JPS60154249A - ポジ・レジスト組成物 - Google Patents

ポジ・レジスト組成物

Info

Publication number
JPS60154249A
JPS60154249A JP25066184A JP25066184A JPS60154249A JP S60154249 A JPS60154249 A JP S60154249A JP 25066184 A JP25066184 A JP 25066184A JP 25066184 A JP25066184 A JP 25066184A JP S60154249 A JPS60154249 A JP S60154249A
Authority
JP
Japan
Prior art keywords
sensitizer
resist
positive resist
resist composition
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25066184A
Other languages
English (en)
Japanese (ja)
Other versions
JPH032293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
ジエームズ・エコノミー
デニス・リチヤード・マツキーン
ロバート・デニス・ミラー
カールトン・グラント・ウイルソン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS60154249A publication Critical patent/JPS60154249A/ja
Publication of JPH032293B2 publication Critical patent/JPH032293B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP25066184A 1983-12-30 1984-11-29 ポジ・レジスト組成物 Granted JPS60154249A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56702983A 1983-12-30 1983-12-30
US567029 1983-12-30

Publications (2)

Publication Number Publication Date
JPS60154249A true JPS60154249A (ja) 1985-08-13
JPH032293B2 JPH032293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-01-14

Family

ID=24265443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25066184A Granted JPS60154249A (ja) 1983-12-30 1984-11-29 ポジ・レジスト組成物

Country Status (2)

Country Link
EP (1) EP0147596A3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS60154249A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3603578A1 (de) * 1986-02-06 1987-08-13 Hoechst Ag Neue bis-1,2-naphthochinon-2-diazid-sulfonsaeure- amide, ihre verwendung in einem strahlungsempfindlichen gemisch und strahlungsempfindliches kopiermaterial
US4737437A (en) * 1986-03-27 1988-04-12 East Shore Chemical Co. Light sensitive diazo compound, composition and method of making the composition
JP2005321489A (ja) 2004-05-07 2005-11-17 Ricoh Co Ltd 撮像装置
EP3879346A1 (en) 2017-02-28 2021-09-15 FUJIFILM Corporation Method for producing lithographic printing plate

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL78797C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1949-07-23
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
BE783962A (fr) * 1971-05-28 1972-11-27 Polychrome Corp Produits photosensibles
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
US4397937A (en) * 1982-02-10 1983-08-09 International Business Machines Corporation Positive resist compositions
JPS5997137A (ja) * 1982-11-01 1984-06-04 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− 多層光可溶化性リスエレメント

Also Published As

Publication number Publication date
EP0147596A3 (en) 1987-03-04
EP0147596A2 (en) 1985-07-10
JPH032293B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-01-14

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