JPS60120592A - Ceramic circuit board and method of producing ceramic circuit board - Google Patents

Ceramic circuit board and method of producing ceramic circuit board

Info

Publication number
JPS60120592A
JPS60120592A JP22938983A JP22938983A JPS60120592A JP S60120592 A JPS60120592 A JP S60120592A JP 22938983 A JP22938983 A JP 22938983A JP 22938983 A JP22938983 A JP 22938983A JP S60120592 A JPS60120592 A JP S60120592A
Authority
JP
Japan
Prior art keywords
ceramic
conductor
circuit
wiring board
board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22938983A
Other languages
Japanese (ja)
Inventor
秀次 桑島
隆男 山田
上山 守
直樹 福富
豊 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP22938983A priority Critical patent/JPS60120592A/en
Publication of JPS60120592A publication Critical patent/JPS60120592A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明はセラミック配線板及びセラミック配線板の製造
方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a ceramic wiring board and a method for manufacturing a ceramic wiring board.

従来セラミック配線板は、セラミックグリーンシート(
以下グリーンシートという)の一方の表面にタングステ
ン、モリブデン等の導体ペーストを用いて回路を形成し
ている。このようなセラミツク配線板は回路におけるメ
タライズ層の接着強度は十分であるが、セラミックスの
厚さが約0.4〜0.8鴫と厚く、かつセラミックスは
金属に比較し熱伝導率が低いため放熱性が悪いという欠
点がある。例えばセラミック配線板の回路上にはパワー
トランジスタ、パワーサイリスタ、パワーダイオード等
のパワー半導体素子が搭載され、配線。
Conventional ceramic wiring boards are made of ceramic green sheets (
A circuit is formed on one surface of the green sheet (hereinafter referred to as a green sheet) using a conductive paste such as tungsten or molybdenum. In such ceramic wiring boards, the adhesive strength of the metallized layer in the circuit is sufficient, but the thickness of the ceramic is about 0.4 to 0.8 mm, and the thermal conductivity of ceramic is lower than that of metal. It has the disadvantage of poor heat dissipation. For example, power semiconductor elements such as power transistors, power thyristors, and power diodes are mounted on the circuit of a ceramic wiring board, and the wiring.

樹脂封止等の工程を経てパワーモジュール化しで使用さ
れる。そして動作中にこれらパワー半導体素子から発生
する熱はセラミック配線板を通して放熱されるが、セラ
ミックスの放熱性が悪いためパワー半導体素子の直下は
高温にさらされ、パワー半導体素子のろう付に使用した
はんだ、銀ろう等が部分的に高温となシ熱劣化によるろ
う封部が剥離する等の不良が発生しパワーモジュールの
寿命を低下させていた。
It is used after being made into a power module through processes such as resin encapsulation. The heat generated by these power semiconductor elements during operation is dissipated through the ceramic wiring board, but due to the poor heat dissipation properties of ceramics, the area directly under the power semiconductor elements is exposed to high temperatures, and the solder used to braze the power semiconductor elements When the silver solder etc. is partially exposed to high temperatures, defects such as peeling of the solder sealing part due to thermal deterioration occur, reducing the lifespan of the power module.

放熱性を良くするためにセラミック配線板の裏面(回路
を形成した部分の反対側の表面)に導体ペーストを印刷
して放熱面とした表面放熱導体部を形成したが十分な放
熱性を持たせることができなかった。
In order to improve heat dissipation, a conductive paste was printed on the back side of the ceramic wiring board (the surface opposite to the part where the circuit was formed) to form a surface heat dissipation conductor part that was used as a heat dissipation surface, but in order to have sufficient heat dissipation. I couldn't.

本発明はこれらの欠点のないセラミック配線板及びセラ
ミック配線板の製造方法を提供することを目的とするも
のである。
An object of the present invention is to provide a ceramic wiring board and a method for manufacturing the ceramic wiring board that are free from these drawbacks.

本発明は一方の表面に形成された回路部と、他の表面に
形成された表面放熱導体部と、セラミック基板中に埋込
まれた伝熱導体部と、この伝熱導体部に固着した金属板
又は高熱伝導性セラミックスとからなるセラミック配線
板並びに一方の表面に回路部を形成した回路形成セラミ
ック板又は一方の表面に回路部を形成し、他方の表面に
伝熱導体部を形成した回路形成セラミック板と、一方の
表面に表面放熱導体部を形成した導体形成セラミック板
又は一方の表面に懺面放熱導体部を形成し。
The present invention includes a circuit section formed on one surface, a surface heat dissipation conductor section formed on the other surface, a heat transfer conductor section embedded in a ceramic substrate, and a metal fixed to the heat transfer conductor section. A ceramic wiring board made of a plate or a highly thermally conductive ceramic, and a circuit-forming ceramic board with a circuit part formed on one surface, or a circuit-forming ceramic board with a circuit part formed on one surface and a heat transfer conductor part on the other surface. A ceramic plate and a conductor-formed ceramic plate with a surface heat dissipation conductor portion formed on one surface, or a surface heat dissipation conductor portion formed on one surface.

他方の表面に伝熱導体部を形成した導体形成セラミック
板とを焼成し1次いで回路形成セラミック板の回路部を
形成した面と導体形成セラミック板の表面放熱導体部を
形成した面とが表面(外側面)になるように重ねると共
に回路形成セラミック板と導体形成セラミック板との間
に金属板又は高熱伝導性セラミックスの一部を介在させ
、加熱して固着するセラミック配線板の製造方法に関す
る。
A conductor-forming ceramic plate with a heat transfer conductor portion formed on the other surface is fired, and then the surface of the circuit-forming ceramic plate on which the circuit portion is formed and the surface of the conductor-forming ceramic plate on which the heat dissipation conductor portion is formed are placed on the surface ( The present invention relates to a method for manufacturing a ceramic wiring board, in which a metal plate or a part of a highly thermally conductive ceramic is interposed between a circuit-forming ceramic board and a conductor-forming ceramic board, and the ceramic wiring board is heated and fixed.

−なお本発明において回路部とは電圧信号、電流を供給
伝播するための配線のことであシ2表面放放熱体部とは
放熱を促進するための金属層のことである。
- In the present invention, the circuit section refers to wiring for supplying and propagating voltage signals and current, and the surface heat dissipating body section refers to a metal layer for promoting heat dissipation.

回路形成セラミック板と導体形成セラミック板との間に
埋込まれる伝熱導体部は一層に限らず複数層形成しても
よい。
The heat transfer conductor portion embedded between the circuit-forming ceramic board and the conductor-forming ceramic board is not limited to one layer, but may be formed in a plurality of layers.

焼成後に回路部及び/又は表面放熱導体部にメッキ処理
してもよい。メッキ処理はニッケルメッキ処理、ニッケ
ルメッキと銅メッキとの二重メッキ処理、ニッケルメッ
キと金メッキとの二重メッキ処理等が適用されるが価格
の面からニッケルメッキ処理、ニッケルメッキと銅メッ
キの二重メッキ処理で行なうことが好ましい。メッキの
厚さについては特に制限はないが、ニッケルメッキ処理
のみの場合は1μm以上あれば十分であるが、10μm
以上あればさらに好ましい。またニッケルメッキと銅メ
ッキとの二重メッキ処理の場合は、ニッケルメッキは1
〜4μmの範囲でメッキすることか好ましく、50μm
以上であればさらに好ましい。メッキの処理法について
も特に制限はな〈従来公知の方法で行なうものとする。
After firing, the circuit portion and/or the surface heat dissipation conductor portion may be plated. Plating treatments include nickel plating, double plating with nickel plating and copper plating, and double plating with nickel plating and gold plating. It is preferable to carry out heavy plating treatment. There are no particular restrictions on the thickness of the plating, but if only nickel plating is done, 1 μm or more is sufficient, but 10 μm or more is sufficient.
It is more preferable if the condition is above. In addition, in the case of double plating treatment of nickel plating and copper plating, nickel plating is
It is preferable to plate in the range of ~4 μm, preferably 50 μm.
It is even more preferable if it is above. There are no particular restrictions on the plating method; any conventionally known method may be used.

回路部2表面放熱溝体部及び伝熱導体部を形成する材料
としては、タングステン、モリブデン。
Tungsten and molybdenum are used as materials for forming the heat dissipation grooves on the surface of the circuit section 2 and the heat transfer conductor sections.

銀、銀−パラジウム、金等が用いられ、tた回路形成セ
ラミック板及び導体形成セラミック板はグリーンシート
を用いてもよく、これを焼結したセラミック板を用いて
もよい。グリーンシートを用いる場合には焼成前に両セ
ラミック板を圧着することが好ましい。なお焼成は従来
公知の方法で行なうものとし特に制限はない。
Silver, silver-palladium, gold, etc. are used, and the circuit-forming ceramic plate and the conductor-forming ceramic plate may be a green sheet, or a ceramic plate obtained by sintering this may be used. When using green sheets, it is preferable to press both ceramic plates together before firing. Incidentally, the firing is performed by a conventionally known method and is not particularly limited.

回路部は金属板又は高熱伝導性セラミックスとの絶縁性
を保持するため緑を少し残してほぼ全面に形成すること
が好ましい。
It is preferable that the circuit portion be formed almost entirely over the entire surface, leaving a little green in order to maintain insulation with the metal plate or the highly thermally conductive ceramic.

回路形成セラミック板と導体形成セラミック板との間に
介在させ固着する金属板としてはコバール、42アロイ
、銅、アルミニウム等が用いられ、また高熱伝導性セラ
ミックスとは熱伝導率が基体となるセラミック配線板よ
り高いものをさし。
Kovar, 42 alloy, copper, aluminum, etc. are used as the metal plate interposed and fixed between the circuit-forming ceramic plate and the conductor-forming ceramic plate, and high thermal conductive ceramics are ceramic wiring based on thermal conductivity. Point higher than the board.

例えばB6Q、SiC,5isN4等が用いられ、これ
らはろう付、ガラス封止等の方法で固着される。
For example, B6Q, SiC, 5isN4, etc. are used, and these are fixed by methods such as brazing and glass sealing.

これらの金属板、高熱伝導性セラミックスの一端はセラ
ミック配線板の外側に露出せしめた方が放熱性が向上す
るので好ましい。
It is preferable to expose one end of these metal plates and highly thermally conductive ceramics to the outside of the ceramic wiring board because heat dissipation is improved.

上記の金属板又は高熱伝導性セラミックスを固着するた
めの加熱温度は使用する材料により適宜決定するものと
する。
The heating temperature for fixing the metal plate or highly thermally conductive ceramic mentioned above shall be appropriately determined depending on the material used.

得られるセラミック配線板の厚さは強度および放熱性の
面から0.3〜0.8 aimであることが好ましい。
The thickness of the obtained ceramic wiring board is preferably 0.3 to 0.8 aim from the viewpoint of strength and heat dissipation.

本発明では伝熱導体部と表面の表面放熱導体部との間に
スルーホール(穴)を形成すればさらに放熱性が向上す
るので好ましく、その開孔率はセラミック板の面積に対
し1チ以上あれば十分であるが、5チ以上であればさら
に放熱性が向上するので好ましい。穴径としては作業性
および使用する導体ペーストの緻密化のため0.2〜2
.0uunであることが好ましく、0.2〜1.0柵で
あればさらに好ましい。
In the present invention, it is preferable to form a through hole (hole) between the heat transfer conductor part and the surface heat dissipation conductor part to further improve heat dissipation, and the pore size is preferably 1 inch or more relative to the area of the ceramic plate. Although it is sufficient if the thickness is 5 or more, it is preferable because the heat dissipation property is further improved. The hole diameter is 0.2 to 2 for workability and densification of the conductive paste used.
.. It is preferable that it is 0uun, and it is more preferable that it is 0.2-1.0 fence.

また本発明においてセラミック配線板の側面に表面放熱
導体部を形成すればさらに放熱性が向上するので好まし
い。
Further, in the present invention, it is preferable to form a surface heat dissipation conductor portion on the side surface of the ceramic wiring board, since this further improves heat dissipation.

以下実施例により本発明を説明する。The present invention will be explained below with reference to Examples.

実施例1 第1表に示す組成の材料をボールミルにて50時間均一
に混合した後ドクターブレード法によりテープキャステ
ィングして厚さ0.35 mmのグリーンシートを得た
Example 1 Materials having the composition shown in Table 1 were uniformly mixed in a ball mill for 50 hours, and then tape cast using a doctor blade method to obtain a green sheet with a thickness of 0.35 mm.

第1表 次に第1図に示す如く前述のグリーンシート1の一方の
表面にタングステンペース)(3TW−1200:日立
化成製、商品名)を印刷して回路部2を形成し、他方の
表面には伝熱導体部3を形成し1回路形成セラミック板
4とした。
Table 1 Next, as shown in FIG. 1, tungsten paste (3TW-1200, manufactured by Hitachi Chemical, trade name) was printed on one surface of the green sheet 1 to form the circuit section 2, and the circuit section 2 was formed on the other surface. A heat transfer conductor portion 3 was formed on the ceramic plate 4 to form a single circuit.

上記とは別に第2図に示す如く他のグリーンシート1に
直径1.0 mの穴(スルーホール)5を1、5 m格
子であけ、この中に前述のタングステンペーストを緻密
に充填し、さらに一方の表面に表面放熱導体部6を形成
し、他方の表面には伝熱導体部3′を形成し、導体形成
セラミック板7とした。
Separately from the above, as shown in Fig. 2, holes (through holes) 5 with a diameter of 1.0 m were made in a 1.5 m grid in another green sheet 1, and the tungsten paste described above was densely filled into the holes. Further, a surface heat dissipation conductor portion 6 was formed on one surface, and a heat transfer conductor portion 3' was formed on the other surface, thereby obtaining a conductor-formed ceramic plate 7.

次に前述の回路形成セラミック板4と導体形成セラミッ
ク板7とを空気中で200℃まで50℃/時間の昇温速
度で加熱し、200℃で1時間保持した後、200℃か
らは水素雰囲気中で30℃/時間の昇温速度で1550
℃まで昇温させて焼成し、その後無電解ニッケルメッキ
にて2μmの厚さにメッキ被膜を施した。
Next, the circuit-forming ceramic board 4 and the conductor-forming ceramic board 7 described above were heated to 200°C in air at a temperature increase rate of 50°C/hour, held at 200°C for 1 hour, and then heated in a hydrogen atmosphere from 200°C. 1550 at a heating rate of 30℃/hour in
The temperature was raised to 0.degree. C. and fired, and then a plating film was applied to a thickness of 2 .mu.m by electroless nickel plating.

次に第3図に示す如く1回路形成セラミック板4の回路
部2を形成した面と導体形成セラミック板7の表面放熱
導体部6を形成した面とが表面(外側面)になるように
重ねると共に回路形成セラミック板4と導体形成セラミ
ック板7との間に厚さ0.2 Inl11のコバール板
8を介在して水素雰囲気中で850℃でろう付してセラ
ミック配線板を得た。
Next, as shown in FIG. 3, the surface of the single-circuit-forming ceramic board 4 on which the circuit part 2 is formed and the surface of the conductor-forming ceramic board 7 on which the surface heat dissipation conductor part 6 is formed are stacked so that they become the front surfaces (outer surfaces). At the same time, a Kovar plate 8 having a thickness of 0.2 Inl11 was interposed between the circuit-forming ceramic plate 4 and the conductor-forming ceramic plate 7, and the ceramic wiring board was brazed at 850° C. in a hydrogen atmosphere.

上記のセラミック配線板についてレーザ・−フラッシュ
法熱定数装置により熱抵抗を測定したとζろ0,65℃
/W(ワット)でちった。
The thermal resistance of the above ceramic wiring board was measured using a laser-flash method thermal constant device.
/W (watt).

実施例2 実施例1で得たグリーンシートを大気中で1520℃で
焼成して焼結したセラミック板を得た。
Example 2 The green sheet obtained in Example 1 was fired at 1520° C. in the atmosphere to obtain a sintered ceramic plate.

上記とは別のグリーンシートに直径1.2柵の穴を1.
8 mm格子であけた後上記と同様の条件にて焼成して
焼結したセラミック板を得た。
1. Hole with a diameter of 1.2 fence in a green sheet different from the above.
A sintered ceramic plate was obtained by opening an 8 mm grid and firing under the same conditions as above.

次にセラミック板の一方の表面には実施例1と同様のタ
ングステンペーストにて実施例1と同様の回路部を形成
し、他方の表面には実施例1と同様の伝熱導体部を形成
し9回路形成セラミック板とした。
Next, a circuit section similar to that in Example 1 was formed using the same tungsten paste as in Example 1 on one surface of the ceramic plate, and a heat transfer conductor section similar to that in Example 1 was formed on the other surface. It was made into a 9-circuit-forming ceramic board.

また前述の穴付のセラミック板の穴の中には実施例1と
同様にタングステンペーストを緻密に充填し、さらに一
方の表面に表面放熱導体部を形成し、他方の表面には伝
熱導体部を形成し、導体形成セラミック板とした。
In addition, the holes of the ceramic plate with holes are densely filled with tungsten paste as in Example 1, and a surface heat dissipation conductor is formed on one surface, and a heat transfer conductor is formed on the other surface. was formed into a conductor-forming ceramic plate.

次に前述の回路形成セラミック板と導体形成セラミック
板とを空気中で200℃まで室温から10時間で昇温し
、200℃からは水素芽囲気中で30℃/時間の昇温速
度で1450℃まで昇温させて焼成し、その後無電解ニ
ッケルメッキにて2μInの厚さにメッキ被膜を施した
Next, the aforementioned circuit-forming ceramic board and conductor-forming ceramic board were heated in air to 200°C from room temperature in 10 hours, and from 200°C to 1450°C at a heating rate of 30°C/hour in a hydrogen atmosphere. After that, a plating film was applied to a thickness of 2 μIn by electroless nickel plating.

以下実施例1と同様の方法にて厚さ0.2 mmのコバ
ール板をろう付してセラミック配線板を得た。
Thereafter, a Kovar plate having a thickness of 0.2 mm was brazed in the same manner as in Example 1 to obtain a ceramic wiring board.

上記のセラミック配線板についてレーザーフラッシュ法
熱定数装置によシ熱抵抗を測定したところ0.8℃/W
であった。
The thermal resistance of the above ceramic wiring board was measured using a laser flash method thermal constant device and was 0.8°C/W.
Met.

実施例3 メッキ処理が無電解ニッケルメッキにて2μmの厚さ、
硫酸銅メッキにて100μmの厚さにメッキ被膜を施し
た以外は実施例1と同様の工程を経てセラミック配線板
を得た。このセラミック配線板を実施例1と同様の装置
にて熱抵抗を測定したところ0.55°C/Wであった
Example 3 Plating treatment was electroless nickel plating with a thickness of 2 μm,
A ceramic wiring board was obtained through the same steps as in Example 1 except that a plating film was applied to a thickness of 100 μm using copper sulfate plating. The thermal resistance of this ceramic wiring board was measured using the same device as in Example 1 and found to be 0.55°C/W.

実施例4 メッキ処理が無電解ニッケルメッキにて2μmの厚さ、
硫酸銅メッキにて20μmの厚さにメッキ被膜を施した
以外は実施例2と同様の工程を経てセラミック配線板を
得た。このセラミック配線板を実施例1と同様の装置に
て熱抵抗を測定したところ0.7℃/Wであった。
Example 4 Plating treatment was electroless nickel plating with a thickness of 2 μm,
A ceramic wiring board was obtained through the same steps as in Example 2 except that a plating film was applied to a thickness of 20 μm using copper sulfate plating. The thermal resistance of this ceramic wiring board was measured using the same device as in Example 1 and found to be 0.7°C/W.

比較例1 実施例1で得たグリーンシートを2枚貼り合わせ厚さ0
.70mのグリーンシートとした。このグリーンシート
の一方の表面に実施例1と同様のタングステンペースト
にて実施例1と同様の回路部を形成し、他方の表面には
実施例1と同様の表面放熱導体部を形成し、以下実施例
1と同様の焼成及びメッキ処理工程を経てセラミック配
線板を得た。このセラミック配線板を実施例1と同様の
装置にて熱抵抗を測定したところ1.20℃/Wであつ
た。
Comparative Example 1 Two green sheets obtained in Example 1 were laminated to a thickness of 0.
.. It was made into a 70m green sheet. A circuit part similar to that in Example 1 was formed on one surface of this green sheet using the same tungsten paste as in Example 1, and a surface heat dissipation conductor part similar to that in Example 1 was formed on the other surface. A ceramic wiring board was obtained through the same firing and plating steps as in Example 1. The thermal resistance of this ceramic wiring board was measured using the same device as in Example 1 and found to be 1.20° C./W.

比較例2 メッキ処理を実施例3の方法で行なった以外は比較例1
と同様の工程を経てセラミック配線板を得た。このセラ
ミック配線板を実施例1と同様の装置にて熱抵抗を測定
したところ1.05℃/Wであった。
Comparative Example 2 Comparative Example 1 except that the plating treatment was performed by the method of Example 3.
A ceramic wiring board was obtained through the same process. The thermal resistance of this ceramic wiring board was measured using the same device as in Example 1 and found to be 1.05° C./W.

本発明によれば、伝熱導体部を形成しない従来のセラミ
ック配線板に比較し1本発明の実施例になるセラミック
配線板は熱抵抗を約20〜40q6向上することができ
るため放熱性の良いセラミック配線板を得ることができ
る。
According to the present invention, the ceramic wiring board according to the embodiment of the present invention can improve the thermal resistance by about 20 to 40q6 compared to the conventional ceramic wiring board that does not form a heat transfer conductor part, so it has good heat dissipation. A ceramic wiring board can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図、第2図および第3図は2本発明の実施例になる
セラミック配線板の製造工程を示す縦断面図である。 符号の説明 1 ・・グリーンシート 2・・・回路部3・・−伝熱
導体部 4・・・回路形成セラミック板5・・穴 6・
・・表面放熱導体部 7・・・導体形成セラミック板 8・・・コバール板 代理人 弁理士 若 林 ハ5 彦
FIGS. 1, 2, and 3 are longitudinal cross-sectional views showing the manufacturing process of a ceramic wiring board according to two embodiments of the present invention. Explanation of symbols 1...Green sheet 2...Circuit section 3...-heat transfer conductor section 4...Circuit forming ceramic plate 5...Hole 6.
...Surface heat dissipation conductor part 7...Conductor-forming ceramic plate 8...Kovar board agent Patent attorney Hiko Wakabayashi

Claims (1)

【特許請求の範囲】 1、一方の表面に形成された回路部と、他の表面に形成
された表面放熱導体部と、セラミック基板中に埋込まれ
た伝熱導体部と、この伝熱導体部に固着した金属板又は
高熱伝導性セラミックスとからなるセラミック配線板。 2一方の表面に回路部を形成した回路形成°セラミック
板又は一方の表面に回路部を形成し、他方の表面に伝熱
導体部を形成した回路形成セラミック板と、一方の表面
に表面放熱導体部を形成した導体形成セラミック板又は
一方の表面に表面放熱導体部を形成し、他方の表面に伝
熱導体部を形成した導体形成セラミック板とを焼成し9
次いで回路形成セラミック板の回路部を形成また面と導
体形成セラミック板の表面放熱導体部を形成し庭面とが
表面(外側面)になるように重ねると共に回路形成セラ
ミック板と導体形成セラミック板との間札金属板又は高
熱伝導性セラミックスの一部を介在させ、加熱して固着
することを特徴とするセラミック配線板の製造方法。 3、焼成後セラミック配線板の回路部及び/又は表面放
熱導体部をメッキ処理する特許請求の範囲第2項記載の
セラミック配線板の製造方法。 4、 メッキ処理がニッケルメッキ処理である特許請求
の範囲第2項又は第3項記載のセラミック配線板の製造
方法。 5、 メッキ処理がニッケルメッキと銅メッキの二重メ
ッキ処理である特許請求の範囲第2項又は第3項記載の
セラミック配線板の製造方法。
[Claims] 1. A circuit section formed on one surface, a surface heat dissipation conductor section formed on the other surface, a heat transfer conductor section embedded in a ceramic substrate, and this heat transfer conductor. A ceramic wiring board consisting of a metal plate or highly thermally conductive ceramics fixed to the parts. 2 A circuit-forming ceramic plate with a circuit section formed on one surface or a circuit-forming ceramic plate with a circuit section formed on one surface and a heat transfer conductor section on the other surface, and a surface heat dissipation conductor on one surface. or a conductor-forming ceramic plate having a surface heat dissipation conductor portion formed on one surface and a heat transfer conductor portion formed on the other surface.
Next, a circuit part of the circuit-forming ceramic board is formed, and a surface heat dissipating conductor part of the surface and the conductor-forming ceramic board is formed, and the circuit-forming ceramic board and the conductor-forming ceramic board are overlapped so that the front surface becomes the front surface (outer surface), and the circuit-forming ceramic board and the conductor-forming ceramic board are A method for manufacturing a ceramic wiring board, which comprises interposing a part of a metal plate or a highly thermally conductive ceramic plate and heating and fixing the board. 3. The method for manufacturing a ceramic wiring board according to claim 2, wherein the circuit portion and/or surface heat dissipation conductor portion of the ceramic wiring board is plated after firing. 4. The method for manufacturing a ceramic wiring board according to claim 2 or 3, wherein the plating treatment is nickel plating treatment. 5. The method for manufacturing a ceramic wiring board according to claim 2 or 3, wherein the plating process is a double plating process of nickel plating and copper plating.
JP22938983A 1983-12-05 1983-12-05 Ceramic circuit board and method of producing ceramic circuit board Pending JPS60120592A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22938983A JPS60120592A (en) 1983-12-05 1983-12-05 Ceramic circuit board and method of producing ceramic circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22938983A JPS60120592A (en) 1983-12-05 1983-12-05 Ceramic circuit board and method of producing ceramic circuit board

Publications (1)

Publication Number Publication Date
JPS60120592A true JPS60120592A (en) 1985-06-28

Family

ID=16891425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22938983A Pending JPS60120592A (en) 1983-12-05 1983-12-05 Ceramic circuit board and method of producing ceramic circuit board

Country Status (1)

Country Link
JP (1) JPS60120592A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61280464A (en) * 1985-06-05 1986-12-11 Nippon Carbide Ind Co Ltd Production of disubstituted cyanamide
JPH0332099A (en) * 1989-06-29 1991-02-12 Yokohama Rubber Co Ltd:The Multilayer printed wiring board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61280464A (en) * 1985-06-05 1986-12-11 Nippon Carbide Ind Co Ltd Production of disubstituted cyanamide
JPH0560461B2 (en) * 1985-06-05 1993-09-02 Nippon Carbide Kogyo Kk
JPH0332099A (en) * 1989-06-29 1991-02-12 Yokohama Rubber Co Ltd:The Multilayer printed wiring board

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