JPS60114759A - Semiconductor type gas detecting element - Google Patents

Semiconductor type gas detecting element

Info

Publication number
JPS60114759A
JPS60114759A JP22397583A JP22397583A JPS60114759A JP S60114759 A JPS60114759 A JP S60114759A JP 22397583 A JP22397583 A JP 22397583A JP 22397583 A JP22397583 A JP 22397583A JP S60114759 A JPS60114759 A JP S60114759A
Authority
JP
Japan
Prior art keywords
resistance
gas
detection element
detecting element
gas detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22397583A
Other languages
Japanese (ja)
Inventor
Toshisuke Hishii
菱井 利祐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP22397583A priority Critical patent/JPS60114759A/en
Publication of JPS60114759A publication Critical patent/JPS60114759A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)

Abstract

PURPOSE:To reduce the resistance temperature coefficient of a gas detecting element in a detection gas by employing a paste having a specified sheet resistance as electrode of the semiconductor type gas detecting element. CONSTITUTION:A thick-film printing resistance paste of a sheet resistance 10kOMEGA per square is applied on a sintered body 2 of stannic oxide as electrode 3 and baked at 600 deg.C to obtain a gas detection element 1. A resistance-temperature curve of the gas detection element 1 in 1,000ppm of i-C4H10 (isobutane) is as illustrated and the resistance temperature coefficient is extremely low at 340- 460 deg.C thereby requiring no temperature control of the gas detection element as in the past.

Description

【発明の詳細な説明】 く厘業土の利用分野〉 本発明は、ガスの吸着vcよシ抵抗値が変化する金属酸
化物半導体を用いた半導体式ガス検知素子に閃する。
DETAILED DESCRIPTION OF THE INVENTION [Field of application of industrial soil] The present invention is directed to a semiconductor type gas sensing element using a metal oxide semiconductor whose resistance value changes depending on gas adsorption (VC).

〈従来技術及び問題点〉 従来この柾の半導体式カス検知素子としては酸化第二錫
を主成分とした材料を焼結した素子が広く開発されてい
る。また、半導体式ガス検知素子の電極としては、一般
にpt(白金)、Au(金)が用いられているがミ従来
のこの種の半導体式カス検知素子は、検知ガス例えばi
 −C4HID(イソブタノガス)中における素子の抵
抗温度係数が高く、このような素子をガス漏れ警報器と
して応用するためには、高精度の素子温度制御回路が必
要となシ、高価となるという問題点がわった。
<Prior Art and Problems> Conventionally, elements made of sintered materials containing stannic oxide as a main component have been widely developed as semiconductor-type scum detection elements of this type. In addition, although PT (platinum) and Au (gold) are generally used as electrodes of semiconductor gas detection elements, conventional semiconductor gas detection elements of this type are not suitable for detecting gases such as i
- The temperature coefficient of resistance of the element in C4HID (isobutano gas) is high, and in order to apply such an element as a gas leak alarm, a highly accurate element temperature control circuit is required and is expensive. It broke.

〈発明の目的〉 本発明の目的は、検知ガス中における抵抗温度係数が低
く、温度制御が不要で、高精度な上に安価な半導体式ガ
ス検知菓子を提供することにある。
<Objective of the Invention> An object of the present invention is to provide a semiconductor-type gas detection confectionery that has a low temperature coefficient of resistance in a detection gas, does not require temperature control, is highly accurate, and is inexpensive.

〈発明の構成〉 本発明の半導体式ガス検知素子にあっては、金属酸化物
半導体を用いた半導体式ガス検知素子においてlΩ/口
〜LOOKΩ/口のシート抵抗を有する厚膜印刷用抵抗
ペーストを電極とじて用いた構成とすることによシ、上
記従来の問題点を解決している。
<Structure of the Invention> In the semiconductor type gas sensing element of the present invention, a thick film printing resistive paste having a sheet resistance of 1Ω/hole to LOOKΩ/hole is used in the semiconductor type gas detection element using a metal oxide semiconductor. By using a configuration in which the electrodes are used together, the above-mentioned conventional problems are solved.

〈実施例〉 以下、本発明を図面に基づいて説明する。<Example> Hereinafter, the present invention will be explained based on the drawings.

第1図は本発明の一実施例に係る半導体式ガス検知素子
を示し、第2図は本発明と対比するため電極にAu(金
)、Pt(白金)を用いた従来のガス検知素子における
1−C4H10(イソブタン)1000 ppm中の抵
抗一温度曲線を示し、そして第3図は本発明の実施例に
よる第2図対応の抵抗−温反曲線を示す。まず、第1図
において、lがガス検知素子、2が素子基体としての酸
化第二錫(5nOz )の焼結体、そして3が抵抗ペー
ストを塗布した電極である。上記ガス検知素子1の形成
に際しては1ず、5hOz(酸化第二スズ)粉体に8j
Oz (二酸化ケイ素)1〜10重童s 、Mg o(
酸化マグネシウム)0.5〜5重量%、ptc彫2(塩
化白金)0.1〜5重it%を添加しボールミルで46
時間混合した後、500 c −1ooo t:’で仮
焼し、再粉砕を行ない混合粉末を得る。このようにして
得られた混合粉末をプレス等で成型し、さらにホットプ
レスによシ焼結せしめる。
FIG. 1 shows a semiconductor type gas sensing element according to an embodiment of the present invention, and FIG. 2 shows a conventional gas sensing element using Au (gold) and Pt (platinum) for electrodes for comparison with the present invention. FIG. 3 shows a resistance-temperature curve in 1000 ppm of 1-C4H10 (isobutane), and FIG. 3 shows a corresponding resistance-temperature curve according to an embodiment of the invention. First, in FIG. 1, 1 is a gas detection element, 2 is a sintered body of stannic oxide (5 nOz) as an element substrate, and 3 is an electrode coated with a resistance paste. When forming the gas sensing element 1, first, 8j was added to 5hOz (stannic oxide) powder.
Oz (silicon dioxide) 1-10 s, Mgo (
Magnesium oxide) 0.5 to 5% by weight, PTC carving 2 (platinum chloride) 0.1 to 5% by weight were added and milled in a ball mill to 46% by weight.
After mixing for a period of time, the mixture is calcined at 500 c -100 t:' and re-pulverized to obtain a mixed powder. The mixed powder thus obtained is molded using a press or the like, and further sintered using a hot press.

次に、この焼結体2に′電極として、シート抵抗10に
Ω/口の厚膜印刷用抵抗ペーストを系布し600Cで焼
付はカス検知素子lを得る。このガス検知素子1のi 
−C4HIO(イソブタン) 11000pp中におけ
る抵抗一温度曲線は第3図に示すようになっており、こ
れを同様の条件における第2図の従来の例と比較すると
、温[340C〜460Cにおいて抵抗温度係数が極め
て低いことが判明した。従って、従来のようにカス検知
素子の温度制御をする必要がない。
Next, a resistance paste for thick film printing of Ω/mm is applied to the sheet resistor 10 as an electrode on the sintered body 2, and baked at 600C to obtain a scum detection element 1. i of this gas sensing element 1
-C4HIO (isobutane) The resistance-temperature curve in 11,000 pp is shown in Figure 3. Comparing this with the conventional example in Figure 2 under similar conditions, the temperature coefficient of resistance at temperature [340C to 460C] was found to be extremely low. Therefore, there is no need to control the temperature of the waste detection element as in the conventional case.

〈発明の効果〉 本発明は、以上説明したように、半導体式ガス検知素子
の電極としてlΩ/目〜100にΩ/口のシート抵抗を
有する厚膜印刷用&抗ペーストを用いることとしたため
、ガス検知素子の検知ガス中における抵抗温度係数を減
することができ、その結果従来のようにガス検知素子の
温度制御をする必要がなく、安価で扁精度な7jス漏れ
警報器を実現することができるという効果がある。
<Effects of the Invention> As explained above, the present invention uses a thick film printing & anti-paste having a sheet resistance of 1 Ω/m to 100 Ω/m as an electrode of a semiconductor gas sensing element. To realize an inexpensive and highly accurate 7J gas leak alarm that can reduce the temperature coefficient of resistance of a gas detection element in a detection gas, and as a result does not require temperature control of the gas detection element as in the past. It has the effect of being able to.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例によるガス検知素子の斜視図、 第2図は、本発明と対比のため従来のガス検知素子にお
ける1−C4H1G(イソブタン) 11000pp中
の抵抗一温度曲線を′電極がAu(金)、Pt(白金)
の楊会について示す特性図、 そして第3図は、本発明の夷JM例による、ガス検知素
子のi −C4Hie (イソブタン) looOpp
m中の抵抗一温度曲線を示す特性図でおる。 l・・・ガス検知素子 2・・・焼結体3・・・電極 第1図 1 第2図 第3図 温度(’C)
Fig. 1 is a perspective view of a gas detection element according to an embodiment of the present invention, and Fig. 2 shows a resistance-temperature curve in 1-C4H1G (isobutane) 11000pp in a conventional gas detection element for comparison with the present invention. is Au (gold), Pt (platinum)
FIG. 3 is a characteristic diagram showing the characteristic diagram for the Yang Kai of the present invention, and FIG.
This is a characteristic diagram showing a resistance-temperature curve in m. l... Gas detection element 2... Sintered body 3... Electrode Figure 1 Figure 2 Figure 3 Temperature ('C)

Claims (1)

【特許請求の範囲】[Claims] 金属酸化物半導体を用いた半導体式ガス検知素子におい
て、lΩ/口〜100にΩ/口のシート抵抗をン目する
W−誤印刷用抵抗ペーストを電極として用いること′(
I−特徴とする半導体式ガス検知素子。
In a semiconductor type gas sensing element using a metal oxide semiconductor, a W-misprinted resistance paste with a sheet resistance of 1Ω/unit to 100Ω/unit is used as an electrode.
I-Characteristic semiconductor gas detection element.
JP22397583A 1983-11-28 1983-11-28 Semiconductor type gas detecting element Pending JPS60114759A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22397583A JPS60114759A (en) 1983-11-28 1983-11-28 Semiconductor type gas detecting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22397583A JPS60114759A (en) 1983-11-28 1983-11-28 Semiconductor type gas detecting element

Publications (1)

Publication Number Publication Date
JPS60114759A true JPS60114759A (en) 1985-06-21

Family

ID=16806606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22397583A Pending JPS60114759A (en) 1983-11-28 1983-11-28 Semiconductor type gas detecting element

Country Status (1)

Country Link
JP (1) JPS60114759A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60209159A (en) * 1984-04-03 1985-10-21 Nippon Muki Kk Gas detecting element

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60209159A (en) * 1984-04-03 1985-10-21 Nippon Muki Kk Gas detecting element
JPH053541B2 (en) * 1984-04-03 1993-01-18 Nippon Muki Kk

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