JPS60102702A - 厚膜抵抗層形成用ペ−スト - Google Patents

厚膜抵抗層形成用ペ−スト

Info

Publication number
JPS60102702A
JPS60102702A JP58209845A JP20984583A JPS60102702A JP S60102702 A JPS60102702 A JP S60102702A JP 58209845 A JP58209845 A JP 58209845A JP 20984583 A JP20984583 A JP 20984583A JP S60102702 A JPS60102702 A JP S60102702A
Authority
JP
Japan
Prior art keywords
resistance layer
thick film
paste
film resistance
layer forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58209845A
Other languages
English (en)
Japanese (ja)
Other versions
JPH023523B2 (enrdf_load_stackoverflow
Inventor
久保川 輝芳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP58209845A priority Critical patent/JPS60102702A/ja
Publication of JPS60102702A publication Critical patent/JPS60102702A/ja
Publication of JPH023523B2 publication Critical patent/JPH023523B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
JP58209845A 1983-11-10 1983-11-10 厚膜抵抗層形成用ペ−スト Granted JPS60102702A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58209845A JPS60102702A (ja) 1983-11-10 1983-11-10 厚膜抵抗層形成用ペ−スト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58209845A JPS60102702A (ja) 1983-11-10 1983-11-10 厚膜抵抗層形成用ペ−スト

Publications (2)

Publication Number Publication Date
JPS60102702A true JPS60102702A (ja) 1985-06-06
JPH023523B2 JPH023523B2 (enrdf_load_stackoverflow) 1990-01-24

Family

ID=16579568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58209845A Granted JPS60102702A (ja) 1983-11-10 1983-11-10 厚膜抵抗層形成用ペ−スト

Country Status (1)

Country Link
JP (1) JPS60102702A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01286401A (ja) * 1988-05-13 1989-11-17 Fuji Xerox Co Ltd サーマルヘッド
US5510823A (en) * 1991-03-07 1996-04-23 Fuji Xerox Co., Ltd. Paste for resistive element film

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104246479B (zh) 2012-04-18 2016-10-19 奥林巴斯株式会社 利用光分析的单个粒子检测装置、单个粒子检测方法以及单个粒子检测用计算机程序

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01286401A (ja) * 1988-05-13 1989-11-17 Fuji Xerox Co Ltd サーマルヘッド
US5510823A (en) * 1991-03-07 1996-04-23 Fuji Xerox Co., Ltd. Paste for resistive element film

Also Published As

Publication number Publication date
JPH023523B2 (enrdf_load_stackoverflow) 1990-01-24

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