JP2003124584A - Ceramic circuit board - Google Patents

Ceramic circuit board

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Publication number
JP2003124584A
JP2003124584A JP2001314223A JP2001314223A JP2003124584A JP 2003124584 A JP2003124584 A JP 2003124584A JP 2001314223 A JP2001314223 A JP 2001314223A JP 2001314223 A JP2001314223 A JP 2001314223A JP 2003124584 A JP2003124584 A JP 2003124584A
Authority
JP
Japan
Prior art keywords
plate
circuit board
metal
thickness
silicon nitride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001314223A
Other languages
Japanese (ja)
Inventor
Takayuki Miyao
貴幸 宮尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001314223A priority Critical patent/JP2003124584A/en
Publication of JP2003124584A publication Critical patent/JP2003124584A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a ceramic circuit board in which the mechanical strength of the board is raised, the thermal characteristics are improved and the warping of the board can be suppressed. SOLUTION: The ceramic circuit board 1 comprises a metal circuit plate 3 connected to one main surface of a base 6 formed by interposing a Cu plate or a Cu alloy plate 4 between two silicon nitride plates 2 and connecting the plate between the plates 2, and a metal plate 5 connected to the other main surface. In this board 1, the Cu plate or the Cu alloy plate 4 has a thickness of 0.5 to 2.0 mm, and the ratio of the total sum of the thicknesses of the plate 3 and the Cu plate or the Cu alloy plate 4 and the plate 5 to the thickness of the entire board 1 is 50 to 90%. T2>=T1>=T3 is preferred, wherein T1 is the thickness of the plate 3, T2 is the thickness of the Cu plate or the Cu alloy plate, and T3 is the thickness of the plate 5.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、セラミック基板に
金属回路板を接合したセラミック回路基板に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a ceramic circuit board obtained by joining a metal circuit board to a ceramic board.

【0002】[0002]

【従来の技術】近年、パワーモジュール用基板やスイッ
チングモジュール用基板等の回路基板として、セラミッ
ク基板上に活性金属ロウ材を介して銅等から成る金属回
路板を直接接合させたセラミック回路基板が用いられて
いる。
2. Description of the Related Art In recent years, a ceramic circuit board in which a metal circuit board made of copper or the like is directly bonded onto a ceramic board via an active metal brazing material has been used as a circuit board such as a power module board or a switching module board. Has been.

【0003】かかるセラミック回路基板は、酸化アルミ
ニウム質焼結体から成るセラミック基板を用いる場合に
は、具体的には以下の方法によって製作される。
Such a ceramic circuit board is specifically manufactured by the following method when a ceramic board made of an aluminum oxide sintered body is used.

【0004】まず、銀−銅合金にチタン・ジルコニウム
・ハフニウムおよびこれらの水素化物の少なくとも1種
を添加した活性金属粉末に有機溶剤・溶媒を添加混合し
てロウ材ペーストを調製する。
First, a brazing paste is prepared by adding and mixing an organic solvent and a solvent to an active metal powder obtained by adding at least one of titanium, zirconium, and hafnium to a silver-copper alloy.

【0005】次に、酸化アルミニウム・酸化珪素・酸化
マグネシウム・酸化カルシウム等の原料粉末に適当な有
機バインダ・可塑剤・溶剤等を添加混合して泥漿状と成
すとともにこれを従来周知のドクターブレード法やカレ
ンダーロール法等のテープ成形技術を採用して複数のセ
ラミックグリーンシートを得た後、所定寸法に形成し、
次にセラミックグリーンシートを必要に応じて上下に積
層するとともに還元雰囲気中にて約1600℃の温度で焼成
し、セラミックグリーンシートを焼結一体化させて酸化
アルミニウム質焼結体から成るセラミック基板を形成す
る。
Next, a suitable organic binder, a plasticizer, a solvent and the like are added to and mixed with raw material powders of aluminum oxide, silicon oxide, magnesium oxide, calcium oxide and the like to form a sludge and this is well-known by the doctor blade method. After obtaining a plurality of ceramic green sheets by adopting tape molding technology such as or calender roll method, it is formed into a predetermined size,
Next, if necessary, the ceramic green sheets are stacked one on top of the other and fired at a temperature of about 1600 ° C. in a reducing atmosphere to sinter and integrate the ceramic green sheets to form a ceramic substrate made of an aluminum oxide sintered body. Form.

【0006】次に、セラミック基板上にロウ材ペースト
を間に挟んで銅等から成る金属回路板を載置する。
Next, a metal circuit board made of copper or the like is placed on the ceramic substrate with a brazing paste interposed therebetween.

【0007】そして最後に、セラミック基板と金属回路
板との間に配されているロウ材ペーストを非酸化性雰囲
気中にて約900℃の温度に加熱して溶融させ、このロウ
材でセラミック基板と金属回路板とを接合することによ
って製作される。
Finally, the brazing material paste disposed between the ceramic substrate and the metal circuit board is heated to a temperature of about 900 ° C. in a non-oxidizing atmosphere to be melted, and the brazing material is used for the ceramic substrate. And a metal circuit board are joined together.

【0008】このように製作されたセラミック回路基板
は、IGBT(Insulated Gate Bipolar Transistor)
やMOS−FET(Metal Oxide Semiconductor - Fiel
d Effect Transistor)等の半導体素子等の電子部品を
半田などの接着剤を介して接合した後、例えばアルミニ
ウム等の放熱部材に半田で接合されることにより、半導
体素子の動作時の発熱を良好に放熱させる半導体モジュ
ールとなる。
The ceramic circuit board manufactured as described above is an IGBT (Insulated Gate Bipolar Transistor).
And MOS-FET (Metal Oxide Semiconductor-Fiel
After connecting electronic components such as semiconductor devices such as d Effect Transistor) via an adhesive such as solder, they are joined to a heat dissipation member such as aluminum with solder to improve heat generation during operation of semiconductor devices. It becomes a semiconductor module that dissipates heat.

【0009】しかしながら、このような半導体モジュー
ルにおいては、セラミック回路基板(熱膨張係数が約3
〜10ppm/℃)と放熱部材(熱膨張係数が約18〜23p
pm/℃)との熱膨張係数が大きく相違することから、
セラミック回路基板と放熱部材間の半田にクラックが発
生し、剥離が生じて信頼性が著しく劣化する場合があ
る。このため、半田に変えてグリース状の伝熱性組成物
を介してセラミック回路基板と放熱部材とを接合実装す
る構成が採用されている。
However, in such a semiconductor module, a ceramic circuit board (having a thermal expansion coefficient of about 3) is used.
~ 10ppm / ℃) and heat dissipation member (coefficient of thermal expansion is about 18-23p)
pm / ° C) and the coefficient of thermal expansion is very different,
In some cases, cracks may occur in the solder between the ceramic circuit board and the heat dissipation member, causing peeling and significantly degrading reliability. Therefore, a configuration is adopted in which the ceramic circuit board and the heat dissipation member are joined and mounted via a grease-like heat conductive composition instead of solder.

【0010】また一方で、上記のような従来のパワーモ
ジュール用のセラミック回路基板では、セラミック回路
基板と放熱部材との熱膨張差に起因する熱応力の発生が
避けられず、繰り返しの熱履歴によってセラミック基板
や半田にクラックが発生し易いため、長期的な信頼性の
点で問題がある。また、セラミック回路基板と放熱部材
との熱膨張率の差によって、半田付け後に冷却すると反
りが生じるという問題点もある。この反りが大きい場
合、放熱部材を冷却するための水冷器との接着が悪くな
り、放熱特性が劣化することとなる。この反りは大きな
放熱部材を用いる程大きくなる。パワーモジュールとす
るには、一般的に放熱部材としてヒートシンクが用いら
れ、このヒートシンクの部分が熱フィンや水冷器にネジ
止めされるので、加熱・冷却の繰り返しによってさらに
大きな曲げ荷重が加わることとなり、セラミック基板に
クラックやワレが生じ、信頼性が低下するという問題点
があった。
On the other hand, in the conventional ceramic circuit board for a power module as described above, generation of thermal stress due to the difference in thermal expansion between the ceramic circuit board and the heat radiation member is unavoidable, and repeated thermal history causes Since cracks easily occur in the ceramic substrate and solder, there is a problem in terms of long-term reliability. Further, there is a problem that a warp occurs when cooled after soldering due to a difference in coefficient of thermal expansion between the ceramic circuit board and the heat dissipation member. If this warp is large, the adhesion to the water cooler for cooling the heat dissipation member will be poor and the heat dissipation characteristics will be deteriorated. This warp increases as a large heat dissipation member is used. In order to make a power module, a heat sink is generally used as a heat radiating member, and the heat sink portion is screwed to a heat fin or a water cooler, so that a larger bending load is applied by repeated heating and cooling, There is a problem in that the ceramic substrate is cracked or cracked to lower reliability.

【0011】そこで、図4に従来のセラミック基板の例
を断面図で示すように、金属回路板13と金属板15とがそ
れぞれセラミック基板12に接合されている、ヒートシン
クを使用しないセラミック回路基板11が用いられてい
る。なお、7は金属回路板13上に搭載された半導体素子
である。このセラミック回路基板11は、水冷器に直接、
オイルコンパウンド等の伝熱性組成物を介して金属板15
が接合される。これによれば、半田付け工程を省略して
いるため、半田に生じるクラックの問題がないため、信
頼性は飛躍的に改善される。また、ヒートシンクを使用
しないセラミック回路基板11の場合は、金属回路板13お
よび金属板15の厚みが小さい場合であれば、セラミック
基板12と金属回路板13および金属板15との接合部に発生
する熱応力が小さいため、セラミック回路基板11の反り
は改善される。
Therefore, as shown in a cross-sectional view of an example of a conventional ceramic substrate in FIG. 4, a metal circuit plate 13 and a metal plate 15 are respectively joined to the ceramic substrate 12, and a ceramic circuit substrate 11 without a heat sink is used. Is used. Reference numeral 7 is a semiconductor element mounted on the metal circuit board 13. This ceramic circuit board 11 is directly attached to the water cooler,
Metal plate 15 through a heat transfer composition such as oil compound
Are joined. According to this, since the soldering step is omitted, there is no problem of cracks occurring in the solder, and the reliability is dramatically improved. Further, in the case of the ceramic circuit board 11 that does not use a heat sink, if the thickness of the metal circuit board 13 and the metal plate 15 is small, it occurs at the joint between the ceramic board 12 and the metal circuit board 13 and the metal plate 15. Since the thermal stress is small, the warp of the ceramic circuit board 11 is improved.

【0012】[0012]

【発明が解決しようとする課題】しかしながら、図4に
示すような従来のヒートシンクを使用しないセラミック
回路基板11においては、ヒートシンクによる熱の拡散効
果がなくなった分、水冷器への熱伝導効率が低下し、放
熱特性が低下するという問題点があり、その結果、半導
体素子7の温度が許容温度を超えると、半導体素子7の
誤動作を招いたり、半導体素子7自身が破壊に至る可能
性があるという問題点があった。
However, in the conventional ceramic circuit board 11 which does not use a heat sink as shown in FIG. 4, the heat conduction efficiency to the water cooler is reduced because the heat diffusion effect by the heat sink is lost. However, there is a problem that the heat dissipation characteristic is deteriorated. As a result, if the temperature of the semiconductor element 7 exceeds the allowable temperature, the semiconductor element 7 may malfunction and the semiconductor element 7 itself may be destroyed. There was a problem.

【0013】これに対して、放熱特性を上げるために熱
伝導率の低いセラミック基板12の厚みを薄くし、熱伝導
率の高い金属回路板13や金属板15の厚みを厚くすること
が考えられるが、セラミック基板12を薄くすると機械的
強度が低下し、その一方で金属回路板13や金属板15の厚
みを厚くするとセラミック回路基板11に大きな熱応力が
加わって反りが発生し、セラミック基板12にクラックを
生じさせたり、そのクラックによる絶縁耐圧不良を起こ
したり、あるいは、金属板15が剥離してしまったりする
などの問題点があった。
On the other hand, it is conceivable to reduce the thickness of the ceramic substrate 12 having a low thermal conductivity and increase the thickness of the metal circuit board 13 or the metal plate 15 having a high thermal conductivity in order to improve the heat dissipation characteristics. However, if the ceramic substrate 12 is made thin, the mechanical strength is reduced, while if the thickness of the metal circuit board 13 or the metal plate 15 is made large, a large thermal stress is applied to the ceramic circuit board 11 to cause warping, and the ceramic board 12 There are problems that cracks are generated in the metal, that the dielectric strength is deteriorated due to the cracks, or that the metal plate 15 is peeled off.

【0014】本発明は上記問題点に鑑み完成されたもの
で、その目的は、セラミック回路基板の機械的強度を上
げ、熱特性を向上し、かつ基板の反りを抑制することが
できるセラミック回路基板を提供することにある。
The present invention has been completed in view of the above problems, and an object thereof is to increase the mechanical strength of a ceramic circuit board, improve the thermal characteristics, and suppress the warp of the board. To provide.

【0015】[0015]

【課題を解決するための手段】本発明のセラミック回路
基板は、2枚の窒化珪素板の間にCu板またはCu合金
板を挟んで接合して成る基体の一方の主面に金属回路板
を、他方の主面に金属板を接合して成るセラミック回路
基板であって、前記Cu板またはCu合金板は、厚みが
0.2mm以上2.0mm以下であり、かつ前記セラミック回
路基板全体の厚さにおける前記金属回路板と前記Cu板
またはCu合金板と前記金属板との厚さの合計の割合が
50〜90%であることを特徴とするものである。
In the ceramic circuit board of the present invention, a metal circuit board is provided on one main surface of a base formed by sandwiching a Cu plate or a Cu alloy plate between two silicon nitride plates, and the other. Is a ceramic circuit board formed by bonding a metal plate to the main surface of the Cu plate or the Cu alloy plate.
It is 0.2 mm or more and 2.0 mm or less, and the total ratio of the thickness of the metal circuit board and the Cu plate or the Cu alloy plate and the metal plate in the total thickness of the ceramic circuit board is
It is characterized by being 50 to 90%.

【0016】また、本発明のセラミック回路基板は、上
記構成において、前記金属回路板の厚みをT1、前記C
u板またはCu合金板の厚みをT2、前記金属板の厚み
をT3としたとき、T2≧T1≧T3であることを特徴
とするものである。
Further, in the ceramic circuit board of the present invention, in the above structure, the thickness of the metal circuit board is T1, and the thickness of the metal circuit board is C
When the thickness of the u plate or the Cu alloy plate is T2 and the thickness of the metal plate is T3, T2 ≧ T1 ≧ T3.

【0017】本発明のセラミック回路基板によれば、基
体を機械的強度や破壊靭性値に優れる窒化珪素焼結体か
ら成る窒化珪素板の間にCu板またはCu合金板を挟ん
で接合して成るものとし、この基体を用いて、回路基板
全体として金属回路板/窒化珪素板/Cu板またはCu
合金板/窒化珪素板/金属板の5層構成としたことか
ら、セラミック回路基板の中間層としてCu板またはC
u合金板を設けることで基体の剛性が上がるため、平均
歪みを低減することが可能となり、従って、基体に厚み
の薄い窒化珪素板を用いた場合でも厚みの厚い金属回路
板を接合して回路基板を構成することが可能となり、接
合信頼性を損なわずに機械的強度を上げることができ
る。さらに、セラミック回路基板全体の厚みが増えると
半導体素子等の電子部品が発生する熱は横方向へも拡散
しながら伝導し、窒化珪素板の間のCu板またはCu合
金板は窒化珪素板に比較して高熱伝導性であるので、よ
り効果的に拡散しながら伝導するため、金属回路板上に
搭載される半導体素子等の電子部品が発生する熱を金属
回路板から金属板へと有効に伝導して放散させることが
可能となる。
According to the ceramic circuit board of the present invention, it is assumed that the base body is bonded by sandwiching a Cu plate or a Cu alloy plate between silicon nitride plates made of a silicon nitride sintered body excellent in mechanical strength and fracture toughness. , Using this substrate, as a whole circuit board, metal circuit board / silicon nitride board / Cu board or Cu
Since it has a five-layer structure of an alloy plate / silicon nitride plate / metal plate, a Cu plate or C is used as an intermediate layer of the ceramic circuit board.
By providing the u-alloy plate, the rigidity of the base increases, so it is possible to reduce the average strain. Therefore, even if a thin silicon nitride plate is used for the base, a thick metal circuit board is joined to form a circuit. The substrate can be configured, and the mechanical strength can be increased without impairing the bonding reliability. Furthermore, when the thickness of the entire ceramic circuit board increases, the heat generated by electronic parts such as semiconductor elements is conducted while being diffused in the lateral direction, and the Cu plate or the Cu alloy plate between the silicon nitride plates is compared with the silicon nitride plate. Since it has high thermal conductivity, it can conduct heat while diffusing more effectively, so that the heat generated by electronic components such as semiconductor elements mounted on the metal circuit board can be effectively conducted from the metal circuit board to the metal plate. It is possible to dissipate.

【0018】一般に、セラミック回路基板を構成するセ
ラミックスから成る基体を多層にすると、機械的強度は
向上し剛性が上がるが、回路基板を外部の水冷器等にネ
ジ止め等で接合する際にセラミック回路基板がたわみに
くくなるため、セラミック回路基板が水冷器等に密着し
にくくなり、熱抵抗が増大することとなる。しかし、本
発明のセラミック回路基板によれば、2枚の窒化珪素板
の間にCu板またはCu合金板を挟んで接合した基体の
一方の主面に金属回路板を、他方の主面に金属板を接合
して成るものとし、回路基板を全体として必要最低限の
5層構成とすることで、機械的強度が充分な厚みの窒化
珪素板を用いてもセラミック回路基板の厚みが増えすぎ
てたわみにくくなることがないため、回路基板に十分な
たわみ量を許容させつつ機械的強度を確保することが可
能となる。
In general, when a ceramic substrate constituting a ceramic circuit board is formed into multiple layers, mechanical strength is improved and rigidity is increased. However, when the circuit board is joined to an external water cooler or the like by screwing or the like, the ceramic circuit is formed. Since the board is less likely to bend, it becomes difficult for the ceramic circuit board to come into close contact with the water cooler or the like, and the thermal resistance increases. However, according to the ceramic circuit board of the present invention, the metal circuit board is formed on one main surface of the base body and the metal plate is formed on the other main surface of the base body in which the Cu plate or the Cu alloy plate is sandwiched and joined between the two silicon nitride plates. Since the circuit board has a minimum required five-layer structure as a whole, the thickness of the ceramic circuit board increases too much even when a silicon nitride plate having a sufficient mechanical strength is used, and the circuit board does not easily bend. Since it does not occur, it becomes possible to secure the mechanical strength while allowing the circuit board a sufficient amount of deflection.

【0019】これに対し、セラミック回路基板に十分な
たわみを持たせつつ、例えば基体を窒化珪素板/Cu板
またはCu合金板/窒化珪素板の3層から窒化珪素板/
Cu板またはCu合金板/窒化珪素板/Cu板またはC
u合金板/窒化珪素板の5層とし回路基板全体として7
層としたりあるいはそれ以上に多層化することを考えた
場合は、回路基板全体の厚みが厚くなり剛性が強くなる
のを避けるために、金属から成る部分と比較して低熱伝
導である窒化珪素板の厚みの割合を小さくすべく窒化珪
素板を薄くすると、接合時に発生する熱応力により窒化
珪素板にクラックが生じやすいものとなる。これとは逆
に、機械的強度が充分な厚みの窒化珪素板を用いて放熱
特性を向上させるために金属部分を厚くすると、セラミ
ック回路基板自体の剛性が必要以上に強くなり、たわみ
にくいものとなる。また、多層化により積層される部材
間の接合界面が増えると、接触抵抗が増え熱特性が低下
する可能性がある。従って、本発明のセラミック回路基
板における5層構成は、放熱特性およびセラミック回路
基板のたわみや反りのバランスの点で良好な特性が得ら
れるものである。
On the other hand, while allowing the ceramic circuit board to have sufficient bending, for example, the substrate is formed from three layers of silicon nitride plate / Cu plate or Cu alloy plate / silicon nitride plate to silicon nitride plate /
Cu plate or Cu alloy plate / silicon nitride plate / Cu plate or C
5 layers of u alloy plate / silicon nitride plate and 7 as a whole circuit board
When considering the use of multiple layers or more layers, a silicon nitride plate that has a low thermal conductivity compared to the metal part in order to avoid the increase in the overall thickness and rigidity of the circuit board. If the silicon nitride plate is thinned in order to reduce the ratio of the thickness of the silicon nitride plate, cracks easily occur in the silicon nitride plate due to the thermal stress generated at the time of bonding. On the contrary, if the metal part is thickened to improve the heat dissipation characteristics by using a silicon nitride plate with sufficient mechanical strength, the rigidity of the ceramic circuit board itself becomes unnecessarily strong and it is difficult to bend. Become. Further, if the number of joint interfaces between the stacked members increases due to the multilayer structure, the contact resistance may increase and the thermal characteristics may deteriorate. Therefore, the five-layer structure of the ceramic circuit board of the present invention provides good characteristics in terms of heat dissipation characteristics and the balance of bending and warpage of the ceramic circuit board.

【0020】また、本発明のセラミック回路基板によれ
ば、2枚の窒化珪素板の間のCu板またはCu合金板を
厚みが0.2mm以上2.0mm以下の熱伝導率の高いCu板
またはCu合金板とし、さらに、セラミック回路基板に
おける、金属回路板、Cu板またはCu合金板、金属板
を合わせた割合が50〜90%としたことから、これら高熱
伝導率の金属部分において熱が広がりやすくなることに
より、横方向への熱拡散が効果的に行なえるものとな
り、熱特性を向上させることができる。
Further, according to the ceramic circuit board of the present invention, the Cu plate or Cu alloy plate between the two silicon nitride plates is a Cu plate or Cu alloy plate having a high thermal conductivity of 0.2 mm or more and 2.0 mm or less. In addition, since the ratio of the metal circuit board, the Cu plate or the Cu alloy plate, and the metal plate in the ceramic circuit board is set to 50 to 90%, the heat easily spreads in these metal parts having high thermal conductivity. Further, the heat diffusion in the lateral direction can be effectively performed, and the thermal characteristics can be improved.

【0021】さらに、本発明のセラミック回路基板によ
れば、金属回路板の厚みをT1、Cu板またはCu合金
板の厚みをT2、金属板の厚みをT3としたとき、T2
≧T1≧T3とすることにより、基板の反りに影響が小
さく、回路基板全面に渡り配置されるCu板またはCu
合金板の厚みT2が最も厚く、接合面積の小さい金属回
路板の厚みT1が接合面積の大きい金属板の厚みT3よ
り厚くなるため、回路基板全体としての剛性が確保さ
れ、かつ窒化珪素板およびCu板またはCu合金板から
成る基体と金属回路板と金属板との熱膨張係数の相違に
起因する回路基板表裏の熱応力がバランスよく構成され
るものとなり、セラミック回路基板の反りを極めて小さ
く抑制することができる。そして、セラミック回路基板
の反りが抑制されることにより、水冷器との密着がよく
なり、放熱特性が上がり、さらには、熱的・機械的応力
に起因するクラックや割れの発生を防止することがで
き、その結果としてクラックに起因する絶縁不良を防止
してセラミック回路基板の信頼性を向上させることが可
能となる。
Furthermore, according to the ceramic circuit board of the present invention, when the thickness of the metal circuit board is T1, the thickness of the Cu plate or the Cu alloy plate is T2, and the thickness of the metal plate is T3, T2 is given.
By setting ≧ T1 ≧ T3, the influence on the warp of the board is small, and the Cu plate or the Cu arranged over the entire surface of the circuit board
Since the thickness T2 of the alloy plate is thickest and the thickness T1 of the metal circuit board having a small bonding area is thicker than the thickness T3 of the metal plate having a large bonding area, the rigidity of the circuit board as a whole is secured, and the silicon nitride plate and the Cu The thermal stress on the front and back of the circuit board due to the difference in thermal expansion coefficient between the metal plate and the base body made of a metal plate or a Cu alloy plate is well-balanced, and the warp of the ceramic circuit board is suppressed to an extremely small level. be able to. Further, by suppressing the warpage of the ceramic circuit board, the close contact with the water cooler is improved, the heat dissipation characteristics are improved, and further, the occurrence of cracks or breaks due to thermal / mechanical stress can be prevented. As a result, it is possible to prevent insulation failure due to cracks and improve the reliability of the ceramic circuit board.

【0022】この結果、本発明のセラミック回路基板に
よれば、放熱特性が良好となり、金属回路板上に搭載さ
れる半導体素子等の電子部品の熱による誤動作を防止す
ることができ、信頼性の高い半導体モジュールを得るこ
とが可能となる。
As a result, according to the ceramic circuit board of the present invention, the heat dissipation characteristics are improved, and it is possible to prevent malfunction of electronic parts such as semiconductor elements mounted on the metal circuit board due to heat, and to improve reliability. It is possible to obtain a high semiconductor module.

【0023】[0023]

【発明の実施の形態】次に、本発明を添付図面に基づき
詳細に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail with reference to the accompanying drawings.

【0024】図1は、本発明のセラミック回路基板の実
施の形態の一例を示す断面図であり、1はセラミック回
路基板、2は窒化珪素板、3は金属回路板、4はCu板
またはCu合金板、5は金属板である。また、6は2枚
の窒化珪素板2の間にCu板またはCu合金板4を挟ん
で接合して成る基体であり、7は金属回路板3上に搭載
された半導体素子である。本発明のセラミック回路基板
1は、2枚の窒化珪素板2の間にCu板またはCu合金
板4(以下、「Cu板またはCu合金板」を「Cu板
等」という。)を挟んで接合して成る基体6の一方の主
面、ここでは上面に金属回路板3を、他方の主面、ここ
では下面に金属板5を接合して成る、全体として5層構
造の構成になっている。
FIG. 1 is a sectional view showing an example of an embodiment of a ceramic circuit board of the present invention. 1 is a ceramic circuit board, 2 is a silicon nitride plate, 3 is a metal circuit board, 4 is a Cu plate or Cu. Alloy plates 5 are metal plates. Further, 6 is a base body formed by sandwiching and bonding a Cu plate or a Cu alloy plate 4 between two silicon nitride plates 2, and 7 is a semiconductor element mounted on the metal circuit plate 3. In the ceramic circuit board 1 of the present invention, a Cu plate or a Cu alloy plate 4 (hereinafter, “Cu plate or Cu alloy plate” is referred to as “Cu plate or the like”) is sandwiched between two silicon nitride plates 2 and joined. A metal circuit board 3 is bonded to one main surface, here the upper surface, of the base body 6 formed as described above, and the metal plate 5 is bonded to the other main surface, here, the lower surface, which has a five-layer structure as a whole. .

【0025】窒化珪素板2は、窒化珪素質焼結体から成
る板状体である。窒化珪素板2を得るには、まず窒化珪
素粉末に希土類酸化物粉末や酸化アルミニウム粉末等の
焼結助剤を添加・混合して窒化珪素質焼結体原料粉末を
調整する。次いで、窒化珪素質焼結体原料粉末に有機バ
インダおよび分散媒を添加・混合してペースト化し、こ
のペーストをドクターブレード法等の成形法でシート状
に成形して窒化珪素グリーンシートを作製する。このよ
うな窒化珪素グリーンシートを必要枚数積層し、プレス
加工等を施して圧着(加圧接着)して窒化珪素質成形体
を作製する。この後、窒化珪素質成形体を空気中もしく
は窒素雰囲気等の非酸化性雰囲気中で脱脂処理した後、
窒素雰囲気等の非酸化性雰囲気中で焼成することによ
り、目的とする窒化珪素板2を得ることができる。
The silicon nitride plate 2 is a plate-like body made of a silicon nitride sintered body. To obtain the silicon nitride plate 2, first, a silicon nitride powder is mixed with a sintering aid such as a rare earth oxide powder or an aluminum oxide powder to prepare a silicon nitride sintered material powder. Next, an organic binder and a dispersion medium are added to and mixed with the raw material powder of a silicon nitride sintered material to form a paste, and the paste is formed into a sheet by a forming method such as a doctor blade method to produce a silicon nitride green sheet. A required number of such silicon nitride green sheets are laminated, press-processed, etc. and pressure-bonded (pressure-bonded) to produce a silicon nitride-based molded body. After this, after degreasing the silicon nitride compact in air or in a non-oxidizing atmosphere such as a nitrogen atmosphere,
By firing in a non-oxidizing atmosphere such as a nitrogen atmosphere, the intended silicon nitride plate 2 can be obtained.

【0026】窒化珪素板2は、金属回路板3上に搭載さ
れる半導体素子7等の電子部品が発生する熱を金属回路
板3から金属板5へと有効に伝導して放散させ、セラミ
ック回路基板1の放熱特性を向上させるためには、熱伝
導率が少なくとも60W/mK以上であることが好まし
く、特に80W/mK、さらには100W/mKであること
が好ましい。
The silicon nitride plate 2 effectively conducts and dissipates the heat generated by the electronic components such as the semiconductor element 7 mounted on the metal circuit plate 3 from the metal circuit plate 3 to the metal plate 5 to dissipate the ceramic circuit. In order to improve the heat dissipation characteristics of the substrate 1, the thermal conductivity is preferably at least 60 W / mK or more, particularly 80 W / mK, and further preferably 100 W / mK.

【0027】また、窒化珪素板2は、セラミック回路基
板1の機械的強度を向上させ、放熱特性を劣化させない
ためには、その厚みを0.2〜1.0mmとすることが好まし
い。厚みが0.2mm未満では、窒化珪素板2と金属回路
板3・Cu板等4・金属板5とを接合したときに発生す
る応力により、窒化珪素板2に割れ等が発生しやすくな
る傾向がある。他方、厚みが1.0mmを超えると、半導
体素子7から発生する熱を金属板5を介して外部の放熱
部材に良好に伝達することが困難となる傾向がある。
The silicon nitride plate 2 preferably has a thickness of 0.2 to 1.0 mm in order to improve the mechanical strength of the ceramic circuit board 1 and not deteriorate the heat radiation characteristics. If the thickness is less than 0.2 mm, the silicon nitride plate 2 tends to be cracked due to the stress generated when the silicon nitride plate 2 and the metal circuit plate 3, the Cu plate 4 and the metal plate 5 are joined. is there. On the other hand, when the thickness exceeds 1.0 mm, it tends to be difficult to satisfactorily transfer the heat generated from the semiconductor element 7 to the external heat dissipation member via the metal plate 5.

【0028】本発明のセラミック回路基板1は、前述の
ようにして製造した窒化珪素板2の間にCu板等4を挟
んで直接接合法や活性金属法を用いて接合して基体6を
作製し、その基体6の上面および下面に、直接接合法や
活性金属法を用いて導電性を有する銅やアルミニウム等
の金属材料から成る金属回路板3および金属板5をそれ
ぞれ接合することにより製造される。
In the ceramic circuit board 1 of the present invention, a Cu plate 4 or the like is sandwiched between the silicon nitride plates 2 manufactured as described above and bonded by a direct bonding method or an active metal method to form a substrate 6. Then, the metal circuit board 3 and the metal plate 5 made of a conductive metal material such as copper or aluminum are bonded to the upper surface and the lower surface of the base body 6 by a direct bonding method or an active metal method, respectively. It

【0029】例えば、活性金属法を用いる場合であれ
ば、銀−銅合金粉末等からなる銀ロウ粉末やアルミニウ
ム−シリコン合金粉末等から成るアルミニウムロウ粉末
に、チタン・ジルコニウム・ハフニウム等の活性金属や
その水素化物の少なくとも1種からなる活性金属粉末を
2〜5重量%添加した活性金属ロウ材に、適当な有機溶
剤・溶媒を添加混合して得た活性金属ロウ材ペースト
を、窒化珪素板2の上下面に従来周知のスクリーン印刷
技術を用いてCu板等4ならびに金属回路板3および金
属板5に対応した所定パターンに印刷する。
For example, in the case of using the active metal method, silver brazing powder made of silver-copper alloy powder or aluminum brazing powder made of aluminum-silicon alloy powder is added to active metals such as titanium, zirconium, and hafnium. The active metal brazing material paste obtained by adding and mixing a suitable organic solvent / solvent to the active metal brazing material in which 2 to 5% by weight of the active metal powder comprising at least one kind of hydride is added to the silicon nitride plate 2 A predetermined pattern corresponding to the Cu plate 4 and the metal circuit board 3 and the metal plate 5 is printed on the upper and lower surfaces using a conventionally known screen printing technique.

【0030】その後、下から金属板5・窒化珪素板2・
Cu板等4・窒化珪素板2・金属回路板3の順で、印刷
された活性金属ロウ材ペーストパターンをそれぞれの間
に挟むように載置し、これを真空中・中性雰囲気中また
は還元雰囲気中で、所定温度(銀ロウの場合は約900
℃、アルミニウムロウ材の場合は600℃)で加熱処理
し、活性金属ロウ材を溶融させて、窒化珪素板2とCu
板等4ならびに金属回路板3および金属板5とを接合さ
せる。
Then, from below, the metal plate 5, the silicon nitride plate 2,
A Cu plate or the like 4, a silicon nitride plate 2, and a metal circuit plate 3 are placed in this order so that the printed active metal brazing material paste pattern is sandwiched between them, and this is placed in a vacuum / neutral atmosphere or reduction. In the atmosphere, at a specified temperature (about 900 for silver wax)
℃, 600 ℃ for aluminum brazing material) to heat the active metal brazing material to melt the silicon nitride plate 2 and Cu.
The plate 4 and the metal circuit plate 3 and the metal plate 5 are joined together.

【0031】銅やアルミニウム等から成る金属回路板3
および金属板5、ならびにCu板等4は、銅やアルミニ
ウム等のインゴット(塊)に圧延加工法や抜き打ち加工
法等従来周知の金属加工法を施すことによって、例え
ば、厚さが0.5mmで、基体6の形状や回路配線パター
ンの形状等に対応する所定のパターン形状に製作され
る。ここで、金属回路板3および金属板5の厚さは、大
電流による金属回路板3の発熱を抑制し、金属回路板3
と窒化珪素板2との接合時に接合界面に発生する熱負荷
によるクラックを抑制するためには、0.1〜1.0mmが好
ましい。金属回路板3の厚さが0.1mmより小さいと、
電気抵抗が大きくなるため半導体素子7からの高電流信
号を伝播しにくくなる傾向がある。他方、1.0mmより
大きいと、窒化珪素板2と金属回路板3および金属板5
とを接合したときに発生する応力により、窒化珪素板2
に割れ等が発生しやすくなる傾向がある。また、金属回
路板3および金属板5は、セラミック回路基板1の両主
面の熱膨張係数を合わせて回路基板1全体としての反り
を低減するためには、同じ材質にすることが好ましい。
Metal circuit board 3 made of copper or aluminum
The metal plate 5 and the Cu plate 4 have a thickness of 0.5 mm, for example, by subjecting an ingot (lump) of copper, aluminum or the like to a conventionally known metal processing method such as a rolling method or a punching method. It is manufactured in a predetermined pattern shape corresponding to the shape of the substrate 6 and the shape of the circuit wiring pattern. Here, the thickness of the metal circuit board 3 and the metal plate 5 suppresses heat generation of the metal circuit board 3 due to a large current,
In order to suppress cracks due to the heat load generated at the bonding interface during bonding between the silicon nitride plate 2 and the silicon nitride plate 2, 0.1 to 1.0 mm is preferable. If the thickness of the metal circuit board 3 is less than 0.1 mm,
Since the electric resistance increases, it tends to be difficult for a high current signal from the semiconductor element 7 to propagate. On the other hand, if it is larger than 1.0 mm, the silicon nitride plate 2, the metal circuit plate 3 and the metal plate 5
Due to the stress generated when joining and
Tends to be cracked. The metal circuit board 3 and the metal plate 5 are preferably made of the same material in order to reduce the warpage of the circuit board 1 as a whole by matching the thermal expansion coefficients of both main surfaces of the ceramic circuit board 1.

【0032】Cu板等4ならびに金属回路板3および金
属板5は、銅から成る場合には、これを無酸素銅で形成
しておくと、無酸素銅はロウ付けの際に銅の表面が銅中
に存在する酸素により酸化されることなくロウ材との濡
れ性が良好となり、ロウ材を介しての接合を強固なもの
とすることができる。したがって、Cu板等4ならびに
金属回路板3および金属板5は、これを無酸素銅で形成
しておくことが好ましい。
When the Cu plate 4, etc. and the metal circuit board 3 and the metal plate 5 are made of copper, if they are made of oxygen-free copper, the oxygen-free copper will have a copper surface when brazing. The wettability with the brazing material is improved without being oxidized by the oxygen existing in the copper, and the bonding via the brazing material can be strengthened. Therefore, the Cu plate 4 and the metal circuit plate 3 and the metal plate 5 are preferably made of oxygen-free copper.

【0033】また、金属回路板3は、その表面にニッケ
ルから成る良導電性で、かつ耐蝕性およびロウ材との濡
れ性が良好な金属をメッキ法により被着させておくと、
金属回路板3と外部電気回路との電気的接続を良好なも
のにできるとともに金属回路板3に半導体素子7等の電
子部品を半田を介して強固に接着させることができる。
従って、金属回路板3はその表面にニッケルから成る良
導電性で、かつ耐蝕性及びロウ材との濡れ性が良好な金
属をメッキ法により被着させておくことが好ましい。
If the metal circuit board 3 is made of nickel and has good conductivity, corrosion resistance, and wettability with the brazing material, the metal circuit board 3 is deposited by plating.
The electric connection between the metal circuit board 3 and the external electric circuit can be made good, and the electronic components such as the semiconductor element 7 can be firmly adhered to the metal circuit board 3 via the solder.
Therefore, it is preferable that the surface of the metal circuit board 3 is made of nickel, which has good conductivity, corrosion resistance, and wettability with the brazing material.

【0034】Cu板等4の厚みは、充分に横方向へ熱拡
散させ、かつセラミック回路基板1に適度なたわみ性を
持たせるためには、0.2mm以上2.0mm以下であること
が好ましい。厚みが0.2mm未満では横方向への熱拡散
の効果が小さくなって不十分となる傾向がある。他方、
厚みが2.0mmより厚いと機械的強度は向上し剛性が上
がるが、基体6を外部の水冷器等にネジ止め等で接合す
る際にセラミック回路基板1がたわみにくくなり、セラ
ミック回路基板1が水冷器等に密着しにくくなって熱抵
抗が増大する傾向がある。また、窒化珪素板2とCu板
等4との接合界面に大きな熱応力が発生するため、基体
6に大きな反りが生じる傾向がある。さらに、基体6ひ
いてはセラミック回路基板1が厚くなり、小型化・低背
化が困難となる傾向がある。
The thickness of the Cu plate 4 or the like is preferably 0.2 mm or more and 2.0 mm or less in order to sufficiently diffuse heat in the lateral direction and to give the ceramic circuit board 1 an appropriate flexibility. If the thickness is less than 0.2 mm, the effect of heat diffusion in the lateral direction becomes small and tends to be insufficient. On the other hand,
If the thickness is thicker than 2.0 mm, the mechanical strength is improved and the rigidity is increased, but when the base 6 is joined to an external water cooler or the like with screws or the like, the ceramic circuit board 1 does not easily bend, and the ceramic circuit board 1 is water cooled. It tends to be difficult to adhere to a vessel or the like and the thermal resistance tends to increase. Further, since a large thermal stress is generated at the bonding interface between the silicon nitride plate 2 and the Cu plate 4 or the like, the base 6 tends to be largely warped. Further, the base body 6 and thus the ceramic circuit board 1 become thick, and it tends to be difficult to reduce the size and height.

【0035】Cu板等4ならびに金属回路板3および金
属板5の厚みは、金属回路板3の厚みをT1、Cu板等
4の厚みをT2、金属板5の厚みをT3としたとき、T
2≧T1≧T3とするとよい。Cu板等4は広面積のい
わゆるベタパターン形状であり、また、セラミック回路
基板1の厚み方向の中心に位置するためセラミック回路
基板1の反りに対する影響が小さいので厚みT2を厚く
することができ、T2を厚くすると、基体6の機械的強
度が強くなり、さらに、横方向への熱拡散が良好になり
放熱特性が向上する。また、セラミック回路基板1の一
方の主面に接合された金属回路板3は回路パターン形状
であるのに対して、セラミック回路基板1の他方の主面
に接合された金属板5は広面積のいわゆるベタパターン
形状であることから、窒化珪素板2と金属回路板3およ
び金属板5とのそれぞれの接合界面に発生する熱応力が
異なり、セラミック回路基板1に反りが発生することと
なるが、T1≧T3とすることにより、基体6の上下の
主面における熱応力のバランスをとることが可能とな
り、セラミック回路基板1の反りを低減することができ
る。従って、T2≧T1≧T3とすることにより、放熱
性に優れ、反りの小さいセラミック回路基板1を得るこ
とが可能となる。
When the thickness of the metal circuit board 3 is T1, the thickness of the Cu board 4 is T2, and the thickness of the metal plate 5 is T3, the thicknesses of the Cu plate 4 and the metal circuit board 3 and the metal plate 5 are T
It is preferable that 2 ≧ T1 ≧ T3. The Cu plate 4 or the like has a wide area, that is, a so-called solid pattern shape, and since it is located at the center of the ceramic circuit board 1 in the thickness direction, the influence on the warp of the ceramic circuit board 1 is small, so the thickness T2 can be increased. When T2 is made thicker, the mechanical strength of the base 6 becomes stronger, and further, the heat diffusion in the lateral direction becomes better, and the heat dissipation characteristics are improved. Further, while the metal circuit board 3 joined to one main surface of the ceramic circuit board 1 has a circuit pattern shape, the metal plate 5 joined to the other main surface of the ceramic circuit board 1 has a large area. Since it is a so-called solid pattern shape, the thermal stress generated at the bonding interface between the silicon nitride plate 2 and the metal circuit plate 3 and the metal plate 5 is different, so that the ceramic circuit board 1 is warped. By setting T1 ≧ T3, it becomes possible to balance the thermal stresses on the upper and lower main surfaces of the base body 6, and it is possible to reduce the warpage of the ceramic circuit board 1. Therefore, by setting T2 ≧ T1 ≧ T3, it becomes possible to obtain the ceramic circuit board 1 having excellent heat dissipation and small warpage.

【0036】本発明のセラミック回路基板1において
は、セラミック回路基板1全体の厚さにおける、金属回
路板3とCu板等4と金属板5との厚さの合計の割合は
50〜90%であることが重要である。この厚さの合計の割
合が50%より小さいと、高熱伝導体である金属の割合に
対して、金属と比較して熱伝導性が低い窒化珪素板2の
割合が大きくなるため、セラミック回路基板1全体の熱
伝導性を向上させる効果が小さくなり不十分となるから
である。また、厚さの合計が90%より大きいと、窒化珪
素板2と金属回路板3・金属板5とを接合したときに発
生する応力により、窒化珪素板2に割れ等が発生しやす
くなるからである。
In the ceramic circuit board 1 of the present invention, the ratio of the total thickness of the metal circuit board 3, the Cu plate 4 and the metal plate 5 to the total thickness of the ceramic circuit board 1 is
It is important to be 50-90%. If the total ratio of the thicknesses is less than 50%, the ratio of the silicon nitride plate 2 having a lower thermal conductivity than that of the metal, which is a high thermal conductor, becomes larger than that of the metal, which is a high thermal conductor. This is because the effect of improving the thermal conductivity of the whole 1 becomes small and becomes insufficient. If the total thickness is more than 90%, the stress generated when the silicon nitride plate 2 and the metal circuit plate 3 / metal plate 5 are joined easily causes cracks or the like in the silicon nitride plate 2. Is.

【0037】以上のような本発明のセラミック回路基板
1に対し、セラミック回路基板1上の金属回路板3の所
定の位置に半導体素子7等の電子部品を半田等を介して
接合し、アルミニウム等のボンディングワイヤで電気的
に接続して、金属板5をグリース状の伝熱性組成物等を
介して放熱部材に接着することにより、半導体モジュー
ルとして完成する。
To the ceramic circuit board 1 of the present invention as described above, an electronic component such as the semiconductor element 7 is bonded to a predetermined position of the metal circuit board 3 on the ceramic circuit board 1 through solder or the like, and aluminum or the like is used. The semiconductor module is completed by electrically connecting the metal plate 5 to the heat radiating member via a grease-like heat conductive composition and the like by electrically connecting the metal plate 5 with the bonding wire.

【0038】[0038]

【実施例】以下、実施例および比較例の試験結果を挙げ
て本発明のセラミック回路基板について詳細に説明する
が、本発明は以下の実施例のみに限定されるものではな
い。
EXAMPLES The ceramic circuit boards of the present invention will be described in detail below with reference to the test results of Examples and Comparative Examples, but the present invention is not limited to the following Examples.

【0039】図1に示した本発明のセラミック回路基板
1において、表1に示す実施例1〜4ような各厚み構成
を変更した回路基板の平均歪みおよび熱抵抗θj-wを計
算した。一方、比較例1として、図4に示した従来のセ
ラミック回路基板11においても、セラミック基板12(窒
化珪素板)の厚みを0.32mm、金属回路板13(Cu)お
よび金属板15(Cu)の厚みは同じとし、それぞれの厚み
を0.2、0.5、1.0、1.5mmと変更した時の回路基板の平
均歪みおよび熱抵抗θj-wを計算した。
In the ceramic circuit board 1 of the present invention shown in FIG. 1, the average strain and the thermal resistance θj-w of the circuit boards in which the respective thickness configurations are changed as in Examples 1 to 4 shown in Table 1 were calculated. On the other hand, as Comparative Example 1, also in the conventional ceramic circuit board 11 shown in FIG. 4, the thickness of the ceramic board 12 (silicon nitride plate) is 0.32 mm, and the metal circuit board 13 (Cu) and the metal plate 15 (Cu) are The thickness was the same, and the average strain and the thermal resistance θj-w of the circuit board when the thickness was changed to 0.2, 0.5, 1.0, and 1.5 mm were calculated.

【0040】また、図1に示した本発明のセラミック回
路基板1において、Cu板等4の厚みを0.1mmとした
回路基板を比較例2、Cu板等4の厚みを2.5mmとし
た回路基板を比較例3とし、同様の計算を行なった。
Further, in the ceramic circuit board 1 of the present invention shown in FIG. 1, a circuit board in which the Cu plate 4 has a thickness of 0.1 mm is a comparative example 2, and a circuit board in which the Cu plate 4 has a thickness of 2.5 mm. Was used as Comparative Example 3 and the same calculation was performed.

【0041】[0041]

【表1】 [Table 1]

【0042】熱抵抗θj-wは、回路基板のサイズを30m
m□、これに搭載される半導体素子のチップサイズを10
mm□とし、このセラミック回路基板を水冷器にオイル
コンパウンドを用いて接着したときのチップ温度Tjと
冷却水温度Twとを定常熱伝導解析し、各温度差を印加
電力で割ることにより計算した。熱抵抗θj-wが小さい
程、放熱能力が高いと判断できる。
The thermal resistance θj-w is the circuit board size of 30 m.
m □, the chip size of the semiconductor element mounted on this is 10
mm □, the steady-state heat conduction analysis was performed for the chip temperature Tj and the cooling water temperature Tw when this ceramic circuit board was bonded to a water cooler using an oil compound, and the temperature difference was calculated by dividing the temperature difference by the applied power. It can be judged that the smaller the thermal resistance θj-w is, the higher the heat radiation capacity is.

【0043】一方、平均歪み(Δεa)は、各層の厚み
(hi)・熱膨張係数(αi)・ヤング率(Ei)・ポア
ソン比(νi)・接合後の温度変化(ΔTi)を用いた数
式Δεa=Σ(hi・Ei/(1−νi)・αi・ΔTi)/
Σ(Ei/(1−νi)・hi)で簡易計算できる。平均
歪みが小さい程、回路基板に加わる熱応力が小さく、回
路基板の反り量も小さいと判断できる。
On the other hand, the average strain (Δε a ) is the thickness of each layer (h i ), coefficient of thermal expansion (α i ), Young's modulus (E i ), Poisson's ratio (ν i ), and temperature change after bonding (ΔT). i ) using the equation Δε a = Σ (h i · E i / (1-ν i ) · α i · ΔT i ) /
A simple calculation can be performed with Σ (E i / (1-ν i ) · h i ). It can be determined that the smaller the average strain, the smaller the thermal stress applied to the circuit board and the smaller the warp amount of the circuit board.

【0044】図2に熱抵抗θj-wの変化に関する結果を
線図で示す。図2において、横軸はセラミック回路基板
全体の厚さにおける、金属回路板とCu板等と金属板と
の厚さの合計の割合(以下、金属の割合という。単位:
%)を表し、縦軸は熱抵抗θj-w(単位:%)を表して
おり、図4に示した従来のセラミック回路基板11におい
てセラミック基板(窒化珪素板)12の厚みを0.32mmと
し、金属回路板13(Cu)および金属板15(Cu)の厚み
を0.5mmとした場合の熱抵抗θj-wを100%とし、その
熱抵抗θj-wと比較したときの比率で示している。その
ような比率で示した理由として、従来のセラミック回路
基板11の厚み構成は、熱的・機械的な特性を考慮して判
断され、セラミック基板12(窒化珪素板)の厚みを0.32
mmとし、金属回路板13(Cu)および金属板15(Cu)
の厚みを0.5mmとするのが、通常よく使用される厚み
構成であるため、これを基準の100%としたものであ
る。なお、図中の各点は、それぞれ図中に示した各実施
例および比較例の結果を示している。
FIG. 2 is a diagram showing the results relating to changes in the thermal resistance θj-w. In FIG. 2, the horizontal axis represents the ratio of the total thickness of the metal circuit plate, the Cu plate, etc., and the metal plate to the total thickness of the ceramic circuit board (hereinafter referred to as the metal ratio. Unit:
%), And the vertical axis represents the thermal resistance θj-w (unit:%). In the conventional ceramic circuit board 11 shown in FIG. 4, the thickness of the ceramic substrate (silicon nitride plate) 12 is 0.32 mm, When the thickness of the metal circuit board 13 (Cu) and the metal plate 15 (Cu) is 0.5 mm, the thermal resistance θj-w is taken as 100%, and is shown as a ratio when compared with the thermal resistance θj-w. The reason for showing such a ratio is that the thickness configuration of the conventional ceramic circuit board 11 is judged in consideration of thermal and mechanical characteristics, and the thickness of the ceramic substrate 12 (silicon nitride plate) is set to 0.32.
mm, metal circuit board 13 (Cu) and metal plate 15 (Cu)
A thickness of 0.5 mm is a commonly used thickness configuration, so this is set to 100% of the standard. Each point in the figure shows the result of each of the examples and comparative examples shown in the figure.

【0045】図2に示す結果より、熱抵抗θj-wは、金
属の割合が増すと小さくなる。また、従来のセラミック
回路基板11の比較例1と比較し、本発明のセラミック回
路基板1においては小さいことが分かる。特に、金属の
割合が多く、さらには、5層構造で回路基板全体の厚み
が厚い場合には、横方向への熱拡散が効果的になり、熱
特性が向上する。ただし、基準の熱抵抗と比較して熱抵
抗が小さくなるときの金属の割合は50〜90%である。こ
れに対し、比較例2のように金属の割合が50%より小さ
いと、金属と比較して熱伝導性が低い窒化珪素板2の割
合が大きいため、回路基板全体の熱伝導性を向上させる
効果が小さくなり、熱抵抗が大きくなる。
From the results shown in FIG. 2, the thermal resistance θj-w decreases as the proportion of metal increases. Further, it can be seen that the ceramic circuit board 1 of the present invention is smaller than the comparative example 1 of the conventional ceramic circuit board 11. In particular, when the proportion of metal is large, and further, in the case of a five-layer structure and the overall thickness of the circuit board is large, thermal diffusion in the lateral direction is effective and thermal characteristics are improved. However, the proportion of metal when the thermal resistance becomes smaller than the standard thermal resistance is 50 to 90%. On the other hand, when the proportion of the metal is less than 50% as in Comparative Example 2, the proportion of the silicon nitride plate 2 having a lower thermal conductivity than that of the metal is large, so that the thermal conductivity of the entire circuit board is improved. The effect is small and the thermal resistance is large.

【0046】次に、図3に平均歪みの変化に関する結果
を線図で示す。図3において、横軸は金属回路板13(C
u)および金属板15(Cu)の厚み(単位:mm)を表
し、縦軸は平均歪み(単位:%)を表しており、従来の
セラミック回路基板11において、セラミック基板(窒化
珪素板)12の厚みを0.32mmとし、金属回路板13(C
u)の厚みを0.5mmとし、金属板15(Cu)の厚みを0.5
mmとしたときの平均歪みを100%とし、その平均歪み
と比較したときの比率で示している。平均歪みを100%
とした回路基板の厚み構成は図2において熱抵抗θj-w
を100%としたものと同じである。なお、図中の各点お
よび特性曲線は、それぞれ図中に示した各実施例および
比較例の結果を示している。
Next, FIG. 3 is a diagram showing the results regarding the change in the average distortion. In FIG. 3, the horizontal axis represents the metal circuit board 13 (C
u) and the thickness (unit: mm) of the metal plate 15 (Cu), and the vertical axis represents the average strain (unit:%). In the conventional ceramic circuit board 11, the ceramic substrate (silicon nitride plate) 12 Has a thickness of 0.32 mm, and the metal circuit board 13 (C
u) has a thickness of 0.5 mm, and the metal plate 15 (Cu) has a thickness of 0.5
The average strain when mm is set to 100%, and the ratio is shown when compared with the average strain. 100% average distortion
The thickness of the circuit board is shown in Fig. 2 as the thermal resistance θj-w.
Is the same as 100%. The points and characteristic curves in the figure show the results of the examples and comparative examples shown in the figure, respectively.

【0047】図3に示す結果より、従来のセラミック回
路基板11においては、金属回路板13(Cu)および金属
板15(Cu)の厚みを厚くすると平均歪みが増大するのに
対し、本発明のセラミック回路基板1においては、Cu
板等4の厚みを厚くしてもセラミック回路基板11と比較
して平均歪みの増加率が小さいことが分かる。比較例1
においては、金属回路板13(Cu)および金属板15(C
u)の厚みが1.5mmのとき、平均歪みは基準の100%に
対し2割増し以上となり、回路基板の反りの影響が熱特
性に対して問題となる領域になる。従って、金属回路板
13(Cu)および金属板15(Cu)の厚みは1.0mm以下
が好ましいことが分かる。Cu板等4の厚みが2mmの
実施例5では、比較例1と比べて平均歪みが大きいが、
平均歪みは基準の100%に対し2割増し以下である。こ
の結果は、熱的な特性を考慮すると、総合的に考えて問
題ないレベルのものである。
From the results shown in FIG. 3, in the conventional ceramic circuit board 11, when the thickness of the metal circuit board 13 (Cu) and the metal plate 15 (Cu) is increased, the average strain is increased. In the ceramic circuit board 1, Cu
It can be seen that the increase rate of the average strain is smaller than that of the ceramic circuit board 11 even if the thickness of the plate 4 or the like is increased. Comparative Example 1
, The metal circuit board 13 (Cu) and the metal plate 15 (C
When the thickness of u) is 1.5 mm, the average strain increases by more than 20% from the standard 100%, and the influence of the warp of the circuit board becomes a problematic area for the thermal characteristics. Therefore, metal circuit board
It can be seen that the thickness of 13 (Cu) and the metal plate 15 (Cu) is preferably 1.0 mm or less. In Example 5 in which the thickness of the Cu plate 4 is 2 mm, the average strain is larger than that in Comparative Example 1, but
The average strain is 20% or less compared to 100% of the standard. This result is at a level that does not pose a problem when comprehensively considered in consideration of thermal characteristics.

【0048】従って、これら図2および図3に示す結果
より、本発明のセラミック回路基板1においては、基板
の信頼性及び反り量を顕著に損なうことなく、熱特性を
向上させることが可能となることが確認できた。
Therefore, from the results shown in FIGS. 2 and 3, in the ceramic circuit board 1 of the present invention, the thermal characteristics can be improved without significantly impairing the reliability and the warpage amount of the board. I was able to confirm that.

【0049】なお、本発明は上述の実施の形態の例に限
定されるものではなく、本発明の要旨を逸脱しない範囲
であれば種々の変更は可能である。例えば、上述の実施
の形態の例では窒化珪素板2に活性金属ロウ材を介して
金属回路板3・Cu板等4・金属板5をロウ付けしてセ
ラミック回路基板1を作製したが、これを窒化珪素板2
の表面に予めタングステンまたはモリブデン等のメタラ
イズ金属層を被着させておき、メタライズ金属層に金属
回路板3・Cu板等4・金属板5をロウ材を介して取着
させてセラミック回路基板1を形成するようにしてもよ
い。
It should be noted that the present invention is not limited to the examples of the above-described embodiments, and various modifications can be made without departing from the gist of the present invention. For example, in the example of the above-described embodiment, the ceramic circuit board 1 is manufactured by brazing the metal circuit board 3, the Cu plate 4 and the metal plate 5 to the silicon nitride plate 2 through the active metal brazing material. Silicon nitride plate 2
A metallized metal layer of tungsten, molybdenum, or the like is previously deposited on the surface of the metal circuit board, and the metal circuit plate 3, the Cu plate 4 or the metal plate 5 is attached to the metallized metal layer via a brazing material to form a ceramic circuit board 1. May be formed.

【0050】また、上述の実施の形態の例では窒化珪素
板2に活性金属ロウ材を介してあらかじめ回路配線パタ
ーン形状に形成された金属回路板3をロウ付けしたが、
窒化珪素板2と略同形状の金属板をロウ付けした後にエ
ッチングにより不要な金属部分を除去して回路配線パタ
ーン形成を行なって金属回路板3としてもよい。
In the example of the above-described embodiment, the metal circuit board 3 formed in advance in the circuit wiring pattern shape is brazed to the silicon nitride plate 2 through the active metal brazing material.
The metal circuit plate 3 may be formed by brazing a metal plate having substantially the same shape as the silicon nitride plate 2 and then removing unnecessary metal portions by etching to form a circuit wiring pattern.

【0051】[0051]

【発明の効果】本発明のセラミック回路基板によれば、
2枚の窒化珪素板の間にCu板またはCu合金板を挟ん
で接合して成る基体の一方の主面に金属回路板を、他方
の主面に金属板を接合して成る回路基板であって、Cu
板またはCu合金板は、厚みが0.5mm以上2.0mm以下
であり、かつセラミック回路基板全体の厚さにおける金
属回路板とCu板またはCu合金板と金属板との厚さの
合計の割合が50〜90%であることから、基体を機械的強
度や破壊靭性値に優れる窒化珪素焼結体から成る窒化珪
素板の間にCu板またはCu合金板を挟んで接合して成
るものとし、この基体を用いて、回路基板全体として金
属回路板/窒化珪素板/Cu板またはCu合金板/窒化
珪素板/金属板の5層構成としたことから、セラミック
回路基板の中間層としてCu板またはCu合金板を設け
ることで基体の剛性が上がるため、平均歪みを低減する
ことが可能となり、従って、基体に厚みの薄い窒化珪素
板を用いた場合でも厚みの厚い金属回路板を接合して回
路基板を構成することが可能となり、接合信頼性を損な
わずに機械的強度を上げることができる。さらに、セラ
ミック回路基板全体の厚みが増えると半導体素子等の電
子部品が発生する熱は横方向へも拡散しながら伝導し、
窒化珪素板の間のCu板またはCu合金板は窒化珪素板
に比較して高熱伝導性であるので、より効果的に拡散し
ながら伝導するため、金属回路板上に搭載される半導体
素子等の電子部品が発生する熱を金属回路板から金属板
へと有効に伝導して放散させることが可能となる。ま
た、本発明のセラミック回路基板によれば、2枚の窒化
珪素板の間にCu板またはCu合金板を挟んで接合した
基体の一方の主面に金属回路板を、他方の主面に金属板
を接合して成るものとし、放熱特性の向上と基板の反り
の抑制とのバランスを考慮して、回路基板を全体として
必要最低限の5層構成とすることで、機械的強度が充分
な厚みの窒化珪素板を用いてもセラミック回路基板の厚
みが増えすぎてたわみにくくなることがないため、回路
基板に十分なたわみ量を許容させつつ機械的強度を確保
することが可能となる。
According to the ceramic circuit board of the present invention,
A circuit board comprising a metal circuit board bonded to one main surface of a base body formed by sandwiching a Cu plate or a Cu alloy plate between two silicon nitride plates, and a metal plate bonded to the other main surface thereof. Cu
The plate or the Cu alloy plate has a thickness of 0.5 mm or more and 2.0 mm or less, and the total ratio of the thickness of the metal circuit plate and the Cu plate or the Cu alloy plate and the metal plate to the total thickness of the ceramic circuit board is 50. Since it is up to 90%, it is assumed that the base is formed by sandwiching a Cu plate or a Cu alloy plate between silicon nitride plates made of a silicon nitride sintered body having excellent mechanical strength and fracture toughness and using this base. Since the circuit board as a whole has a five-layer structure of metal circuit plate / silicon nitride plate / Cu plate or Cu alloy plate / silicon nitride plate / metal plate, the Cu plate or Cu alloy plate is used as the intermediate layer of the ceramic circuit board. Since the rigidity of the base is increased by providing it, it is possible to reduce the average strain. Therefore, even when a thin silicon nitride plate is used for the base, a thick metal circuit board is bonded to form a circuit board. thing And the mechanical strength can be increased without impairing the joint reliability. Furthermore, when the thickness of the entire ceramic circuit board increases, the heat generated by electronic components such as semiconductor elements is conducted while spreading laterally,
Since the Cu plate or the Cu alloy plate between the silicon nitride plates has higher thermal conductivity than the silicon nitride plate, it conducts while diffusing more effectively, and therefore electronic components such as semiconductor elements mounted on the metal circuit board. It is possible to effectively conduct and dissipate the heat generated by the metal circuit plate to the metal plate. Further, according to the ceramic circuit board of the present invention, the metal circuit board is provided on one main surface of the base body in which the Cu plate or the Cu alloy plate is sandwiched between the two silicon nitride plates, and the metal plate is provided on the other main surface. By combining them, considering the balance between the improvement of heat dissipation characteristics and the suppression of warpage of the board, the circuit board as a whole has a minimum required five-layer structure, so that the mechanical strength is sufficient. Even if a silicon nitride plate is used, the thickness of the ceramic circuit board does not increase excessively and it is difficult for the ceramic circuit board to flex. Therefore, it is possible to secure mechanical strength while allowing a sufficient flexure amount in the circuit board.

【0052】また、本発明のセラミック回路基板によれ
ば、2枚の窒化珪素板の間のCu板またはCu合金板を
厚みが0.2mm以上2.0mm以下の熱伝導率の高いCu板
またはCu合金板とし、さらに、セラミック回路基板に
おける、金属回路板、Cu板またはCu合金板、金属板
を合わせた割合が50〜90%としたことから、これら高熱
伝導の金属部分において熱が広がりやすいことにより、
横方向への熱拡散が効果的に行なえるものとなり、熱特
性を向上させることができる。
Further, according to the ceramic circuit board of the present invention, the Cu plate or Cu alloy plate between the two silicon nitride plates is a Cu plate or Cu alloy plate having a high thermal conductivity of 0.2 mm or more and 2.0 mm or less. Furthermore, since the ratio of the metal circuit board, the Cu plate or the Cu alloy plate, and the metal plate in the ceramic circuit board is set to 50 to 90%, the heat easily spreads in these high heat conductive metal parts,
The heat can be effectively diffused in the lateral direction, and the thermal characteristics can be improved.

【0053】さらに、本発明のセラミック回路基板によ
れば、金属回路板の厚みをT1、Cu板またはCu合金
板の厚みをT2、金属板の厚みをT3としたとき、T2
≧T1≧T3とすることにより、基板の反りに影響が小
さく、回路基板全面に渡り配置されるCu板またはCu
合金板の厚みT2が最も厚く、接合面積の小さい金属回
路板の厚みT1が接合面積の大きい金属板の厚みT3よ
り厚くなるため、回路基板全体としての剛性が確保さ
れ、かつ窒化珪素板およびCu板またはCu合金板から
成る基体と金属回路板と金属板との熱膨張係数の相違に
起因する回路基板表裏の熱応力がバランスよく構成され
るものとなり、セラミック回路基板の反りを極めて小さ
く抑制することができる。そして、回路基板の反りが抑
制されることにより、外部の水冷器等との密着がよくな
り、放熱特性が上がり、さらには、熱的・機械的応力に
起因するクラックや割れの発生を防止することができ、
その結果としてクラックに起因する絶縁不良を防止して
回路基板の信頼性を向上させることが可能となる。
Further, according to the ceramic circuit board of the present invention, when the thickness of the metal circuit board is T1, the thickness of the Cu plate or the Cu alloy plate is T2, and the thickness of the metal plate is T3, T2 is given.
By setting ≧ T1 ≧ T3, the influence on the warp of the board is small, and the Cu plate or the Cu arranged over the entire surface of the circuit board
Since the thickness T2 of the alloy plate is thickest and the thickness T1 of the metal circuit board having a small bonding area is thicker than the thickness T3 of the metal plate having a large bonding area, the rigidity of the circuit board as a whole is secured, and the silicon nitride plate and the Cu The thermal stress on the front and back of the circuit board due to the difference in thermal expansion coefficient between the metal plate and the base body made of a metal plate or a Cu alloy plate is well-balanced, and the warp of the ceramic circuit board is suppressed to an extremely small level. be able to. Further, by suppressing the warp of the circuit board, the close contact with an external water cooler or the like is improved, the heat dissipation characteristics are improved, and further, the occurrence of cracks or cracks due to thermal / mechanical stress is prevented. It is possible,
As a result, it becomes possible to prevent insulation failure due to cracks and improve the reliability of the circuit board.

【0054】この結果、本発明の回路基板によれば、放
熱特性が良好となり、金属回路板上に搭載される半導体
素子等の電子部品の熱による誤動作を防止することがで
き、信頼性の高い半導体モジュールを得ることが可能と
なる。
As a result, according to the circuit board of the present invention, the heat dissipation characteristics are improved, and it is possible to prevent malfunction of electronic components such as semiconductor elements mounted on the metal circuit board due to heat, and it is highly reliable. It is possible to obtain a semiconductor module.

【0055】以上により、本発明によれば、セラミック
回路基板の機械的強度を上げ、熱特性を向上し、かつ基
板の反りを抑制することができるセラミック回路基板を
提供することができた。
As described above, according to the present invention, it is possible to provide a ceramic circuit board capable of increasing the mechanical strength of the ceramic circuit board, improving the thermal characteristics, and suppressing the warp of the board.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のセラミック回路基板の実施の形態の一
例を示す断面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of a ceramic circuit board of the present invention.

【図2】本発明および従来のセラミック回路基板におけ
る金属の割合に対する熱抵抗θj-wの変化の例を示す線
図である。
FIG. 2 is a diagram showing an example of a change in thermal resistance θj-w with respect to a metal ratio in the present invention and the conventional ceramic circuit board.

【図3】本発明および従来のセラミック回路基板におけ
る銅板厚みに対する平均歪みの変化の例を示す線図であ
る。
FIG. 3 is a diagram showing an example of changes in average strain with respect to copper plate thickness in the present invention and conventional ceramic circuit boards.

【図4】従来のセラミック回路基板の例を示す断面図で
ある。
FIG. 4 is a cross-sectional view showing an example of a conventional ceramic circuit board.

【符号の説明】[Explanation of symbols]

1:セラミック回路基板 2:窒化珪素板 3:金属回路板 4:Cu板またはCu合金板(Cu板等) 5:金属板 6:基体 1: Ceramic circuit board 2: Silicon nitride plate 3: Metal circuit board 4: Cu plate or Cu alloy plate (Cu plate, etc.) 5: Metal plate 6: Base

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 2枚の窒化珪素板の間にCu板またはC
u合金板を挟んで接合して成る基体の一方の主面に金属
回路板を、他方の主面に金属板を接合して成るセラミッ
ク回路基板であって、前記Cu板またはCu合金板は、
厚みが0.2mm以上2.0mm以下であり、かつ前記セラミ
ック回路基板全体の厚さにおける前記金属回路板と前記
Cu板またはCu合金板と前記金属板との厚さの合計の
割合が50〜90%であることを特徴とするセラミック回路
基板。
1. A Cu plate or a C plate between two silicon nitride plates.
A ceramic circuit board in which a metal circuit board is bonded to one main surface of a base body formed by sandwiching and sandwiching a u alloy plate and a metal plate is bonded to the other main surface, wherein the Cu plate or the Cu alloy plate comprises:
The thickness is 0.2 mm or more and 2.0 mm or less, and the ratio of the total thickness of the metal circuit plate and the Cu plate or the Cu alloy plate and the metal plate in the total thickness of the ceramic circuit board is 50 to 90%. A ceramic circuit board characterized by:
【請求項2】 前記金属回路板の厚みをT1、前記Cu
板またはCu合金板の厚みをT2、前記金属板の厚みを
T3としたとき、T2≧T1≧T3であることを特徴と
する請求項1記載のセラミック回路基板。
2. The thickness of the metal circuit board is T1, the Cu
The ceramic circuit board according to claim 1, wherein T2 ≧ T1 ≧ T3, where T2 is the thickness of the plate or Cu alloy plate and T3 is the thickness of the metal plate.
JP2001314223A 2001-10-11 2001-10-11 Ceramic circuit board Pending JP2003124584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001314223A JP2003124584A (en) 2001-10-11 2001-10-11 Ceramic circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001314223A JP2003124584A (en) 2001-10-11 2001-10-11 Ceramic circuit board

Publications (1)

Publication Number Publication Date
JP2003124584A true JP2003124584A (en) 2003-04-25

Family

ID=19132574

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001314223A Pending JP2003124584A (en) 2001-10-11 2001-10-11 Ceramic circuit board

Country Status (1)

Country Link
JP (1) JP2003124584A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006319313A (en) * 2005-04-13 2006-11-24 Kyocera Corp Circuit board and electronic parts module
WO2016121660A1 (en) * 2015-01-29 2016-08-04 京セラ株式会社 Circuit board and electronic device
JP2017063168A (en) * 2015-09-26 2017-03-30 京セラ株式会社 Circuit board and electronic apparatus
WO2018131583A1 (en) * 2017-01-13 2018-07-19 三菱電機株式会社 Metal-ceramic bonded substrate and manufacturing method therefor

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006319313A (en) * 2005-04-13 2006-11-24 Kyocera Corp Circuit board and electronic parts module
JP4721929B2 (en) * 2005-04-13 2011-07-13 京セラ株式会社 Multilayer circuit board and electronic component module
WO2016121660A1 (en) * 2015-01-29 2016-08-04 京セラ株式会社 Circuit board and electronic device
EP3252810A4 (en) * 2015-01-29 2018-10-10 Kyocera Corporation Circuit board and electronic device
JP2017063168A (en) * 2015-09-26 2017-03-30 京セラ株式会社 Circuit board and electronic apparatus
WO2018131583A1 (en) * 2017-01-13 2018-07-19 三菱電機株式会社 Metal-ceramic bonded substrate and manufacturing method therefor
JPWO2018131583A1 (en) * 2017-01-13 2019-06-27 三菱電機株式会社 Metal-ceramic bonding substrate and method for manufacturing the same
CN110169211A (en) * 2017-01-13 2019-08-23 三菱电机株式会社 Metal-ceramic engages substrate and its manufacturing method
CN110169211B (en) * 2017-01-13 2022-02-18 三菱电机株式会社 Metal-ceramic bonded substrate and method for producing same

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