
US6285011B1 (en) | 1999-10-12 | 2001-09-04 | Memc Electronic Materials, Inc. | Electrical resistance heater for crystal growing apparatus |
JP2003522086A (en) * | 1998-06-26 | 2003-07-22 | エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド | Electric resistance heater for crystal growth apparatus and method of using the same |
-
1984
- 1984-01-25 JP JP1145784A patent/JPS60155594A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH075101U (en) * | 1993-06-25 | 1995-01-24 | 恵和商工株式会社 | Composite sheet material |
US6053974A (en) * | 1997-09-30 | 2000-04-25 | Memc Electronic Materials, Inc. | Heat shield for crystal puller |
WO1999063133A1 (en) * | 1998-06-05 | 1999-12-09 | Memc Electronic Materials, Inc. | Electrical resistance heater for crystal growing apparatus |
US6093913A (en) * | 1998-06-05 | 2000-07-25 | Memc Electronic Materials, Inc | Electrical heater for crystal growth apparatus with upper sections producing increased heating power compared to lower sections |
JP2003522086A (en) * | 1998-06-26 | 2003-07-22 | エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド | Electric resistance heater for crystal growth apparatus and method of using the same |
US6285011B1 (en) | 1999-10-12 | 2001-09-04 | Memc Electronic Materials, Inc. | Electrical resistance heater for crystal growing apparatus |
EP1107646A1 (en) * | 1999-12-09 | 2001-06-13 | Freiberger Compound Materials GmbH | Heating element for smelt crucibles and arrangement of heating elements |
US6355910B1 (en) | 1999-12-09 | 2002-03-12 | Freiberger Compound Materials Gmbh | Heating element for heating crucibles and arrangement of heating elements |
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