JPS6014135A - 光学的温度検出素子 - Google Patents
光学的温度検出素子Info
- Publication number
- JPS6014135A JPS6014135A JP12166283A JP12166283A JPS6014135A JP S6014135 A JPS6014135 A JP S6014135A JP 12166283 A JP12166283 A JP 12166283A JP 12166283 A JP12166283 A JP 12166283A JP S6014135 A JPS6014135 A JP S6014135A
- Authority
- JP
- Japan
- Prior art keywords
- etalon
- optical
- film
- temperature
- solid etalon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 42
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 claims abstract description 84
- 239000010409 thin film Substances 0.000 claims abstract description 29
- 239000013307 optical fiber Substances 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 230000008859 change Effects 0.000 claims abstract description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 50
- 239000010453 quartz Substances 0.000 claims description 49
- 239000007787 solid Substances 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 27
- 238000001514 detection method Methods 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 4
- 239000000835 fiber Substances 0.000 claims description 4
- 239000010408 film Substances 0.000 abstract description 52
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 238000005259 measurement Methods 0.000 abstract description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- 229910052582 BN Inorganic materials 0.000 description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 3
- 238000009529 body temperature measurement Methods 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 229910000809 Alumel Inorganic materials 0.000 description 1
- 241000218691 Cupressaceae Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 101100460719 Mus musculus Noto gene Proteins 0.000 description 1
- 101100187345 Xenopus laevis noto gene Proteins 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 210000004907 gland Anatomy 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
- G01K11/12—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in colour, translucency or reflectance
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectrometry And Color Measurement (AREA)
- Optical Filters (AREA)
- Measuring Temperature Or Quantity Of Heat (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12166283A JPS6014135A (ja) | 1983-07-06 | 1983-07-06 | 光学的温度検出素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12166283A JPS6014135A (ja) | 1983-07-06 | 1983-07-06 | 光学的温度検出素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6014135A true JPS6014135A (ja) | 1985-01-24 |
| JPH0231811B2 JPH0231811B2 (enrdf_load_stackoverflow) | 1990-07-17 |
Family
ID=14816789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12166283A Granted JPS6014135A (ja) | 1983-07-06 | 1983-07-06 | 光学的温度検出素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6014135A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63215925A (ja) * | 1987-03-04 | 1988-09-08 | Shimadzu Corp | エタロン分光器 |
| JP2007263847A (ja) * | 2006-03-29 | 2007-10-11 | Kyocera Corp | 光ファイバセンサ |
| WO2025047181A1 (ja) * | 2023-09-01 | 2025-03-06 | 浜松ホトニクス株式会社 | ファブリペロー干渉フィルタ |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4817049B2 (ja) * | 2006-01-20 | 2011-11-16 | 日本電気株式会社 | 温度センサ及び温度センサシステム |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57157124A (en) * | 1981-03-24 | 1982-09-28 | Yutaka Ono | Optical rod fabry-perot thermometer |
-
1983
- 1983-07-06 JP JP12166283A patent/JPS6014135A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57157124A (en) * | 1981-03-24 | 1982-09-28 | Yutaka Ono | Optical rod fabry-perot thermometer |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63215925A (ja) * | 1987-03-04 | 1988-09-08 | Shimadzu Corp | エタロン分光器 |
| JP2007263847A (ja) * | 2006-03-29 | 2007-10-11 | Kyocera Corp | 光ファイバセンサ |
| WO2025047181A1 (ja) * | 2023-09-01 | 2025-03-06 | 浜松ホトニクス株式会社 | ファブリペロー干渉フィルタ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0231811B2 (enrdf_load_stackoverflow) | 1990-07-17 |
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