JPS60115228A - スパツタリング装置 - Google Patents

スパツタリング装置

Info

Publication number
JPS60115228A
JPS60115228A JP22274983A JP22274983A JPS60115228A JP S60115228 A JPS60115228 A JP S60115228A JP 22274983 A JP22274983 A JP 22274983A JP 22274983 A JP22274983 A JP 22274983A JP S60115228 A JPS60115228 A JP S60115228A
Authority
JP
Japan
Prior art keywords
substrate
thin film
magnet
substrate surface
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22274983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH027393B2 (enrdf_load_stackoverflow
Inventor
Tadashi Serikawa
正 芹川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP22274983A priority Critical patent/JPS60115228A/ja
Publication of JPS60115228A publication Critical patent/JPS60115228A/ja
Publication of JPH027393B2 publication Critical patent/JPH027393B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP22274983A 1983-11-26 1983-11-26 スパツタリング装置 Granted JPS60115228A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22274983A JPS60115228A (ja) 1983-11-26 1983-11-26 スパツタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22274983A JPS60115228A (ja) 1983-11-26 1983-11-26 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS60115228A true JPS60115228A (ja) 1985-06-21
JPH027393B2 JPH027393B2 (enrdf_load_stackoverflow) 1990-02-16

Family

ID=16787302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22274983A Granted JPS60115228A (ja) 1983-11-26 1983-11-26 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS60115228A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100327685B1 (ko) * 1995-09-22 2002-06-28 순페이 야마자끼 스퍼터링을통한박막제조방법및스퍼터링장치
KR100421293B1 (ko) * 2001-12-21 2004-03-09 동부전자 주식회사 반도체 소자용 금속막 증착장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130277A (ja) * 1982-01-27 1983-08-03 Clarion Co Ltd マグネトロンスパツタ装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130277A (ja) * 1982-01-27 1983-08-03 Clarion Co Ltd マグネトロンスパツタ装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100327685B1 (ko) * 1995-09-22 2002-06-28 순페이 야마자끼 스퍼터링을통한박막제조방법및스퍼터링장치
KR100421293B1 (ko) * 2001-12-21 2004-03-09 동부전자 주식회사 반도체 소자용 금속막 증착장치

Also Published As

Publication number Publication date
JPH027393B2 (enrdf_load_stackoverflow) 1990-02-16

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