JPS60144938A - 光源制御装置 - Google Patents

光源制御装置

Info

Publication number
JPS60144938A
JPS60144938A JP59000763A JP76384A JPS60144938A JP S60144938 A JPS60144938 A JP S60144938A JP 59000763 A JP59000763 A JP 59000763A JP 76384 A JP76384 A JP 76384A JP S60144938 A JPS60144938 A JP S60144938A
Authority
JP
Japan
Prior art keywords
power
light source
exposure
light
input power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59000763A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0525171B2 (enrdf_load_stackoverflow
Inventor
Keiichiro Sakado
坂戸　啓一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP59000763A priority Critical patent/JPS60144938A/ja
Publication of JPS60144938A publication Critical patent/JPS60144938A/ja
Priority to US06/925,487 priority patent/US4712910A/en
Publication of JPH0525171B2 publication Critical patent/JPH0525171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
JP59000763A 1984-01-05 1984-01-09 光源制御装置 Granted JPS60144938A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59000763A JPS60144938A (ja) 1984-01-09 1984-01-09 光源制御装置
US06/925,487 US4712910A (en) 1984-01-05 1986-10-29 Exposure method and apparatus for semiconductor fabrication equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59000763A JPS60144938A (ja) 1984-01-09 1984-01-09 光源制御装置

Publications (2)

Publication Number Publication Date
JPS60144938A true JPS60144938A (ja) 1985-07-31
JPH0525171B2 JPH0525171B2 (enrdf_load_stackoverflow) 1993-04-12

Family

ID=11482733

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59000763A Granted JPS60144938A (ja) 1984-01-05 1984-01-09 光源制御装置

Country Status (1)

Country Link
JP (1) JPS60144938A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008091061A (ja) * 2006-09-29 2008-04-17 Matsushita Electric Works Ltd 無電極放電灯点灯装置及びその照明器具
JP2008281934A (ja) * 2007-05-14 2008-11-20 Harison Toshiba Lighting Corp 紫外線照射装置
JP2012174807A (ja) * 2011-02-18 2012-09-10 Ushio Inc 紫外線照射装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008091061A (ja) * 2006-09-29 2008-04-17 Matsushita Electric Works Ltd 無電極放電灯点灯装置及びその照明器具
JP2008281934A (ja) * 2007-05-14 2008-11-20 Harison Toshiba Lighting Corp 紫外線照射装置
JP2012174807A (ja) * 2011-02-18 2012-09-10 Ushio Inc 紫外線照射装置

Also Published As

Publication number Publication date
JPH0525171B2 (enrdf_load_stackoverflow) 1993-04-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term