JPS60114857A - 乾式現像用感光性組成物 - Google Patents

乾式現像用感光性組成物

Info

Publication number
JPS60114857A
JPS60114857A JP22198683A JP22198683A JPS60114857A JP S60114857 A JPS60114857 A JP S60114857A JP 22198683 A JP22198683 A JP 22198683A JP 22198683 A JP22198683 A JP 22198683A JP S60114857 A JPS60114857 A JP S60114857A
Authority
JP
Japan
Prior art keywords
group
phenoxy
phenyl
polymer
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22198683A
Other languages
English (en)
Japanese (ja)
Other versions
JPH045178B2 (nl
Inventor
Hisashi Nakane
中根　久
Akira Yokota
晃 横田
Mitsuo Yabuta
光男 藪田
Wataru Ishii
石井　渡
Minoru Tsuda
津田　穣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP22198683A priority Critical patent/JPS60114857A/ja
Publication of JPS60114857A publication Critical patent/JPS60114857A/ja
Publication of JPH045178B2 publication Critical patent/JPH045178B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP22198683A 1983-11-28 1983-11-28 乾式現像用感光性組成物 Granted JPS60114857A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22198683A JPS60114857A (ja) 1983-11-28 1983-11-28 乾式現像用感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22198683A JPS60114857A (ja) 1983-11-28 1983-11-28 乾式現像用感光性組成物

Publications (2)

Publication Number Publication Date
JPS60114857A true JPS60114857A (ja) 1985-06-21
JPH045178B2 JPH045178B2 (nl) 1992-01-30

Family

ID=16775281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22198683A Granted JPS60114857A (ja) 1983-11-28 1983-11-28 乾式現像用感光性組成物

Country Status (1)

Country Link
JP (1) JPS60114857A (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01110564A (ja) * 1987-10-23 1989-04-27 Ube Ind Ltd ビスアジド化合物及びそれを含有する感光性重合体組成物

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014208578A1 (de) * 2014-05-07 2015-11-12 Bayerische Motoren Werke Aktiengesellschaft Energieabsorptionsstruktur für ein Fahrzeugende und Fahrzeugstruktur

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
JPS5859440A (ja) * 1981-10-05 1983-04-08 Hitachi Ltd 感光性重合体組成物
JPS5872139A (ja) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd 感光性材料
JPS58168048A (ja) * 1982-03-29 1983-10-04 Hitachi Ltd パタ−ン形成方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
JPS5859440A (ja) * 1981-10-05 1983-04-08 Hitachi Ltd 感光性重合体組成物
JPS5872139A (ja) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd 感光性材料
JPS58168048A (ja) * 1982-03-29 1983-10-04 Hitachi Ltd パタ−ン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01110564A (ja) * 1987-10-23 1989-04-27 Ube Ind Ltd ビスアジド化合物及びそれを含有する感光性重合体組成物

Also Published As

Publication number Publication date
JPH045178B2 (nl) 1992-01-30

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