JPS60124919A - 薄膜蒸着装置 - Google Patents
薄膜蒸着装置Info
- Publication number
- JPS60124919A JPS60124919A JP23556983A JP23556983A JPS60124919A JP S60124919 A JPS60124919 A JP S60124919A JP 23556983 A JP23556983 A JP 23556983A JP 23556983 A JP23556983 A JP 23556983A JP S60124919 A JPS60124919 A JP S60124919A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- thin film
- substrate
- film deposition
- cluster
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23556983A JPS60124919A (ja) | 1983-12-12 | 1983-12-12 | 薄膜蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23556983A JPS60124919A (ja) | 1983-12-12 | 1983-12-12 | 薄膜蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60124919A true JPS60124919A (ja) | 1985-07-04 |
| JPH0215629B2 JPH0215629B2 (enrdf_load_html_response) | 1990-04-12 |
Family
ID=16987929
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23556983A Granted JPS60124919A (ja) | 1983-12-12 | 1983-12-12 | 薄膜蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60124919A (enrdf_load_html_response) |
-
1983
- 1983-12-12 JP JP23556983A patent/JPS60124919A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0215629B2 (enrdf_load_html_response) | 1990-04-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6353259A (ja) | 薄膜形成方法 | |
| JPS581186B2 (ja) | イオンプレ−テイング装置 | |
| JP2501828B2 (ja) | 薄膜蒸着装置 | |
| JPS60124919A (ja) | 薄膜蒸着装置 | |
| JPS63238264A (ja) | 蒸着物質の蒸気およびクラスタ−噴出装置 | |
| JPS63472A (ja) | 真空成膜装置 | |
| JPS60124915A (ja) | 薄膜蒸着装置 | |
| JPS60125368A (ja) | 薄膜蒸着装置 | |
| JPS60124932A (ja) | 薄膜蒸着装置 | |
| JPS60124923A (ja) | 薄膜蒸着装置 | |
| JPS6320820A (ja) | 薄膜蒸着装置 | |
| JPS60124931A (ja) | 薄膜蒸着装置 | |
| JPS6274070A (ja) | 薄膜蒸着装置 | |
| JPS62260053A (ja) | 化合物薄膜蒸着装置 | |
| JPH0351087B2 (enrdf_load_html_response) | ||
| JPS60125367A (ja) | 薄膜蒸着装置 | |
| JPS6329925A (ja) | 化合物薄膜形成装置 | |
| JPS60124930A (ja) | 薄膜蒸着装置 | |
| JPS60124913A (ja) | 薄膜蒸着装置 | |
| JPS6215815A (ja) | 薄膜蒸着装置 | |
| JPS61247036A (ja) | 絶縁性薄膜形成装置およびその方法 | |
| JPS60124916A (ja) | 薄膜蒸着装置 | |
| JPH0443412B2 (enrdf_load_html_response) | ||
| JPS60124917A (ja) | 薄膜蒸着装置 | |
| JPS60158617A (ja) | 薄膜蒸着装置 |